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FR1103269A - Matériel photosensible pour la reproduction photomécanique - Google Patents

Matériel photosensible pour la reproduction photomécanique

Info

Publication number
FR1103269A
FR1103269A FR1103269DA FR1103269A FR 1103269 A FR1103269 A FR 1103269A FR 1103269D A FR1103269D A FR 1103269DA FR 1103269 A FR1103269 A FR 1103269A
Authority
FR
France
Prior art keywords
photosensitive material
photomechanical reproduction
photomechanical
reproduction
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Other languages
English (en)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kalle GmbH and Co KG
Original Assignee
Kalle GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG
Application granted granted Critical
Publication of FR1103269A publication Critical patent/FR1103269A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Printing Plates And Materials Therefor (AREA)
FR1103269D 1953-07-01 1954-06-29 Matériel photosensible pour la reproduction photomécanique Expired FR1103269A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEK18645A DE937569C (de) 1953-07-01 1953-07-01 Lichtempfindliches Material fuer die photomechanische Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
FR1103269A true FR1103269A (fr) 1955-11-02

Family

ID=7215443

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1103269D Expired FR1103269A (fr) 1953-07-01 1954-06-29 Matériel photosensible pour la reproduction photomécanique

Country Status (6)

Country Link
US (1) US3070443A (fr)
CH (1) CH325858A (fr)
DE (1) DE937569C (fr)
FR (1) FR1103269A (fr)
GB (1) GB745889A (fr)
NL (2) NL92883C (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4032518A (en) * 1975-01-16 1977-06-28 Eastman Kodak Company Sulfonamide compounds and polymers derived therefrom
US4299910A (en) * 1980-11-24 1981-11-10 Rca Corporation Water-based photoresists using stilbene compounds as crosslinking agents
LU84264A1 (fr) * 1982-07-08 1984-03-22 Oreal Nouveaux sulfonamides derives du 3-benzylidene camphre et leur application en tant que filtres u.v.,notamment dans des compositions cosmetiques
US4869995A (en) * 1987-05-28 1989-09-26 Nippon Paint Co., Ltd. Positive type photosensitive resinous composition
US5276184A (en) * 1990-08-03 1994-01-04 The Dow Chemical Company Sulfonamide compounds containing mesogenic moieties
TW201702218A (zh) * 2014-12-12 2017-01-16 美國杰克森實驗室 關於治療癌症、自體免疫疾病及神經退化性疾病之組合物及方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2258162A (en) * 1938-04-16 1941-10-07 American Cyanamid Co Polysulphanilamidoaromatic, polysulphanilamidoaliphatic and related compounds and a process for making them
GB577387A (en) * 1943-04-16 1946-05-16 Du Pont Improvements in or relating to dyestuff intermediates and their use in colour photography
US2395484A (en) * 1943-04-16 1946-02-26 Du Pont Bis sulphonamides of naphthol sulphonyl chlorides with aromatic diamines
DE855706C (de) * 1944-03-23 1952-11-17 Hydrierwerke A G Deutsche Verfahren zur Herstellung von Abkoemmlingen des 4, 4'-Diaminostilbens
US2635535A (en) * 1946-01-31 1953-04-21 Du Pont Mordanting
GB678599A (en) * 1949-10-10 1952-09-03 Kalle & Co Ag Improvements relating to the production of colloid photo-images for use in photomechanical printing
DE838688C (de) * 1949-10-24 1952-05-12 Kalle & Co Ag Lichtempfindliche Silberhalogenid-Kolloidschichten fuer gerbende Entwicklung
DE903415C (de) * 1951-03-10 1954-02-04 Kalle & Co Ag Verfahren zur photomechanischen Herstellung von Flachdruckformen und Bildern und Material hierfuer
NL89894C (fr) * 1952-08-16
GB733409A (en) * 1952-12-10 1955-07-13 Kalle & Co Ag Light-sensitive material for photomechanical reproduction and process of making images

Also Published As

Publication number Publication date
CH325858A (de) 1957-11-30
NL92883C (fr)
DE937569C (de) 1956-01-12
US3070443A (en) 1962-12-25
GB745889A (en) 1956-03-07
NL188856B (nl)

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