FR1507529A - Couche de reproduction photosensible - Google Patents
Couche de reproduction photosensibleInfo
- Publication number
- FR1507529A FR1507529A FR90077A FR90077A FR1507529A FR 1507529 A FR1507529 A FR 1507529A FR 90077 A FR90077 A FR 90077A FR 90077 A FR90077 A FR 90077A FR 1507529 A FR1507529 A FR 1507529A
- Authority
- FR
- France
- Prior art keywords
- reproduction layer
- photosensitive reproduction
- photosensitive
- layer
- reproduction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DEK0058083 | 1966-01-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1507529A true FR1507529A (fr) | 1967-12-29 |
Family
ID=7228536
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR90077A Expired FR1507529A (fr) | 1966-01-07 | 1967-01-05 | Couche de reproduction photosensible |
Country Status (5)
Country | Link |
---|---|
US (1) | US3497353A (fr) |
AT (1) | AT276936B (fr) |
DE (1) | DE1572061C3 (fr) |
FR (1) | FR1507529A (fr) |
GB (1) | GB1164024A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0255989A1 (fr) * | 1986-08-06 | 1988-02-17 | Ciba-Geigy Ag | Photoréserve négative à base de polyphénols et de composés époxydes ou de vinyléthers |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5129947B2 (fr) * | 1972-08-05 | 1976-08-28 | ||
US4113497A (en) * | 1973-06-11 | 1978-09-12 | American Can Company | Compositions with organohalogen compound and diazonium salts as photoinitiators of epoxy compounds in photo-polymerization |
US4046567A (en) * | 1976-08-02 | 1977-09-06 | E. I. Du Pont De Nemours And Company | Christiansen cells containing epoxy gelling agents |
US4546067A (en) * | 1983-01-26 | 1985-10-08 | Ciba Geigy Corporation | Image production utilizing multifunctional light sensitive compounds |
US5300380A (en) * | 1986-08-06 | 1994-04-05 | Ciba-Geigy Corporation | Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers |
CA2693645A1 (fr) * | 2007-07-11 | 2009-01-15 | Enzon Pharmaceuticals, Inc. | Systemes d'administration de medicament polymere contenant un acide allylique aromatique |
CN115974859B (zh) * | 2022-12-13 | 2024-11-05 | 南京林业大学 | 一种呋喃基缩水甘油醚及其制备方法和应用 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3410824A (en) * | 1965-03-19 | 1968-11-12 | Ralph B. Atkinson | Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer |
-
1966
- 1966-01-07 DE DE1572061A patent/DE1572061C3/de not_active Expired
-
1967
- 1967-01-04 AT AT9267A patent/AT276936B/de not_active IP Right Cessation
- 1967-01-04 US US607173A patent/US3497353A/en not_active Expired - Lifetime
- 1967-01-05 FR FR90077A patent/FR1507529A/fr not_active Expired
- 1967-01-06 GB GB965/67A patent/GB1164024A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0255989A1 (fr) * | 1986-08-06 | 1988-02-17 | Ciba-Geigy Ag | Photoréserve négative à base de polyphénols et de composés époxydes ou de vinyléthers |
Also Published As
Publication number | Publication date |
---|---|
DE1572061B2 (de) | 1974-04-04 |
AT276936B (de) | 1969-12-10 |
GB1164024A (en) | 1969-09-10 |
DE1572061C3 (de) | 1974-11-07 |
DE1572061A1 (de) | 1970-01-02 |
US3497353A (en) | 1970-02-24 |
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