FR2526586B1 - DEEP GRID FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD - Google Patents
DEEP GRID FIELD EFFECT TRANSISTOR AND MANUFACTURING METHODInfo
- Publication number
- FR2526586B1 FR2526586B1 FR8207755A FR8207755A FR2526586B1 FR 2526586 B1 FR2526586 B1 FR 2526586B1 FR 8207755 A FR8207755 A FR 8207755A FR 8207755 A FR8207755 A FR 8207755A FR 2526586 B1 FR2526586 B1 FR 2526586B1
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- field effect
- effect transistor
- grid field
- deep grid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000002353 field-effect transistor method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8207755A FR2526586B1 (en) | 1982-05-04 | 1982-05-04 | DEEP GRID FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8207755A FR2526586B1 (en) | 1982-05-04 | 1982-05-04 | DEEP GRID FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2526586A1 FR2526586A1 (en) | 1983-11-10 |
FR2526586B1 true FR2526586B1 (en) | 1985-11-08 |
Family
ID=9273720
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR8207755A Expired FR2526586B1 (en) | 1982-05-04 | 1982-05-04 | DEEP GRID FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR2526586B1 (en) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4835585A (en) * | 1984-11-26 | 1989-05-30 | American Telephone And Telegraph Company, At&T Bell Laboratories | Trench gate structures |
US4685196A (en) * | 1985-07-29 | 1987-08-11 | Industrial Technology Research Institute | Method for making planar FET having gate, source and drain in the same plane |
JP2994670B2 (en) | 1989-12-02 | 1999-12-27 | 忠弘 大見 | Semiconductor device and manufacturing method thereof |
JP2948985B2 (en) * | 1992-06-12 | 1999-09-13 | 三菱電機株式会社 | Semiconductor device |
US6066952A (en) * | 1997-09-25 | 2000-05-23 | International Business Machnies Corporation | Method for polysilicon crystalline line width measurement post etch in undoped-poly process |
US5945707A (en) * | 1998-04-07 | 1999-08-31 | International Business Machines Corporation | DRAM cell with grooved transfer device |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4243997A (en) * | 1976-03-25 | 1981-01-06 | Tokyo Shibaura Electric Co., Ltd. | Semiconductor device |
US4324038A (en) * | 1980-11-24 | 1982-04-13 | Bell Telephone Laboratories, Incorporated | Method of fabricating MOS field effect transistors |
-
1982
- 1982-05-04 FR FR8207755A patent/FR2526586B1/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
FR2526586A1 (en) | 1983-11-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
D6 | Patent endorsed licences of rights |