FR1069408A - Photosensitive material prepared using disazo compounds - Google Patents

Photosensitive material prepared using disazo compounds

Info

Publication number: FR1069408A
Authority: FR; France
Prior art keywords: photosensitive material; material prepared; disazo compounds; disazo; compounds
Prior art date: 1952-01-05
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

Other languages

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kalle GmbH and Co KG

Original Assignee

Kalle GmbH and Co KG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1952-01-05

Filing date

1953-01-03

Publication date

1954-07-07

1953-01-03 Application filed by Kalle GmbH and Co KG filed Critical Kalle GmbH and Co KG

1954-07-07 Application granted granted Critical

1954-07-07 Publication of FR1069408A publication Critical patent/FR1069408A/en

Status Expired legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/162—Protective or antiabrasion layer
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31844—Of natural gum, rosin, natural oil or lac

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)
Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

FR1069408D 1952-01-05 1953-01-03 Photosensitive material prepared using disazo compounds Expired FR1069408A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DEK12749A DE918848C (en)	1952-01-05	1952-01-05	Photosensitive material made using diazo compounds

Publications (1)

Publication Number	Publication Date
FR1069408A true FR1069408A (en)	1954-07-07

Family

ID=25793124

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FR1069408D Expired FR1069408A (en)	1952-01-05	1953-01-03	Photosensitive material prepared using disazo compounds

Country Status (7)

Country	Link
US (1)	US3046131A (en)
BE (1)	BE516716A (en)
CH (1)	CH311827A (en)
DE (1)	DE918848C (en)
FR (1)	FR1069408A (en)
GB (1)	GB735129A (en)
NL (1)	NL77599C (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3046114A (en) *	1955-03-01	1962-07-24	Azoplate Corp	Diazo compounds and printing plates manufactured therefrom

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL77599C (en) *	1952-01-05	1954-10-15
US3868254A (en) *	1972-11-29	1975-02-25	Gaf Corp	Positive working quinone diazide lithographic plate compositions and articles having non-ionic surfactants
JPS5421089B2 (en) *	1973-05-29	1979-07-27
US4168979A (en) *	1974-03-19	1979-09-25	Fuji Photo Film Co., Ltd.	Light-sensitive printing plate with matt overlayer
JPS50125805A (en) *	1974-03-19	1975-10-03
US4200463A (en) *	1975-12-19	1980-04-29	Motorola, Inc.	Semiconductor device manufacture using photoresist protective coating
JPS52109926A (en) *	1976-02-25	1977-09-14	Fuji Photo Film Co Ltd	Metallic image forming material
US4093463A (en) *	1977-02-22	1978-06-06	Eastman Kodak Company	Water soluble binder overcoat on vesicular element containing N2 -releasing agent
US5188924A (en) *	1984-05-14	1993-02-23	Kabushiki Kaisha Toshiba	Pattern forming method utilizing material with photoresist film underlayer and contrast enhancement overlayer containing photosensitive diazonium salt
US4672021A (en) *	1985-06-03	1987-06-09	Fairmount Chemical Company	Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
US4784936A (en) *	1985-10-24	1988-11-15	General Electric Company	Process of forming a resist structure on substrate having topographical features using positive photoresist layer and poly(vinyl pyrrolidone) overlayer
DE4040117C2 (en) *	1990-12-13	1994-02-17	Fotochem Werke Gmbh	Steel sensitive material for electron beam and X-ray lithography and process for dry development of the material
US5506090A (en) *	1994-09-23	1996-04-09	Minnesota Mining And Manufacturing Company	Process for making shoot and run printing plates

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL70798C (en) *	1948-10-15
NL78797C (en) *	1949-07-23
US2702243A (en) *	1950-06-17	1955-02-15	Azoplate Corp	Light-sensitive photographic element and process of producing printing plates
NL77599C (en) *	1952-01-05	1954-10-15

0
- NL NL77599D patent/NL77599C/xx active
- BE BE516716D patent/BE516716A/xx unknown
1952
- 1952-01-05 DE DEK12749A patent/DE918848C/en not_active Expired
1953
- 1953-01-01 GB GB9453A patent/GB735129A/en not_active Expired
- 1953-01-03 FR FR1069408D patent/FR1069408A/en not_active Expired
- 1953-01-05 CH CH311827D patent/CH311827A/en unknown
1958
- 1958-02-14 US US71518258 patent/US3046131A/en not_active Expired - Lifetime

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3046114A (en) *	1955-03-01	1962-07-24	Azoplate Corp	Diazo compounds and printing plates manufactured therefrom

Also Published As

Publication number	Publication date
NL77599C (en)	1954-10-15
BE516716A (en)	1900-01-01
GB735129A (en)	1955-08-17
CH311827A (en)	1955-12-15
DE918848C (en)	1954-10-07
US3046131A (en)	1962-07-24

Publication	Publication Date	Title
CH320331A (en)	1957-03-31	Curable mixture
FR1069408A (en)	1954-07-07	Photosensitive material prepared using disazo compounds
CH318475A (en)	1957-01-15	Project
FR1084273A (en)	1955-01-18	photoconductive electrodes
NL107894C (en)	1964-04-15	Lockstitch forming mechanism
FR1058290A (en)	1954-03-15	Clutch
FR1058379A (en)	1954-03-16	Soap
CH312994A (en)	1956-03-15	Cartridge case
FR1085807A (en)	1955-02-07	Mercaptoorgano-stannic compounds
FR1071686A (en)	1954-09-03	Advanced carburettor
FR1065962A (en)	1954-06-01	Advanced clutch
FR1052300A (en)	1954-01-22	Whaling
AT184773B (en)	1956-02-25	Pesticides
FR1067427A (en)	1954-06-15	Metronome
FR1060656A (en)	1954-04-05	Seed drill
FR1055153A (en)	1954-02-16	Radiology light centralizer
DK84922C (en)	1958-01-27	Fluorescent mixture.
FR1055148A (en)	1954-02-16	Duplicator
FR1082567A (en)	1954-12-30	Transformer
FR1053007A (en)	1954-01-29	Advanced burner
FR1088223A (en)	1955-03-04	Steroid compounds
FR1091676A (en)	1955-04-14	Steroid compounds
FR1068158A (en)	1954-06-23	Burner
ES38041Y (en)	1954-07-16	New suitcase-container
AT177985B (en)	1954-03-25	Feed sleeve

FR1069408A - Photosensitive material prepared using disazo compounds - Google Patents

Info

Links

Classifications

Landscapes

Applications Claiming Priority (1)

Publications (1)

Family

ID=25793124

Family Applications (1)

Country Status (7)

Cited By (1)

Families Citing this family (13)

Family Cites Families (4)

Cited By (1)

Also Published As

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