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EP4527990A4 - METHOD FOR PRODUCING A PLATING FILM - Google Patents

METHOD FOR PRODUCING A PLATING FILM

Info

Publication number
EP4527990A4
EP4527990A4 EP23807300.1A EP23807300A EP4527990A4 EP 4527990 A4 EP4527990 A4 EP 4527990A4 EP 23807300 A EP23807300 A EP 23807300A EP 4527990 A4 EP4527990 A4 EP 4527990A4
Authority
EP
European Patent Office
Prior art keywords
producing
plating film
plating
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP23807300.1A
Other languages
German (de)
French (fr)
Other versions
EP4527990A1 (en
Inventor
Masafumi Nozaki
Yoshiaki Maeda
Toshimitsu Nagao
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Okuno Chemical Industries Co Ltd
Original Assignee
Okuno Chemical Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=83400857&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP4527990(A4) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Okuno Chemical Industries Co Ltd filed Critical Okuno Chemical Industries Co Ltd
Publication of EP4527990A1 publication Critical patent/EP4527990A1/en
Publication of EP4527990A4 publication Critical patent/EP4527990A4/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/16—Acetylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
    • C25D3/14—Electroplating: Baths therefor from solutions of nickel or cobalt from baths containing acetylenic or heterocyclic compounds
    • C25D3/18—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C25D5/14—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium two or more layers being of nickel or chromium, e.g. duplex or triplex layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/48—After-treatment of electroplated surfaces
    • C25D5/50—After-treatment of electroplated surfaces by heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611—Smooth layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
EP23807300.1A 2022-05-19 2023-03-30 METHOD FOR PRODUCING A PLATING FILM Pending EP4527990A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2022082348A JP7141780B1 (en) 2022-05-19 2022-05-19 A method for producing a plating film.
PCT/JP2023/013182 WO2023223685A1 (en) 2022-05-19 2023-03-30 Plating film manufacturing method

Publications (2)

Publication Number Publication Date
EP4527990A1 EP4527990A1 (en) 2025-03-26
EP4527990A4 true EP4527990A4 (en) 2026-02-11

Family

ID=83400857

Family Applications (1)

Application Number Title Priority Date Filing Date
EP23807300.1A Pending EP4527990A4 (en) 2022-05-19 2023-03-30 METHOD FOR PRODUCING A PLATING FILM

Country Status (6)

Country Link
US (1) US20250290216A1 (en)
EP (1) EP4527990A4 (en)
JP (1) JP7141780B1 (en)
CN (1) CN119183481A (en)
MX (1) MX2024014235A (en)
WO (1) WO2023223685A1 (en)

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1025594A (en) * 1996-07-09 1998-01-27 Inax Corp Nickel-chromium plating method
TW554398B (en) * 2001-08-10 2003-09-21 Semiconductor Energy Lab Method of peeling off and method of manufacturing semiconductor device
JP2003138396A (en) * 2001-08-24 2003-05-14 Toto Ltd Nickel chrome plating method and appliance for water system subjected to this plating
CN102317504B (en) * 2009-02-13 2014-01-15 日产自动车株式会社 Chrome-plated part and manufacturing method of the same
JP2011214057A (en) * 2010-03-31 2011-10-27 Yamagata Prefecture Heat-resistant nickel alloy plating film and forming die using the same
JP5504221B2 (en) * 2011-08-05 2014-05-28 株式会社半導体エネルギー研究所 Light emitting device and manufacturing method thereof
CN102873935A (en) * 2012-09-24 2013-01-16 无锡市方正金属捆带有限公司 Nickel-chromium-plated steel band for battery steel shell
CN103451695B (en) * 2013-09-30 2016-02-10 山东星辉航空液压机械有限公司 High corrosion resistance nano nickel adds flawless micro-hard chrome composite deposite electroplate liquid and electrolytic coating production technique
US10415148B2 (en) * 2014-03-07 2019-09-17 Macdermid Acumen, Inc. Passivation of micro-discontinuous chromium deposited from a trivalent electrolyte
DE102014207778B3 (en) * 2014-04-25 2015-05-21 Kiesow Dr. Brinkmann GmbH & Co. KG Use of a mixture for use in a plating bath or plating bath to produce a bright nickel plating, and to a method of making an article having a bright nickel plating
JP6498617B2 (en) * 2016-02-18 2019-04-10 奥野製薬工業株式会社 Brightening agent for electro nickel plating, electro nickel plating solution, electro plating method, plated product, and nickel elution prevention method
CN106906496A (en) * 2017-03-24 2017-06-30 武汉迪赛环保新材料股份有限公司 A kind of method for preparing trivalent chromium plating coating in steel surface
KR20190133705A (en) * 2017-04-04 2019-12-03 아토테크더치랜드게엠베하 Controlled method for depositing a chromium or chromium alloy layer on at least one substrate
CN106929892A (en) * 2017-04-10 2017-07-07 武汉迪赛新材料有限公司 Preparation method of high-corrosion-resistance high-hardness trivalent chromium hard chromium coating
JP6542437B1 (en) * 2018-06-19 2019-07-10 奥野製薬工業株式会社 Bright nickel plating method and control method of bright nickel plating film.
FR3087209B1 (en) * 2018-10-12 2022-11-04 Mecaprotec Ind COMPOSITION FOR CHROMING A SUBSTRATE AND CHROMING METHOD USING SUCH A COMPOSITION

Also Published As

Publication number Publication date
WO2023223685A1 (en) 2023-11-23
JP7141780B1 (en) 2022-09-26
EP4527990A1 (en) 2025-03-26
US20250290216A1 (en) 2025-09-18
CN119183481A (en) 2024-12-24
MX2024014235A (en) 2024-12-06
JP2023170524A (en) 2023-12-01

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