GB1051251A - - Google Patents
Info
- Publication number
- GB1051251A GB1051251A GB1051251DA GB1051251A GB 1051251 A GB1051251 A GB 1051251A GB 1051251D A GB1051251D A GB 1051251DA GB 1051251 A GB1051251 A GB 1051251A
- Authority
- GB
- United Kingdom
- Prior art keywords
- substrate
- metal
- screen
- march
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910052751 metal Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 3
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000003990 capacitor Substances 0.000 abstract 1
- 238000010276 construction Methods 0.000 abstract 1
- 239000004744 fabric Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000012216 screening Methods 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Abstract
1,051,251. Cathode sputtering. ULTRA ELECTRONICS Ltd. March 20, 1964 [March 21, 1963], No.11319/63. Heading C7F. Different thicknesses of metal e.g. Ta are deposited simultaneously in different areas of a substrate by cathode sputtering wherein a perforate screen is interposed between the cathode metal and the substrate, the screen being of spatially varying construction, e.g. consisting of a plurality of pieces of material of different mesh, or screening only a part of the substrate. The screen, preferably connected to the anode, may be metal gauze or cloth or perforated metal sheet. The method is applicable to tantalum micro-circuit production wherein connected areas for resistor and capacitor formation can be deposited simultaneously.
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1051251A true GB1051251A (en) |
Family
ID=1756282
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB1051251D Active GB1051251A (en) |
Country Status (1)
| Country | Link |
|---|---|
| GB (1) | GB1051251A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2136451A (en) * | 1983-03-11 | 1984-09-19 | Gen Electric Plc | Depositing porous films by evaporating material on to a surface |
| GB2233983A (en) * | 1989-06-07 | 1991-01-23 | Ppg Industries Inc | Producing sputtered coating using foraminous mask member |
| WO1995003436A1 (en) * | 1993-07-22 | 1995-02-02 | Materials Research Corporation | Stationary aperture plate for reactive sputter deposition |
-
0
- GB GB1051251D patent/GB1051251A/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2136451A (en) * | 1983-03-11 | 1984-09-19 | Gen Electric Plc | Depositing porous films by evaporating material on to a surface |
| GB2233983A (en) * | 1989-06-07 | 1991-01-23 | Ppg Industries Inc | Producing sputtered coating using foraminous mask member |
| GB2233983B (en) * | 1989-06-07 | 1993-07-21 | Ppg Industries Inc | Apparatus and method for making sputtered coatings |
| WO1995003436A1 (en) * | 1993-07-22 | 1995-02-02 | Materials Research Corporation | Stationary aperture plate for reactive sputter deposition |
| US5415753A (en) * | 1993-07-22 | 1995-05-16 | Materials Research Corporation | Stationary aperture plate for reactive sputter deposition |
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