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FR1478042A - Method of manufacturing a semiconductor device - Google Patents

Method of manufacturing a semiconductor device

Info

Publication number
FR1478042A
FR1478042A FR59624A FR59624A FR1478042A FR 1478042 A FR1478042 A FR 1478042A FR 59624 A FR59624 A FR 59624A FR 59624 A FR59624 A FR 59624A FR 1478042 A FR1478042 A FR 1478042A
Authority
FR
France
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR59624A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Priority to FR59624A priority Critical patent/FR1478042A/en
Application granted granted Critical
Publication of FR1478042A publication Critical patent/FR1478042A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/76Making of isolation regions between components
    • H01L21/762Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
    • H01L21/76297Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
FR59624A 1965-04-30 1966-04-29 Method of manufacturing a semiconductor device Expired FR1478042A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
FR59624A FR1478042A (en) 1965-04-30 1966-04-29 Method of manufacturing a semiconductor device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45230065A 1965-04-30 1965-04-30
FR59624A FR1478042A (en) 1965-04-30 1966-04-29 Method of manufacturing a semiconductor device

Publications (1)

Publication Number Publication Date
FR1478042A true FR1478042A (en) 1967-04-21

Family

ID=26170334

Family Applications (1)

Application Number Title Priority Date Filing Date
FR59624A Expired FR1478042A (en) 1965-04-30 1966-04-29 Method of manufacturing a semiconductor device

Country Status (1)

Country Link
FR (1) FR1478042A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311309A2 (en) * 1987-10-09 1989-04-12 AT&T Corp. Method of forming semiconductor device structures including dielectrically isolated tubs
EP0391056A2 (en) * 1989-04-03 1990-10-10 Motorola Inc. Dielectrically isolated semiconductor device and method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0311309A2 (en) * 1987-10-09 1989-04-12 AT&T Corp. Method of forming semiconductor device structures including dielectrically isolated tubs
EP0311309A3 (en) * 1987-10-09 1991-02-06 AT&T Corp. Method of forming semiconductor device structures including dielectrically isolated tubs
EP0391056A2 (en) * 1989-04-03 1990-10-10 Motorola Inc. Dielectrically isolated semiconductor device and method
EP0391056A3 (en) * 1989-04-03 1991-02-06 Motorola Inc. Dielectrically isolated semiconductor device and method

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