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EP4209120A4 - SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE - Google Patents

SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE Download PDF

Info

Publication number
EP4209120A4
EP4209120A4 EP21864799.8A EP21864799A EP4209120A4 EP 4209120 A4 EP4209120 A4 EP 4209120A4 EP 21864799 A EP21864799 A EP 21864799A EP 4209120 A4 EP4209120 A4 EP 4209120A4
Authority
EP
European Patent Office
Prior art keywords
radiation source
short wavelength
collector module
wavelength radiation
section collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP21864799.8A
Other languages
German (de)
French (fr)
Other versions
EP4209120A1 (en
Inventor
Aleksandr Yurievich Vinokhodov
Vladimir Vitalievich Ivanov
Denis Aleksandrovich GLUSHKOV
Samir Ellwi
Konstantin Nikolaevich Koshelev
Mikhail Sergeyevich Krivokorytov
Vladimir Mikhailovich KRIVTSUN
Aleksandr Andreevich LASH
Vyacheslav Valerievich Medvedev
Yury Viktorovich Sidelnikov
Oleg Borisovich Khristoforov
Oleg Feliksovich YAKUSHEV
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Isteq Group Holding BV
Isteq BV
Original Assignee
Isteq Group Holding BV
Isteq BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from RU2020129329A external-priority patent/RU2743572C1/en
Priority claimed from US16/952,587 external-priority patent/US11252810B2/en
Application filed by Isteq Group Holding BV, Isteq BV filed Critical Isteq Group Holding BV
Publication of EP4209120A1 publication Critical patent/EP4209120A1/en
Publication of EP4209120A4 publication Critical patent/EP4209120A4/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/009Auxiliary arrangements not involved in the plasma generation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/009Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094Reduction, prevention or protection from contamination; Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
EP21864799.8A 2020-09-04 2021-08-26 SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE Pending EP4209120A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
RU2020129329A RU2743572C1 (en) 2020-09-04 2020-09-04 High-brightness source of short-wave radiation (options)
US16/952,587 US11252810B2 (en) 2017-11-24 2020-11-19 Short-wavelength radiation source with multisectional collector module and method of collecting radiation
PCT/RU2021/050277 WO2022050875A1 (en) 2020-09-04 2021-08-26 Short- wavelength radiation source with multisectional collector module

Publications (2)

Publication Number Publication Date
EP4209120A1 EP4209120A1 (en) 2023-07-12
EP4209120A4 true EP4209120A4 (en) 2024-08-28

Family

ID=80491908

Family Applications (1)

Application Number Title Priority Date Filing Date
EP21864799.8A Pending EP4209120A4 (en) 2020-09-04 2021-08-26 SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE

Country Status (4)

Country Link
EP (1) EP4209120A4 (en)
JP (1) JP7549313B2 (en)
CN (1) CN116195369B (en)
WO (1) WO2022050875A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP4209120A4 (en) * 2020-09-04 2024-08-28 Isteq B.V. SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE
US12429783B2 (en) * 2022-04-11 2025-09-30 Taiwan Semiconductor Manufacturing Company, Ltd. EUV lithography apparatus and operating method for mitigating contamination

Citations (2)

* Cited by examiner, † Cited by third party
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US20090272917A1 (en) * 2008-04-29 2009-11-05 Asml Netherlands B.V. Radiation source
RU2726316C1 (en) * 2020-01-25 2020-07-13 Общество С Ограниченной Ответственностью "Эуф Лабс" High-brightness source of short-wave radiation based on laser plasma

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US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
TWI299505B (en) * 2003-04-08 2008-08-01 Cymer Inc Systems and methods for removal of debris on a reflecting surface of an euv collector in an euv light source
WO2005094318A2 (en) * 2004-03-29 2005-10-13 Jmar Research, Inc. Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
DE102005015274B4 (en) * 2005-03-31 2012-02-23 Xtreme Technologies Gmbh Radiation source for generating short-wave radiation
DE102005020521B4 (en) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Method and device for suppressing debris in the generation of short-wave radiation based on a plasma
US8158960B2 (en) * 2007-07-13 2012-04-17 Cymer, Inc. Laser produced plasma EUV light source
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
US7687788B2 (en) * 2007-07-16 2010-03-30 Asml Netherlands B.V. Debris prevention system, radiation system, and lithographic apparatus
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
NL1036803A (en) * 2008-09-09 2010-03-15 Asml Netherlands Bv RADIATION SYSTEM AND LITHOGRAPHIC EQUIPMENT.
DE102008049494A1 (en) * 2008-09-27 2010-04-08 Xtreme Technologies Gmbh Method and arrangement for operating plasma-based short-wave radiation sources
DE102010028655A1 (en) * 2010-05-06 2011-11-10 Carl Zeiss Smt Gmbh EUV collector
JP6122853B2 (en) * 2011-09-22 2017-04-26 エーエスエムエル ネザーランズ ビー.ブイ. Radiation source
NL2010274C2 (en) * 2012-02-11 2015-02-26 Media Lario Srl Source-collector modules for euv lithography employing a gic mirror and a lpp source.
US9268031B2 (en) * 2012-04-09 2016-02-23 Kla-Tencor Corporation Advanced debris mitigation of EUV light source
KR102122484B1 (en) * 2012-11-15 2020-06-15 에이에스엠엘 네델란즈 비.브이. Radiation source and method for lithography
US9826615B2 (en) * 2015-09-22 2017-11-21 Taiwan Semiconductor Manufacturing Co., Ltd. EUV collector with orientation to avoid contamination
RU2658314C1 (en) * 2016-06-14 2018-06-20 Общество С Ограниченной Ответственностью "Эуф Лабс" High-frequency source of euf-radiation and method of generation of radiation from laser plasma
US12028958B2 (en) * 2017-11-24 2024-07-02 Isteq B.V. High-brightness laser produced plasma source and method of generation and collection radiation
US10887973B2 (en) * 2018-08-14 2021-01-05 Isteq B.V. High brightness laser-produced plasma light source
US11252810B2 (en) * 2017-11-24 2022-02-15 Isteq B.V. Short-wavelength radiation source with multisectional collector module and method of collecting radiation
RU2706713C1 (en) * 2019-04-26 2019-11-20 Общество С Ограниченной Ответственностью "Эуф Лабс" High-brightness short-wave radiation source
RU2670273C2 (en) * 2017-11-24 2018-10-22 Общество с ограниченной ответственностью "РнД-ИСАН" Device and method for emission generation from laser plasma
CN111399346A (en) * 2020-04-14 2020-07-10 中国科学院上海光学精密机械研究所 LPP-EUV light source system based on plasma confinement
EP4209120A4 (en) * 2020-09-04 2024-08-28 Isteq B.V. SHORT WAVELENGTH RADIATION SOURCE WITH MULTI-SECTION COLLECTOR MODULE
KR102802111B1 (en) * 2020-11-19 2025-05-02 아이에스티이큐 비.브이. Shortwave radiation source with multi-section collector module
EP4427549B1 (en) * 2021-11-03 2025-12-31 Isteq B.V. High-brightness laser-generated plasma source and method for generating and collecting radiation

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090272917A1 (en) * 2008-04-29 2009-11-05 Asml Netherlands B.V. Radiation source
RU2726316C1 (en) * 2020-01-25 2020-07-13 Общество С Ограниченной Ответственностью "Эуф Лабс" High-brightness source of short-wave radiation based on laser plasma

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2022050875A1 *

Also Published As

Publication number Publication date
WO2022050875A1 (en) 2022-03-10
JP7549313B2 (en) 2024-09-11
EP4209120A1 (en) 2023-07-12
CN116195369A (en) 2023-05-30
CN116195369B (en) 2024-10-18
JP2023540119A (en) 2023-09-21

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