EP3305948A4 - Appareil de production d'un monocristal et procédé de production d'un monocristal - Google Patents
Appareil de production d'un monocristal et procédé de production d'un monocristal Download PDFInfo
- Publication number
- EP3305948A4 EP3305948A4 EP17807992.7A EP17807992A EP3305948A4 EP 3305948 A4 EP3305948 A4 EP 3305948A4 EP 17807992 A EP17807992 A EP 17807992A EP 3305948 A4 EP3305948 A4 EP 3305948A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- single crystal
- producing single
- producing
- crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
- C30B35/007—Apparatus for preparing, pre-treating the source material to be used for crystal growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/001—Continuous growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/002—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/003—Heating or cooling of the melt or the crystallised material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
- C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
- C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/14—Crucibles or vessels
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/02—Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B17/00—Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016128546 | 2016-06-29 | ||
PCT/JP2017/020227 WO2018003386A1 (fr) | 2016-06-29 | 2017-05-31 | Appareil de production d'un monocristal et procédé de production d'un monocristal |
Publications (3)
Publication Number | Publication Date |
---|---|
EP3305948A1 EP3305948A1 (fr) | 2018-04-11 |
EP3305948A4 true EP3305948A4 (fr) | 2019-03-20 |
EP3305948B1 EP3305948B1 (fr) | 2022-01-12 |
Family
ID=60787053
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP17807992.7A Active EP3305948B1 (fr) | 2016-06-29 | 2017-05-31 | Appareil de production d'un monocristal et procédé de production d'un monocristal |
Country Status (5)
Country | Link |
---|---|
US (1) | US10829869B2 (fr) |
EP (1) | EP3305948B1 (fr) |
JP (1) | JP6629886B2 (fr) |
CN (1) | CN107849732B (fr) |
WO (1) | WO2018003386A1 (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP3572559B1 (fr) * | 2018-03-29 | 2024-09-25 | Crystal Systems Corporation | Dispositif de fabrication d'un monocristal |
EP3572560B1 (fr) * | 2018-03-29 | 2024-09-11 | Crystal Systems Corporation | Dispositif de fabrication d'un monocristal |
JP7157932B2 (ja) * | 2019-01-11 | 2022-10-21 | 株式会社Sumco | シリカガラスルツボの製造装置および製造方法 |
JP6752464B1 (ja) * | 2019-06-27 | 2020-09-09 | Ftb研究所株式会社 | ルツボ |
CN112647122B (zh) * | 2020-11-25 | 2022-05-24 | 浙江普智能源装备有限公司 | 一种铸造单晶的热场结构及其方法 |
US20220298673A1 (en) * | 2021-03-22 | 2022-09-22 | Axt, Inc. | Method and system for vertical gradient freeze 8 inch gallium arsenide substrates |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61197493A (ja) * | 1985-02-26 | 1986-09-01 | Kyozo Kaneko | 金属酸化物の結晶化方法 |
EP0787837A1 (fr) * | 1996-02-08 | 1997-08-06 | Shin-Etsu Handotai Company Limited | Procédé pour l'alimentation de silicium granulé, tuyau d'alimentation pour ce procédé et méthode de production de silicium monocristallin |
EP2128308A1 (fr) * | 2007-01-10 | 2009-12-02 | Crystal Systems Corp. | Appareil de fusion à zone flottante |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL8005312A (nl) * | 1980-09-24 | 1982-04-16 | Philips Nv | Werkwijze voor het vervaardigen van ferriet eenkristallen. |
JPS5915056U (ja) | 1982-07-16 | 1984-01-30 | コニカ株式会社 | 現像剤補給容器 |
US5116456A (en) * | 1988-04-18 | 1992-05-26 | Solon Technologies, Inc. | Apparatus and method for growth of large single crystals in plate/slab form |
EP0450494B1 (fr) | 1990-03-30 | 1996-06-19 | Sumitomo Sitix Corporation | Procédé de fabrication de monocristaux de silicium |
US5108720A (en) | 1991-05-20 | 1992-04-28 | Hemlock Semiconductor Corporation | Float zone processing of particulate silicon |
US5178719A (en) * | 1991-08-20 | 1993-01-12 | Horiba Instruments, Inc. | Continuous refill crystal growth method |
JP3053958B2 (ja) * | 1992-04-10 | 2000-06-19 | 光弘 丸山 | 浮遊帯溶融法による結晶の製造装置 |
JP2831906B2 (ja) | 1993-06-08 | 1998-12-02 | 日鉄鉱業株式会社 | 単結晶製造装置 |
JP3011114B2 (ja) * | 1996-01-12 | 2000-02-21 | 住友金属工業株式会社 | シリコン溶融用坩堝 |
JP2937108B2 (ja) * | 1996-02-23 | 1999-08-23 | 住友金属工業株式会社 | 単結晶引き上げ方法及び単結晶引き上げ装置 |
KR100293095B1 (ko) | 1996-02-29 | 2001-10-25 | 고지마 마타오 | 단결정향상방법과 단결정향상장치 |
US5919306A (en) * | 1997-11-03 | 1999-07-06 | Sumitomo Sitix Corporation | Silicon melting crucible |
EP0971052B1 (fr) * | 1998-07-07 | 2004-02-04 | Mitsubishi Chemical Corporation | Monocristal de GaAs de type P et procédé pour sa préparation |
JP2001151595A (ja) | 1999-11-19 | 2001-06-05 | Murata Mfg Co Ltd | 単結晶製造方法および製造装置 |
JP4092398B2 (ja) * | 2002-12-11 | 2008-05-28 | 独立行政法人産業技術総合研究所 | アルカリコバルト酸化物のバルク状単結晶 |
US7383696B2 (en) | 2005-09-08 | 2008-06-10 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with bubble-free and reduced bubble growth wall |
US7427327B2 (en) | 2005-09-08 | 2008-09-23 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with barium-doped inner wall |
US20070056504A1 (en) * | 2005-09-12 | 2007-03-15 | Rexor Corporation | Method and apparatus to produce single crystal ingot of uniform axial resistivity |
TWI408259B (zh) | 2006-09-28 | 2013-09-11 | Shinetsu Quartz Prod | 具有鋇摻雜內壁的矽玻璃坩堝 |
DE102007038851A1 (de) * | 2007-08-16 | 2009-02-19 | Schott Ag | Verfahren zur Herstellung von monokristallinen Metall- oder Halbmetallkörpern |
KR101286431B1 (ko) * | 2007-12-25 | 2013-07-18 | 크리스탈 시스템스 코포레이션 | 부유대역 용융장치 |
CN101555620A (zh) * | 2008-04-07 | 2009-10-14 | Axt公司 | 晶体生长装置及方法 |
US8652257B2 (en) * | 2010-02-22 | 2014-02-18 | Lev George Eidelman | Controlled gravity feeding czochralski apparatus with on the way melting raw material |
SG191391A1 (en) * | 2010-12-28 | 2013-08-30 | Ube Industries | Polycrystalline silicon ingot casting mold and method for producing same, and silicon nitride powder for mold release material for polycrystalline silicon ingot casting mold and slurry containing same |
US8684151B2 (en) * | 2011-03-09 | 2014-04-01 | Sinfonia Technology Co., Ltd. | Raw material loading apparatus and pipe unit for raw material loading apparatus |
KR20130140532A (ko) * | 2011-03-09 | 2013-12-24 | 신포니아 테크놀로지 가부시끼가이샤 | 피처리물 투입 장치, 피처리물 투입 장치용의 파이프 유닛 및 이 파이프 유닛에 사용하는 파이프 |
JP2014076915A (ja) | 2012-10-10 | 2014-05-01 | Electronics & Materials Corporation Ltd | 半導体結晶成長容器、およびそれにより成長させた結晶から得られるウエハを用いて作製した太陽電池 |
JP6075625B2 (ja) * | 2013-01-22 | 2017-02-08 | 京セラ株式会社 | シリコン用鋳造装置およびシリコンの鋳造方法 |
KR101437488B1 (ko) | 2013-05-16 | 2014-09-03 | (주)에스테크 | 잉곳 원료 공급시스템 |
US9845548B2 (en) * | 2013-09-30 | 2017-12-19 | Gtat Corporation | Advanced crucible support and thermal distribution management |
US10358740B2 (en) * | 2014-07-25 | 2019-07-23 | Corner Star Limited | Crystal growing systems and methods including a passive heater |
-
2017
- 2017-05-31 CN CN201780002198.9A patent/CN107849732B/zh active Active
- 2017-05-31 JP JP2017559720A patent/JP6629886B2/ja active Active
- 2017-05-31 EP EP17807992.7A patent/EP3305948B1/fr active Active
- 2017-05-31 US US15/736,467 patent/US10829869B2/en active Active
- 2017-05-31 WO PCT/JP2017/020227 patent/WO2018003386A1/fr unknown
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61197493A (ja) * | 1985-02-26 | 1986-09-01 | Kyozo Kaneko | 金属酸化物の結晶化方法 |
EP0787837A1 (fr) * | 1996-02-08 | 1997-08-06 | Shin-Etsu Handotai Company Limited | Procédé pour l'alimentation de silicium granulé, tuyau d'alimentation pour ce procédé et méthode de production de silicium monocristallin |
EP2128308A1 (fr) * | 2007-01-10 | 2009-12-02 | Crystal Systems Corp. | Appareil de fusion à zone flottante |
Non-Patent Citations (1)
Title |
---|
See also references of WO2018003386A1 * |
Also Published As
Publication number | Publication date |
---|---|
WO2018003386A1 (fr) | 2018-01-04 |
JP6629886B2 (ja) | 2020-01-15 |
CN107849732A (zh) | 2018-03-27 |
US20190085482A1 (en) | 2019-03-21 |
EP3305948A1 (fr) | 2018-04-11 |
CN107849732B (zh) | 2020-09-18 |
US10829869B2 (en) | 2020-11-10 |
EP3305948B1 (fr) | 2022-01-12 |
JPWO2018003386A1 (ja) | 2018-07-05 |
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