ES2023577A6 - A process for the direct or indirect electro-deposition of a highly corrosion resisting crack-tree technical hard chromium plating layer - Google Patents
A process for the direct or indirect electro-deposition of a highly corrosion resisting crack-tree technical hard chromium plating layerInfo
- Publication number
- ES2023577A6 ES2023577A6 ES9002531A ES9002531A ES2023577A6 ES 2023577 A6 ES2023577 A6 ES 2023577A6 ES 9002531 A ES9002531 A ES 9002531A ES 9002531 A ES9002531 A ES 9002531A ES 2023577 A6 ES2023577 A6 ES 2023577A6
- Authority
- ES
- Spain
- Prior art keywords
- pulse frequency
- critical pulse
- deposition
- direct
- plating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title abstract 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title abstract 2
- 229910052804 chromium Inorganic materials 0.000 title abstract 2
- 239000011651 chromium Substances 0.000 title abstract 2
- 238000005260 corrosion Methods 0.000 title abstract 2
- 230000007797 corrosion Effects 0.000 title abstract 2
- 238000007747 plating Methods 0.000 title abstract 2
- 238000004070 electrodeposition Methods 0.000 title 1
- 230000001419 dependent effect Effects 0.000 abstract 2
- 230000008021 deposition Effects 0.000 abstract 2
- 239000003792 electrolyte Substances 0.000 abstract 2
- BDHFUVZGWQCTTF-UHFFFAOYSA-N sulfonic acid Chemical compound OS(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-N 0.000 abstract 2
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 abstract 1
- 239000011696 chromium(III) sulphate Substances 0.000 abstract 1
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 abstract 1
- 229910052736 halogen Chemical class 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 229910021653 sulphate ion Inorganic materials 0.000 abstract 1
- -1 sulphate ions Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/04—Electroplating: Baths therefor from solutions of chromium
- C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
- C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
A process for the direct or indirect deposition of a highly corrosion resisting technical hard chromium plating layer on the surface of a metallic workpiece from an aqueous working electrolyte containing chromic acid and sulphate ions is described. In a process wherein the current yield of the working electrolyte is optimised by the addition of at least one saturated aliphatic sulphonic acid having at the most two carbon atoms and at the most six sulphonic acid groups and or by the addition of salts or halogen derivatives thereof and the deposit has a thickness of at least 2 mu m and a hardness exceeding 9oo HV o.1, the deposition is effected with direct current pulses, the pulse frequency lying in the range between a lower critical pulse frequency dependent on the cathode current density setting and an upper critical pulse frequency point dependent on the optimised current yield at the same current density. The procedures for determining the lower critical pulse frequency and the upper critical pulse frequency point are described. The on-off ratio in the range between the lower critical pulse frequency and the upper critical pulse frequency point is kept sufficiently low for the deposit to remain bright and substantially crack-free.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE3933896A DE3933896C1 (en) | 1989-10-11 | 1989-10-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ES2023577A6 true ES2023577A6 (en) | 1992-01-16 |
Family
ID=6391241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| ES9002531A Expired - Lifetime ES2023577A6 (en) | 1989-10-11 | 1990-10-05 | A process for the direct or indirect electro-deposition of a highly corrosion resisting crack-tree technical hard chromium plating layer |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPH03207884A (en) |
| DE (1) | DE3933896C1 (en) |
| ES (1) | ES2023577A6 (en) |
| FR (1) | FR2652825B1 (en) |
| GB (1) | GB2236763B (en) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4011201C1 (en) * | 1990-04-06 | 1991-08-22 | Lpw-Chemie Gmbh, 4040 Neuss, De | Coating workpiece with chromium for improved corrosion resistance - comprises using aq. electrolyte soln. contg. chromic acid sulphate ions, and fluoro:complexes to increase deposition |
| US5670265A (en) * | 1990-10-20 | 1997-09-23 | Ina Walzlager Schaeffler Kg | Steel component with an electroplated anti-corrosive coating and process for producing same |
| DE4125585A1 (en) * | 1990-10-20 | 1992-04-30 | Schaeffler Waelzlager Kg | STEEL COMPONENT WITH GALVANICALLY APPLIED CORROSION PROTECTIVE LAYER |
| USRE35860F1 (en) * | 1991-06-05 | 2001-01-02 | Timken Co | Corrosion-resistant zinc-nickel plated bearing races |
| JPH05161904A (en) * | 1991-12-12 | 1993-06-29 | Mishima Kosan Co Ltd | Roll for cold rolling |
| US5352266A (en) * | 1992-11-30 | 1994-10-04 | Queen'university At Kingston | Nanocrystalline metals and process of producing the same |
| IT1267394B1 (en) * | 1994-02-18 | 1997-02-05 | Ind S R L | PROCEDURE FOR THE PRODUCTION OF HARD CHROME COMPOSITE GALVANIC FINISHINGS WITH A DISPERSED PHASE AND ANTI-WEAR FINISHING MADE WITH |
| DE4430923C2 (en) * | 1994-08-31 | 1997-10-09 | Schaeffler Waelzlager Kg | Galvanic chrome bath, process for the electrodeposition of chromium and use of the bath |
| JP3918142B2 (en) * | 1998-11-06 | 2007-05-23 | 株式会社日立製作所 | Chrome-plated parts, chromium-plating method, and method of manufacturing chromium-plated parts |
| USRE40386E1 (en) | 1998-11-06 | 2008-06-17 | Hitachi Ltd. | Chrome plated parts and chrome plating method |
| DE10006151A1 (en) * | 2000-02-11 | 2001-09-06 | Heinz Busch | System used for a wheel rim of a rail vehicle comprises a substrate as carrier with a coating having a specified hardness |
| JP3423702B2 (en) | 2000-08-29 | 2003-07-07 | 創輝株式会社 | Metal plating method |
| US20070068821A1 (en) | 2005-09-27 | 2007-03-29 | Takahisa Hirasawa | Method of manufacturing chromium plated article and chromium plating apparatus |
| DE102004019370B3 (en) * | 2004-04-21 | 2005-09-01 | Federal-Mogul Burscheid Gmbh | Production of optionally coated structurized hard chrome layer, used e.g. for decoration, protection or functional coating on printing roller or stamping, embossing or deep drawing tool uses aliphatic sulfonic acid in acid plating bath |
| JP6450838B2 (en) * | 2015-05-12 | 2019-01-09 | 日立オートモティブシステムズ株式会社 | Method for manufacturing chrome-plated parts |
| KR20220043575A (en) | 2020-09-29 | 2022-04-05 | 주식회사 원탑플레이팅 | A method for producing a chromium plated part and achromium plating apparatus |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3232854A (en) * | 1959-06-05 | 1966-02-01 | Diamond Alkali Co | Chromium plating |
| US4092226A (en) * | 1974-12-11 | 1978-05-30 | Nikolaus Laing | Process for the treatment of metal surfaces by electro-deposition of metal coatings at high current densities |
| DE2604628A1 (en) * | 1976-02-06 | 1977-08-11 | Rosenloecher Claus | Direct electrodeposition of chromium onto nickel - from a chromium electrolyte using a direct current with superimposed pulses |
| JPS5914977B2 (en) * | 1978-07-27 | 1984-04-06 | 三菱電機株式会社 | temperature control device |
| DE3402554A1 (en) * | 1984-01-26 | 1985-08-08 | LPW-Chemie GmbH, 4040 Neuss | DEPOSITION OF HARD CHROME ON A METAL ALLOY FROM AN AQUEOUS ELECTROLYTE CONTAINING CHROME ACID AND SULFURIC ACID |
| US4789437A (en) * | 1986-07-11 | 1988-12-06 | University Of Hong Kong | Pulse electroplating process |
| JPS6332874A (en) * | 1986-07-24 | 1988-02-12 | Matsushita Electric Works Ltd | Temperature sensor fitting structure for storage battery |
| IT1216808B (en) * | 1987-05-13 | 1990-03-14 | Sviluppo Materiali Spa | CONTINUOUS ELECTRODEPOSITION PROCESS OF METALLIC CHROME AND CHROMIUM OXIDE ON METAL SURFACES |
| IT1215985B (en) * | 1988-03-04 | 1990-02-22 | Elca Srl | ELECTROCHEMICAL PROCEDURE FOR THE CONSTRUCTION OF CHROME AND METAL COATINGS SIMILAR BY PERIODIC REVERSAL POLARITY BUTTON CURRENT |
-
1989
- 1989-10-11 DE DE3933896A patent/DE3933896C1/de not_active Expired - Lifetime
-
1990
- 1990-10-03 GB GB9021528A patent/GB2236763B/en not_active Expired - Fee Related
- 1990-10-05 FR FR9012326A patent/FR2652825B1/en not_active Expired - Fee Related
- 1990-10-05 ES ES9002531A patent/ES2023577A6/en not_active Expired - Lifetime
- 1990-10-11 JP JP2270685A patent/JPH03207884A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| GB9021528D0 (en) | 1990-11-14 |
| DE3933896C1 (en) | 1990-10-11 |
| FR2652825B1 (en) | 1993-12-24 |
| JPH03207884A (en) | 1991-09-11 |
| GB2236763B (en) | 1993-11-17 |
| FR2652825A1 (en) | 1991-04-12 |
| GB2236763A (en) | 1991-04-17 |
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