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EP4014260A1 - Capteur de détection de photons incidents sur sa surface et/ou substances étrangères s'accumulant sur sa surface - Google Patents

Capteur de détection de photons incidents sur sa surface et/ou substances étrangères s'accumulant sur sa surface

Info

Publication number
EP4014260A1
EP4014260A1 EP20743672.6A EP20743672A EP4014260A1 EP 4014260 A1 EP4014260 A1 EP 4014260A1 EP 20743672 A EP20743672 A EP 20743672A EP 4014260 A1 EP4014260 A1 EP 4014260A1
Authority
EP
European Patent Office
Prior art keywords
sensor
layer
photons
foreign substances
barrier
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
EP20743672.6A
Other languages
German (de)
English (en)
Inventor
Daniel Neumaier
Zhenxing WANG
Stijn Goossens
Frank KOPPENS
Domenico DE DE FAZIO
Hasan Burkay UZLU
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Amo GmbH
Institut de Ciencies Fotoniques ICFO
Original Assignee
Amo GmbH
Institut de Ciencies Fotoniques ICFO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Amo GmbH, Institut de Ciencies Fotoniques ICFO filed Critical Amo GmbH
Publication of EP4014260A1 publication Critical patent/EP4014260A1/fr
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/21—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation
    • H10F30/22—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to infrared, visible or ultraviolet radiation the devices having only one potential barrier, e.g. photodiodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
    • G01N27/129—Diode type sensors, e.g. gas sensitive Schottky diodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/10—Semiconductor bodies
    • H10F77/12—Active materials
    • H10F77/122—Active materials comprising only Group IV materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/40—Optical elements or arrangements
    • H10F77/413—Optical elements or arrangements directly associated or integrated with the devices, e.g. back reflectors

Definitions

  • the invention is based on a previously known sensor which has a vertical diode with a two-dimensional, two-dimensional transition and based on a layer arrangement of a metal electrode, a dielectric barrier and a graphene layer.
  • graphene phototransistors and photodetectors which have a double-layer heterostructure, see for example US 8 344 358 B2, US 2014/0264275 A1. These sensors provide a very short response time and a higher sensitivity compared to conventional, semiconductor-based sensors.
  • such sensors are ideal for application to any surface, such as curved surfaces such as skin and the like, to detect light. They are well suited for healthcare applications.
  • a disadvantage of the known sensors is that they have high dark currents in the range of pA and high noise levels.
  • the high noise levels limit the specific sensitivity and the signal / noise ratio.
  • the object of the invention is to further develop a sensor of the previously known type in such a way that it is sensitive to light and / or accumulating and adsorbed foreign substances, is easy to manufacture, has a low dark current and exhibits high sensitivity with a quick response time.
  • a sensor for detecting photons incident on its surface and / or foreign matter deposited / deposited on its surface the sensor a) being a diode with a two-dimensional barrier layer based on a layer arrangement of a metal electrode, egg ner dielectric barrier and a graphene layer, and b) a surface layer which is located above and on the graphene layer and electrically reacts to photons and / or deposited / deposited foreign substances and which forms the surface of the sensor.
  • the object is achieved by a method for detecting photons and / or foreign substances that accumulate and / or are accumulated, with the sensor according to the previous paragraph, by measuring the change in resistance and / or capacitance between the two Connections of the diode.
  • This sensor can be easily manufactured, for example, using thin-film technology. It has a high sensitivity with low self-noise. The dark currents are very low. This enables use with low power requirements and high specific sensitivity. A sensitivity of up to 103 A / W for light with a wavelength of 633 nm with currents in the nA range was achieved, using a surface layer with PbS colloidal quantum dots.
  • the sensor can be used for optical communication systems, for image recording and also for photovoltaic systems.
  • Photons are preferably understood to mean photons in the visible spectral range, in the near UV and in the infrared range.
  • one or more photoactive layers in particular quantum dots, J-aggregates and / or chalcogenides such as HgS (Zin nober), CdS (cadmium yellow), CdSe and especially transition metal dichalcogenides, are used for the surface layer.
  • the graphene layer can be used as the surface layer, in particular a top layer of the multilayer graphene layer.
  • the surface layer can also be formed by modified or functionalized graphene.
  • the surface layers specified in the previous paragraph for the absorption of photons can be used to detect foreign substances.
  • linker biomolecules can be used as a surface layer.
  • Foreign substances are typically atoms or molecules. In particular, they reach the surface by themselves, without solvents or the like. For example, it can be micro-dust, fine dust, gas.
  • the foreign substances can also enter into chemical reactions with the surface layer or with another partner. They are preferably adsorbed, that is, kept on the surface via so-called Van der Waals forces.
  • the foreign substances can be chemically and / or bioactive.
  • a surface layer that reacts electrically to deposited foreign matter
  • cleaning methods or means are provided in order to detach the foreign matter from the surface layer again after accumulation has taken place.
  • neural signals can also be recorded.
  • One application is in the area of direct detection of in vivo electrical signals
  • another application is in the area of implemented biosensors that use chemically bound linker molecules that increase the selectivity of specific biomolecules.
  • a molecule to be detected docks or binds to the linker, it transfers a charge into the graphene layer or induces an electric field in it, so that the charge distribution in the graphene layer is influenced.
  • the graphene layer preferably has dimensions in the range from 1 ⁇ 1 to 15 ⁇ 15 ⁇ m, for example approximately 10 ⁇ 10 ⁇ m.
  • the area of the barrier is preferably between 1 pm2 and 400 pm2, preferably in the range below 120 pm2.
  • the material of the barrier can be an insulator or a semiconductor. For example, SiO 2, Al 2 O 3, hBN, SiN, MoS 2 or the like are possible.
  • the diode has a two-dimensional barrier layer. When illuminated, the surface layer absorbs light.
  • the surface layer has quantum dots, for example, electron-hole pairs are generated in the quantum dots, depending on the quantum dots used.
  • the electron or the hole is transferred to the graphene and changes the charge distribution and / or doping there. This can be read out electrically, for example by measuring the resistance or capacitance of the diode.
  • Corresponding processes take place when a chemoactive or bioactive graphene diode is used. You can follow an adsorption process during the adsorption process. Due to foreign substances that increasingly reach the surface, a charge shift takes place, which leads to a change in the resistance and the capacity of the diode. This change can be verified using suitable measuring methods. For example, the resistance can be measured.
  • the diode can also be connected to an inductance, so that an oscillating circuit is formed which has a resonant frequency which changes when the capacitance of the diode changes.
  • Figure 1 a basic sectional view across the barrier layer through the sensor and with a detection device
  • FIG. 2 shows a sectional view like FIG. 1, but now with a surface layer formed by at least one top layer of a graphene layer.
  • the diode of the sensor has a metal electrode 20, a barrier 22 and a Gra phen für 24.
  • This arrangement is also referred to as MIG (metal-insulator-graphene). It forms a two-dimensional transition.
  • MIG metal-insulator-graphene
  • photosensitive Surface layer 26 are in particular photoactive materials, for example quantum dots, J-aggregates, in particular in the form of dye molecules (for example merocyanines, rhodamine) and chalcogenides, in particular metal chalcogenides and here preferably transition metal chalcogenides.
  • the task of the surface layer is to give the sensor a light sensitivity and / or sensitivity for the adsorption of foreign substances. When light is absorbed or a foreign substance is adsorbed, free charge carriers are released from the surface layer into the graphene layer 24 and / or the charge distribution in the surface layer changes, for example due to the dipole moments. This leads to a change in the charge distribution in the graphene layer 24, for example the doping and / or the distribution of the charge carriers. This changes the resistance and capacitance of the MIG diode.
  • the metal for the metal electrode 20 can be Al, Ti, Au or a ferromagnetic material such as Ni, Fe, Co.
  • the metal electrode has a thickness of typically 1 nm to a few millimeters, for example 3 mm.
  • the barrier 22 is made of insulating or semiconducting material. It typically has a thickness of 1 to 15 nm.
  • the metal electrode 20 can be arranged on a substrate (not shown) in order to fix it mechanically.
  • This substrate does not add functionality. It can be rigid or flexible. It is preferably very thin, in particular a film a few ⁇ m thick or a rigid carrier.
  • the diode is connected in a known manner by means of contacts on the graph layer 24 and on the metal electrode 20.
  • a detection device is also shown that uses these contacts. It has a voltage source 28 and an ammeter 30. The ohmic resistance of the diode is measured in each case.
  • the voltage source 28 is connected to the metal electrode 20.
  • the voltage source 28 is in turn connected to the current measuring device 30, which in turn is connected to the graphene layer 24.
  • the sensor for detecting photons incident on its surface and / or foreign matter accumulating on its surface has a) a diode with a two-dimensional barrier layer based on a layer arrangement of a metal electrode 20, a dielectric barrier 22 and a graphene layer 24, and b) a via the surface layer 26 located under the graphene layer 24, which reacts electrically to photons and / or accumulated foreign substances and which forms the surface of the sensor.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
  • Light Receiving Elements (AREA)

Abstract

L'invention concerne un capteur de détection de photons incidents sur sa surface et/ou de substances étrangères s'accumulant sur sa surface qui comporte a) une diode ayant une couche barrière bidimensionnelle sur la base d'un agencement de couches composé d'une électrode métallique (20), une barrière diélectrique (22) et une couche de graphène (24), et b) une couche de surface (26) qui est située au-dessus et sur la couche de graphène (24), réagit électriquement aux photons et/ou aux substances étrangères accumulées et forme la surface du capteur.
EP20743672.6A 2019-08-15 2020-07-20 Capteur de détection de photons incidents sur sa surface et/ou substances étrangères s'accumulant sur sa surface Pending EP4014260A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102019122009 2019-08-15
PCT/EP2020/070460 WO2021028157A1 (fr) 2019-08-15 2020-07-20 Capteur de détection de photons incidents sur sa surface et/ou substances étrangères s'accumulant sur sa surface

Publications (1)

Publication Number Publication Date
EP4014260A1 true EP4014260A1 (fr) 2022-06-22

Family

ID=71738146

Family Applications (1)

Application Number Title Priority Date Filing Date
EP20743672.6A Pending EP4014260A1 (fr) 2019-08-15 2020-07-20 Capteur de détection de photons incidents sur sa surface et/ou substances étrangères s'accumulant sur sa surface

Country Status (2)

Country Link
EP (1) EP4014260A1 (fr)
WO (1) WO2021028157A1 (fr)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8344358B2 (en) 2010-09-07 2013-01-01 International Business Machines Corporation Graphene transistor with a self-aligned gate
US9202945B2 (en) * 2011-12-23 2015-12-01 Nokia Technologies Oy Graphene-based MIM diode and associated methods
US9680038B2 (en) 2013-03-13 2017-06-13 The Regents Of The University Of Michigan Photodetectors based on double layer heterostructures
JP6413824B2 (ja) * 2015-02-17 2018-10-31 富士通株式会社 ガスセンサ及びその製造方法

Also Published As

Publication number Publication date
WO2021028157A1 (fr) 2021-02-18

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