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FR1325810A - Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication - Google Patents

Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication

Info

Publication number
FR1325810A
FR1325810A FR891922A FR891922A FR1325810A FR 1325810 A FR1325810 A FR 1325810A FR 891922 A FR891922 A FR 891922A FR 891922 A FR891922 A FR 891922A FR 1325810 A FR1325810 A FR 1325810A
Authority
FR
France
Prior art keywords
manufacturing
semiconductor structures
gain semiconductor
inverted gain
low inverted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR891922A
Other languages
English (en)
Inventor
Jacques Eldin
Marc Savelli
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to FR891922A priority Critical patent/FR1325810A/fr
Priority to DE19631464565D priority patent/DE1464565B1/de
Priority to GB11506/63A priority patent/GB1033602A/en
Application granted granted Critical
Publication of FR1325810A publication Critical patent/FR1325810A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/34DC amplifiers in which all stages are DC-coupled
    • H03F3/343DC amplifiers in which all stages are DC-coupled with semiconductor devices only
    • H03F3/347DC amplifiers in which all stages are DC-coupled with semiconductor devices only in integrated circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F1/00Details of amplifiers with only discharge tubes, only semiconductor devices or only unspecified devices as amplifying elements
    • H03F1/42Modifications of amplifiers to extend the bandwidth
    • H03F1/48Modifications of amplifiers to extend the bandwidth of aperiodic amplifiers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/0112Integrating together multiple components covered by H10D8/00, H10D10/00 or H10D18/00, e.g. integrating multiple BJTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/01Manufacture or treatment
    • H10D84/02Manufacture or treatment characterised by using material-based technologies
    • H10D84/03Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
    • H10D84/038Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401Combinations of FETs or IGBTs with BJTs
    • H10D84/403Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H10D84/406Combinations of FETs or IGBTs with vertical BJTs and with one or more of diodes, resistors or capacitors

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Bipolar Transistors (AREA)
FR891922A 1962-03-22 1962-03-22 Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication Expired FR1325810A (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
FR891922A FR1325810A (fr) 1962-03-22 1962-03-22 Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication
DE19631464565D DE1464565B1 (de) 1962-03-22 1963-03-21 Breitbandverstaerker mit zwei Transistoren mit einem gemeinsamen Halbleiterkoerper
GB11506/63A GB1033602A (en) 1962-03-22 1963-03-22 Improvements in and relating to quadripole networks and their construction

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR891922A FR1325810A (fr) 1962-03-22 1962-03-22 Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication

Publications (1)

Publication Number Publication Date
FR1325810A true FR1325810A (fr) 1963-05-03

Family

ID=8775111

Family Applications (1)

Application Number Title Priority Date Filing Date
FR891922A Expired FR1325810A (fr) 1962-03-22 1962-03-22 Structures à semi-conducteurs à très faible gain inversé et procédé de fabrication

Country Status (3)

Country Link
DE (1) DE1464565B1 (fr)
FR (1) FR1325810A (fr)
GB (1) GB1033602A (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3411054A (en) * 1964-05-25 1968-11-12 Int Standard Electric Corp Semiconductor switching device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL83838C (fr) * 1952-12-01 1957-01-15
US2993998A (en) * 1955-06-09 1961-07-25 Sprague Electric Co Transistor combinations

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3411054A (en) * 1964-05-25 1968-11-12 Int Standard Electric Corp Semiconductor switching device

Also Published As

Publication number Publication date
GB1033602A (en) 1966-06-22
DE1464565B1 (de) 1971-05-27

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