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FR2376510A1 - Projecteur photoelectronique d'images - Google Patents

Projecteur photoelectronique d'images

Info

Publication number
FR2376510A1
FR2376510A1 FR7737041A FR7737041A FR2376510A1 FR 2376510 A1 FR2376510 A1 FR 2376510A1 FR 7737041 A FR7737041 A FR 7737041A FR 7737041 A FR7737041 A FR 7737041A FR 2376510 A1 FR2376510 A1 FR 2376510A1
Authority
FR
France
Prior art keywords
prodn
semiconductor
electric field
positive electrode
image projector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR7737041A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens Corp
Original Assignee
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Corp filed Critical Siemens Corp
Publication of FR2376510A1 publication Critical patent/FR2376510A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2037—Exposure with X-ray radiation or corpuscular radiation, through a mask with a pattern opaque to that radiation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
    • H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/047—Changing particle velocity
    • H01J2237/0473—Changing particle velocity accelerating
    • H01J2237/04735—Changing particle velocity accelerating with electrostatic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/317—Processing objects on a microscale
    • H01J2237/3175—Lithography
    • H01J2237/31777—Lithography by projection
    • H01J2237/31779—Lithography by projection from patterned photocathode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)

Abstract

L'invention concerne un projecteur photoélectronique d'images. Ce projecteur destiné à former l'image d'un masque 4 sur une préparation 5 comporte une photocathode 3 pouvant être éclairée par des lampes à ultraviolets 9, le support 2 de la préparation 5 étant relié à un potentiel fortement négatif, tandis qu'une électrode auxiliaire 6 placée entre un marque 4 de la photocathode 3 et la préparation 5 sert d'électrode positive pour le champ électrique. Application notamment à la réalisation de modèles sur des pastilles semi-conductrices pour circuits intégrés.
FR7737041A 1977-01-04 1977-12-08 Projecteur photoelectronique d'images Withdrawn FR2376510A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772700357 DE2700357A1 (de) 1977-01-04 1977-01-04 Fotoelektronischer bildprojektor

Publications (1)

Publication Number Publication Date
FR2376510A1 true FR2376510A1 (fr) 1978-07-28

Family

ID=5998186

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7737041A Withdrawn FR2376510A1 (fr) 1977-01-04 1977-12-08 Projecteur photoelectronique d'images

Country Status (4)

Country Link
JP (1) JPS5385176A (fr)
DE (1) DE2700357A1 (fr)
FR (1) FR2376510A1 (fr)
NL (1) NL7713549A (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136752A3 (en) * 1983-09-05 1986-12-30 Philips Electronic And Associated Industries Limited Electron image projector
EP0157457A3 (en) * 1984-04-02 1987-01-07 Philips Electronic And Associated Industries Limited Electron image projector
EP0161723A3 (en) * 1984-05-18 1987-01-07 Philips Electronic And Associated Industries Limited Electron lithography apparatus
EP0334334A3 (fr) * 1988-03-23 1991-01-23 Fujitsu Limited Appareil de projection d'image photocathodique pour l'obtention de motifs sur un dispositif semi-conducteur
EP0445787A1 (fr) * 1990-03-06 1991-09-11 Ebara Research Co., Ltd. Composant émettant des photo-électrons et utilisation à cet effet

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558528A (en) * 1978-10-25 1980-05-01 Nippon Telegr & Teleph Corp <Ntt> Electron beam projecting/imaging device
GB2147141A (en) * 1983-09-26 1985-05-01 Philips Electronic Associated Electron image projector

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0136752A3 (en) * 1983-09-05 1986-12-30 Philips Electronic And Associated Industries Limited Electron image projector
EP0157457A3 (en) * 1984-04-02 1987-01-07 Philips Electronic And Associated Industries Limited Electron image projector
EP0161723A3 (en) * 1984-05-18 1987-01-07 Philips Electronic And Associated Industries Limited Electron lithography apparatus
EP0334334A3 (fr) * 1988-03-23 1991-01-23 Fujitsu Limited Appareil de projection d'image photocathodique pour l'obtention de motifs sur un dispositif semi-conducteur
US5023462A (en) * 1988-03-23 1991-06-11 Fujitsu Limited Photo-cathode image projection apparatus for patterning a semiconductor device
EP0445787A1 (fr) * 1990-03-06 1991-09-11 Ebara Research Co., Ltd. Composant émettant des photo-électrons et utilisation à cet effet
US5154733A (en) * 1990-03-06 1992-10-13 Ebara Research Co., Ltd. Photoelectron emitting member and method of electrically charging fine particles with photoelectrons

Also Published As

Publication number Publication date
DE2700357A1 (de) 1978-07-13
NL7713549A (nl) 1978-07-06
JPS5385176A (en) 1978-07-27

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Legal Events

Date Code Title Description
ST Notification of lapse