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ES504914A0 - Un conmutador semiconductor de alta tension - Google Patents

Un conmutador semiconductor de alta tension

Info

Publication number
ES504914A0
ES504914A0 ES504914A ES504914A ES504914A0 ES 504914 A0 ES504914 A0 ES 504914A0 ES 504914 A ES504914 A ES 504914A ES 504914 A ES504914 A ES 504914A ES 504914 A0 ES504914 A0 ES 504914A0
Authority
ES
Spain
Prior art keywords
high voltage
semiconductor switch
voltage semiconductor
switch
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES504914A
Other languages
English (en)
Other versions
ES8301391A1 (es
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia Spain SA
Original Assignee
Alcatel Espana SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel Espana SA filed Critical Alcatel Espana SA
Publication of ES504914A0 publication Critical patent/ES504914A0/es
Publication of ES8301391A1 publication Critical patent/ES8301391A1/es
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401Combinations of FETs or IGBTs with BJTs
    • H10D84/403Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H10D84/409Combinations of FETs or IGBTs with lateral BJTs and with one or more of diodes, resistors or capacitors
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03KPULSE TECHNIQUE
    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
    • H03K17/51Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/567Circuits characterised by the use of more than one type of semiconductor device, e.g. BIMOS, composite devices such as IGBT
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • H10D12/441Vertical IGBTs
    • H10D12/461Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/40Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
    • H10D84/401Combinations of FETs or IGBTs with BJTs
    • H10D84/403Combinations of FETs or IGBTs with BJTs and with one or more of diodes, resistors or capacitors
    • H10D84/406Combinations of FETs or IGBTs with vertical BJTs and with one or more of diodes, resistors or capacitors
ES504914A 1980-08-25 1981-08-24 Un conmutador semiconductor de alta tension Expired ES8301391A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US18129080A 1980-08-25 1980-08-25

Publications (2)

Publication Number Publication Date
ES504914A0 true ES504914A0 (es) 1982-12-01
ES8301391A1 ES8301391A1 (es) 1982-12-01

Family

ID=22663651

Family Applications (1)

Application Number Title Priority Date Filing Date
ES504914A Expired ES8301391A1 (es) 1980-08-25 1981-08-24 Un conmutador semiconductor de alta tension

Country Status (7)

Country Link
EP (1) EP0047392B1 (es)
JP (1) JPS5772365A (es)
AU (1) AU547356B2 (es)
BR (1) BR8105277A (es)
DE (1) DE3175641D1 (es)
ES (1) ES8301391A1 (es)
NZ (1) NZ198035A (es)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0099926B1 (en) * 1982-02-09 1987-01-21 Western Electric Company, Incorporated Field-effect controlled bi-directional lateral thyristor
EP0111803B1 (en) * 1982-12-13 1989-03-01 General Electric Company Lateral insulated-gate rectifier structures
EP0118336B1 (en) * 1983-02-03 1988-04-20 Fairchild Semiconductor Corporation High voltage mos/bipolar power transistor apparatus
NL8302092A (nl) * 1983-06-13 1985-01-02 Philips Nv Halfgeleiderinrichting bevattende een veldeffekttransistor.
DE3583897D1 (de) * 1984-06-22 1991-10-02 Hitachi Ltd Halbleiterschalter.
JP2590863B2 (ja) * 1987-03-12 1997-03-12 日本電装株式会社 導電変調型mosfet
JPS6459868A (en) * 1987-08-29 1989-03-07 Fuji Electric Co Ltd Semiconductor device having insulating gate
JPH01198076A (ja) * 1988-02-02 1989-08-09 Mitsubishi Electric Corp 半導体装置
DE3838355A1 (de) * 1988-11-11 1990-05-17 Fraunhofer Ges Forschung Vertikaltransistoranordnung
JPH0716009B2 (ja) * 1988-12-02 1995-02-22 株式会社日立製作所 横型絶縁ゲートバイポーラトランジスタ
JPH02156678A (ja) * 1988-12-09 1990-06-15 Meidensha Corp 電界効果トランジスタ及びその製造方法
US5072266A (en) 1988-12-27 1991-12-10 Siliconix Incorporated Trench DMOS power transistor with field-shaping body profile and three-dimensional geometry
EP1291924A1 (en) * 2001-09-10 2003-03-12 STMicroelectronics S.r.l. MOS semiconductor device having a body region
JP2005057028A (ja) * 2003-08-04 2005-03-03 Sanken Electric Co Ltd 絶縁ゲート型バイポーラトランジスタ

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2422258A1 (fr) * 1978-01-19 1979-11-02 Radiotechnique Compelec Dispositif semiconducteur monolithique a transistors de types mos et bipolaire

Also Published As

Publication number Publication date
EP0047392B1 (de) 1986-11-20
JPS5772365A (en) 1982-05-06
EP0047392A2 (de) 1982-03-17
AU547356B2 (en) 1985-10-17
NZ198035A (en) 1986-04-11
AU7432081A (en) 1982-03-04
BR8105277A (pt) 1982-04-27
ES8301391A1 (es) 1982-12-01
DE3175641D1 (en) 1987-01-08
EP0047392A3 (en) 1983-07-20

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