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FR2799014B1 - Procede et installation de nanolithographie par interferometrie atomique - Google Patents

Procede et installation de nanolithographie par interferometrie atomique

Info

Publication number
FR2799014B1
FR2799014B1 FR9912016A FR9912016A FR2799014B1 FR 2799014 B1 FR2799014 B1 FR 2799014B1 FR 9912016 A FR9912016 A FR 9912016A FR 9912016 A FR9912016 A FR 9912016A FR 2799014 B1 FR2799014 B1 FR 2799014B1
Authority
FR
France
Prior art keywords
nanolithography
installation
atomic interferometry
interferometry
atomic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9912016A
Other languages
English (en)
Other versions
FR2799014A1 (fr
Inventor
Jacques Baudon
Jacques Robert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Universite Sorbonne Paris Nord
Original Assignee
Universite Sorbonne Paris Nord
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universite Sorbonne Paris Nord filed Critical Universite Sorbonne Paris Nord
Priority to FR9912016A priority Critical patent/FR2799014B1/fr
Priority to US10/089,176 priority patent/US6891623B1/en
Priority to PCT/FR2000/002664 priority patent/WO2001024219A1/fr
Priority to AU76675/00A priority patent/AU7667500A/en
Publication of FR2799014A1 publication Critical patent/FR2799014A1/fr
Application granted granted Critical
Publication of FR2799014B1 publication Critical patent/FR2799014B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Polarising Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
FR9912016A 1999-09-27 1999-09-27 Procede et installation de nanolithographie par interferometrie atomique Expired - Fee Related FR2799014B1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FR9912016A FR2799014B1 (fr) 1999-09-27 1999-09-27 Procede et installation de nanolithographie par interferometrie atomique
US10/089,176 US6891623B1 (en) 1999-09-27 2000-09-27 Method and device for atomic interferometry nanolithography
PCT/FR2000/002664 WO2001024219A1 (fr) 1999-09-27 2000-09-27 Procede et installation de nanolithographie par interferometrie atomique
AU76675/00A AU7667500A (en) 1999-09-27 2000-09-27 Method and device for atomic interferometry nanolithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9912016A FR2799014B1 (fr) 1999-09-27 1999-09-27 Procede et installation de nanolithographie par interferometrie atomique

Publications (2)

Publication Number Publication Date
FR2799014A1 FR2799014A1 (fr) 2001-03-30
FR2799014B1 true FR2799014B1 (fr) 2001-12-07

Family

ID=9550264

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9912016A Expired - Fee Related FR2799014B1 (fr) 1999-09-27 1999-09-27 Procede et installation de nanolithographie par interferometrie atomique

Country Status (4)

Country Link
US (1) US6891623B1 (fr)
AU (1) AU7667500A (fr)
FR (1) FR2799014B1 (fr)
WO (1) WO2001024219A1 (fr)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU2003239533A1 (en) * 2002-05-20 2003-12-12 The University Of Houston System Energetic neutral particle lithographic apparatus and process
US20070240757A1 (en) * 2004-10-15 2007-10-18 The Trustees Of Boston College Solar cells using arrays of optical rectennas
US7589880B2 (en) * 2005-08-24 2009-09-15 The Trustees Of Boston College Apparatus and methods for manipulating light using nanoscale cometal structures
WO2007086903A2 (fr) * 2005-08-24 2007-08-02 The Trustees Of Boston College Appareils et procedes de conversion de l’energie solaire utilisant des structures nanocoaxiales
US7943847B2 (en) * 2005-08-24 2011-05-17 The Trustees Of Boston College Apparatus and methods for solar energy conversion using nanoscale cometal structures
WO2007025023A2 (fr) * 2005-08-24 2007-03-01 The Trustees Of Boston College Appareil et procedes pour commutation optique au moyen de dispositifs optiques d'echelle nanometrique
WO2007025004A2 (fr) * 2005-08-24 2007-03-01 The Trustees Of Boston College Dispositif et procedes de nanolithographie utilisant un systeme optique nanometrique
EP1953763A4 (fr) * 2005-11-02 2008-12-17 Ilyanok Alexander Mikhailovich Microscope a balayage a nano-jets et procede de fonctionnement
EP1953117B1 (fr) * 2005-11-02 2010-06-30 Ilyanok, Alexander Mikhailovich Appareil de nano-lithographie a balayage a jets et procede de fonctionnement
JP4825697B2 (ja) * 2007-01-25 2011-11-30 株式会社ミツトヨ デジタル式変位測定器
CN101627479B (zh) * 2007-01-30 2011-06-15 索拉斯特公司 光电池及其制造方法
WO2008143721A2 (fr) * 2007-02-12 2008-11-27 Solasta, Inc. Cellule photovoltaïque avec un refroidissement de support chaud réduit
WO2009005805A2 (fr) * 2007-07-03 2009-01-08 Solasta, Inc. Dispositif photovoltaïque coaxial distribué
KR101686435B1 (ko) * 2010-07-12 2016-12-14 삼성전자주식회사 휴대용 단말기에서 전자파 간섭 발생을 방지하기 위한 장치 및 방법
JPWO2015015628A1 (ja) * 2013-08-02 2017-03-02 株式会社日立製作所 磁場計測装置
WO2017009817A1 (fr) * 2015-08-11 2017-01-19 Majlesi Hosein Analyseur de spin intrinsèque d'électrons
US9952154B2 (en) * 2016-06-22 2018-04-24 The Charles Stark Draper Laboratory, Inc. Separated parallel beam generation for atom interferometry
US10157692B2 (en) 2016-06-22 2018-12-18 The Charles Stark Draper Laboratory, Inc. Cold atom interferometry
JP6650647B2 (ja) * 2018-07-31 2020-02-19 日本航空電子工業株式会社 冷却原子線生成方法、冷却原子線生成装置、原子干渉計
CN110143199B (zh) * 2019-05-17 2020-09-25 南京理工大学 商用车车重自适应坡道起步控制方法

Also Published As

Publication number Publication date
US6891623B1 (en) 2005-05-10
WO2001024219A1 (fr) 2001-04-05
FR2799014A1 (fr) 2001-03-30
AU7667500A (en) 2001-04-30

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20150529