FR2526584B1 - - Google Patents

Info

Publication number: FR2526584B1
Authority: FR; France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

FR8207752A

Other languages

Other versions

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Thales SA

Original Assignee

Thomson CSF SA

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1982-05-04

Filing date

1982-05-04

Publication date

1984-09-14

1982-05-04 Application filed by Thomson CSF SA filed Critical Thomson CSF SA

1982-05-04 Priority to FR8207752A priority Critical patent/FR2526584A1/fr

1983-11-10 Publication of FR2526584A1 publication Critical patent/FR2526584A1/fr

1984-09-14 Application granted granted Critical

1984-09-14 Publication of FR2526584B1 publication Critical patent/FR2526584B1/fr

Status Granted legal-status Critical Current

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/061—Manufacture or treatment of FETs having Schottky gates
- H10D30/0612—Manufacture or treatment of FETs having Schottky gates of lateral single-gate Schottky FETs
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/285—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation
- H01L21/28506—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers
- H01L21/28575—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds
- H01L21/28587—Deposition of conductive or insulating materials for electrodes conducting electric current from a gas or vapour, e.g. condensation of conductive layers on semiconductor bodies comprising AIIIBV compounds characterised by the sectional shape, e.g. T, inverted T
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/482—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of lead-in layers inseparably applied to the semiconductor body (electrodes)
- H01L23/4821—Bridge structure with air gap
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Condensed Matter Physics & Semiconductors (AREA)
General Physics & Mathematics (AREA)
Computer Hardware Design (AREA)
Microelectronics & Electronic Packaging (AREA)
Power Engineering (AREA)
Manufacturing & Machinery (AREA)
Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

FR8207752A 1982-05-04 1982-05-04 Procede de realisation d'une structure metallique de forme complexe pour semi-conducteurs et circuits integres Granted FR2526584A1 (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
FR8207752A FR2526584A1 (fr)	1982-05-04	1982-05-04	Procede de realisation d'une structure metallique de forme complexe pour semi-conducteurs et circuits integres

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR8207752A FR2526584A1 (fr)	1982-05-04	1982-05-04	Procede de realisation d'une structure metallique de forme complexe pour semi-conducteurs et circuits integres

Publications (2)

Publication Number	Publication Date
FR2526584A1 FR2526584A1 (fr)	1983-11-10
FR2526584B1 true FR2526584B1 (da)	1984-09-14

Family

ID=9273717

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FR8207752A Granted FR2526584A1 (fr)	1982-05-04	1982-05-04	Procede de realisation d'une structure metallique de forme complexe pour semi-conducteurs et circuits integres

Country Status (1)

Country	Link
FR (1)	FR2526584A1 (da)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5019877A (en) *	1989-08-31	1991-05-28	Mitsubishi Denki Kabushiki Kaisha	Field effect transistor
JPH03148838A (ja) *	1989-11-06	1991-06-25	Sumitomo Electric Ind Ltd	マイクロ波半導体装置
US5168329A (en) *	1989-11-06	1992-12-01	Sumitomo Electric Industries, Ltd.	Microwave semiconductor device capable of controlling a threshold voltage
US5070376A (en) *	1990-01-05	1991-12-03	Sumitomo Electric Industries, Ltd.	Semiconductor device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2535156C3 (de) *	1975-08-06	1978-08-31	Siemens Ag, 1000 Berlin Und 8000 Muenchen	Verfahren zur Herstellung einer Schicht mit vorgegebenem Muster von Bereichen geringerer Schichtdicke und Verwendung der Schicht als Maske bei der Dotierung
US4054484A (en) *	1975-10-23	1977-10-18	Bell Telephone Laboratories, Incorporated	Method of forming crossover connections
US4213840A (en) *	1978-11-13	1980-07-22	Avantek, Inc.	Low-resistance, fine-line semiconductor device and the method for its manufacture
US4283483A (en) *	1979-07-19	1981-08-11	Hughes Aircraft Company	Process for forming semiconductor devices using electron-sensitive resist patterns with controlled line profiles

1982
- 1982-05-04 FR FR8207752A patent/FR2526584A1/fr active Granted

Also Published As

Publication number	Publication date
FR2526584A1 (fr)	1983-11-10

Publication	Publication Date	Title
DE3374522D1 (da)	1987-12-23
FR2511252B1 (da)	1984-12-07
FR2521400B3 (da)	1985-02-15
DE3374472T (da)	1987-12-17
DE3241530C2 (da)	1986-01-09
FR2526890B3 (da)	1985-02-22
FR2519564B1 (da)	1985-05-10
GR79001B (da)	1984-10-02
CH655565B (da)	1986-04-30
CH655464B (da)	1986-04-30
DE3378479T2 (da)	1988-12-22
FR2519797B1 (da)	1984-08-31
FR2522943B3 (da)	1984-01-13
CH655572B (da)	1986-04-30
CH655407B (da)	1986-04-15
FR2519749B1 (da)	1984-04-13
DE3375436T (da)	1988-02-25
CH655563B (da)	1986-04-30
FR2520537B1 (da)	1985-05-03
FR2519812B2 (da)	1984-03-09
FR2521610B1 (da)	1985-03-01
FR2520588B3 (da)	1985-03-01
FR2526584B1 (da)	1984-09-14
FR2523617B1 (da)	1984-09-21
DE3247369C2 (da)	1984-11-08

Legal Events

Date	Code	Title	Description
1986-03-28	ST	Notification of lapse