FR2589630B1 - Absorbant saturable a tres faibles temps de commutation - Google Patents
Absorbant saturable a tres faibles temps de commutationInfo
- Publication number
- FR2589630B1 FR2589630B1 FR8511234A FR8511234A FR2589630B1 FR 2589630 B1 FR2589630 B1 FR 2589630B1 FR 8511234 A FR8511234 A FR 8511234A FR 8511234 A FR8511234 A FR 8511234A FR 2589630 B1 FR2589630 B1 FR 2589630B1
- Authority
- FR
- France
- Prior art keywords
- switching times
- low switching
- saturable absorbent
- saturable
- absorbent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000002745 absorbent Effects 0.000 title 1
- 239000002250 absorbent Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity
- H01S3/1061—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity using a variable absorption device
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/35—Non-linear optics
- G02F1/3523—Non-linear absorption changing by light, e.g. bleaching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F3/00—Optical logic elements; Optical bistable devices
- G02F3/02—Optical bistable devices
- G02F3/026—Optical bistable devices based on laser effects
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/81—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation
- H10D62/815—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW]
- H10D62/8161—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices
- H10D62/8162—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation
- H10D62/8164—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials of structures exhibiting quantum-confinement effects, e.g. single quantum wells; of structures having periodic or quasi-periodic potential variation of structures having periodic or quasi-periodic potential variation, e.g. superlattices or multiple quantum wells [MQW] potential variation due to variations in composition or crystallinity, e.g. heterojunction superlattices having quantum effects only in the vertical direction, i.e. layered structures having quantum effects solely resulting from vertical potential variation comprising only semiconductor materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/11—Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
- H01S3/1106—Mode locking
- H01S3/1112—Passive mode locking
- H01S3/1115—Passive mode locking using intracavity saturable absorbers
- H01S3/1118—Semiconductor saturable absorbers, e.g. semiconductor saturable absorber mirrors [SESAMs]; Solid-state saturable absorbers, e.g. carbon nanotube [CNT] based
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/065—Gp III-V generic compounds-processing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/072—Heterojunctions
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/16—Superlattice
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Electromagnetism (AREA)
- Biophysics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Plasma & Fusion (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8511234A FR2589630B1 (fr) | 1985-07-23 | 1985-07-23 | Absorbant saturable a tres faibles temps de commutation |
US06/883,818 US4720309A (en) | 1985-07-23 | 1986-07-09 | Saturatable absorbant with very short switching times |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8511234A FR2589630B1 (fr) | 1985-07-23 | 1985-07-23 | Absorbant saturable a tres faibles temps de commutation |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2589630A1 FR2589630A1 (fr) | 1987-05-07 |
FR2589630B1 true FR2589630B1 (fr) | 1988-06-17 |
Family
ID=9321543
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8511234A Expired FR2589630B1 (fr) | 1985-07-23 | 1985-07-23 | Absorbant saturable a tres faibles temps de commutation |
Country Status (2)
Country | Link |
---|---|
US (1) | US4720309A (fr) |
FR (1) | FR2589630B1 (fr) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0821708B2 (ja) * | 1985-11-14 | 1996-03-04 | 株式会社豊田中央研究所 | 半導体素子 |
US5047822A (en) * | 1988-03-24 | 1991-09-10 | Martin Marietta Corporation | Electro-optic quantum well device |
US5185647A (en) * | 1988-12-12 | 1993-02-09 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Long wavelength infrared detector |
CA1299719C (fr) * | 1989-01-13 | 1992-04-28 | Hui Chun Liu | Source infrarouge a super-reseau semiconducteur |
US5132981A (en) * | 1989-05-31 | 1992-07-21 | Hitachi, Ltd. | Semiconductor optical device |
US5005176A (en) * | 1990-04-04 | 1991-04-02 | Hughes Aircraft Company | Method and apparatus for Q-switching a laser |
US5031190A (en) * | 1990-05-17 | 1991-07-09 | Cornell Research Foundation, Inc. | Optical logic using semiconductor ring lasers |
US5132983A (en) * | 1990-05-17 | 1992-07-21 | Cornell Research Foundation, Inc. | Optical logic using semiconductor ring lasers |
US5160993A (en) * | 1990-06-06 | 1992-11-03 | Fujitsu Limited | High speed optosemiconductor device having multiple quantum wells |
US5965899A (en) * | 1990-10-31 | 1999-10-12 | Lockheed Martin Corp. | Miniband transport quantum well detector |
DE69120518T2 (de) * | 1990-12-20 | 1996-10-24 | Fujitsu Ltd | Nichtlineare optische Vorrichtung mit verbesserter Erholungsrate |
US5132746A (en) * | 1991-01-04 | 1992-07-21 | International Business Machines Corporation | Biaxial-stress barrier shifts in pseudomorphic tunnel devices |
DE69211737T2 (de) * | 1991-03-27 | 1996-10-31 | Fujitsu Ltd | Nichtlineare halbleitende optische Vorrichtung mit verbessertem Signal-Rausch-Verhältnis |
US5237577A (en) * | 1991-11-06 | 1993-08-17 | At&T Bell Laboratories | Monolithically integrated fabry-perot saturable absorber |
US5345454A (en) * | 1991-11-06 | 1994-09-06 | At&T Bell Laboratories | Antiresonant Fabry-Perot p-i-n modulator |
US5265107A (en) * | 1992-02-05 | 1993-11-23 | Bell Communications Research, Inc. | Broadband absorber having multiple quantum wells of different thicknesses |
US5278855A (en) * | 1992-05-11 | 1994-01-11 | At&T Bell Laboratories | Broadband semiconductor saturable absorber |
US5374831A (en) * | 1993-04-14 | 1994-12-20 | The United States Of America As Represented By The Secretary Of The Army | Quantum well phonon modulator |
US5421910A (en) * | 1994-02-10 | 1995-06-06 | Northwestern University | Intermetallic compound semiconductor thin film |
WO1995029426A1 (fr) * | 1994-04-26 | 1995-11-02 | Telefonaktiebolaget Lm Ericsson | Absorbeur optique a super reseau |
US5410178A (en) * | 1994-08-22 | 1995-04-25 | Northwestern University | Semiconductor films |
US5668395A (en) * | 1994-11-22 | 1997-09-16 | Northwestern University | Composition for InSB and GaAs thin film on silicon substrate for use in photodetectors |
US5650635A (en) * | 1995-07-14 | 1997-07-22 | Northwestern University | Multiple stacked Sb-based heterostructures |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3993963A (en) * | 1974-06-20 | 1976-11-23 | Bell Telephone Laboratories, Incorporated | Heterostructure devices, a light guiding layer having contiguous zones of different thickness and bandgap and method of making same |
US4205329A (en) * | 1976-03-29 | 1980-05-27 | Bell Telephone Laboratories, Incorporated | Periodic monolayer semiconductor structures grown by molecular beam epitaxy |
US4163237A (en) * | 1978-04-24 | 1979-07-31 | Bell Telephone Laboratories, Incorporated | High mobility multilayered heterojunction devices employing modulated doping |
US4205331A (en) * | 1978-06-09 | 1980-05-27 | The United States Of America As Represented By The Secretary Of The Army | Infrared optical devices of layered structure |
JPS57176785A (en) * | 1981-04-22 | 1982-10-30 | Hitachi Ltd | Semiconductor laser device |
US4450463A (en) * | 1981-06-29 | 1984-05-22 | Rockwell International Corporation | Multiple-quantum-layer photodetector |
US4553317A (en) * | 1981-11-09 | 1985-11-19 | Canon Kabushiki Kaisha | Method of obtaining an impact ionization coefficient rate by junction of different kinds of semiconductors |
JPS58207684A (ja) * | 1982-05-28 | 1983-12-03 | Nippon Telegr & Teleph Corp <Ntt> | ダブルヘテロ接合型半導体発光装置 |
JPS59104189A (ja) * | 1982-12-07 | 1984-06-15 | Kokusai Denshin Denwa Co Ltd <Kdd> | 半導体レ−ザ |
JPS5929484A (ja) * | 1982-08-12 | 1984-02-16 | Fujitsu Ltd | 半導体発光装置 |
NL8301215A (nl) * | 1983-04-07 | 1984-11-01 | Philips Nv | Halfgeleiderinrichting voor het opwekken van electromagnetische straling. |
EP0133342B1 (fr) * | 1983-06-24 | 1989-11-29 | Nec Corporation | Structure de semi-conducteur avec supraréseau à haute densité de porteurs de charge |
US4546480A (en) * | 1983-08-19 | 1985-10-08 | Xerox Corporation | Injection lasers with quantum size effect transparent waveguiding |
US4637122A (en) * | 1983-09-19 | 1987-01-20 | Honeywell Inc. | Integrated quantum well lasers for wavelength division multiplexing |
JPS60145678A (ja) * | 1984-01-10 | 1985-08-01 | Toshiba Corp | 低温真空断熱配管 |
-
1985
- 1985-07-23 FR FR8511234A patent/FR2589630B1/fr not_active Expired
-
1986
- 1986-07-09 US US06/883,818 patent/US4720309A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2589630A1 (fr) | 1987-05-07 |
US4720309A (en) | 1988-01-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TP | Transmission of property | ||
TP | Transmission of property | ||
ST | Notification of lapse |