EP2698449B1 - Plating bath composition for immersion plating of gold - Google Patents
Plating bath composition for immersion plating of gold Download PDFInfo
- Publication number
- EP2698449B1 EP2698449B1 EP12180227.6A EP12180227A EP2698449B1 EP 2698449 B1 EP2698449 B1 EP 2698449B1 EP 12180227 A EP12180227 A EP 12180227A EP 2698449 B1 EP2698449 B1 EP 2698449B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gold
- plating bath
- cyanide
- group
- ions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007747 plating Methods 0.000 title claims description 82
- 239000010931 gold Substances 0.000 title claims description 78
- 229910052737 gold Inorganic materials 0.000 title claims description 77
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims description 60
- 239000000203 mixture Substances 0.000 title description 10
- 238000007654 immersion Methods 0.000 title description 8
- 229920000642 polymer Polymers 0.000 claims description 49
- 239000000654 additive Substances 0.000 claims description 39
- -1 gold ions Chemical class 0.000 claims description 37
- 230000000996 additive effect Effects 0.000 claims description 30
- 150000001875 compounds Chemical class 0.000 claims description 28
- 239000000178 monomer Substances 0.000 claims description 27
- 150000003839 salts Chemical class 0.000 claims description 21
- 239000008139 complexing agent Substances 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 15
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 14
- KXDHJXZQYSOELW-UHFFFAOYSA-N Carbamic acid Chemical class NC(O)=O KXDHJXZQYSOELW-UHFFFAOYSA-N 0.000 claims description 10
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 10
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 9
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical class OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 9
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 9
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 8
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical compound [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 claims description 8
- 229910052759 nickel Inorganic materials 0.000 claims description 7
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 5
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- 238000000151 deposition Methods 0.000 claims description 5
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- 229910052763 palladium Inorganic materials 0.000 claims description 5
- 229910001020 Au alloy Inorganic materials 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 4
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 4
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- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 3
- 229910052794 bromium Inorganic materials 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
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- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
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- ITMCEJHCFYSIIV-UHFFFAOYSA-M triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-M 0.000 claims description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 2
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 claims description 2
- 229910000531 Co alloy Inorganic materials 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 2
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 2
- 239000004471 Glycine Substances 0.000 claims description 2
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 claims description 2
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- 229910001451 bismuth ion Inorganic materials 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 claims description 2
- 235000018417 cysteine Nutrition 0.000 claims description 2
- 230000008021 deposition Effects 0.000 claims description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 2
- 239000000174 gluconic acid Substances 0.000 claims description 2
- 235000012208 gluconic acid Nutrition 0.000 claims description 2
- 239000004310 lactic acid Substances 0.000 claims description 2
- 235000014655 lactic acid Nutrition 0.000 claims description 2
- 239000001630 malic acid Substances 0.000 claims description 2
- 235000011090 malic acid Nutrition 0.000 claims description 2
- DOXNDFPXMBXOKH-UHFFFAOYSA-N [Au+2] Chemical compound [Au+2] DOXNDFPXMBXOKH-UHFFFAOYSA-N 0.000 claims 1
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- AFVFQIVMOAPDHO-UHFFFAOYSA-M methanesulfonate group Chemical group CS(=O)(=O)[O-] AFVFQIVMOAPDHO-UHFFFAOYSA-M 0.000 claims 1
- 239000000243 solution Substances 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 11
- 239000000956 alloy Substances 0.000 description 11
- 229910000679 solder Inorganic materials 0.000 description 10
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 9
- 150000002500 ions Chemical class 0.000 description 9
- 239000011550 stock solution Substances 0.000 description 9
- QFFVPLLCYGOFPU-UHFFFAOYSA-N barium chromate Chemical compound [Ba+2].[O-][Cr]([O-])(=O)=O QFFVPLLCYGOFPU-UHFFFAOYSA-N 0.000 description 7
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 7
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 239000000463 material Substances 0.000 description 5
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- 229910000521 B alloy Inorganic materials 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-N Sulfurous acid Chemical class OS(O)=O LSNNMFCWUKXFEE-UHFFFAOYSA-N 0.000 description 4
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000003456 ion exchange resin Substances 0.000 description 4
- 229920003303 ion-exchange polymer Polymers 0.000 description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 3
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000003277 amino group Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- LFGFZXXKZPSRMB-UHFFFAOYSA-N [B].[Mo].[Co] Chemical compound [B].[Mo].[Co] LFGFZXXKZPSRMB-UHFFFAOYSA-N 0.000 description 2
- CPJYFACXEHYLFS-UHFFFAOYSA-N [B].[W].[Co] Chemical compound [B].[W].[Co] CPJYFACXEHYLFS-UHFFFAOYSA-N 0.000 description 2
- GLQZWODKWRZLDJ-UHFFFAOYSA-H [Na+].[Na+].[Na+].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O Chemical compound [Na+].[Na+].[Na+].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O GLQZWODKWRZLDJ-UHFFFAOYSA-H 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 239000002280 amphoteric surfactant Substances 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 229960002449 glycine Drugs 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002366 halogen compounds Chemical class 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 229910001385 heavy metal Inorganic materials 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 235000006408 oxalic acid Nutrition 0.000 description 2
- 229910052938 sodium sulfate Inorganic materials 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
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- JAJIPIAHCFBEPI-UHFFFAOYSA-N 9,10-dioxoanthracene-1-sulfonic acid Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2S(=O)(=O)O JAJIPIAHCFBEPI-UHFFFAOYSA-N 0.000 description 1
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- 239000003795 chemical substances by application Substances 0.000 description 1
- WHDPTDWLEKQKKX-UHFFFAOYSA-N cobalt molybdenum Chemical compound [Co].[Co].[Mo] WHDPTDWLEKQKKX-UHFFFAOYSA-N 0.000 description 1
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- IEJYHZREBFJJLJ-UHFFFAOYSA-N cyano thiocyanate;gold Chemical compound [Au].N#CSC#N IEJYHZREBFJJLJ-UHFFFAOYSA-N 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-M dihydrogenphosphate Chemical compound OP(O)([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-M 0.000 description 1
- ADPOBOOHCUVXGO-UHFFFAOYSA-H dioxido-oxo-sulfanylidene-$l^{6}-sulfane;gold(3+) Chemical compound [Au+3].[Au+3].[O-]S([O-])(=O)=S.[O-]S([O-])(=O)=S.[O-]S([O-])(=O)=S ADPOBOOHCUVXGO-UHFFFAOYSA-H 0.000 description 1
- FGRVOLIFQGXPCT-UHFFFAOYSA-L dipotassium;dioxido-oxo-sulfanylidene-$l^{6}-sulfane Chemical compound [K+].[K+].[O-]S([O-])(=O)=S FGRVOLIFQGXPCT-UHFFFAOYSA-L 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 235000013905 glycine and its sodium salt Nutrition 0.000 description 1
- FDWREHZXQUYJFJ-UHFFFAOYSA-M gold monochloride Chemical compound [Cl-].[Au+] FDWREHZXQUYJFJ-UHFFFAOYSA-M 0.000 description 1
- OVWPJGBVJCTEBJ-UHFFFAOYSA-K gold tribromide Chemical compound Br[Au](Br)Br OVWPJGBVJCTEBJ-UHFFFAOYSA-K 0.000 description 1
- OIZJPMOIAMYNJL-UHFFFAOYSA-H gold(3+);trisulfate Chemical compound [Au+3].[Au+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O OIZJPMOIAMYNJL-UHFFFAOYSA-H 0.000 description 1
- SRCZENKQCOSNAI-UHFFFAOYSA-H gold(3+);trisulfite Chemical class [Au+3].[Au+3].[O-]S([O-])=O.[O-]S([O-])=O.[O-]S([O-])=O SRCZENKQCOSNAI-UHFFFAOYSA-H 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 1
- 229940071870 hydroiodic acid Drugs 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 125000002768 hydroxyalkyl group Chemical group 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000013580 millipore water Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910001453 nickel ion Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- BHZRJJOHZFYXTO-UHFFFAOYSA-L potassium sulfite Chemical compound [K+].[K+].[O-]S([O-])=O BHZRJJOHZFYXTO-UHFFFAOYSA-L 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- 235000019252 potassium sulphite Nutrition 0.000 description 1
- 125000002577 pseudohalo group Chemical group 0.000 description 1
- 235000019423 pullulan Nutrition 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 235000002639 sodium chloride Nutrition 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 235000019345 sodium thiosulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- DHCDFWKWKRSZHF-UHFFFAOYSA-N sulfurothioic S-acid Chemical compound OS(O)(=O)=S DHCDFWKWKRSZHF-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical group [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- AAGLRRWDTGMXSD-UHFFFAOYSA-H trisodium gold(3+) sulfinato sulfite Chemical compound S(=O)([O-])OS(=O)[O-].[Na+].[Na+].[Na+].[Au+3].S(=O)([O-])OS(=O)[O-].S(=O)([O-])OS(=O)[O-] AAGLRRWDTGMXSD-UHFFFAOYSA-H 0.000 description 1
- 150000003751 zinc Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/54—Contact plating, i.e. electroless electrochemical plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
Definitions
- the present invention relates to aqueous plating bath compositions for immersion plating of gold layers onto a substrate.
- the plating bath is particularly suitable in the manufacture of printed circuit boards, IC substrates, semiconducting devices, interposers made of glass and the like.
- Immersion-type plating is an established method to deposit a layer of gold onto a metal substrate.
- Gold ions present in such plating bath compositions are reduced to metallic gold when in contact with a metal present on the substrate surface which is less noble than gold. Thereby, the metal from the substrate surface is oxidised and transferred to the gold plating bath.
- Such plating bath compositions do not contain a strong reducing agent such as hypophosphite ions or formaldehyde which is common in plating baths for electroless deposition of e.g., nickel alloys and copper.
- Immersion plated gold layers are frequently used as solderable and/or wire bondable surfaces in the manufacture of printed circuit boards, IC substrates, semiconducting devices and the like.
- Gold layers are usually deposited by immersion-type plating onto a barrier layer such as a nickel phosphorous alloy or onto an intermediate layer such as a palladium or palladium alloy layer.
- An important property of the deposited gold layer is a sufficient wettability of a molten solder material which is usually a tin based alloy on the surface of the gold or gold alloy layer. Furthermore, the gold layer should be applicable for wire bonding with e.g. aluminium, copper and gold wires.
- Another desired property of the gold layer is the optical appearance: a discoloration of the gold layer is not acceptable.
- a cyanide-free immersion type plating bath comprising a source for gold ions, a sulfite salt, complexing agents, a heavy metal ion stabiliser (antimony or bismuth) and a quaternary ammonium salt type polymer is disclosed in JP 2004-250765 A .
- EP 1 201 789 A2 discloses an aqueous plating bath for electrodeposition of tin-zinc alloys comprising at least one bath-soluble stannous salt, at least one bath soluble zinc salt, and a quaternary ammonium polymer selected from a ureylene quaternary ammonium polymer, an iminoureylene quaternary ammonium polymer or a thioureylene quaternary ammonium polymer.
- the plating baths also may contain one or more of the following additives: hydroxy polycarboxylic acids or salts thereof such as citric acid; ammonium salts; conducting salts; aromatic carbonyl-containing compounds; polymers of aliphatic amines such as a poly(alkyleneimine); and hydroxyalkyl substituted diamines as metal complexing agents.
- hydroxy polycarboxylic acids or salts thereof such as citric acid
- ammonium salts such as citric acid
- conducting salts aromatic carbonyl-containing compounds
- polymers of aliphatic amines such as a poly(alkyleneimine)
- hydroxyalkyl substituted diamines as metal complexing agents.
- JP 2000 192248 A discloses a plating bath containing a soluble gold salt, a complexing agent consisting of sulfite and thiosulfite, a concealing complexing agent consisting of oxycarboxylic acid, such as tartaric acid, an amine compound, such as aminoacetic acid or ethylene diamine and an ammonium compound., a pH control agent, an amphoteric surfactant or a mixture composed of the amphoteric surfactant and a nonionic surfactant.
- the plating bath is characterized in that the sulfite and the thiosulfite are combined as the complexing agent, that the concealing complexing agent is used and that the kind of the surfactant is limited to the mixture of the amphoteric or amphoteric and nonionic system.
- the stabilization of the gold ions in the plating bath and the suppression of the plating spreading at the time of gold plating may be simultaneously achieved by the synergistic effect based on the constitution.
- a cyanide-free immersion type plating bath comprising gold ions, a pyrosulfurous acid compound, a thiosulfuric acid compound, a sulfurous acid compound and an aminocarboxylic acid is disclosed in US 2006/0269761 A1 .
- an aqueous immersion type plating bath composition which is free of cyanide ions, the plating bath composition comprising
- Gold layers having a sufficient wettability to tin based solder materials and the desired lemon-yellow colour are obtained by the aqueous immersion-type plating bath composition according to the present invention. Furthermore, in case the gold layer is deposited onto a nickel or nickel alloy layer, a reduced corrosive attack of the underlying nickel or nickel alloy layer is observed when plating a gold layer from the aqueous plating bath according to the present invention.
- the aqueous immersion-type plating bath according to the present invention comprises gold ions in either Au + , Au 3+ or both oxidation states.
- the source of gold ions is a water soluble salt such as trisodium gold disulfite, tripotassium gold disulfite and triammonium gold disulfite, gold thiosulfate, gold thiocyanide, gold sulfate, gold chloride, and gold bromide.
- the source of gold ions is added to the aqueous plating bath in the form of a gold sulfite solution.
- the concentration of gold ions in the aqueous plating bath preferably ranges from 0.1 to 10 g/l, more preferably from 0.3 to 6 g/l.
- the at least one complexing agent present in the aqueous plating bath is selected from the group comprising carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids or a salt of the aforementioned and serves as a complexing agent for gold ions as well as for metal ions dissolved from the substrate during plating, e.g., nickel ions.
- a preferred carboxylic acid is for example oxalic acid or a salt thereof.
- Preferred hydroxycarboxylic acids are for example tartaric acid, citric acid, lactic acid, malic acid, gluconic acid and salts of the aforementioned.
- Preferred aminocarboxylic acids are for example glycine, cysteine, methionine and salts of the aforementioned. In all cases also the sodium, potassium and ammonium salts of said compounds are also suitable.
- the concentration of the at least one complexing agent preferably ranges from 0.1 to 25 g/l, more preferably from 0.5 to 10 g/l.
- the aqueous plating bath comprises two different complexing agents and/or salts thereof, such as a hydroxycarboxylic acid or salt thereof and an aminocarboxylic acid or salt thereof.
- the aqueous plating bath comprises three different complexing agents such as two different hydroxycarboxylic acids or salts thereof and one aminocarboxylic acid or salt thereof.
- the aqueous plating bath according to the present invention further comprises sulfite ions which also serve as a complexing agent for gold ions.
- Sulfite ions are added to the aqueous plating bath in form of a water soluble sulfite salt such as sodium sulfite, potassium sulfite and ammonium sulfite or together with gold ions as trisodium gold sulfite, tripotassium gold sulfite and ammonium gold sulfite.
- concentration of sulfite ions in the aqueous plating bath preferably ranges from 0.05 to 20 g/l, more preferably from 0.1 to 10 g/l.
- the aqueous plating bath according to the present invention further comprises thiosulfate ions which also serve as a complexing agent for gold ions.
- Suitable sources for thiosulfate ions are water soluble salts of thiosulfate such as sodium thiosulfate, potassium thiosulfate and ammonium thiosulfate.
- the concentration of thiosulfate ions in the plating bath preferably ranges from 0.1 to 20 g/l, more preferably from 0.5 to 10 g/l.
- the aqueous plating bath according to the present invention further comprises at least one ureylene polymer additive which enhances the wettability of the tin based solder materials on the gold layer.
- monomer A is selected from compounds according to formula (III).
- concentration of the at least one ureylene polymer additive according to formulae (I) and (II) in the aqueous plating bath preferably ranges from 0.005 to 10 g/l, more preferably from 0.01 to 5 g/l.
- polymer has to be understood in a broad sense in connection with the present invention. It comprises any compound which has been formed by reaction of at least two monomer molecules A and one divalent residue L.
- polymer does comprise, in particular, compounds which are typically designated as oligomers.
- polymer is, in connection with the present invention also applied to compounds, which are formed by a poly "condensation" reaction.
- the ureylene polymer additive according to formulae (I) and (II) are obtained by reacting one or more diamino compounds of formulae (III) to (V) with one or more compounds of the following formula (VI) P-L-Q (VI) wherein L has the same meaning as in formulae (I) and (II) and wherein P and Q may each be the same or different and represent halogens such as Cl, Br and I or pseudohalogens such as mesylate, triflate, nonaflate, methanesulfonate, or tosylate.
- the compounds of the formula (VI) are organic di(pseudo)halogen compounds.
- the molar ratio (n A n B ) of the total amount of substance used of the compound(s) of formulae (III) to (V) (n A ) to the total amount of substance of the compound(s) of formula (VI) (n B ) is 1 : 1.
- the molar ratio (n A : n B ) of the total amount of substance used of the compound(s) of formulae (III) to (V) (n A ) to the total amount of substance of the compound(s) of formula (VI) (n B ) is preferably at least 1.1 : 1, more preferably at least 1.3 : 1, and most preferably at least 1.5 : 1.
- the di(pseudo)halogen compound of the formula (VI) is used in a substoichiometric amount with respect to component(s) of the formulae (III) to (V).
- the chain of the ureylene polymer additive according to formula (II) has units A having amino groups at both ends. These terminal amino groups are at first tertiary (as in the compounds of formulae (III) to (V)), but may be quaternized. In acidic solution, the amino groups exist in completely or partially protonated form.
- terminal tertiary amino groups may be quaternized in accordance with the desired properties by using an organic monohalide, such as benzyl chloride, allyl chloride, alkyl chloride, such as 1-chloro-hexane or their corresponding bromides, or by using an appropriate mineral acid, such as hydrochloric acid, hydrobromic acid, hydroiodic acid or sulfuric acid.
- organic monohalide such as benzyl chloride, allyl chloride, alkyl chloride, such as 1-chloro-hexane or their corresponding bromides
- mineral acid such as hydrochloric acid, hydrobromic acid, hydroiodic acid or sulfuric acid.
- the ureylene polymer additives according to formulae (I) and (II) preferably have a weight average molecular mass M W of 1000 to 25000 Da, more preferably of 2000 to 20000 Da.
- reaction of diamino compounds of the formulae (III) to (V) with the compounds of the formula (VI) may preferably be carried out in aqueous or aqueous-alcoholic solutions or solvent-free substances at temperatures of preferably 20 to 100°C.
- the ureylene polymer additives according to formula (II) do not contain any organically bound (pseudo-)halogen, such as a covalent C-Cl moiety.
- halide ions serving as the counter ions of the positively charged ureylene polymer additives according to formulae (I) and (II) are replaced after preparation of the polymer by anions such as hydroxide, sulfate, hydrogensulfate, carbonate, hydrogencarbonate, alkylsulfonate such as methane sulfonate, alkarylsulfonate, arylsulfonate, alkyl-carboxylate, alkarylcarboxylate, arylcarboxylate, phosphate, hydrogenphosphate, dihydrogenphosphate, and phosphonate.
- the halide ions can be for example replaced by ion exchange over a suitable ion exchange resin.
- the most suitable ion exchange resins are basic ion exchange resins such as Amberlyst® A21.
- Halide ions can then be replaced by adding an inorganic acid and/or an organic acid containing the desired anions to the ion exchange resin.
- the aqueous plating bath according to the present invention may further comprise sulfate ions.
- Suitable sources for optional sulfate ions are water soluble salts of sulfate ions such as sodium sulfate, potassium sulfate, and ammonium sulfate.
- the concentration of the optional sulfate ions preferably ranges from 0.05 to 20 g/l, more preferably from 0.1 to 10 g/l.
- the aqueous plating bath according to the present invention is prepared by adding the ingredients to water.
- concentrates of the aqueous plating bath are prepared and further diluted with water prior to use of the plating bath.
- the cyanide-free aqueous immersion-type bath according to the present invention is free of antimony or bismuth ions.
- a kit comprising two different aqueous solutions.
- the first solution contains at least one complexing agent selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids and salts of the aforementioned, thiosulfate ions and the at least one ureylene polymer additive according to formulae (I) and/or (II).
- the second solution contains gold ions and sulfite ions.
- the first solution and the second solution of the kit are mixed to obtain the immersion-type plating bath according to the present invention.
- the pH of the aqueous plating bath according to the present invention preferably ranges from 5 to 8, more preferably from 5.5 to 7.5.
- the target pH value can be adjusted using for example sulfuric acid or sodium hydroxide.
- the substrate to be plated with gold or a gold alloy has a surface area consisting of a metal or metal alloy less noble than gold and is contacted with the aqueous plating bath according to the present invention by either dipping the substrate into the plating bath or by spraying the plating bath onto the substrate.
- Gold or a gold alloy is then deposited onto the surface area consisting of a metal or metal alloy less noble than gold, selected from the group comprising nickel, nickel alloys such as nickel phosphorous alloys, nickel boron alloys, cobalt, cobalt alloys such as cobalt phosphorous alloys, cobalt molybdenum phosphorous alloys, cobalt molybdenum boron alloys, cobalt molybdenum boron phosphorous alloys, cobalt tungsten phosphorous alloys, cobalt tungsten boron alloys, cobalt tungsten boron phosphorous alloys, palladium, palladium alloys such as palladium phosphorous alloys, palladium boron alloys, copper and copper alloys.
- nickel alloys such as nickel phosphorous alloys, nickel boron alloys, cobalt, cobalt alloys such as cobalt phosphorous alloys, cobalt molybdenum boron alloys, cobalt moly
- the temperature of the aqueous plating bath is preferably in the range of 30 to 70 °C, more preferably from 40 to 60 °C during plating.
- the plating time is preferably in the range of 40 to 60 min, more preferably in the range of 5 to 30 min.
- the immersion-type plating bath according to the present invention may be used with horizontal, vertical and spray plating equipment.
- the solvent used was Millipore water with 0.5 % acetic acid and 0.1 M Na 2 SO 4 .
- Substrates (length: 27.5 mm, width: 12.5 mm) containing 40 plated through-holes (0.8 mm diameter, 1.5 mm land size, and a surface consisting of a plated nickel phosphorous alloy) were used throughout all examples. Gold was deposited onto the plated through-holes.
- Test C1 a solder float test with lead-free solder according to IPC J-STD-003B (March 2007 ) was applied to all gold plated samples in order to asses the solder wettability of the gold layers.
- a SnAg3.0Cu0.5 solder bath was used.
- three reflow cycles in air atmosphere were applied to each sample prior to inspection.
- the samples are evaluated after the test with an optical microscope (magnification: 10 x). A sufficient wetting of the gold layer with solder material is achieved when at least 95 % of the gold surfaces being tested exhibit good wetting.
- An aqueous immersion type gold plating bath stock solution comprising 1.5 g/l trisodium gold sulfite 3.72 g/l Na 2 S 2 O 3 ⁇ 5H 2 O 1 g/l oxalic acid 3.1 g/l trisodium citrate dihydrate 5 g/l methionine was used throughout all examples. Further additives added to the stock solution are indicated in the respective example.
- the plating bath pH was 6.
- the plating bath temperature during plating was 50 °C and the plating time was 15 min.
- the thickness of the deposited gold layers ranged between 60 and 80 nm.
- the gold layer obtained has a green colour which is not desired.
- test C1 was only achieved for 5 % of the gold plated area. Accordingly, the gold layer failed the solder float test.
- the polymer additive according to formula (II) was obtained according to preparation example 12 in WO 2011/029781 A1 and comprises chloride ions as counter ions.
- the weight average molecular mass M W of the ureylene polymer additive obtained was 5380 Da.
- the gold layer obtained has the desired lemon-yellow colour.
- test C1 was achieved for 98 % of the gold plated area.
- the ureylene polymer additive was prepared by reacting 20 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 22.77 g oxybis-(ethane-2,1-diyl)-methanesulfonate (monomer L) in a molar ratio of 4 : 3 for 12 h at a temperature of 80 °C.
- the ureylene polymer additive according to formula (II) comprises methanesulfonate as counter ions and has a weight average molecular mass M W of 5677 Da.
- the gold layer obtained has the desired lemon-yellow colour.
- the polymer additive according to formula (I) was prepared by reacting 20 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 22.7 g oxybis-(ethane-2,1-diyl)-methanesulfonate (monomer L) in a molar ratio of 1 : 1 for 20 h at a temperature of 80 °C.
- the ureylene polymer additive according to formula (I) comprises methanesulfonate as counter ions and has a weight average molecular mass M W of 17260 Da.
- the gold layer obtained has the desired lemon-yellow colour.
- the polymer additive according to formula (II) was prepared by reacting 25 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 24.94 g ethane-1,2-diyl-bis(oxy)-bis(ethane-3,1-diyl)-dimethanesulfonate (monomer L) in a molar ratio of 3 : 2 for 24 h at a temperature of 80 °C.
- the ureylene polymer additive according to formula (II) comprises methanesulfonate as counter ions and has a weight average molecular mass M W of 7299 Da.
- the gold layer obtained has the desired lemon-yellow colour.
- the polymer additive according to formula (II) was prepared by reacting 15 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 6.43 g 1,3-dichloropropane-2-ol (monomer L) in a molar ratio of 4 : 3 for 12 h at a temperature of 80 °C.
- the ureylene polymer additive according to formula (II) comprises chloride as counter ions and has a weight average molecular mass M W of 5202 Da.
- the gold layer obtained has the desired lemon-yellow colour.
- the polymer additive according to formula (II) was prepared by reacting the 45 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 18.6 g 1-bromo-3-chloro-propane in a molar ratio of 3 : 2 for 12 h at a temperature of 80 °C.
- the ureylene polymer additive according to formula (II) comprises bromide and chloride as counter ions and has a weight average molecular mass M W of 5016 Da.
- the gold layer obtained has the desired lemon-yellow colour.
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- Chemical Kinetics & Catalysis (AREA)
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- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Description
- The present invention relates to aqueous plating bath compositions for immersion plating of gold layers onto a substrate. The plating bath is particularly suitable in the manufacture of printed circuit boards, IC substrates, semiconducting devices, interposers made of glass and the like.
- Immersion-type plating is an established method to deposit a layer of gold onto a metal substrate. Gold ions present in such plating bath compositions are reduced to metallic gold when in contact with a metal present on the substrate surface which is less noble than gold. Thereby, the metal from the substrate surface is oxidised and transferred to the gold plating bath. Such plating bath compositions do not contain a strong reducing agent such as hypophosphite ions or formaldehyde which is common in plating baths for electroless deposition of e.g., nickel alloys and copper.
- Immersion plated gold layers are frequently used as solderable and/or wire bondable surfaces in the manufacture of printed circuit boards, IC substrates, semiconducting devices and the like. Gold layers are usually deposited by immersion-type plating onto a barrier layer such as a nickel phosphorous alloy or onto an intermediate layer such as a palladium or palladium alloy layer.
- An important property of the deposited gold layer is a sufficient wettability of a molten solder material which is usually a tin based alloy on the surface of the gold or gold alloy layer. Furthermore, the gold layer should be applicable for wire bonding with e.g. aluminium, copper and gold wires.
- Another desired property of the gold layer is the optical appearance: a discoloration of the gold layer is not acceptable.
- Furthermore, toxic ingredients such as cyanide ions or heavy metal ions as stabilising agents commonly used in such immersion type plating baths need to be replaced by less or non toxic raw materials.
- A cyanide-free immersion type plating bath comprising a source for gold ions, a sulfite salt, complexing agents, a heavy metal ion stabiliser (antimony or bismuth) and a quaternary ammonium salt type polymer is disclosed in
JP 2004-250765 A -
EP 1 201 789 A2 discloses an aqueous plating bath for electrodeposition of tin-zinc alloys comprising at least one bath-soluble stannous salt, at least one bath soluble zinc salt, and a quaternary ammonium polymer selected from a ureylene quaternary ammonium polymer, an iminoureylene quaternary ammonium polymer or a thioureylene quaternary ammonium polymer. The plating baths also may contain one or more of the following additives: hydroxy polycarboxylic acids or salts thereof such as citric acid; ammonium salts; conducting salts; aromatic carbonyl-containing compounds; polymers of aliphatic amines such as a poly(alkyleneimine); and hydroxyalkyl substituted diamines as metal complexing agents. The plating baths of this invention deposit a bright and level deposit, and they can be adapted to provide plated alloys having high tin concentration over a wide current density range. -
JP 2000 192248 A - A cyanide-free immersion type plating bath comprising gold ions, a pyrosulfurous acid compound, a thiosulfuric acid compound, a sulfurous acid compound and an aminocarboxylic acid is disclosed in
US 2006/0269761 A1 . - It is the objective of the present invention to provide an aqueous immersion-type gold plating bath composition which is free of cyanide ions and from which gold layers can be deposited having an improved wettability for tin-based solder materials and showing no discoloration.
- This objective is solved by an aqueous immersion type plating bath composition which is free of cyanide ions, the plating bath composition comprising
- (i) a source of gold ions,
- (ii) at least one complexing agent selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids and salts of the aforementioned,
- (iii) sulfite ions,
- (iv) thiosulfate ions, and
- (v) at least one ureylene polymer additive represented by formulae (I) and (II):
- wherein R1, R2, R5, and R6 are independently selected from the group consisting of a substituted or unsubstituted hydrocarbon residue with 1 to 10 carbon atoms, preferably methyl, ethyl, hydroxyethyl or -CH2CH2(OCH2CH2)y-OH, wherein y is between 0 and 4, and
- R3, R4 and R7 are independently selected from the group consisting of (CH2)p, wherein p stands for an integer of 2 to 12, preferably for an ethylene or propylene group, or for a -[CH2CH2O]m-CH2CH2- group, wherein m is between 1 and 40, preferably for a -(CH2)2-O-(CH2)2- or -(CH2)2-O-(CH2)2-O-(CH2)2- group, and wherein
- L stands for a divalent residue, which is selected from the group consisting of -(CH2)p-, wherein p is an integer between 1 and 12, preferably between 1 and 6, and most preferably between 2 and 4,
- -CH2-CH(OH)-CH2-, -[CH2O]q-CH2CH2- and -[CH2CH2O]q-CH2CH2-, wherein q is an integer between 1 and 40, preferably -(CH2)-O-(CH2)2-, -(CH2)2-O-(CH2)2- or -(CH2)2-O-(CH2)2-O-(CH2)2-, and -CH2-CH(OH)-CH2-.
P-L-Q (VI)
wherein L has the same meaning as in formulae (I) and (II) and wherein P and Q are each the same or different and selected from the group consisting of Cl, Br, I, mesylate, triflate, nonaflate, methanesulfonate, or tosylate. - Gold layers having a sufficient wettability to tin based solder materials and the desired lemon-yellow colour are obtained by the aqueous immersion-type plating bath composition according to the present invention. Furthermore, in case the gold layer is deposited onto a nickel or nickel alloy layer, a reduced corrosive attack of the underlying nickel or nickel alloy layer is observed when plating a gold layer from the aqueous plating bath according to the present invention.
- The aqueous immersion-type plating bath according to the present invention comprises gold ions in either Au+, Au3+ or both oxidation states. The source of gold ions is a water soluble salt such as trisodium gold disulfite, tripotassium gold disulfite and triammonium gold disulfite, gold thiosulfate, gold thiocyanide, gold sulfate, gold chloride, and gold bromide. Preferably, the source of gold ions is added to the aqueous plating bath in the form of a gold sulfite solution. The concentration of gold ions in the aqueous plating bath preferably ranges from 0.1 to 10 g/l, more preferably from 0.3 to 6 g/l.
- The at least one complexing agent present in the aqueous plating bath is selected from the group comprising carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids or a salt of the aforementioned and serves as a complexing agent for gold ions as well as for metal ions dissolved from the substrate during plating, e.g., nickel ions. A preferred carboxylic acid is for example oxalic acid or a salt thereof. Preferred hydroxycarboxylic acids are for example tartaric acid, citric acid, lactic acid, malic acid, gluconic acid and salts of the aforementioned. Preferred aminocarboxylic acids are for example glycine, cysteine, methionine and salts of the aforementioned. In all cases also the sodium, potassium and ammonium salts of said compounds are also suitable. The concentration of the at least one complexing agent preferably ranges from 0.1 to 25 g/l, more preferably from 0.5 to 10 g/l.
- More preferably, the aqueous plating bath comprises two different complexing agents and/or salts thereof, such as a hydroxycarboxylic acid or salt thereof and an aminocarboxylic acid or salt thereof.
- Most preferably, the aqueous plating bath comprises three different complexing agents such as two different hydroxycarboxylic acids or salts thereof and one aminocarboxylic acid or salt thereof.
- The aqueous plating bath according to the present invention further comprises sulfite ions which also serve as a complexing agent for gold ions. Sulfite ions are added to the aqueous plating bath in form of a water soluble sulfite salt such as sodium sulfite, potassium sulfite and ammonium sulfite or together with gold ions as trisodium gold sulfite, tripotassium gold sulfite and ammonium gold sulfite. The concentration of sulfite ions in the aqueous plating bath preferably ranges from 0.05 to 20 g/l, more preferably from 0.1 to 10 g/l.
- The aqueous plating bath according to the present invention further comprises thiosulfate ions which also serve as a complexing agent for gold ions. Suitable sources for thiosulfate ions are water soluble salts of thiosulfate such as sodium thiosulfate, potassium thiosulfate and ammonium thiosulfate. The concentration of thiosulfate ions in the plating bath preferably ranges from 0.1 to 20 g/l, more preferably from 0.5 to 10 g/l.
- The aqueous plating bath according to the present invention further comprises at least one ureylene polymer additive which enhances the wettability of the tin based solder materials on the gold layer.
- Preferably, monomer A is selected from compounds according to formula (III). The concentration of the at least one ureylene polymer additive according to formulae (I) and (II) in the aqueous plating bath preferably ranges from 0.005 to 10 g/l, more preferably from 0.01 to 5 g/l.
- The term "polymer" has to be understood in a broad sense in connection with the present invention. It comprises any compound which has been formed by reaction of at least two monomer molecules A and one divalent residue L. The term "polymer" does comprise, in particular, compounds which are typically designated as oligomers. The term "polymer" is, in connection with the present invention also applied to compounds, which are formed by a poly "condensation" reaction.
- According to claim 1 the ureylene polymer additive according to formulae (I) and (II) are obtained by reacting one or more diamino compounds of formulae (III) to (V) with one or more compounds of the following formula (VI)
P-L-Q (VI)
wherein L has the same meaning as in formulae (I) and (II) and wherein P and Q may each be the same or different and represent halogens such as Cl, Br and I or pseudohalogens such as mesylate, triflate, nonaflate, methanesulfonate, or tosylate. The compounds of the formula (VI) are organic di(pseudo)halogen compounds. - In case of ureylene polymer additives according to formula (I), the molar ratio (nA nB) of the total amount of substance used of the compound(s) of formulae (III) to (V) (nA) to the total amount of substance of the compound(s) of formula (VI) (nB) is 1 : 1.
- In case of ureylene polymer additives according to formula (II), the molar ratio (nA : nB) of the total amount of substance used of the compound(s) of formulae (III) to (V) (nA) to the total amount of substance of the compound(s) of formula (VI) (nB) is preferably at least 1.1 : 1, more preferably at least 1.3 : 1, and most preferably at least 1.5 : 1.
- This means that in the preparation of ureylene polymer additives according to formula (II), the di(pseudo)halogen compound of the formula (VI) is used in a substoichiometric amount with respect to component(s) of the formulae (III) to (V). Thus, it is effected that the chain of the ureylene polymer additive according to formula (II) has units A having amino groups at both ends. These terminal amino groups are at first tertiary (as in the compounds of formulae (III) to (V)), but may be quaternized. In acidic solution, the amino groups exist in completely or partially protonated form.
- The linkages between units A and residues L occur via quaternary ammonium groups, which are formed by substitution of groups P and Q in the compounds of formula (VI) by the tertiary amino groups of the compounds of the formulae (III) to (V).
- These terminal tertiary amino groups may be quaternized in accordance with the desired properties by using an organic monohalide, such as benzyl chloride, allyl chloride, alkyl chloride, such as 1-chloro-hexane or their corresponding bromides, or by using an appropriate mineral acid, such as hydrochloric acid, hydrobromic acid, hydroiodic acid or sulfuric acid.
- The ureylene polymer additives according to formulae (I) and (II) preferably have a weight average molecular mass MW of 1000 to 25000 Da, more preferably of 2000 to 20000 Da.
- The reaction of diamino compounds of the formulae (III) to (V) with the compounds of the formula (VI) may preferably be carried out in aqueous or aqueous-alcoholic solutions or solvent-free substances at temperatures of preferably 20 to 100°C.
- The ureylene polymer additives according to formula (II) do not contain any organically bound (pseudo-)halogen, such as a covalent C-Cl moiety.
- In another embodiment of the present invention, halide ions serving as the counter ions of the positively charged ureylene polymer additives according to formulae (I) and (II) are replaced after preparation of the polymer by anions such as hydroxide, sulfate, hydrogensulfate, carbonate, hydrogencarbonate, alkylsulfonate such as methane sulfonate, alkarylsulfonate, arylsulfonate, alkyl-carboxylate, alkarylcarboxylate, arylcarboxylate, phosphate, hydrogenphosphate, dihydrogenphosphate, and phosphonate. The halide ions can be for example replaced by ion exchange over a suitable ion exchange resin. The most suitable ion exchange resins are basic ion exchange resins such as Amberlyst® A21. Halide ions can then be replaced by adding an inorganic acid and/or an organic acid containing the desired anions to the ion exchange resin.
- The aqueous plating bath according to the present invention may further comprise sulfate ions. Suitable sources for optional sulfate ions are water soluble salts of sulfate ions such as sodium sulfate, potassium sulfate, and ammonium sulfate. The concentration of the optional sulfate ions preferably ranges from 0.05 to 20 g/l, more preferably from 0.1 to 10 g/l.
- The aqueous plating bath according to the present invention is prepared by adding the ingredients to water. In one embodiment of the present invention, concentrates of the aqueous plating bath are prepared and further diluted with water prior to use of the plating bath.
- Preferably, the cyanide-free aqueous immersion-type bath according to the present invention is free of antimony or bismuth ions.
- In one embodiment of the present invention, a kit comprising two different aqueous solutions is provided. The first solution contains at least one complexing agent selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids and salts of the aforementioned, thiosulfate ions and the at least one ureylene polymer additive according to formulae (I) and/or (II). The second solution contains gold ions and sulfite ions. Prior to use of the immersion-type plating bath, the first solution and the second solution of the kit are mixed to obtain the immersion-type plating bath according to the present invention.
- The pH of the aqueous plating bath according to the present invention preferably ranges from 5 to 8, more preferably from 5.5 to 7.5. The target pH value can be adjusted using for example sulfuric acid or sodium hydroxide.
- The substrate to be plated with gold or a gold alloy has a surface area consisting of a metal or metal alloy less noble than gold and is contacted with the aqueous plating bath according to the present invention by either dipping the substrate into the plating bath or by spraying the plating bath onto the substrate.
- Gold or a gold alloy is then deposited onto the surface area consisting of a metal or metal alloy less noble than gold, selected from the group comprising nickel, nickel alloys such as nickel phosphorous alloys, nickel boron alloys, cobalt, cobalt alloys such as cobalt phosphorous alloys, cobalt molybdenum phosphorous alloys, cobalt molybdenum boron alloys, cobalt molybdenum boron phosphorous alloys, cobalt tungsten phosphorous alloys, cobalt tungsten boron alloys, cobalt tungsten boron phosphorous alloys, palladium, palladium alloys such as palladium phosphorous alloys, palladium boron alloys, copper and copper alloys.
- The temperature of the aqueous plating bath is preferably in the range of 30 to 70 °C, more preferably from 40 to 60 °C during plating. The plating time is preferably in the range of 40 to 60 min, more preferably in the range of 5 to 30 min.
- The immersion-type plating bath according to the present invention may be used with horizontal, vertical and spray plating equipment.
- The following non-limiting examples further illustrate the present invention.
- The weight average molecular mass Mw of the ureylene polymer additives according to formulae (I) and (II) was determined by gel permeation chromatography (GPC) using a GPC apparatus from WGE-Dr. Bures equipped with a molecular weight analyzer BI-MwA from Brookhaven, a TSK Oligo +3000 column, and Pullulan and PEG standards with MW = 400 to 22000 g/mol. The solvent used was Millipore water with 0.5 % acetic acid and 0.1 M Na2SO4.
- Substrates (length: 27.5 mm, width: 12.5 mm) containing 40 plated through-holes (0.8 mm diameter, 1.5 mm land size, and a surface consisting of a plated nickel phosphorous alloy) were used throughout all examples. Gold was deposited onto the plated through-holes.
- Test C1, a solder float test with lead-free solder according to IPC J-STD-003B (March 2007) was applied to all gold plated samples in order to asses the solder wettability of the gold layers. A SnAg3.0Cu0.5 solder bath was used. Next, three reflow cycles in air atmosphere were applied to each sample prior to inspection. The samples are evaluated after the test with an optical microscope (magnification: 10 x). A sufficient wetting of the gold layer with solder material is achieved when at least 95 % of the gold surfaces being tested exhibit good wetting.
- An aqueous immersion type gold plating bath stock solution comprising
1.5 g/l trisodium gold sulfite 3.72 g/l Na2S2O3 · 5H2O 1 g/l oxalic acid 3.1 g/l trisodium citrate dihydrate 5 g/l methionine - The plating bath pH was 6.
- The plating bath temperature during plating was 50 °C and the plating time was 15 min. The thickness of the deposited gold layers ranged between 60 and 80 nm.
- No ureylene polymer additive according to formulae (I) or (II) was added to the aqueous immersion-type gold plating bath stock solution.
- The gold layer obtained has a green colour which is not desired.
- A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was only achieved for 5 % of the gold plated area. Accordingly, the gold layer failed the solder float test.
- 0.1 ml/l of a solution comprising 50 wt.-% of a polymer additive according to formula (II) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = (CH)2O(CH2)2 was added to the aqueous immersion-type gold plating bath stock solution. The polymer additive according to formula (II) was obtained according to preparation example 12 in
WO 2011/029781 A1 and comprises chloride ions as counter ions. The weight average molecular mass MW of the ureylene polymer additive obtained was 5380 Da. - The gold layer obtained has the desired lemon-yellow colour.
- A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 98 % of the gold plated area.
- 0.3 ml/l of a solution comprising 25 wt.-% of a polymer additive according to formula (II) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = (CH2)2O(CH2)2 was added to the aqueous immersion-type gold plating bath stock solution.
- The ureylene polymer additive was prepared by reacting 20 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 22.77 g oxybis-(ethane-2,1-diyl)-methanesulfonate (monomer L) in a molar ratio of 4 : 3 for 12 h at a temperature of 80 °C. The ureylene polymer additive according to formula (II) comprises methanesulfonate as counter ions and has a weight average molecular mass MW of 5677 Da.
- The gold layer obtained has the desired lemon-yellow colour. A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 96 % of the gold plated area.
- 0.3 ml/l of a solution comprising 50 wt.-% of a polymer additive according to formula (I) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = (CH2)2O(CH2)2 was added to the aqueous immersion-type gold plating bath stock solution.
- The polymer additive according to formula (I) was prepared by reacting 20 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 22.7 g oxybis-(ethane-2,1-diyl)-methanesulfonate (monomer L) in a molar ratio of 1 : 1 for 20 h at a temperature of 80 °C. The ureylene polymer additive according to formula (I) comprises methanesulfonate as counter ions and has a weight average molecular mass MW of 17260 Da.
- The gold layer obtained has the desired lemon-yellow colour. A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 98 % of the gold plated area.
- 0.3 ml/l of a solution comprising 50 wt.-% of a polymer additive according to formula (II) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = (CH2)2O(CH2)2O(CH2)2 was added to the aqueous immersion-type gold plating bath stock solution.
- The polymer additive according to formula (II) was prepared by reacting 25 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 24.94 g ethane-1,2-diyl-bis(oxy)-bis(ethane-3,1-diyl)-dimethanesulfonate (monomer L) in a molar ratio of 3 : 2 for 24 h at a temperature of 80 °C. The ureylene polymer additive according to formula (II) comprises methanesulfonate as counter ions and has a weight average molecular mass MW of 7299 Da.
- The gold layer obtained has the desired lemon-yellow colour. A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 100 % of the gold plated area.
- 0.3 ml/l of a solution comprising 20 wt.-% of a polymer additive according to formula (II) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = CH2-CH(OH)-CH2 was added to the aqueous immersion-type gold plating bath stock solution.
- The polymer additive according to formula (II) was prepared by reacting 15 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 6.43 g 1,3-dichloropropane-2-ol (monomer L) in a molar ratio of 4 : 3 for 12 h at a temperature of 80 °C. The ureylene polymer additive according to formula (II) comprises chloride as counter ions and has a weight average molecular mass MW of 5202 Da.
- The gold layer obtained has the desired lemon-yellow colour. A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 97 % of the gold plated area.
- 0.3 ml/l of a solution comprising 50 wt.-% of a polymer additive according to formula (II) consisting of monomer A according to formula (III) with R1, R2, R5 and R6 = methyl, and R3 and R4 = propylene, and monomer L = (CH2)3 was added to the aqueous immersion-type gold plating bath stock solution.
- The polymer additive according to formula (II) was prepared by reacting the 45 g 1,3-bis-(3-dimethylamino)-propyl-urea (monomer A) with 18.6 g 1-bromo-3-chloro-propane in a molar ratio of 3 : 2 for 12 h at a temperature of 80 °C. The ureylene polymer additive according to formula (II) comprises bromide and chloride as counter ions and has a weight average molecular mass MW of 5016 Da.
- The gold layer obtained has the desired lemon-yellow colour. A sufficient wettability according to IPC J-STD-003B (March 2007), test C1 was achieved for 99 % of the gold plated area.
Claims (16)
- A cyanide-free aqueous immersion-type plating bath for deposition of gold, comprising(i) a source of gold ions,(ii) at least one complexing agent selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids and salts of the aforementioned,(iii) sulfite ions,(iv) thiosulfate ions, and(v) at least one ureylene polymer additive selected from polymers according to formulae (I) and (II):wherein n is an integer 1 and 40,wherein R1, R2, R5, and R6 are independently selected from the group consisting of a substituted or unsubstituted hydrocarbon residue with 1 to 10 carbon atoms,R3, R4 and R7 are independently selected from the group consisting of (CH2)p, wherein p stands for an integer of 2 to 12, -[CH2CH2O]m-CH2CH2- group, wherein m is between 1 and 40,and whereinL stands for a divalent residue, which is selected from the group consisting of -(CH2)p-, wherein p is an integer between 1 and 12, -CH2-CH(OH)-CH2-, -[CH2O]q-CH2CH2- and -[CH2CH2O]q-CH2CH2-, wherein q is an integer between 1 and 40and wherein the ureylene polymer additive according to formulae (I) and (II) are obtained by reacting one or more diamino compounds of formulae (III) to (V) with one or more compounds of the formula (VI)
P-L-Q (VI)
wherein L has the same meaning as in formulae (I) and (II) and wherein P and Q are the same or different and selected from the group consisting of Cl, Br, I, mesylate, triflate nonaflate, methansulfonate and tosylate. - The cyanide-free aqueous immersion-type plating bath according to claim 1 wherein the concentration of gold ions ranges from 0.1 to 10 g/l.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the at least one complexing agent comprises a hydroxycarboxylic acid selected from the group consisting of tartaric acid, citric acid, lactic acid, malic acid, gluconic acid or a salt of the aforementioned.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the at least one complexing agent consisting of an aminocarboxylic acid selected from the group comprising glycine, cysteine, methionine or a salt of the aforementioned.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the concentration of the at least one complexing agent ranges from 0.1 to 25 g/l.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the concentration of sulfite ions ranges from 0.05 to 10 g/l.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the concentration of thiosulfate ions ranges from 0.1 to 20 g/l.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein monomer A is selected from compounds according to formula (III).
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein R1, R2, R5, and R6 are independently selected from the group consisting of methyl, ethyl, hydroxyethyl and - CH2CH2(OCH2CH2)y-OH, wherein y is between 0 and 4.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein R3, R4 and R7 are independently selected from the group consisting of -(CH2)p-, wherein p is 2, -(CH2)2-O-(CH2)2- and -(CH2)2-O-(CH2)2-O-(CH2)2- .
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the monomer L is selected from the group consisting of -(CH2)p-, wherein p is an integer between 1 and 6, - (CH2)-O-(CH2)2-, -(CH2)2-O-(CH2)2- , -(CH2)2-O-(CH2)2-O-(CH2)2- and -CH2-CH(OH)-CH2-.
- The cyanide-free aqueous immersion-type plating bath according to any of the foregoing claims wherein the concentration of the at least one ureylene polymer ranges from 0.005 to 10 g/l.
- The cyanide-free aqueous immersion-type bath according to any of the foregoing claims which is free of antimony or bismuth ions.
- A kit comprising a first solution which contains at least one complexing agent selected from the group consisting of carboxylic acids, hydroxycarboxylic acids, aminocarboxylic acids and salts of the aforementioned, thiosulfate ions and at least one ureylene polymer additive according to formulae (I) and/or (II) according to step v) of claim 1 and wherein the ureylene polymer additive according to formulae (I) and (II) are obtained by reacting one or more diamino compounds of formulae (III) to (V) with one or more compounds of the formula (VI) and a second solution which contains a source of gold ions and sulfite ions.
- A method for depositing a gold layer onto a substrate, comprising, in this order, the steps(i) providing a substrate having a surface area consisting of a metal or metal alloy less noble than gold(ii) contacting the substrate with a cyanide-free aqueous immersion-type plating bath according to claims 1 to 13and thereby depositing a gold layer onto the surface area consisting of a metal or metal alloy less noble than gold.
- The method for depositing a gold or gold alloy layer onto a substrate according to claim 15 wherein the metal or metal alloy less noble than gold is selected from the group consisting of nickel, nickel alloys, cobalt, cobalt alloys, palladium, palladium alloys, copper and copper alloys.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
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EP12180227.6A EP2698449B1 (en) | 2012-08-13 | 2012-08-13 | Plating bath composition for immersion plating of gold |
PCT/EP2013/064725 WO2014026806A2 (en) | 2012-08-13 | 2013-07-11 | Plating bath composition for immersion plating of gold |
CN201380042872.8A CN104520471B (en) | 2012-08-13 | 2013-07-11 | Bath compositions for the immersion plating of gold |
TW102127505A TWI551723B (en) | 2012-08-13 | 2013-07-31 | Plating bath composition for immersion plating of gold |
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EP12180227.6A EP2698449B1 (en) | 2012-08-13 | 2012-08-13 | Plating bath composition for immersion plating of gold |
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CN (1) | CN104520471B (en) |
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EP3517651B1 (en) * | 2018-01-26 | 2020-09-02 | ATOTECH Deutschland GmbH | Electroless gold plating bath |
DE102019202899B3 (en) * | 2019-03-04 | 2019-11-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Aqueous formulation for producing a layer of gold and silver |
EP3933073B1 (en) * | 2020-06-29 | 2023-11-29 | Atotech Deutschland GmbH & Co. KG | Copper electroplating bath |
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US4618513A (en) * | 1984-12-17 | 1986-10-21 | Texo Corporation | Tin plating immersion process |
JP4147359B2 (en) * | 1998-12-24 | 2008-09-10 | 石原薬品株式会社 | Displacement gold plating bath and gold plating method using the bath |
US6436269B1 (en) * | 2000-10-19 | 2002-08-20 | Atotech Deutschland Gmbh | Plating bath and method for electroplating tin-zinc alloys |
JP4932094B2 (en) * | 2001-07-02 | 2012-05-16 | 日本リーロナール有限会社 | Electroless gold plating solution and electroless gold plating method |
JP2004250765A (en) | 2003-02-21 | 2004-09-09 | Murata Mfg Co Ltd | Gold plating solution and method for producing electronic component |
JP4711435B2 (en) | 2004-07-09 | 2011-06-29 | Jx日鉱日石金属株式会社 | Electroless gold plating solution |
JP4759416B2 (en) * | 2006-03-20 | 2011-08-31 | 新光電気工業株式会社 | Non-cyanide electroless gold plating solution and electroless gold plating method |
TW200848544A (en) * | 2007-06-13 | 2008-12-16 | Solution Chemicals Co Ltd | Electroless golden plating bath without cyanide |
ES2788080T3 (en) | 2009-09-08 | 2020-10-20 | Atotech Deutschland Gmbh | Polymers with amino terminal groups and their use as additives for zinc plating and zinc alloy baths |
-
2012
- 2012-08-13 EP EP12180227.6A patent/EP2698449B1/en active Active
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2013
- 2013-07-11 WO PCT/EP2013/064725 patent/WO2014026806A2/en active Application Filing
- 2013-07-11 CN CN201380042872.8A patent/CN104520471B/en not_active Expired - Fee Related
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CN104520471A (en) | 2015-04-15 |
TW201413051A (en) | 2014-04-01 |
WO2014026806A2 (en) | 2014-02-20 |
CN104520471B (en) | 2016-08-24 |
TWI551723B (en) | 2016-10-01 |
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