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FR1481819A - Compositions et éléments photopolymérisables et leur utilisation - Google Patents

Compositions et éléments photopolymérisables et leur utilisation

Info

Publication number
FR1481819A
FR1481819A FR63948A FR63948A FR1481819A FR 1481819 A FR1481819 A FR 1481819A FR 63948 A FR63948 A FR 63948A FR 63948 A FR63948 A FR 63948A FR 1481819 A FR1481819 A FR 1481819A
Authority
FR
France
Prior art keywords
elements
light
curing compositions
curing
compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR63948A
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of FR1481819A publication Critical patent/FR1481819A/fr
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/117Free radical
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
FR63948A 1965-06-03 1966-06-02 Compositions et éléments photopolymérisables et leur utilisation Expired FR1481819A (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US46119965A 1965-06-03 1965-06-03
US502462A US3418118A (en) 1965-06-03 1965-10-22 Photographic processes and products
US53178466A 1966-03-04 1966-03-04

Publications (1)

Publication Number Publication Date
FR1481819A true FR1481819A (fr) 1967-05-19

Family

ID=27412831

Family Applications (2)

Application Number Title Priority Date Filing Date
FR63947A Expired FR1481818A (fr) 1965-06-03 1966-06-02 Dispersions et éléments photopolymérisables et procédé de reproduction d'images colorées les utilisant
FR63948A Expired FR1481819A (fr) 1965-06-03 1966-06-02 Compositions et éléments photopolymérisables et leur utilisation

Family Applications Before (1)

Application Number Title Priority Date Filing Date
FR63947A Expired FR1481818A (fr) 1965-06-03 1966-06-02 Dispersions et éléments photopolymérisables et procédé de reproduction d'images colorées les utilisant

Country Status (6)

Country Link
US (1) US3418118A (fr)
JP (1) JPS4924288B1 (fr)
BE (2) BE681945A (fr)
DE (1) DE1572135B2 (fr)
FR (2) FR1481818A (fr)
GB (2) GB1141475A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0271195A1 (fr) * 1986-11-12 1988-06-15 Horsell Plc Dérivés substitués de la triazine

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US3650755A (en) * 1963-05-06 1972-03-21 Bell & Howell Co Positive-mode photographic process and composition
US3495987A (en) * 1965-09-03 1970-02-17 Du Pont Photopolymerizable products
DE1547865A1 (de) * 1967-01-18 1969-12-04 Kalle Ag Verfahren zur Herstellung von in Wasser unloeslichen Kopierschichten und zu deren bildmaessiger Differenzierung
GB1267812A (en) * 1968-06-21 1972-03-22 Howson Algraphy Ltd Improvements in and relating to the processing of printing plates
US4019909A (en) * 1970-02-16 1977-04-26 E. I. Du Pont De Nemours And Company Photohardenable vesicular image-forming elements
US3661589A (en) * 1970-02-18 1972-05-09 Norman T Notley Interfacial vesicular print materials and methods of preparation
JPS4918809B1 (fr) * 1970-04-08 1974-05-13
US3718473A (en) * 1971-01-27 1973-02-27 Du Pont Photopolymerizable elements containing hydro philic colloids and polymerizable monomers for making gravure printing plate resists
US3879204A (en) * 1971-02-02 1975-04-22 Du Pont Two-layer photopolymerizable gravure resist film
JPS487547U (fr) * 1971-06-14 1973-01-27
GB1408265A (en) 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
US3787213A (en) * 1972-01-19 1974-01-22 J Gervay Process for modifying surfaces using photopolymerizable elements comprising hydrophilic colloids and polymerizable monomers
US3954462A (en) * 1972-04-07 1976-05-04 Keuffel & Esser Company Electrolytically induced polymerization utilizing diazotization of primary aromatic amines
US3856528A (en) * 1972-08-10 1974-12-24 Keuffel & Esser Co Color toned photopolymerization imaging process
US4012256A (en) * 1972-09-25 1977-03-15 Keuffel & Esser Company Photo-imaging utilizing alkali-activated photopolymerizable compositions
US3966574A (en) * 1974-01-07 1976-06-29 Scm Corporation Ultraviolet polymerization coatings suitable for food packaging using FDA approved dyes as photosensitizers
JPS50125805A (fr) * 1974-03-19 1975-10-03
US4324852A (en) * 1974-04-15 1982-04-13 Eastman Kodak Company Transition metal photoreduction systems and processes
US4195998A (en) * 1974-04-15 1980-04-01 Eastman Kodak Company CO(III) Complex containing radiation sensitive element with diazo recording layer
US4201588A (en) * 1974-04-15 1980-05-06 Eastman Kodak Company Radiation sensitive co(III)complex photoreduction element with image recording layer
CA1051705A (fr) * 1974-04-15 1979-04-03 Thap Dominh Formation d'images au moyen d'un complexe a metal de transition a gain eleve
US3954468A (en) * 1974-08-27 1976-05-04 Horizons Incorporated Radiation process for producing colored photopolymer systems
US4033773A (en) * 1974-08-27 1977-07-05 Horizons Incorporated, A Division Of Horizons Research Incorporated Radiation produced colored photopolymer systems
US4171221A (en) * 1975-09-08 1979-10-16 Eastman Kodak Company High gain Co(III)complex imaging
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex
US4221859A (en) * 1976-05-04 1980-09-09 Ball Corporation Photopolymerizable composition with oxalic acid photoinitiator
US4407862A (en) 1978-03-31 1983-10-04 W. R. Grace & Co. Method of making letterpress printing plates
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
US4822714A (en) * 1981-11-12 1989-04-18 The Mead Corporation Transfer imaging system
US4842981A (en) * 1981-11-12 1989-06-27 The Mead Corporation Imaging system
US4842976A (en) * 1982-01-18 1989-06-27 Mead Corp. Color image-forming process
DE3248247A1 (de) * 1982-12-28 1984-06-28 Basf Ag, 6700 Ludwigshafen Farbstoff enthaltende schicht einer photopolymerisierbaren mischung und verfahren zur herstellung von relief- und druckformen
US4562137A (en) * 1982-12-30 1985-12-31 The Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition
CA1216455A (fr) * 1983-01-17 1987-01-13 Frederick W. Sanders Systeme imageur
US4482624A (en) * 1983-02-15 1984-11-13 The Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition and process for improving sensitivity by sequestering oxygen
US4508807A (en) * 1983-07-11 1985-04-02 Mead Corporation Photosensitive material employing encapsulated radiation sensitive composition and a transparentizable image-receiving layer
US4903991A (en) * 1983-07-18 1990-02-27 The Mead Corporation Document security system
US4535050A (en) * 1983-07-18 1985-08-13 The Mead Corporation Peeling development of photosensitive materials employing microencapsulated radiation sensitive compositions
US4532200A (en) * 1983-11-16 1985-07-30 The Mead Corporation Photosensitive imaging material employing encapsulated radiation sensitive composition having improved toe speed
JPS60264279A (ja) * 1984-06-13 1985-12-27 Fuji Photo Film Co Ltd 記録材料
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
GB8718528D0 (en) * 1987-08-05 1987-09-09 Ciba Geigy Ag Photopolymerisable composition
US5163786A (en) * 1987-08-12 1992-11-17 Christianson Systems, Inc. Cyclone separator with filter assembly for pneumatic conveyor
US5053309A (en) * 1989-03-15 1991-10-01 The Mead Corporation Color image-forming process
US5250391A (en) * 1990-05-10 1993-10-05 Hughes Aircraft Company Photopolymer composition and its use
US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5733693A (en) 1993-08-05 1998-03-31 Kimberly-Clark Worldwide, Inc. Method for improving the readability of data processing forms
US5643356A (en) * 1993-08-05 1997-07-01 Kimberly-Clark Corporation Ink for ink jet printers
US6017471A (en) 1993-08-05 2000-01-25 Kimberly-Clark Worldwide, Inc. Colorants and colorant modifiers
US6211383B1 (en) 1993-08-05 2001-04-03 Kimberly-Clark Worldwide, Inc. Nohr-McDonald elimination reaction
CA2120838A1 (fr) * 1993-08-05 1995-02-06 Ronald Sinclair Nohr Substance a couleur en aplat variable a l'ultraviolet
US6017661A (en) 1994-11-09 2000-01-25 Kimberly-Clark Corporation Temporary marking using photoerasable colorants
US5645964A (en) 1993-08-05 1997-07-08 Kimberly-Clark Corporation Digital information recording media and method of using same
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JP4707981B2 (ja) * 2004-08-06 2011-06-22 昭和電工株式会社 成形物の製造方法
JP5514781B2 (ja) 2011-08-31 2014-06-04 富士フイルム株式会社 平版印刷版原版及びこれを用いた平版印刷版の作成方法
CN105807562A (zh) * 2016-03-29 2016-07-27 莆田市荔城区聚慧科技咨询有限公司 一种对红光敏感的光致聚合物全息干版及其制备方法
CN111448518B (zh) 2017-12-08 2023-08-01 恩熙思德国有限公司 识别用于制造凸版结构的凸版前体的方法

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GB1055025A (en) * 1963-05-06 1967-01-11 Bell & Howell Co Improvements in or relating to the preparation and use of photographic compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0271195A1 (fr) * 1986-11-12 1988-06-15 Horsell Plc Dérivés substitués de la triazine

Also Published As

Publication number Publication date
BE681944A (fr) 1966-12-01
GB1141475A (en) 1969-01-29
GB1135280A (en) 1968-12-04
FR1481818A (fr) 1967-05-19
US3418118A (en) 1968-12-24
BE681945A (fr) 1966-12-01
JPS4924288B1 (fr) 1974-06-21
DE1572135A1 (de) 1970-01-02
DE1572135B2 (de) 1970-07-23

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