FR3152018A1 - Solar control and/or low-emissivity glazing - Google Patents

Abstract

The invention relates to a material comprising a transparent substrate coated with a functional coating capable of acting on solar radiation and/or infrared radiation. The invention also relates to glazing comprising these materials as well as the use of such materials for manufacturing thermal insulation and/or solar protection glazing. The invention is specifically concerned with developing a material comprising a functional coating with two functional layers based on silver having a selectivity close to functional coatings with three functional layers, while maintaining excellent color neutrality. Figure: 1

Description

Solar control and/or low-emissivity glazing

The invention relates to a material comprising a transparent substrate coated with a functional coating capable of acting on solar radiation and/or infrared radiation. The invention also relates to glazing comprising these materials as well as the use of such materials for manufacturing thermal insulation and/or solar protection glazing. In the remainder of the description, the term "functional" qualifying "functional coating" means "capable of acting on solar radiation and/or infrared radiation".

These glazings can be used to equip both buildings and vehicles, in particular for:
- reduce the air conditioning effort and/or prevent excessive overheating, so-called “solar control” glazing and/or
- reduce the amount of energy dissipated to the outside, so-called “low emissive” glazing.

The selectivity “S” is used to assess the performance of these glazings. It corresponds to the ratio of light transmission TL_screwin the visible of the glazing on the solar factor FS of the glazing (S = TL_screw/ FS). The solar factor “FS or g” corresponds to the ratio in % between the total energy entering the room through the glazing and the incident solar energy. The solar factor therefore measures the contribution of glazing to the heating of the “room”. The smaller the solar factor, the lower the solar input.

Known selective glazings comprise transparent substrates coated with a functional coating comprising a stack of one or more metallic functional layers, each arranged between two dielectric coatings. Such glazings make it possible to improve solar protection while maintaining high light transmission. These functional coatings are generally obtained by a succession of deposits carried out by cathodic sputtering, optionally assisted by a magnetic field.

Conventionally, the faces of a glazing are designated starting from the exterior of the building and by numbering the faces of the substrates from the outside to the inside of the dwelling or room it equips. This means that the incident sunlight passes through the faces in ascending order of their number.

Known selective glazing is generally double glazing comprising the functional coating located on face 2, that is to say on the outermost substrate of the building on its face facing the interlayer gas blade.

Currently, the best performing materials have a selectivity greater than 2 and include a functional coating with at least three silver-based metal functional layers. For comparison:
- a material comprising a functional coating with two silver-based layers allows to obtain a selectivity of 1.7 up to 1.9,
- a material comprising a functional coating with a silver-based layer allows to obtain a selectivity of up to 1.2,
- a material comprising a functional coating without a silver-based layer allows to obtain a selectivity of up to 1.

However, functional coatings comprising at least three functional layers are complex. Indeed, by multiplying the number of layers and materials constituting these functional coatings, it becomes increasingly difficult to adapt the settings of the deposition conditions in order to obtain functional coatings that are constant in color and properties.

The invention is specifically interested in developing a material comprising a functional coating with two functional layers based on silver having an improved selectivity close to functional coatings with three functional layers, i.e. a selectivity close to, or even greater than, 2, while maintaining excellent color neutrality (a*T less than -9, preferably less than -6), low external reflection (<12%, or even less than 10%). The invention preferably targets medium to low light transmissions (< 60%).

The invention relates to a material comprising a substrate coated with a functional coating comprising an alternation of only two silver-based metallic functional layers called, starting from the substrate, first and second functional layers and three dielectric coatings called, starting from the substrate, Di1, Di2 and Di3, each dielectric coating comprising at least one dielectric layer, such that each functional metallic layer is arranged between two dielectric coatings, characterized in that:
the first dielectric coating Di1 located below the first functional layer comprises an absorbent layer located between two dielectric layers, said absorbent layer being chosen from:
- layers based on a metal or a metal alloy,
- metal nitride layers, and
- metal oxynitride layers;
the metallic element(s) being chosen from nickel, chromium, niobium, vanadium, titanium, tungsten, palladium, stainless steel, molybdenum, zirconium, tantalum and zinc.

The absorbing layer may be essentially in metallic form. Although essentially in metallic form, the metal may have traces of nitriding due to the deposition atmosphere polluted by nitrogen from the neighboring deposition zones. Preferably, the absorbing layer is a metal selected from palladium, niobium, tungsten, stainless steel, titanium, chromium, molybdenum, zirconium, nickel, tantalum, zinc, alloys such as NiCr, NiCrW, WTa, WCr, NbZr, TaNiV, CrZr and NbCr.

The absorbing layer may be a nitride or a subnitride, i.e. a substoichiometric nitrogen nitride. Preferably, the absorbing layer is a nitride selected from TiN, NiCrWN, NiVN, TaN, CrN, ZrN, CrZrN, TiAIN, TiZrN, WN, SiZrN and SiNiCrN.

Advantageously, the absorbent layer can be chosen from layers based on Ti, TiN, Nb, NbN, Ni, NiN, Cr, CrN, NiCr, NiCrN.

According to preferred embodiments, the absorbing layer is a layer of titanium nitride TiN or a metallic layer of nickel and chromium alloy NiCr.

Preferably, the stack comprises a single absorbent layer. This means in particular that the upper covering does not comprise an absorbent layer.

The thickness of the absorbent layer is, in order of increasing preference, from 0.2 to 9 nm, from 0.3 to 5 nm, from 0.35 to 3 nm, from 0.35 to 0.45 nm.

The absorbing layer is located between two dielectric layers.
Preferably, the sum of the thicknesses of all dielectric layers immediately above and in contact with the absorbing layer is greater than 5 nm, 10 nm, 15 nm, 20 nm or 30 nm.
Preferably, the sum of the thicknesses of all the dielectric layers immediately below and in contact with the absorbing layer is greater than or equal to 4 nm, preferably greater than or equal to 5 nm.
One or more dielectric layers are considered to be in immediate contact with the absorbing layer when they are not separated from the absorbing layer by a metal layer or another absorbing layer. For example, in the sequence Dielectric layer 1 / Absorbing layer / Dielectric layer 2 / Dielectric layer 3, the thicknesses of dielectric layer 1 and dielectric layer 2 will be added together to determine the sum of the thicknesses of all dielectric layers immediately above and in contact with the absorbing layer.

The material of the invention may have the following characteristics alone or in combination:
- the functional coating comprises one or more metal blocking layers preferably located in contact with, below and/or above the first and/or second metal functional layer,
- the first dielectric coating Di1 located below the first functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm, preferably greater than 8 nm, or even greater than 10 nm, the high index layer may be located between the absorbent layer and the first functional layer,
- the third dielectric coating Di3 located above the second functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm, preferably greater than 8 nm, or even greater than 10 nm,
- the absorbent layer can be chosen from metallic layers based on nickel and/or chromium and layers based on titanium nitride,
- the second dielectric coating further comprises a tin oxide-based layer comprising at least 10%, or less than 20% or at least 30% by mass of tin relative to the total mass of elements other than nitrogen and oxygen, this tin oxide-based layer generally has a thickness greater than 5 nm, or even greater than 10 nm and less than 40 nm, or even less than 30 nm,
- the second dielectric coating further comprises a layer based on tin oxide, preferably based on zinc and tin oxide comprising at least 10%, at least 20% or at least 30% by mass of tin relative to the total mass of zinc and tin, this layer based on tin oxide generally has a thickness greater than 5 nm, or even greater than 10 nm and less than 40 nm, or even less than 30 nm,
- when the functional coating comprises one or more layers with a high refractive index, these are preferably chosen from layers based on titanium oxide and layers based on silicon and zirconium nitride,
- when the functional coating comprises one or more layers with a high refractive index, these preferably have a thickness greater than 10 nm,
- the dielectric coating located below the first functional layer may comprise a zinc oxide-based layer located in contact with the first functional layer or separated from the first functional layer by a blocking layer,
- the dielectric coating located below the second functional layer may comprise a zinc oxide-based layer located in contact with the second functional layer or separated from the second functional layer by a blocking layer,
- the dielectric coating located below the first metallic functional layer comprises a layer comprising silicon chosen from silicon nitride layers,
- the dielectric coating located above the first metallic functional layer comprises a layer comprising silicon chosen from silicon nitride layers,
- the dielectric coating located above the second metallic functional layer comprises a layer comprising silicon chosen from silicon nitride layers,
- each dielectric coating comprises a layer comprising silicon selected from silicon nitride layers.

The material according to the invention has, in particular, a light transmission of between 20 and 70%, preferably between 35 and 65%.

The glazing comprising material according to the invention may be in the form of multiple glazing or laminated glazing.

The invention also relates to:
- glazing comprising a material according to the invention,
- glazing comprising a material according to the invention mounted on a vehicle or on a building, and
- the process for preparing a material or glazing according to the invention,
- the use of glazing according to the invention as solar control and/or low-emissivity glazing for buildings or vehicles,
- a building, a vehicle or a device comprising glazing according to the invention.

Throughout the description, the substrate according to the invention is considered to be laid horizontally. The stack of thin layers is deposited above the substrate. The meaning of the expressions “above” and “below” and “lower” and “upper” is to be considered in relation to this orientation. In the absence of a specific stipulation, the expressions “above” and “below” do not necessarily mean that two layers and/or coatings are arranged in contact with each other. When it is specified that a layer is deposited “in contact” with another layer or a coating, this means that there cannot be one (or more) layer(s) intercalated between these two layers (or layer and coating).

All the luminous characteristics described are obtained according to the principles and methods of the European standards EN 410 relating to the determination of the luminous and solar characteristics of glazing used in glass for construction. It is considered that the sunlight entering a building goes from the outside to the inside.

According to the invention, the luminous characteristics are measured according to illuminant D65 at 2°. perpendicular to the material mounted in double glazing:
- TL corresponds to the light transmission in the visible in %,
- Rext (or RL1) corresponds to the external light reflection in the visible in %, observer on the external space side,
- Rint (or RL2) corresponds to the interior light reflection in the visible in %, observer on the interior space side,
- a*T and b*T correspond to the transmission colors a* and b* in the L*a*b* system,
- a*Rext and b*Rext correspond to the colors in reflection a* and b* in the L*a*b* system, observer on the exterior space side,
- a*Rint (or a*RL2) and b*Rint (or b*RL2) correspond to the reflection colors a* and b* in the L*a*b* system, observer side interior space.

The coating is deposited by magnetic field-assisted sputtering (magnetron process). According to this advantageous embodiment, all layers of the stack are deposited by magnetic field-assisted sputtering.

In the absence of a specific stipulation, the expressions "above" and "below" do not necessarily mean that two layers and/or coatings are arranged in contact with each other. When it is specified that a layer is deposited "in contact" with another layer or a coating, this means that there cannot be one (or more) layer(s) intercalated between these two layers (or layer and coating).

Unless otherwise stated, thicknesses referred to in this document are physical thicknesses and layers are thin layers. A thin layer is defined as a layer having a thickness between 0.1 nm and 100 micrometers.

According to the invention, unless otherwise indicated, the expression “based on”, used to qualify a material or a metallic layer as to what it contains, means that the mass fraction of the constituent that it comprises is at least 50%, in particular at least 70%, preferably at least 90%.

According to the invention, unless otherwise indicated, the expression "based on", used to qualify a material or a dielectric layer as to what it contains, means that the mass fraction of the constituent that it comprises is at least 50%, in particular at least 70%, preferably at least 90% by mass relative to the total mass of the elements other than oxygen and nitrogen.

According to the invention, the term “distinct layers” means two layers of different chemical nature, that is to say made up of different chemical elements or two layers of the same nature but separated by at least one layer of different chemical nature.

The silver-based metal functional layers comprise at least 95.0%, preferably at least 96.5% and more preferably at least 98.0% by weight of silver relative to the weight of the functional layer. Preferably, a silver-based metal functional layer comprises less than 1.0% by weight of metals other than silver relative to the weight of the silver-based metal functional layer.

The silver-based metallic functional layers have a thickness:
- greater than 5 nm, 6 nm, 7 nm, 8 nm, 9 nm, 10 nm, 11 nm, 12 nm, 13 nm, 14 nm, 15 nm or 16 nm, and/or
- less than 25 nm, 22 nm, 20 nm, 18, nm.

By "dielectric coating" within the meaning of the present invention, it is understood that there may be a single layer or several layers of different materials inside the coating. A "dielectric coating" according to the invention mainly comprises dielectric layers. However, according to the invention these coatings may also comprise layers of other nature, in particular absorbent layers, for example metallic.

A "same" dielectric coating is considered to be located:
- between the substrate and the first functional layer,
- between each functional silver-based metal layer,
- above the last functional layer (the furthest from the substrate).

Dielectric coatings comprise dielectric layers. By "dielectric layer" for the purposes of the present invention, it is to be understood that from the point of view of its nature, the material is "non-metallic", i.e. is not a metal. In the context of the invention, this term designates a material having an n/k ratio over the entire visible wavelength range (from 380 nm to 780 nm) equal to or greater than 5. n designates the real refractive index of the material at a given wavelength and k represents the imaginary part of the refractive index at a given wavelength; the n/k ratio being calculated at a given wavelength identical for n and for k.

The thickness of a dielectric coating corresponds to the sum of the thicknesses of the layers constituting it. Preferably, the dielectric coatings have a thickness greater than 10 nm, greater than 15 nm, between 15 and 200 nm, between 15 and 100 nm or between 15 and 70 nm.

The dielectric layers of the coatings have the following characteristics alone or in combination:
- they are deposited by magnetic field-assisted cathodic sputtering,
- they are chosen from oxides, nitrides or oxynitrides of one or more elements chosen from titanium, silicon, aluminum, zirconium, tin and zinc,
- they have a thickness greater than 2 nm, preferably between 2 and 100 nm.

Dielectric layers, in addition to their optical function, can have various other functions. The choice of the nature and position of the dielectric layers within the dielectric coating depends on this function. As an example, the following functions can be cited: - stabilizing or wetting layers located in the immediate vicinity of silver-based functional layers such as zinc oxide-based layers,
- smoothing layers located below the wetting layers such as tin oxide-based layers,
- barrier or optical function layers.

A single dielectric layer generally performs several functions. In fact, each dielectric layer plays an optical role which depends on its refractive index and its thickness.

The dielectric layers are conventionally chosen from oxide-based, nitride-based or oxynitride-based layers. The oxide-based layers of one or more elements comprise essentially oxygen and very little nitrogen. The oxide-based layers comprise in particular at least 90% by atomic percentage of oxygen relative to the oxygen and nitrogen in said layer. The nitride-based layers comprise essentially nitrogen and very little oxygen. The nitride-based layers comprise at least 90% by atomic percentage of nitrogen relative to the oxygen and nitrogen in said layer. The oxynitride-based layers comprise a mixture of oxygen and nitrogen. The silicon oxynitride-based layers comprise 10 to 90% (limits excluded) by atomic percentage of nitrogen relative to the oxygen and nitrogen in said layer.

The amounts of oxygen and nitrogen in a layer are determined as atomic percentages relative to the total amounts of oxygen and nitrogen in the layer under consideration.

The dielectric layers are classically chosen from:
- layers comprising silicon, aluminium and/or zirconium, optionally doped with at least one other element,
- tin oxide-based layers,
- titanium oxide-based layers,
- zinc oxide-based layers.

The stack may comprise at least one layer comprising silicon or aluminium. Preferably, the dielectric coating located above the functional layer may comprise a layer comprising silicon, in particular chosen from silicon nitride layers or silicon nitride and zirconium layers. Each dielectric coating may also comprise at least one layer comprising silicon.

Layers containing silicon are extremely stable to heat treatments. For example, no migration of the elements constituting them is observed. Consequently, these elements are not likely to alter the silver layer. Layers containing silicon therefore also contribute to the non-alteration of the silver layers and therefore to obtaining low emissivity after heat treatment.

The silicon-comprising layers comprise at least 50% by mass of silicon relative to the mass of all elements constituting the silicon-comprising layer other than nitrogen and oxygen.

The layers comprising silicon may be selected from oxide-based, nitride-based or oxynitride-based layers such as silicon oxide-based layers, silicon nitride-based layers and silicon oxynitride-based layers.

The silicon oxide-based layers comprise at least 90 atomic percent oxygen relative to the oxygen and nitrogen in the silicon oxide-based layer. The silicon nitride-based layers comprise at least 90 atomic percent nitrogen relative to the oxygen and nitrogen in the silicon nitride-based layer. The silicon oxynitride-based layers comprise 10 to 90 atomic percent nitrogen relative to the oxygen and nitrogen in the silicon oxide-based layer. Preferably, the silicon oxide-based layers are characterized by a refractive index at 550 nm of less than or equal to 1.55. Preferably, the silicon nitride-based layers are characterized by a refractive index at 550 nm of greater than or equal to 1.95.

The layers comprising silicon may comprise or consist of elements other than silicon, oxygen and nitrogen. These elements may be selected from aluminium, boron, titanium and zirconium. The layers comprising silicon may comprise at least 2%, at least 5% or at least 8% by mass of aluminium relative to the mass of all elements constituting the layer comprising silicon other than oxygen and nitrogen.

The layers comprising aluminum may be selected from oxide-based, nitride-based or oxynitride-based layers such as aluminum oxide-based layers such as Al2O3, aluminum nitride-based layers such as AIN and aluminum oxynitride-based layers such as AlOxNy.

Silicon nitride and zirconium layers Si _x Zr _y N _z are among the layers comprising silicon, in particular silicon nitride-based layers. The refractive index of silicon nitride and zirconium layers increases with increasing proportions of zirconium in said layer.

The silicon nitride-based layers may comprise aluminum and/or zirconium. Such layers may comprise, in atomic proportions relative to the atomic proportions of Si, Zr and Al:
- 50 to 98%, 60 to 90%, 60 to 70% atomic silicon,
- 0 to 10%, 2 to 10 atomic % of aluminum,
- 0 to 40%, 10 to 40% or 15 to 30 atomic % zirconium.

Preferably, at least one dielectric coating comprises a layer comprising silicon selected from silicon nitride-based layers. Preferably, the dielectric coating located above the silver-based functional layer comprises a layer comprising silicon selected from silicon nitride-based layers. Each dielectric coating may comprise a layer comprising silicon selected from silicon nitride-based layers.

Preferably, the sum of the thicknesses of all layers comprising silicon nitride-based silicon in each dielectric coating located above the first silver-based functional metal layer may be greater than 35%, greater than 50%, of the total thickness of the dielectric coating.

Preferably, the silver-based functional layer is located above a dielectric layer called a stabilizing or wetting layer made of a material capable of stabilizing the interface with the functional layer. These layers are generally based on zinc oxide.

Preferably, the silver-based functional layer is located below a dielectric layer called a stabilizing or wetting layer made of a material capable of stabilizing the interface with the functional layer. These layers are generally based on zinc oxide.

The zinc oxide-based layers may comprise at least 80% or at least 90% by mass of zinc relative to the total mass of all the elements constituting the zinc oxide-based layer excluding oxygen and nitrogen.

The zinc oxide-based layers may comprise one or more elements selected from aluminum, titanium, niobium, zirconium, magnesium, copper, silver, gold, silicon, molybdenum, nickel, chromium, platinum, indium, tin and hafnium, preferably aluminum.

Zinc oxide-based layers can optionally be doped with at least one other element, such as aluminum.

A priori, the zinc oxide-based layer is not nitrided, however traces may exist.

The zinc oxide-based layer comprises, in order of increasing preference, at least 80%, at least 90%, at least 95%, at least 98% or at least 100%, by mass of oxygen relative to the total mass of oxygen and nitrogen.

The dielectric coating between the substrate and the first functional metal layer and/or one or each dielectric coating above the first silver-based functional layer comprises a zinc oxide-based layer comprising at least 80% by weight of zinc relative to the weight of all elements other than oxygen.

Preferably, each dielectric coating comprises a zinc oxide-based layer comprising at least 80% by weight of zinc relative to the weight of all elements other than oxygen.

Preferably, the dielectric coating directly below the silver-based functional metal layer comprises at least one zinc oxide-based dielectric layer, optionally doped with at least one other element, such as aluminum. The metal functional layer deposited above a zinc oxide-based layer is either directly in contact or separated by a blocking layer.

In all stacks, the dielectric coating closest to the substrate is called the bottom coating and the dielectric coating farthest from the substrate is called the top coating. Stacks with more than one layer of silver also include intermediate dielectric coatings located between the bottom and top coatings.

Preferably, the lower or intermediate coatings comprise a zinc oxide-based dielectric layer located below and directly in contact with a silver-based metallic layer or separated from this layer by a blocking sub-layer.

Preferably, the dielectric coating directly above the silver-based functional metal layer comprises at least one zinc oxide-based dielectric layer, optionally doped with at least one other element, such as aluminum. The metal functional layer deposited below a zinc oxide-based layer is either directly in contact or separated by a blocking layer.

Preferably, the intermediate or upper coatings comprise a zinc oxide-based dielectric layer located above and directly in contact with the silver-based metallic layer or separated from this layer by a blocking overlayer.

The zinc oxide layers have a thickness of:
- at least 1.0 nm, at least 2.0 nm, at least 3.0 nm, at least 4.0 nm or at least 5.0 nm, and/or
- not more than 25 nm, not more than 10 nm or not more than 8.0 nm.

Preferably, the material comprises one or more layers based on tin oxide, preferably zinc oxide and tin oxide.

The zinc and tin oxide-based layers comprise at least 20% by mass of tin relative to the total mass of zinc and tin. The zinc and tin oxide-based layer comprises, relative to the total mass of zinc and tin, at least 20%, at least 30%, at least 40%, at least 50%, at least 60% or at least 80% by mass of tin. Preferably, the zinc and tin oxide-based layer comprises 40 to 80% by mass of tin relative to the total mass of zinc and tin.

The tin oxide layer has a thickness of:
- greater than 5 nm, greater than 10 nm, greater than 15 nm, greater than 20 nm or greater than 25 nm,
- less than 50 nm, less than 40 nm or less than 35 nm.

The dielectric coating between the substrate and the first functional metal layer and/or one or each dielectric coating above the first silver-based functional layer comprises a layer based on tin oxide, preferably zinc oxide and tin comprising at least 20% by weight of tin relative to the total weight of zinc and tin. Each dielectric coating may comprise a layer of tin oxide, preferably based on zinc oxide and tin comprising at least 20% by weight of tin relative to the total weight of zinc and tin.

Among the dielectric layers, a distinction is made, depending on their refractive index at 550 nm, between layers with a low refractive index, layers with an intermediate refractive index and layers with a high refractive index. Layers with a low refractive index have a refractive index of less than 1.70. Layers with an intermediate refractive index have a refractive index between 1.70 and 2.2. Layers with a high refractive index have a refractive index greater than 2.2.

The coating may include a layer with a refractive index greater than 2.20. The presence of high-index layers contributes to obtaining high light transmission.

High refractive index layers can be chosen from:
- layers based on titanium oxide (n550=2.4),
- layers based on mixed titanium oxide and another component chosen from the group consisting of Zn, Zr and Sn,
- layers based on a layer of zirconium nitride (n 550 = 2.55),
- layers based on silicon and zirconium nitride (n550 nm = 2.20 - 2.40),
- layers based on a layer of zirconium oxide,
- layers based on a layer of niobium oxide (n550 = 2.30),
- layers based on a layer of bismuth oxide (n 550 = 2.60).
Preferably, the high refractive index layer is selected from titanium oxide-based layers and silicon and zirconium nitride-based layers.

The functional coating may comprise at least one blocking layer whose function is to protect the silver layers by preventing possible degradation linked to the deposition of a dielectric coating or linked to a heat treatment. These blocking layers are preferably located in contact with the silver-based functional metal layers.

According to advantageous embodiments, the stack may comprise at least one blocking layer, located below and directly in contact with a silver-based functional metal layer (blocking sub-layer) and/or at least one blocking layer located above and directly in contact with a silver-based functional metal layer (blocking over-layer).

A blocking layer above a silver-based functional metal layer is called a blocking overlayer. A blocking layer below a silver-based functional metal layer is called a blocking underlayer.

The blocking layers are selected from metal layers based on a metal or a metal alloy, metal nitride layers, metal oxide layers and metal oxynitride layers of one or more elements selected from titanium, nickel, chromium, tantalum and niobium such as Ti, TiN, TiOx, Nb, NbN, NbOx, Ni, NiN, NiOx, Cr, CrN, CrOx, NiCr, NiCrN, NiCrOx.

When these blocking layers are deposited in metallic, nitrided or oxynitrided form, these layers can undergo partial or total oxidation depending on their thickness and the nature of the layers surrounding them, for example, at the time of deposition of the next layer or by oxidation in contact with the underlying layer.

The blocking layers can be selected from metallic layers, in particular from a nickel-chromium alloy (NiCr) or titanium. The choice of this type of blocking layer is particularly suitable when the material or functional coating is intended to undergo heat treatment at high temperature.

Advantageously, the blocking layers are nickel-based metal layers. The nickel-based metal blocking layers may comprise, (before heat treatment), at least 20%, at least 30%, at least 40%, at least 50%, at least 60%, at least 70%, at least 80%, at least 90%, at least 95%, at least 96%, at least 97%, at least 98%, at least 99% or 100% by mass of nickel relative to the mass of the nickel-based metal layer.

Nickel-based metal layers can be chosen from:
- nickel metal layers,
- doped nickel metal layers,
- metallic layers based on nickel alloy.

Nickel alloy based metal layers can be based on nickel and chromium alloy.

Blocking layers can also be selected from titanium metal layers or titanium oxide layers. The choice of this type of blocking layer is particularly suitable when the material or functional coating is used as is, i.e. without heat treatment.

Each blocking layer has a thickness between 0.1 and 5.0 nm. The thickness of these blocking layers can be:
- at least 0.1 nm, at least 0.2 nm or at least 0.4 nm and/or
- not more than 5.0 nm, not more than 2.0 nm, not more than 1.0 nm or not more than 0.5 nm.

The functional coating may optionally comprise a protective layer. The protective layer is preferably the last layer of the stack, i.e. the layer furthest from the coated substrate of the stack (before heat treatment). These layers generally have a thickness of between 0.5 and 10 nm, between 1 and 5 nm, between 1 and 3 nm or between 1 and 2.5 nm. This protective layer may be chosen from a layer of titanium, zirconium, hafnium, silicon, zinc and/or tin, this or these metals being in metallic, oxidized or nitrided form.

According to one embodiment, the protective layer is based on zirconium oxide and/or titanium oxide, preferably based on zirconium oxide, titanium oxide or titanium and zirconium oxide. When determining the thickness of a dielectric coating, the thickness of the protective layer is taken into account.

The transparent substrates according to the invention are preferably made of a rigid mineral material, such as glass, or organic materials based on polymers (or polymer).

The transparent organic substrates according to the invention may also be made of polymer, rigid or flexible. Examples of polymers suitable according to the invention include, in particular:
- polyethylene,
- polyesters such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polyethylene naphthalate (PEN);
- polyacrylates such as polymethyl methacrylate (PMMA);
- polycarbonates;
- polyurethanes;
- polyamides;
- polyimides;
- fluorinated polymers such as fluoroesters such as ethylene tetrafluoroethylene (ETFE), polyvinylidene fluoride (PVDF), polychlorotrifluoroethylene (PCTFE), ethylene chlorotrifluoroethylene (ECTFE), fluorinated ethylene-propylene copolymers (FEP);
- photocrosslinkable and/or photopolymerizable resins, such as thiolene, polyurethane, urethane-acrylate, polyester-acrylate and
- polythiourethanes.

The substrate is preferably a sheet of glass or glass-ceramic. The substrate is preferably transparent, colorless (in which case it is a clear or extra-clear glass) or colored, for example blue, gray or bronze. The glass is preferably of the soda-lime-silica type, but it can also be of borosilicate or alumino-borosilicate glass. According to a preferred embodiment, the substrate is made of glass, in particular soda-lime-silica or of polymeric organic material.

The substrate advantageously has at least one dimension greater than or equal to 1 m, or even 2 m and even 3 m. The thickness of the substrate generally varies between 0.5 mm and 19 mm, preferably between 0.7 and 9 mm, in particular between 2 and 8 mm, or even between 4 and 6 mm. The substrate may be flat or curved, or even flexible.

The present invention relates to the non-heat-treated material. The coating may not have undergone heat treatment at a temperature above 500°C, preferably 300°C.

The present invention also relates to the heat-treated material. The heat treatments are chosen from:
- annealing, for example rapid annealing,
- quenching and/or bending.

The material, i.e. the transparent substrate coated with the stack, may have undergone a heat treatment at elevated temperature. The stack and the substrate may have been subjected to a heat treatment at elevated temperature such as quenching, annealing or doming.

It is also possible to heat treat only the stack. In this case, only the stack may have undergone heat treatment.

In both cases, the stack may have undergone heat treatment at a temperature greater than 300°C, preferably 500°C. The heat treatment temperature (at the stack) is greater than 300°C, preferably greater than 400°C, and better still greater than 500°C.

According to the invention, it is possible to carry out a rapid thermal annealing ("Rapid Thermal Process") such as a laser or flash lamp annealing. Rapid thermal annealing is for example described in applications WO2008/096089 and WO2015/185848. In these cases, only the stack is subjected to a heat treatment. During this type of treatment, each point of the stack is brought to a temperature of at least 300 ^° C while maintaining a temperature less than or equal to 150 ^° C at any point on the face of the substrate opposite that on which the stack is located. This method has the advantage of heating only the stack, without significantly heating the entire substrate.

In the case of laser treatment, the coated materials can be treated using a laser line formed from laser sources such as InGaAs laser diodes or Yb:YAG disk lasers. These continuous sources emit at a wavelength between 900 and 1100 nm. The laser line has a length of the order of 3.3 m, equal to the width 1 of the substrate, and an average full width at half maximum FWHM between 45 and 100 µm.

The materials are arranged on a roller conveyor so as to run along a direction X, parallel to its length. The laser line is fixed and positioned above the coated surface of the substrate with its longitudinal direction Y extending perpendicular to the direction X of the substrate, i.e. along the width of the substrate, extending over this entire width.

The position of the focal plane of the laser line is adjusted to be within the thickness of the functional coating when the substrate is positioned on the conveyor. The power flux density of the laser line at the focal plane is less than 100kW/cm2. The substrate was passed under the laser line at a speed of about 8 m/min.

The coating may therefore have been subjected to rapid thermal annealing in which each point of the stack is brought to a temperature of at least 300 ^° C while maintaining a temperature less than or equal to 150 ^° C at any point on the face of the substrate opposite that on which the stack is located.

It is also possible to combine heat treatments. For example, it is possible to carry out rapid thermal annealing followed by quenching.

The coating and substrate may have been subjected to a heat treatment at an elevated temperature above 500 °C such as quenching, annealing or bending. The coated substrate of the stack may be a curved or tempered glass.

The invention also relates to a glazing comprising at least one material according to the invention. The invention relates to a glazing which may be in the form of monolithic, laminated and/or multiple glazing, in particular double glazing or triple glazing.

Double glazing has 4 faces, face 1 is on the outside of the building and therefore constitutes the outer wall of the glazing, face 4 is on the inside of the building and therefore constitutes the inner wall of the glazing, faces 2 and 3 being on the inside of the double glazing. The stack according to the invention is on face 2 or face 3.

Triple glazing has 6 faces, face 1 is on the outside of the building and therefore constitutes the outer wall of the glazing, face 6 is on the inside of the building and therefore constitutes the inner wall of the glazing, faces 2 and 3 and 4 and 5 being on the inside of the double glazing. The stack according to the invention can be on face 2, face 3 and/or face 5.

Laminated glazing comprises at least one structure of the first substrate / sheet(s) / second substrate type. The polymeric sheet may in particular be based on polyvinyl butyral PVB, ethylene vinyl acetate EVA, polyethylene terephthalate PET, polyvinyl chloride PVC. The stack of thin layers is positioned on at least one of the faces of one of the substrates.

The invention therefore concerns:
- multiple glazing of the double glazing type with stacking on face 2,
- multiple glazing of the double glazing type with stacking on face 3,
- multiple glazing of the triple glazing type with stacking on face 2 and face 5,
- laminated glazing with stacking on face 2 or 3.
These windows can be mounted on a building or a vehicle.

The following examples illustrate the invention.

Examples

has. Preparation of substrates: materials and deposition conditions
Thin film stacks defined below are deposited on clear soda-lime glass substrates with a thickness of 6 mm. In the examples of the invention:
- the functional layers are silver (Ag) layers,
- the dielectric layers are based on silicon nitride doped with aluminum (Si₃N₄: Al), based on silicon and zirconium nitride doped with aluminum (SiZrN: Al), based on zinc and tin oxide, based on zinc oxide (ZnO).
The layers of titanium oxide TiOx hereinafter called TiOx (1) located above and in contact with the functional layers are deposited from a ceramic target, in particular under stoichiometric, in a controlled atmosphere comprising oxygen. A first thin layer thickness based on titanium oxide is deposited in contact with the silver layer, from a ceramic target, in a non-oxidizing or very weakly oxidizing atmosphere. Then, a thicker layer thickness based on titanium oxide is deposited from a ceramic target in an oxidizing atmosphere. The layer based on titanium oxide is made up of these two parts. During deposition, the part of the layer based on titanium oxide in contact with the functional layer is less oxidized than the part furthest from the functional layer.
The layers of titanium oxide TiOx, hereinafter called TiOx (2), are deposited from a ceramic target, in particular under stoichiometric conditions without varying the proportions of oxygen during their deposition.

The deposition conditions of the layers, which were deposited by sputtering (so-called “magnetron cathode sputtering”), are summarized in Table 1.

Materials Composition target Pressure Power sccm gas Ar O ₂ N ₂ ZnO (1) ZnO:Al2O3 2%wt ceramic 2 µbar 500 W 40 2 - ZnO (2) Zn: Al metallic 2 ubar 750 15 16 - TiOx (1) TiOx ceramic 2 µbar
500 W 20 - - TiOx (2) TiOx ceramic 2 µbar 2000 W 20 2 - SnZnO Sn:Zn 60/40%wt metallic 2 µbar 1500 W 15 32 Ag Ag metallic 8 µbar 210 W 80 - - NiCr Ni:Cr 80:20 %wt metallic 2 ubar 125 W 18 - - Si3N4 If:Al 8%wt metallic 2 µbar 2000 W 18 - 24 SiZrN Si:Zr 27% at metallic 2 µbar 1000 W 12 - 18

%wt: % by weight; at%: atomic.

In the examples, different materials according to the invention and comparative materials were tested. In all the tables setting out the optical characteristics and performances, the characteristics were measured on a double glazing having a 6/16/4 structure: 6 mm glass / 16 mm interlayer space filled with 90% argon and 10% air / 4 mm glass, the stack being positioned on face 2 (face 1 of the glazing being the outermost face of the glazing, as usual).

Light transmission levels ranging from 40% to 60% were tested. For this, a color box was defined in interior reflection and exterior reflection for all glazing.

The color box varies only by the level of a* in transmission for the different light transmission levels. The color level (a*) in transmission, and more particularly the search for neutrality in transmission (a*T close to 0), regulates the selectivity of multi-Ag coatings. For the TL cases of 40 and 50%, a*T is greater than -9. For the 60% cases, a*T is greater than -7.

Tab.2 a*, min a*, max b*, min b*, max TL variable 0 -3.0 2.5 RL1 <18 -3.0 -1.0 -10.0 0 RL2 <16 -6.0 0 -5.0 1

The table below lists the materials and physical thicknesses in nanometers (unless otherwise indicated) of each layer or coating that constitutes the stacks according to their positions relative to the substrate carrying the stack.
The stacks according to the invention are all stacks comprising two silver-based metal layers intercalated between dielectric coatings.

Example 1

In this example, the stack comprises an absorbing layer of NiCr between two dielectric layers of If₃N₄ in the first dielectric coating.
Light transmissions of 40, 50 and 60% are sought: 40% in example 1a, 50% in examples 1b, 1c and 1d and 60% in example 1e.
Each example is compared with a stack reaching the same TL and, where appropriate, the same aT* index, but not including an absorbing layer.

Table 3 below lists the different functional coatings tested.

Table 3 Layers REF
1a INV
1a REF 1b INV
1b REF 1c INV
1c REF 1d INV 1d REF 1e INV
1st Rev, Dielectric, TiOx 1 1 1 1 1 1 1 1 1 1 If ₃ N ₄ 32 28 33 28 33 28 31 35 32 31 ZnO 5 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 1.2 0.7 0.7 0.7 0.2 0.7 0.2 0.7 1.0 0.7 Functional layer Ag 12.7 18.7 13.8 17.5 13.3 17.0 11.1 13.1 14.1 16.4 Barrier layer NiCr 0.8 0.2 0.5 0.3 0.5 0.2 0.5 0.2 1.0 0.2 Rev, Dielectric, ZnO 5 5 5 5 5 5 5 5 5 5 SnZnO 10 10 10 10 10 10 10 10 10 10 If ₃ N ₄ 64 64 68 61 69 64 61 60 66 62 ZnO 5 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 3.0 0.7 1.6 0.7 2.5 0.5 3.0 0.6 1.0 0.7 Functional layer Ag 8.0 17.4 10.7 14.4 10.9 13.5 8.1 10.7 11.7 12.0 Barrier layer NiCr 3.0 0.3 2.4 0.2 2.3 0.3 2.2 1.6 2.0 0.2 Rev, dielectric, ZnO 5 5 5 5 5 5 5 5 5 5 If ₃ N ₄ - 49 - 49 - 47 - 40 - 39 NiCr - 4.7 - 3.6 - 3.1 - 2.1 - 2.1 If ₃ N ₄ 12 5 20 5 40 5 50 12 24 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6 6

There relates the selectivity S with the transmission neutrality represented by the index a*T.
The black curve shows the values for the reference stacks REF 1b, REF 1c and REF 1d and the gray curve for the stacks according to the invention INV 1b, INV 1c and INV1d.
One might think that the selectivity of example 1d is not very high (1.709) but it is associated with a very high neutrality (a*T=-2). For this neutrality the corresponding reference stack only reaches a selectivity of 1.623.

With identical neutrality, the invention always makes it possible to increase the values of S.

Example 2

As in the previous example, the stack comprises an absorbing layer between two dielectric layers of If₃N₄in the first dielectric coating. In this example, the absorbing layer used is either NiCr or TiN.
The target TLs are 50% in Examples 2a and 2b and 40% in Examples 2c, 2d, 2e, 2f, 2g and 2h.
Each example is compared with a stack reaching the same TL but not including an absorbing layer.
Several levels of transmission neutrality are considered:
a*T > -9 ; a*T > -4 ; and a*T > -2

Table 4 below lists the different functional coatings tested.

Table 4 Layers REF 2a INV 2a REF_2b INV 2b REF 2c INV 2c INV 2d INV 2nd INV 2f INV 2g INV 2h Rev, TiOx 1 1 1 1 1 1 1 1 1 1 1 dielectric If ₃ N ₄ 33 28 33 27 32 28 32 28 32 27 20 ZnO 5 5 5 5 5 5 5 5 5 5 5 C. barrier NiCr 0.7 0.7 0.2 0.7 1.2 0.7 0.8 0.3 0.3 0.2 1.3 C. funct. Ag 13.8 17.5 13.3 14.8 12.7 18.7 14.5 17.7 12.7 17.2 9.0 C. barrier NiCr 0.5 0.3 0.5 - 0.8 0.2 0.2 0.2 0.8 0.2 2.9 Rev, ZnO 5 5 5 5 5 5 5 5 5 5 5 Dielectric, SnZnO 10 10 10 10 10 10 10 10 10 10 10 If ₃ N ₄ 68 61 69 62 64 64 59 63 57 64 71 ZnO 5 5 5 5 5 5 5 5 5 5 5 C.barrier NiCr 1.6 0.7 2.5 0.7 3.0 0.7 0.2 0.7 0.2 0.7 0.7 C. funct. Ag 10.7 14.4 10.9 11.6 8.0 17.4 11.4 16.9 9.2 16.3 8.0 C. barrier NiCr 2.4 0.2 2.3 0.5 3.0 0.3 0.3 0.3 0.2 1.0 2.1 Rev, ZnO 5 5 5 5 5 5 5 5 5 5 5 Dielectric, If ₃ N ₄ - 49 0 33 - 49 31 48 50 48 41 NiCr - - - - - 4.7 - 4.6 - 4.1 - TiN - 3.6 - 7.1 - - 15 - 18 - 3.9 If ₃ N ₄ 20 5 40 5 12 5 8 8 8 6 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6 6 6

Example 3

In this example, as in the previous examples,the stacking includes an absorbent layer between two dielectric layers of If₃N₄in the first dielectric coating.

In Examples 3a, 3c and 3e, an additional high index layer is inserted into the first dielectric coating. In Examples 3b, 3d and 3f, a high index layer is inserted into the first and third dielectric coatings.

Each stack according to the invention is compared to a stack reaching the same TL but not comprising an absorbent layer and comprising a high index layer in the first dielectric coating.

Table 5 below lists the different functional coatings tested.

Table 5 Layers REF 3a INV 3a INV 3b REF 3c INV 3c INV 3d REF 3rd INV 6 3rd INV
3f Rev, TiOx 1 1 1 1 1 1 1 1 1 Dielectric, If ₃ N ₄ 32 37 5 34 30 6 32 29 6 SiZr27N - - 17 - - 18 - - 19 ZnO 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 1.2 0.9 0.2 0.7 0.4 0.7 0.7 0.7 0.7 Function layer Ag 12.5 13.8 18.4 14.5 17.5 19.9 15.0 17.5 19.1 Barrier layer NiCr 1.2 1.0 0.2 0.2 0.2 0.4 0.5 0.2 0.2 Rev, ZnO 5 5 5 5 5 5 5 5 5 Dielectric, SnZnO 10 10 10 10 10 10 10 10 10 If ₃ N ₄ 66 70 67 68 64 66 68 64 68 ZnO 5 5 5 5 5 5 5 5 5 Barrier layer NiCr 3.0 0.2 0.7 1.3 0.7 0.7 0.7 0.7 0.7 Function layer, Ag 8.0 14.9 18.7 12.3 16.1 16.5 14.3 13.4 13.9 Barrier layer NiCr 3.0 0.2 0.2 2.9 0.2 0.2 2.3 0.2 0.3 Rev, ZnO 5 5 5 5 5 5 5 5 5 dielectric SiZr27N 6 32 29 13 25 29 17 29 20 If ₃ N ₄ - 16 11 - 16 9 - 29 14 NiCr - 5.6 4.8 - 3.6 3.6 - 2.2 2.1 If ₃ N ₄ 5 6 6 5 5 5 5 5 5 Substrate (mm) glass 6 6 6 6 6 6 6 6 6

b. Optical Properties and Performances

Table 6 g S TL has* b* RL1 has* b* RL2 has* b* a* R2 60° b* R2 60° Ex 1 REF_1a 23.5 1,698 40.0 -5.7 -6.4 20.3 -0.4 -7.6 12.5 -6.4 -6.1 3.0 -10.0 INV 1a 21.5 1,853 39.9 -9.0 -2.9 12.0 -2.8 0.0 19.5 -5.8 -5.0 1.4 -3.3 REF 1b 28.1 1,781 50.0 -5.2 -3.4 18.7 -0.4 -7.7 14.3 -6.2 -6.0 1.2 -10.0 INV 1b 25.6 1,919 49.1 -5.8 -2.4 7.7 -1.4 -1.5 15.9 0.0 -5.0 1.2 -2.2 REF 1c 28.4 1,761 50.0 -3.8 -3.6 18.3 -0.8 -4.1 15.9 -5.8 -6.5 1.0 -10.0 INV 1c 26.4 1,871 49.3 -4.0 -2.5 7.8 -1.0 -2.6 15.8 -4.9 -5.1 1.3 -4.2 REF 1d 30.8 1,623 50.0 -2.0 -3.9 15.5 -4.9 -0.3 16.0 -7.6 -5.2 2.8 -9.9 INV 1d 29.3 1,709 50.0 -2.0 -3.1 8.9 -2.9 -2.3 15.8 -7.8 -5.0 2.8 -6.3 REF 1e 32.8 1,798 59.0 -4.4 -2.4 15.2 -0.7 -6.5 14.4 -6.6 -5.6 3.0 -10.0 INV 1st 31.5 1,871 59.0 -4.7 -0.8 8.8 -2.9 -1.0 13.4 0.0 -5.0 3.0 -5.5 Ex 2 REF 2a 28.1 1,781 50.0 -5.2 -3.4 18.7 -0.4 -7.7 14.3 -6.2 -6.0 1.2 -10.0 INV 2a 26.2 1,894 49.7 -6.0 -0.5 7.8 -1.0 0.0 15.2 0.0 -5.0 1.1 -1.7 REF 2b 28.4 1,761 50.0 -3.8 -3.6 18.3 -0.8 -4.1 15.9 -5.8 -6.5 1.0 -10.0 INV 2b 27.1 1,834 49.6 -4.0 -0.4 8.5 -0.6 0.0 15.9 -4.1 -5.1 3.0 -4.3 REF 2c 23.5 1,698 40.0 -5.7 -6.4 20.3 -0.4 -7.6 12.5 -6.4 -6.1 3.0 -10.0 INV 2c 21.5 1,853 39.9 -9.0 -2.9 12.0 -2.8 0.0 19.5 -5.8 -5.0 1.4 -3.3 INV 2d 21.4 1,867 40.0 -9.0 -2.9 7.9 -1.0 -0.2 15.7 0.0 -5.0 1.0 -1.9 INV 2nd 21.1 1,899 40.0 -5.9 -3.1 7.8 -1.0 -0.2 22.0 -5.9 -5.1 1.0 -0.6 INV 2f 22.9 1,750 40.0 -6.2 -2.3 11.3 -1.0 -6.9 12.5 -3.8 -2.4 1.4 -7.1 INV 2g 21.4 1,861 39.8 -4.0 -3.6 8.1 -0.9 -0.1 21.9 -5.9 -5.3 1.0 -1.1 Ex 3 REF 3a 23.6 1,697 40.0 -6.0 -6.6 18.5 -0.2 -8.8 12.1 -6.4 -6.8 2.8 -10.0 INV 3a 21.4 1,868 40.0 -9.0 -3.0 9.3 -1.0 -8.2 14.7 0.0 -3.4 1.0 -7.8 INV 3b 19.0 2,070 39.4 -9.0 -0.9 8.5 -1.1 -0.8 20.4 -1.7 -5.0 1.4 -1.4 REF 3c 27.1 1,846 50.0 -6.0 -3.0 18.1 -1.2 -4.8 15.1 -5.7 -5.1 2.6 -8.6 INV 3c 24.8 1,980 49.0 -7.4 -1.9 7.8 -1.4 -2.1 15.5 0.0 -4.9 2.5 -3.4 INV 3d 23.7 2,068 49.1 -7.9 0.4 8.1 -1.4 -0.8 15.9 -0.1 -4.7 2.9 -4.5 REF 3rd 31.4 1,876 59.0 -4.5 -1.6 16.3 -2.6 -0.2 16.1 -5.2 -5.3 3.0 -7.9 INV 3rd 30.6 1,926 59.0 -4.6 -0.2 9.0 -1.0 0.4 13.1 -0.8 -5.2 3.0 -3.2 INV 3f 29.6 1,996 59.0 -5.6 2.2 9.3 -2.9 0.0 13.7 -2.5 -5.0 2.9 -7.1

Compared with a stack reaching the same TL, and depending on the case, the same color in transmission (index a*T), we can see that the Selectivity S is improved each time.

The solution of the invention makes it possible to improve selectivity while obtaining in combination:

- excellent transmission neutrality,

- low external reflection values,

- colors in neutral reflection.

Claims (14)

Material comprising a substrate coated with a functional coating comprising an alternation of only two silver-based metallic functional layers called, starting from the substrate, first and second functional layers and three dielectric coatings called, starting from the substrate, Di1, Di2 and Di3, each dielectric coating comprising at least one dielectric layer, such that each functional metallic layer is arranged between two dielectric coatings, characterized in that:
the first dielectric coating Di1 located below the first functional layer comprises an absorbent layer located between two dielectric layers, said absorbent layer being chosen from:
- layers based on a metal or a metal alloy,
- metal nitride layers, and
- metal oxynitride layers;
the metallic element(s) being chosen from nickel, chromium, niobium, vanadium, titanium, tungsten, palladium, stainless steel, molybdenum, zirconium, tantalum and zinc. Material according to the preceding claim, characterized in that the functional coating comprises one or more metallic blocking layers located in contact with, below and/or above the first and/or second metallic functional layer. Material according to any one of the preceding claims, characterized in that the first dielectric coating Di1 located below the first functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm. Material according to the preceding claim, characterized in that the high index layer is located between the absorbent layer and the first functional layer. Material according to any one of the preceding claims, characterized in that the third dielectric coating Di3 located above the second functional layer comprises a high refractive index layer having a refractive index measured at 550 nm greater than 2.20 and a thickness greater than 5 nm. Material according to any one of the preceding claims, characterized in that the absorbent layer is chosen from metallic layers based on nickel and/or chromium and layers based on titanium nitride. Material according to the preceding claim, characterized in that the second dielectric coating further comprises a layer based on tin oxide, preferably based on zinc and tin oxide comprising at least 10% by mass of tin relative to the total mass of zinc and tin. Material according to the preceding claim, characterized in that the tin oxide-based layer has a thickness:
- greater than 5 nm,
- less than 40 nm. Material according to any one of claims 3 to 8, characterized in that the layers with a high refractive index are chosen from layers based on titanium oxide and layers based on silicon and zirconium nitride. Material according to any one of claims 3 to 9, characterized in that the high refractive index layers have a thickness greater than 10 nm. Material according to any one of the preceding claims, characterized in that the dielectric coating located below the first functional layer comprises a zinc oxide-based layer located in contact with the first functional layer or separated from the first functional layer by a blocking layer. Material according to any one of the preceding claims, characterized in that the dielectric coating located below the second functional layer comprises a zinc oxide-based layer located in contact with the second functional layer or separated from the second functional layer by a blocking layer. Material according to any one of the preceding claims, characterized in that it has a light transmission of between 20 and 70%, preferably of between 35 and 65%. Glazing comprising material according to any one of claims 1 to 13 in the form of multiple glazing or laminated glazing.