FR1478042A - Method of manufacturing a semiconductor device - Google Patents
Method of manufacturing a semiconductor deviceInfo
- Publication number
- FR1478042A FR1478042A FR59624A FR59624A FR1478042A FR 1478042 A FR1478042 A FR 1478042A FR 59624 A FR59624 A FR 59624A FR 59624 A FR59624 A FR 59624A FR 1478042 A FR1478042 A FR 1478042A
- Authority
- FR
- France
- Prior art keywords
- manufacturing
- semiconductor device
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR59624A FR1478042A (en) | 1965-04-30 | 1966-04-29 | Method of manufacturing a semiconductor device |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US45230065A | 1965-04-30 | 1965-04-30 | |
FR59624A FR1478042A (en) | 1965-04-30 | 1966-04-29 | Method of manufacturing a semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1478042A true FR1478042A (en) | 1967-04-21 |
Family
ID=26170334
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR59624A Expired FR1478042A (en) | 1965-04-30 | 1966-04-29 | Method of manufacturing a semiconductor device |
Country Status (1)
Country | Link |
---|---|
FR (1) | FR1478042A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0311309A2 (en) * | 1987-10-09 | 1989-04-12 | AT&T Corp. | Method of forming semiconductor device structures including dielectrically isolated tubs |
EP0391056A2 (en) * | 1989-04-03 | 1990-10-10 | Motorola Inc. | Dielectrically isolated semiconductor device and method |
-
1966
- 1966-04-29 FR FR59624A patent/FR1478042A/en not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0311309A2 (en) * | 1987-10-09 | 1989-04-12 | AT&T Corp. | Method of forming semiconductor device structures including dielectrically isolated tubs |
EP0311309A3 (en) * | 1987-10-09 | 1991-02-06 | AT&T Corp. | Method of forming semiconductor device structures including dielectrically isolated tubs |
EP0391056A2 (en) * | 1989-04-03 | 1990-10-10 | Motorola Inc. | Dielectrically isolated semiconductor device and method |
EP0391056A3 (en) * | 1989-04-03 | 1991-02-06 | Motorola Inc. | Dielectrically isolated semiconductor device and method |
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