EP3171214A4 - Array substrate, preparation method therefor, and display device - Google Patents
Array substrate, preparation method therefor, and display device Download PDFInfo
- Publication number
- EP3171214A4 EP3171214A4 EP15897380.0A EP15897380A EP3171214A4 EP 3171214 A4 EP3171214 A4 EP 3171214A4 EP 15897380 A EP15897380 A EP 15897380A EP 3171214 A4 EP3171214 A4 EP 3171214A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- preparation
- display device
- array substrate
- method therefor
- therefor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
- H10D30/67—Thin-film transistors [TFT]
- H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
- H10D30/6723—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device having light shields
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/01—Manufacture or treatment
- H10D86/021—Manufacture or treatment of multiple TFTs
- H10D86/0212—Manufacture or treatment of multiple TFTs comprising manufacture, treatment or coating of substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/451—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs characterised by the compositions or shapes of the interlayer dielectrics
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/08—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00 light absorbing layer
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2201/00—Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
- G02F2201/38—Anti-reflection arrangements
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F2202/00—Materials and properties
- G02F2202/16—Materials and properties conductive
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Mathematical Physics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Geometry (AREA)
- Electroluminescent Light Sources (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510536219.8A CN105093654B (en) | 2015-08-27 | 2015-08-27 | Array substrate and preparation method thereof and display device |
PCT/CN2015/100199 WO2017031908A1 (en) | 2015-08-27 | 2015-12-31 | Array substrate, preparation method therefor, and display device |
Publications (3)
Publication Number | Publication Date |
---|---|
EP3171214A1 EP3171214A1 (en) | 2017-05-24 |
EP3171214A4 true EP3171214A4 (en) | 2018-03-21 |
EP3171214B1 EP3171214B1 (en) | 2020-08-12 |
Family
ID=54574430
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP15897380.0A Active EP3171214B1 (en) | 2015-08-27 | 2015-12-31 | Array substrate, preparation method therefor, and display device |
Country Status (4)
Country | Link |
---|---|
US (1) | US9910327B2 (en) |
EP (1) | EP3171214B1 (en) |
CN (1) | CN105093654B (en) |
WO (1) | WO2017031908A1 (en) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104880879A (en) * | 2015-06-19 | 2015-09-02 | 京东方科技集团股份有限公司 | COA array substrate and manufacturing method and display device thereof |
CN105093654B (en) * | 2015-08-27 | 2018-12-25 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof and display device |
CN105204223B (en) * | 2015-10-30 | 2019-05-03 | 京东方科技集团股份有限公司 | Method for manufacturing a substrate, substrate and display device |
KR102420398B1 (en) * | 2015-11-24 | 2022-07-14 | 삼성디스플레이 주식회사 | Liquid crystal display device and manufacturing method thereof |
CN105301844A (en) * | 2015-12-04 | 2016-02-03 | 江苏日久光电股份有限公司 | High-penetration optical combined thin film |
CN105446041A (en) * | 2016-01-11 | 2016-03-30 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and manufacturing method thereof |
CN105932031A (en) * | 2016-06-15 | 2016-09-07 | 京东方科技集团股份有限公司 | Array substrate and manufacturing method thereof, touch panel and touch display device |
CN106249979B (en) * | 2016-08-31 | 2019-05-31 | 京东方科技集团股份有限公司 | Touch electrode structure and touch control display apparatus |
KR102728640B1 (en) * | 2016-12-02 | 2024-11-13 | 삼성디스플레이 주식회사 | Substrate, display device having the same and fabricating method thereof |
CN106611826B (en) * | 2016-12-27 | 2018-11-09 | 深圳市华星光电技术有限公司 | Quantum stippling film display panel and preparation method thereof |
CN107045221A (en) * | 2016-12-28 | 2017-08-15 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display |
US20180267345A1 (en) * | 2017-03-15 | 2018-09-20 | HKC Corporation Limited | Display device and display panel thereof |
CN108630725A (en) * | 2017-03-21 | 2018-10-09 | 宸鸿光电科技股份有限公司 | Organic light emitting diode display device |
CN108630724A (en) * | 2017-03-21 | 2018-10-09 | 宸鸿光电科技股份有限公司 | Organic light emitting diode display device |
CN107479227A (en) * | 2017-07-06 | 2017-12-15 | 惠科股份有限公司 | Circuit board and manufacturing method thereof |
CN107359168A (en) | 2017-07-11 | 2017-11-17 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, display device |
CN108121098B (en) | 2017-12-19 | 2019-08-06 | 友达光电股份有限公司 | Metal structure, manufacturing method and display panel for application thereof |
TWI678579B (en) | 2017-12-19 | 2019-12-01 | 友達光電股份有限公司 | Display panel and display device |
CN108922657B (en) * | 2018-06-30 | 2021-10-01 | 广州国显科技有限公司 | Conductive laminated structure, preparation method thereof and display panel |
CN108873459A (en) * | 2018-07-17 | 2018-11-23 | 深圳市华星光电技术有限公司 | COA type display panel and display device |
TWI694289B (en) * | 2019-02-20 | 2020-05-21 | 友達光電股份有限公司 | Display device |
CN109887967A (en) * | 2019-02-22 | 2019-06-14 | 深圳市华星光电技术有限公司 | Array substrate and preparation method thereof |
US11966009B2 (en) | 2019-09-11 | 2024-04-23 | Beijing Boe Display Technology Co., Ltd. | Display substrate and method for preparing the same, and display device |
TWI710827B (en) | 2019-12-04 | 2020-11-21 | 友達光電股份有限公司 | Display apparatus |
CN112802905A (en) * | 2021-02-04 | 2021-05-14 | 深圳市华星光电半导体显示技术有限公司 | Display panel, preparation method thereof and display device |
CN114779544A (en) * | 2022-03-29 | 2022-07-22 | 武汉华星光电技术有限公司 | TFT substrate and manufacturing method thereof, liquid crystal display panel and OLED display panel |
CN114792716A (en) * | 2022-04-11 | 2022-07-26 | 深圳市华星光电半导体显示技术有限公司 | Display back plate and preparation method thereof |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5926236A (en) * | 1998-03-13 | 1999-07-20 | Ois Optical Imaging Systems, Inc. | High aperture liquid crystal display including thin film diodes, and method of making same |
CN104730603A (en) * | 2015-04-01 | 2015-06-24 | 京东方科技集团股份有限公司 | Anti-reflection stacked structure and manufacture method, substrate and display device thereof |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20020013719A (en) * | 2000-08-14 | 2002-02-21 | 이데이 노부유끼 | Light absorption/anti-reflection material member and display apparatus |
CN1249463C (en) * | 2003-04-18 | 2006-04-05 | 鸿富锦精密工业(深圳)有限公司 | Manufacturing method of colour flter and manufacturing method of liquid crystal display device |
JP2011221316A (en) * | 2010-04-12 | 2011-11-04 | Toshiba Mobile Display Co Ltd | Liquid crystal display device |
CN104076550A (en) * | 2014-06-17 | 2014-10-01 | 京东方科技集团股份有限公司 | Color film array substrate, display device and method for manufacturing color film array substrate |
CN104749816B (en) | 2015-04-14 | 2017-11-10 | 京东方科技集团股份有限公司 | A kind of preparation method of display base plate, display base plate and display device |
CN104765191B (en) * | 2015-04-30 | 2018-07-06 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof and display device |
CN105093654B (en) * | 2015-08-27 | 2018-12-25 | 京东方科技集团股份有限公司 | Array substrate and preparation method thereof and display device |
-
2015
- 2015-08-27 CN CN201510536219.8A patent/CN105093654B/en not_active Expired - Fee Related
- 2015-12-31 WO PCT/CN2015/100199 patent/WO2017031908A1/en active Application Filing
- 2015-12-31 US US15/324,981 patent/US9910327B2/en not_active Expired - Fee Related
- 2015-12-31 EP EP15897380.0A patent/EP3171214B1/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5926236A (en) * | 1998-03-13 | 1999-07-20 | Ois Optical Imaging Systems, Inc. | High aperture liquid crystal display including thin film diodes, and method of making same |
CN104730603A (en) * | 2015-04-01 | 2015-06-24 | 京东方科技集团股份有限公司 | Anti-reflection stacked structure and manufacture method, substrate and display device thereof |
WO2016155351A1 (en) * | 2015-04-01 | 2016-10-06 | Boe Technology Group Co., Ltd. | Anti-reflective tandem structure and fabrication method thereof, substrate and display apparatus |
Non-Patent Citations (1)
Title |
---|
See also references of WO2017031908A1 * |
Also Published As
Publication number | Publication date |
---|---|
US20170248827A1 (en) | 2017-08-31 |
EP3171214B1 (en) | 2020-08-12 |
CN105093654B (en) | 2018-12-25 |
US9910327B2 (en) | 2018-03-06 |
CN105093654A (en) | 2015-11-25 |
WO2017031908A1 (en) | 2017-03-02 |
EP3171214A1 (en) | 2017-05-24 |
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