EP4209120A4 - SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE - Google Patents
SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE Download PDFInfo
- Publication number
- EP4209120A4 EP4209120A4 EP21864799.8A EP21864799A EP4209120A4 EP 4209120 A4 EP4209120 A4 EP 4209120A4 EP 21864799 A EP21864799 A EP 21864799A EP 4209120 A4 EP4209120 A4 EP 4209120A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- radiation source
- short wavelength
- collector module
- wavelength radiation
- section collector
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/009—Auxiliary arrangements not involved in the plasma generation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/009—Auxiliary arrangements not involved in the plasma generation
- H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| RU2020129329A RU2743572C1 (en) | 2020-09-04 | 2020-09-04 | High-brightness source of short-wave radiation (options) |
| US16/952,587 US11252810B2 (en) | 2017-11-24 | 2020-11-19 | Short-wavelength radiation source with multisectional collector module and method of collecting radiation |
| PCT/RU2021/050277 WO2022050875A1 (en) | 2020-09-04 | 2021-08-26 | Short- wavelength radiation source with multisectional collector module |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP4209120A1 EP4209120A1 (en) | 2023-07-12 |
| EP4209120A4 true EP4209120A4 (en) | 2024-08-28 |
Family
ID=80491908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP21864799.8A Pending EP4209120A4 (en) | 2020-09-04 | 2021-08-26 | SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4209120A4 (en) |
| JP (1) | JP7549313B2 (en) |
| CN (1) | CN116195369B (en) |
| WO (1) | WO2022050875A1 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4209120A4 (en) * | 2020-09-04 | 2024-08-28 | Isteq B.V. | SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE |
| US12429783B2 (en) * | 2022-04-11 | 2025-09-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV lithography apparatus and operating method for mitigating contamination |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090272917A1 (en) * | 2008-04-29 | 2009-11-05 | Asml Netherlands B.V. | Radiation source |
| RU2726316C1 (en) * | 2020-01-25 | 2020-07-13 | Общество С Ограниченной Ответственностью "Эуф Лабс" | High-brightness source of short-wave radiation based on laser plasma |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| TWI299505B (en) * | 2003-04-08 | 2008-08-01 | Cymer Inc | Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source |
| WO2005094318A2 (en) * | 2004-03-29 | 2005-10-13 | Jmar Research, Inc. | Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma |
| US7302043B2 (en) * | 2004-07-27 | 2007-11-27 | Gatan, Inc. | Rotating shutter for laser-produced plasma debris mitigation |
| DE102005015274B4 (en) * | 2005-03-31 | 2012-02-23 | Xtreme Technologies Gmbh | Radiation source for generating short-wave radiation |
| DE102005020521B4 (en) * | 2005-04-29 | 2013-05-02 | Xtreme Technologies Gmbh | Method and device for suppressing debris in the generation of short-wave radiation based on a plasma |
| US8158960B2 (en) * | 2007-07-13 | 2012-04-17 | Cymer, Inc. | Laser produced plasma EUV light source |
| US8071963B2 (en) * | 2006-12-27 | 2011-12-06 | Asml Netherlands B.V. | Debris mitigation system and lithographic apparatus |
| US7687788B2 (en) * | 2007-07-16 | 2010-03-30 | Asml Netherlands B.V. | Debris prevention system, radiation system, and lithographic apparatus |
| US8519366B2 (en) * | 2008-08-06 | 2013-08-27 | Cymer, Inc. | Debris protection system having a magnetic field for an EUV light source |
| NL1036803A (en) * | 2008-09-09 | 2010-03-15 | Asml Netherlands Bv | RADIATION SYSTEM AND LITHOGRAPHIC EQUIPMENT. |
| DE102008049494A1 (en) * | 2008-09-27 | 2010-04-08 | Xtreme Technologies Gmbh | Method and arrangement for operating plasma-based short-wave radiation sources |
| DE102010028655A1 (en) * | 2010-05-06 | 2011-11-10 | Carl Zeiss Smt Gmbh | EUV collector |
| JP6122853B2 (en) * | 2011-09-22 | 2017-04-26 | エーエスエムエル ネザーランズ ビー.ブイ. | Radiation source |
| NL2010274C2 (en) * | 2012-02-11 | 2015-02-26 | Media Lario Srl | Source-collector modules for euv lithography employing a gic mirror and a lpp source. |
| US9268031B2 (en) * | 2012-04-09 | 2016-02-23 | Kla-Tencor Corporation | Advanced debris mitigation of EUV light source |
| KR102122484B1 (en) * | 2012-11-15 | 2020-06-15 | 에이에스엠엘 네델란즈 비.브이. | Radiation source and method for lithography |
| US9826615B2 (en) * | 2015-09-22 | 2017-11-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV collector with orientation to avoid contamination |
| RU2658314C1 (en) * | 2016-06-14 | 2018-06-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | High-frequency source of euf-radiation and method of generation of radiation from laser plasma |
| US12028958B2 (en) * | 2017-11-24 | 2024-07-02 | Isteq B.V. | High-brightness laser produced plasma source and method of generation and collection radiation |
| US10887973B2 (en) * | 2018-08-14 | 2021-01-05 | Isteq B.V. | High brightness laser-produced plasma light source |
| US11252810B2 (en) * | 2017-11-24 | 2022-02-15 | Isteq B.V. | Short-wavelength radiation source with multisectional collector module and method of collecting radiation |
| RU2706713C1 (en) * | 2019-04-26 | 2019-11-20 | Общество С Ограниченной Ответственностью "Эуф Лабс" | High-brightness short-wave radiation source |
| RU2670273C2 (en) * | 2017-11-24 | 2018-10-22 | Общество с ограниченной ответственностью "РнД-ИСАН" | Device and method for emission generation from laser plasma |
| CN111399346A (en) * | 2020-04-14 | 2020-07-10 | 中国科学院上海光学精密机械研究所 | LPP-EUV light source system based on plasma confinement |
| EP4209120A4 (en) * | 2020-09-04 | 2024-08-28 | Isteq B.V. | SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE |
| KR102802111B1 (en) * | 2020-11-19 | 2025-05-02 | 아이에스티이큐 비.브이. | Shortwave radiation source with multi-section collector module |
| EP4427549B1 (en) * | 2021-11-03 | 2025-12-31 | Isteq B.V. | High-brightness laser-generated plasma source and method for generating and collecting radiation |
-
2021
- 2021-08-26 EP EP21864799.8A patent/EP4209120A4/en active Pending
- 2021-08-26 WO PCT/RU2021/050277 patent/WO2022050875A1/en not_active Ceased
- 2021-08-26 JP JP2023514896A patent/JP7549313B2/en active Active
- 2021-08-26 CN CN202180054712.XA patent/CN116195369B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20090272917A1 (en) * | 2008-04-29 | 2009-11-05 | Asml Netherlands B.V. | Radiation source |
| RU2726316C1 (en) * | 2020-01-25 | 2020-07-13 | Общество С Ограниченной Ответственностью "Эуф Лабс" | High-brightness source of short-wave radiation based on laser plasma |
Non-Patent Citations (1)
| Title |
|---|
| See also references of WO2022050875A1 * |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022050875A1 (en) | 2022-03-10 |
| JP7549313B2 (en) | 2024-09-11 |
| EP4209120A1 (en) | 2023-07-12 |
| CN116195369A (en) | 2023-05-30 |
| CN116195369B (en) | 2024-10-18 |
| JP2023540119A (en) | 2023-09-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE INTERNATIONAL PUBLICATION HAS BEEN MADE |
|
| PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
| STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
| 17P | Request for examination filed |
Effective date: 20230322 |
|
| AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
| DAV | Request for validation of the european patent (deleted) | ||
| DAX | Request for extension of the european patent (deleted) | ||
| A4 | Supplementary search report drawn up and despatched |
Effective date: 20240730 |
|
| RIC1 | Information provided on ipc code assigned before grant |
Ipc: H05G 2/00 20060101AFI20240724BHEP |