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FR2808378B1 - Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre - Google Patents

Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre

Info

Publication number
FR2808378B1
FR2808378B1 FR0005367A FR0005367A FR2808378B1 FR 2808378 B1 FR2808378 B1 FR 2808378B1 FR 0005367 A FR0005367 A FR 0005367A FR 0005367 A FR0005367 A FR 0005367A FR 2808378 B1 FR2808378 B1 FR 2808378B1
Authority
FR
France
Prior art keywords
crosslink
patterns
layer
reticle
active
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0005367A
Other languages
English (en)
Other versions
FR2808378A1 (fr
Inventor
Jean Pierre Lazzari
Roux Vincent Le
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
X Ion SA
Original Assignee
X Ion SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by X Ion SA filed Critical X Ion SA
Priority to FR0005367A priority Critical patent/FR2808378B1/fr
Priority to EP01921469A priority patent/EP1290500A1/fr
Priority to PCT/FR2001/001005 priority patent/WO2001081999A1/fr
Priority to AU48457/01A priority patent/AU4845701A/en
Publication of FR2808378A1 publication Critical patent/FR2808378A1/fr
Application granted granted Critical
Publication of FR2808378B1 publication Critical patent/FR2808378B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31789—Reflection mask

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Filters (AREA)
FR0005367A 2000-04-27 2000-04-27 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre Expired - Fee Related FR2808378B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR0005367A FR2808378B1 (fr) 2000-04-27 2000-04-27 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre
EP01921469A EP1290500A1 (fr) 2000-04-27 2001-04-04 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre
PCT/FR2001/001005 WO2001081999A1 (fr) 2000-04-27 2001-04-04 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre
AU48457/01A AU4845701A (en) 2000-04-27 2001-04-24 Active reticle, method for making same, ion projecting lithography method using same and equipment therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0005367A FR2808378B1 (fr) 2000-04-27 2000-04-27 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre

Publications (2)

Publication Number Publication Date
FR2808378A1 FR2808378A1 (fr) 2001-11-02
FR2808378B1 true FR2808378B1 (fr) 2003-08-15

Family

ID=8849653

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0005367A Expired - Fee Related FR2808378B1 (fr) 2000-04-27 2000-04-27 Reticule actif, procede de realisation d'un tel reticule, procede de lithographie ionique utilisant un tel reticule et equipement de mise en oeuvre

Country Status (4)

Country Link
EP (1) EP1290500A1 (fr)
AU (1) AU4845701A (fr)
FR (1) FR2808378B1 (fr)
WO (1) WO2001081999A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112899740B (zh) * 2019-11-15 2022-04-19 源秩科技（上海）有限公司 基于电化学的加工装置和方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4472636A (en) * 1979-11-01 1984-09-18 Eberhard Hahn Method of and device for corpuscular projection
JP2957669B2 (ja) * 1990-09-28 1999-10-06 株式会社東芝 反射マスク及びこれを用いた荷電ビーム露光装置
US5354583A (en) * 1992-11-09 1994-10-11 Martin Marietta Energy Systems, Inc. Apparatus and method for selective area deposition of thin films on electrically biased substrates

Also Published As

Publication number Publication date
FR2808378A1 (fr) 2001-11-02
WO2001081999A1 (fr) 2001-11-01
EP1290500A1 (fr) 2003-03-12
AU4845701A (en) 2001-11-07

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Legal Events

Date Code Title Description
FC Favourable decision of inpi director general on an application for restauration.
RN Application for restoration
ST Notification of lapse