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FR2887891B1 - Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau. - Google Patents

Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau.

Info

Publication number
FR2887891B1
FR2887891B1 FR0507024A FR0507024A FR2887891B1 FR 2887891 B1 FR2887891 B1 FR 2887891B1 FR 0507024 A FR0507024 A FR 0507024A FR 0507024 A FR0507024 A FR 0507024A FR 2887891 B1 FR2887891 B1 FR 2887891B1
Authority
FR
France
Prior art keywords
polysiloxane
depositing
low hysteresis
based material
hysteresis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0507024A
Other languages
English (en)
Other versions
FR2887891A1 (fr
Inventor
Marc Plissonnier
Mathias Borella
Frederic Gaillard
Pascal Faucherand
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR0507024A priority Critical patent/FR2887891B1/fr
Priority to US11/922,421 priority patent/US20090081384A1/en
Priority to EP06778687A priority patent/EP1910486A1/fr
Priority to JP2008518916A priority patent/JP5037505B2/ja
Priority to PCT/FR2006/001492 priority patent/WO2007003754A1/fr
Publication of FR2887891A1 publication Critical patent/FR2887891A1/fr
Application granted granted Critical
Publication of FR2887891B1 publication Critical patent/FR2887891B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/62—Plasma-deposition of organic layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FR0507024A 2005-07-01 2005-07-01 Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau. Expired - Fee Related FR2887891B1 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
FR0507024A FR2887891B1 (fr) 2005-07-01 2005-07-01 Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau.
US11/922,421 US20090081384A1 (en) 2005-07-01 2006-06-27 Low Wetting Hysteresis Polysiloxane-Based Material and Method for Depositing Same
EP06778687A EP1910486A1 (fr) 2005-07-01 2006-06-27 Matériau à base de polysiloxane et à faible hystérésis de mouillage et procédé de dépôt d'un tel matériau
JP2008518916A JP5037505B2 (ja) 2005-07-01 2006-06-27 低濡れヒステリシスポリシロキサン系材料およびその堆積方法
PCT/FR2006/001492 WO2007003754A1 (fr) 2005-07-01 2006-06-27 Matériau à base de polysiloxane et à faible hystérésis de mouillage et procédé de dépôt d'un tel matériau

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0507024A FR2887891B1 (fr) 2005-07-01 2005-07-01 Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau.

Publications (2)

Publication Number Publication Date
FR2887891A1 FR2887891A1 (fr) 2007-01-05
FR2887891B1 true FR2887891B1 (fr) 2007-09-21

Family

ID=36102999

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0507024A Expired - Fee Related FR2887891B1 (fr) 2005-07-01 2005-07-01 Materiau a base de polysiloxane et a faible hysteresis de mouillage et procede de depot d'un tel materiau.

Country Status (5)

Country Link
US (1) US20090081384A1 (fr)
EP (1) EP1910486A1 (fr)
JP (1) JP5037505B2 (fr)
FR (1) FR2887891B1 (fr)
WO (1) WO2007003754A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8474306B1 (en) * 2009-06-05 2013-07-02 University Of Northern Iowa Research Foundation Method and apparatus for measurement of fluid properties
FR2946658B1 (fr) * 2009-06-11 2011-08-05 Commissariat Energie Atomique Dispositif microfluidique comportant deux couches hydrophobes assemblees l'une a l'autre et procede d'assemblage
CN107105824A (zh) * 2014-10-16 2017-08-29 欧洲等离子公司 具有改善的穿戴舒适度的鞋靴制品的制造方法和根据该方法制造的鞋靴制品
AU2015339342B2 (en) 2014-10-28 2018-11-15 3M Innovative Properties Company Spray application system components comprising a repellent surface and methods
CA3003259A1 (fr) 2015-10-28 2017-05-04 3M Innovative Properties Company Elements d'un systeme d'application par pulverisation comprenant une surface repulsive, et procedes associes
WO2017074708A1 (fr) 2015-10-28 2017-05-04 3M Innovative Properties Company Articles soumis à formation de glace comprenant une surface répulsive
US10907070B2 (en) 2016-04-26 2021-02-02 3M Innovative Properties Company Articles subject to ice formation comprising a repellent surface comprising a siloxane material
CN109675776A (zh) * 2017-10-18 2019-04-26 上海稷以科技有限公司 在物体表面形成保护层的方法及表面形成有保护层的产品
CN113897597A (zh) * 2020-07-06 2022-01-07 江苏菲沃泰纳米科技股份有限公司 超疏水膜层、制备方法和产品
US20220338768A1 (en) 2021-04-09 2022-10-27 Medtronic Minimed, Inc. Hexamethyldisiloxane membranes for analyte sensors

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6041637B2 (ja) * 1980-12-08 1985-09-18 ト−レ・シリコ−ン株式会社 無機質吸水性建材の撥水処理方法
JP3589679B2 (ja) * 1992-09-21 2004-11-17 多摩化学工業株式会社 建築材料用表面処理剤
JP2851505B2 (ja) * 1993-02-26 1999-01-27 信越化学工業株式会社 シリコーン系防水処理剤およびこれによる防水処理方法
US5359109A (en) * 1993-06-16 1994-10-25 Osi Specialties, Inc. Surface-active siloxane coating compounds and their use in coatings
US6881683B2 (en) * 1998-02-05 2005-04-19 Asm Japan K.K. Insulation film on semiconductor substrate and method for forming same
TW437017B (en) * 1998-02-05 2001-05-28 Asm Japan Kk Silicone polymer insulation film on semiconductor substrate and method for formation thereof
JP3938431B2 (ja) * 1998-03-12 2007-06-27 大日本印刷株式会社 撥水性コーティング膜の製造方法
US6068884A (en) * 1998-04-28 2000-05-30 Silcon Valley Group Thermal Systems, Llc Method of making low κ dielectric inorganic/organic hybrid films
KR20060097768A (ko) * 2001-08-30 2006-09-15 동경 엘렉트론 주식회사 성막 방법 및 성막 장치
JP2003113244A (ja) * 2001-10-03 2003-04-18 Shin Etsu Chem Co Ltd パーフルオロポリエーテル変性シクロポリシロキサン及び表面処理剤並びに硬化被膜を形成した物品
US7071277B2 (en) * 2001-10-16 2006-07-04 The University Of Akron Poly(cyclosiloxane) composition and synthesis
JP2003206477A (ja) * 2002-01-10 2003-07-22 Toyo Riken Kk 超撥水剤組成物
JP4217870B2 (ja) * 2002-07-15 2009-02-04 日本電気株式会社 有機シロキサン共重合体膜、その製造方法、成長装置、ならびに該共重合体膜を用いた半導体装置
TWI282124B (en) * 2002-11-28 2007-06-01 Tosoh Corp Insulating film material containing an organic silane compound, its production method and semiconductor device
US20040253378A1 (en) * 2003-06-12 2004-12-16 Applied Materials, Inc. Stress reduction of SIOC low k film by addition of alkylenes to OMCTS based processes
CN100446193C (zh) * 2004-02-13 2008-12-24 松下电器产业株式会社 有机无机混合绝缘膜的形成方法
KR101237354B1 (ko) * 2005-01-31 2013-02-28 토소가부시키가이샤 환상 실록산 화합물, Ｓｉ함유 막 형성 재료 및 그 용도

Also Published As

Publication number Publication date
FR2887891A1 (fr) 2007-01-05
JP2008545037A (ja) 2008-12-11
JP5037505B2 (ja) 2012-09-26
US20090081384A1 (en) 2009-03-26
WO2007003754A1 (fr) 2007-01-11
EP1910486A1 (fr) 2008-04-16

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Legal Events

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Year of fee payment: 11

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Effective date: 20170331