GB1126001A - Determination of vapor coating rate by x-rays - Google Patents
Determination of vapor coating rate by x-raysInfo
- Publication number
- GB1126001A GB1126001A GB55497/65A GB5549765A GB1126001A GB 1126001 A GB1126001 A GB 1126001A GB 55497/65 A GB55497/65 A GB 55497/65A GB 5549765 A GB5549765 A GB 5549765A GB 1126001 A GB1126001 A GB 1126001A
- Authority
- GB
- United Kingdom
- Prior art keywords
- vapour
- coating
- electron beam
- rays
- characteristic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2209—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using wavelength dispersive spectroscopy [WDS]
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/079—Investigating materials by wave or particle radiation secondary emission incident electron beam and measuring excited X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/61—Specific applications or type of materials thin films, coatings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/638—Specific applications or type of materials gas
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
1,126,001. Photo-electric coating thickness control. UNITED STATES STEEL CORP. Dec. 31, 1965 [Jan. 6, 1965], No. 55497/65. Heading G1A. [Also in Division H1] The density of a vapour in a vapour-coating machine is measured in order to control the coating thickness, by subjecting the vapour to a high energy beam, e. g. of electrons, in order to produce characteristic X-rays, a portion of which is detected and measured. The particular application is in the continuous coating,of strip material and is suitable for thickness control in the vacuum coating of steel strip with aluminium. In one arrangement, Fig. 1, an electron beam 2 from a gun 1 is bent in a semicircular arc by a magnetic field to heat and melt the coating material 3 in a crucible 4. The resulting vapour flows towards the strip 6 to be coated. The electron beam 2 comes into contact with atoms of the coating vapour producing characteristic X-rays 8. Some of these enter the collimator 9a of a detector 9, the output of which is amplified, and counted, allowing for scattered radiation. In another arrangement, Fig. 2 (not shown) separate means produce the coating vapour which flows through a housing (10), an electron beam being directed at right angles to the flow of the vapour. Characteristic X-radiation emitted in a direction mutually at right angles to the electron beam and vapour flow, is investigated by the collimatordetector system.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US423764A US3373278A (en) | 1965-01-06 | 1965-01-06 | Determination of vapor coating rate by x-rays emitted from said vapor |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1126001A true GB1126001A (en) | 1968-09-05 |
Family
ID=23680089
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB55497/65A Expired GB1126001A (en) | 1965-01-06 | 1965-12-31 | Determination of vapor coating rate by x-rays |
Country Status (5)
Country | Link |
---|---|
US (1) | US3373278A (en) |
BE (1) | BE674605A (en) |
FR (1) | FR1461909A (en) |
GB (1) | GB1126001A (en) |
NL (1) | NL6517043A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2125541A (en) * | 1982-08-13 | 1984-03-07 | Inst Tzvetna Metalurgia | Method and device for determination of dust content in dust gas flows |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3612859A (en) * | 1968-01-31 | 1971-10-12 | Westinghouse Electric Corp | Method for measuring and controlling the density of a metallic vapor |
US3590777A (en) * | 1969-03-13 | 1971-07-06 | United Aircarft Corp | Ingot feed drive |
US3667421A (en) * | 1970-09-17 | 1972-06-06 | United Aircraft Corp | Mechanism for controlling the thickness of a coating in a vapor deposition apparatus |
US3984581A (en) * | 1973-02-28 | 1976-10-05 | Carl Zeiss-Stiftung | Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers |
JPS5435920B2 (en) * | 1974-06-10 | 1979-11-06 | ||
US4036167A (en) * | 1976-01-30 | 1977-07-19 | Inficon Leybold-Heraeus Inc. | Apparatus for monitoring vacuum deposition processes |
US4292341A (en) * | 1980-02-26 | 1981-09-29 | Bell Telephone Laboratories, Incorporated | Method of controlling the index profile of optical fiber preforms |
DE4336682C1 (en) * | 1993-10-27 | 1994-10-27 | Fraunhofer Ges Forschung | Method for electron-beam vapour coating (vapour depositing, vacuum depositing) with multi-component evaporation material |
KR950034499A (en) * | 1994-01-28 | 1995-12-28 | 제임스 조셉 드롱 | Method and apparatus for monitoring the deposition rate of films during physical vapor deposition |
WO2020104744A1 (en) * | 2018-11-20 | 2020-05-28 | Commissariat A L'energie Atomique Et Aux Energies Alternatives | Method for analyzing evaporation fumes, computer program product, analysis system and additive manufacturing facility associated therewith |
FR3089299B1 (en) * | 2018-11-29 | 2021-06-04 | Commissariat Energie Atomique | EVAPORATION FUMES ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT, ASSOCIATED ANALYSIS SYSTEM AND ADDITIVE MANUFACTURING PLANT |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3230110A (en) * | 1962-01-22 | 1966-01-18 | Temescal Metallurgical Corp | Method of forming carbon vapor barrier |
US3246146A (en) * | 1963-07-11 | 1966-04-12 | Ass Elect Ind | Apparatus for the X-ray analysis of a liquid suspension of specimen material |
-
1965
- 1965-01-06 US US423764A patent/US3373278A/en not_active Expired - Lifetime
- 1965-12-27 FR FR43769A patent/FR1461909A/en not_active Expired
- 1965-12-28 NL NL6517043A patent/NL6517043A/xx unknown
- 1965-12-31 BE BE674605A patent/BE674605A/xx unknown
- 1965-12-31 GB GB55497/65A patent/GB1126001A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2125541A (en) * | 1982-08-13 | 1984-03-07 | Inst Tzvetna Metalurgia | Method and device for determination of dust content in dust gas flows |
Also Published As
Publication number | Publication date |
---|---|
NL6517043A (en) | 1966-07-07 |
FR1461909A (en) | 1966-12-09 |
US3373278A (en) | 1968-03-12 |
BE674605A (en) | 1966-06-30 |
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