[go: up one dir, main page]

FR2009054A1 - - Google Patents

Info

Publication number
FR2009054A1
FR2009054A1 FR6916604A FR6916604A FR2009054A1 FR 2009054 A1 FR2009054 A1 FR 2009054A1 FR 6916604 A FR6916604 A FR 6916604A FR 6916604 A FR6916604 A FR 6916604A FR 2009054 A1 FR2009054 A1 FR 2009054A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR6916604A
Other versions
FR2009054B1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Publication of FR2009054A1 publication Critical patent/FR2009054A1/fr
Application granted granted Critical
Publication of FR2009054B1 publication Critical patent/FR2009054B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/0223—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate
    • H01L21/02233—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer
    • H01L21/02236—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor
    • H01L21/02238—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by oxidation, e.g. oxidation of the substrate of the semiconductor substrate or a semiconductor layer group IV semiconductor silicon in uncombined form, i.e. pure silicon
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
    • H01L21/02227—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process
    • H01L21/02255—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a process other than a deposition process formation by thermal treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00—Subject matter not provided for in other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Formation Of Insulating Films (AREA)
  • Electrodes Of Semiconductors (AREA)
FR6916604A 1968-05-21 1969-05-21 Expired FR2009054B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73074368A 1968-05-21 1968-05-21

Publications (2)

Publication Number Publication Date
FR2009054A1 true FR2009054A1 (fr) 1970-01-30
FR2009054B1 FR2009054B1 (fr) 1974-08-09

Family

ID=24936644

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6916604A Expired FR2009054B1 (fr) 1968-05-21 1969-05-21

Country Status (5)

Country Link
BE (1) BE733310A (fr)
DE (1) DE1921614B2 (fr)
FR (1) FR2009054B1 (fr)
GB (1) GB1278052A (fr)
NL (1) NL153029B (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5311572A (en) * 1976-07-19 1978-02-02 Handotai Kenkyu Shinkokai Method of making semiconductor device
GB2206994A (en) * 1987-06-08 1989-01-18 Philips Electronic Associated Semiconductor device

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3085033A (en) * 1960-03-08 1963-04-09 Bell Telephone Labor Inc Fabrication of semiconductor devices
US3203840A (en) * 1961-12-14 1965-08-31 Texas Insutruments Inc Diffusion method
FR1485063A (fr) * 1965-06-30 1967-06-16 Ibm Dispositifs semi-conducteurs et leur procédé de fabrication
US3354006A (en) * 1965-03-01 1967-11-21 Texas Instruments Inc Method of forming a diode by using a mask and diffusion

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3085033A (en) * 1960-03-08 1963-04-09 Bell Telephone Labor Inc Fabrication of semiconductor devices
US3203840A (en) * 1961-12-14 1965-08-31 Texas Insutruments Inc Diffusion method
US3354006A (en) * 1965-03-01 1967-11-21 Texas Instruments Inc Method of forming a diode by using a mask and diffusion
FR1485063A (fr) * 1965-06-30 1967-06-16 Ibm Dispositifs semi-conducteurs et leur procédé de fabrication

Also Published As

Publication number Publication date
DE1921614B2 (de) 1971-05-06
NL6905772A (fr) 1969-11-25
DE1921614A1 (de) 1970-02-26
NL153029B (nl) 1977-04-15
GB1278052A (en) 1972-06-14
FR2009054B1 (fr) 1974-08-09
BE733310A (fr) 1969-11-03

Similar Documents

Publication Publication Date Title
AU5506869A (fr)
AU5184069A (fr)
AU6168869A (fr)
AU6171569A (fr)
FR2009054B1 (fr)
AU2952567A (fr)
AU4811568A (fr)
AU4744468A (fr)
BE727753A (fr)
BE726914A (fr)
BE728284A (fr)
BE728128A (fr)
BE709274A (fr)
BE709138A (fr)
BE709119A (fr)
AU3083868A (fr)
BE709095A (fr)
BE708951A (fr)
BE708888A (fr)
BE727887A (fr)
BE642636A (fr)
BE727800A (fr)
BE708933A (fr)
BE630165A (fr)
BE727116A (fr)

Legal Events

Date Code Title Description
ST Notification of lapse