EP3340252A1 - Electrode assembly - Google Patents
Electrode assembly Download PDFInfo
- Publication number
- EP3340252A1 EP3340252A1 EP16206475.2A EP16206475A EP3340252A1 EP 3340252 A1 EP3340252 A1 EP 3340252A1 EP 16206475 A EP16206475 A EP 16206475A EP 3340252 A1 EP3340252 A1 EP 3340252A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- methyl
- trimethoxysilane
- bis
- propyl
- triethoxysilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- -1 polysiloxane Polymers 0.000 claims abstract description 123
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- 239000002070 nanowire Substances 0.000 claims abstract description 50
- 239000000758 substrate Substances 0.000 claims abstract description 45
- 229920001296 polysiloxane Polymers 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 15
- 238000004519 manufacturing process Methods 0.000 claims abstract description 7
- 229920001609 Poly(3,4-ethylenedioxythiophene) Polymers 0.000 claims description 41
- 150000001875 compounds Chemical class 0.000 claims description 39
- 229920001940 conductive polymer Polymers 0.000 claims description 27
- 229920000642 polymer Polymers 0.000 claims description 19
- 238000002834 transmittance Methods 0.000 claims description 19
- 229920005989 resin Polymers 0.000 claims description 18
- 239000011347 resin Substances 0.000 claims description 18
- 229920003171 Poly (ethylene oxide) Polymers 0.000 claims description 16
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 16
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 claims description 14
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 12
- 229920002678 cellulose Polymers 0.000 claims description 12
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 claims description 12
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 12
- 238000009835 boiling Methods 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 10
- 239000004642 Polyimide Substances 0.000 claims description 10
- 239000002042 Silver nanowire Substances 0.000 claims description 10
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229920001721 polyimide Polymers 0.000 claims description 10
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 claims description 10
- 150000001412 amines Chemical class 0.000 claims description 9
- 150000002430 hydrocarbons Chemical group 0.000 claims description 9
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 claims description 8
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 8
- DRRZZMBHJXLZRS-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]cyclohexanamine Chemical compound CO[Si](C)(OC)CCCNC1CCCCC1 DRRZZMBHJXLZRS-UHFFFAOYSA-N 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims description 8
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 claims description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 claims description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- 229910052697 platinum Inorganic materials 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 6
- 239000004332 silver Substances 0.000 claims description 6
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 claims description 6
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 claims description 5
- 229910045601 alloy Inorganic materials 0.000 claims description 5
- 239000000956 alloy Substances 0.000 claims description 5
- 229910052802 copper Inorganic materials 0.000 claims description 5
- 239000010949 copper Substances 0.000 claims description 5
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920000728 polyester Polymers 0.000 claims description 5
- 229920001282 polysaccharide Polymers 0.000 claims description 5
- 239000005017 polysaccharide Substances 0.000 claims description 5
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 5
- ZYAASQNKCWTPKI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propan-1-amine Chemical compound CO[Si](C)(OC)CCCN ZYAASQNKCWTPKI-UHFFFAOYSA-N 0.000 claims description 4
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 4
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims description 4
- 239000004713 Cyclic olefin copolymer Substances 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- 239000004962 Polyamide-imide Substances 0.000 claims description 4
- 239000004698 Polyethylene Substances 0.000 claims description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 4
- 229920003235 aromatic polyamide Polymers 0.000 claims description 4
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims description 4
- 239000007795 chemical reaction product Substances 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229940018564 m-phenylenediamine Drugs 0.000 claims description 4
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 4
- VUNBLDSFJSYFIM-UHFFFAOYSA-N n-benzyl-3-[diethoxy(methyl)silyl]-n-ethenylpropan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN(C=C)CC1=CC=CC=C1 VUNBLDSFJSYFIM-UHFFFAOYSA-N 0.000 claims description 4
- MFDSFCWUEWTNCE-UHFFFAOYSA-N n-benzyl-n-ethenyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCN(C=C)CC1=CC=CC=C1 MFDSFCWUEWTNCE-UHFFFAOYSA-N 0.000 claims description 4
- 229910052759 nickel Inorganic materials 0.000 claims description 4
- 229920002312 polyamide-imide Polymers 0.000 claims description 4
- 229920000573 polyethylene Polymers 0.000 claims description 4
- 229920000123 polythiophene Polymers 0.000 claims description 4
- 229920000915 polyvinyl chloride Polymers 0.000 claims description 4
- 150000003335 secondary amines Chemical group 0.000 claims description 4
- 229910052718 tin Inorganic materials 0.000 claims description 4
- 239000011135 tin Substances 0.000 claims description 4
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 claims description 4
- FBBATURSCRIBHN-UHFFFAOYSA-N triethoxy-[3-(3-triethoxysilylpropyldisulfanyl)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCSSCCC[Si](OCC)(OCC)OCC FBBATURSCRIBHN-UHFFFAOYSA-N 0.000 claims description 4
- 239000004760 aramid Substances 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229920001577 copolymer Polymers 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- 229910052741 iridium Inorganic materials 0.000 claims description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 3
- 229920002492 poly(sulfone) Polymers 0.000 claims description 3
- 229910052703 rhodium Inorganic materials 0.000 claims description 3
- 239000010948 rhodium Substances 0.000 claims description 3
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 3
- 150000003512 tertiary amines Chemical group 0.000 claims description 3
- RGFDUEXNZLUZGH-YIYPIFLZSA-N (2r,3s,4r,5r)-2,3,4,5,6-pentahydroxy-n-(3-triethoxysilylpropyl)hexanamide Chemical compound CCO[Si](OCC)(OCC)CCCNC(=O)[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO RGFDUEXNZLUZGH-YIYPIFLZSA-N 0.000 claims description 2
- JCZPMGDSEAFWDY-SQOUGZDYSA-N (2r,3s,4r,5r)-2,3,4,5,6-pentahydroxyhexanamide Chemical compound NC(=O)[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO JCZPMGDSEAFWDY-SQOUGZDYSA-N 0.000 claims description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 2
- NATNFHSGWXVQDI-UHFFFAOYSA-N (methoxy-methyl-propylsilyl)oxymethyl acetate Chemical compound CCC[Si](C)(OC)OCOC(C)=O NATNFHSGWXVQDI-UHFFFAOYSA-N 0.000 claims description 2
- QWOVEJBDMKHZQK-UHFFFAOYSA-N 1,3,5-tris(3-trimethoxysilylpropyl)-1,3,5-triazinane-2,4,6-trione Chemical compound CO[Si](OC)(OC)CCCN1C(=O)N(CCC[Si](OC)(OC)OC)C(=O)N(CCC[Si](OC)(OC)OC)C1=O QWOVEJBDMKHZQK-UHFFFAOYSA-N 0.000 claims description 2
- UHOTXZIFNKTLLF-UHFFFAOYSA-N 1,3-bis(3-dimethoxysilylbutyl)urea Chemical compound CC(CCNC(=O)NCCC(C)[SiH](OC)OC)[SiH](OC)OC UHOTXZIFNKTLLF-UHFFFAOYSA-N 0.000 claims description 2
- HOBIHBQJHORMMP-UHFFFAOYSA-N 1,3-bis(3-triethoxysilylpropyl)urea Chemical compound CCO[Si](OCC)(OCC)CCCNC(=O)NCCC[Si](OCC)(OCC)OCC HOBIHBQJHORMMP-UHFFFAOYSA-N 0.000 claims description 2
- HSDGFGSXXVWDET-UHFFFAOYSA-N 1,3-bis(3-trimethoxysilylpropyl)urea Chemical compound CO[Si](OC)(OC)CCCNC(=O)NCCC[Si](OC)(OC)OC HSDGFGSXXVWDET-UHFFFAOYSA-N 0.000 claims description 2
- RZRQAVWMADRZMG-UHFFFAOYSA-N 1,3-bis[3-[diethoxy(methyl)silyl]propyl]urea Chemical compound CCO[Si](C)(OCC)CCCNC(=O)NCCC[Si](C)(OCC)OCC RZRQAVWMADRZMG-UHFFFAOYSA-N 0.000 claims description 2
- KOYUVAFDTQTYND-UHFFFAOYSA-N 1-[4-(2-dimethoxysilylpropyl)phenyl]propan-2-yl-dimethoxysilane Chemical compound CC(CC1=CC=C(C=C1)CC([SiH](OC)OC)C)[SiH](OC)OC KOYUVAFDTQTYND-UHFFFAOYSA-N 0.000 claims description 2
- KNDTWGMCUPQWPQ-UHFFFAOYSA-N 1-[diethoxy(methyl)silyl]ethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)C(C)[Si](C)(OCC)OCC KNDTWGMCUPQWPQ-UHFFFAOYSA-N 0.000 claims description 2
- RDRJOHWRPPUUNI-UHFFFAOYSA-N 1-[dimethoxy(methyl)silyl]ethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C(C)[Si](C)(OC)OC RDRJOHWRPPUUNI-UHFFFAOYSA-N 0.000 claims description 2
- FRECVIICVRIBDE-UHFFFAOYSA-N 11-[diethoxy(methyl)silyl]undecan-1-amine Chemical compound CCO[Si](C)(OCC)CCCCCCCCCCCN FRECVIICVRIBDE-UHFFFAOYSA-N 0.000 claims description 2
- LPWZCJFZJCOBHO-UHFFFAOYSA-N 11-triethoxysilylundecan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCCCCCCCCN LPWZCJFZJCOBHO-UHFFFAOYSA-N 0.000 claims description 2
- AFHXHUBTTHIEHJ-UHFFFAOYSA-N 2-[2-[2-hydroxyethyl(3-trimethoxysilylpropyl)amino]ethyl-(3-trimethoxysilylpropyl)amino]ethanol Chemical compound CO[Si](OC)(OC)CCCN(CCO)CCN(CCO)CCC[Si](OC)(OC)OC AFHXHUBTTHIEHJ-UHFFFAOYSA-N 0.000 claims description 2
- WIPJLPDDJCJVFS-UHFFFAOYSA-N 2-[3-dimethoxysilylbutyl-[2-[3-dimethoxysilylbutyl(2-hydroxyethyl)amino]ethyl]amino]ethanol Chemical compound OCCN(CCN(CCC([SiH](OC)OC)C)CCO)CCC([SiH](OC)OC)C WIPJLPDDJCJVFS-UHFFFAOYSA-N 0.000 claims description 2
- RGAHQVPQZZNNOV-UHFFFAOYSA-N 2-diethoxyphosphorylethyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCP(=O)(OCC)OCC RGAHQVPQZZNNOV-UHFFFAOYSA-N 0.000 claims description 2
- TYZRVQDBDAPABU-UHFFFAOYSA-N 2-ethenoxyethyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCOC=C TYZRVQDBDAPABU-UHFFFAOYSA-N 0.000 claims description 2
- NTRVVJNKPVHXLO-UHFFFAOYSA-N 2-ethenoxyethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCOC=C NTRVVJNKPVHXLO-UHFFFAOYSA-N 0.000 claims description 2
- FYEHTPSFNWGFHU-UHFFFAOYSA-N 2-methylprop-2-enyl 11-[dimethoxy(methyl)silyl]undecanoate Chemical compound CO[Si](C)(OC)CCCCCCCCCCC(=O)OCC(C)=C FYEHTPSFNWGFHU-UHFFFAOYSA-N 0.000 claims description 2
- BVAKBXAIZQDQEX-UHFFFAOYSA-N 2-methylprop-2-enyl 11-trimethoxysilylundecanoate Chemical compound CO[Si](OC)(OC)CCCCCCCCCCC(=O)OCC(C)=C BVAKBXAIZQDQEX-UHFFFAOYSA-N 0.000 claims description 2
- WKDXWVFWDKSYAE-UHFFFAOYSA-N 3-(3-aminopropyl-ethoxy-methylsilyl)oxy-3-methylpentane-1,5-diol Chemical compound NCCC[Si](C)(OCC)OC(C)(CCO)CCO WKDXWVFWDKSYAE-UHFFFAOYSA-N 0.000 claims description 2
- GXDMUOPCQNLBCZ-UHFFFAOYSA-N 3-(3-triethoxysilylpropyl)oxolane-2,5-dione Chemical compound CCO[Si](OCC)(OCC)CCCC1CC(=O)OC1=O GXDMUOPCQNLBCZ-UHFFFAOYSA-N 0.000 claims description 2
- HUPGCAGBHBJUJC-UHFFFAOYSA-N 3-(3-trimethoxysilylpropoxy)aniline Chemical compound CO[Si](OC)(OC)CCCOC1=CC=CC(N)=C1 HUPGCAGBHBJUJC-UHFFFAOYSA-N 0.000 claims description 2
- WBUSESIMOZDSHU-UHFFFAOYSA-N 3-(4,5-dihydroimidazol-1-yl)propyl-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN1CCN=C1 WBUSESIMOZDSHU-UHFFFAOYSA-N 0.000 claims description 2
- RMSIYQPGLJEZLW-UHFFFAOYSA-N 3-[3-[diethoxy(methyl)silyl]propyl]oxolane-2,5-dione Chemical compound CCO[Si](C)(OCC)CCCC1CC(=O)OC1=O RMSIYQPGLJEZLW-UHFFFAOYSA-N 0.000 claims description 2
- KPJOTRNNFIYMTC-UHFFFAOYSA-N 3-[3-[diethoxy(methyl)silyl]propyldisulfanyl]propyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCSSCCC[Si](C)(OCC)OCC KPJOTRNNFIYMTC-UHFFFAOYSA-N 0.000 claims description 2
- CQAKEDKOKFHMSM-UHFFFAOYSA-N 3-[3-[dimethoxy(methyl)silyl]propoxy]aniline Chemical compound CO[Si](C)(OC)CCCOC1=CC=CC(N)=C1 CQAKEDKOKFHMSM-UHFFFAOYSA-N 0.000 claims description 2
- PMJIKKNFJBDSHO-UHFFFAOYSA-N 3-[3-aminopropyl(diethoxy)silyl]oxy-3-methylpentane-1,5-diol Chemical compound NCCC[Si](OCC)(OCC)OC(C)(CCO)CCO PMJIKKNFJBDSHO-UHFFFAOYSA-N 0.000 claims description 2
- CECLHTTXVLWBIF-UHFFFAOYSA-N 3-[bis(2-methoxyethoxy)-methylsilyl]propan-1-amine Chemical compound COCCO[Si](C)(CCCN)OCCOC CECLHTTXVLWBIF-UHFFFAOYSA-N 0.000 claims description 2
- SUKDLHIPTSZFPO-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]-n-[3-[diethoxy(methyl)silyl]propyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCNCCC[Si](C)(OCC)OCC SUKDLHIPTSZFPO-UHFFFAOYSA-N 0.000 claims description 2
- HXLAEGYMDGUSBD-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(OCC)CCCN HXLAEGYMDGUSBD-UHFFFAOYSA-N 0.000 claims description 2
- MBNRBJNIYVXSQV-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propane-1-thiol Chemical compound CCO[Si](C)(OCC)CCCS MBNRBJNIYVXSQV-UHFFFAOYSA-N 0.000 claims description 2
- VKRWVLAGVUOYLB-UHFFFAOYSA-N 3-[diethoxy(methyl)silyl]propylurea Chemical compound CCO[Si](C)(OCC)CCCNC(N)=O VKRWVLAGVUOYLB-UHFFFAOYSA-N 0.000 claims description 2
- JWZAFLRHIAYYJF-UHFFFAOYSA-N 3-[dihydroxy(methyl)silyl]propane-1-sulfonic acid Chemical compound C[Si](O)(O)CCCS(O)(=O)=O JWZAFLRHIAYYJF-UHFFFAOYSA-N 0.000 claims description 2
- FHLZUEPKLGQEQP-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]-n,n-diethylpropan-1-amine Chemical compound CCN(CC)CCC[Si](C)(OC)OC FHLZUEPKLGQEQP-UHFFFAOYSA-N 0.000 claims description 2
- JXNGSNLOFNAVJI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]-n,n-dimethylpropan-1-amine Chemical compound CO[Si](C)(OC)CCCN(C)C JXNGSNLOFNAVJI-UHFFFAOYSA-N 0.000 claims description 2
- GGZBCIDSFGUWRA-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]-n-methylpropan-1-amine Chemical compound CNCCC[Si](C)(OC)OC GGZBCIDSFGUWRA-UHFFFAOYSA-N 0.000 claims description 2
- IZMPSTYHYCLDKE-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]aniline Chemical compound CO[Si](C)(OC)C1=CC=CC(N)=C1 IZMPSTYHYCLDKE-UHFFFAOYSA-N 0.000 claims description 2
- IKYAJDOSWUATPI-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propane-1-thiol Chemical compound CO[Si](C)(OC)CCCS IKYAJDOSWUATPI-UHFFFAOYSA-N 0.000 claims description 2
- YEDODYOYAUZNBT-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl benzoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C1=CC=CC=C1 YEDODYOYAUZNBT-UHFFFAOYSA-N 0.000 claims description 2
- MXDWUGFTSGOHRF-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propylurea Chemical compound CO[Si](C)(OC)CCCNC(N)=O MXDWUGFTSGOHRF-UHFFFAOYSA-N 0.000 claims description 2
- UNVFWCQQWZUPLB-UHFFFAOYSA-N 3-[dimethoxy(pentan-3-yloxy)silyl]propan-1-amine Chemical compound CCC(CC)O[Si](OC)(OC)CCCN UNVFWCQQWZUPLB-UHFFFAOYSA-N 0.000 claims description 2
- PJURIXUDYDHOMA-UHFFFAOYSA-N 3-[tris[2-(2-methoxyethoxy)ethoxy]silyl]propan-1-amine Chemical compound COCCOCCO[Si](CCCN)(OCCOCCOC)OCCOCCOC PJURIXUDYDHOMA-UHFFFAOYSA-N 0.000 claims description 2
- GLISZRPOUBOZDL-UHFFFAOYSA-N 3-bromopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCBr GLISZRPOUBOZDL-UHFFFAOYSA-N 0.000 claims description 2
- XVNYMEVFHNKMIA-UHFFFAOYSA-N 3-bromopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCBr XVNYMEVFHNKMIA-UHFFFAOYSA-N 0.000 claims description 2
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 claims description 2
- OXYZDRAJMHGSMW-UHFFFAOYSA-N 3-chloropropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCl OXYZDRAJMHGSMW-UHFFFAOYSA-N 0.000 claims description 2
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 claims description 2
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 claims description 2
- NLUBWVOYYFNGKI-UHFFFAOYSA-N 3-dimethoxysilyl-N-(3-dimethoxysilylbutyl)butan-1-amine Chemical compound CO[SiH](OC)C(C)CCNCCC(C)[SiH](OC)OC NLUBWVOYYFNGKI-UHFFFAOYSA-N 0.000 claims description 2
- JMICBDHJGYAFMU-UHFFFAOYSA-N 3-ethenoxypropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCOC=C JMICBDHJGYAFMU-UHFFFAOYSA-N 0.000 claims description 2
- BQHXNWAPYXXVNP-UHFFFAOYSA-N 3-ethenoxypropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCOC=C BQHXNWAPYXXVNP-UHFFFAOYSA-N 0.000 claims description 2
- FMGBDYLOANULLW-UHFFFAOYSA-N 3-isocyanatopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCN=C=O FMGBDYLOANULLW-UHFFFAOYSA-N 0.000 claims description 2
- NNTRMVRTACZZIO-UHFFFAOYSA-N 3-isocyanatopropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCN=C=O NNTRMVRTACZZIO-UHFFFAOYSA-N 0.000 claims description 2
- RWLDCNACDPTRMY-UHFFFAOYSA-N 3-triethoxysilyl-n-(3-triethoxysilylpropyl)propan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCNCCC[Si](OCC)(OCC)OCC RWLDCNACDPTRMY-UHFFFAOYSA-N 0.000 claims description 2
- DCQBZYNUSLHVJC-UHFFFAOYSA-N 3-triethoxysilylpropane-1-thiol Chemical compound CCO[Si](OCC)(OCC)CCCS DCQBZYNUSLHVJC-UHFFFAOYSA-N 0.000 claims description 2
- LVNLBBGBASVLLI-UHFFFAOYSA-N 3-triethoxysilylpropylurea Chemical compound CCO[Si](OCC)(OCC)CCCNC(N)=O LVNLBBGBASVLLI-UHFFFAOYSA-N 0.000 claims description 2
- WYTQXLFLAMZNNZ-UHFFFAOYSA-N 3-trihydroxysilylpropane-1-sulfonic acid Chemical compound O[Si](O)(O)CCCS(O)(=O)=O WYTQXLFLAMZNNZ-UHFFFAOYSA-N 0.000 claims description 2
- TZZGHGKTHXIOMN-UHFFFAOYSA-N 3-trimethoxysilyl-n-(3-trimethoxysilylpropyl)propan-1-amine Chemical compound CO[Si](OC)(OC)CCCNCCC[Si](OC)(OC)OC TZZGHGKTHXIOMN-UHFFFAOYSA-N 0.000 claims description 2
- YMTRNELCZAZKRB-UHFFFAOYSA-N 3-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=CC(N)=C1 YMTRNELCZAZKRB-UHFFFAOYSA-N 0.000 claims description 2
- UUEWCQRISZBELL-UHFFFAOYSA-N 3-trimethoxysilylpropane-1-thiol Chemical compound CO[Si](OC)(OC)CCCS UUEWCQRISZBELL-UHFFFAOYSA-N 0.000 claims description 2
- FZTPAOAMKBXNSH-UHFFFAOYSA-N 3-trimethoxysilylpropyl acetate Chemical compound CO[Si](OC)(OC)CCCOC(C)=O FZTPAOAMKBXNSH-UHFFFAOYSA-N 0.000 claims description 2
- HYFWOBSAALCFRS-UHFFFAOYSA-N 3-trimethoxysilylpropyl benzoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C1=CC=CC=C1 HYFWOBSAALCFRS-UHFFFAOYSA-N 0.000 claims description 2
- LVACOMKKELLCHJ-UHFFFAOYSA-N 3-trimethoxysilylpropylurea Chemical compound CO[Si](OC)(OC)CCCNC(N)=O LVACOMKKELLCHJ-UHFFFAOYSA-N 0.000 claims description 2
- MFIOWDIZBWUSJJ-UHFFFAOYSA-N 4-(3-diethoxysilylbutylamino)butan-1-ol Chemical compound CCO[SiH](C(C)CCNCCCCO)OCC MFIOWDIZBWUSJJ-UHFFFAOYSA-N 0.000 claims description 2
- KTFLAZUEXFFCFI-UHFFFAOYSA-N 4-(3-triethoxysilylpropylamino)butan-1-ol Chemical compound CCO[Si](OCC)(OCC)CCCNCCCCO KTFLAZUEXFFCFI-UHFFFAOYSA-N 0.000 claims description 2
- ANZPQOTXVAYKBE-UHFFFAOYSA-N 4-(4,5-dihydroimidazol-1-yl)butan-2-yl-diethoxysilane Chemical compound CC(CCN1C=NCC1)[SiH](OCC)OCC ANZPQOTXVAYKBE-UHFFFAOYSA-N 0.000 claims description 2
- YHFFINXFNYQPQA-UHFFFAOYSA-N 4-[diethoxy(methyl)silyl]butan-1-amine Chemical compound CCO[Si](C)(OCC)CCCCN YHFFINXFNYQPQA-UHFFFAOYSA-N 0.000 claims description 2
- PEJIRIKCMRPHKT-UHFFFAOYSA-N 4-[dimethoxy(methyl)silyl]aniline Chemical compound CO[Si](C)(OC)C1=CC=C(N)C=C1 PEJIRIKCMRPHKT-UHFFFAOYSA-N 0.000 claims description 2
- IEJGRVMVZRCTDO-UHFFFAOYSA-N 4-ethenoxybutyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCOC=C IEJGRVMVZRCTDO-UHFFFAOYSA-N 0.000 claims description 2
- GZXZKMYRJGMUFE-UHFFFAOYSA-N 4-ethenoxybutyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCOC=C GZXZKMYRJGMUFE-UHFFFAOYSA-N 0.000 claims description 2
- SWDDLRSGGCWDPH-UHFFFAOYSA-N 4-triethoxysilylbutan-1-amine Chemical compound CCO[Si](OCC)(OCC)CCCCN SWDDLRSGGCWDPH-UHFFFAOYSA-N 0.000 claims description 2
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 claims description 2
- DCPGYSSQJBLQKV-UHFFFAOYSA-N 6-[diethoxy(methyl)silyl]hexyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCCC[Si](C)(OCC)OCC DCPGYSSQJBLQKV-UHFFFAOYSA-N 0.000 claims description 2
- PWIRBZUPYYDNNW-UHFFFAOYSA-N 8-[diethoxy(methyl)silyl]octyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCCCCC[Si](C)(OCC)OCC PWIRBZUPYYDNNW-UHFFFAOYSA-N 0.000 claims description 2
- IAAAQEHCHXUSEE-UHFFFAOYSA-N CO[Si](C)(OC)C1=CC=C(CCl)C=C1 Chemical compound CO[Si](C)(OC)C1=CC=C(CCl)C=C1 IAAAQEHCHXUSEE-UHFFFAOYSA-N 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 239000004743 Polypropylene Substances 0.000 claims description 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 2
- 239000007983 Tris buffer Substances 0.000 claims description 2
- ZXOFHTCCTUEJQJ-UHFFFAOYSA-N [4-(chloromethyl)phenyl]-trimethoxysilane Chemical compound CO[Si](OC)(OC)C1=CC=C(CCl)C=C1 ZXOFHTCCTUEJQJ-UHFFFAOYSA-N 0.000 claims description 2
- AYHMBXGPNZPJIS-UHFFFAOYSA-N [4-[dimethoxy(methyl)silyl]phenyl]-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C1=CC=C([Si](C)(OC)OC)C=C1 AYHMBXGPNZPJIS-UHFFFAOYSA-N 0.000 claims description 2
- NUHXAEPJZWEPDH-UHFFFAOYSA-M [Na+].C(=O)([O-])CC[Si](O)(O)C Chemical compound [Na+].C(=O)([O-])CC[Si](O)(O)C NUHXAEPJZWEPDH-UHFFFAOYSA-M 0.000 claims description 2
- FTNUVZVPIYMLMV-UHFFFAOYSA-M [Na+].CP(OCCC(C)[SiH](O)O)([O-])=O Chemical compound [Na+].CP(OCCC(C)[SiH](O)O)([O-])=O FTNUVZVPIYMLMV-UHFFFAOYSA-M 0.000 claims description 2
- RPDMQUQDEIOJGO-UHFFFAOYSA-N [diethoxy(methyl)silyl]methanol Chemical compound CCO[Si](C)(CO)OCC RPDMQUQDEIOJGO-UHFFFAOYSA-N 0.000 claims description 2
- PKEPISNVQYTALX-UHFFFAOYSA-N [diethoxy(methyl)silyl]methyl acetate Chemical compound CCO[Si](C)(OCC)COC(C)=O PKEPISNVQYTALX-UHFFFAOYSA-N 0.000 claims description 2
- HIALYWKJVULGCE-UHFFFAOYSA-N [diethoxy(methyl)silyl]methyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)C[Si](C)(OCC)OCC HIALYWKJVULGCE-UHFFFAOYSA-N 0.000 claims description 2
- DNMSYWSOVWVKMS-UHFFFAOYSA-N [dimethoxy(methyl)silyl]methyl acetate Chemical compound CO[Si](C)(OC)COC(C)=O DNMSYWSOVWVKMS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052787 antimony Inorganic materials 0.000 claims description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- GFKYCBYNLQRVIW-UHFFFAOYSA-N bis(2-methoxyethoxy)-methylsilane Chemical compound COCCO[SiH](C)OCCOC GFKYCBYNLQRVIW-UHFFFAOYSA-N 0.000 claims description 2
- 229910052797 bismuth Inorganic materials 0.000 claims description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 2
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 claims description 2
- IIMISJTWARSKOJ-UHFFFAOYSA-N dec-9-enyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCCCCCC=C IIMISJTWARSKOJ-UHFFFAOYSA-N 0.000 claims description 2
- AFLYPCVMHGYUMS-UHFFFAOYSA-N dec-9-enyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCCCCCC=C AFLYPCVMHGYUMS-UHFFFAOYSA-N 0.000 claims description 2
- KQAHMVLQCSALSX-UHFFFAOYSA-N decyl(trimethoxy)silane Chemical compound CCCCCCCCCC[Si](OC)(OC)OC KQAHMVLQCSALSX-UHFFFAOYSA-N 0.000 claims description 2
- GWUJPMKBSYJFCK-UHFFFAOYSA-N decyl-dimethoxy-methylsilane Chemical compound CCCCCCCCCC[Si](C)(OC)OC GWUJPMKBSYJFCK-UHFFFAOYSA-N 0.000 claims description 2
- RUOGIPBQCAKQFQ-UHFFFAOYSA-N dibutoxy-ethenyl-methylsilane Chemical compound CCCCO[Si](C)(C=C)OCCCC RUOGIPBQCAKQFQ-UHFFFAOYSA-N 0.000 claims description 2
- QUTVYTPWQCUBKR-UHFFFAOYSA-N dibutoxy-methyl-prop-1-en-2-ylsilane Chemical compound CCCCO[Si](C)(C(C)=C)OCCCC QUTVYTPWQCUBKR-UHFFFAOYSA-N 0.000 claims description 2
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 claims description 2
- VNNPFQQFUFDPJM-UHFFFAOYSA-N diethoxy-(2-isocyanatoethyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CCN=C=O VNNPFQQFUFDPJM-UHFFFAOYSA-N 0.000 claims description 2
- PJIFJEUHCQYNHO-UHFFFAOYSA-N diethoxy-(3-isocyanatopropyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CCCN=C=O PJIFJEUHCQYNHO-UHFFFAOYSA-N 0.000 claims description 2
- OCNXBDSYTXVOIV-UHFFFAOYSA-N diethoxy-(isocyanatomethyl)-methylsilane Chemical compound CCO[Si](C)(OCC)CN=C=O OCNXBDSYTXVOIV-UHFFFAOYSA-N 0.000 claims description 2
- UYJVWFZJQXTYLG-UHFFFAOYSA-N diethoxy-ethyl-phenylsilane Chemical compound CCO[Si](CC)(OCC)C1=CC=CC=C1 UYJVWFZJQXTYLG-UHFFFAOYSA-N 0.000 claims description 2
- OTARVPUIYXHRRB-UHFFFAOYSA-N diethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](C)(OCC)CCCOCC1CO1 OTARVPUIYXHRRB-UHFFFAOYSA-N 0.000 claims description 2
- NPLKBJCKBLEGDL-UHFFFAOYSA-N diethoxy-methyl-prop-1-en-2-ylsilane Chemical compound CCO[Si](C)(C(C)=C)OCC NPLKBJCKBLEGDL-UHFFFAOYSA-N 0.000 claims description 2
- VGWJKDPTLUDSJT-UHFFFAOYSA-N diethyl dimethyl silicate Chemical compound CCO[Si](OC)(OC)OCC VGWJKDPTLUDSJT-UHFFFAOYSA-N 0.000 claims description 2
- 125000004177 diethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 claims description 2
- FUWSTKIKWNDXDT-UHFFFAOYSA-N dimethoxy(1-pyridin-2-ylpropan-2-yl)silane Chemical compound CC(CC1=NC=CC=C1)[SiH](OC)OC FUWSTKIKWNDXDT-UHFFFAOYSA-N 0.000 claims description 2
- FSNUFGQISFVCAX-UHFFFAOYSA-N dimethoxy(4-pyrrol-1-ylbutan-2-yl)silane Chemical compound CC(CCN1C=CC=C1)[SiH](OC)OC FSNUFGQISFVCAX-UHFFFAOYSA-N 0.000 claims description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 claims description 2
- XSZBWDYSUYCDTD-UHFFFAOYSA-N dimethoxy-(2-methylprop-2-enoxy)-phenylsilane Chemical compound CC(=C)CO[Si](OC)(OC)C1=CC=CC=C1 XSZBWDYSUYCDTD-UHFFFAOYSA-N 0.000 claims description 2
- IEROPTUZBGYDKF-UHFFFAOYSA-N dimethoxy-(3-methoxypropyl)-methylsilane Chemical compound COCCC[Si](C)(OC)OC IEROPTUZBGYDKF-UHFFFAOYSA-N 0.000 claims description 2
- WOQAOSJDXCJTQH-UHFFFAOYSA-N dimethoxy-methyl-(2-prop-1-en-2-yloxyethyl)silane Chemical compound CO[Si](C)(OC)CCOC(C)=C WOQAOSJDXCJTQH-UHFFFAOYSA-N 0.000 claims description 2
- ZTZRZVFGQZTEAW-UHFFFAOYSA-N dimethoxy-methyl-[2-(2-pyridin-2-ylethylsulfanyl)propyl]silane Chemical compound CO[Si](C)(OC)CC(C)SCCC1=CC=CC=N1 ZTZRZVFGQZTEAW-UHFFFAOYSA-N 0.000 claims description 2
- ITZFXKVJPCIBRZ-UHFFFAOYSA-N dimethoxy-methyl-[2-(2-pyridin-4-ylethylsulfanyl)propyl]silane Chemical compound CO[Si](C)(OC)CC(C)SCCC1=CC=NC=C1 ITZFXKVJPCIBRZ-UHFFFAOYSA-N 0.000 claims description 2
- SLQTWNAJXFHMHM-UHFFFAOYSA-N dimethoxy-methyl-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](C)(OC)OC)CCC2OC21 SLQTWNAJXFHMHM-UHFFFAOYSA-N 0.000 claims description 2
- LTEHGXBBLYUGQI-UHFFFAOYSA-N dimethoxy-methyl-[3-(2-methylprop-2-enoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC(C)=C LTEHGXBBLYUGQI-UHFFFAOYSA-N 0.000 claims description 2
- WHGNXNCOTZPEEK-UHFFFAOYSA-N dimethoxy-methyl-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](C)(OC)CCCOCC1CO1 WHGNXNCOTZPEEK-UHFFFAOYSA-N 0.000 claims description 2
- CVQVSVBUMVSJES-UHFFFAOYSA-N dimethoxy-methyl-phenylsilane Chemical compound CO[Si](C)(OC)C1=CC=CC=C1 CVQVSVBUMVSJES-UHFFFAOYSA-N 0.000 claims description 2
- XHLHJWWQGRARSA-UHFFFAOYSA-N dimethoxy-methyl-prop-1-en-2-ylsilane Chemical compound CO[Si](C)(OC)C(C)=C XHLHJWWQGRARSA-UHFFFAOYSA-N 0.000 claims description 2
- WQTNGCZMPUCIEX-UHFFFAOYSA-N dimethoxy-methyl-prop-2-enylsilane Chemical compound CO[Si](C)(OC)CC=C WQTNGCZMPUCIEX-UHFFFAOYSA-N 0.000 claims description 2
- PPTYNCJKYCGKEA-UHFFFAOYSA-N dimethoxy-phenyl-prop-2-enoxysilane Chemical compound C=CCO[Si](OC)(OC)C1=CC=CC=C1 PPTYNCJKYCGKEA-UHFFFAOYSA-N 0.000 claims description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims description 2
- JGOICJFFICGNEJ-UHFFFAOYSA-M disodium;3-[dihydroxy(oxido)silyl]propanoate Chemical compound [Na+].[Na+].O[Si](O)([O-])CCC([O-])=O JGOICJFFICGNEJ-UHFFFAOYSA-M 0.000 claims description 2
- NXJUHEVORDCULB-UHFFFAOYSA-N dodec-11-enyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCCCCCCCC=C NXJUHEVORDCULB-UHFFFAOYSA-N 0.000 claims description 2
- HFKOYNFZPCOPCD-UHFFFAOYSA-N dodec-11-enyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCCCCCCCC=C HFKOYNFZPCOPCD-UHFFFAOYSA-N 0.000 claims description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 claims description 2
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 claims description 2
- INWVHJGPNCHXOO-UHFFFAOYSA-N ethenyl-bis(2-methoxyethoxy)-methylsilane Chemical compound COCCO[Si](C)(C=C)OCCOC INWVHJGPNCHXOO-UHFFFAOYSA-N 0.000 claims description 2
- MBGQQKKTDDNCSG-UHFFFAOYSA-N ethenyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(C=C)OCC MBGQQKKTDDNCSG-UHFFFAOYSA-N 0.000 claims description 2
- ZLNAFSPCNATQPQ-UHFFFAOYSA-N ethenyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)C=C ZLNAFSPCNATQPQ-UHFFFAOYSA-N 0.000 claims description 2
- WOXXJEVNDJOOLV-UHFFFAOYSA-N ethenyl-tris(2-methoxyethoxy)silane Chemical compound COCCO[Si](OCCOC)(OCCOC)C=C WOXXJEVNDJOOLV-UHFFFAOYSA-N 0.000 claims description 2
- VGEWEGHHYWGXGG-UHFFFAOYSA-N ethyl n-hydroxycarbamate Chemical compound CCOC(=O)NO VGEWEGHHYWGXGG-UHFFFAOYSA-N 0.000 claims description 2
- ITAHRPSKCCPKOK-UHFFFAOYSA-N ethyl trimethyl silicate Chemical compound CCO[Si](OC)(OC)OC ITAHRPSKCCPKOK-UHFFFAOYSA-N 0.000 claims description 2
- UQXMIPQJJDKQHZ-UHFFFAOYSA-N ethyl tripropyl silicate Chemical compound CCCO[Si](OCC)(OCCC)OCCC UQXMIPQJJDKQHZ-UHFFFAOYSA-N 0.000 claims description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 2
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 2
- LWXRFJUOHUGVBN-UHFFFAOYSA-N methoxy-methyl-(2-methylprop-2-enoxy)-phenylsilane Chemical compound CC(=C)CO[Si](C)(OC)C1=CC=CC=C1 LWXRFJUOHUGVBN-UHFFFAOYSA-N 0.000 claims description 2
- NTYTVZGBEPPCRE-UHFFFAOYSA-N methoxy-methyl-phenyl-prop-2-enoxysilane Chemical compound C=CCO[Si](C)(OC)C1=CC=CC=C1 NTYTVZGBEPPCRE-UHFFFAOYSA-N 0.000 claims description 2
- GNTPOHADLMEOEZ-UHFFFAOYSA-N methyl 3-[dimethoxy(methyl)silyl]propanoate Chemical compound COC(=O)CC[Si](C)(OC)OC GNTPOHADLMEOEZ-UHFFFAOYSA-N 0.000 claims description 2
- XJLTZAGUXSAJCZ-UHFFFAOYSA-N methyl 3-trimethoxysilylpropanoate Chemical compound COC(=O)CC[Si](OC)(OC)OC XJLTZAGUXSAJCZ-UHFFFAOYSA-N 0.000 claims description 2
- SFLULBKYTSNESB-UHFFFAOYSA-N methyl tripropyl silicate Chemical compound CCCO[Si](OC)(OCCC)OCCC SFLULBKYTSNESB-UHFFFAOYSA-N 0.000 claims description 2
- JQYGMRTZHJTQAC-UHFFFAOYSA-N methyl-phenyl-dipropoxysilane Chemical compound CCCO[Si](C)(OCCC)C1=CC=CC=C1 JQYGMRTZHJTQAC-UHFFFAOYSA-N 0.000 claims description 2
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- RMBYJMVHGICGMN-UHFFFAOYSA-N n',n'-bis(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCN(CCN)CCC[Si](OC)(OC)OC RMBYJMVHGICGMN-UHFFFAOYSA-N 0.000 claims description 2
- AEXNXFCTHRXVMT-UHFFFAOYSA-N n',n'-bis[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCN(CCN)CCC[Si](C)(OC)OC AEXNXFCTHRXVMT-UHFFFAOYSA-N 0.000 claims description 2
- MNEXIOKPOFUXLA-UHFFFAOYSA-N n'-(11-trimethoxysilylundecyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCCCCCCCCCNCCN MNEXIOKPOFUXLA-UHFFFAOYSA-N 0.000 claims description 2
- INJVFBCDVXYHGQ-UHFFFAOYSA-N n'-(3-triethoxysilylpropyl)ethane-1,2-diamine Chemical compound CCO[Si](OCC)(OCC)CCCNCCN INJVFBCDVXYHGQ-UHFFFAOYSA-N 0.000 claims description 2
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims description 2
- AMVXVPUHCLLJRE-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)hexane-1,6-diamine Chemical compound CO[Si](OC)(OC)CCCNCCCCCCN AMVXVPUHCLLJRE-UHFFFAOYSA-N 0.000 claims description 2
- RRQTYXHHYIJDFB-UHFFFAOYSA-N n'-(triethoxysilylmethyl)hexane-1,6-diamine Chemical compound CCO[Si](OCC)(OCC)CNCCCCCCN RRQTYXHHYIJDFB-UHFFFAOYSA-N 0.000 claims description 2
- GQAOXYDSYMXUQB-UHFFFAOYSA-N n'-[1-[ethoxy(dimethyl)silyl]oxyethyl]hexane-1,6-diamine Chemical compound CCO[Si](C)(C)OC(C)NCCCCCCN GQAOXYDSYMXUQB-UHFFFAOYSA-N 0.000 claims description 2
- WLYGAKQYCYAHPA-UHFFFAOYSA-N n'-[11-[dimethoxy(methyl)silyl]undecyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCCCCCCCCCNCCN WLYGAKQYCYAHPA-UHFFFAOYSA-N 0.000 claims description 2
- SDLRHOXJZJJEEF-UHFFFAOYSA-N n'-[2-[methoxy-methyl-(2-phenylethyl)silyl]oxyethyl]ethane-1,2-diamine Chemical compound NCCNCCO[Si](C)(OC)CCC1=CC=CC=C1 SDLRHOXJZJJEEF-UHFFFAOYSA-N 0.000 claims description 2
- YLBPOJLDZXHVRR-UHFFFAOYSA-N n'-[3-[diethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CCO[Si](C)(OCC)CCCNCCN YLBPOJLDZXHVRR-UHFFFAOYSA-N 0.000 claims description 2
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 claims description 2
- KNEKGIMTTIJSJU-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]hexane-1,6-diamine Chemical compound CO[Si](C)(OC)CCCNCCCCCCN KNEKGIMTTIJSJU-UHFFFAOYSA-N 0.000 claims description 2
- HBELKEREKFGFNM-UHFFFAOYSA-N n'-[[4-(2-trimethoxysilylethyl)phenyl]methyl]ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCC1=CC=C(CNCCN)C=C1 HBELKEREKFGFNM-UHFFFAOYSA-N 0.000 claims description 2
- ICRFXIKCXYDMJD-UHFFFAOYSA-N n'-benzyl-n'-ethenyl-n-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN(C=C)CC1=CC=CC=C1 ICRFXIKCXYDMJD-UHFFFAOYSA-N 0.000 claims description 2
- LAVCCFJYKQPHQS-UHFFFAOYSA-N n'-benzyl-n'-prop-1-en-2-yl-n-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN(C(C)=C)CC1=CC=CC=C1 LAVCCFJYKQPHQS-UHFFFAOYSA-N 0.000 claims description 2
- SVIPKPWWLXBTTA-UHFFFAOYSA-N n'-benzyl-n-[3-[dimethoxy(methyl)silyl]propyl]-n'-ethenylethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN(C=C)CC1=CC=CC=C1 SVIPKPWWLXBTTA-UHFFFAOYSA-N 0.000 claims description 2
- XJCLWYXTRXICMZ-UHFFFAOYSA-N n'-benzyl-n-[3-[dimethoxy(methyl)silyl]propyl]-n'-prop-1-en-2-ylethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN(C(C)=C)CC1=CC=CC=C1 XJCLWYXTRXICMZ-UHFFFAOYSA-N 0.000 claims description 2
- QIOYHIUHPGORLS-UHFFFAOYSA-N n,n-dimethyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN(C)C QIOYHIUHPGORLS-UHFFFAOYSA-N 0.000 claims description 2
- JXLQREJGIDQFJP-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)acetamide Chemical compound CO[Si](OC)(OC)CCCNC(C)=O JXLQREJGIDQFJP-UHFFFAOYSA-N 0.000 claims description 2
- KBJFYLLAMSZSOG-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCNC1=CC=CC=C1 KBJFYLLAMSZSOG-UHFFFAOYSA-N 0.000 claims description 2
- XCOASYLMDUQBHW-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)butan-1-amine Chemical compound CCCCNCCC[Si](OC)(OC)OC XCOASYLMDUQBHW-UHFFFAOYSA-N 0.000 claims description 2
- KGNDVXPHQJMHLX-UHFFFAOYSA-N n-(3-trimethoxysilylpropyl)cyclohexanamine Chemical compound CO[Si](OC)(OC)CCCNC1CCCCC1 KGNDVXPHQJMHLX-UHFFFAOYSA-N 0.000 claims description 2
- WUFHQGLVNNOXMP-UHFFFAOYSA-N n-(triethoxysilylmethyl)cyclohexanamine Chemical compound CCO[Si](OCC)(OCC)CNC1CCCCC1 WUFHQGLVNNOXMP-UHFFFAOYSA-N 0.000 claims description 2
- MZSSLPUGOKHRCV-UHFFFAOYSA-N n-[3-[diethoxy(methyl)silyl]propyl]-n-ethenylaniline Chemical compound CCO[Si](C)(OCC)CCCN(C=C)C1=CC=CC=C1 MZSSLPUGOKHRCV-UHFFFAOYSA-N 0.000 claims description 2
- WAAMCOKEEMYTTJ-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]-n-ethenylaniline Chemical compound CO[Si](C)(OC)CCCN(C=C)C1=CC=CC=C1 WAAMCOKEEMYTTJ-UHFFFAOYSA-N 0.000 claims description 2
- FKAAOZRWMWTXRG-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]acetamide Chemical compound CO[Si](C)(OC)CCCNC(C)=O FKAAOZRWMWTXRG-UHFFFAOYSA-N 0.000 claims description 2
- YZPARGTXKUIJLJ-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]aniline Chemical compound CO[Si](C)(OC)CCCNC1=CC=CC=C1 YZPARGTXKUIJLJ-UHFFFAOYSA-N 0.000 claims description 2
- SLTAOXPOORASCD-UHFFFAOYSA-N n-[3-[dimethoxy(methyl)silyl]propyl]butan-1-amine Chemical compound CCCCNCCC[Si](C)(OC)OC SLTAOXPOORASCD-UHFFFAOYSA-N 0.000 claims description 2
- WMORUEAGCZUGBD-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]-n-ethylethanamine Chemical compound CCO[Si](C)(OCC)CN(CC)CC WMORUEAGCZUGBD-UHFFFAOYSA-N 0.000 claims description 2
- REODOQPOCJZARG-UHFFFAOYSA-N n-[[diethoxy(methyl)silyl]methyl]cyclohexanamine Chemical compound CCO[Si](C)(OCC)CNC1CCCCC1 REODOQPOCJZARG-UHFFFAOYSA-N 0.000 claims description 2
- XJLLJYRJSZRGLI-UHFFFAOYSA-N n-[[methoxy-methyl-(2-methylpropyl)silyl]oxymethyl]ethanamine Chemical compound CCNCO[Si](C)(OC)CC(C)C XJLLJYRJSZRGLI-UHFFFAOYSA-N 0.000 claims description 2
- NWUQNVLDFRHZNJ-UHFFFAOYSA-N n-ethenyl-n-(3-triethoxysilylpropyl)aniline Chemical compound CCO[Si](OCC)(OCC)CCCN(C=C)C1=CC=CC=C1 NWUQNVLDFRHZNJ-UHFFFAOYSA-N 0.000 claims description 2
- YFFSUFPDFLRUAX-UHFFFAOYSA-N n-ethenyl-n-(3-trimethoxysilylpropyl)aniline Chemical compound CO[Si](OC)(OC)CCCN(C=C)C1=CC=CC=C1 YFFSUFPDFLRUAX-UHFFFAOYSA-N 0.000 claims description 2
- FRDNYWXDODPUJV-UHFFFAOYSA-N n-ethyl-2-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CCNCC(C)C[Si](OC)(OC)OC FRDNYWXDODPUJV-UHFFFAOYSA-N 0.000 claims description 2
- UMXXGDJOCQSQBV-UHFFFAOYSA-N n-ethyl-n-(triethoxysilylmethyl)ethanamine Chemical compound CCO[Si](OCC)(OCC)CN(CC)CC UMXXGDJOCQSQBV-UHFFFAOYSA-N 0.000 claims description 2
- DVYVMJLSUSGYMH-UHFFFAOYSA-N n-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CNCCC[Si](OC)(OC)OC DVYVMJLSUSGYMH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 239000010955 niobium Substances 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- 229910052762 osmium Inorganic materials 0.000 claims description 2
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 claims description 2
- FABOKLHQXVRECE-UHFFFAOYSA-N phenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 FABOKLHQXVRECE-UHFFFAOYSA-N 0.000 claims description 2
- 229920000767 polyaniline Polymers 0.000 claims description 2
- 229920001155 polypropylene Polymers 0.000 claims description 2
- 229920000128 polypyrrole Polymers 0.000 claims description 2
- 229910052707 ruthenium Inorganic materials 0.000 claims description 2
- MKAWPVONNWUREJ-UHFFFAOYSA-M sodium;methyl(3-trihydroxysilylpropoxy)phosphinate Chemical compound [Na+].CP([O-])(=O)OCCC[Si](O)(O)O MKAWPVONNWUREJ-UHFFFAOYSA-M 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 claims description 2
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 claims description 2
- 239000010936 titanium Substances 0.000 claims description 2
- 229910052719 titanium Inorganic materials 0.000 claims description 2
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 claims description 2
- WZIIZUZFKOQTEN-UHFFFAOYSA-N tributoxy(prop-1-en-2-yl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(C)=C WZIIZUZFKOQTEN-UHFFFAOYSA-N 0.000 claims description 2
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 claims description 2
- KEIBTGABMNALIT-UHFFFAOYSA-N triethoxy(2-isocyanatoethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCN=C=O KEIBTGABMNALIT-UHFFFAOYSA-N 0.000 claims description 2
- MMZPUXVBQAQQDQ-UHFFFAOYSA-N triethoxy(2-pyridin-4-ylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CCC1=CC=NC=C1 MMZPUXVBQAQQDQ-UHFFFAOYSA-N 0.000 claims description 2
- FRGPKMWIYVTFIQ-UHFFFAOYSA-N triethoxy(3-isocyanatopropyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCN=C=O FRGPKMWIYVTFIQ-UHFFFAOYSA-N 0.000 claims description 2
- NRYWFNLVRORSCA-UHFFFAOYSA-N triethoxy(6-triethoxysilylhexyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCC[Si](OCC)(OCC)OCC NRYWFNLVRORSCA-UHFFFAOYSA-N 0.000 claims description 2
- OSAJVUUALHWJEM-UHFFFAOYSA-N triethoxy(8-triethoxysilyloctyl)silane Chemical compound CCO[Si](OCC)(OCC)CCCCCCCC[Si](OCC)(OCC)OCC OSAJVUUALHWJEM-UHFFFAOYSA-N 0.000 claims description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 claims description 2
- BOTMPGMIDPRZGP-UHFFFAOYSA-N triethoxy(isocyanatomethyl)silane Chemical compound CCO[Si](OCC)(OCC)CN=C=O BOTMPGMIDPRZGP-UHFFFAOYSA-N 0.000 claims description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims description 2
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 claims description 2
- HPXYNXVPCURWAZ-UHFFFAOYSA-N triethoxy(prop-1-en-2-yl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)=C HPXYNXVPCURWAZ-UHFFFAOYSA-N 0.000 claims description 2
- NIINUVYELHEORX-UHFFFAOYSA-N triethoxy(triethoxysilylmethyl)silane Chemical compound CCO[Si](OCC)(OCC)C[Si](OCC)(OCC)OCC NIINUVYELHEORX-UHFFFAOYSA-N 0.000 claims description 2
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 claims description 2
- HPEPIADELDNCED-UHFFFAOYSA-N triethoxysilylmethanol Chemical compound CCO[Si](CO)(OCC)OCC HPEPIADELDNCED-UHFFFAOYSA-N 0.000 claims description 2
- CSDVDSUBFYNSMC-UHFFFAOYSA-N triethoxysilylmethyl acetate Chemical compound CCO[Si](OCC)(OCC)COC(C)=O CSDVDSUBFYNSMC-UHFFFAOYSA-N 0.000 claims description 2
- QYBKVVRRGQSGDC-UHFFFAOYSA-N triethyl methyl silicate Chemical compound CCO[Si](OC)(OCC)OCC QYBKVVRRGQSGDC-UHFFFAOYSA-N 0.000 claims description 2
- CXZMPNCYSOLUEK-UHFFFAOYSA-N triethyl propyl silicate Chemical compound CCCO[Si](OCC)(OCC)OCC CXZMPNCYSOLUEK-UHFFFAOYSA-N 0.000 claims description 2
- QQAMNGHGALAGAS-UHFFFAOYSA-N trimethoxy(2-prop-1-en-2-yloxyethyl)silane Chemical compound CO[Si](OC)(OC)CCOC(C)=C QQAMNGHGALAGAS-UHFFFAOYSA-N 0.000 claims description 2
- XVZMLSWFBPLMEA-UHFFFAOYSA-N trimethoxy(2-pyridin-2-ylethyl)silane Chemical compound CO[Si](OC)(OC)CCC1=CC=CC=N1 XVZMLSWFBPLMEA-UHFFFAOYSA-N 0.000 claims description 2
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 claims description 2
- JPMBLOQPQSYOMC-UHFFFAOYSA-N trimethoxy(3-methoxypropyl)silane Chemical compound COCCC[Si](OC)(OC)OC JPMBLOQPQSYOMC-UHFFFAOYSA-N 0.000 claims description 2
- FTDRQHXSYGDMNJ-UHFFFAOYSA-N trimethoxy(3-pyrrol-1-ylpropyl)silane Chemical compound CO[Si](OC)(OC)CCCN1C=CC=C1 FTDRQHXSYGDMNJ-UHFFFAOYSA-N 0.000 claims description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 claims description 2
- VRSBZTSRTUAWOY-UHFFFAOYSA-N trimethoxy(prop-1-en-2-yl)silane Chemical compound CO[Si](OC)(OC)C(C)=C VRSBZTSRTUAWOY-UHFFFAOYSA-N 0.000 claims description 2
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 claims description 2
- JGUUIHSLFPRUSA-UHFFFAOYSA-N trimethoxy-[2-(2-pyridin-2-ylethylsulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)SCCC1=CC=CC=N1 JGUUIHSLFPRUSA-UHFFFAOYSA-N 0.000 claims description 2
- MQGPKQPSPLQBBD-UHFFFAOYSA-N trimethoxy-[2-(2-pyridin-4-ylethylsulfanyl)propyl]silane Chemical compound CO[Si](OC)(OC)CC(C)SCCC1=CC=NC=C1 MQGPKQPSPLQBBD-UHFFFAOYSA-N 0.000 claims description 2
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 claims description 2
- MAFQBSQRZKWGGE-UHFFFAOYSA-N trimethoxy-[2-[4-(2-trimethoxysilylethyl)phenyl]ethyl]silane Chemical compound CO[Si](OC)(OC)CCC1=CC=C(CC[Si](OC)(OC)OC)C=C1 MAFQBSQRZKWGGE-UHFFFAOYSA-N 0.000 claims description 2
- ZHCRUFFDSVZNLM-UHFFFAOYSA-N trimethoxy-[3-(2-methylprop-2-enoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC(C)=C ZHCRUFFDSVZNLM-UHFFFAOYSA-N 0.000 claims description 2
- KRIUTXYABPSKPN-UHFFFAOYSA-N trimethoxy-[3-[2-[2-(2-methoxyethoxy)ethoxy]ethoxy]propyl]silane Chemical compound COCCOCCOCCOCCC[Si](OC)(OC)OC KRIUTXYABPSKPN-UHFFFAOYSA-N 0.000 claims description 2
- VEUVMSUEDGSSFT-UHFFFAOYSA-N trimethoxy-[phenyl(trimethoxysilyl)methyl]silane Chemical compound CO[Si](OC)(OC)C([Si](OC)(OC)OC)C1=CC=CC=C1 VEUVMSUEDGSSFT-UHFFFAOYSA-N 0.000 claims description 2
- IJQHYEFNLXHUGV-UHFFFAOYSA-N trimethoxysilylmethyl acetate Chemical compound CO[Si](OC)(OC)COC(C)=O IJQHYEFNLXHUGV-UHFFFAOYSA-N 0.000 claims description 2
- WKEXHTMMGBYMTA-UHFFFAOYSA-N trimethyl propyl silicate Chemical compound CCCO[Si](OC)(OC)OC WKEXHTMMGBYMTA-UHFFFAOYSA-N 0.000 claims description 2
- CIOXFKGQNIJXKF-UHFFFAOYSA-N tris(2-methoxyethoxy)silane Chemical compound COCCO[SiH](OCCOC)OCCOC CIOXFKGQNIJXKF-UHFFFAOYSA-N 0.000 claims description 2
- ITSHRZUAZCEILC-UHFFFAOYSA-K trisodium N'-(3-dimethoxysilylbutyl)ethane-1,2-diamine triacetate Chemical compound C(C)(=O)[O-].C(C)(=O)[O-].C(C)(=O)[O-].[Na+].CC(CCNCCN)[SiH](OC)OC.[Na+].[Na+] ITSHRZUAZCEILC-UHFFFAOYSA-K 0.000 claims description 2
- FRGBDYDAIWEXJX-UHFFFAOYSA-K trisodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(3-trimethoxysilylpropyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].CO[Si](OC)(OC)CCCN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O FRGBDYDAIWEXJX-UHFFFAOYSA-K 0.000 claims description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 239000010937 tungsten Substances 0.000 claims description 2
- 150000004676 glycans Chemical class 0.000 claims 1
- 230000008569 process Effects 0.000 abstract description 4
- 239000000203 mixture Substances 0.000 description 85
- 239000010410 layer Substances 0.000 description 57
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 37
- 238000000576 coating method Methods 0.000 description 32
- 239000011248 coating agent Substances 0.000 description 30
- 238000009472 formulation Methods 0.000 description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 22
- 239000000243 solution Substances 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 13
- 239000000463 material Substances 0.000 description 13
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 12
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 12
- 125000000217 alkyl group Chemical group 0.000 description 12
- 238000001035 drying Methods 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 11
- 125000003118 aryl group Chemical group 0.000 description 10
- 239000004020 conductor Substances 0.000 description 10
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 9
- 235000010980 cellulose Nutrition 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 239000011230 binding agent Substances 0.000 description 8
- 230000003287 optical effect Effects 0.000 description 8
- 229920000139 polyethylene terephthalate Polymers 0.000 description 8
- 239000005020 polyethylene terephthalate Substances 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 7
- 125000003342 alkenyl group Chemical group 0.000 description 7
- 239000002585 base Substances 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 239000001913 cellulose Substances 0.000 description 7
- 229920000172 poly(styrenesulfonic acid) Polymers 0.000 description 7
- 229940005642 polystyrene sulfonic acid Drugs 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- LJDSTRZHPWMDPG-UHFFFAOYSA-N 2-(butylamino)ethanol Chemical compound CCCCNCCO LJDSTRZHPWMDPG-UHFFFAOYSA-N 0.000 description 6
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- 229920000144 PEDOT:PSS Polymers 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- 239000000654 additive Substances 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 229910021393 carbon nanotube Inorganic materials 0.000 description 5
- 239000002041 carbon nanotube Substances 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 125000000623 heterocyclic group Chemical group 0.000 description 5
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 239000004094 surface-active agent Substances 0.000 description 5
- 238000003786 synthesis reaction Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RZXLPPRPEOUENN-UHFFFAOYSA-N Chlorfenson Chemical compound C1=CC(Cl)=CC=C1OS(=O)(=O)C1=CC=C(Cl)C=C1 RZXLPPRPEOUENN-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 4
- 239000012790 adhesive layer Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 4
- 150000002169 ethanolamines Chemical class 0.000 description 4
- 230000007062 hydrolysis Effects 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- 229910044991 metal oxide Inorganic materials 0.000 description 4
- 150000004706 metal oxides Chemical class 0.000 description 4
- 150000004804 polysaccharides Chemical class 0.000 description 4
- 239000000523 sample Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 229920002554 vinyl polymer Polymers 0.000 description 4
- FOGYNLXERPKEGN-UHFFFAOYSA-N 3-(2-hydroxy-3-methoxyphenyl)-2-[2-methoxy-4-(3-sulfopropyl)phenoxy]propane-1-sulfonic acid Chemical compound COC1=CC=CC(CC(CS(O)(=O)=O)OC=2C(=CC(CCCS(O)(=O)=O)=CC=2)OC)=C1O FOGYNLXERPKEGN-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 244000303965 Cyamopsis psoralioides Species 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 239000002202 Polyethylene glycol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 150000003973 alkyl amines Chemical class 0.000 description 3
- 125000000304 alkynyl group Chemical group 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 229910001870 ammonium persulfate Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000002019 doping agent Substances 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- 239000003112 inhibitor Substances 0.000 description 3
- 239000003960 organic solvent Substances 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 238000006068 polycondensation reaction Methods 0.000 description 3
- 229920001223 polyethylene glycol Polymers 0.000 description 3
- 239000013460 polyoxometalate Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- CXWXQJXEFPUFDZ-UHFFFAOYSA-N tetralin Chemical compound C1=CC=C2CCCCC2=C1 CXWXQJXEFPUFDZ-UHFFFAOYSA-N 0.000 description 3
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- YBYIRNPNPLQARY-UHFFFAOYSA-N 1H-indene Chemical compound C1=CC=C2CC=CC2=C1 YBYIRNPNPLQARY-UHFFFAOYSA-N 0.000 description 2
- KZTWONRVIPPDKH-UHFFFAOYSA-N 2-(piperidin-1-yl)ethanol Chemical compound OCCN1CCCCC1 KZTWONRVIPPDKH-UHFFFAOYSA-N 0.000 description 2
- DVFGEIYOLIFSRX-UHFFFAOYSA-N 3-(2-ethylhexoxy)propan-1-amine Chemical compound CCCCC(CC)COCCCN DVFGEIYOLIFSRX-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 101100248240 Arabidopsis thaliana RH35 gene Proteins 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 2
- 229920002799 BoPET Polymers 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229920002274 Nalgene Polymers 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 229940022682 acetone Drugs 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 125000002723 alicyclic group Chemical group 0.000 description 2
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 150000007514 bases Chemical class 0.000 description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 229940043232 butyl acetate Drugs 0.000 description 2
- 125000002837 carbocyclic group Chemical group 0.000 description 2
- 150000007942 carboxylates Chemical class 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- LVTYICIALWPMFW-UHFFFAOYSA-N diisopropanolamine Chemical compound CC(O)CNCC(C)O LVTYICIALWPMFW-UHFFFAOYSA-N 0.000 description 2
- 238000003618 dip coating Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004070 electrodeposition Methods 0.000 description 2
- 239000004210 ether based solvent Substances 0.000 description 2
- 235000019439 ethyl acetate Nutrition 0.000 description 2
- 229940093499 ethyl acetate Drugs 0.000 description 2
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 125000001072 heteroaryl group Chemical group 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
- 239000011254 layer-forming composition Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 229940032007 methylethyl ketone Drugs 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- SLCVBVWXLSEKPL-UHFFFAOYSA-N neopentyl glycol Chemical compound OCC(C)(C)CO SLCVBVWXLSEKPL-UHFFFAOYSA-N 0.000 description 2
- 125000000962 organic group Chemical group 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000009832 plasma treatment Methods 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 239000004800 polyvinyl chloride Substances 0.000 description 2
- 150000003152 propanolamines Chemical class 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000012748 slip agent Substances 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000001308 synthesis method Methods 0.000 description 2
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- 239000004034 viscosity adjusting agent Substances 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- ICMJHPBQTVWCNT-UHFFFAOYSA-N 1-(dibutylamino)propan-2-ol Chemical compound CCCCN(CC(C)O)CCCC ICMJHPBQTVWCNT-UHFFFAOYSA-N 0.000 description 1
- GODZNYBQGNSJJN-UHFFFAOYSA-N 1-aminoethane-1,2-diol Chemical compound NC(O)CO GODZNYBQGNSJJN-UHFFFAOYSA-N 0.000 description 1
- ZRUPXAZUXDFLTG-UHFFFAOYSA-N 1-aminopentan-2-ol Chemical compound CCCC(O)CN ZRUPXAZUXDFLTG-UHFFFAOYSA-N 0.000 description 1
- IANQTJSKSUMEQM-UHFFFAOYSA-N 1-benzofuran Chemical compound C1=CC=C2OC=CC2=C1 IANQTJSKSUMEQM-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 1
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- IWSZDQRGNFLMJS-UHFFFAOYSA-N 2-(dibutylamino)ethanol Chemical compound CCCCN(CCO)CCCC IWSZDQRGNFLMJS-UHFFFAOYSA-N 0.000 description 1
- KKFDCBRMNNSAAW-UHFFFAOYSA-N 2-(morpholin-4-yl)ethanol Chemical compound OCCN1CCOCC1 KKFDCBRMNNSAAW-UHFFFAOYSA-N 0.000 description 1
- HYVGFUIWHXLVNV-UHFFFAOYSA-N 2-(n-ethylanilino)ethanol Chemical compound OCCN(CC)C1=CC=CC=C1 HYVGFUIWHXLVNV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- GVNHOISKXMSMPX-UHFFFAOYSA-N 2-[butyl(2-hydroxyethyl)amino]ethanol Chemical compound CCCCN(CCO)CCO GVNHOISKXMSMPX-UHFFFAOYSA-N 0.000 description 1
- HHPDFYDITNAMAM-UHFFFAOYSA-N 2-[cyclohexyl(2-hydroxyethyl)amino]ethanol Chemical compound OCCN(CCO)C1CCCCC1 HHPDFYDITNAMAM-UHFFFAOYSA-N 0.000 description 1
- OJPDDQSCZGTACX-UHFFFAOYSA-N 2-[n-(2-hydroxyethyl)anilino]ethanol Chemical compound OCCN(CCO)C1=CC=CC=C1 OJPDDQSCZGTACX-UHFFFAOYSA-N 0.000 description 1
- MSIAFRBGOYFCND-UHFFFAOYSA-N 2-amino-1-cyclohexylethanol Chemical compound NCC(O)C1CCCCC1 MSIAFRBGOYFCND-UHFFFAOYSA-N 0.000 description 1
- MWGATWIBSKHFMR-UHFFFAOYSA-N 2-anilinoethanol Chemical compound OCCNC1=CC=CC=C1 MWGATWIBSKHFMR-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- WVUGKLPVHGFHKM-UHFFFAOYSA-N 4-(2-aminoethylamino)hexan-3-ol Chemical compound NCCNC(C(CC)O)CC WVUGKLPVHGFHKM-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- FTGIHCSSXPBYMX-UHFFFAOYSA-N 4-(4-hydroxybutylamino)butan-1-ol Chemical compound OCCCCNCCCCO FTGIHCSSXPBYMX-UHFFFAOYSA-N 0.000 description 1
- QBZYRSGKGIAAQC-UHFFFAOYSA-N 5-amino-4-(methylamino)pentan-1-ol Chemical compound NCC(CCCO)NC QBZYRSGKGIAAQC-UHFFFAOYSA-N 0.000 description 1
- 244000215068 Acacia senegal Species 0.000 description 1
- 229920001817 Agar Polymers 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 229920000945 Amylopectin Polymers 0.000 description 1
- 229920000856 Amylose Polymers 0.000 description 1
- 229920000189 Arabinogalactan Polymers 0.000 description 1
- 241000531908 Aramides Species 0.000 description 1
- 241000416162 Astragalus gummifer Species 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- 240000008886 Ceratonia siliqua Species 0.000 description 1
- 235000013912 Ceratonia siliqua Nutrition 0.000 description 1
- 229920002101 Chitin Polymers 0.000 description 1
- 229920001661 Chitosan Polymers 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- 229920002307 Dextran Polymers 0.000 description 1
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 239000001692 EU approved anti-caking agent Substances 0.000 description 1
- 229920000926 Galactomannan Polymers 0.000 description 1
- 229920001503 Glucan Polymers 0.000 description 1
- 229920002581 Glucomannan Polymers 0.000 description 1
- 229920001706 Glucuronoxylan Polymers 0.000 description 1
- 229920002527 Glycogen Polymers 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000663 Hydroxyethyl cellulose Polymers 0.000 description 1
- 229920001479 Hydroxyethyl methyl cellulose Polymers 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- 241000219730 Lathyrus aphaca Species 0.000 description 1
- 240000003183 Manihot esculenta Species 0.000 description 1
- 235000016735 Manihot esculenta subsp esculenta Nutrition 0.000 description 1
- 229920000057 Mannan Polymers 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 229920002230 Pectic acid Polymers 0.000 description 1
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 229920002396 Polyurea Polymers 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- WUGQZFFCHPXWKQ-UHFFFAOYSA-N Propanolamine Chemical compound NCCCO WUGQZFFCHPXWKQ-UHFFFAOYSA-N 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 244000061456 Solanum tuberosum Species 0.000 description 1
- 235000002595 Solanum tuberosum Nutrition 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 240000001058 Sterculia urens Species 0.000 description 1
- 235000015125 Sterculia urens Nutrition 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical compound OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 1
- 229920001615 Tragacanth Polymers 0.000 description 1
- SLINHMUFWFWBMU-UHFFFAOYSA-N Triisopropanolamine Chemical compound CC(O)CN(CC(C)O)CC(C)O SLINHMUFWFWBMU-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- 235000021307 Triticum Nutrition 0.000 description 1
- 244000098338 Triticum aestivum Species 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229920002433 Vinyl chloride-vinyl acetate copolymer Polymers 0.000 description 1
- 229920002000 Xyloglucan Polymers 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 235000005824 Zea mays ssp. parviglumis Nutrition 0.000 description 1
- 235000002017 Zea mays subsp mays Nutrition 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- YIMQCDZDWXUDCA-UHFFFAOYSA-N [4-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1CCC(CO)CC1 YIMQCDZDWXUDCA-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 235000010419 agar Nutrition 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 125000003158 alcohol group Chemical group 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 125000002877 alkyl aryl group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003368 amide group Chemical group 0.000 description 1
- LHIJANUOQQMGNT-UHFFFAOYSA-N aminoethylethanolamine Chemical compound NCCNCCO LHIJANUOQQMGNT-UHFFFAOYSA-N 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 239000004599 antimicrobial Substances 0.000 description 1
- 239000002216 antistatic agent Substances 0.000 description 1
- 235000019312 arabinogalactan Nutrition 0.000 description 1
- 229920000617 arabinoxylan Polymers 0.000 description 1
- 150000004783 arabinoxylans Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 239000002981 blocking agent Substances 0.000 description 1
- CDQSJQSWAWPGKG-UHFFFAOYSA-N butane-1,1-diol Chemical compound CCCC(O)O CDQSJQSWAWPGKG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 239000003575 carbonaceous material Substances 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 229920001525 carrageenan Polymers 0.000 description 1
- 235000010418 carrageenan Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 239000012986 chain transfer agent Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000011231 conductive filler Substances 0.000 description 1
- 235000005822 corn Nutrition 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 125000006448 cycloalkyl cycloalkyl group Chemical group 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000001983 dialkylethers Chemical class 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- 229940043276 diisopropanolamine Drugs 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 235000019326 ethyl hydroxyethyl cellulose Nutrition 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 229920003089 ethylhydroxy ethyl cellulose Polymers 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012847 fine chemical Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 125000001153 fluoro group Chemical group F* 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000002541 furyl group Chemical group 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 229940096919 glycogen Drugs 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004404 heteroalkyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 229920013821 hydroxy alkyl cellulose Polymers 0.000 description 1
- 235000019447 hydroxyethyl cellulose Nutrition 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 229920003088 hydroxypropyl methyl cellulose Polymers 0.000 description 1
- 235000010979 hydroxypropyl methyl cellulose Nutrition 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 229940011051 isopropyl acetate Drugs 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000005956 isoquinolyl group Chemical group 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N isovaleric acid Chemical compound CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 239000005453 ketone based solvent Substances 0.000 description 1
- 229920005610 lignin Polymers 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- LUEWUZLMQUOBSB-GFVSVBBRSA-N mannan Chemical class O[C@H]1[C@@H](O)[C@H](O)[C@@H](CO)O[C@H]1O[C@@H]1[C@@H](CO)O[C@@H](O[C@@H]2[C@H](O[C@@H](O[C@H]3[C@H](O[C@@H](O)[C@@H](O)[C@H]3O)CO)[C@@H](O)[C@H]2O)CO)[C@H](O)[C@H]1O LUEWUZLMQUOBSB-GFVSVBBRSA-N 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229920000609 methyl cellulose Polymers 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 235000010981 methylcellulose Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 125000004370 n-butenyl group Chemical group [H]\C([H])=C(/[H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- SLIUAWYAILUBJU-UHFFFAOYSA-N pentacene Chemical compound C1=CC=CC2=CC3=CC4=CC5=CC=CC=C5C=C4C=C3C=C21 SLIUAWYAILUBJU-UHFFFAOYSA-N 0.000 description 1
- RUOPINZRYMFPBF-UHFFFAOYSA-N pentane-1,3-diol Chemical compound CCC(O)CCO RUOPINZRYMFPBF-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920006122 polyamide resin Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920002959 polymer blend Polymers 0.000 description 1
- 238000004917 polyol method Methods 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- 235000013772 propylene glycol Nutrition 0.000 description 1
- 229960004063 propylene glycol Drugs 0.000 description 1
- 125000000561 purinyl group Chemical group N1=C(N=C2N=CNC2=C1)* 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- 125000005493 quinolyl group Chemical group 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 238000007764 slot die coating Methods 0.000 description 1
- 239000004984 smart glass Substances 0.000 description 1
- 238000010129 solution processing Methods 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000005987 sulfurization reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 229920001221 xylan Polymers 0.000 description 1
- 150000004823 xylans Chemical class 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
- H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones
Definitions
- the present invention concerns an electrode assembly comprising at least: a substrate, a conductive layer formed on the substrate comprising at least a metal nanowires, and a polysiloxane-based layer formed on the conductive layer; and a process for the production of said electrode assembly.
- Transparent conductors are optically transparent, thin conductive materials. Such materials have a wide variety of applications, such as transparent electrodes in displays such as liquid crystal displays (LCD), light emitting diode (LED) displays, plasma displays, and organic light-emitting diode (OLED) displays, electroluminescent display displays (ELD), electrophoretic display (EPD), LED lighting, OLED lighting, touch panels, photovoltaic cells, electrochromic devices, smart windows, as anti-static layers and as electromagnetic interference shielding layers, and as resistive heaters.
- LCD liquid crystal displays
- LED light emitting diode
- OLED electroluminescent display displays
- EPD electrophoretic display
- LED lighting OLED lighting
- touch panels photovoltaic cells
- electrochromic devices smart windows, as anti-static layers and as electromagnetic interference shielding layers, and as resistive heaters.
- ITO indium tin oxide
- Conventional transparent conductors include metal oxide films, in particular indium tin oxide (ITO) film due to its relatively high transparency at high conductivity.
- ITO has several shortcomings, such as high cost during its fabrication because it needs to be deposited using sputtering technique which involves the use of high temperatures and vacuum chambers.
- Metal oxide films are also fragile and prone to damage even when subjected to minor physical stresses such as bending, and as such, often does not applicable when a flexible substrate on which the metal oxide film is to be deposited is used.
- Conductive polymers have a good flexibility and are often considered to be inexpensive because they can be formed by simple processing. Having these characteristics, it is believed that conductive polymer compositions are among the potential candidates to replace ITO film in forming the transparent conductor for various electronic device applications.
- Metal nanowires are considered as another promising candidate to replace the commonly-used ITO due to its high dc conductivity and optical transmittance, and good mechanical flexibility, etc.
- composite transparent conductors which comprise conductive medium based on metal nanowires and a secondary conductive medium based on a continuous conductive film.
- Development of conductive composition which can be suitably used for forming high quality transparent conductors, in particular those having not only satisfactory conductivity, transparency, and/or haze, but also an excellent reliability of at least one or all of them, is desired in the art.
- the purpose of the present invention is therefore to provide an electrode assembly comprising at least:
- the electrode assembly according to the present invention exhibits a desirable sheet resistance as well as excellent reliability of the sheet resistance for an extended time period.
- the electrode assembly can also display good conductivity, transparency, and/or low haze.
- the conductor assembly of the present invention surprisingly exhibits an outstanding reliability of said properties over an extended time period, notably at a temperature comprised between 0 and 60°C. Said electrode assembly can be suitably used for touch panel and display applications.
- polysiloxane layer provides a higher contact angle and lower haze in comparison with a classical UV coating and the use of such a polysiloxane layer notably permit to increase the transmittance of the film in comparison with the conductive layer alone, while the use of a classical UV coating is substantially decreasing said transmittance in comparison with the use of the conductive layer alone.
- the invention also concerns a method for the production of an electrode assembly comprising at least the steps of:
- the present invention provides an electronic device, in particular touch panel and display, comprising the electrode assembly according to the present invention.
- Ratios, concentrations, amounts, and other numerical data may be presented herein in a range format. It is to be understood that such range format is used merely for convenience and brevity and should be interpreted flexibly to include not only the numerical values explicitly recited as the limits of the range, but also to include all the individual numerical values or sub-ranges encompassed within that range as if each numerical value and sub-range is explicitly recited.
- a temperature range of about 120°C to about 150°C should be interpreted to include not only the explicitly recited limits of about 120°C to about 150°C, but also to include sub-ranges, such as 125°C to 145°C, 130°C to 150°C, and so forth, as well as individual amounts, including fractional amounts, within the specified ranges, such as 122.2°C, 140.6°C, and 141.3°C, for example.
- hydrocarbon group refers to a group mainly consisting of carbon atoms and hydrogen atoms, which group may be saturated or unsaturated, linear, branched or cyclic, aliphatic or aromatic. Hydrocarbon groups of the present invention may be alkyl groups, alkenyl groups, alkynyl groups, aryl groups, alkylaryl groups, aryalkyl groups, heterocyclic groups, and/or alkylheterocyclic groups.
- n and m are each integers, indicates that the group may contain from n carbon atoms to m carbon atoms per group.
- alkyl groups include saturated hydrocarbons having one or more carbon atoms, including straight-chain alkyl groups, such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, cyclic alkyl groups (or "cycloalkyl” or “alicyclic” or “carbocyclic” groups), such as cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl, branched-chain alkyl groups, such as isopropyl, tert-butyl, sec-butyl, and isobutyl, and alkyl-substituted alkyl groups, such as alkyl-substituted cycloalkyl groups and cycloalkyl-substituted alkyl groups.
- aliphatic group includes organic moieties characterized by straight or branched-chains, typically having between 1 and 22 carbon atoms. In complex structures, the chains may be branched, bridged, or cross-linked. Aliphatic groups include alkyl groups, alkenyl groups, and alkynyl groups.
- alkenyl or “alkenyl group” refers to an aliphatic hydrocarbon radical which can be straight or branched, containing at least one carbon-carbon double bond.
- alkenyl groups include, but are not limited to, ethenyl, propenyl, n-butenyl, i-butenyl, 3-methylbut-2-enyl, n-pentenyl, heptenyl, octenyl, decenyl, and the like.
- alkynyl refers to straight or branched chain hydrocarbon groups having at least one triple carbon to carbon bond, such as ethynyl.
- aryl group includes unsaturated and aromatic cyclic hydrocarbons as well as unsaturated and aromatic heterocycles containing one or more rings.
- Aryl groups may also be fused or bridged with alicyclic or heterocyclic rings that are not aromatic so as to form a polycycle, such as tetralin.
- An "arylene” group is a divalent analog of an aryl group.
- heterocyclic group includes closed ring structures analogous to carbocyclic groups in which one or more of the carbon atoms in the ring is an element other than carbon, for example, nitrogen, sulfur, or oxygen. Heterocyclic groups may be saturated or unsaturated. Additionally, heterocyclic groups, such as pyrrolyl, pyridyl, isoquinolyl, quinolyl, purinyl, and furyl, may have aromatic character, in which case they may be referred to as “heteroaryl” or “heteroaromatic” groups.
- boiling point generally denotes the normal boiling point (also called the atmospheric boiling point or the atmospheric pressure boiling point) of a liquid; it corresponds to the case in which the vapor pressure of the liquid equals the defined atmospheric pressure at sea level, 1 atmosphere. It can be measured using a regular scale distillation procedure.
- Substrate of the present invention may be a variety of base materials that can be used depending on the purpose as long as the base material can bear the conductive layer. Generally, a plate-like base material or a sheet-like base material is used.
- the substrate may be transparent or opaque.
- a material that forms the substrate include transparent glass such as white plate glass, blue plate glass and silica-coated blue plate glass; synthesis resins such as polycarbonates, polyethersulfones, polyesters, acrylic resins, vinyl chloride resins, aromatic polyamide resins, polyamideimides and polyimides; metal such as aluminum, copper, nickel and stainless steel; additionally, ceramics, silicon wafers used for semiconductor substrates, and the like.
- a surface of the base material on which the conductive layer is formed can be subjected to a pretreatment such as a chemical treatment using a silane coupling agent or the like, a plasma treatment, ion plating, sputtering, a gas-phase reaction or vacuum deposition as desired.
- a substrate with a thickness in a desired range depending on the use may be used.
- the thickness is generally selected from a range of from 1 ⁇ m to 500 ⁇ m, more preferably from 3 ⁇ m to 400 and still more preferably from 5 ⁇ m to 300 ⁇ m.
- the substrate may be transparent and having a total visible light transmittance from 60% to 100%, preferably from 85% to 100%, and still more preferably from 90% to 100%, in the visible light region (400 nm to 700 nm). Meanwhile, the total light transmittance of the substrate may be measured based on JIS K 7361-1:1997.
- Such substrates include a glass substrate, and transparent solid polymers, for example polycarbonates (PC), polyesters, such as polyethyleneterephthalate (PET), acryl resins, polyvinyl resins, such as polyvinyl chloride, polyvinylidene chloride, and polyvinyl acetals, aromatic polyamide resins, polyamideimides, polyethylene naphthalene dicarboxylate, polysulphones, such as polyethersulfone (PES), polyimides (PI), cyclic olefin copolymers (COC), styrene copolymers, polyethylene, polypropylene, cellulose ester bases, such as cellulose triacetate, and cellulose acetate, and any combination thereof.
- PC polycarbonates
- PET polyethyleneterephthalate
- acryl resins polyvinyl resins, such as polyvinyl chloride, polyvinylidene chloride, and polyvinyl acetals
- aromatic polyamide resins polyamideimides
- the substrate is in the form of a sheet.
- the substrate may be rigid or flexible.
- the flexible substrate include, but are not limited to, those transparent solid polymers, including polycarbonates, polyesters, polyolefins, polyvinyls, cellulose ester bases, polysulphones, polyimides, and other conventional polymeric films, or adhesive layers embedded in specific display structures.
- the substrate may notably comprise an adhesive layer formed on the substrate.
- an adhesive layer might be called as a hard coat layer, or a hardcoat.
- An adhesive layer may refer to any optically clear material that bonds two adjacent layers (e.g. conductive layer and substrate) together with no or with very limited effect on the physical, electrical or optical properties of either layer. It is known that some types of adhesives can have a positive effect on the mechanical and optical properties of substrates.
- Adhesive material are well known in the art, including without limitation: acrylic resins, chlorinated olefin resins, resins of vinyl chloride-vinyl acetate copolymer, maleic acid resins, chlorinated rubber resins, cyclorubber resins, polyamide resins, cumarone indene resins, resins of ethylene-vinyl acetate copolymer, polyester resins, urethane resins, styrene resins, polysiloxanes and the like.
- the adhesion promoting monomers may be polymerized by conventional means such as radiation, thermal or redox curing with other vinyl monomers and prepolymers to form coatings, films or adhesives.
- the adhesive composition also may comprise various additives as needed to alter or enhance certain properties such as, for example, to improve weatherability, components to improve abrasion resistance, additives to enhance appearance, and materials to improve toughness and mechanical properties.
- additives that may be used in the coating composition of the present invention include, but are not limited to, photoinitiators; slip agents; leveling agents; wetting agents; adhesion promoters; anti-absorption agents; anti-foaming agents, such as, for example, mixtures of foam destroying polymers and polysiloxanes; accelerators; pigment dispersion aids; anti-blocking agents; anti-caking agents; anti-slip agents; anti-skinning agents; anti-static agents; anti-stripping agents; binders; curing agents; deaerators; diluents; dispersants; dryers; emulsifiers; fillers; flatting agents; flow control agents; gloss agents; hardeners; lubricants; mar resistance aids; whiteners; plasticizers;
- the coating composition may further comprise finely divided SiO 2 , Al 2 O 3 , ZrO 2 , or TiO 2 dispersed therein. These materials can modify the viscosity of the coating such that it may be applied easily and can enhance the abrasion resistance of the cured coating.
- the adhesive materials can be applied to the substrate by the customary techniques, for example by spin coating, slit coating, spraying, dipping, spreading or electrodeposition. In some cases, a plurality of coats may be applied.
- Conducive layer forming composition may comprise at least one metal nanowires and at least one solvent.
- the nanowires When deposited on the substrate, the nanowires are usually present so as to intersect each other to form a conductive metal nanowire network having plurality of intersections of metal nanowire.
- an average diameter of the metal nanowires is from 10 nm to 50 nm, preferably 15 nm to 35 nm, more preferably 18 nm to 25 nm, notably 18 to 23 nm.
- the diameter of the metal nanowires can be measured by transmission electron microscope (TEM).
- An average length of the metal nanowires in the present invention is often in the range of 1 ⁇ m to 100 ⁇ m.
- the average length of the metal nanowires is preferably at least 10 ⁇ m, more preferably more than 10 ⁇ m, still more preferably at least 15 ⁇ m.
- the average length of the metal nanowires is preferably equal to or less than 50 ⁇ m, more preferably equal to or less than 30 ⁇ m. In the present invention, the length of the metal nanowires can be measured by optical microscope.
- the aspect ratio of the metallic nanowires is preferably from 300 and 2000, preferably from 800 to 1200.
- the aspect ratio refers to a ratio of the average long axis length to the average short axis length.
- the aspect ratio can be computed using the average long axis length and the average short axis length computed using the above method.
- the metal nanowires can be nanowires formed of metal, metal alloys, plated metals or metal oxides.
- metallic nanowires formed of metal or a metallic compound are preferable, and metallic nanowires formed of metal are more preferable.
- the metal is preferably at least one kind of metal chosen in the group constituted by Periods 4, 5 and 6 of the long-form periodic table (IUPAC 1991), more preferably at least one kind of metal selected from Groups 2 to 14, and still more preferably at least one kind of metal selected from Groups 2, 8, 9, 10, 11, 12, 13 and 14.
- the metal is particularly preferably included as a main component.
- Specific examples of the metal include copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium, iron, ruthenium, osmium, manganese, molybdenum, tungsten, niobium, tantalum, titanium, bismuth, antimony, lead, alloys thereof and the like.
- copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium or an alloy thereof is preferable, and palladium, copper, silver, gold, platinum, tin or an alloy thereof is more preferable, and silver or an alloy containing silver is particularly preferable.
- metal nanowires examples include, but are not limited to, silver nanowires, gold nanowires, copper nanowires, nickel nanowires, gold-plated silver nanowires, platinum nanowires, and palladium nanowires.
- the metal nanowires in the composition preferably comprise silver nanowires. Silver nanowires are the most preferred metal nanowires in the present invention because of its high electrical conductivity.
- Such silver nanowires may be prepared via the synthesis methods known in the art. For instance, so-called “polyol method” may be used for the synthesis of the silver nanowires to be used in the present invention. Reference can be made to Sun et al., "Crystalline silver nanowires by soft solution processing", Nanoletters, (2002), 2(2) 165-168 .
- the metal nanowires are used in the amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.5wt%, notably 0.05 to 0.2 wt %, relative to the total weight of the composition.
- the composition comprising the metal nanowires in the amount of 0.01 to 1.0 wt % relative to the total weight of the composition can exhibit particularly good conductivity, transparency and/or haze.
- the conductive layer composition may notably be a dispersion.
- At least one solvent to constitute the composition can be chosen among those chosen in the group constituted by water; aliphatic alcohols, such as methanol, ethanol, isopropanol, butanol, n-propylalcohol, ethylene glycol, propylene glycol, butanediol, neopentyl glycol, 1,3-pentanediol, 1,4-cyclohexanedimethanol, diethyleneglycol, polyethelene glycol, polybutylene glycol, dimethylolpropane, trimethylolpropane, sorbitol, esterification products of the afore-mentioned alcohols ; aliphatic ketones, such as cellosolve, propyleneglycol methylether, diacetone alcohol, ethylacetate, butylacetate, acetone and methylethylketone ; ethers such as tetrahydrofuran, dibutyl ether, mono- and
- composition may also comprise at least one ⁇ -conjugated conductive polymer.
- a ⁇ -conjugated conductive polymer is understood to denote in particular any polymeric materials that conduct electricity.
- the ⁇ -conjugated conductive polymers can be, for example, dissolved or dispersed in the solvent.
- the conductive polymers are dispersed in water and/or alcohol.
- An electrically conductive polymer usually means any polymer or polymer blend that is inherently or intrinsically, without the addition of electrically conductive fillers such as carbon black or conductive metal particles, capable of electrical conductivity, more typically to any polymer or oligomer that exhibits a bulk specific conductance of greater than or equal to 10 -7 Siemens per centimeter (“S/cm").
- the ⁇ -conjugated conductive polymer may be chosen in the group constituted by polyaniline polymers, polypyrrole polymers, polythiophene polymers, and any combination thereof.
- the ⁇ -conjugated conductive polymer comprises a polydioxythiopene polymer that comprises monomeric units according to structure (I) per molecule of the polymer: wherein:
- all R 1 groups of the monomeric unit according to structure (I) are each H, alkyl, or alkenyl. In one embodiment, at least one R 1 groups of the monomeric unit according to structure (I) is not H. In one embodiment, each R 1 groups of the monomeric unit according to structure (I) is H.
- the electrically conductive polymer comprises an electrically conductive polythiophene homopolymer of monomeric units according to structure (I) wherein each R 1 is H and m is 2, known as poly(3,4-ethylenedioxythiophene), more typically referred to as "PEDOT".
- the PEDOT polymer is preferably doped with at least one further compound.
- One example of such compound for doping includes polymeric acid dopant, in particular a water soluble polymeric dopant.
- doped PEDOT polymers include PEDOT doped with lignosulfonic acid (LSA) (PEDOT/LSA), PEDOT doped with polyethyleneglycol (PEG) (PEDOT/PEG), PEDOT doped with polyoxometalate (POM) (PEDOT/POM), PEDOT doped with sufonated polyimide (SPI) (PEDOT/SPI), PEDOT doped with carbon materials, such as activated carbon, graphene and carbon nanotube (CNT) (activated carbon/PEDOT composite, PEDOT/graphene composite, or PEDOT/CNT composite), PEDOT doped with DMSO and CNT (PEDOT/DMSO/CNT), PEDOT doped with tosylate, PEDOT doped with chloride anion, PEDOT doped with NO 3 , PEDOT doped with PSS (
- the ⁇ -conjugated conductive polymer comprises at least one polythiophene polymer, preferably poly(3,4-ethylenedioxythiophene)(PEDOT) polymer, doped with at least one water soluble polymeric dopant, preferably polystyrene sulfonic acid (PSS).
- PEDOT poly(3,4-ethylenedioxythiophene)
- PSS polystyrene sulfonic acid
- the ratio of PEDOT and PSS is preferably from 5:95 to 50:50 by weight.
- the ⁇ -conjugated conductive polymer may be used in the amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.2 wt %, relative to the total weight of the composition.
- a composition comprising the ⁇ -conjugated conductive polymer in the amount of 0.01 to 1.0 wt % relative to the total weight of the composition can exhibit particularly good conductivity and transparency.
- the PEDOT:PSS co-doped with para -toluene sulfonic acid is especially preferred.
- the weight ratio between the ⁇ -conjugated conductive polymer and the metal nanowires in the composition is preferably 1:0.5-1:5, more preferably 1:1-1:3.
- the composition comprising the ⁇ -conjugated conductive polymer and the metal nanowires in said range may attain well-balanced conductivity and optical properties.
- incorporation of the ⁇ -conjugated conductive polymer into the composition comprising at least one metal nanowires may prevent oxidation and/or degradation of the metal nanowires and/or it conductive network. Also, such incorporation allows increased conductivity compared to the conductive system solely based on the metal nanowire network.
- the composition may also comprise at least one binder.
- the binder may be an organic compound, an inorganic compound, or a hybrid compound thereof.
- the organic binder include polyesters, such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polyimides, such as polyimide, and polyamideimide; polyamides, such as polyamide 6, polyamide 6,6, polyamide 12, and polyamide 11; fluororesins, such as polyvinylidene fluoride, polyvinyl fluoride, polytetrafluoroethylene, ethylenetetrafluoroethylene copolymer, and polychlorotrifluoroethylene; vinyl resins, such as polyvinyl alcohol, polyvinyl ether, polyvinyl butyral, polyvinyl acetate, and polyvinyl chloride; epoxy resin; oxetane resin; xylene resin; aramide resin; polyimide silicon; polyurethane; polyurea; melamine resin
- the binder when present, is typically used in an amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.2 wt %, relative to the total weight of the composition.
- the composition may also comprise an amine compound, preferably at least one amine compound having a boiling point from 180-300°C.
- an amine compound preferably at least one amine compound having a boiling point from 180-300°C.
- this particular amine compound functions as a pH control agent for ⁇ -conjugated conductive polymer which usually exists in an acidic status, oxidation and/or degradation of metal nanowires in the same composition when contacted with the ⁇ -conjugated conductive polymer often possessing highly acidic nature can be prevented or substantially reduced.
- the compositions which comprise said amine compound can attain a stable degree of dispersion as having good miscibility between ⁇ -conjugated conductive polymer and metal nanowires.
- the incorporation of said amine compound enables an extended shelf-life during delivery and storage.
- the boiling point of the amine compound is preferably at least 190 °C, more preferably at least 195 °C.
- the maximum boiling point may be as high as about 300 °C (e.g. in case of glycol amine).
- the amine compounds which have a boiling point of at least 180 °C as well as exhibit an anti-corrosion effect are particularly preferred in the present invention.
- the amine compounds often having an excellent solubility in water are often preferred, for instance, in view of their good processability during the formulation preparation.
- the amine compound is preferably present in liquid state at room temperature.
- Said amine compound preferably comprises at least one group other than the amine group, the group which confers sufficient solubility in water. Particular example of such group includes alcohol group.
- Suitable class of the amine compound includes alkanol amines, such as monoalkanol amines, dialkanol amines, and trialkanol amines.
- Alkanol amines may defined as an amine compound comprising at least one amine function and at least one hydroxyl function. From the point of commercial availability, ethanol amines and propanol amines may be used as the amine compound in the present invention. Among the ethanol amines, N-substituted monoethanol amines, unsubstituted or N-substituted diethanol amines and unsubstituted or N-substituted triethanol amines are preferred.
- ethanol amines include methyldiethanolamine, n-butylethanolamine, n-buthyldiethanolamine, dibutylethanolamine, cyclohexylethanolamine, cyclohexyldiethanolamine, 4-(2-hydroxyethyl)morpholine, hydroxyethylaniline, ethylhydroxyethylaniline, hydroxyethylpiperidine, dihydroxyethylaniline, and n-propylethanolamine, but the present invention is not limited thereto.
- propanol amines include diisopropanolamine, triisopropanolamine, methyldiisopropanolamine, dibutylisopropanolamine, cyclohexylisopropanolamine, cyclooctylisopropanolamine, cyclooctyldiisopropanolamine, 4-(2-hydroxypropyl)morphloline, 3-(2-ethylhexyloxy)-propylamine, aminoethylisopropanolamine, 3-(2-ethylhexyloxy)propylamine, and 3-amino-1-propanol, but the present invention is not limited thereto.
- the amine compound is a compound comprising at least one secondary amine function or a tertiary amine function and at least one hydroxyl function.
- Said amine compound may comprise a hydrocarbon group and at least one secondary amine function or a tertiary amine function and at least one hydroxyl function, such as for instance N-alkylalkanolamine and N-dialkylalkanolamine.
- the amine compound has a boiling point from 180 to 300 °C and comprises at least one secondary amine function and at least one hydroxyl function, such as for instance: N-Butylethanolamine; N-(2-Hydroxyethyl)ethylenediamine; 4-[(2-aminoethyl)amino]-3-hexanol; 5-amino-4-(methylamino)-pentanol; 2-[-2-methoxypropyl]amino]-ethanol; N,N-Bis(4-hydroxybutyl)amine; Bis(2-hydroxypropyl)amine; and 2,2'-dihydroxydiethylamine.
- N-Butylethanolamine N-(2-Hydroxyethyl)ethylenediamine
- Another class of the amine compound includes polyamines.
- Particular examples of the polyamines include diamines, such as hexamethylenediamine, triamines, such as diethylenetriamine, and tetramines, such as triethylenetetramine, but the present invention is not limited thereto.
- Further class of the amine compound includes alkoxylated alkylamines.
- Particular examples of the alkoxylated alkylamines include ethoxylated alkylamines, but the present invention is not limited thereto.
- said amine compound can be applied to an aqueous solution of ⁇ -conjugated conductive polymer.
- amine compound include the product line of trademark SYNERGEX®, such as SYNERGEX® T series for instance, the product commercially available from Taminco, particularly N-Butyldiethanolamine and N-Butylethanolamine.
- the amine compound may be used in the amount of 0.01 to 1.0 wt %, preferably 0.1 to 0.5 wt %, relative to the total weight of the composition.
- a composition comprising the amine compound in said range can exhibit particularly good reliability of conductivity, and/or excellent shelf-life.
- the amount of the amine compound can be selected so as to adjust the pH of ⁇ -conjugated conductive polymer solution to equal to or more than 7, more preferably to more than 9, preferably comprised between 9 and 11.
- Compositions of the invention may also comprise at least one polysaccharide.
- Polysaccharides may be especially chosen in the group constituted by: glucans, starches, (such as those derived, for example, from cereals, for instance wheat, corn or rice, from vegetables, for instance yellow pea, and tubers, for instance potato or cassava), amylose, amylopectin, glycogen, dextrans, celluloses and derivatives thereof such as methylcelluloses, hydroxyalkylcelluloses, and ethylhydroxyethylcelluloses, mannans, xylans, lignins, arabans, galactans, galacturonans, chitin, chitosans, glucuronoxylans, arabinoxylans, xyloglucans, glucomannans, pectic acids and pectins, arabinogalactans, carrageenans, agars, gum arabics, gum tragacanths, ghatt
- Polysacharides are preferably chosen in the group constituted by: cellulose, hydroxyethyl celluloses, cetylhydoxyethyl celluloses, hydroxypropyl celluloses, hydroxypropylmethyl celluloses, hydroxyethylmethyl celluloses
- the polysaccharide may be used in the amount of 0.1 to 1.5 wt %, preferably 0.3 to 0.7 wt %, relative to the total weight of the composition.
- composition may contain one or more additives known in the art.
- additives known in the art. Reference can be made to the disclosure of the United States Patent Application Publication No. US 2014/0203223 A .
- Such additives may be for instance chosen in the group constituted by: a sensitizer, a chain transfer agent, a crosslinking agent, a dispersant, a solvent, a surfactant, an oxidation inhibitor, a sulfuration inhibitor, a metal corrosion inhibitor, a viscosity adjusting agent, and an antiseptic agent.
- a surfactant may notably be a leveling agent.
- nonionic organic surfactants may be cited such as Dynol 607 from Air Products and Surfynol 104 grades from Air Products.
- the present invention concerns a composition
- a composition comprising at least:
- Such method may comprise (a) preparing a first solution comprising at least one metal nanowires; preparing a second solution comprising at least one ⁇ -conjugated conductive polymer and optionally at least one amine compound; and (c) mixing the first solution and the second solution to obtain the composition.
- One or more of the above-explained solvents may be used to form the first solution and/or the second solution.
- the method for preparing the composition preferably comprises adjusting the pH level of a solution of (B) at least one ⁇ -conjugated conductive polymer to over pH 9, preferably between 9 and 11. It has been surprisingly found that by controlling the pH of the conductive polymer to such degree, exceptionally advantageous reliability of the transparent conductor can be obtained.
- a polysaccharide may also be possible to dissolve at least a polysaccharide in a liquid medium, for instance comprising water and optionally a solvent, and then add at least one metal nanowires.
- the conductive layer of the present invention may be obtained by application of the composition comprises at least at least a metal nanowires and a solvent on the surface of a substrate and curing the composition applied on the surface.
- Examples of such method of applying the composition on the substrate include wettings, such as dipping, coatings, such as spin coating, dip coating, slot-die coating, spray coating, flow coating, bar coating, meniscus coating, capillary coating, roll coating, and electro-deposition coating, and spreading, but the present invention is not limited thereto.
- the thickness of the conductive layer on the substrate is preferably from 10 nm to 1000 nm, more preferably 20 to 500 nm, particularly 30 to 150 nm, notably 40 to 100 nm. This thickness may be determined by a person skilled in the art considering the type of rod to apply the coating to determine the wet thickness and the solid content of the coating formulation. Drying may be performed under air or under inert atmosphere such as nitrogen or argon.
- Drying is typically conducted under atmospheric pressure or under reduced pressure, particularly under atmospheric pressure. Drying is usually conducted at a temperature sufficiently high to allow evaporation of the solvent. Drying may be performed at a temperature between 10 to 200 °C depending on selection of the solvent.
- Optional curing can be conducted by a subsequent treatment, such as a heat treatment and/or a treatment with radiation.
- a subsequent treatment such as a heat treatment and/or a treatment with radiation.
- UV radiation in particular with a wavelength ranging from 100 nm to 450 nm, for example 172, 248 or 308 nm, can be suitably used.
- One or more optional treatment step such as cleaning, drying, heating, plasma treatment, microwave treatment, and ozone treatment, may be conducted in any time during the process for the manufacture of transparent conductor.
- Polysiloxane-based layer forming composition may comprise at least one compound of Formula (I) and optionally at least one compound of Formula (II) as follows: Si(OR 1 ) 4 (I) Si(OR 2 ) a R 3 4-a (II) wherein:
- the polysiloxane-based layer of the invention preferably comprise a reaction product obtained by reacting at least one compound of Formula (I) and optionally at least one compound of Formula (II).
- Preferable examples of the respective hydrocarbon groups for R 1 in the Formula (I) and for R 2 and R 3 in the Formula (II) include alkyl groups or aryl groups.
- R 1 , R 2 and R 3 represent an alkyl group
- the number of carbon atoms is preferably 1 to 18, more preferably 1 to 8, and still more preferably 1 to 4.
- R 1 , R 2 and R 3 represent an aryl group
- a phenyl group is preferable.
- the alkyl group or the aryl group may have a substituent, and examples of introducible substituents include halogen atoms, amino groups, mercapto groups and the like.
- the compound is a low molecular compound, and the molecular weight is preferably comprised between 30 and 1000.
- Preferable compounds of Formula (I) are chosen in the group constituted by: tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, methoxytriethoxysilane, ethoxytrimethoxysilane, methoxytripropoxysilane, ethoxytripropoxysilane, propoxytrimethoxysilane, propoxytriethoxysilane, dimethoxydiethoxysilane, or the like.
- particularly preferable examples include tetramethoxysilane, tetraethoxysilane, and the like.
- the compound of Formula (II) is a difunctional alkoxysilane, and may be chosen in the group constituted by: dimethyl dimethoxysilane, diethyl dimethoxysilane, propyl methyl dimethoxysilane, dimethyl diethoxysilane, diethyl diethoxysilane, dipropyl diethoxysilane, ⁇ -chloropropyl methyl diethoxysilane, ⁇ -chloropropyl methyl dimethoxysilane, (p-chloromethyl)phenyl methyl dimethoxysilane, ⁇ -bromopropyl methyl dimethoxysilane, acetoxymethyl methyl diethoxysilane, acetoxymethyl methyl dimethoxysilane, acetoxy propyl methyl dimethoxysilane, benzoyloxypropyl methyl dimethoxysilane, 2-(carbomethoxy)
- the compound of Formula (II) is a trifunctional organo alkoxysilane, and may be chosen in the group constituted by: methyl trimethoxysilane, ethyl trimethoxysilane, propyl trimethoxysilane, methyl triethoxysilane, ethyl triethoxysilane, propyl triethoxysilane, ⁇ -chloropropyl triethoxysilane, ⁇ -chloropropyl trimethoxysilane, chloromethyl triethoxysilane, (p-chloromethyl)phenyl trimethoxy silane, ⁇ -bromopropyl trimethoxysilane, acetoxymethyl triethoxysilane, acetoxymethyl trimethoxysilane, acetoxypropyl trimethoxy silane, benzoyloxypropyl trimethoxysilane, 2-(carbomethoxy)
- the specific alkoxide compound include tetramethoxysilane, tetraethoxysilane, 3-glycidoxypropyltrimethoxysilane, diethyldiethoxysilane, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane.
- the polysiloxane-based layer comprises a reaction product obtained by reacting:
- the specific alkoxide can be easily procured from commercially available products, or can be obtained using a well-known synthesis method, for example, a reaction between each of the metal chlorides and an alcohol.
- one compound may be solely used, or a combination of two or more compounds may be used.
- the combination include a combination of at least one compound of Formula (I) and at least one compound of Formula (II).
- a conductive layer including, as the matrix, a cured sol-gel substance obtained by hydrolyzing and polycondensing a combination of two specific alkoxide compounds, the properties can be modified using the mixing ratio.
- a polysiloxane-based layer comprising the specific cured sol-gel substance as the matrix can be provided on the conductive layer by coating an aqueous solution comprising the specific alkoxide compound as a coating liquid (hereinafter, also referred to as "sol-gel coating liquid") on the conductive layer so as to form a coated film, causing reactions of hydrolysis and polycondensation of the specific alkoxide compound in the coated film, and, furthermore, as necessary, heating and evaporating water which is used as a solvent, thereby drying the coated film.
- a coating liquid hereinafter, also referred to as "sol-gel coating liquid”
- an acidic catalyst or a basic catalyst In order to accelerate the hydrolysis and polycondensation reactions, it is practically preferable to jointly use an acidic catalyst or a basic catalyst since the reaction efficiency increases. Any substance can be used as the catalyst as long as the substance accelerates the hydrolysis and polycondensation reactions of the alkoxide compound.
- the catalyst include acidic compounds and basic compounds.
- the acidic compounds and the basic compounds can be used as they are, and may be used in a state in which the compounds are dissolved in a solvent such as water or an alcohol.
- the kind of the acidic catalyst or the basic catalyst is not particularly limited; however, in a case in which it is necessary to use a catalyst having a high concentration, it is preferable to select a catalyst made of an element that rarely remains in the layer.
- the acidic catalyst include hydrogen halides such as hydrochloric acid; inorganic acids such as nitric acid, sulfuric acid, sulfurous acid, hydrogen sulfide, perchloric acid, hydrogen perchloride and carbonic acid; carboxylic acids such as formic acid and acetic acid; substituted carboxylic acids such as benzenesulfonic acid; and the like, and specific examples of the basic catalyst include quaternary ammonium salt compounds such as ammonia water and tetramethylammonium hydroxide; organic amines such as ethylamine and aniline; and the like.
- An organic solvent may be included as desired in the sol-gel coating liquid in order to ensure the uniform formability of a coating liquid film on the conductive layer.
- the organic solvent include ketone-based solvents such as acetone, methyl ethyl ketone and diethyl ketone; alcohol-based solvents such as methanol, ethanol, 2-propanol, 1-propanol, 1-butanol and tert-butanol; chlorine-based solvents such as chloroform and methylene chloride; aromatic solvents such as benzene and toluene; ester-based solvents such as ethyl acetate, butyl acetate and isopropyl acetate; ether-based solvents such as diethyl ether, tetrahydrofuran and dioxane; glycol ether-based solvents such as ethylene glycol monomethyl ether and ethylene glycol dimethyl ether; and the like.
- the organic solvent may be added in a range
- the heating temperature for accelerating the sol-gel reaction is appropriate in a range of from 30°C to 200°C, and more preferably in a range of from 50°C to 180°C.
- the heating and drying time is preferably from 10 seconds to 300 minutes, and more preferably from 1 minute to 120 minutes.
- At least a compound of formula (I), and optionally at least a compound of formula (II) is mixed with a polar solvent and a catalyst to thereby prepare the solution by sol-gel type hydrolysis.
- the molar ratio of compound(s) of formula (I) and compound(s) of formula (II) may be in the range from 1:5 to 10:1, preferably from 1:1 to 7:1.
- the content ratio of the compound of Formula (I)/compound of Formula (II) may be in a range of from 0.01/1 to 100/1, and more preferably in a range of from 0.05/1 to 50/1 by mass ratio.
- the solution may be coated on the surface of the conductive layer by spin coating, dip coating, roll coating, screen coating, spray coating, spin casting, flow coating, screen printing, ink-jetting, drop casting, and the like with a thickness usually comprised between 0.03 and 0.1 ⁇ m, followed by heat curing or photocuring, to thereby form a layer.
- the thickness of the polysiloxane-based layer is preferably from 10 nm to 1000 nm, more preferably 20 to 500 nm, particularly 30 to 150 nm, notably 40 to 100 nm. This thickness may be determined by a person skilled in the art considering the type of rod to apply the coating to determine the wet thickness and the solid content of the coating formulation.
- the electrode assembly according to the present invention can attain excellent one or more optical and electrical properties which are often required for various applications of such transparent conductor.
- the electrode assembly of the present invention may possess at least one, preferably two, more preferably all of the following characteristics:
- the transparency (transmission) to visible light can be measured by using UV-VIS spectrometer at wavelength range from 400 nm to 800 nm.
- UV-VIS spectrometer at wavelength range from 400 nm to 800 nm.
- Haze-gard plus instrument available from BYK-Gardner (ASTM D 1003) can be used.
- the sheet resistance can be measured using 4-point probes using R-CHEK Surface Resistivity Meter (Model #RC3175) available from EDTM Inc.
- the haze can be measured using a haze-meter, for instance Haze-gard plus instrument available from BYK-Gardner (ASTM D 1003).
- the assessment for contact angle can be measured by measurement of water contact angle thru SEO Phoenix 150 (Surface electro optics Co, Korea) at 26.5°C and RH35%.
- the transparent electrode assembly according to the present invention may be subject to one or more subsequent fabrication process.
- the transparent electrode assembly can be patterned and/or over-coated with one or more layer.
- the methodologies of the patterning reference can be made to the disclosures of the United States Patent Application Publication No. US 2014/0203223 A , which, by its entirety, is incorporated herein by reference.
- the transparent electrode assembly of the present invention and/or its fabricated structure, especially patterned structure thereof, can be used in various electronic devices in which a transparent electrode assembly is suitably utilized.
- the invention also concerns an electronic device comprising at least an electrode assembly comprising at least:
- Examples of the application include touch panels, various electrodes for display devices, such as liquid crystal display (LCD), light emitting diode (LED) display plasma displays, and organic light-emitting diode (OLED) displays, electroluminescent display displays (ELD), electrophoretic display (EPD), LED lighting, OLED lighting, antistatic layers, electromagnetic interference (EMI) shields, touch-panel-embedded display devices, and photovoltaic (PV) cells, but the present invention is not limited thereto.
- the electrode assembly of the present invention is particularly useful when used in touch panel and display applications.
- Still further aspect of the present invention concerns an electronic device at least comprising the electrode assembly, such as notably the transparent electrode assembly, according to the present invention.
- PEDOT:PSS (1wt% Verasol WED-SM from SOKEN) has been put on 2L Vessel, then 100g of isopropyl alcohol, 50g Dimethyl sulfoxide and 500g deionized water have been added. The mixture was stirred by direct stirrer at 100rpm. 8.3g of Synergex® (N-Butylethanolamine from TAMICO) as neutral agent has been added when the mixture goes from low pH to reach a pH of 9.4. This mixture was 0.35wt% solid contents.
- PEDOT formulation 14.25g was put in 250mL Nalgene bottle, and 60.75g of deionized water and 10g of isopropyl alcohol have been then added. 15g of AgNW (1wt% dispersion in water from N&B) and 0.07g Dynol 607(from Air-product) as leveling agent have been added after the mixture shakes by vortex mixer. The mixture has been shaken by roll-mixer during 1 hour.
- TEOS tetramethyl orthosilicate
- TEOS tetramethyl orthosilicate
- GPTMS glycol dimethoxysilane
- 14g of acetic acid has been then added into the vessel.
- the mixture has been stirred then under N 2 gas during 24hr at room temperature. After finished sol-gel synthesis, the mixture has been kept in freezer at below -12°C.
- Comparative example 1 of UV coating on surface coated AgNW formulation Comparative example 1 of UV coating on surface coated AgNW formulation.
- AgNW formulation has been first coated on PET substrate by bar coater (#8) and get dry on condition of 130°C/60sec (at convection oven). This coated film shows properties on Transmittance 92% and Haze 0.64%. Then UV coating solution (Urethane Acrylate - PET-1006, Headong UV polymer, Korea. 27 wt%) has been diluted on ethyl cellosolve (2-ethoxy ethanol) as the ratios 1 to 10 (10g of solution for 100g of ethyl cellosolve), and then shook by vortex mixer. This solution has 2.45 wt% of solid contents.
- AgNW formulation has been first coated on PET substrate by bar coater (#8) and get dry on condition of 130°C/60sec (at convection oven). This coated film shows properties on Transmittance 89.4% and Haze 1.05%. Then UV coating solution (Urethane Acrylate - PET-1006, Headong UV polymer, Korea. 27 wt%) has been diluted on ethyl cellosolve as the ratios 1 to 10 (10g of solution for 100g of ethyl cellosolve), and then shook by vortex mixer. This solution has 2.45wt% of solid contents. This solution has been then coated on the AgNW formulation film with 500mJ UV-radiation under broad band UV mercury lamp after drying at 130°C/60min. This coated film shows properties on Transmittance 88.7%, Haze 1.37.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C/60sec (at convection oven).
- the polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer.
- the mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min.
- Film of AgNW formulation has transmittance 92.6% and haze 0.82%.
- Film of AgNW formulation with the polysiloxane layer has transmittance 90.5% and haze 1.03%.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C /60sec.
- the polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer.
- the mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min.
- Film of AgNW formulation has transmittance 92.6% and haze 0.55%.
- Film of AgNW formulation with the polysiloxane layer has transmittance 91% and haze 0.83%.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C /60sec.
- the polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer.
- the mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min.
- Film of AgNW formulation has transmittance 92.3% and haze 0.73%.
- Film of AgNW formulation with the polysiloxane layer has transmittance 88.9% and haze 1.49%.
- Table 1 shows optical properties and contact angle after treatment.
- Table 1 Case Comp. example 1 Comp. example 2
- Example 1 Example 2 AgNW formulation AgNW + cellulose AgNW + PEDOT AgNW + cellulose AgNW + PEDOT AgNW + cellulose AgNW + PEDOT Without treatment layer Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Treatment layer UV coating UV coating POS A POS A POS B POS B With treatment layer Tr 91.9% Haze 0.89% Tr 88.7% Haze 1.37% Tr 92.6% Haze 0.82% Tr 90.5% Haze 1.03% Tr 92.6% Haze 0.55% Tr 91% Haze 0.83% Contact angle (°) 52.64 52.64 69.46 69.46 70.53 70.53
- polysiloxane layer provides a higher contact angle and lower haze in comparison with a classical UV coating.
- the use of a polysiloxane layer also permit to increase the transmittance of the film in comparison with the AgNW formulation layer alone, while the use of a classical UV coating is substantially decreasing the transmittance in comparison with the use of the AgNW formulation layer alone.
- Transmittance and haze were measured by averaging the value in 9 points on the coated PET film (A4 size) by using, respectively, UV-VIS spectrometer at wavelength range from 400 nm to 800 nm and Haze-gard plus instrument from BYK-Gardner in accordance with ASTM D 1003.
- Sheet resistance was measured by averaging the value in 12 points in the coated PET film (A4 size) with 4-point probes using R-CHEK Surface Resistivity Meter (Model #RC3175) from EDTM Inc.
- test condition keeps under 65°C and relative humidity 90%.
- test equipment uses a thermo hygrostat from Enex science, Korea. It determines the results of change rates on sheet-resistance after having done during 250hr.
- sample size is 7.5cm by 7.5cm on each condition.
- the initial sheet-resistance is around 50 ⁇ /sq.
- ⁇ sheet-resistance (sheet-resistance after test/ sheet-resistance before test) X 100%.
- Table 2 shows the test results for reliability under 65°C and relative humidity 90%.
- Table 2 Case Comp. example 1 Comp. example 2
- Example 1 Example 2
- Example 3 AgNW + cellulose AgNW + PEDOT AgNW AgNW + PEDOT AgNW AgNW + PEDOT AgNW AgNW + PEDOT ⁇ sheet-resistance (%) 34 23 9 6 7 3 17 15
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Non-Insulated Conductors (AREA)
Abstract
Description
- The present invention concerns an electrode assembly comprising at least: a substrate, a conductive layer formed on the substrate comprising at least a metal nanowires, and a polysiloxane-based layer formed on the conductive layer; and a process for the production of said electrode assembly.
- The following discussion of the prior art is provided to place the invention in an appropriate technical context and enable the advantages of it to be more fully understood. It should be appreciated, however, that any discussion of the prior art throughout the specification should not be considered as an express or implied admission that such prior art is widely known or forms part of common general knowledge in the field.
- Transparent conductors are optically transparent, thin conductive materials. Such materials have a wide variety of applications, such as transparent electrodes in displays such as liquid crystal displays (LCD), light emitting diode (LED) displays, plasma displays, and organic light-emitting diode (OLED) displays, electroluminescent display displays (ELD), electrophoretic display (EPD), LED lighting, OLED lighting, touch panels, photovoltaic cells, electrochromic devices, smart windows, as anti-static layers and as electromagnetic interference shielding layers, and as resistive heaters.
- Conventional transparent conductors include metal oxide films, in particular indium tin oxide (ITO) film due to its relatively high transparency at high conductivity. However, ITO has several shortcomings, such as high cost during its fabrication because it needs to be deposited using sputtering technique which involves the use of high temperatures and vacuum chambers. Metal oxide films are also fragile and prone to damage even when subjected to minor physical stresses such as bending, and as such, often does not applicable when a flexible substrate on which the metal oxide film is to be deposited is used.
- Conductive polymers have a good flexibility and are often considered to be inexpensive because they can be formed by simple processing. Having these characteristics, it is believed that conductive polymer compositions are among the potential candidates to replace ITO film in forming the transparent conductor for various electronic device applications.
- Metal nanowires are considered as another promising candidate to replace the commonly-used ITO due to its high dc conductivity and optical transmittance, and good mechanical flexibility, etc.
- In US patent application publication No.
US 2008/0259262 A1 , disclosed are composite transparent conductors which comprise conductive medium based on metal nanowires and a secondary conductive medium based on a continuous conductive film. Development of conductive composition which can be suitably used for forming high quality transparent conductors, in particular those having not only satisfactory conductivity, transparency, and/or haze, but also an excellent reliability of at least one or all of them, is desired in the art. - The purpose of the present invention is therefore to provide an electrode assembly comprising at least:
- a substrate;
- a conductive layer formed on the substrate comprising at least a metal nanowires; and
- a polysiloxane-based layer formed on the conductive layer.
- The electrode assembly according to the present invention exhibits a desirable sheet resistance as well as excellent reliability of the sheet resistance for an extended time period. The electrode assembly can also display good conductivity, transparency, and/or low haze. In addition, the conductor assembly of the present invention surprisingly exhibits an outstanding reliability of said properties over an extended time period, notably at a temperature comprised between 0 and 60°C. Said electrode assembly can be suitably used for touch panel and display applications.
- It also appears that polysiloxane layer provides a higher contact angle and lower haze in comparison with a classical UV coating and the use of such a polysiloxane layer notably permit to increase the transmittance of the film in comparison with the conductive layer alone, while the use of a classical UV coating is substantially decreasing said transmittance in comparison with the use of the conductive layer alone.
- The invention also concerns a method for the production of an electrode assembly comprising at least the steps of:
- forming a conductive layer formed on all or a part of a substrate; said conductive layer comprising at least a metal nanowires; and
- forming a polysiloxane-based layer on all or a part of the conductive layer.
- Further, the present invention provides an electronic device, in particular touch panel and display, comprising the electrode assembly according to the present invention.
- Other characteristics, details and advantages of the invention will emerge even more fully upon reading the description which follows.
- For convenience, before further description of the present disclosure, certain terms employed in the specification, and examples are collected here. These definitions should be read in the light of the remainder of the disclosure and understood as by a person of skill in the art. The terms used herein have the meanings recognized and known to those of skill in the art, however, for convenience and completeness, particular terms and their meanings are set forth below.
- The articles "a", "an" and "the" are used to refer to one or to more than one (i.e., to at least one) of the grammatical object of the article.
- The term "and/or" includes the meanings "and", "or" and also all the other possible combinations of the elements connected to this term.
- The terms "comprise" and "comprising" are used in the inclusive, open sense, meaning that additional elements may be included. Throughout this specification, unless the context requires otherwise the word "comprise", and variations, such as "comprises" and "comprising", will be understood to imply the inclusion of a stated element or step or group of element or steps but not the exclusion of any other element or step or group of element or steps.
- The term "including" is used to mean "including but not limited to". "Including" and "including but not limited to" are used interchangeably.
- Ratios, concentrations, amounts, and other numerical data may be presented herein in a range format. It is to be understood that such range format is used merely for convenience and brevity and should be interpreted flexibly to include not only the numerical values explicitly recited as the limits of the range, but also to include all the individual numerical values or sub-ranges encompassed within that range as if each numerical value and sub-range is explicitly recited. For example, a temperature range of about 120°C to about 150°C should be interpreted to include not only the explicitly recited limits of about 120°C to about 150°C, but also to include sub-ranges, such as 125°C to 145°C, 130°C to 150°C, and so forth, as well as individual amounts, including fractional amounts, within the specified ranges, such as 122.2°C, 140.6°C, and 141.3°C, for example.
- The term "between" should be understood as being inclusive of the limits.
- As used herein, the term "hydrocarbon group" refers to a group mainly consisting of carbon atoms and hydrogen atoms, which group may be saturated or unsaturated, linear, branched or cyclic, aliphatic or aromatic. Hydrocarbon groups of the present invention may be alkyl groups, alkenyl groups, alkynyl groups, aryl groups, alkylaryl groups, aryalkyl groups, heterocyclic groups, and/or alkylheterocyclic groups.
- As used herein, the terminology "(Cn-Cm)" in reference to an organic group, wherein n and m are each integers, indicates that the group may contain from n carbon atoms to m carbon atoms per group.
- As used herein, "alkyl" groups include saturated hydrocarbons having one or more carbon atoms, including straight-chain alkyl groups, such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, cyclic alkyl groups (or "cycloalkyl" or "alicyclic" or "carbocyclic" groups), such as cyclopropyl, cyclopentyl, cyclohexyl, cycloheptyl, and cyclooctyl, branched-chain alkyl groups, such as isopropyl, tert-butyl, sec-butyl, and isobutyl, and alkyl-substituted alkyl groups, such as alkyl-substituted cycloalkyl groups and cycloalkyl-substituted alkyl groups. The term "aliphatic group" includes organic moieties characterized by straight or branched-chains, typically having between 1 and 22 carbon atoms. In complex structures, the chains may be branched, bridged, or cross-linked. Aliphatic groups include alkyl groups, alkenyl groups, and alkynyl groups.
- As used herein, "alkenyl" or "alkenyl group" refers to an aliphatic hydrocarbon radical which can be straight or branched, containing at least one carbon-carbon double bond. Examples of alkenyl groups include, but are not limited to, ethenyl, propenyl, n-butenyl, i-butenyl, 3-methylbut-2-enyl, n-pentenyl, heptenyl, octenyl, decenyl, and the like. The term "alkynyl" refers to straight or branched chain hydrocarbon groups having at least one triple carbon to carbon bond, such as ethynyl.
- The term "aryl group" includes unsaturated and aromatic cyclic hydrocarbons as well as unsaturated and aromatic heterocycles containing one or more rings. Aryl groups may also be fused or bridged with alicyclic or heterocyclic rings that are not aromatic so as to form a polycycle, such as tetralin. An "arylene" group is a divalent analog of an aryl group.
- The term "heterocyclic group" includes closed ring structures analogous to carbocyclic groups in which one or more of the carbon atoms in the ring is an element other than carbon, for example, nitrogen, sulfur, or oxygen. Heterocyclic groups may be saturated or unsaturated. Additionally, heterocyclic groups, such as pyrrolyl, pyridyl, isoquinolyl, quinolyl, purinyl, and furyl, may have aromatic character, in which case they may be referred to as "heteroaryl" or "heteroaromatic" groups.
- As used herein, the following terms refer to the corresponding substituent groups:
- "amido" is -R1-C(O)N(R4)R4
- "amidosulfonate" is --R1-C(O)N(R4)R2-SO3Z
- "benzyl" is -CH2-C6H5
- "carboxylate" is -R1-C(O)O-Z or -R1-O-C(O)-Z
- "ether" is -R1-(O-R3)p-O-R3
- "ether carboxylate" is -R1-O-R2-C(O)O-Z or -R1-O-R2-O-C(O)-Z
- "ether sulfonate" is -R1-O-R2-SO3Z
- "ester sulfonate" is -R1-O-C(O)R2-SO3Z,
- "urethane" is -R1-O-C(O)-N(R4)2,
- each R1 is absent or alkylene,
- each R2 is alkylene,
- each R3 is alkyl,
- each R4 is H or an alkyl,
- p is 0 or an integer from 1 to 20, and
- each Z is H, alkali metal, alkaline earth metal, N(R3)4 or R3,
- As herein used, the term "boiling point" generally denotes the normal boiling point (also called the atmospheric boiling point or the atmospheric pressure boiling point) of a liquid; it corresponds to the case in which the vapor pressure of the liquid equals the defined atmospheric pressure at sea level, 1 atmosphere. It can be measured using a regular scale distillation procedure.
- Those skilled in the art will be aware that the present disclosure is subject to variations and modifications other than those specifically described. It is to be understood that the present disclosure includes all such variations and modifications. The disclosure also includes all such steps, features, compositions and compounds referred to or indicated in this specification, individually or collectively and any and all combinations of any or more of such steps or features.
- Substrate of the present invention may be a variety of base materials that can be used depending on the purpose as long as the base material can bear the conductive layer. Generally, a plate-like base material or a sheet-like base material is used.
- The substrate may be transparent or opaque. Examples of a material that forms the substrate include transparent glass such as white plate glass, blue plate glass and silica-coated blue plate glass; synthesis resins such as polycarbonates, polyethersulfones, polyesters, acrylic resins, vinyl chloride resins, aromatic polyamide resins, polyamideimides and polyimides; metal such as aluminum, copper, nickel and stainless steel; additionally, ceramics, silicon wafers used for semiconductor substrates, and the like. A surface of the base material on which the conductive layer is formed can be subjected to a pretreatment such as a chemical treatment using a silane coupling agent or the like, a plasma treatment, ion plating, sputtering, a gas-phase reaction or vacuum deposition as desired.
- A substrate with a thickness in a desired range depending on the use may be used. The thickness is generally selected from a range of from 1 µm to 500 µm, more preferably from 3 µm to 400 and still more preferably from 5 µm to 300 µm.
- The substrate may be transparent and having a total visible light transmittance from 60% to 100%, preferably from 85% to 100%, and still more preferably from 90% to 100%, in the visible light region (400 nm to 700 nm). Meanwhile, the total light transmittance of the substrate may be measured based on JIS K 7361-1:1997.
- Examples of such substrates include a glass substrate, and transparent solid polymers, for example polycarbonates (PC), polyesters, such as polyethyleneterephthalate (PET), acryl resins, polyvinyl resins, such as polyvinyl chloride, polyvinylidene chloride, and polyvinyl acetals, aromatic polyamide resins, polyamideimides, polyethylene naphthalene dicarboxylate, polysulphones, such as polyethersulfone (PES), polyimides (PI), cyclic olefin copolymers (COC), styrene copolymers, polyethylene, polypropylene, cellulose ester bases, such as cellulose triacetate, and cellulose acetate, and any combination thereof. Preferably, the substrate is in the form of a sheet. In the present invention, the substrate may be rigid or flexible. Examples of the flexible substrate include, but are not limited to, those transparent solid polymers, including polycarbonates, polyesters, polyolefins, polyvinyls, cellulose ester bases, polysulphones, polyimides, and other conventional polymeric films, or adhesive layers embedded in specific display structures.
- The substrate may notably comprise an adhesive layer formed on the substrate. In some cases an adhesive layer might be called as a hard coat layer, or a hardcoat.
- An adhesive layer may refer to any optically clear material that bonds two adjacent layers (e.g. conductive layer and substrate) together with no or with very limited effect on the physical, electrical or optical properties of either layer. It is known that some types of adhesives can have a positive effect on the mechanical and optical properties of substrates. Adhesive material are well known in the art, including without limitation: acrylic resins, chlorinated olefin resins, resins of vinyl chloride-vinyl acetate copolymer, maleic acid resins, chlorinated rubber resins, cyclorubber resins, polyamide resins, cumarone indene resins, resins of ethylene-vinyl acetate copolymer, polyester resins, urethane resins, styrene resins, polysiloxanes and the like. The adhesion promoting monomers may be polymerized by conventional means such as radiation, thermal or redox curing with other vinyl monomers and prepolymers to form coatings, films or adhesives.
- The adhesive composition also may comprise various additives as needed to alter or enhance certain properties such as, for example, to improve weatherability, components to improve abrasion resistance, additives to enhance appearance, and materials to improve toughness and mechanical properties. Examples of additives that may be used in the coating composition of the present invention include, but are not limited to, photoinitiators; slip agents; leveling agents; wetting agents; adhesion promoters; anti-absorption agents; anti-foaming agents, such as, for example, mixtures of foam destroying polymers and polysiloxanes; accelerators; pigment dispersion aids; anti-blocking agents; anti-caking agents; anti-slip agents; anti-skinning agents; anti-static agents; anti-stripping agents; binders; curing agents; deaerators; diluents; dispersants; dryers; emulsifiers; fillers; flatting agents; flow control agents; gloss agents; hardeners; lubricants; mar resistance aids; whiteners; plasticizers; solvents; stabilizers; surfactants; viscosity modifiers; UV stabilizers; UV absorbers; and water repellants. For example, the coating composition may further comprise finely divided SiO2, Al2O3, ZrO2, or TiO2 dispersed therein. These materials can modify the viscosity of the coating such that it may be applied easily and can enhance the abrasion resistance of the cured coating.
- The adhesive materials can be applied to the substrate by the customary techniques, for example by spin coating, slit coating, spraying, dipping, spreading or electrodeposition. In some cases, a plurality of coats may be applied.
- Conducive layer forming composition may comprise at least one metal nanowires and at least one solvent. When deposited on the substrate, the nanowires are usually present so as to intersect each other to form a conductive metal nanowire network having plurality of intersections of metal nanowire.
- In the present invention, an average diameter of the metal nanowires is from 10 nm to 50 nm, preferably 15 nm to 35 nm, more preferably 18 nm to 25 nm, notably 18 to 23 nm. In the present invention, the diameter of the metal nanowires can be measured by transmission electron microscope (TEM). An average length of the metal nanowires in the present invention is often in the range of 1 µm to 100 µm. The average length of the metal nanowires is preferably at least 10 µm, more preferably more than 10 µm, still more preferably at least 15 µm. The average length of the metal nanowires is preferably equal to or less than 50 µm, more preferably equal to or less than 30 µm. In the present invention, the length of the metal nanowires can be measured by optical microscope.
- The aspect ratio of the metallic nanowires is preferably from 300 and 2000, preferably from 800 to 1200. The aspect ratio refers to a ratio of the average long axis length to the average short axis length. The aspect ratio can be computed using the average long axis length and the average short axis length computed using the above method.
- In the present invention, the metal nanowires can be nanowires formed of metal, metal alloys, plated metals or metal oxides. Among the above, metallic nanowires formed of metal or a metallic compound are preferable, and metallic nanowires formed of metal are more preferable.
- The metal is preferably at least one kind of metal chosen in the group constituted by Periods 4, 5 and 6 of the long-form periodic table (IUPAC 1991), more preferably at least one kind of metal selected from Groups 2 to 14, and still more preferably at least one kind of metal selected from Groups 2, 8, 9, 10, 11, 12, 13 and 14. The metal is particularly preferably included as a main component. Specific examples of the metal include copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium, iron, ruthenium, osmium, manganese, molybdenum, tungsten, niobium, tantalum, titanium, bismuth, antimony, lead, alloys thereof and the like. Among the above, copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium or an alloy thereof is preferable, and palladium, copper, silver, gold, platinum, tin or an alloy thereof is more preferable, and silver or an alloy containing silver is particularly preferable.
- Examples of the metal nanowires include, but are not limited to, silver nanowires, gold nanowires, copper nanowires, nickel nanowires, gold-plated silver nanowires, platinum nanowires, and palladium nanowires. The metal nanowires in the composition preferably comprise silver nanowires. Silver nanowires are the most preferred metal nanowires in the present invention because of its high electrical conductivity.
- Excellent result can be obtained when silver nanowires having an average diameter of 10nm to 30 nm, preferably 18 nm to 25 nm, notably 18 nm to 23 nm and an average length of 10 to 30 µm, notably 10 to 25 µm are used in the composition according to the present invention.
- Such silver nanowires may be prepared via the synthesis methods known in the art. For instance, so-called "polyol method" may be used for the synthesis of the silver nanowires to be used in the present invention. Reference can be made to Sun et al., "Crystalline silver nanowires by soft solution processing", Nanoletters, (2002), 2(2) 165-168.
- In a particular embodiment of the present invention, the metal nanowires are used in the amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.5wt%, notably 0.05 to 0.2 wt %, relative to the total weight of the composition. The composition comprising the metal nanowires in the amount of 0.01 to 1.0 wt % relative to the total weight of the composition, can exhibit particularly good conductivity, transparency and/or haze.
- The conductive layer composition may notably be a dispersion.
- At least one solvent to constitute the composition can be chosen among those chosen in the group constituted by water; aliphatic alcohols, such as methanol, ethanol, isopropanol, butanol, n-propylalcohol, ethylene glycol, propylene glycol, butanediol, neopentyl glycol, 1,3-pentanediol, 1,4-cyclohexanedimethanol, diethyleneglycol, polyethelene glycol, polybutylene glycol, dimethylolpropane, trimethylolpropane, sorbitol, esterification products of the afore-mentioned alcohols ; aliphatic ketones, such as cellosolve, propyleneglycol methylether, diacetone alcohol, ethylacetate, butylacetate, acetone and methylethylketone ; ethers such as tetrahydrofuran, dibutyl ether, mono- and polyalkylene glycol dialkyl ethers ; aliphatic carboxylic acid esters ; aliphatic carboxylic acid amides ; aromatic hydrocarbons ; aliphatic hydrocarbons ; acetonitrile ; aliphatic sulfoxides ; and any combination thereof. Water and/or alcohols can be preferably used.
- The composition may also comprise at least one π-conjugated conductive polymer.
- In the present invention, a π-conjugated conductive polymer is understood to denote in particular any polymeric materials that conduct electricity. In the compositions the π-conjugated conductive polymers can be, for example, dissolved or dispersed in the solvent. Preferably, the conductive polymers are dispersed in water and/or alcohol.
- An electrically conductive polymer usually means any polymer or polymer blend that is inherently or intrinsically, without the addition of electrically conductive fillers such as carbon black or conductive metal particles, capable of electrical conductivity, more typically to any polymer or oligomer that exhibits a bulk specific conductance of greater than or equal to 10-7 Siemens per centimeter ("S/cm").
- The π-conjugated conductive polymer may be chosen in the group constituted by polyaniline polymers, polypyrrole polymers, polythiophene polymers, and any combination thereof.
-
- R1 is independently H, alkyl, hydroxy, heteroalkyl, alkenyl, heteroalkenyl, hydroxalkyl, amidosulfonate, benzyl, carboxylate, ether, ether carboxylate, ether sulfonate, ester sulfonate, or urethane, and
- m is 2 or 3.
- In one embodiment, all R1 groups of the monomeric unit according to structure (I) are each H, alkyl, or alkenyl. In one embodiment, at least one R1 groups of the monomeric unit according to structure (I) is not H. In one embodiment, each R1 groups of the monomeric unit according to structure (I) is H.
- In one embodiment, the electrically conductive polymer comprises an electrically conductive polythiophene homopolymer of monomeric units according to structure (I) wherein each R1 is H and m is 2, known as poly(3,4-ethylenedioxythiophene), more typically referred to as "PEDOT".
- The PEDOT polymer is preferably doped with at least one further compound. One example of such compound for doping includes polymeric acid dopant, in particular a water soluble polymeric dopant. Examples of doped PEDOT polymers include PEDOT doped with lignosulfonic acid (LSA) (PEDOT/LSA), PEDOT doped with polyethyleneglycol (PEG) (PEDOT/PEG), PEDOT doped with polyoxometalate (POM) (PEDOT/POM), PEDOT doped with sufonated polyimide (SPI) (PEDOT/SPI), PEDOT doped with carbon materials, such as activated carbon, graphene and carbon nanotube (CNT) (activated carbon/PEDOT composite, PEDOT/graphene composite, or PEDOT/CNT composite), PEDOT doped with DMSO and CNT (PEDOT/DMSO/CNT), PEDOT doped with tosylate, PEDOT doped with chloride anion, PEDOT doped with NO3, PEDOT doped with PSS (PEDOT:PSS), PEDOT/PSS doped with pentacene, PEDOT doped with ammonium persulfate (APS) (PEDOT/APS), and PEDOT doped with dimethyl sulfoxide (DMSO) (PEDOT/DMSO), but the present invention is not limited thereto. More preferably, the PEDOT polymer is doped with a polymer having at least one sulfonic acid, such as polystyrene sulfonic acid (PSS).
- In the preferred embodiment of the present invention, the π-conjugated conductive polymer comprises at least one polythiophene polymer, preferably poly(3,4-ethylenedioxythiophene)(PEDOT) polymer, doped with at least one water soluble polymeric dopant, preferably polystyrene sulfonic acid (PSS). The ratio of PEDOT and PSS is preferably from 5:95 to 50:50 by weight.
- The π-conjugated conductive polymer may be used in the amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.2 wt %, relative to the total weight of the composition. A composition comprising the π-conjugated conductive polymer in the amount of 0.01 to 1.0 wt % relative to the total weight of the composition, can exhibit particularly good conductivity and transparency.
- The PEDOT:PSS co-doped with para-toluene sulfonic acid is especially preferred.
- The weight ratio between the π-conjugated conductive polymer and the metal nanowires in the composition is preferably 1:0.5-1:5, more preferably 1:1-1:3. The composition comprising the π-conjugated conductive polymer and the metal nanowires in said range may attain well-balanced conductivity and optical properties.
- Without wishing to be bound by any theory, incorporation of the π-conjugated conductive polymer into the composition comprising at least one metal nanowires may prevent oxidation and/or degradation of the metal nanowires and/or it conductive network. Also, such incorporation allows increased conductivity compared to the conductive system solely based on the metal nanowire network.
- The composition may also comprise at least one binder. The binder may be an organic compound, an inorganic compound, or a hybrid compound thereof. Examples of the organic binder include polyesters, such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polyimides, such as polyimide, and polyamideimide; polyamides, such as polyamide 6, polyamide 6,6, polyamide 12, and polyamide 11; fluororesins, such as polyvinylidene fluoride, polyvinyl fluoride, polytetrafluoroethylene, ethylenetetrafluoroethylene copolymer, and polychlorotrifluoroethylene; vinyl resins, such as polyvinyl alcohol, polyvinyl ether, polyvinyl butyral, polyvinyl acetate, and polyvinyl chloride; epoxy resin; oxetane resin; xylene resin; aramide resin; polyimide silicon; polyurethane; polyurea; melamine resin; phenol resin; polyether; organosilicons; poly(ethylene oxide)s (PEO); silicon(Si)-based binder, such as aminosilane-based binders, and tetraalkoxysilane-based binders; acrylic resin, and their copolymers.
- The binder, when present, is typically used in an amount of 0.01 to 1.0 wt %, preferably 0.05 to 0.2 wt %, relative to the total weight of the composition.
- The composition may also comprise an amine compound, preferably at least one amine compound having a boiling point from 180-300°C. Without wishing to be bound by any theory, it is believed that by incorporating this particular amine compound functions as a pH control agent for π-conjugated conductive polymer which usually exists in an acidic status, oxidation and/or degradation of metal nanowires in the same composition when contacted with the π-conjugated conductive polymer often possessing highly acidic nature can be prevented or substantially reduced. The compositions which comprise said amine compound can attain a stable degree of dispersion as having good miscibility between π-conjugated conductive polymer and metal nanowires. In addition, the incorporation of said amine compound enables an extended shelf-life during delivery and storage.
- The boiling point of the amine compound is preferably at least 190 °C, more preferably at least 195 °C. The maximum boiling point may be as high as about 300 °C (e.g. in case of glycol amine). The amine compounds which have a boiling point of at least 180 °C as well as exhibit an anti-corrosion effect are particularly preferred in the present invention. The amine compounds often having an excellent solubility in water are often preferred, for instance, in view of their good processability during the formulation preparation. In the present invention, the amine compound is preferably present in liquid state at room temperature. Said amine compound preferably comprises at least one group other than the amine group, the group which confers sufficient solubility in water. Particular example of such group includes alcohol group.
- Suitable class of the amine compound includes alkanol amines, such as monoalkanol amines, dialkanol amines, and trialkanol amines. Alkanol amines may defined as an amine compound comprising at least one amine function and at least one hydroxyl function. From the point of commercial availability, ethanol amines and propanol amines may be used as the amine compound in the present invention. Among the ethanol amines, N-substituted monoethanol amines, unsubstituted or N-substituted diethanol amines and unsubstituted or N-substituted triethanol amines are preferred. Particular examples of the ethanol amines include methyldiethanolamine, n-butylethanolamine, n-buthyldiethanolamine, dibutylethanolamine, cyclohexylethanolamine, cyclohexyldiethanolamine, 4-(2-hydroxyethyl)morpholine, hydroxyethylaniline, ethylhydroxyethylaniline, hydroxyethylpiperidine, dihydroxyethylaniline, and n-propylethanolamine, but the present invention is not limited thereto. Particular examples of the propanol amines include diisopropanolamine, triisopropanolamine, methyldiisopropanolamine, dibutylisopropanolamine, cyclohexylisopropanolamine, cyclooctylisopropanolamine, cyclooctyldiisopropanolamine, 4-(2-hydroxypropyl)morphloline, 3-(2-ethylhexyloxy)-propylamine, aminoethylisopropanolamine, 3-(2-ethylhexyloxy)propylamine, and 3-amino-1-propanol, but the present invention is not limited thereto.
- Preferably the amine compound is a compound comprising at least one secondary amine function or a tertiary amine function and at least one hydroxyl function. Said amine compound may comprise a hydrocarbon group and at least one secondary amine function or a tertiary amine function and at least one hydroxyl function, such as for instance N-alkylalkanolamine and N-dialkylalkanolamine.
- More preferably the amine compound has a boiling point from 180 to 300 °C and comprises at least one secondary amine function and at least one hydroxyl function, such as for instance: N-Butylethanolamine; N-(2-Hydroxyethyl)ethylenediamine; 4-[(2-aminoethyl)amino]-3-hexanol; 5-amino-4-(methylamino)-pentanol; 2-[-2-methoxypropyl]amino]-ethanol; N,N-Bis(4-hydroxybutyl)amine; Bis(2-hydroxypropyl)amine; and 2,2'-dihydroxydiethylamine.
- Another class of the amine compound includes polyamines. Particular examples of the polyamines include diamines, such as hexamethylenediamine, triamines, such as diethylenetriamine, and tetramines, such as triethylenetetramine, but the present invention is not limited thereto.
- Further class of the amine compound includes alkoxylated alkylamines. Particular examples of the alkoxylated alkylamines include ethoxylated alkylamines, but the present invention is not limited thereto.
- In general, said amine compound can be applied to an aqueous solution of π-conjugated conductive polymer. Particular preferred examples of the amine compound include the product line of trademark SYNERGEX®, such as SYNERGEX® T series for instance, the product commercially available from Taminco, particularly N-Butyldiethanolamine and N-Butylethanolamine.
- The amine compound may be used in the amount of 0.01 to 1.0 wt %, preferably 0.1 to 0.5 wt %, relative to the total weight of the composition. A composition comprising the amine compound in said range can exhibit particularly good reliability of conductivity, and/or excellent shelf-life.
- The amount of the amine compound can be selected so as to adjust the pH of π-conjugated conductive polymer solution to equal to or more than 7, more preferably to more than 9, preferably comprised between 9 and 11.
- Compositions of the invention may also comprise at least one polysaccharide. Polysaccharides may be especially chosen in the group constituted by: glucans, starches, (such as those derived, for example, from cereals, for instance wheat, corn or rice, from vegetables, for instance yellow pea, and tubers, for instance potato or cassava), amylose, amylopectin, glycogen, dextrans, celluloses and derivatives thereof such as methylcelluloses, hydroxyalkylcelluloses, and ethylhydroxyethylcelluloses, mannans, xylans, lignins, arabans, galactans, galacturonans, chitin, chitosans, glucuronoxylans, arabinoxylans, xyloglucans, glucomannans, pectic acids and pectins, arabinogalactans, carrageenans, agars, gum arabics, gum tragacanths, ghatti gums, karaya gums, carob gums, galactomannans such as guars and derivatives thereof, such as hydroxypropyl guar or cationic guar, and mixtures thereof.
- Polysacharides are preferably chosen in the group constituted by: cellulose, hydroxyethyl celluloses, cetylhydoxyethyl celluloses, hydroxypropyl celluloses, hydroxypropylmethyl celluloses, hydroxyethylmethyl celluloses
- The polysaccharide may be used in the amount of 0.1 to 1.5 wt %, preferably 0.3 to 0.7 wt %, relative to the total weight of the composition.
- Optionally, the composition may contain one or more additives known in the art. Reference can be made to the disclosure of the United States Patent Application Publication No.
US 2014/0203223 A . - Such additives may be for instance chosen in the group constituted by: a sensitizer, a chain transfer agent, a crosslinking agent, a dispersant, a solvent, a surfactant, an oxidation inhibitor, a sulfuration inhibitor, a metal corrosion inhibitor, a viscosity adjusting agent, and an antiseptic agent. A surfactant may notably be a leveling agent. Among surfactant having leveling agent properties, nonionic organic surfactants may be cited such as Dynol 607 from Air Products and Surfynol 104 grades from Air Products.
- Preferably the present invention concerns a composition comprising at least:
- (A) 0.01 to 1.0 wt %, preferably 0.05 to 0.5 wt%, notably 0.05 to 0.3 wt %, of at least one metal nanowires relative to the total weight of the composition;
- (B) 0.01 to 1.0 wt %, preferably 0.05 to 0.5wt%, notably 0.05 to 0.2 wt %, of at least one π-conjugated conductive polymer, relative to the total weight of the composition;
- (C) 0.01 to 1.0 wt %, preferably 0.1 to 0.5 wt %, of at least one amine compound, notably having a boiling point from 180 °C to 300 °C, relative to the total weight of the composition; and
- (D) at least one solvent.
- Several methods for preparing the composition may be used. Such method may comprise (a) preparing a first solution comprising at least one metal nanowires; preparing a second solution comprising at least one π-conjugated conductive polymer and optionally at least one amine compound; and (c) mixing the first solution and the second solution to obtain the composition. One or more of the above-explained solvents may be used to form the first solution and/or the second solution.
- The method for preparing the composition preferably comprises adjusting the pH level of a solution of (B) at least one π-conjugated conductive polymer to over pH 9, preferably between 9 and 11. It has been surprisingly found that by controlling the pH of the conductive polymer to such degree, exceptionally advantageous reliability of the transparent conductor can be obtained.
- It may also be possible to dissolve at least a polysaccharide in a liquid medium, for instance comprising water and optionally a solvent, and then add at least one metal nanowires.
- Usually the conductive layer of the present invention may be obtained by application of the composition comprises at least at least a metal nanowires and a solvent on the surface of a substrate and curing the composition applied on the surface.
- Examples of such method of applying the composition on the substrate include wettings, such as dipping, coatings, such as spin coating, dip coating, slot-die coating, spray coating, flow coating, bar coating, meniscus coating, capillary coating, roll coating, and electro-deposition coating, and spreading, but the present invention is not limited thereto. The thickness of the conductive layer on the substrate is preferably from 10 nm to 1000 nm, more preferably 20 to 500 nm, particularly 30 to 150 nm, notably 40 to 100 nm. This thickness may be determined by a person skilled in the art considering the type of rod to apply the coating to determine the wet thickness and the solid content of the coating formulation. Drying may be performed under air or under inert atmosphere such as nitrogen or argon. Drying is typically conducted under atmospheric pressure or under reduced pressure, particularly under atmospheric pressure. Drying is usually conducted at a temperature sufficiently high to allow evaporation of the solvent. Drying may be performed at a temperature between 10 to 200 °C depending on selection of the solvent. Optional curing can be conducted by a subsequent treatment, such as a heat treatment and/or a treatment with radiation. Preferably, ultraviolet (UV) radiation in particular with a wavelength ranging from 100 nm to 450 nm, for example 172, 248 or 308 nm, can be suitably used. One or more optional treatment step, such as cleaning, drying, heating, plasma treatment, microwave treatment, and ozone treatment, may be conducted in any time during the process for the manufacture of transparent conductor.
- Polysiloxane-based layer forming composition may comprise at least one compound of Formula (I) and optionally at least one compound of Formula (II) as follows:
Si(OR1)4 (I)
Si(OR2)aR3 4-a (II)
wherein: - a plurality of R1 may be the same as or different from each other and each of R1 independently represents a hydrogen atom or a hydrocarbon group
- a plurality of R2 and a plurality of R3 may be the same as or different from each other, and each of R2 and each of R3 independently represent a hydrogen atom or a hydrocarbon group, and
- a represents an integer of 1 to 3.
- The polysiloxane-based layer of the invention preferably comprise a reaction product obtained by reacting at least one compound of Formula (I) and optionally at least one compound of Formula (II).
- Preferable examples of the respective hydrocarbon groups for R1 in the Formula (I) and for R2 and R3 in the Formula (II) include alkyl groups or aryl groups. In a case in which R1, R2 and R3 represent an alkyl group, the number of carbon atoms is preferably 1 to 18, more preferably 1 to 8, and still more preferably 1 to 4. In addition, in a case in which R1, R2 and R3 represent an aryl group, a phenyl group is preferable. The alkyl group or the aryl group may have a substituent, and examples of introducible substituents include halogen atoms, amino groups, mercapto groups and the like. Meanwhile, the compound is a low molecular compound, and the molecular weight is preferably comprised between 30 and 1000.
- Hereinafter, specific examples of the compounds of Formula (I) will be described, but the invention is not limited thereto.
- Preferable compounds of Formula (I) are chosen in the group constituted by: tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, methoxytriethoxysilane, ethoxytrimethoxysilane, methoxytripropoxysilane, ethoxytripropoxysilane, propoxytrimethoxysilane, propoxytriethoxysilane, dimethoxydiethoxysilane, or the like. Among the above, particularly preferable examples include tetramethoxysilane, tetraethoxysilane, and the like.
- Next, specific examples of the compound represented by the Formula (II) will be described, but the invention is not limited thereto.
- In a case in which a is 2, the compound of Formula (II) is a difunctional alkoxysilane, and may be chosen in the group constituted by: dimethyl dimethoxysilane, diethyl dimethoxysilane, propyl methyl dimethoxysilane, dimethyl diethoxysilane, diethyl diethoxysilane, dipropyl diethoxysilane, γ-chloropropyl methyl diethoxysilane, γ-chloropropyl methyl dimethoxysilane, (p-chloromethyl)phenyl methyl dimethoxysilane, γ-bromopropyl methyl dimethoxysilane, acetoxymethyl methyl diethoxysilane, acetoxymethyl methyl dimethoxysilane, acetoxy propyl methyl dimethoxysilane, benzoyloxypropyl methyl dimethoxysilane, 2-(carbomethoxy) ethyl methyl dimethoxysilane, phenyl methyl dimethoxysilane, phenyl ethyl diethoxysilane, phenyl methyl di-propoxysilane, hydroxymethyl methyl diethoxysilane, N-(methyl-diethoxysilyl-propyl)-O-polyethylene oxide urethane, N-(3-methyl-diethoxysilylpropyl)-4-hydroxy-butylamide, N-(3-methyl-diethoxysilylpropyl) gluconamide, vinyl methyl dimethoxysilane, vinyl methyl diethoxysilane, vinyl methyl dibutoxysilane, isopropenyl methyl dimethoxysilane, isopropenyl methyl diethoxysilane, isopropenyl methyl dibutoxysilane, vinyl methyl bis(2-methoxyethoxy)silane, allyl methyl dimethoxysilane, vinyldecyl methyl dimethoxysilane, vinyloctyl methyl dimethoxysilane, vinylphenyl methyl dimethoxysilane, isopropenylphenyl methyl dimethoxysilane, 2-(meth)acryloyloxyethyl methyl dimethoxysilane, 2-(meth)acryloyloxyethyl methyl diethoxysilane, 3-(meth)acryloyloxypropyl methyl dimethoxysilane, 3-(meth)acryloyloxypropyl methyl diethoxysilane, 3-(meth)acryloyloxypropyl methyl bis(2-methoxyethoxy)silane, 3-[2-(allyloxycarbonyl)phenylcarbonyloxy]propyl methyl dimethoxysilane, 3-(vinyl phenylamino)propyl methyl dimethoxysilane, 3-(vinylphenylamino)propyl methyl diethoxysilane, 3-(vinylbenzylamino)propyl methyl diethoxysilane, 3-(vinylbenzylamino)propyl methyl diethoxysilane, 3-[2-(N-vinylphenylmethylamino)ethyl amino]propyl methyl dimethoxysilane, 3-[2-(N-isopropenylphenylmethylamino)ethylamino]propyl methyl dimethoxysilane, 2-(vinyloxy)ethyl methyl dimethoxysilane, 3-(vinyloxy)propyl methyl dimethoxysilane, 4-(vinyloxy)butyl methyl diethoxysilane, 2-(isopropenyloxy)ethyl methyl dimethoxysilane, 3-(allyloxy)propyl methyl dimethoxysilane, 10-(allyloxycarbonyl)decyl methyl dimethoxysilane, 3-(isopropenylmethyloxy)propyl methyl dimethoxysilane, 10-(isopropenylmethyloxycarbonyl)decyl methyl dimethoxysilane, 3-[(meth)acryloyloxypropyl]methyl dimethoxysilane, 3-[(meth)acryloyloxypropyl]methyl diethoxysilane, 3-[(meth)acryloyloxymethyl]methyl dimethoxysilane, 3-[(meth)acryloyloxymethyl]methyl diethoxysilane, γ-glycidoxypropyl methyl dimethoxysilane, N-[3-(meth)acryloyloxy-2-hydroxypropyl]-3-aminopropyl methyl diethoxysilane, O-[(meth)acryloyloxyethyl]-N-(methyldiethoxysilylpropyl)urethane, γ-glycidoxypropyl methyl diethoxysilane, β-(3,4-epoxycyclohexyl)ethyl methyl dimethoxysilane, γ-aminopropyl methyl diethoxysilane, γ-aminopropyl methyl dimethoxysilane, 4-amino-butyl methyl diethoxysilane, 11-amino-undecyl methyl diethoxysilane, m-aminophenyl methyl dimethoxysilane, p-aminophenyl methyl dimethoxysilane, 3-aminopropyl methyl-bis(methoxyethoxy)silane, 2-(4-pyridylethyl)methyl diethoxysilane, 2-(methyldimethoxysilylethyl)pyridine, N-(3-methyldimethoxysilylpropyl)pyrrole, 3-(m-aminophenoxy)propyl methyl dimethoxysilane, N-(2-aminoethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-aminoethyl)-3-aminopropyl methyl diethoxysilane, N-(6-aminohexyl)amino-methyl methyl diethoxysilane, N-(6-aminohexyl)aminopropyl methyl dimethoxysilane, N-(2-aminoethyl)-11-amino-undecyl methyl dimethoxysilane, (aminoethyl aminomethyl)phenethyl methyl dimethoxysilane, N-3-[(amino(polypropyleneoxy))]aminopropyl methyl dimethoxysilane, n-butylaminopropyl methyl dimethoxysilane, N-ethylaminoisobutyl methyl dimethoxysilane, N-methyl-aminopropyl methyl dimethoxysilane, N-phenyl-γ-aminopropyl methyl dimethoxysilane, N-phenyl-γ-aminomethyl methyl diethoxysilane, (cyclohexylaminomethyl) methyl diethoxysilane, N-cyclohexylaminopropyl methyl dimethoxysilane, bis(2-hydroxyethyl)-3-aminopropyl methyl diethoxysilane, diethylaminomethyl methyl diethoxysilane, diethylaminopropyl methyl dimethoxysilane, dimethylaminopropyl methyl dimethoxysilane, N-3-methyldimethoxysilylpropyl-m-phenylenediamine, N,N-bis[3-(methyldimethoxysilyl)propyl]-ethylenediamine, bis(methyl-diethoxysilylpropyl)amine, bis(methyldimethoxysilylpropyl)amine, bis[(3-methyldimethoxysilyl)propyl]-ethylenediamine, bis[3-(methyldiethoxysilyl)propyl]urea, bis(methyldimethoxysilylpropyl)urea, N-(3-methyl-diethoxysilylpropyl)-4,5-dihydroimidazole, ureidopropyl methyl diethoxysilane, ureidopropyl methyl dimethoxysilane, acetamidopropyl methyl dimethoxysilane, 2-(2-pyridylethyl)thiopropyl methyl dimethoxysilane, 2-(4-pyridylethyl)thiopropyl methyl dimethoxysilane, bis[3-(methyldiethoxysilyl)propyl]disulfide, 3-(methyldiethoxysilyl)propylsuccinic acid anhydride, γ-mercaptopropyl methyl dimethoxysilane, γ-mercaptopropyl methyl diethoxysilane, isocyanatopropyl methyl dimethoxysilane, isocyanatopropyl methyl diethoxysilane, isocyanatoethyl methyl diethoxysilane, isocyanatomethyl methyl diethoxysilane, carboxyethyl methylsilane diol sodium salt, N-(methyldimethoxysilylpropyl)ethylenediamine triacetic acid trisodium salt, 3-(methyl dihydroxysilyl)-1-propanesulfonic acid, diethyl phosphatoethyl methyl diethoxysilane, 3-methyl-dihydroxysilylpropyl methylphosphonate sodium salt, bis(methyldiethoxysilyl)ethane, bis(methyldimethoxysilyl)ethane, bis(methyldiethoxysilyl)methane, 1,6-bis(methyldiethoxysilyl)hexane, 1,8-bis(methyldiethoxysilyl)octane, p-bis(methyldimethoxysilylethyl)benzene, p-bis(methyldimethoxysilyl)benzene, 3-methoxypropyl methyl dimethoxysilane, 2-[methoxy(polyethyleneoxy)propyl]methyl dimethoxysilane, methoxytriethyleneoxypropyl methyl dimethoxysilane, tris(3-methyldimethoxysilylpropyl)isocyanurate, [hydroxy(polyethyleneoxy)propyl]methyl diethoxysilane, N,N'-bis(hydroxyethyl)-N,N'-bis(methyldimethoxysilylpropyl)ethylenediamine, bis-[3-(methyldiethoxysilylpropyl)-2-hydroxypropoxy]polyethylene oxide, bis[N,N'-(methyl-diethoxysilylpropyl)aminocarbonyl]polyethylene oxide, and bis(methyldiethoxysilylpropyl)polyethylene oxide.
- In a case in which a is 3, the compound of Formula (II) is a trifunctional organo alkoxysilane, and may be chosen in the group constituted by: methyl trimethoxysilane, ethyl trimethoxysilane, propyl trimethoxysilane, methyl triethoxysilane, ethyl triethoxysilane, propyl triethoxysilane, γ-chloropropyl triethoxysilane, γ-chloropropyl trimethoxysilane, chloromethyl triethoxysilane, (p-chloromethyl)phenyl trimethoxy silane, γ-bromopropyl trimethoxysilane, acetoxymethyl triethoxysilane, acetoxymethyl trimethoxysilane, acetoxypropyl trimethoxy silane, benzoyloxypropyl trimethoxysilane, 2-(carbomethoxy)ethyl trimethoxysilane, phenyl trimethoxysilane, phenyl triethoxysilane, phenyl tripropoxysilane, hydroxymethyl triethoxysilane, N-(triethoxysilylpropyl)-O-polyethylene oxido urethane, N-(3-triethoxysilylpropyl)-4-hydroxybutyl amide, N-(3-triethoxysilylpropyl)gluconamide, vinyl trimethoxysilane, vinyl triethoxysilane, vinyl tributoxysilane, isopropenyl trimethoxysilane, isopropenyl triethoxysilane, isopropenyl tributoxysilane, vinyl tris(2-methoxyethoxy)silane, allyl trimethoxysilane, vinyldecyl trimethoxy silane, vinyloctyl trimethoxysilane, vinylphenyl trimethoxysilane, isopropenylphenyl trimethoxysilane, 2-(meth)acryloyloxyethyl trimethoxysilane, 2-(meth)acryloyloxyethyl triethoxysilane, 3-(meth)acryloyloxypropyl trimethoxysilane, 3-(meth)acryloyloxypropyl trimethoxysilane, 3-(meth)acryloyloxypropyl tris(2-methoxyethoxy)silane, 3-[2-(allyloxycarbonyl)phenylcarbonyloxy]propyl trimethoxysilane, 3-(vinylphenylamino)propyl trimethoxysilane, 3-(vinylphenylamino)propyl triethoxysilane, 3-(vinylbenzylamino)propyl triethoxysilane, 3-(vinylbenzylamino)propyl triethoxysilane, 3-[2-(N-vinylphenylmethylamino)ethylamino]propyl trimethoxysilane, 3-[2-(N-isopropenylphenylmethylamino)ethylamino]propyl trimethoxysilane, 2-(vinyloxy)ethyl trimethoxysilane, 3-(vinyloxy)propyl trimethoxysilane, 4-(vinyloxy)butyl triethoxysilane, 2-(isopropenyloxy)ethyl trimethoxysilane, 3-(allyloxy)propyl trimethoxysilane, 10-(allyloxycarbonyl)decyl trimethoxysilane, 3-(isopropenyl methyloxy)propyl trimethoxysilane, 10-(isopropenylmethyloxycarbonyl)decyl trimethoxysilane, 3-[(meth)acryloyloxy]propyl trimethoxysilane, 3-[(meth)acryloyloxy]propyl triethoxysilane, (meth)acryloyloxymethyl trimethoxysilane, (meth)acryloyloxymethyl triethoxysilane, γ-glycidoxypropyl trimethoxysilane, N-[3-(meth)acryloyloxy-2-hydroxypropyl]-3-aminopropyl triethoxysilane, O-[(meth)acryloyloxyethyl]-N-(triethoxysilylpropyl)urethane, γ-glycidoxypropyl triethoxysilane, β-(3,4-epoxycyclohexyl)ethyl trimethoxysilane, γ-aminopropyl triethoxysilane, γ-aminopropyl trimethoxysilane, 4-aminobutyl triethoxysilane, 11-aminoundecyl triethoxysilane, m-aminophenyl trimethoxysilane, p-aminophenyl trimethoxysilane, 3-amino propyl tris(methoxyethoxyethoxy)silane, 2-(4-pyridyl)ethyl triethoxysilane, 2-(trimethoxysilylethyl)pyridine, N-(3-trimethoxysilylpropyl)pyrrole, 3-(m-amino-phenoxy)propyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl triethoxysilane, N-(6-aminohexyl)aminomethyl triethoxy silane, N-(6-aminohexyl)aminopropyl trimethoxysilane, N-(2-aminoethyl)-11-aminoundecyl trimethoxysilane, (aminoethylaminomethyl)phenethyl trimethoxysilane, 3-N-[(amino (polypropyleneoxy))]aminopropyl trimethoxysilane, n-butylaminopropyl trimethoxy silane, N-ethylaminoisobutyl trimethoxy silane, N-methylaminopropyl trimethoxysilane, N-phenyl-γ-aminopropyl trimethoxysilane, N-phenyl-γ-aminomethyl triethoxysilane, (cyclohexylaminomethyl)triethoxysilane, N-cyclohexylaminopropyl trimethoxysilane, bis(2-hydroxyethyl)-3-aminopropyl triethoxysilane, diethylaminomethyl triethoxysilane, diethylaminopropyl trimethoxy silane, dimethylaminopropyl trimethoxysilane, N-3-trimethoxysilylpropyl-m-phenylenediamine, N,N-bis[3-(trimethoxysilyl)propyl]ethylenediamine, bis(triethoxysilylpropyl)amine, bis(trimethoxysilylpropyl)amine, bis [(3-trimethoxysilyl)propyl]-ethylenediamine, bis[3-(triethoxysilyl)propyl]urea, bis(trimethoxysilylpropyl)urea, N-(3-triethoxysilylpropyl)-4,5-dihydroimidazole, ureidopropyltriethoxysilane, ureidopropyltrimethoxysilane, acetamidopropyl trimethoxysilane, 2-(2-pyridylethyl)thiopropyl trimethoxysilane, 2-(4-pyridylethyl)thiopropyl trimethoxysilane, bis[3-(triethoxysilyl)propyl]disulfide, 3-(triethoxysilyl)propylsuccinic acid anhydride, γ-mercaptopropyl trimethoxysilane, γ-mercaptopropyl triethoxysilane, isocyanatopropyl trimethoxysilane, isocyanatopropyl triethoxysilane, isocyanatoethyl triethoxysilane, isocyanatomethyl triethoxysilane, carboxyethylsilanetriol sodium salt, N-(trimethoxysilyl propyl)ethylenediamine triacetic acid trisodium salt, 3-(trihydroxysilyl)-1-propanesulfonic acid, diethyl phosphatoethyl triethoxysilane, 3-trihydroxysilylpropyl methyl phosphonate sodium salt, bis(triethoxysilyl)ethane, bis(trimethoxysilyl)ethane, bis(triethoxysilyl)methane, 1,6-bis(triethoxysilyl)hexane, 1,8-bis(triethoxysilyl)octane, p-bis(trimethoxysilylethyl)benzene, p-bis(trimethoxysilyl)methylbenzene, 3-methoxypropyl trimethoxysilane, 2-[methoxy(polyethyleneoxy)propyl]trimethoxysilane, methoxytriethyleneoxypropyl trimethoxysilane, tris(3-trimethoxysilylpropyl)isocyanurate, [hydroxy(polyethyleneoxy)propyl]triethoxysilane, N,N'-bis(hydroxyethyl)-N,N'-bis(trimethoxysilylpropyl)ethylenediamine, bis-[3-(triethoxysilylpropyl)-2-hydroxypropoxy]polyethylene oxide, bis[N,N'-(triethoxysilylpropyl)aminocarbonyl]polyethylene oxide, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane, and bis(triethoxysilylpropyl)polyethylene oxide.
- Preferable examples of the specific alkoxide compound include tetramethoxysilane, tetraethoxysilane, 3-glycidoxypropyltrimethoxysilane, diethyldiethoxysilane, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane.
- Preferably, the polysiloxane-based layer comprises a reaction product obtained by reacting:
- at least one compound of Formula (I) chosen in the group constituted by: tetramethoxysilane and tetraethoxysilane; and
- optionally at least one compound of Formula (II) chosen in the group constituted by: 3-glycidoxypropyltrimethoxysilane, diethyldiethoxysilane, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane.
- The specific alkoxide can be easily procured from commercially available products, or can be obtained using a well-known synthesis method, for example, a reaction between each of the metal chlorides and an alcohol.
- As the specific alkoxide, one compound may be solely used, or a combination of two or more compounds may be used.
- Examples of the combination include a combination of at least one compound of Formula (I) and at least one compound of Formula (II). For a conductive layer including, as the matrix, a cured sol-gel substance obtained by hydrolyzing and polycondensing a combination of two specific alkoxide compounds, the properties can be modified using the mixing ratio.
- A polysiloxane-based layer comprising the specific cured sol-gel substance as the matrix can be provided on the conductive layer by coating an aqueous solution comprising the specific alkoxide compound as a coating liquid (hereinafter, also referred to as "sol-gel coating liquid") on the conductive layer so as to form a coated film, causing reactions of hydrolysis and polycondensation of the specific alkoxide compound in the coated film, and, furthermore, as necessary, heating and evaporating water which is used as a solvent, thereby drying the coated film.
- In order to accelerate the hydrolysis and polycondensation reactions, it is practically preferable to jointly use an acidic catalyst or a basic catalyst since the reaction efficiency increases. Any substance can be used as the catalyst as long as the substance accelerates the hydrolysis and polycondensation reactions of the alkoxide compound. Examples of the catalyst include acidic compounds and basic compounds. The acidic compounds and the basic compounds can be used as they are, and may be used in a state in which the compounds are dissolved in a solvent such as water or an alcohol. The kind of the acidic catalyst or the basic catalyst is not particularly limited; however, in a case in which it is necessary to use a catalyst having a high concentration, it is preferable to select a catalyst made of an element that rarely remains in the layer. Specific examples of the acidic catalyst include hydrogen halides such as hydrochloric acid; inorganic acids such as nitric acid, sulfuric acid, sulfurous acid, hydrogen sulfide, perchloric acid, hydrogen perchloride and carbonic acid; carboxylic acids such as formic acid and acetic acid; substituted carboxylic acids such as benzenesulfonic acid; and the like, and specific examples of the basic catalyst include quaternary ammonium salt compounds such as ammonia water and tetramethylammonium hydroxide; organic amines such as ethylamine and aniline; and the like.
- An organic solvent may be included as desired in the sol-gel coating liquid in order to ensure the uniform formability of a coating liquid film on the conductive layer. Examples of the organic solvent include ketone-based solvents such as acetone, methyl ethyl ketone and diethyl ketone; alcohol-based solvents such as methanol, ethanol, 2-propanol, 1-propanol, 1-butanol and tert-butanol; chlorine-based solvents such as chloroform and methylene chloride; aromatic solvents such as benzene and toluene; ester-based solvents such as ethyl acetate, butyl acetate and isopropyl acetate; ether-based solvents such as diethyl ether, tetrahydrofuran and dioxane; glycol ether-based solvents such as ethylene glycol monomethyl ether and ethylene glycol dimethyl ether; and the like. The organic solvent may be added in a range of preferably from 10 to 90% by mass, more preferably from 25 to 75% by mass with respect to the total mass of the sol-gel coating liquid.
- The heating temperature for accelerating the sol-gel reaction is appropriate in a range of from 30°C to 200°C, and more preferably in a range of from 50°C to 180°C. The heating and drying time is preferably from 10 seconds to 300 minutes, and more preferably from 1 minute to 120 minutes.
- According to one embodiment of the present invention, at least a compound of formula (I), and optionally at least a compound of formula (II) is mixed with a polar solvent and a catalyst to thereby prepare the solution by sol-gel type hydrolysis.
- The molar ratio of compound(s) of formula (I) and compound(s) of formula (II) may be in the range from 1:5 to 10:1, preferably from 1:1 to 7:1.
- The content ratio of the compound of Formula (I)/compound of Formula (II) may be in a range of from 0.01/1 to 100/1, and more preferably in a range of from 0.05/1 to 50/1 by mass ratio.
- The solution may be coated on the surface of the conductive layer by spin coating, dip coating, roll coating, screen coating, spray coating, spin casting, flow coating, screen printing, ink-jetting, drop casting, and the like with a thickness usually comprised between 0.03 and 0.1 µm, followed by heat curing or photocuring, to thereby form a layer.
- The thickness of the polysiloxane-based layer is preferably from 10 nm to 1000 nm, more preferably 20 to 500 nm, particularly 30 to 150 nm, notably 40 to 100 nm. This thickness may be determined by a person skilled in the art considering the type of rod to apply the coating to determine the wet thickness and the solid content of the coating formulation.
- The electrode assembly according to the present invention can attain excellent one or more optical and electrical properties which are often required for various applications of such transparent conductor.
- Accordingly, the electrode assembly of the present invention may possess at least one, preferably two, more preferably all of the following characteristics:
- a transparency to visible light from 60 to 99 %, preferably from 75 to 98 %, and even more preferably from 88 to 95 %;
- a sheet resistance from 0.1 to 1000000 Ω/square, preferably from 5 to 200 Ω/square, even more preferably from 30 to 80 Ω/square;
- a haze from 0.1 to 20 %, preferably, from 0.4 to 4 %, even more preferably from 0.6 to 1.1 %; and
- a contact angle 50 to 80°, preferably from 65 to 75°.
- In the present invention, the transparency (transmission) to visible light can be measured by using UV-VIS spectrometer at wavelength range from 400 nm to 800 nm. For instance, Haze-gard plus instrument (transparency function) available from BYK-Gardner (ASTM D 1003) can be used.
- In the present invention, the sheet resistance can be measured using 4-point probes using R-CHEK Surface Resistivity Meter (Model #RC3175) available from EDTM Inc.
- In the present invention, the haze can be measured using a haze-meter, for instance Haze-gard plus instrument available from BYK-Gardner (ASTM D 1003).
- In the present invention, the assessment for contact angle can be measured by measurement of water contact angle thru SEO Phoenix 150 (Surface electro optics Co, Korea) at 26.5°C and RH35%.
- The transparent electrode assembly according to the present invention may be subject to one or more subsequent fabrication process. For instance, the transparent electrode assembly can be patterned and/or over-coated with one or more layer. For the methodologies of the patterning, reference can be made to the disclosures of the United States Patent Application Publication No.
US 2014/0203223 A , which, by its entirety, is incorporated herein by reference. - The transparent electrode assembly of the present invention and/or its fabricated structure, especially patterned structure thereof, can be used in various electronic devices in which a transparent electrode assembly is suitably utilized.
- The invention also concerns an electronic device comprising at least an electrode assembly comprising at least:
- a substrate;
- a conductive layer formed on the substrate comprising at least a metal nanowires; and
- a polysiloxane-based layer formed on the conductive layer.
- Examples of the application include touch panels, various electrodes for display devices, such as liquid crystal display (LCD), light emitting diode (LED) display plasma displays, and organic light-emitting diode (OLED) displays, electroluminescent display displays (ELD), electrophoretic display (EPD), LED lighting, OLED lighting, antistatic layers, electromagnetic interference (EMI) shields, touch-panel-embedded display devices, and photovoltaic (PV) cells, but the present invention is not limited thereto. The electrode assembly of the present invention is particularly useful when used in touch panel and display applications.
- Thus, still further aspect of the present invention concerns an electronic device at least comprising the electrode assembly, such as notably the transparent electrode assembly, according to the present invention.
- The disclosure will now be illustrated with working examples, which is intended to illustrate the working of disclosure and not intended to take restrictively to imply any limitations on the scope of the present disclosure. Other examples are also possible which are within the scope of the present disclosure.
- 350g PEDOT:PSS (1wt% Verasol WED-SM from SOKEN) has been put on 2L Vessel, then 100g of isopropyl alcohol, 50g Dimethyl sulfoxide and 500g deionized water have been added. The mixture was stirred by direct stirrer at 100rpm. 8.3g of Synergex® (N-Butylethanolamine from TAMICO) as neutral agent has been added when the mixture goes from low pH to reach a pH of 9.4. This mixture was 0.35wt% solid contents.
- 14.25g of PEDOT formulation was put in 250mL Nalgene bottle, and 60.75g of deionized water and 10g of isopropyl alcohol have been then added. 15g of AgNW (1wt% dispersion in water from N&B) and 0.07g Dynol 607(from Air-product) as leveling agent have been added after the mixture shakes by vortex mixer. The mixture has been shaken by roll-mixer during 1 hour.
- 5g of cellulose (Mw 4000, B4K, Lotte Fine Chemicals) has been dissolved in 995g D.I water as stirring during 24hr. 14.25g of cellulose solution has been put in 250mL Nalgene bottle, and 60.75g of deionized water and 10g of isopropyl alcohol have been added. 15g AgNW (1wt% dispersion in water from N&B) has been added and the mixture has been shaken by vortex mixer during 1 hour.
- 205g of TEOS (tetramethyl orthosilicate) has been put on 2L reactor vessel and 624.8g of ethanol and 156.2g of deionized water have been added. 14g of acetic acid has been added into the vessel. The mixture has been stirred then under N2 gas during 24hr at room temperature. After finished sol-gel synthesis, the mixture has been kept in freezer at below -12°C.
- 164g of TEOS (tetramethyl orthosilicate) and 41g of GPTMS (glycidoxypropyl trimethoxysilane) have been put on 2L reactor vessel and 624.8g of ethanol and 156.2g of deionized water have been then added. 14g of acetic acid has been then added into the vessel. The mixture has been stirred then under N2 gas during 24hr at room temperature. After finished sol-gel synthesis, the mixture has been kept in freezer at below -12°C.
- 164g of 3-methacryloxypropyl-trimethoxysilane and 41g of GPTMS (glycidoxypropyl trimethoxysilane) have been put on 2L reactor vessel and 624.8g of ethanol and 156.2g of deionized water have been then added. 14g of acetic acid has been then added into the vessel. The mixture has been stirred then under N2 gas during 24hr at room temperature. After finished sol-gel synthesis, the mixture has been kept in freezer at below -12°C.
- AgNW formulation has been first coated on PET substrate by bar coater (#8) and get dry on condition of 130°C/60sec (at convection oven). This coated film shows properties on Transmittance 92% and Haze 0.64%. Then UV coating solution (Urethane Acrylate - PET-1006, Headong UV polymer, Korea. 27 wt%) has been diluted on ethyl cellosolve (2-ethoxy ethanol) as the ratios 1 to 10 (10g of solution for 100g of ethyl cellosolve), and then shook by vortex mixer. This solution has 2.45 wt% of solid contents. This solution has been then coated on the AgNW formulation film with 500mJ UV-radiation under broad band UV mercury lamp after drying at 130°C/60min. This coated film shows properties on Transmittance 91.9%, Haze 0.89. All bar coater used in these experiments are wire wound rods from RDS with Wire Size #.
- AgNW formulation has been first coated on PET substrate by bar coater (#8) and get dry on condition of 130°C/60sec (at convection oven). This coated film shows properties on Transmittance 89.4% and Haze 1.05%. Then UV coating solution (Urethane Acrylate - PET-1006, Headong UV polymer, Korea. 27 wt%) has been diluted on ethyl cellosolve as the ratios 1 to 10 (10g of solution for 100g of ethyl cellosolve), and then shook by vortex mixer. This solution has 2.45wt% of solid contents. This solution has been then coated on the AgNW formulation film with 500mJ UV-radiation under broad band UV mercury lamp after drying at 130°C/60min. This coated film shows properties on Transmittance 88.7%, Haze 1.37.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C/60sec (at convection oven). The polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer. The mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min. Film of AgNW formulation has transmittance 92.6% and haze 0.82%. Film of AgNW formulation with the polysiloxane layer has transmittance 90.5% and haze 1.03%.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C /60sec. The polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer. The mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min. Film of AgNW formulation has transmittance 92.6% and haze 0.55%. Film of AgNW formulation with the polysiloxane layer has transmittance 91% and haze 0.83%.
- Each of AgNW formulations has been coated on PET substrate by bar coater(#8) gets dry on condition of 130°C /60sec. The polysiloxane mixture is then diluted in ethanol as a ratio of 1g of polysiloxane mixture with 2g of ethanol, and then shook by vortex mixer. The mixture is then coated on the AgNW layer by bar coater(#5) and then dried under drying condition of 130°C/10min. Film of AgNW formulation has transmittance 92.3% and haze 0.73%. Film of AgNW formulation with the polysiloxane layer has transmittance 88.9% and haze 1.49%.
- Table 1 shows optical properties and contact angle after treatment.
Table 1 Case Comp. example 1 Comp. example 2 Example 1 Example 2 AgNW formulation AgNW + cellulose AgNW + PEDOT AgNW + cellulose AgNW + PEDOT AgNW + cellulose AgNW + PEDOT Without treatment layer Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Tr 92% Haze 0.64% Tr 89.4% Haze 1.05% Treatment layer UV coating UV coating POS A POS A POS B POS B With treatment layer Tr 91.9% Haze 0.89% Tr 88.7% Haze 1.37% Tr 92.6% Haze 0.82% Tr 90.5% Haze 1.03% Tr 92.6% Haze 0.55% Tr 91% Haze 0.83% Contact angle (°) 52.64 52.64 69.46 69.46 70.53 70.53 - It appears that polysiloxane layer provides a higher contact angle and lower haze in comparison with a classical UV coating. The use of a polysiloxane layer also permit to increase the transmittance of the film in comparison with the AgNW formulation layer alone, while the use of a classical UV coating is substantially decreasing the transmittance in comparison with the use of the AgNW formulation layer alone.
- Transmittance and haze were measured by averaging the value in 9 points on the coated PET film (A4 size) by using, respectively, UV-VIS spectrometer at wavelength range from 400 nm to 800 nm and Haze-gard plus instrument from BYK-Gardner in accordance with ASTM D 1003.
- The assessment for contact angle on each sample has been made as follows: measurement of water contact angle thru SEO Phoenix 150 (Surface electro optics Co, Korea) by using coated film as upper description (26.5°C/RH35%).
- Sheet resistance was measured by averaging the value in 12 points in the coated PET film (A4 size) with 4-point probes using R-CHEK Surface Resistivity Meter (Model #RC3175) from EDTM Inc.
- The test condition keeps under 65°C and relative humidity 90%. For this test, test equipment uses a thermo hygrostat from Enex science, Korea. It determines the results of change rates on sheet-resistance after having done during 250hr. Here in, sample size is 7.5cm by 7.5cm on each condition. The initial sheet-resistance is around 50Ω/sq. Δsheet-resistance = (sheet-resistance after test/ sheet-resistance before test) X 100%.
- Table 2 shows the test results for reliability under 65°C and relative humidity 90%.
Table 2 Case Comp. example 1 Comp. example 2 Example 1 Example 2 Example 3 AgNW + cellulose AgNW + PEDOT AgNW AgNW + PEDOT AgNW AgNW + PEDOT AgNW AgNW + PEDOT Δ sheet-resistance (%) 34 23 9 6 7 3 17 15 - It appears that the application of a polysiloxane layer lead to better performance after durability test of high humidity and high temperature (at 65°C/90%).
Claims (25)
- An electrode assembly comprising at least:- a substrate;- a conductive layer formed on the substrate comprising at least a metal nanowires; and- a polysiloxane-based layer formed on the conductive layer.
- The electrode assembly according to claim 1, wherein the substrate has a total visible light transmittance from 60% to 100%.
- The electrode assembly according to claim 1 or 2, wherein the substrate is a glass substrate or a transparent solid polymer chosen in the group constituted by: polycarbonates, polyesters, acryl resins, polyvinyl resins, aromatic polyamide resins, polyamideimides, polyethylene naphthalene dicarboxylate, polysulphones, polyimides (PI), cyclic olefin copolymers (COC), styrene copolymers, polyethylene, polypropylene, cellulose ester bases and any combination thereof
- The electrode assembly according to anyone of claim 1 to 3, wherein the aspect ratio of the metallic nanowires is from 300 and 2000.
- The electrode assembly according to anyone of claim 1 to 4, wherein the metal of metal nanowires is chosen in the group constituted by: copper, silver, gold, platinum, palladium, nickel, tin, cobalt, rhodium, iridium, iron, ruthenium, osmium, manganese, molybdenum, tungsten, niobium, tantalum, titanium, bismuth, antimony, lead, alloys thereof and the like.
- The electrode assembly according to anyone of claim 1 to 5, wherein the metal nanowires is chosen in the group constituted by: metal nanowires include, but are not limited to, silver nanowires, gold nanowires, copper nanowires, nickel nanowires, gold-plated silver nanowires, platinum nanowires, and palladium nanowires.
- The electrode assembly according to anyone of claim 1 to 6, wherein the metal nanowires have an average diameter of 10 nm to 30 nm and an average length of 10 to 30 µm.
- The electrode assembly according to anyone of claim 1 to 7, wherein the conductive layer comprises at least one π-conjugated conductive polymer.
- The electrode assembly according to anyone of claim 1 to 8, wherein the conductive layer comprises at least one π-conjugated conductive polymer chosen in the group constituted by polyaniline polymers, polypyrrole polymers, polythiophene polymers, and any combination thereof.
- The electrode assembly according to anyone of claim 1 to 9, wherein the conductive layer comprises poly(3,4-ethylenedioxythiophene) polymer.
- The electrode assembly according to anyone of claim 1 to 10, wherein the conductive layer comprises at least one amine compound.
- The electrode assembly according to claim 11, wherein the amine compound is an alkanol amine.
- The electrode assembly according to claim 11 or 12, wherein the amine compound is a compound comprising at least one secondary amine function or a tertiary amine function and at least one hydroxyl function.
- The electrode assembly according to anyone of claims 11 to 13, wherein the amine compound has a boiling point from 180-300 °C.
- The electrode assembly according to anyone of claims 1 to 14, wherein the conductive layer comprises at least one polysaccharide.
- The electrode assembly according to anyone of claims 1 to 15, wherein the polysiloxane-based layer comprises a reaction product obtained by reacting at least one compound of Formula (I) and optionally at least one compound of Formula (II) as follows:
Si(OR1)4 (I)
Si(OR2)aR3 4-a (II)
wherein:- a plurality of R1 may be the same as or different from each other and each of R1 independently represents a hydrogen atom or a hydrocarbon group- a plurality of R2 and a plurality of R3 may be the same as or different from each other, and each of R2 and each of R3 independently represent a hydrogen atom or a hydrocarbon group, and- a represents an integer of 1 to 3. - The electrode assembly according to claim 16, wherein the compounds of Formula (I) are chosen in the group constituted by: tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetrabutoxysilane, methoxytriethoxysilane, ethoxytrimethoxysilane, methoxytripropoxysilane, ethoxytripropoxysilane, propoxytrimethoxysilane, propoxytriethoxysilane, and dimethoxydiethoxysilane.
- The electrode assembly according to claim 16, wherein the compounds of Formula (II) when a is 2, are chosen in the group constituted by: dimethyl dimethoxysilane, diethyl dimethoxysilane, propyl methyl dimethoxysilane, dimethyl diethoxysilane, diethyl diethoxysilane, dipropyl diethoxysilane, γ-chloropropyl methyl diethoxysilane, γ-chloropropyl methyl dimethoxysilane, (p-chloromethyl)phenyl methyl dimethoxysilane, γ-bromopropyl methyl dimethoxysilane, acetoxymethyl methyl diethoxysilane, acetoxymethyl methyl dimethoxysilane, acetoxy propyl methyl dimethoxysilane, benzoyloxypropyl methyl dimethoxysilane, 2-(carbomethoxy) ethyl methyl dimethoxysilane, phenyl methyl dimethoxysilane, phenyl ethyl diethoxysilane, phenyl methyl di-propoxysilane, hydroxymethyl methyl diethoxysilane, N-(methyl-diethoxysilyl-propyl)-O-polyethylene oxide urethane, N-(3-methyl-diethoxysilylpropyl)-4-hydroxy-butylamide, N-(3-methyl-diethoxysilylpropyl) gluconamide, vinyl methyl dimethoxysilane, vinyl methyl diethoxysilane, vinyl methyl dibutoxysilane, isopropenyl methyl dimethoxysilane, isopropenyl methyl diethoxysilane, isopropenyl methyl dibutoxysilane, vinyl methyl bis(2-methoxyethoxy)silane, allyl methyl dimethoxysilane, vinyldecyl methyl dimethoxysilane, vinyloctyl methyl dimethoxysilane, vinylphenyl methyl dimethoxysilane, isopropenylphenyl methyl dimethoxysilane, 2-(meth)acryloyloxyethyl methyl dimethoxysilane, 2-(meth)acryloyloxyethyl methyl diethoxysilane, 3-(meth)acryloyloxypropyl methyl dimethoxysilane, 3-(meth)acryloyloxypropyl methyl diethoxysilane, 3-(meth)acryloyloxypropyl methyl bis(2-methoxyethoxy)silane, 3-[2-(allyloxycarbonyl)phenylcarbonyloxy]propyl methyl dimethoxysilane, 3-(vinyl phenylamino)propyl methyl dimethoxysilane, 3-(vinylphenylamino)propyl methyl diethoxysilane, 3-(vinylbenzylamino)propyl methyl diethoxysilane, 3-(vinylbenzylamino)propyl methyl diethoxysilane, 3-[2-(N-vinylphenylmethylamino)ethyl amino]propyl methyl dimethoxysilane, 3-[2-(N-isopropenylphenylmethylamino)ethylamino]propyl methyl dimethoxysilane, 2-(vinyloxy)ethyl methyl dimethoxysilane, 3-(vinyloxy)propyl methyl dimethoxysilane, 4-(vinyloxy)butyl methyl diethoxysilane, 2-(isopropenyloxy)ethyl methyl dimethoxysilane, 3-(allyloxy)propyl methyl dimethoxysilane, 10-(allyloxycarbonyl)decyl methyl dimethoxysilane, 3-(isopropenylmethyloxy)propyl methyl dimethoxysilane, 10-(isopropenylmethyloxycarbonyl)decyl methyl dimethoxysilane, 3-[(meth)acryloyloxypropyl]methyl dimethoxysilane, 3-[(meth)acryloyloxypropyl]methyl diethoxysilane, 3-[(meth)acryloyloxymethyl]methyl dimethoxysilane, 3-[(meth)acryloyloxymethyl]methyl diethoxysilane, γ-glycidoxypropyl methyl dimethoxysilane, N-[3-(meth)acryloyloxy-2-hydroxypropyl]-3-aminopropyl methyl diethoxysilane, O-[(meth)acryloyloxyethyl]-N-(methyldiethoxysilylpropyl)urethane, γ-glycidoxypropyl methyl diethoxysilane, β-(3,4-epoxycyclohexyl)ethyl methyl dimethoxysilane, γ-aminopropyl methyl diethoxysilane, γ-aminopropyl methyl dimethoxysilane, 4-amino-butyl methyl diethoxysilane, 11-amino-undecyl methyl diethoxysilane, m-aminophenyl methyl dimethoxysilane, p-aminophenyl methyl dimethoxysilane, 3-aminopropyl methyl-bis(methoxyethoxy)silane, 2-(4-pyridylethyl)methyl diethoxysilane, 2-(methyldimethoxysilylethyl)pyridine, N-(3-methyldimethoxysilylpropyl)pyrrole, 3-(m-aminophenoxy)propyl methyl dimethoxysilane, N-(2-aminoethyl)-3-aminopropyl methyl dimethoxysilane, N-(2-aminoethyl)-3-aminopropyl methyl diethoxysilane, N-(6-aminohexyl)amino-methyl methyl diethoxysilane, N-(6-aminohexyl)aminopropyl methyl dimethoxysilane, N-(2-aminoethyl)-11-amino-undecyl methyl dimethoxysilane, (aminoethyl aminomethyl)phenethyl methyl dimethoxysilane, N-3-[(amino(polypropyleneoxy))]aminopropyl methyl dimethoxysilane, n-butylaminopropyl methyl dimethoxysilane, N-ethylaminoisobutyl methyl dimethoxysilane, N-methyl-aminopropyl methyl dimethoxysilane, N-phenyl-γ-aminopropyl methyl dimethoxysilane, N-phenyl-γ-aminomethyl methyl diethoxysilane, (cyclohexylaminomethyl) methyl diethoxysilane, N-cyclohexylaminopropyl methyl dimethoxysilane, bis(2-hydroxyethyl)-3-aminopropyl methyl diethoxysilane, diethylaminomethyl methyl diethoxysilane, diethylaminopropyl methyl dimethoxysilane, dimethylaminopropyl methyl dimethoxysilane, N-3-methyldimethoxysilylpropyl-m-phenylenediamine, N,N-bis[3-(methyldimethoxysilyl)propyl]-ethylenediamine, bis(methyl-diethoxysilylpropyl)amine, bis(methyldimethoxysilylpropyl)amine, bis[(3-methyldimethoxysilyl)propyl]-ethylenediamine, bis[3 -(methyldiethoxysilyl)propyl]urea, bis(methyldimethoxysilylpropyl)urea, N-(3-methyl-diethoxysilylpropyl)-4,5-dihydroimidazole, ureidopropyl methyl diethoxysilane, ureidopropyl methyl dimethoxysilane, acetamidopropyl methyl dimethoxysilane, 2-(2-pyridylethyl)thiopropyl methyl dimethoxysilane, 2-(4-pyridylethyl)thiopropyl methyl dimethoxysilane, bis[3-(methyldiethoxysilyl)propyl]disulfide, 3-(methyldiethoxysilyl)propylsuccinic acid anhydride, γ-mercaptopropyl methyl dimethoxysilane, γ-mercaptopropyl methyl diethoxysilane, isocyanatopropyl methyl dimethoxysilane, isocyanatopropyl methyl diethoxysilane, isocyanatoethyl methyl diethoxysilane, isocyanatomethyl methyl diethoxysilane, carboxyethyl methylsilane diol sodium salt, N-(methyldimethoxysilylpropyl)ethylenediamine triacetic acid trisodium salt, 3-(methyl dihydroxysilyl)-1-propanesulfonic acid, diethyl phosphatoethyl methyl diethoxysilane, 3-methyl-dihydroxysilylpropyl methylphosphonate sodium salt, bis(methyldiethoxysilyl)ethane, bis(methyldimethoxysilyl)ethane, bis(methyldiethoxysilyl)methane, 1,6-bis(methyldiethoxysilyl)hexane, 1,8-bis(methyldiethoxysilyl)octane, p-bis(methyldimethoxysilylethyl)benzene, p-bis(methyldimethoxysilyl)benzene, 3-methoxypropyl methyl dimethoxysilane, 2-[methoxy(polyethyleneoxy)propyl]methyl dimethoxysilane, methoxytriethyleneoxypropyl methyl dimethoxysilane, tris(3-methyldimethoxysilylpropyl)isocyanurate, [hydroxy(polyethyleneoxy)propyl]methyl diethoxysilane, N,N'-bis(hydroxyethyl)-N,N'-bis(methyldimethoxysilylpropyl)ethylenediamine, bis-[3-(methyldiethoxysilylpropyl)-2-hydroxypropoxy]polyethylene oxide, bis[N,N'-(methyl-diethoxysilylpropyl)aminocarbonyl]polyethylene oxide, and bis(methyldiethoxysilylpropyl)polyethylene oxide.
- The electrode assembly according to claim 16, wherein the compounds of Formula (II) when a is 3, are chosen in the group constituted by: methyl trimethoxysilane, ethyl trimethoxysilane, propyl trimethoxysilane, methyl triethoxysilane, ethyl triethoxysilane, propyl triethoxysilane, γ-chloropropyl triethoxysilane, γ-chloropropyl trimethoxysilane, chloromethyl triethoxysilane, (p-chloromethyl)phenyl trimethoxy silane, γ-bromopropyl trimethoxysilane, acetoxymethyl triethoxysilane, acetoxymethyl trimethoxysilane, acetoxypropyl trimethoxy silane, benzoyloxypropyl trimethoxysilane, 2-(carbomethoxy)ethyl trimethoxysilane, phenyl trimethoxysilane, phenyl triethoxysilane, phenyl tripropoxysilane, hydroxymethyl triethoxysilane, N-(triethoxysilylpropyl)-O-polyethylene oxido urethane, N-(3-triethoxysilylpropyl)-4-hydroxybutyl amide, N-(3-triethoxysilylpropyl)gluconamide, vinyl trimethoxysilane, vinyl triethoxysilane, vinyl tributoxysilane, isopropenyl trimethoxysilane, isopropenyl triethoxysilane, isopropenyl tributoxysilane, vinyl tris(2-methoxyethoxy)silane, allyl trimethoxysilane, vinyldecyl trimethoxy silane, vinyloctyl trimethoxysilane, vinylphenyl trimethoxysilane, isopropenylphenyl trimethoxysilane, 2-(meth)acryloyloxyethyl trimethoxysilane, 2-(meth)acryloyloxyethyl triethoxysilane, 3-(meth)acryloyloxypropyl trimethoxysilane, 3-(meth)acryloyloxypropyl trimethoxysilane, 3-(meth)acryloyloxypropyl tris(2-methoxyethoxy)silane, 3-[2-(allyloxycarbonyl)phenylcarbonyloxy]propyl trimethoxysilane, 3-(vinylphenylamino)propyl trimethoxysilane, 3-(vinylphenylamino)propyl triethoxysilane, 3-(vinylbenzylamino)propyl triethoxysilane, 3-(vinylbenzylamino)propyl triethoxysilane, 3-[2-(N-vinylphenylmethylamino)ethylamino]propyl trimethoxysilane, 3-[2-(N-isopropenylphenylmethylamino)ethylamino]propyl trimethoxysilane, 2-(vinyloxy)ethyl trimethoxysilane, 3-(vinyloxy)propyl trimethoxysilane, 4-(vinyloxy)butyl triethoxysilane, 2-(isopropenyloxy)ethyl trimethoxysilane, 3-(allyloxy)propyl trimethoxysilane, 10-(allyloxycarbonyl)decyl trimethoxysilane, 3-(isopropenyl methyloxy)propyl trimethoxysilane, 10-(isopropenylmethyloxycarbonyl)decyl trimethoxysilane, 3-[(meth)acryloyloxy]propyl trimethoxysilane, 3-[(meth)acryloyloxy]propyl triethoxysilane, (meth)acryloyloxymethyl trimethoxysilane, (meth)acryloyloxymethyl triethoxysilane, γ-glycidoxypropyl trimethoxysilane, N-[3-(meth)acryloyloxy-2-hydroxypropyl]-3-aminopropyl triethoxysilane, O-[(meth)acryloyloxyethyl]-N-(triethoxysilylpropyl)urethane, γ-glycidoxypropyl triethoxysilane, β-(3,4-epoxycyclohexyl)ethyl trimethoxysilane, γ-aminopropyl triethoxysilane, γ-aminopropyl trimethoxysilane, 4-aminobutyl triethoxysilane, 11-aminoundecyl triethoxysilane, m-aminophenyl trimethoxysilane, p-aminophenyl trimethoxysilane, 3-amino propyl tris(methoxyethoxyethoxy)silane, 2-(4-pyridyl)ethyl triethoxysilane, 2-(trimethoxysilylethyl)pyridine, N-(3-trimethoxysilylpropyl)pyrrole, 3-(m-amino-phenoxy)propyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl trimethoxysilane, N-(2-aminoethyl)-3-aminopropyl triethoxysilane, N-(6-aminohexyl)aminomethyl triethoxy silane, N-(6-aminohexyl)aminopropyl trimethoxysilane, N-(2-aminoethyl)-11-aminoundecyl trimethoxysilane, (aminoethylaminomethyl)phenethyl trimethoxysilane, 3-N-[(amino (polypropyleneoxy))]aminopropyl trimethoxysilane, n-butylaminopropyl trimethoxy silane, N-ethylaminoisobutyl trimethoxy silane, N-methylaminopropyl trimethoxysilane, N-phenyl-γ-aminopropyl trimethoxysilane, N-phenyl-γ-aminomethyl triethoxysilane, (cyclohexylaminomethyl)triethoxysilane, N-cyclohexylaminopropyl trimethoxysilane, bis(2-hydroxyethyl)-3-aminopropyl triethoxysilane, diethylaminomethyl triethoxysilane, diethylaminopropyl trimethoxy silane, dimethylaminopropyl trimethoxysilane, N-3-trimethoxysilylpropyl-m-phenylenediamine, N,N-bis[3-(trimethoxysilyl)propyl]ethylenediamine, bis(triethoxysilylpropyl)amine, bis(trimethoxysilylpropyl)amine, bis [(3-trimethoxysilyl)propyl]-ethylenediamine, bis[3-(triethoxysilyl)propyl]urea, bis(trimethoxysilylpropyl)urea, N-(3-triethoxysilylpropyl)-4,5-dihydroimidazole, ureidopropyltriethoxysilane, ureidopropyltrimethoxysilane, acetamidopropyl trimethoxysilane, 2-(2-pyridylethyl)thiopropyl trimethoxysilane, 2-(4-pyridylethyl)thiopropyl trimethoxysilane, bis[3-(triethoxysilyl)propyl]disulfide, 3-(triethoxysilyl)propylsuccinic acid anhydride, γ-mercaptopropyl trimethoxysilane, γ-mercaptopropyl triethoxysilane, isocyanatopropyl trimethoxysilane, isocyanatopropyl triethoxysilane, isocyanatoethyl triethoxysilane, isocyanatomethyl triethoxysilane, carboxyethylsilanetriol sodium salt, N-(trimethoxysilyl propyl)ethylenediamine triacetic acid trisodium salt, 3-(trihydroxysilyl)-1-propanesulfonic acid, diethyl phosphatoethyl triethoxysilane, 3-trihydroxysilylpropyl methyl phosphonate sodium salt, bis(triethoxysilyl)ethane, bis(trimethoxysilyl)ethane, bis(triethoxysilyl)methane, 1,6-bis(triethoxysilyl)hexane, 1,8-bis(triethoxysilyl)octane, p-bis(trimethoxysilylethyl)benzene, p-bis(trimethoxysilyl)methylbenzene, 3-methoxypropyl trimethoxysilane, 2-[methoxy(polyethyleneoxy)propyl]trimethoxysilane, methoxytriethyleneoxypropyl trimethoxysilane, tris(3-trimethoxysilylpropyl)isocyanurate, [hydroxy(polyethyleneoxy)propyl]triethoxysilane, N,N'-bis(hydroxyethyl)-N,N'-bis(trimethoxysilylpropyl)ethylenediamine, bis-[3-(triethoxysilylpropyl)-2-hydroxypropoxy]polyethylene oxide, bis[N,N'-(triethoxysilylpropyl)aminocarbonyl]polyethylene oxide, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane, and bis(triethoxysilylpropyl)polyethylene oxide.
- The electrode assembly according to claim 16, wherein the polysiloxane-based layer comprises a reaction product obtained by reacting:- at least one compound of Formula (I) chosen in the group constituted by: tetramethoxysilane and tetraethoxysilane; and- optionally at least one compound of Formula (II) chosen in the group constituted by: 3-glycidoxypropyltrimethoxysilane, diethyldiethoxysilane, 3-methacryloxypropyl-trimethoxysilane, 3-methacryloxypropyl-triethoxysilane.
- The electrode assembly according to anyone of claims 16 to 20, wherein the molar ratio of compound(s) of formula (I) and compound(s) of formula (II) is from 1:5 to 10:1.
- The electrode assembly according to anyone of claims 1 to 21, wherein:- the thickness of the conductive layer is from 10 to 1000 nm;- the thickness of the polysiloxane-based layer is from 10 to 1000 nm.
- The electrode assembly according to anyone of claims 1 to 22, wherein said electrode assembly possess at least one, preferably two, more preferably all of the following characteristics:- a transparency to visible light from 60 to 99 %, preferably from 75 to 98 %, and even more preferably from 88 to 95 %;- a sheet resistance from 0.1 to 1000000 Ω/square, preferably from 5 to 200 Ω/square, and even more preferably from 30 to 80 Ω/square;- a haze from 0.1 to 20 %, preferably from 0.4 to 4 %, and even more preferably from 0.6 to 1.1 %; and- a contact angle 50 to 80°, preferably from 65 to 75°.
- A method for the production of an electrode assembly comprising at least the steps of:- forming a conductive layer formed on all or a part of a substrate; said conductive layer comprising at least a metal nanowires; and- forming a polysiloxane-based layer on all or a part of the conductive layer.
- An electronic device comprising at least an electrode assembly comprising at least:- a substrate;- a conductive layer formed on the substrate comprising at least a metal nanowires; and- a polysiloxane-based layer formed on the conductive layer.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16206475.2A EP3340252A1 (en) | 2016-12-22 | 2016-12-22 | Electrode assembly |
PCT/EP2017/082763 WO2018114570A1 (en) | 2016-12-22 | 2017-12-14 | Electrode assembly |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP16206475.2A EP3340252A1 (en) | 2016-12-22 | 2016-12-22 | Electrode assembly |
Publications (1)
Publication Number | Publication Date |
---|---|
EP3340252A1 true EP3340252A1 (en) | 2018-06-27 |
Family
ID=57749725
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP16206475.2A Withdrawn EP3340252A1 (en) | 2016-12-22 | 2016-12-22 | Electrode assembly |
Country Status (2)
Country | Link |
---|---|
EP (1) | EP3340252A1 (en) |
WO (1) | WO2018114570A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021099236A1 (en) * | 2019-11-19 | 2021-05-27 | Merck Patent Gmbh | Adhesion promoting composition and method for producing laminate, and film forming composition and method for producing film |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113903497B (en) * | 2021-12-09 | 2022-03-08 | 西安宏星电子浆料科技股份有限公司 | Isolation medium slurry and preparation method thereof |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080259262A1 (en) | 2007-04-20 | 2008-10-23 | Cambrios Technologies Corporation | Composite transparent conductors and methods of forming the same |
WO2012040637A2 (en) * | 2010-09-24 | 2012-03-29 | The Regents Of The University Of California | Nanowire-polymer composite electrodes |
US20130221288A1 (en) * | 2012-02-24 | 2013-08-29 | Xerox Corporation | Processes for producing palladium nanoparticle inks |
US20140203223A1 (en) | 2011-09-28 | 2014-07-24 | Fujifilm Corporation | Conductive composition, method of producing the same, conductive member, touch panel, and solar cell |
US20150179297A1 (en) * | 2012-07-02 | 2015-06-25 | Carestream Health, Inc. | Transparent conductive film |
US20150315391A1 (en) * | 2010-09-09 | 2015-11-05 | Carestream Health, Inc. | Transparent conductive films, compositions, articles, and methods |
-
2016
- 2016-12-22 EP EP16206475.2A patent/EP3340252A1/en not_active Withdrawn
-
2017
- 2017-12-14 WO PCT/EP2017/082763 patent/WO2018114570A1/en active Application Filing
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080259262A1 (en) | 2007-04-20 | 2008-10-23 | Cambrios Technologies Corporation | Composite transparent conductors and methods of forming the same |
US20150315391A1 (en) * | 2010-09-09 | 2015-11-05 | Carestream Health, Inc. | Transparent conductive films, compositions, articles, and methods |
WO2012040637A2 (en) * | 2010-09-24 | 2012-03-29 | The Regents Of The University Of California | Nanowire-polymer composite electrodes |
US20140203223A1 (en) | 2011-09-28 | 2014-07-24 | Fujifilm Corporation | Conductive composition, method of producing the same, conductive member, touch panel, and solar cell |
US20130221288A1 (en) * | 2012-02-24 | 2013-08-29 | Xerox Corporation | Processes for producing palladium nanoparticle inks |
US20150179297A1 (en) * | 2012-07-02 | 2015-06-25 | Carestream Health, Inc. | Transparent conductive film |
Non-Patent Citations (2)
Title |
---|
JIS K 7361-1, 1997 |
SUN ET AL.: "Crystalline silver nanowires by soft solution processing", NANOLETTERS, vol. 2, no. 2, 2002, pages 165 - 168, XP008072569, DOI: doi:10.1021/nl010093y |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021099236A1 (en) * | 2019-11-19 | 2021-05-27 | Merck Patent Gmbh | Adhesion promoting composition and method for producing laminate, and film forming composition and method for producing film |
CN114729225A (en) * | 2019-11-19 | 2022-07-08 | 默克专利有限公司 | Method for producing tackifier composition and laminate, and method for producing film-forming composition and film |
Also Published As
Publication number | Publication date |
---|---|
WO2018114570A1 (en) | 2018-06-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US12227661B2 (en) | Method for processing metal nanowire ink with metal ions | |
WO2017067969A1 (en) | Composition for forming transparent conductor and transparent conductor made therefrom | |
JP5480295B2 (en) | Polymer film using conductive polymer solution composition and its structure | |
JP2019023274A (en) | Conductive coating liquid composition and transparent conductive film for flexible display comprising conductive layer produced from composition | |
CN105793363A (en) | Conductive composition and layer made therefrom | |
KR20110047515A (en) | Manufacturing method of conductive coating film using carbon nanotube coated with metal oxide and its conductive coating film | |
Li et al. | High water-stable, hard and strong-adhesive antistatic films from waterborne PEDOT: PSS composites | |
WO2018114570A1 (en) | Electrode assembly | |
KR101190206B1 (en) | Transparent Conductors and Method of Preparing Same | |
WO2014016194A1 (en) | Conductive polymer composition and transparent electrode and/or antistatic layer made therefrom | |
WO2018114631A1 (en) | Uv-resistant electrode assembly | |
KR20110071539A (en) | Transparent conductive film and its manufacturing method | |
KR20140118454A (en) | Transparent Conducting Film based on Nanowire and a Method for Preparing Thereof) | |
WO2017032780A1 (en) | Composition for forming transparent conductive layer and method for preparing the same | |
WO2016071484A1 (en) | Composition for forming transparent conductive layer and method for preparing the same | |
TW201041988A (en) | Conductive coating composition | |
KR101583852B1 (en) | Electrode substrate and Preparing method of the same | |
KR20140145300A (en) | Composition for high durable transparent conductive coating, manufacturing method of the composition and transparent conductive film using the composition | |
US9920220B2 (en) | Conductive films and devices comprised thereof | |
KR101130235B1 (en) | Transparent Conductors and Method of Preparing Same | |
KR20180035570A (en) | Method of Producing Transparent Conductive Film | |
KR20150051105A (en) | Composition for preparing conductive film and method for preparing the same | |
KR20140081675A (en) | Production method of composition for coating-type transparent film formation | |
KR20180014531A (en) | Conductive ink composition and conductive laminate | |
KR20140127106A (en) | anti-ESD siloxane coating composition with hardness and leveling layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN PUBLISHED |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
AX | Request for extension of the european patent |
Extension state: BA ME |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: LEE, JUNG-YUL |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: REQUEST FOR EXAMINATION WAS MADE |
|
17P | Request for examination filed |
Effective date: 20190102 |
|
RBV | Designated contracting states (corrected) |
Designated state(s): AL AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO RS SE SI SK SM TR |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION HAS BEEN WITHDRAWN |
|
18W | Application withdrawn |
Effective date: 20190307 |