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EP3305948A4 - Appareil de production d'un monocristal et procédé de production d'un monocristal - Google Patents

Appareil de production d'un monocristal et procédé de production d'un monocristal Download PDF

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Publication number
EP3305948A4
EP3305948A4 EP17807992.7A EP17807992A EP3305948A4 EP 3305948 A4 EP3305948 A4 EP 3305948A4 EP 17807992 A EP17807992 A EP 17807992A EP 3305948 A4 EP3305948 A4 EP 3305948A4
Authority
EP
European Patent Office
Prior art keywords
single crystal
producing single
producing
crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP17807992.7A
Other languages
German (de)
English (en)
Other versions
EP3305948A1 (fr
EP3305948B1 (fr
Inventor
Isamu Shindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Crystal Systems Corp
Original Assignee
Crystal Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Crystal Systems Corp filed Critical Crystal Systems Corp
Publication of EP3305948A1 publication Critical patent/EP3305948A1/fr
Publication of EP3305948A4 publication Critical patent/EP3305948A4/fr
Application granted granted Critical
Publication of EP3305948B1 publication Critical patent/EP3305948B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • C30B35/007Apparatus for preparing, pre-treating the source material to be used for crystal growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/001Continuous growth
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/002Crucibles or containers for supporting the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/003Heating or cooling of the melt or the crystallised material
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/08Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/14Crucibles or vessels
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/02Single-crystal growth by pulling from a melt, e.g. Czochralski method adding crystallising materials or reactants forming it in situ to the melt
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B17/00Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
EP17807992.7A 2016-06-29 2017-05-31 Appareil de production d'un monocristal et procédé de production d'un monocristal Active EP3305948B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016128546 2016-06-29
PCT/JP2017/020227 WO2018003386A1 (fr) 2016-06-29 2017-05-31 Appareil de production d'un monocristal et procédé de production d'un monocristal

Publications (3)

Publication Number Publication Date
EP3305948A1 EP3305948A1 (fr) 2018-04-11
EP3305948A4 true EP3305948A4 (fr) 2019-03-20
EP3305948B1 EP3305948B1 (fr) 2022-01-12

Family

ID=60787053

Family Applications (1)

Application Number Title Priority Date Filing Date
EP17807992.7A Active EP3305948B1 (fr) 2016-06-29 2017-05-31 Appareil de production d'un monocristal et procédé de production d'un monocristal

Country Status (5)

Country Link
US (1) US10829869B2 (fr)
EP (1) EP3305948B1 (fr)
JP (1) JP6629886B2 (fr)
CN (1) CN107849732B (fr)
WO (1) WO2018003386A1 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3572559B1 (fr) * 2018-03-29 2024-09-25 Crystal Systems Corporation Dispositif de fabrication d'un monocristal
EP3572560B1 (fr) * 2018-03-29 2024-09-11 Crystal Systems Corporation Dispositif de fabrication d'un monocristal
JP7157932B2 (ja) * 2019-01-11 2022-10-21 株式会社Sumco シリカガラスルツボの製造装置および製造方法
JP6752464B1 (ja) * 2019-06-27 2020-09-09 Ftb研究所株式会社 ルツボ
CN112647122B (zh) * 2020-11-25 2022-05-24 浙江普智能源装备有限公司 一种铸造单晶的热场结构及其方法
US20220298673A1 (en) * 2021-03-22 2022-09-22 Axt, Inc. Method and system for vertical gradient freeze 8 inch gallium arsenide substrates

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61197493A (ja) * 1985-02-26 1986-09-01 Kyozo Kaneko 金属酸化物の結晶化方法
EP0787837A1 (fr) * 1996-02-08 1997-08-06 Shin-Etsu Handotai Company Limited Procédé pour l'alimentation de silicium granulé, tuyau d'alimentation pour ce procédé et méthode de production de silicium monocristallin
EP2128308A1 (fr) * 2007-01-10 2009-12-02 Crystal Systems Corp. Appareil de fusion à zone flottante

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8005312A (nl) * 1980-09-24 1982-04-16 Philips Nv Werkwijze voor het vervaardigen van ferriet eenkristallen.
JPS5915056U (ja) 1982-07-16 1984-01-30 コニカ株式会社 現像剤補給容器
US5116456A (en) * 1988-04-18 1992-05-26 Solon Technologies, Inc. Apparatus and method for growth of large single crystals in plate/slab form
EP0450494B1 (fr) 1990-03-30 1996-06-19 Sumitomo Sitix Corporation Procédé de fabrication de monocristaux de silicium
US5108720A (en) 1991-05-20 1992-04-28 Hemlock Semiconductor Corporation Float zone processing of particulate silicon
US5178719A (en) * 1991-08-20 1993-01-12 Horiba Instruments, Inc. Continuous refill crystal growth method
JP3053958B2 (ja) * 1992-04-10 2000-06-19 光弘 丸山 浮遊帯溶融法による結晶の製造装置
JP2831906B2 (ja) 1993-06-08 1998-12-02 日鉄鉱業株式会社 単結晶製造装置
JP3011114B2 (ja) * 1996-01-12 2000-02-21 住友金属工業株式会社 シリコン溶融用坩堝
JP2937108B2 (ja) * 1996-02-23 1999-08-23 住友金属工業株式会社 単結晶引き上げ方法及び単結晶引き上げ装置
KR100293095B1 (ko) 1996-02-29 2001-10-25 고지마 마타오 단결정향상방법과 단결정향상장치
US5919306A (en) * 1997-11-03 1999-07-06 Sumitomo Sitix Corporation Silicon melting crucible
EP0971052B1 (fr) * 1998-07-07 2004-02-04 Mitsubishi Chemical Corporation Monocristal de GaAs de type P et procédé pour sa préparation
JP2001151595A (ja) 1999-11-19 2001-06-05 Murata Mfg Co Ltd 単結晶製造方法および製造装置
JP4092398B2 (ja) * 2002-12-11 2008-05-28 独立行政法人産業技術総合研究所 アルカリコバルト酸化物のバルク状単結晶
US7383696B2 (en) 2005-09-08 2008-06-10 Heraeus Shin-Etsu America, Inc. Silica glass crucible with bubble-free and reduced bubble growth wall
US7427327B2 (en) 2005-09-08 2008-09-23 Heraeus Shin-Etsu America, Inc. Silica glass crucible with barium-doped inner wall
US20070056504A1 (en) * 2005-09-12 2007-03-15 Rexor Corporation Method and apparatus to produce single crystal ingot of uniform axial resistivity
TWI408259B (zh) 2006-09-28 2013-09-11 Shinetsu Quartz Prod 具有鋇摻雜內壁的矽玻璃坩堝
DE102007038851A1 (de) * 2007-08-16 2009-02-19 Schott Ag Verfahren zur Herstellung von monokristallinen Metall- oder Halbmetallkörpern
KR101286431B1 (ko) * 2007-12-25 2013-07-18 크리스탈 시스템스 코포레이션 부유대역 용융장치
CN101555620A (zh) * 2008-04-07 2009-10-14 Axt公司 晶体生长装置及方法
US8652257B2 (en) * 2010-02-22 2014-02-18 Lev George Eidelman Controlled gravity feeding czochralski apparatus with on the way melting raw material
SG191391A1 (en) * 2010-12-28 2013-08-30 Ube Industries Polycrystalline silicon ingot casting mold and method for producing same, and silicon nitride powder for mold release material for polycrystalline silicon ingot casting mold and slurry containing same
US8684151B2 (en) * 2011-03-09 2014-04-01 Sinfonia Technology Co., Ltd. Raw material loading apparatus and pipe unit for raw material loading apparatus
KR20130140532A (ko) * 2011-03-09 2013-12-24 신포니아 테크놀로지 가부시끼가이샤 피처리물 투입 장치, 피처리물 투입 장치용의 파이프 유닛 및 이 파이프 유닛에 사용하는 파이프
JP2014076915A (ja) 2012-10-10 2014-05-01 Electronics & Materials Corporation Ltd 半導体結晶成長容器、およびそれにより成長させた結晶から得られるウエハを用いて作製した太陽電池
JP6075625B2 (ja) * 2013-01-22 2017-02-08 京セラ株式会社 シリコン用鋳造装置およびシリコンの鋳造方法
KR101437488B1 (ko) 2013-05-16 2014-09-03 (주)에스테크 잉곳 원료 공급시스템
US9845548B2 (en) * 2013-09-30 2017-12-19 Gtat Corporation Advanced crucible support and thermal distribution management
US10358740B2 (en) * 2014-07-25 2019-07-23 Corner Star Limited Crystal growing systems and methods including a passive heater

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61197493A (ja) * 1985-02-26 1986-09-01 Kyozo Kaneko 金属酸化物の結晶化方法
EP0787837A1 (fr) * 1996-02-08 1997-08-06 Shin-Etsu Handotai Company Limited Procédé pour l'alimentation de silicium granulé, tuyau d'alimentation pour ce procédé et méthode de production de silicium monocristallin
EP2128308A1 (fr) * 2007-01-10 2009-12-02 Crystal Systems Corp. Appareil de fusion à zone flottante

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of WO2018003386A1 *

Also Published As

Publication number Publication date
WO2018003386A1 (fr) 2018-01-04
JP6629886B2 (ja) 2020-01-15
CN107849732A (zh) 2018-03-27
US20190085482A1 (en) 2019-03-21
EP3305948A1 (fr) 2018-04-11
CN107849732B (zh) 2020-09-18
US10829869B2 (en) 2020-11-10
EP3305948B1 (fr) 2022-01-12
JPWO2018003386A1 (ja) 2018-07-05

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