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EP2628607A1 - Device for anchoring a metal incrustation - Google Patents

Device for anchoring a metal incrustation Download PDF

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Publication number
EP2628607A1
EP2628607A1 EP12155635.1A EP12155635A EP2628607A1 EP 2628607 A1 EP2628607 A1 EP 2628607A1 EP 12155635 A EP12155635 A EP 12155635A EP 2628607 A1 EP2628607 A1 EP 2628607A1
Authority
EP
European Patent Office
Prior art keywords
recess
hole
deposit
galvanic
decoration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP12155635.1A
Other languages
German (de)
French (fr)
Other versions
EP2628607B1 (en
Inventor
Alexandre Netuschill
Thomas Froelicher
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Omega SA
Original Assignee
Omega SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Omega SA filed Critical Omega SA
Priority to EP12155635.1A priority Critical patent/EP2628607B1/en
Priority to IN544CH2013 priority patent/IN2013CH00544A/en
Priority to CN2013100506786A priority patent/CN103253067A/en
Priority to CN201810612134.7A priority patent/CN108749459A/en
Priority to US13/764,961 priority patent/US9150978B2/en
Priority to RU2013106520A priority patent/RU2620941C2/en
Priority to JP2013027497A priority patent/JP2013167628A/en
Publication of EP2628607A1 publication Critical patent/EP2628607A1/en
Application granted granted Critical
Publication of EP2628607B1 publication Critical patent/EP2628607B1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B44—DECORATIVE ARTS
    • B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
    • B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
    • B44C1/26—Inlaying with ornamental structures, e.g. niello work, tarsia work
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B19/00—Indicating the time by visual means
    • G04B19/06—Dials
    • G04B19/18—Graduations on the crystal or glass, on the bezel, or on the rim
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B37/00—Cases
    • G04B37/22—Materials or processes of manufacturing pocket watch or wrist watch cases
    • G04B37/225—Non-metallic cases
    • G04B37/226—Non-metallic cases coated with a metallic layer
    • G—PHYSICS
    • G04—HOROLOGY
    • G04B—MECHANICALLY-DRIVEN CLOCKS OR WATCHES; MECHANICAL PARTS OF CLOCKS OR WATCHES IN GENERAL; TIME PIECES USING THE POSITION OF THE SUN, MOON OR STARS
    • G04B45/00—Time pieces of which the indicating means or cases provoke special effects, e.g. aesthetic effects
    • G04B45/0076—Decoration of the case and of parts thereof, e.g. as a method of manufacture thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12014—All metal or with adjacent metals having metal particles
    • Y10T428/12028—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, etc.]
    • Y10T428/12063—Nonparticulate metal component

Definitions

  • the invention relates to an encrusted element of at least one metallic decoration and more specifically to such an element comprising a device for anchoring said at least one metallic decoration.
  • spectacles at least partially synthetic sapphire to show, by transparency, a deposit made in a hollow under the bezel forming for example a graduation or trade name.
  • This configuration has the advantage of protecting the deposit from any mechanical degradation by total recovery of the sapphire part.
  • this configuration can make it difficult to read the decoration by the altered transmission of the coloration of the deposit but also by the lack of difference in the hue of the sapphire with respect to that of the deposit.
  • the object of the present invention is to overcome all or part of the aforementioned drawbacks while keeping the advantage of mechanical strength and bringing that of an improved visual quality.
  • the invention relates to an element comprising a body comprising at least one recess forming the imprint of a decoration, said at least one recess being completely filled by a galvanic deposit to form an inlay element. less a metal decoration with improved visual quality characterized in that it comprises a device for anchoring said at least one metallic decoration communicating with said at least one recess to improve the anchoring of said at least one decor against said element.
  • the decorations are thus much more resistant to tearing without being aesthetically modified.
  • the invention relates to a part of the cladding of a timepiece or more generally to a timepiece or a article of jewelery, characterized in that it comprises at least one element according to one of the preceding variants.
  • the decorations are manufactured in a great depth of the element which makes them much more resistant to tearing without aesthetically modified.
  • a timepiece generally annotated 1 having at least one element 10 encrusted.
  • Each element 10 inlaid is intended to form a very wear-resistant part comprising at least a metal decoration 13 whose visual quality is improved in particular in terms of contrast.
  • the element 10 inlaid according to the invention can in particular form all or part of the cladding of the timepiece 1.
  • it could form all or part of a housing 2, a bracelet 3, a bezel 4, a dial 5, an ice cream 6, a pusher 7 and / or a crown 8.
  • the explanation of the invention will be given from a ring 10 having inlaid decorations 13 forming the graduations of a telescope 4.
  • inlaid elements 10 belonging to a watchmaking movement such as, for example, a bridge and / or a plate and / or a oscillating weight.
  • the inlaid ceramic element 10 comprises a body 11 comprising at least one recess 12 forming the impression of a decoration 13.
  • each decoration 13 may, advantageously according to the invention, be of any shape, such as, for example, a geometric figure or an alphanumeric character.
  • each recess 12 is completely filled by a galvanic deposit 16 formed by a metallic material. This configuration makes it possible to protect each decoration 13 in the body 11.
  • the body 11 is electrically conductive ceramic like a cermet.
  • a cermet is a material formed by a mixture of ceramic and metal. It may, for example, comprise TiC, SiN or ZrC to form all or part of the body 11.
  • the body 11 may also be of a material that is not electrically conductive.
  • the decoration 13 further comprises at least one electrically conductive layer of substantially 50 nm between the body 11 and the galvanic deposit 16.
  • the body 11 can then be formed for example of ceramic or zirconia for its mechanical properties, its polishing ability and, to a lesser extent, its ability to offer a wide range of hues.
  • the body 11 can be formed from an electrically conductive material or not. Therefore, the body 11 can be obtained from a wide variety of materials.
  • the recess 12 preferably comprises a depth of between 80 ⁇ m and 200 ⁇ m.
  • each recess 12 has a continuous surface at least partially radiated, that is to say that their inner surface has no edges.
  • the inlaid element 10 further comprises a device for anchoring said at least one metallic decoration 13 communicating with said at least one recess 12 in order to improve the anchoring of said at least one decoration 13 against said element 10.
  • the anchoring device comprises at least one hole 14 passing through said element 10 and being at least partially filled by said galvanic deposit 16 and, optionally, said at least one electrically conductive layer 15 in order to increase the contact surface with said element .
  • the diameter of the hole 14 can flare as it moves away from said at least one recess 12 in order to maintain said galvanic deposit 16 and, optionally, said at least one layer 15 electrically conductive, against said element 10.
  • the hole 14 is substantially conical, the diameter of the hole 14 opening into the recess 12 being smaller than the remainder of the hole 14, the decorations 13 can no longer be removed .
  • the galvanic deposit 16 can also completely fill the said at least one hole 14 in order to maximize the area of contact with the body 18, 18 'of the element.
  • the thickness of the body 18, 18 ' is substantially equal to or less than four times the depth of the recesses 12 such as for example a dial 5 of a timepiece.
  • the body 18 comprises at least one recess 12 communicating with at least one hole 14 which opens on the face P opposite to the face F intended to receive said at least one recess 12. It is therefore clear that the body 18 is hollowed from side to side. go.
  • the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18. It is therefore understood that the galvanic deposit 16 protrudes with respect to said opposite face P.
  • the body 18 ' has at least one recess 12 communicating with at least one hole 14 which opens on a recess 20 of the face P opposite to the face F for receiving said at least one recess 12. It is therefore understood that the body 18 is dug through.
  • the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18 '. It is therefore understood that the galvanic deposit 16 is intended to remain only in the recess 20, that is to say not to project relative to said opposite face P.
  • a layer for improving the gripping force of the future decoration 13 on the body 11 may be used.
  • a layer for example of substantially 50 nm, can be deposited between the galvanic deposit 16 and, optionally, the layer Electrically conductive, and the body 11, 18, 18 '.
  • materials such as, for example, Cr, Cr 2 N, TiN, TiW, Ni, NiP, Cu, Ti or Zr.
  • the galvanic plating 16 and, optionally, said at least one electrically conductive layer 15 may also be formed from a wide variety of materials.
  • the electrically conductive layer 15 is chosen for its adhesion capacity and its good electrical conductivity necessary for electroforming.
  • the visual rendering of each decoration 13 is mainly obtained by the color of the galvanic deposit 16. Therefore, the material used for the galvanic deposition 16 will preferably be guided by its hue or more generally its aesthetic rendering.
  • the metallic galvanic deposit 16 and, incidentally, the layer 15 comprise gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.
  • the decorations 13 can be formed with the same metal to provide an appearance homogeneous or with several different metals to, for example, give a different hue between two decorations as a hue for the indexes and another for alphanumeric characters in the case of the figure 1 .
  • decorations 13 of the same material as that surrounding the body 11, 18, 18 ' could thus, in an exemplary embodiment of the figure 1 , having decorations 13 of bezel 4 of the same material as the case 2, the bracelet 3, the rest of the telescope 4, the dial 5, the pushers 7 and / or the crown 8.
  • the element 10 inlaid may, according to the invention, also provide an optional substantially transparent layer to protect the decorations 13 of aging.
  • a layer may, for example, comprise silicon nitride which makes it possible in particular to combat the tarnishing of the galvanic deposit 16 and, possibly, of said at least one electrically conductive layer 15, especially when these are mainly formed of silver. .
  • the manufacturing method 21 of an inlaid element 10 will now be explained from the Figures 2 to 9 with the example of a body 11 electrically non-conductive ceramic.
  • the body 11 may be made from a material other than electrically non-conductive ceramic as explained above.
  • a first step 22 illustrated in the figure 9 the method 21 consists in forming the body 11, for example made of zirconia.
  • the final body 11 of step 22 is preferably obtained by sintering, that is to say from a preformed green body 17 using an injection process.
  • the body 11 visible to the figure 4 has its final dimensions.
  • the method 21 comprises a second step 23 intended to etch at least one blind recess 12 in a face F of the ceramic body 11, the recesses 12 forming the imprint of the future decorations 13 as visible at Figures 2 and 5 .
  • each recess 12 has a depth of between 80 and 200 ⁇ m.
  • each recess 12 has a continuous surface at least partially radiated to facilitate the setting implementation of the electroforming step 26 explained below.
  • Step 23 is preferably obtained by destructive radiation using a laser to obtain a good accuracy of the etchings.
  • the method 21 continues in a third step 24 for engraving at least one hole 14 communicating with each recess 12 to form an anchoring device.
  • a third step 24 for engraving at least one hole 14 communicating with each recess 12 to form an anchoring device.
  • one or more holes 14 are made for each recess 12.
  • the step 24 is preferably obtained by destructive radiation by means of a laser to obtain a good accuracy of the engravings.
  • each one hole 14 passes through the body 11 of the element 10 so that it can be at least partially filled during the step 26 by the metal material 16 and, optionally, during the steps 25 and 25 ' by said at least one electrically conductive layer to increase the area of contact with said element.
  • the electrolyte can thus flow "in front of” and “behind” the recess 12, that is to say that it can be deposited in each recess 12 and in each hole 14 at any time of the electroforming step 26.
  • each hole 14 becomes smaller as it moves away from said at least one recess 12 in order to block the future metal material 16 and, possibly, said at least one electrically conductive layer 15 against the element 10.
  • each hole 14 may thus comprise a diameter substantially equal to 100 ⁇ m at the bottom of the recess 12 and finish with a diameter substantially equal to 120 ⁇ m or more at the opposite face P of the body 11.
  • step 24 is, advantageously according to the invention, carried out by orienting the laser beam from the opposite face P in order to directly form said at least one hole 14 in a conical manner, that is to say in which the largest diameter is at the junction with the opposite P face.
  • step 24 continues with step 25 'of the method 21 of depositing at least one electrically conductive layer of substantially 50 nm on the entire face F having said at least one recess 12 and said at least one hole 14.
  • the step 25 ' can be carried out wet, such as for example a chemical autocatalysis (also known as "electroless") or dry, such as a physical vapor deposition.
  • the method 21 continues with step 26.
  • such a layer 15 may, for example, be gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.
  • step 24 continues with step 25 of the method 21 of depositing an intermediate layer as explained above.
  • the intermediate layer is then preferably carried out by the dry route, such as, for example, by physical vapor deposition.
  • the method 21 continues, either with step 25 'of the first embodiment before going to step 26, or directly with step 26. .
  • step 24 continues directly with step 26.
  • This embodiment relates to the first variant which preferably uses an electrically conductive ceramic as a material for the body 11.
  • Step 26 consists in depositing galvanically a metal material 16 from the face F of the body 11 and, possibly, the conductive layer 15, in order to completely fill each recess 12 and at least partially each hole 14 as visible in FIG. figure 7 . Moreover, as explained in the two alternatives of anchoring device Figures 10 and 11 during step 26, the metal deposit 16 can completely fill said at least one hole 14. Finally, during this same step 26, the metal deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposed to that communicating with said at least one recess 12 in order to block any displacement of at least one decor 13 relative to the body 18, 18 '.
  • the holes 14 and, optionally, the recesses 20 is forced by agitation, that is to say the installation of a forced displacement of the fluids of the electroplating bath, in order to avoid problems of filling the recesses 12, the holes 14 and, possibly, the recesses 20.
  • the metallic material deposited during step 26 comprises gold and / or copper and / or silver and / or silver. indium and / or platinum and / or palladium and / or nickel.
  • a sixth step 27 the process 21 ends by removing any deposit 16 and, possibly 15, the surface F of the body 11, 18, 18 'so as to leave only at the level of each recess 12 and holes 14 as visible to the figure 8 , 10 or 11 .
  • the element 10 inlaid is thus completed and possibly has only to be mounted on a final part.
  • This step 27 can be achieved by a conventional surfacing method such as grinding or lapping to remove excess material followed by polishing.
  • the method 21 according to the invention may also provide a last optional step intended to deposit a layer substantially transparent to protect the decorations 13 of aging.
  • a layer may, for example, comprise silicon nitride making it possible, in particular, to combat the tarnishing of the metallic material 16 and, possibly, of said at least one electrically conductive layer, especially when these are mainly formed on the basis of money.
  • the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art.
  • the application of the element 10 inlaid according to the invention can not be limited to a timepiece 1.
  • the element 10 inlaid could, for example, be applied to a jewelry item or jewelery or the arts of the table.
  • step 23 could be interchanged with that of the holes 14 of step 24 without reducing the advantages of the invention. It is also conceivable to substitute the laser etching of step 23 and / or step 24 by another type of etching if its accuracy and its scrap rate is acceptable.
  • step 25 or step 25 ' is not limited to chemical autocatalysis or physical vapor deposition but may alternatively be performed, for example, by chemical vapor deposition. , atomic layer deposition or ion bombardment.

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Adornments (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The element (10) has main structure (11) that is provided with recess for forming decorative pattern cavity (13). The recess is entirely filled by galvanic deposition, so as to form element structure. The fixing device is provided for fixedly securing metallic decoration of element structure. The hole of element structure is communicated with recess and is partially filled with galvanic deposition. Independent claims are included for the following: (1) a timepiece; and (2) a method for fabricating element.

Description

Domaine de l'inventionField of the invention

L'invention se rapporte à un élément incrusté d'au moins un décor métallique et plus précisément un tel élément comportant un dispositif d'ancrage dudit au moins un décor métallique.The invention relates to an encrusted element of at least one metallic decoration and more specifically to such an element comprising a device for anchoring said at least one metallic decoration.

Arrière-plan de l'inventionBackground of the invention

Il est connu de former des lunettes de montre au moins partiellement en saphir synthétique pour montrer, par transparence, un dépôt effectué dans un creux sous la lunette formant par exemple une graduation ou une dénomination commerciale. Cette configuration à l'avantage de protéger le dépôt de toute dégradation mécanique par recouvrement total de la partie en saphir. Cependant, cette configuration peut rendre difficile la lecture du décor par la transmission altérée de la coloration du dépôt mais également par le manque de différence de la teinte du saphir par rapport à celle du dépôt.It is known to form spectacles at least partially synthetic sapphire to show, by transparency, a deposit made in a hollow under the bezel forming for example a graduation or trade name. This configuration has the advantage of protecting the deposit from any mechanical degradation by total recovery of the sapphire part. However, this configuration can make it difficult to read the decoration by the altered transmission of the coloration of the deposit but also by the lack of difference in the hue of the sapphire with respect to that of the deposit.

Résumé de l'inventionSummary of the invention

Le but de la présente invention est de pallier tout ou partie les inconvénients cités précédemment en gardant l'avantage de la résistance mécanique et en apportant celui d'une qualité visuelle améliorée.The object of the present invention is to overcome all or part of the aforementioned drawbacks while keeping the advantage of mechanical strength and bringing that of an improved visual quality.

A cet effet, l'invention se rapporte à un élément comportant un corps comprenant au moins un évidement formant l'empreinte d'un décor, ledit au moins un évidement étant entièrement rempli par un dépôt galvanique afin de former un élément incrusté d'au moins un décor métallique à la qualité visuelle améliorée caractérisé en ce qu'il comporte un dispositif d'ancrage dudit au moins un décor métallique communiquant avec ledit au moins un évidement afin d'améliorer l'ancrage dudit au moins un décor contre ledit élément.For this purpose, the invention relates to an element comprising a body comprising at least one recess forming the imprint of a decoration, said at least one recess being completely filled by a galvanic deposit to form an inlay element. less a metal decoration with improved visual quality characterized in that it comprises a device for anchoring said at least one metallic decoration communicating with said at least one recess to improve the anchoring of said at least one decor against said element.

Avantageusement selon l'invention, les décors sont ainsi beaucoup plus résistants à l'arrachement sans qu'ils soient modifiés esthétiquement.Advantageously according to the invention, the decorations are thus much more resistant to tearing without being aesthetically modified.

Conformément à d'autres caractéristiques avantageuses de l'invention :

  • le dispositif d'ancrage comporte au moins un trou traversant ledit élément et étant au moins partiellement rempli dudit dépôt galvanique afin d'augmenter la surface de contact avec ledit élément ;
  • le diamètre dudit au moins un trou s'évase au fur et à mesure qu'il s'éloigne dudit au moins un évidement afin de maintenir ledit dépôt galvanique contre ledit élément ;
  • le dépôt galvanique rempli complètement ledit au moins un trou ;
  • le dépôt galvanique recouvre l'épaulement de l'extrémité dudit au moins un trou qui est opposée à celle communiquant avec ledit au moins un évidement afin de bloquer tout déplacement dudit au moins un décor par rapport au corps ;
  • le dépôt galvanique métallique comporte de l'or et/ou du cuivre et/ou de l'argent et/ou de l'indium et/ou du platine et/ou du palladium et/ou du nickel ;
  • chaque au moins un évidement comporte une profondeur comprise entre 80 µm et 200 µm afin d'améliorer la force d'accrochage ;
  • le corps est en céramique électriquement conductrice telle qu'un cermet ;
  • le corps est électriquement non conducteur comme à base de zircone et le décor comporte en outre au moins une couche électriquement conductrice de sensiblement 50 nm entre le corps et le dépôt galvanique.
According to other advantageous features of the invention:
  • the anchoring device comprises at least one hole passing through said element and being at least partially filled with said galvanic deposit in order to increase the area of contact with said element;
  • the diameter of said at least one hole fades as it moves away from said at least one recess to maintain said galvanic deposit against said element;
  • the galvanic deposit completely filled said at least one hole;
  • the galvanic deposition covers the shoulder of the end of said at least one hole which is opposite to that communicating with said at least one recess in order to block any displacement of said at least one decor relative to the body;
  • the metallic galvanic deposit comprises gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel;
  • each at least one recess has a depth of between 80 μm and 200 μm in order to improve the gripping force;
  • the body is electrically conductive ceramic such as a cermet;
  • the body is electrically nonconductive as zirconia based and the decor further comprises at least one electrically conductive layer of substantially 50 nm between the body and the galvanic deposit.

De plus, l'invention se rapporte à une partie de l'habillage d'une pièce d'horlogerie ou plus généralement à une pièce d'horlogerie ou à un article de bijouterie ou de joaillerie caractérisé en ce qu'il comporte au moins un élément conforme à l'une des variantes précédentes.In addition, the invention relates to a part of the cladding of a timepiece or more generally to a timepiece or a article of jewelery, characterized in that it comprises at least one element according to one of the preceding variants.

Enfin, l'invention se rapporte à un procédé de fabrication d'un élément comportant les étapes suivantes :

  1. a) former un corps ;
  2. b) graver au moins un évidement dans une face du corps, chaque au moins un évidement formant l'empreinte d'un décor ;
  3. c) graver au moins un trou communiquant avec ledit au moins un évidement afin de former un dispositif d'ancrage ;
  4. d) déposer galvaniquement un matériau métallique afin de remplir complètement ledit au moins un évidement et au moins partiellement ledit au moins un trou ;
  5. e) retirer tout dépôt de la surface du corps afin de n'en laisser que dans le creux dudit au moins un évidement et dudit au moins un trou.
Finally, the invention relates to a method of manufacturing an element comprising the following steps:
  1. a) to form a body;
  2. b) etching at least one recess in one face of the body, each at least one recess forming the imprint of a decor;
  3. c) etching at least one hole communicating with said at least one recess to form an anchoring device;
  4. d) galvanically depositing a metallic material to completely fill said at least one recess and at least partially said at least one hole;
  5. e) removing any deposit from the surface of the body to leave only in the hollow of said at least one recess and said at least one hole.

Avantageusement selon l'invention, les décors sont fabriqués dans une grande profondeur de l'élément ce qui les rend ainsi beaucoup plus résistants à l'arrachement sans qu'ils soient modifiés esthétiquement.Advantageously according to the invention, the decorations are manufactured in a great depth of the element which makes them much more resistant to tearing without aesthetically modified.

Conformément à d'autres caractéristiques avantageuses de l'invention :

  • ledit au moins un trou traverse ledit élément afin qu'il puisse être au moins partiellement rempli lors de l'étape d) par le matériau métallique afin d'augmenter la surface de contact avec ledit élément ;
  • le diamètre dudit au moins un trou s'évase au fur et à mesure qu'il s'éloigne dudit au moins un évidement afin de maintenir ledit dépôt galvanique contre ledit élément ;
  • lors de l'étape d), le dépôt métallique rempli complètement ledit au moins un trou ;
  • lors de l'étape d), le dépôt métallique recouvre l'épaulement de l'extrémité dudit au moins un trou qui est opposée à celle communiquant avec ledit au moins un évidement afin de bloquer tout déplacement d'au moins un décor par rapport au corps ;
    • le corps est en céramique électriquement conductrice ;
    • le corps est en céramique électriquement non conductrice et en ce que le procédé comporte en outre, entre l'étape c) et l'étape d), l'étape f) : déposer au moins une couche électriquement conductrice de sensiblement 50 nm sur l'ensemble de la face comportant ledit au moins un évidement et ledit trou ;
    • l'étape f) est réalisée par autocatalyse chimique ou par dépôt physique en phase vapeur ;
    • l'étape a) est réalisée par frittage ;
    • l'étape b) est réalisée par laser sur une profondeur comprise entre 80 µm et 200 µm afin d'améliorer la force d'accrochage ;
    • l'étape c) est réalisée par laser en orientant le faisceau à partir de la face opposée à celle destinée à recevoir ledit au moins un évidement ;
    • les étapes b) et c) sont interverties ;
    • chaque au moins un évidement comporte une surface continue au moins partiellement rayonnée afin de faciliter la mise en oeuvre de l'étape d).
According to other advantageous features of the invention:
  • said at least one hole passes through said element so that it can be at least partially filled in step d) by the metallic material to increase the contact area with said element;
  • the diameter of said at least one hole fades as it moves away from said at least one recess to maintain said galvanic deposit against said element;
  • during step d), the metal deposit completely fills said at least one hole;
  • during step d), the metal deposit covers the shoulder of the end of said at least one hole which is opposite to that communicating with said at least one recess to block movement of at least one decor relative to the body;
    • the body is electrically conductive ceramic;
    • the body is made of electrically non-conductive ceramic and in that the method further comprises, between step c) and step d), step f): depositing at least one electrically conductive layer of substantially 50 nm on the set of the face comprising said at least one recess and said hole;
    • step f) is carried out by chemical autocatalysis or by physical vapor deposition;
    • step a) is carried out by sintering;
    • step b) is performed by laser on a depth of between 80 μm and 200 μm in order to improve the gripping force;
    • step c) is performed by laser directing the beam from the face opposite to that intended to receive said at least one recess;
    • steps b) and c) are interchanged;
    • each at least one recess comprises a continuous surface at least partially radiated to facilitate the implementation of step d).

Description sommaire des dessinsBrief description of the drawings

D'autres particularités et avantages ressortiront clairement de la description qui en est faite ci-après, à titre indicatif et nullement limitatif, en référence aux dessins annexés, dans lesquels :

  • la figure 1 est une représentation d'une pièce d'horlogerie selon l'invention ;
  • la figure 2 est une vue de dessus d'un élément céramique avant son incrustation selon l'invention ;
  • les figures 3 à 8 sont des étapes successives du procédé de fabrication selon l'invention ;
  • la figure 9 est un schéma fonctionnel du procédé selon l'invention ;
  • les figures 10 et 11 sont des alternatives de dispositif d'ancrage selon l'invention.
Other particularities and advantages will emerge clearly from the description which is given hereinafter, by way of indication and in no way limiting, with reference to the appended drawings, in which:
  • the figure 1 is a representation of a timepiece according to the invention;
  • the figure 2 is a top view of a ceramic element before its inlay according to the invention;
  • the Figures 3 to 8 are successive stages of the manufacturing process according to the invention;
  • the figure 9 is a block diagram of the process according to the invention;
  • the Figures 10 and 11 are alternatives of anchoring device according to the invention.

Description détaillée des modes de réalisation préférésDetailed Description of the Preferred Embodiments

Dans l'exemple illustré à la figure 1, on peut voir une pièce d'horlogerie généralement annotée 1 comportant au moins un élément 10 incrusté. Chaque élément 10 incrusté est destiné à former une pièce très résistante à l'usure comportant au moins un décor 13 métallique dont la qualité visuelle est améliorée notamment en termes de contraste.In the example shown in figure 1 , one can see a timepiece generally annotated 1 having at least one element 10 encrusted. Each element 10 inlaid is intended to form a very wear-resistant part comprising at least a metal decoration 13 whose visual quality is improved in particular in terms of contrast.

L'élément 10 incrusté selon l'invention peut notamment former indifféremment tout ou partie de l'habillage de la pièce d'horlogerie 1. Ainsi, il pourrait former tout ou partie d'un boîtier 2, d'un bracelet 3, d'une lunette 4, d'un cadran 5, d'une glace 6, d'un poussoir 7 et/ou d'une couronne 8. Dans l'exemple illustré ci-après, l'explication de l'invention sera donnée à partir d'un anneau 10 comportant des décors 13 incrustés formant les graduations d'une lunette 4. Il est également possible de former des éléments 10 incrustés appartenant à un mouvement horloger comme, par exemple, un pont et/ou une platine et/ou une masse oscillante.The element 10 inlaid according to the invention can in particular form all or part of the cladding of the timepiece 1. Thus, it could form all or part of a housing 2, a bracelet 3, a bezel 4, a dial 5, an ice cream 6, a pusher 7 and / or a crown 8. In the example illustrated below, the explanation of the invention will be given from a ring 10 having inlaid decorations 13 forming the graduations of a telescope 4. It is also possible to form inlaid elements 10 belonging to a watchmaking movement such as, for example, a bridge and / or a plate and / or a oscillating weight.

Comme illustré aux figures 1, 2 et 8, l'élément céramique incrusté 10 comporte un corps 11 comportant au moins un évidement 12 formant l'empreinte d'un décor 13. A la figure 1, on peut voir que chaque décor 13 peut, avantageusement selon l'invention, être de forme quelconque, comme, par exemple, une figure géométrique ou un caractère alphanumérique. Selon l'invention, chaque évidement 12 est entièrement rempli par un dépôt 16 galvanique formé par un matériau métallique. Cette configuration permet de protéger chaque décor 13 dans le corps 11.As illustrated in figures 1 , 2 and 8 the inlaid ceramic element 10 comprises a body 11 comprising at least one recess 12 forming the impression of a decoration 13. At the figure 1 it can be seen that each decoration 13 may, advantageously according to the invention, be of any shape, such as, for example, a geometric figure or an alphanumeric character. According to the invention, each recess 12 is completely filled by a galvanic deposit 16 formed by a metallic material. This configuration makes it possible to protect each decoration 13 in the body 11.

Selon une première variante préférée, le corps 11 est en céramique électriquement conductrice comme un cermet. Un cermet est un matériau formé par un mélange de céramique et de métal. Il peut, à titre d'exemple, comporter du TiC, du SiN ou du ZrC pour former tout ou partie du corps 11.According to a first preferred variant, the body 11 is electrically conductive ceramic like a cermet. A cermet is a material formed by a mixture of ceramic and metal. It may, for example, comprise TiC, SiN or ZrC to form all or part of the body 11.

Toutefois, selon une deuxième variante, le corps 11 peut également être en un matériau qui n'est pas électriquement conducteur. Dans un tel cas, le décor 13 comporte en outre au moins une couche 15 électriquement conductrice de sensiblement 50 nm entre le corps 11 et le dépôt galvanique 16. Le corps 11 peut alors être formée par exemple en céramique comme à base de zircone pour ses propriétés mécaniques, sa capacité de polissage et, dans une moindre mesure, pour sa capacité à offrir une large palette de teintes.However, according to a second variant, the body 11 may also be of a material that is not electrically conductive. In such a case, the decoration 13 further comprises at least one electrically conductive layer of substantially 50 nm between the body 11 and the galvanic deposit 16. The body 11 can then be formed for example of ceramic or zirconia for its mechanical properties, its polishing ability and, to a lesser extent, its ability to offer a wide range of hues.

On comprend donc selon l'invention que le corps 11 peut être formé à partir d'un matériau électriquement conducteur ou non. Par conséquent, le corps 11 peut être obtenu à partir d'une grande variété de matériaux.It is thus understood according to the invention that the body 11 can be formed from an electrically conductive material or not. Therefore, the body 11 can be obtained from a wide variety of materials.

Afin d'améliorer l'accrochage du décor 13 dans le corps 11, l'évidement 12 comporte, de manière préférée, une profondeur comprise entre 80 µm et 200 µm.In order to improve the attachment of the decoration 13 in the body 11, the recess 12 preferably comprises a depth of between 80 μm and 200 μm.

De plus, pour des raisons d'adhérence du dépôt galvanique, préférentiellement, chaque évidement 12 comporte une surface continue au moins partiellement rayonnée, c'est-à-dire que leur surface interne ne comporte pas d'arêtes.In addition, for reasons of adhesion of the galvanic deposit, preferably, each recess 12 has a continuous surface at least partially radiated, that is to say that their inner surface has no edges.

Enfin, l'élément 10 incrusté comporte en outre un dispositif d'ancrage dudit au moins un décor 13 métallique communiquant avec ledit au moins un évidement 12 afin d'améliorer l'ancrage dudit au moins un décor 13 contre ledit élément 10. Préférentiellement, le dispositif d'ancrage comporte au moins un trou 14 traversant ledit élément 10 et étant au moins partiellement rempli par ledit dépôt 16 galvanique et, éventuellement, de ladite au moins une couche 15 électriquement conductrice afin d'augmenter la surface de contact avec ledit élément.Finally, the inlaid element 10 further comprises a device for anchoring said at least one metallic decoration 13 communicating with said at least one recess 12 in order to improve the anchoring of said at least one decoration 13 against said element 10. Preferably, the anchoring device comprises at least one hole 14 passing through said element 10 and being at least partially filled by said galvanic deposit 16 and, optionally, said at least one electrically conductive layer 15 in order to increase the contact surface with said element .

Dans l'exemple illustré à la figure 8, il est également visible que le diamètre du trou 14 peut s'évaser au fur et à mesure qu'il s'éloigne dudit au moins un évidement 12 afin de maintenir ledit dépôt 16 galvanique et, éventuellement, de ladite au moins une couche 15 électriquement conductrice, contre ledit élément 10. En effet, dans ce cas où le trou 14 est sensiblement conique, le diamètre du trou 14 débouchant dans l'évidement 12 étant plus petit que le reste du trou 14, les décors 13 ne peuvent plus être retirés.In the example shown in figure 8 , it is also visible that the diameter of the hole 14 can flare as it moves away from said at least one recess 12 in order to maintain said galvanic deposit 16 and, optionally, said at least one layer 15 electrically conductive, against said element 10. Indeed, in this case where the hole 14 is substantially conical, the diameter of the hole 14 opening into the recess 12 being smaller than the remainder of the hole 14, the decorations 13 can no longer be removed .

Selon des alternatives de dispositif d'ancrage visibles aux figures 10 et 11, le dépôt galvanique 16 peut également remplir complètement ledit au moins un trou 14 afin de maximiser la surface de contact avec le corps 18, 18' de l'élément. Ces deux alternatives sont notamment possibles quand l'épaisseur du corps 18, 18' est sensiblement égale ou inférieure à quatre fois la profondeur des évidements 12 comme par exemple un cadran 5 de pièce d'horlogerie.According to alternatives of anchoring device visible to Figures 10 and 11 , the galvanic deposit 16 can also completely fill the said at least one hole 14 in order to maximize the area of contact with the body 18, 18 'of the element. These two alternatives are possible in particular when the thickness of the body 18, 18 'is substantially equal to or less than four times the depth of the recesses 12 such as for example a dial 5 of a timepiece.

Selon une première alternative illustrée à la figure 10, le corps 18 comporte au moins un évidement 12 communiquant avec au moins un trou 14 qui débouche sur la face P opposée à la face F destinée à recevoir ledit au moins un évidement 12. On comprend donc que le corps 18 est creusé de part en part. De plus, préférentiellement, le dépôt galvanique 16 recouvre l'épaulement 19 de l'extrémité dudit au moins un trou 14 qui est opposée à celle communiquant avec ledit au moins un évidement 12 afin de bloquer tout déplacement dudit au moins un décor 13 par rapport au corps 18. On comprend donc que le dépôt galvanique 16 fait saillie par rapport à ladite face P opposée.According to a first alternative illustrated in figure 10 , the body 18 comprises at least one recess 12 communicating with at least one hole 14 which opens on the face P opposite to the face F intended to receive said at least one recess 12. It is therefore clear that the body 18 is hollowed from side to side. go. In addition, preferably, the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18. It is therefore understood that the galvanic deposit 16 protrudes with respect to said opposite face P.

Selon une deuxième alternative illustrée à la figure 11, le corps 18' comporte au moins un évidement 12 communiquant avec au moins un trou 14 qui débouche sur une creusure 20 de la face P opposée à la face F destinée à recevoir ledit au moins un évidement 12. On comprend donc que le corps 18' est creusé de part en part. De plus, préférentiellement, le dépôt galvanique 16 recouvre l'épaulement 19 de l'extrémité dudit au moins un trou 14 qui est opposée à celle communiquant avec ledit au moins un évidement 12 afin de bloquer tout déplacement dudit au moins un décor 13 par rapport au corps 18'. On comprend donc que le dépôt galvanique 16 est destiné à rester uniquement dans la creusure 20, c'est-à-dire ne pas faire saillie par rapport à ladite face P opposée.According to a second alternative illustrated in figure 11 , the body 18 'has at least one recess 12 communicating with at least one hole 14 which opens on a recess 20 of the face P opposite to the face F for receiving said at least one recess 12. It is therefore understood that the body 18 is dug through. In addition, preferably, the galvanic deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposite to that communicating with said at least one recess 12 in order to block any displacement of said at least one decor 13 relative to to the body 18 '. It is therefore understood that the galvanic deposit 16 is intended to remain only in the recess 20, that is to say not to project relative to said opposite face P.

Optionnellement, une couche destinée à améliorer la force d'accrochage du futur décor 13 sur le corps 11 peut être utilisée. En effet, même si la microrugosité du fond de l'évidement 12 et le dispositif d'ancrage contribuent à l'adhérence, une couche, par exemple de sensiblement 50 nm, peut être déposée entre le dépôt galvanique 16 et, éventuellement, la couche 15 électriquement conductrice, et le corps 11, 18, 18'. Suivant le mode de dépôt de la couche intermédiaire, il peut être envisagé plusieurs types de matériaux, comme, par exemple, du type Cr, Cr2N, TiN, TiW, Ni, NiP, Cu, Ti ou Zr.Optionally, a layer for improving the gripping force of the future decoration 13 on the body 11 may be used. Indeed, even if the microroughness of the bottom of the recess 12 and the anchoring device contribute to the adhesion, a layer, for example of substantially 50 nm, can be deposited between the galvanic deposit 16 and, optionally, the layer Electrically conductive, and the body 11, 18, 18 '. Depending on the deposition mode of the intermediate layer, it is possible to envisage several types of materials, such as, for example, Cr, Cr 2 N, TiN, TiW, Ni, NiP, Cu, Ti or Zr.

Le dépôt galvanique 16 et, éventuellement, de ladite au moins une couche 15 électriquement conductrice peuvent également être formés à partir d'une large variété de matériaux. Préférentiellement pour la deuxième variante, la couche 15 électriquement conductrice est choisie pour sa capacité d'adhérence et sa bonne conductivité électrique nécessaire à l'électroformage.The galvanic plating 16 and, optionally, said at least one electrically conductive layer 15 may also be formed from a wide variety of materials. Preferentially for the second variant, the electrically conductive layer 15 is chosen for its adhesion capacity and its good electrical conductivity necessary for electroforming.

De plus, selon l'invention, le rendu visuel de chaque décor 13 est principalement obtenu par la teinte du dépôt galvanique 16. Par conséquent, le matériau utilisé pour le dépôt galvanique 16 sera préférentiellement guidé par sa teinte ou plus globalement son rendu esthétique. A ce titre, le dépôt galvanique métallique 16 et, incidemment, la couche 15 comportent de l'or et/ou du cuivre et/ou de l'argent et/ou de l'indium et/ou du platine et/ou du palladium et/ou du nickel.In addition, according to the invention, the visual rendering of each decoration 13 is mainly obtained by the color of the galvanic deposit 16. Therefore, the material used for the galvanic deposition 16 will preferably be guided by its hue or more generally its aesthetic rendering. In this respect, the metallic galvanic deposit 16 and, incidentally, the layer 15 comprise gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.

A titre d'exemple, il est ainsi possible d'obtenir un rendu visuel complexe en donnant un aspect brillant au corps 11 et un aspect satiné aux décors 13. De plus, les décors 13 peuvent être formés avec le même métal pour offrir un aspect homogène ou avec plusieurs métaux différents pour, par exemple, donner une teinte différente entre deux décors comme une teinte pour les index et une autre pour les caractères alphanumériques dans la cas de la figure 1.By way of example, it is thus possible to obtain a complex visual rendering by giving a shiny appearance to the body 11 and a satin appearance to the decorations 13. Moreover, the decorations 13 can be formed with the same metal to provide an appearance homogeneous or with several different metals to, for example, give a different hue between two decorations as a hue for the indexes and another for alphanumeric characters in the case of the figure 1 .

Il est également envisageable, afin d'uniformiser les teintes, de former des décors 13 du même matériau que celui qui entoure le corps 11, 18, 18'. On pourrait ainsi, dans un exemple de réalisation de la figure 1, avoir des décors 13 de lunette 4 du même matériau que le boîtier 2, le bracelet 3, le reste de la lunette 4, le cadran 5, les poussoirs 7 et/ou la couronne 8.It is also conceivable, in order to standardize the hues, to form decorations 13 of the same material as that surrounding the body 11, 18, 18 '. We could thus, in an exemplary embodiment of the figure 1 , having decorations 13 of bezel 4 of the same material as the case 2, the bracelet 3, the rest of the telescope 4, the dial 5, the pushers 7 and / or the crown 8.

Enfin, optionnellement, l'élément 10 incrusté peut, selon l'invention, également prévoir une couche optionnelle sensiblement transparente afin de protéger les décors 13 du vieillissement. Une telle couche peut, par exemple, comporter du nitrure de silicium permettant notamment de lutter contre le ternissement du dépôt galvanique 16et, éventuellement, de ladite au moins une couche 15 électriquement conductrice, surtout lorsque ceux-ci sont formés principalement à base d'argent.Finally, optionally, the element 10 inlaid may, according to the invention, also provide an optional substantially transparent layer to protect the decorations 13 of aging. Such a layer may, for example, comprise silicon nitride which makes it possible in particular to combat the tarnishing of the galvanic deposit 16 and, possibly, of said at least one electrically conductive layer 15, especially when these are mainly formed of silver. .

Le procédé de fabrication 21 d'un élément 10 incrusté va maintenant être expliqué à partir des figures 2 à 9 avec l'exemple d'un corps 11 en céramique électriquement non conductrice. Bien entendu, le corps 11 peut être fabriqué à partir d'un autre matériau que de la céramique électriquement non conductrice comme expliqué ci-dessus.The manufacturing method 21 of an inlaid element 10 will now be explained from the Figures 2 to 9 with the example of a body 11 electrically non-conductive ceramic. Of course, the body 11 may be made from a material other than electrically non-conductive ceramic as explained above.

Dans une première étape 22 illustrée à la figure 9, le procédé 21 consiste à former le corps 11 comme par exemple en zircone. Comme le montre partiellement le passage de la figure 3 à la figure 4, le corps final 11 de l'étape 22 est obtenu préférentiellement par frittage, c'est-à-dire à partir d'un corps vert 17 préformé à l'aide d'un processus d'injection. A la fin de l'étape 22, le corps 11 visible à la figure 4 comporte ses dimensions finales.In a first step 22 illustrated in the figure 9 the method 21 consists in forming the body 11, for example made of zirconia. As partially shown by the passage of the figure 3 to the figure 4 , the final body 11 of step 22 is preferably obtained by sintering, that is to say from a preformed green body 17 using an injection process. At the end of step 22, the body 11 visible to the figure 4 has its final dimensions.

Comme illustré à la figure 9, le procédé 21 comporte une deuxième étape 23 destinée à graver au moins un évidement 12 borgne dans une face F du corps 11 en céramique, les évidements 12 formant l'empreinte des futurs décors 13 comme visible aux figures 2 et 5. Préférentiellement, chaque évidement 12 comporte une profondeur comprise entre 80 et 200 µm. De plus, de manière préférée, chaque évidement 12 comporte une surface continue au moins partiellement rayonnée afin de faciliter la mise en oeuvre de l'étape 26 d'électroformage expliquée ci-dessous. L'étape 23 est préférentiellement obtenue par un rayonnement destructif au moyen d'un laser permettant d'obtenir une bonne précision des gravures.As illustrated in figure 9 the method 21 comprises a second step 23 intended to etch at least one blind recess 12 in a face F of the ceramic body 11, the recesses 12 forming the imprint of the future decorations 13 as visible at Figures 2 and 5 . Preferably, each recess 12 has a depth of between 80 and 200 μm. In addition, preferably, each recess 12 has a continuous surface at least partially radiated to facilitate the setting implementation of the electroforming step 26 explained below. Step 23 is preferably obtained by destructive radiation using a laser to obtain a good accuracy of the etchings.

Comme illustré à la figure 9, le procédé 21 se poursuit selon une troisième étape 24 destinée à graver au moins un trou 14 communiquant avec chaque évidement 12 afin de former un dispositif d'ancrage. Comme visible aux figures 2 et 6, suivant la forme et l'étendue de chaque évidement 12, un ou plusieurs trous 14 sont réalisés pour chaque évidement 12. L'étape 24 est préférentiellement obtenue par un rayonnement destructif au moyen d'un laser permettant d'obtenir une bonne précision des gravures.As illustrated in figure 9 , the method 21 continues in a third step 24 for engraving at least one hole 14 communicating with each recess 12 to form an anchoring device. As visible to Figures 2 and 6 , depending on the shape and extent of each recess 12, one or more holes 14 are made for each recess 12. The step 24 is preferably obtained by destructive radiation by means of a laser to obtain a good accuracy of the engravings.

Selon l'invention, chaque un trou 14 traverse le corps 11 de l'élément 10 afin qu'il puisse être au moins partiellement rempli lors de l'étape 26 par le matériau métallique 16 et, éventuellement, lors des étapes 25 et 25' par ladite au moins une couche 15 électriquement conductrice afin d'augmenter la surface de contact avec ledit élément. En effet, on comprend notamment que l'électrolyte peut ainsi circuler « devant » et « derrière » l'évidement 12, c'est-à-dire qu'il peut être déposé dans chaque évidement 12 et dans chaque trou 14 à tout moment de l'étape 26 d'électroformage.According to the invention, each one hole 14 passes through the body 11 of the element 10 so that it can be at least partially filled during the step 26 by the metal material 16 and, optionally, during the steps 25 and 25 ' by said at least one electrically conductive layer to increase the area of contact with said element. Indeed, it is understood in particular that the electrolyte can thus flow "in front of" and "behind" the recess 12, that is to say that it can be deposited in each recess 12 and in each hole 14 at any time of the electroforming step 26.

Enfin, comme visible à la figure 6, le diamètre de chaque trou 14 s'évase au fur et à mesure qu'il s'éloigne dudit au moins un évidement 12 afin de bloquer le futur matériau 16 métallique et, éventuellement, de ladite au moins une couche 15 électriquement conductrice contre l'élément 10. En effet, comme expliqué ci-dessus, dans ce cas où chaque trou 14 est sensiblement conique, le diamètre du trou 14 débouchant dans l'évidement 12 étant plus petit que le reste du trou 14, les décors 13 ne peuvent plus être retirés. Préférentiellement, chaque trou 14 peut ainsi comporter un diamètre sensiblement égal à 100 µm au niveau du fond de l'évidement 12 et finir avec un diamètre sensiblement égal à 120 µm ou plus au niveau de la face P opposée du corps 11.Finally, as visible at figure 6 , the diameter of each hole 14 becomes smaller as it moves away from said at least one recess 12 in order to block the future metal material 16 and, possibly, said at least one electrically conductive layer 15 against the element 10. Indeed, as explained above, in this case where each hole 14 is substantially conical, the diameter of the hole 14 opening into the recess 12 being smaller than the rest of the hole 14, the decorations 13 can not no longer be removed. Preferably, each hole 14 may thus comprise a diameter substantially equal to 100 μm at the bottom of the recess 12 and finish with a diameter substantially equal to 120 μm or more at the opposite face P of the body 11.

Préférentiellement, l'étape 24 est, avantageusement selon l'invention, réalisée en orientant le faisceau laser à partir de la face P opposée afin de former directement lesdits au moins un trou 14 de manière conique, c'est-à-dire dans lequel le plus grand diamètre est à la jonction avec la face P opposée.Preferably, step 24 is, advantageously according to the invention, carried out by orienting the laser beam from the opposite face P in order to directly form said at least one hole 14 in a conical manner, that is to say in which the largest diameter is at the junction with the opposite P face.

Dans un premier mode de réalisation, visible en trait triple à la figure 9, l'étape 24 se poursuit avec l'étape 25' du procédé 21 consistant à déposer au moins une couche 15 électriquement conductrice de sensiblement 50 nm sur l'ensemble de la face F comportant ledit au moins un évidement 12 et ledit au moins un trou 14. L'étape 25' peut être réalisée par voie humide, comme par exemple une autocatalyse chimique (également connue sous le terme anglais « electroless ») ou par voie sèche, comme par exemple un dépôt physique en phase vapeur. Dans la premier mode de réalisation, à la suite de cette étape 25', le procédé 21 se poursuit avec l'étape 26.In a first embodiment, visible in triple line at the figure 9 , step 24 continues with step 25 'of the method 21 of depositing at least one electrically conductive layer of substantially 50 nm on the entire face F having said at least one recess 12 and said at least one hole 14. The step 25 'can be carried out wet, such as for example a chemical autocatalysis (also known as "electroless") or dry, such as a physical vapor deposition. In the first embodiment, following this step 25 ', the method 21 continues with step 26.

Par conséquent, une telle couche 15 peut, par exemple, être de l'or et/ou du cuivre et/ou de l'argent et/ou de l'indium et/ou du platine et/ou du palladium et/ou du nickel.Therefore, such a layer 15 may, for example, be gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel.

Dans un deuxième mode de réalisation, visible en trait double à la figure 9, l'étape 24 se poursuit avec l'étape 25 du procédé 21 consistant à déposer une couche intermédiaire comme expliqué ci-dessus. La couche intermédiaire est alors de manière préférée réalisée par voie sèche, comme, par exemple, par dépôt physique en phase vapeur. Dans la deuxième mode de réalisation, à la suite de cette étape 25, le procédé 21 se poursuit, soit avec l'étape 25' du premier mode de réalisation avant de passer à l'étape 26, soit directement avec l'étape 26..In a second embodiment, visible in double line at the figure 9 step 24 continues with step 25 of the method 21 of depositing an intermediate layer as explained above. The intermediate layer is then preferably carried out by the dry route, such as, for example, by physical vapor deposition. In the second embodiment, following this step 25, the method 21 continues, either with step 25 'of the first embodiment before going to step 26, or directly with step 26. .

Enfin dans un troisième mode de réalisation, visible en trait simple à la figure 9, l'étape 24 se poursuit directement avec l'étape 26. Ce mode de réalisation concerne la première variante qui utilise préférentiellement une céramique électriquement conductrice comme matériau pour le corps 11.Finally, in a third embodiment, visible in single line at the figure 9 , step 24 continues directly with step 26. This embodiment relates to the first variant which preferably uses an electrically conductive ceramic as a material for the body 11.

L'étape 26 consiste à déposer galvaniquement un matériau métallique 16 à partir de la face F du corps 11 et, éventuellement, de la couche conductrice 15, afin de remplir complètement chaque évidement 12 et au moins partiellement chaque trou 14 comme visible à la figure 7. De plus, comme expliqué dans les deux alternatives de dispositif d'ancrage des figures 10 et 11, lors de l'étape 26, le dépôt métallique 16 peut remplir complètement ledit au moins un trou 14. Enfin, lors de cette même étape 26, le dépôt métallique 16 recouvre l'épaulement 19 de l'extrémité dudit au moins un trou 14 qui est opposée à celle communiquant avec ledit au moins un évidement 12 afin de bloquer tout déplacement d'au moins un décor 13 par rapport au corps 18, 18'.Step 26 consists in depositing galvanically a metal material 16 from the face F of the body 11 and, possibly, the conductive layer 15, in order to completely fill each recess 12 and at least partially each hole 14 as visible in FIG. figure 7 . Moreover, as explained in the two alternatives of anchoring device Figures 10 and 11 during step 26, the metal deposit 16 can completely fill said at least one hole 14. Finally, during this same step 26, the metal deposit 16 covers the shoulder 19 of the end of said at least one hole 14 which is opposed to that communicating with said at least one recess 12 in order to block any displacement of at least one decor 13 relative to the body 18, 18 '.

Afin de faciliter ces remplissages, préférentiellement, un renouvellement de l'électrolyte dans les évidements 12, les trous 14 et, éventuellement, les creusures 20, est forcé par une agitation, c'est-à-dire la mise en place d'un déplacement forcé des fluides du bain galvanique, afin d'éviter des problèmes de remplissage des évidements 12, des trous 14 et, éventuellement, des creusures 20.In order to facilitate these fills, preferably, a renewal of the electrolyte in the recesses 12, the holes 14 and, optionally, the recesses 20, is forced by agitation, that is to say the installation of a forced displacement of the fluids of the electroplating bath, in order to avoid problems of filling the recesses 12, the holes 14 and, possibly, the recesses 20.

Comme expliqué ci-dessus, suivant la teinte ou plus globalement le rendu visuel souhaité, le matériau métallique déposé lors de l'étape 26 comporte de l'or et/ou du cuivre et/ou de l'argent et/ou de l'indium et/ou du platine et/ou du palladium et/ou du nickel.As explained above, depending on the hue or, more generally, on the desired visual rendering, the metallic material deposited during step 26 comprises gold and / or copper and / or silver and / or silver. indium and / or platinum and / or palladium and / or nickel.

Enfin, dans une sixième étape 27, le procédé 21 se termine en retirant tout dépôt 16 et, éventuellement 15, de la surface F du corps 11, 18, 18' afin de n'en laisser qu'au niveau de chaque évidement 12 et des trous 14 comme visible à la figure 8, 10 ou 11. L'élément 10 incrusté est ainsi terminé et n'a, éventuellement, plus qu'à être monté sur une pièce finale. Cette étape 27 peut être obtenue par une méthode de surfaçage habituelle comme un meulage ou un rodage pour enlever le surplus de matière suivit d'un polissage.Finally, in a sixth step 27, the process 21 ends by removing any deposit 16 and, possibly 15, the surface F of the body 11, 18, 18 'so as to leave only at the level of each recess 12 and holes 14 as visible to the figure 8 , 10 or 11 . The element 10 inlaid is thus completed and possibly has only to be mounted on a final part. This step 27 can be achieved by a conventional surfacing method such as grinding or lapping to remove excess material followed by polishing.

Le procédé 21 selon l'invention, peut également prévoir une dernière étape optionnelle destinée à déposer une couche sensiblement transparente afin de protéger les décors 13 du vieillissement. Une telle couche peut, par exemple, comporter du nitrure de silicium permettant notamment de lutter contre le ternissement du matériau métallique 16 et, éventuellement, de ladite au moins une couche 15 électriquement conductrice, surtout lorsque ceux-ci sont formés principalement à base d'argent.The method 21 according to the invention may also provide a last optional step intended to deposit a layer substantially transparent to protect the decorations 13 of aging. Such a layer may, for example, comprise silicon nitride making it possible, in particular, to combat the tarnishing of the metallic material 16 and, possibly, of said at least one electrically conductive layer, especially when these are mainly formed on the basis of money.

Bien entendu, la présente invention ne se limite pas à l'exemple illustré mais est susceptible de diverses variantes et modifications qui apparaîtront à l'homme de l'art. En particulier, l'application de l'élément 10 incrusté selon l'invention ne saurait se limiter à une pièce d'horlogerie 1. Ainsi, l'élément 10 incrusté pourrait, à titre d'exemple, être appliqué à un article de bijouterie ou de joaillerie ou encore aux arts de la table.Of course, the present invention is not limited to the illustrated example but is susceptible of various variations and modifications that will occur to those skilled in the art. In particular, the application of the element 10 inlaid according to the invention can not be limited to a timepiece 1. Thus, the element 10 inlaid could, for example, be applied to a jewelry item or jewelery or the arts of the table.

De plus, la réalisation des évidements 12 lors de l'étape 23 pourrait être intervertie avec celle des trous 14 de l'étape 24 sans diminution des avantages de l'invention. Il est également envisageable de substituer le gravage par laser de l'étape 23 et/ou de l'étape 24 par un autre type de gravage si sa précision et son taux de rebut est acceptable.In addition, the realization of the recesses 12 in step 23 could be interchanged with that of the holes 14 of step 24 without reducing the advantages of the invention. It is also conceivable to substitute the laser etching of step 23 and / or step 24 by another type of etching if its accuracy and its scrap rate is acceptable.

Enfin, il est également à noter que l'étape 25 ou l'étape 25' n'est pas limitée à une autocatalyse chimique ou un dépôt physique en phase vapeur mais peut être alternativement réalisée, par exemple, par un dépôt chimique en phase vapeur, un dépôt de couches atomiques ou un bombardement ionique.Finally, it should also be noted that step 25 or step 25 'is not limited to chemical autocatalysis or physical vapor deposition but may alternatively be performed, for example, by chemical vapor deposition. , atomic layer deposition or ion bombardment.

Claims (27)

Elément (10) comportant un corps (11, 18, 18') comprenant au moins un évidement (12) formant l'empreinte d'un décor (13), ledit au moins un évidement étant entièrement rempli par un dépôt (16) galvanique afin de former un élément (10) incrusté d'au moins un décor métallique (13) à la qualité visuelle améliorée caractérisé en ce qu'il comporte un dispositif d'ancrage dudit au moins un décor métallique communiquant avec ledit au moins un évidement afin d'améliorer l'ancrage dudit au moins un décor contre ledit élément.Element (10) comprising a body (11, 18, 18 ') comprising at least one recess (12) forming the impression of a decoration (13), said at least one recess being completely filled by a deposit (16) galvanic in order to form an element (10) inlaid with at least one metallic decoration (13) with an improved visual quality, characterized in that it comprises a device for anchoring said at least one metallic decoration communicating with said at least one recess so as to to improve the anchoring of said at least one decor against said element. Elément (10) selon la revendication précédente, caractérisé en ce que le dispositif d'ancrage comporte au moins un trou (14) traversant ledit élément et étant au moins partiellement rempli dudit dépôt (16) galvanique afin d'augmenter la surface de contact avec ledit élément.Element (10) according to the preceding claim, characterized in that the anchoring device comprises at least one hole (14) passing through said element and being at least partially filled with said galvanic deposit (16) in order to increase the contact area with said element. Elément (10) selon la revendication précédente, caractérisé en ce que le diamètre dudit au moins un trou (14) s'évase au fur et à mesure qu'il s'éloigne dudit au moins un évidement (12) afin de maintenir ledit dépôt (16) galvanique contre ledit élément.Element (10) according to the preceding claim, characterized in that the diameter of said at least one hole (14) flares as it moves away from said at least one recess (12) to maintain said deposit (16) galvanic against said element. Elément (10) selon la revendication 2 ou 3, caractérisé en ce que le dépôt galvanique (16) rempli complètement ledit au moins un trou (14).Element (10) according to claim 2 or 3, characterized in that the galvanic deposit (16) completely fills the at least one hole (14). Elément (10) selon la revendication précédente, caractérisé en ce que le dépôt galvanique (16) recouvre l'épaulement (19) de l'extrémité dudit au moins un trou (14) qui est opposée à celle communiquant avec ledit au moins un évidement (12) afin de bloquer tout déplacement dudit au moins un décor (13) par rapport au corps (18, 18').Element (10) according to the preceding claim, characterized in that the galvanic deposition (16) covers the shoulder (19) of the end of said at least one hole (14) which is opposite to that communicating with said at least one recess (12) to block any movement of said at least one decor (13) relative to the body (18, 18 '). Elément (10) selon l'une des revendications précédentes, caractérisé en ce que le dépôt (16) galvanique métallique comporte de l'or et/ou du cuivre et/ou de l'argent et/ou de l'indium et/ou du platine et/ou du palladium et/ou du nickel.Element (10) according to one of the preceding claims, characterized in that the galvanic metal deposit (16) comprises gold and / or copper and / or silver and / or indium and / or platinum and / or palladium and / or nickel. Elément (10) selon l'une des revendications précédentes, caractérisé en ce que chaque au moins un évidement (12) comporte une profondeur comprise entre 80 µm et 200 µm afin d'améliorer la force d'accrochage.Element (10) according to one of the preceding claims, characterized in that each at least one recess (12) has a depth of between 80 μm and 200 μm in order to improve the gripping force. Elément (10) selon l'une des revendications précédentes, caractérisé en ce que le corps (11, 18, 18') est en céramique électriquement conductrice.Element (10) according to one of the preceding claims, characterized in that the body (11, 18, 18 ') is electrically conductive ceramic. Elément (10) selon la revendication précédente, caractérisé en ce que le corps (11, 18, 18') est tout ou partie formé par un cermet.Element (10) according to the preceding claim, characterized in that the body (11, 18, 18 ') is wholly or partly formed by a cermet. Elément (10) selon l'une des revendications précédentes, caractérisé en ce que le corps (11, 18, 18') est électriquement non conducteur et en ce que le décor (13) comporte en outre au moins une couche (15) électriquement conductrice de sensiblement 50 nm entre le corps (11, 18, 18') et le dépôt galvanique (16).Element (10) according to one of the preceding claims, characterized in that the body (11, 18, 18 ') is electrically non-conductive and in that the decoration (13) further comprises at least one layer (15) electrically conductor of substantially 50 nm between the body (11, 18, 18 ') and the galvanic deposit (16). Elément (10) selon la revendication précédente, caractérisé en ce que le corps (11, 18, 18') est formé à base de zircone.Element (10) according to the preceding claim, characterized in that the body (11, 18, 18 ') is formed of zirconia. Pièce d'horlogerie (1) caractérisée en ce qu'elle comporte au moins un élément (10) conforme à l'une des revendications précédentes.Timepiece (1) characterized in that it comprises at least one element (10) according to one of the preceding claims. Pièce d'horlogerie (1) selon la revendication précédente, caractérisée en ce que le corps (11, 18, 18') dudit élément forme tout ou partie d'un boîtier (2) et/ou d'un bracelet (3) et/ou d'une lunette (4) et/ou d'un cadran (5) et/ou d'une glace (6) et/ou d'un poussoir (7) et/ou d'une couronne (8)..Timepiece (1) according to the preceding claim, characterized in that the body (11, 18, 18 ') of said element forms all or part of a housing (2) and / or a bracelet (3) and / or a telescope (4) and / or a dial (5) and / or an ice (6) and / or a pusher (7) and / or a crown (8). . Article de bijouterie ou de joaillerie caractérisé en ce qu'il comporte au moins un élément (10) conforme à l'une des revendications 1 à 9.Article of jewelery, characterized in that it comprises at least one element (10) according to one of Claims 1 to 9. Procédé de fabrication (21) d'un élément (10) comportant les étapes suivantes : a) former (22) un corps (11,18,18'); b) graver (23) au moins un évidement (12) dans une face (F) du corps (11, 18, 18'), chaque au moins un évidement formant l'empreinte d'un décor (13) ; c) graver (24) au moins un trou (14) communiquant avec ledit au moins un évidement afin de former un dispositif d'ancrage ; d) déposer (26) galvaniquement un matériau métallique (16) afin de remplir complètement ledit au moins un évidement et au moins partiellement ledit au moins un trou ; e) retirer (27) tout dépôt (16) de la surface du corps (11, 18, 18') afin de n'en laisser que dans le creux dudit au moins un évidement et dudit au moins un trou. A method of manufacturing (21) an element (10) comprising the steps of: a) forming (22) a body (11, 18, 18 '); b) etching (23) at least one recess (12) in a face (F) of the body (11, 18, 18 '), each at least one recess forming the imprint of a decoration (13); c) etching (24) at least one hole (14) communicating with said at least one recess to form an anchoring device; d) depositing (26) galvanically a metallic material (16) to completely fill said at least one recess and at least partially said at least one hole; e) removing (27) any deposit (16) from the surface of the body (11, 18, 18 ') to leave only in the hollow of said at least one recess and said at least one hole. Procédé (21) selon la revendication précédente, caractérisé en ce que ledit au moins un trou (14) traverse ledit élément afin qu'il puisse être au moins partiellement rempli lors de l'étape d) par le matériau métallique (16) afin d'augmenter la surface de contact avec ledit élément.Method (21) according to the preceding claim, characterized in that said at least one hole (14) passes through said element so that it can be at least partially filled during step d) by the metallic material (16) in order to to increase the contact area with said element. Procédé (21) selon la revendication précédente, caractérisé en ce que le diamètre dudit au moins un trou (14) s'évase au fur et à mesure qu'il s'éloigne dudit au moins un évidement (12) afin de maintenir ledit dépôt (16) galvanique contre ledit élément.Method (21) according to the preceding claim, characterized in that the diameter of said at least one hole (14) flares as it moves away from said at least one recess (12) to maintain said deposit (16) galvanic against said element. Procédé (21) selon l'une des revendications 15 à 17, caractérisé en ce que, lors de l'étape d), le dépôt métallique (16) rempli complètement ledit au moins un trou (14).Method (21) according to one of claims 15 to 17, characterized in that , in step d), the metal deposit (16) completely fills said at least one hole (14). Procédé (21) selon la revendication précédente, caractérisé en ce que, lors de l'étape d), le dépôt métallique (16) recouvre l'épaulement (19) de l'extrémité dudit au moins un trou (14) qui est opposée à celle communiquant avec ledit au moins un évidement (12) afin de bloquer tout déplacement d'au moins un décor (13) par rapport au corps (18, 18').Method (21) according to the preceding claim, characterized in that , in step d), the metal deposit (16) covers the shoulder (19) of the end of said at least one hole (14) which is opposite to that communicating with said at least one recess (12) to block movement of at least one decor (13) relative to the body (18, 18 '). Procédé (21) selon l'une des revendications 15 à 19, caractérisé en ce que le corps (11) est en céramique électriquement conductrice.Method (21) according to one of claims 15 to 19, characterized in that the body (11) is electrically conductive ceramic. Procédé (21) selon l'une des revendications 15 à 19, caractérisé en ce que le corps (11, 18, 18') est en céramique électriquement non conductrice et en ce que le procédé (21) comporte en outre, entre l'étape c) et l'étape d), l'étape suivante : f) déposer (25') au moins une couche (15) électriquement conductrice de sensiblement 50 nm sur l'ensemble de la face (F) comportant ledit au moins un évidement et ledit trou. Method (21) according to one of Claims 15 to 19, characterized in that the body (11, 18, 18 ') is electrically non-conductive ceramic and in that the method (21) further comprises between step c) and step d), the next step: f) depositing (25 ') at least one electrically conductive layer (15) of substantially 50 nm over the entire face (F) comprising said at least one recess and said hole. Procédé (21) selon la revendication précédente, caractérisé en ce que l'étape f) est réalisée par autocatalyse chimique ou par dépôt physique en phase vapeur.Process (21) according to the preceding claim, characterized in that step f) is carried out by chemical autocatalysis or by physical vapor deposition. Procédé (21) selon l'une des revendications 20 à 22, caractérisé en ce que l'étape a) est réalisée par frittage.Process (21) according to one of Claims 20 to 22, characterized in that step a) is carried out by sintering. Procédé (21) selon l'une des revendications 15 à 23, caractérisé en ce que l'étape b) est réalisée par laser sur une profondeur comprise entre 80 µm et 200 µm afin d'améliorer la force d'accrochage.Method (21) according to one of Claims 15 to 23, characterized in that step b) is performed by laser on a depth of between 80 μm and 200 μm in order to improve the gripping force. Procédé (21) selon l'une des revendications 15 à 24, caractérisé en ce que l'étape c) est réalisée par laser en orientant le faisceau à partir de la face (P) opposée à celle (F) destinée à recevoir ledit au moins un évidement (12).Method (21) according to one of claims 15 to 24, characterized in that step c) is carried out by laser by directing the beam from the face (P) opposite to that (F) intended to receive said at minus one recess (12). Procédé (21) selon l'une des revendications 15 à 25, caractérisé en ce que les étapes b) et c) sont interverties.Method (21) according to one of claims 15 to 25, characterized in that steps b) and c) are inverted. Procédé (21) selon l'une des revendications 15 à 26, caractérisé en ce que chaque au moins un évidement (12) comporte une surface continue au moins partiellement rayonnée (R) afin de faciliter la mise en oeuvre de l'étape d).Method (21) according to one of claims 15 to 26, characterized in that each at least one recess (12) has a continuous surface at least partially radiated (R) to facilitate the implementation of step d) .
EP12155635.1A 2012-02-15 2012-02-15 Device for anchoring a metal incrustation Active EP2628607B1 (en)

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EP12155635.1A EP2628607B1 (en) 2012-02-15 2012-02-15 Device for anchoring a metal incrustation
CN2013100506786A CN103253067A (en) 2012-02-15 2013-02-08 Device for anchoring metal incrustation
CN201810612134.7A CN108749459A (en) 2012-02-15 2013-02-08 Device for being fixedly secured metal inlay
IN544CH2013 IN2013CH00544A (en) 2012-02-15 2013-02-08
US13/764,961 US9150978B2 (en) 2012-02-15 2013-02-12 Device for fixedly securing a metallic inlay
RU2013106520A RU2620941C2 (en) 2012-02-15 2013-02-14 Device for permanent fixing of metal insert
JP2013027497A JP2013167628A (en) 2012-02-15 2013-02-15 Element for fixedly securing metallic inlay

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US9150978B2 (en) 2015-10-06
JP2013167628A (en) 2013-08-29
US20130208577A1 (en) 2013-08-15
RU2013106520A (en) 2014-08-20
CN108749459A (en) 2018-11-06
EP2628607B1 (en) 2016-08-03
IN2013CH00544A (en) 2015-08-07
RU2620941C2 (en) 2017-05-30

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