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FR2488731B3 - - Google Patents

Info

Publication number
FR2488731B3
FR2488731B3 FR8115738A FR8115738A FR2488731B3 FR 2488731 B3 FR2488731 B3 FR 2488731B3 FR 8115738 A FR8115738 A FR 8115738A FR 8115738 A FR8115738 A FR 8115738A FR 2488731 B3 FR2488731 B3 FR 2488731B3
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8115738A
Other languages
French (fr)
Other versions
FR2488731A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Original Assignee
Heraeus Quarzschmelze GmbH
Heraeus Schott Quarzschmelze GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzschmelze GmbH, Heraeus Schott Quarzschmelze GmbH filed Critical Heraeus Quarzschmelze GmbH
Publication of FR2488731A1 publication Critical patent/FR2488731A1/fr
Application granted granted Critical
Publication of FR2488731B3 publication Critical patent/FR2488731B3/fr
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/673Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
    • H01L21/67313Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
    • H01L21/67316Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements characterized by a material, a roughness, a coating or the like
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B31/00Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor
    • C30B31/06Diffusion or doping processes for single crystals or homogeneous polycrystalline material with defined structure; Apparatus therefor by contacting with diffusion material in the gaseous state
    • C30B31/10Reaction chambers; Selection of materials therefor
    • C30B31/103Mechanisms for moving either the charge or heater
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/005Oxydation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
FR8115738A 1980-08-16 1981-08-14 Claie support pour plaquettes semi-conductrices Granted FR2488731A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19808021868 DE8021868U1 (de) 1980-08-16 1980-08-16 Traegerhorde fuer halbleiterscheiben

Publications (2)

Publication Number Publication Date
FR2488731A1 FR2488731A1 (fr) 1982-02-19
FR2488731B3 true FR2488731B3 (es) 1983-06-10

Family

ID=6718055

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8115738A Granted FR2488731A1 (fr) 1980-08-16 1981-08-14 Claie support pour plaquettes semi-conductrices

Country Status (4)

Country Link
JP (1) JPS5737826A (es)
DE (1) DE8021868U1 (es)
FR (1) FR2488731A1 (es)
GB (1) GB2082388B (es)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5844836U (ja) * 1981-09-21 1983-03-25 日本電気ホームエレクトロニクス株式会社 半導体製造治具
EP0100539A3 (en) * 1982-07-30 1985-05-22 Tecnisco Ltd. Assembled device for supporting semiconductor wafers or the like
DE3419866C2 (de) * 1984-05-28 1986-06-26 Heraeus Quarzschmelze Gmbh, 6450 Hanau Trägerhorde aus Quarzglas für scheibenförmige Substrate
DE3440111C1 (de) * 1984-11-02 1986-05-15 Heraeus Quarzschmelze Gmbh, 6450 Hanau Traegerhorde
DE3441887C1 (de) * 1984-11-16 1985-10-17 Heraeus Quarzschmelze Gmbh, 6450 Hanau Ofen fuer die Waermebehandlung von Halbleiter-Substraten
EP0267462A3 (en) * 1986-11-12 1990-01-31 Heraeus Amersil, Inc. Mass transferable semiconductor substrate processing and handling full shell carrier (boat)
DE3829159A1 (de) * 1988-08-27 1990-03-08 Westdeutsche Quarzschmelze Gmb Vorrichtung zur aufnahme von halbleiterscheibchen
DE69529333T2 (de) * 1994-08-31 2004-01-15 Heraeus Quarzglas Verfahren zur herstellung einer quarzglas-haltevorrichtung zur wärmebehandlung von silizium-wafern

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5068775A (es) * 1973-10-19 1975-06-09
JPS53133366A (en) * 1977-04-27 1978-11-21 Nec Corp Impurity diffusion method

Also Published As

Publication number Publication date
JPS5737826A (en) 1982-03-02
GB2082388A (en) 1982-03-03
JPS6141128B2 (es) 1986-09-12
GB2082388B (en) 1984-05-23
DE8021868U1 (de) 1981-01-29
FR2488731A1 (fr) 1982-02-19

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