EP2202030A2 - Polishing head for zonal processing of optical spectacle surfaces - Google Patents

Abstract

The invention relates to a polishing head 1 for spectacle surfaces 8.1 with a base body 2 for attachment to a polishing spindle 7, with an elastic support member 3 for an attached or to be attached polishing foil 4, wherein the support member 3 has a recess 3.1 with a wall surface 3.2 and a depth t and the polishing film 4 has at least one hole 4.1, wherein the hole 4.1 forms an access to the recess 3.1, wherein the polishing film 4 in addition to the hole 4.1 at least one further hole 4.4, which is arranged in the region of an edge 3.3 of the recess 3.1 and to the hole 4.1 has a radial distance a, wherein the further hole 4.4 forms an outflow channel for polishing from the recess 3.1 out or the wall surface 3.2 at least over a part of the depth t and / or with respect to a circumference at least segmentally with respect to the axis of rotation D. is set at an angle α, and / or the support member 3 at least one in the Stirnsei te 3.3 provided groove 3.5 having a groove base 3.6 and a depth t1, which connects to the recess 3.1, and / or the support part 3 at least one of the recess 3.1 and the end face 3.3 connecting channel 3.7 having an opening 3.7a.

The invention also relates to a method in which prior to merging the polishing head 1 and the surface to be polished, a supply of polishing agent is introduced into the recess 3.1 in the carrier part 3.

Description

The invention relates to a polishing head for zonal machining of optical spectacle surfaces with a rotation axis D having base body for attachment to a polishing spindle, with an arranged on the body elastic support member on which a polishing foil is arranged, wherein the support member has a recess of the depth t and the polishing sheet has at least one hole, the hole forming an access to the recess.

Furthermore, the invention relates to a polishing head for zonal processing of optical spectacle surfaces having a rotation axis D having base body for attachment to a polishing spindle and arranged on the base body, elastic support member having an end face for fixing a polishing sheet, wherein the support member a central recess having a depth t and having a wall surface.

The invention also relates to a method for polishing optical spectacle surfaces with a zonal polishing tool consisting of a polishing spindle and a polishing head arranged thereon, comprising a base body for attachment to the polishing spindle and arranged on the base elastic support member with a recess and an am Carrier part attached polished foil is formed.

It is already a polishing plate for a tool for fine machining of optically active surfaces of spectacle lenses from the DE 10 2005 010 583 A1 known. This polishing plate has a support body, on which a foam layer is fixed, on which a polishing foil rests. The polishing foil is provided in a central region with at least one opening. The orifice provides pressure equalization during processing and provides liquid polishing agent from inside the foam layer, thereby providing better rinsing and cooling of otherwise less favored beater areas.

The from the DE 10 2005 010 583 A1 Known recess within the support member is intended to serve as a reservoir for liquid polishing agent during processing, which was in the foam, ie in the support member itself, stored or sucked and which in the case of Walkens or pressing the support part, starting from the pores into the recess. From there, it should be delivered to the polishing process via the opening in the polishing foil. A separate filling of the recess according to the invention prior to placement of the workpiece is not provided according to the teaching of the prior art. Rather, it is customary to provide the surface to be polished on the one hand and the polishing head on the other hand after putting on the surface to be polished laterally with polishing agent, which should then be guided inwards due to the capillary function of the support member.

The opening in the polishing film thus serves to forward liquid polishing agent from the interior of the foam layer. The foam layer itself has a recess in the region of the opening in the polishing film, which serves as a reservoir for the liquid polishing agent during processing.

The US 3,128,580 describes a grinding and polishing machine with a grinding and polishing head, which has a plurality of grooves, which serve to make coolant more effective to be machined To transport workpiece surface. The grooves are provided within the grinding and polishing pad, wherein the respective groove is associated with a groove-shaped recess within the body of the grinding and polishing head. In addition, a centric circular recess is provided within the grinding and polishing pad, which is associated with a corresponding cup-shaped recess within the body for receiving cooling medium. According to embodiment 11, the grooves or the associated groove-shaped recesses extend into the region of the central recess or recess, wherein a gap is provided between the groove and the central recess. As can be seen clearly from FIGS. 10 and 12, however, there is no flow connection between the central recess and the respective groove or groove-shaped recess. According to the embodiments FIG. 4 . 8 and 9 Although there is a flow connection between the central recess and the respective groove or groove-shaped recess, however, the groove-shaped recess has no distance from the central recess.

The various recesses serve as a holder reservoir for cooling medium, which should probably emerge gradually from the recesses up to the workpiece during the process. A direct transfer between the different recesses is not described.

The object of the invention is to design and arrange a polishing foil or a polishing head for optical spectacle surfaces such that an improved transport of polishing agent between the polishing foil and the surface to be processed is ensured.

The object is achieved according to the invention by the subjects of claims 1 or 2 or the method of claim 14.

The fact that the polishing foil has at least one further or separate hole in addition to the hole, which hole is arranged in the region of an edge of the recess and has a radial distance a from the hole, leads to an outlet for polishing agent out of the recess. The additional or separate hole may also be formed as a groove-shaped extension of the central hole. The said distance refers in this case to the respective radially outer edge of the central hole on the one hand and the groove-shaped extension on the other. Due to the centrifugal forces generated by the rotation, the polishing agent is displaced outwards or upwards in the edge region of the recess, regardless of the shape of the polishing agent receiving recess. Through the inventive further hole or the groove-shaped extension in the edge region of the recess, where the polishing agent is displaced due to the centrifugal forces upwards or outwards, the polishing agent can escape through the hole and so incorporated between the polishing film and the surface to be machined or be distributed. The hole or the groove-shaped extension is designed in its size or its diameter to the desired volume flow. This also applies to the number of holes distributed over the circumference or groove-shaped extensions. When polishing optical spectacle surfaces or aspherical surfaces, it is to be expected that the polishing foil lifts off the surface to be polished during the polishing process, so that the further hole according to the invention is not permanently closed by the surface to be treated. Accordingly, the separate hole according to the invention is in consideration of the achievable Speeds during polishing, so with regard to the expected flow on the one hand and with regard to the viscosity of the polishing agent formed much smaller than the previously known from the prior art centric opening. The diameter of the hole according to the invention is between 0.2 and 4 mm.

The wall surface, which is employed at least over a part of the depth t and / or with respect to a circumference at least segmentally with respect to the rotation axis D at an angle α undercutting, ensures by utilizing the impending during processing centrifugal forces improved transport of polishing agent in radial and axial direction out of the recess. This feature may be provided alternatively or in addition to promoting polishing flux.

It is envisaged that the recess opens due to the employment of the wall surface to one of the polishing foil facing away side, as in the embodiments according to FIG. 2 . 4 . 5a, 5b. 5c . 6a and 8th , so that increased polishing agent is conveyed to the edge of the recess.

The polishing sheet to be arranged has at least one centric hole, wherein the hole forms an access to the recess for the purpose of filling. With the employment of the wall surface, an increased force acting in the axial direction to the axis of rotation force is exerted on the rotating with the polishing pad polishing agent, so this much better out of the recess, possibly via a channel up to a there to be provided polishing film or there to be provided outlets is encouraged.

The provided in the free end face of the support member, adjoining the recess in fluid communication groove with a groove bottom and a depth t1 ensures increased flow of polishing agent out of the recess at a height below the polishing film. This feature may be provided alternatively or in addition to promoting polishing flux. The polishing agent can thus emerge from the recess via the groove underneath the polishing foil to be applied in the radial direction of the groove and be passed on through the groove.

The depth t1 of the groove is smaller than the depth t of the recess. The groove thus forms a channel which is open on one side in the carrier part, which is closed by the polishing foil at least partially, except for an outlet opening or an outlet. If the depth t1 of the groove is the same as the depth t of the recess, then it is a segmented recess described below. This also applies to the case in which the depth t of the recess or the depth t1 of the groove varies over the radius.

Alternatively or additionally, the support part may have at least one channel connecting the recess and the end face with an opening, wherein the opening of the channel is provided with respect to a central axis M of the channel at a depth t2 of the recess or near the bottom. The polishing agent can escape via the channel from the recess near the bottom. In this respect, the channel represents a closed variant of a groove whose depth t1 of the groove bottom varies with the radius.

As an alternative to the case mentioned above, it can be provided that the recess opens due to a reverse employment of the wall surface in the opposite direction, ie the base body and therefore not is formed without distinction. In this case, polishing agent is increasingly promoted in a near-bottom opening of a channel or in the channel which connects the recess or a bottom region of the recess with an end face of the support member, due to the centrifugal forces.

When using a polishing head described above, in which a polishing sheet with at least one hole can be fixed for use on the support member, wherein the hole forms an access to the recess, it may be advantageous if the polishing sheet facing the carrier part or zuwendbare inside and has an outer surface can be applied to the optical surface and when the polishing film has in addition to the hole at least one radial distance a to the hole arranged further hole which in the region of an edge of the recess and / or in the region of the groove and / or in the region of an opening the channel is arranged, wherein the further hole forms a discharge channel for polishing agent from the recess, out of the groove and / or out of the opening. This results in the above advantages regarding the transport of polishing agent to the surface to be machined.

If the central axis M of the channel encloses an angle β between 25 ° and 60 ° with the axis of rotation D, the polishing agent is optimally conveyed outwards and upwards due to the centrifugal forces applied during the machining. The employment ultimately depends on the desired exit position on the front side or from the overlying polishing film and the diameter of the support member. Preferably, the channel opens in the recess near the bottom.

The channel can also be curved or parabolic, so that the angle β varies over the length of the channel or over the radius of the polishing head. Near the axis of rotation, the channel may be flatter, which promotes polishing agent transport despite lower centrifugal forces. With a greater distance to the axis of rotation D, the channel may be steeper, which initially worsens the polishing agent transport. However, due to the centrifugal forces increasing with the radius, this disadvantage is compensated.

It can also be advantageous if the polishing foil has an inner side facing the support part and an outer side which can be applied to the optical surface, the polishing foil having, in addition to the hole, at least one groove provided on the inner side with a groove bottom and at least one on the outer side Has recess which opens the groove bottom partially towards the outside and which has a distance d to the hole. The groove preferably runs in the radial direction. It connects an inflow for polishing agent, preferably the edge region of the recess with the recess lying further outward in the radial direction, so that polishing agent is passed from the recess in the carrier part through the groove to the recess and thus between the polishing foil and a surface to be polished. The open side of the groove is closed when resting the polishing film on the support member and thus formed as a channel. The groove in the polishing film can be embossed and / or produced during the molding process of the polishing film. It is also conceivable to form the groove after the molding process of the polishing film by a cutting machining process. These features may be provided as an alternative or in addition to promoting polishing flux.

It can be advantageous in this case if the groove in the carrier part, the groove in the polishing film and / or the channel in the carrier part in the radial direction to the rotation axis D extends. The length or radial extent of the groove or of the channel is measured according to how far the recess according to the invention or the hole according to the invention on the outside of the polishing foil is removed from the central hole provided in the polishing foil.

Alternatively or additionally, it is advantageous if the central hole of the polishing film forms an access to the recess and the groove of the polishing film, the groove of the carrier part and / or the channel of the carrier part forms an outflow channel for polishing agent out of the recess, wherein the polishing film has a hole that connects to the exit of polishing fluid to the groove of the support member and / or the channel of the support member. As already stated, the carrier part of the polishing head, in conjunction with the polishing film described above, forms a discharge channel for polishing agent which is arranged below the polishing foil and which is stored in the recess of the carrier part. By means of the groove, the polishing agent, starting from the recess or an edge of the recess, is guided radially outward over an arbitrary distance, up to the exit hole, due to the displacement effect produced by the rotation, in order to exit there to the outside. The size or dimensions of the groove or channel, as well as the size of the subsequent hole in the polishing foil, are also selected according to the desired polishing agent flow, depending on the polishing agent pressure varying with the viscosity of the polishing agent and the rotational speed.

Of particular importance for the present invention may be when the hole in the polishing foil has a diameter d1 and the recess at the edge has a diameter d2, wherein the diameter d1 is smaller than the diameter d2 and the polishing film protrudes beyond the edge of the recess and the recess in the edge region in the axial direction at least partially closes. Thus, the edge portion of the recess in which the polishing agent would escape upwards and / or sideways due to the centrifugal forces is closed by the polishing film. Accordingly, the polishing film can not escape there, or only into the holes and / or grooves provided there as described above, which serve for a defined transfer and discharge of polishing agent to the outer surface. The supernatant thus formed is between 15% and 90%, preferably between 20% and 60%, of half the diameter d2.

In connection with the design and arrangement according to the invention, it may be advantageous if the polishing film has a first functional area F1 and corresponding means which performs a cover function in subregions of the edge of the recess by a projection and a forwarding function for polishing from the recess radially outward the groove and / or ensured in the axial direction through the further hole. Due to the groove also acting in the axial direction forwarding function is ensured for the polishing agent. In the foreground, however, is the radial forwarding function due to the length of the groove. The cover function ensures retention of polishing agent, so that the limited volume of polishing agent can be defined as part of the forwarding function and forward as metered and finally delivered to the desired areas of the polishing agent film. The forwarding function is ensured carrier part side by the groove or the channel in the carrier part.

It can also be advantageous if the polishing foil has a second functional area F2 and corresponding means which directs the polishing agent outlet function to the outside through the further hole at the edge of the recess, through the hole adjacent to the groove or channel in the carrier part and Guaranteed by the recess following the groove in the polishing film. The second functional area ensures the desired exit of polishing agent at the freely selectable positions on the outside of the polishing film.

In addition, it may be advantageous if the polishing foil has a lower part with the inner side and an upper part with the outer side, wherein the first functional region F1 is assigned to the lower part and the second functional region F2 is assigned to the upper part. The polishing film can be formed one, two or more layers in order to form a desired forwarding system.

For this purpose, it may alternatively be advantageous if the lower part and the upper part are formed in one piece and / or material identical or if the lower part and the upper part form different components. In the case of the presence of two different components, the lower part may also have a stiffening function, so that the adaptability of the polishing foil in conjunction with the flexible carrier is limited downwards, ie towards smaller radii.

It may be advantageous if the recess has a volume which is at least 0.3 ml or 0.4 ml or 0.5 ml or 0.6 ml. The main function of the carrier part is still the support of the polishing foil when polishing the surface. With the size of the central recess, which is to serve as a supply of polishing agent, the support function is reduced overall or is completely lost in the region of the recess, so that the radial extent of the recess ultimately has to be limited. With regard to the height of the support member, so the depth of the recess thus a desired, but upwardly limited storage volume for polishing agent can be achieved.

Finally, it may be advantageous if the recess is formed funnel and / or cup and / or frustoconical, wherein the salaried part of the wall surface of the recess is flat or flat. Flat or even wall surfaces can initially be made somewhat easier due to the available tools. The funnel and / or cup-shaped design of the at least upper part of the recess favors, as already mentioned above, the polishing agent pressure resulting from the rotation in the upper edge region of the recess.

It may be advantageous for this purpose if the salaried part of the wall surface of the recess has a straight or parabolic boundary line B which encloses an angle α with the axis of rotation. In the parabolic boundary line B, the angle α varies with respect to the depth t. At a varying angle α, the distance of the surface from the axis of rotation in the choice of the angle α can be considered, ie that with surface portions with a small distance to the center of rotation or to the rotation axis D, the angle α is formed correspondingly large and surfaces with a greater distance to the center of rotation correspondingly smaller, as in the example FIG. 5c is shown. Consequently is counteracted an excessive discharge or polishing agent pressure in the areas with a large distance to the center of rotation and still bridged the depth t of the recess.

Ultimately, it may be advantageous if the recess or at least the funnel and / or cup-shaped part of the recess with respect to the circumferential direction U is segmented into a plurality of sub-segments. The total resulting from the recess lack of support by the support member is at least partially repealed in the case of a segmented structure of the funnel-shaped parts of the recess. This ensures on the one hand a slightly larger volume for the polishing liquid, but on the other hand, a support function that depends on the size of the segments or the extensions of the recess.

Finally, it may be advantageous if the base body has a central polishing agent channel. About the polishing agent channel of the polishing head can be supplied with polishing agent, which is provided or supplied via the polishing spindle. The polishing agent can be transported via the polishing agent channel into the recess and from there as described above.

The fact that prior to merging the polishing head and the surface to be polished, a supply of polishing agent is filled into the recess in the carrier part leads to a considerably larger amount of polishing agent, which is conveyed during the subsequent processing via the above-mentioned means between the polishing film and the surface to be processed and / or polishing agent is supplied via the polishing agent channel. Since the quantities which can be supplied via the polishing agent channel are substantially larger, not only reproducible results but also good cooling effects can be achieved achieve.

For the procedure, it is advantageous if the filling process is repeated several times during the polishing process of one spectacle surface, possibly two to ten times. The overall volume of polishing agent available for the one polishing process can be increased by the corresponding factor starting from the available, above-mentioned volume of the recess, which improves the quality of the polishing process, but above all the reproducibility of the polishing process.

Figur 1

eine perspektivische Darstellung des Polierkopfes mit Polierfolie;

Figur 2

eine Schnittdarstellung aus Figur 1;

Figur 3

eine Draufsicht auf den Polierkopf als Prinzipskizze;

Figur 4

eine Schnittdarstellung gemäß Schnitt A-A aus Figur 3;

Figuren 5a-5d

verschiedene Ausführungsbeispiele für die Biegefläche der Mantelfläche der Aussparung;

Figur 6

eine Prinzipskizze als Draufsicht mit einer segmentierten Aussparung;

Figur 6a

einen Schnitt B-B aus Figur 6;

Figur 7

eine Draufsicht mit schlitzförmigen Erweiterungen der Aussparung;

Figur 7a

einen Schnitt C-C aus Figur 7;

Figur 7b

eine Schnittdarstellung alternativer Ausbildungsformen;

Figur 8

eine Schnittdarstellung der perspektivischen Ansicht;

Figur 9

eine Schnittdarstellung einer weiteren Ausführungsform.

Further advantages and details of the invention are explained in the patent claims and in the description and illustrated in the figures. Show it:

FIG. 1

a perspective view of the polishing head with polishing foil;

FIG. 2

a sectional view FIG. 1 ;

FIG. 3

a plan view of the polishing head as a schematic diagram;

FIG. 4

a sectional view according to section AA FIG. 3 ;

Figures 5a-5d

various embodiments of the bending surface of the lateral surface of the recess;

FIG. 6

a schematic diagram as a plan view with a segmented recess;

FIG. 6a

a cut BB off FIG. 6 ;

FIG. 7

a plan view with slot-shaped extensions of the recess;

Figure 7a

a cut CC off FIG. 7 ;

FIG. 7b

a sectional view of alternative forms of training;

FIG. 8

a sectional view of the perspective view;

FIG. 9

a sectional view of another embodiment.

A polishing head 1 according to FIG. 1 has a base body 2 formed from plastic with a carrier part 3 formed thereon of foam and a polishing foil 4 arranged on the carrier part 3. The main body 2 is used for receiving a polishing spindle 7, not shown, and has for the purpose of machine handling a collar 2.1 and detent springs 2.2 for clipping onto the spindle, not shown, or a spindle head.

The polishing film 4 has on its upper side a coaxially to a rotation axis D arranged hole 4.1. In addition, there are further holes 4.4 to 4.4 "at a radial distance, and there are four recesses 4.7 to 4.7" 'on the upper side, but they are not a continuous hole.

In FIG. 2 It can be seen that both the central hole 4.1 and the holes 4.4 to 4.4 '"which are located further outside with respect to the rotation axis D are formed as a hole, ie extend through the entire film.

The polishing film 4 is formed from the two layers 4a, 4b.

The above-mentioned holes 4.1-4.4 pass through both layers 4a, 4b. In addition, starting from the respective hole 4.4, the lower layer 4b has a recess or groove 4.5, which extends into the region of the respective recess 4.7.

The carrier part 3 has a centrally arranged recess 3.1, which extends from the top down to the support part 3 down. The recess 3.1 has a conical outer surface 3.2, which with the

Rotary axis D includes an angle α. The recess 3.1 serves as a polishing agent supply, which is introduced into the recess 3.1 before the polishing process. The respective hole 4.4 to 4.4 '' or the beginning of the respective groove 4.5 is provided in the region of an edge 3.3 of the recess 3.1 In the case of the rotation of the polishing head 1, the polishing agent located in the recess 3.1 would be conveyed outwards, thus upwards and emerges upwards in the region of the edge 3.3 into the hole 4.4 or out of the hole 4.4 On the other hand, the polishing agent is conveyed through the groove 4.5 or the channel formed together with the groove 4.5 and the carrier part 3 towards the recess 4.7 and passes through the recess 4.7 also off.

As shown FIG. 3 extends the respective groove 4.5, starting from the hole 4.4 in the radial direction to the recess 4.7.

As in FIG. 2 can be seen, the polishing film is above the edge 3.3 of the recess 3.1 by a projection 4.8 forth. The supernatant 4.8 is about 40% of half the diameter d2 of the recess 3.1. Accordingly, the polishing agent displaced upwards or outwards only by the hole 4.4 or the groove 4.5 upwards or radially escape to the outside.

The groove 4.5 has a length 1, wherein the hole 4.4 to the central hole 4.1 has a distance a, whereby the supernatant 4.8 would be at least partially justified. The recess 4.7 is therefore spaced by the length 1 of the groove 4.5 to the hole 4.4 and has the hole 4.1 corresponding to a distance d.

Opposite to the further hole 4.4 another embodiment of the further hole 4.4a is shown. The further hole 4.4a is groove-shaped and connects to the central hole 4.1. The distance a in this case refers to the radially outer boundary line of the respective hole 4.1, 4.4a. The size of the respective hole 4.1, 4.4a, such as the width and length, as well as the number of distributed over the circumference further holes 4.4, 4.4a may vary depending on the application.

As shown in section AA FIG. 3 the recess 3.1 in the region of the edge 3.3 has a diameter d2 and tapers downwards by about 70% to a diameter d3.

As shown FIG. 4 is the polishing head 1 thus formed against a surface 8.1 of a workpiece 8 and a lens 8 can be applied.

Each of the two layers 4a, 4b of the polishing foil 4 has a separate functional area F1, F2. The lower layer 4b ensures on the one hand the cover function by the projection 4.8 on the edge 3.3 of the recess 3.1. Furthermore, the lower layer 4b fulfills the exit and forwarding function of the polishing agent into the hole 4.4 or into the groove 4.5 towards the recess 4.7. The upper layer 4a is essentially the exit function, since there the polishing agent from the hole 4.4 and the recess 4.7 emerges at a desired location and can be incorporated between the polishing film 4 and the surface to be machined 8.1 and there fulfills the polishing function or sustainably supported.

The recess 3.1 may according to embodiment 5a to 5d have different shapes with respect to their wall surface 3.2. A according to section resulting boundary line B of the projection of the wall surface 3.2 may funnel-shaped according to FIG. 5a , arcuate or parabolic in accordance with embodiment FIGS. 5b and 5c and / or cylindrical according to FIG. 5d be educated. In the first three cases mentioned, the angle of attack α of the wall surface 3.2 varies as a function of a height or depth t of the recess 3.1. This can be done in particular as in the case FIG. 5c be advantageous because in the areas near the axis of rotation D in the bottom of the recess, the centrifugal forces acting in the radial direction will be smaller than in the areas with more distance from the axis of rotation, ie in the region of the edge 3.3.

Even in the case of a cylindrical recess according to FIG. 5d due to the centrifugal forces an increase of the level of the polishing liquid at the edge 3.3 of the recess 3.1, so that the polishing liquid can also escape through the hole 4.4 and the groove 4.5. The height of the part of the wall surface 3.2, which has a position relative to the axis of rotation D, as in the embodiment FIG. 5a be greater than the total depth t of the recess 3.1.

According to embodiment FIG. 6 and the accompanying Sectional view BB according to FIG. 6a it is provided that the recess 3.1 at least partially segment in the circumferential direction U, ie the recess 3.1 is extended by three wing-shaped extensions 3.1a, 3.1b, 3.1c. Within the wing-shaped extensions 3.1a, 3.1b, 3.1c, the wall surface 3.2 is employed with respect to the axis of rotation D. The central part of the recess 3.1 is, as far as it is limited, cylindrical. The wing-shaped extensions 3.1a, 3.1b, 3.1c represent, in addition to the central part of the recess 3.1, three further segments of the recess 3.1. Depending on the length and width of the extensions 3.1a-3.1c, the support function of the carrier part is impaired.

In the embodiment according to FIG. 7 is the recess 3.1 similar to the embodiment according to FIG. 6 segmented, wherein the segmentation by three in the plan view slit-shaped, extending in the radial direction extensions 3.1a, 3.1b and 3.1c is formed. In addition to the central recess 3.1 and the three slot-shaped extensions 3.1a to 3.1c is on the top or front side 3.4 of the support member 3, an opening 3.7b of an in Figure 7a represented channel 3.7 shown.

After sectional view CC according to Figure 7a , Left half, have the slot-shaped extensions 3.1a to 3.1c the same depth t, as the recess 3.1 itself. The slot-shaped recesses 3.1a to 3.1c are according to embodiment FIG. 7 rectangular with respect to the plan view. However, these may also have an oval, oblong, angular or triangular shape of a star tip.

According to embodiment according to Fig. 7a , right side, is in Carrier part 3, a channel 3.7 is provided which extends in the central recess 3.1 starting radially outwards and upwards to the free end face 3.4 out. The channel 3.7 has a central axis M, which forms an angle β of about 55 ° with the axis of rotation D.

The channel 3.7 forms in the wall surface 3.2 of the recess 3.1 an opening 3.7a, which is placed with respect to the central axis M at a depth t2, measured from the front 3.4. The channel 3.7 opens into an opening 3.7b on the front 3.4. The opening 3.7b has a radial distance b from the central recess 3.1, as in FIG FIG. 7 shown on.

According to embodiment FIG. 7b , Left side, the groove 3.5 may be formed shallower or less deep than the central recess 3.1. The groove 3.5 and the groove base 3.6 in this case has the depth t1, which is about 40 percent of the depth t of the central recess 3.1.

According to embodiment FIG. 7b , right side, the channel 3.7 can be similar to the recess after FIG. 5b or FIG. 5c be formed curved or parabolic. The angle of attack β between the central channel axis M and the axis of rotation D thus varies with the radius.

In principle, it is also possible, the groove base 3.6 according to embodiment FIG. 7b , left side, similar to the channel 3.7 according to the embodiment FIG. 7b , right side, curved or parabolic form. As soon as the depth t1 in the region of the central recess 3.1 in the curved or parabolic case of the groove base 3.6 reaches the depth t of the central recess 3.1, an embodiment results similar to FIG FIG. 6 respectively. FIG. 6a , according to which a segmented recess 3.1 with the according Top view wing-like extensions 3.1a to 3.1c of the recess 3.1 is provided. In contrast to the embodiment according to FIG. 6 the extensions 3.1a to 3.1c are much longer and narrower, as far as slot-shaped as in the embodiment according to FIG. 6 ,

In the sectional view according to FIG. 8 the respective groove 3.5, 3.5 "is provided in the carrier part 3. The groove 3.5 extends in the radial direction starting from the recess 3.1 or its upper edge 3.3 to the height of the respective hole 4.7, 4.7" in the polishing foil 4. The in In the case of rotation, polishing material located in the recess 3.1 is conveyed out of the conical recess 3.1 and conveyed via the groove 3.5 to the hole 4.7 of the polishing foil 4, and finally exits from the hole 4.7. At the latest when the groove 3.5 is filled with polishing agent, there is a discharge of polishing agent from the hole 4.4, which is arranged with respect to the radial direction in front of the hole 4.7.

According to FIG. 8 On the left side, the hole 4.4 or 4.4 "is not provided, only the hole 4.7" at the end of the groove 3.5 "is provided, from which the polishing agent can escape to the outside.

The main body 2 has a coaxial with the axis of rotation D, formed as a hole polishing agent channel 2.3. About the polishing agent channel 2.3, the polishing head 1 and the recess 3.1 is alternatively or additionally supplied with polishing agent, which has a in FIG. 4 sketched polishing spindle 7 is provided.

According to the embodiment according to FIG. 9 opens the recess 3.1 down to the base part 2, not shown (s. Fig. 8 ). The polish is above the respective Channel 3.7, 3.7 "to the front 3.4 of the support member promoted. The downwardly widening shape of the recess 3.1 ensures the transport of the polishing agent from the recess 3.1 in the respective channel 3.7, 3.7" or its respective opening 3.7a, 3.7a ".

LIST OF REFERENCE NUMBERS

1

polishing head

2

body

2.1

Flange, collar

2.2

detent spring

2.3

Polish channel, hole

3

support part

3.1

Recess, trough

3.1a

Extension, propeller-shaped, slot-shaped, subsegment

3.1b

Extension, propeller-shaped, slot-shaped, subsegment

3.1c

Extension, propeller-shaped, slot-shaped, subsegment

3.2

Wall surface, lateral surface

3.3

edge

3.4

Front side, free

3.5

groove

3.6

groove base

3.7

channel

3.7a

Opening, below

3.7b

Opening, top, front

4

polishing film

4a

upper part, position

4b

lower part, location

4.1

hole

4.2

inside

4.3

outside

4.4

hole

4.4 '

hole

4.4 "

hole

4.4 " '

hole

4.4a

hole

4.5

groove

4.6

groove base

4.7

Recess, hole

4.7 '

recess

4.7 "

recess

4.7 " '

recess

4.8

Got over

7

polishing spindle

8th

Lens, workpiece

8.1

optical glasses surfaces, aspheric surface

α

angle

β

angle

a

distance

b

distance

B

boundary line

D

axis of rotation

d

distance

d1

diameter

d2

diameter

d3

diameter

F1

functional area

F2

functional area

1

length

M

Central axis channel 3.7

t

depth

t1

depth

t2

depth

U

circumferentially

Claims (15)

Polishing head (1) for zonal machining of optical spectacle surfaces (8.1) with a base (2) having an axis of rotation D for attachment to a polishing spindle (7), with an elastic support part (3) arranged on the base body (2) on which a Polishing film (4) is arranged, wherein the carrier part (3) has a recess (3.1) of the depth t and the polishing film (4) at least one hole (4.1), wherein the hole (4.1) forms an access to the recess (3.1) .
characterized,
that the polishing sheet (4) in addition to the hole (4.1) has at least one further hole (4.4), which in the region of an edge (3.3) is disposed the recess (3.1) and the hole (4.1) has a radial distance a, said the further hole (4.4) forms an outflow channel for polishing agent out of the recess (3.1). Polishing head (1) for zonal machining of optical spectacle surfaces (8.1) with a base (2) having a rotation axis D for attachment to a polishing spindle (7) and with an elastic support part (3) arranged on the base body (2), which is an end face (3.3) for fixing a polishing foil (4), wherein the carrier part (3) has a wall surface (3.2) having a recess (3.1) with a depth t, characterized
that the wall surface (3.2) at least over part of the depth t and / or is made with reference to a circumference at least in segments, with respect to the axis of rotation D at an angle α, wherein the wall surface (3.2) is formed without undercuts and / or that the carrier part (3) at least one in the end face (3.3) provided groove (3.5) with a
Has groove bottom (3.6) and a depth t1, which adjoins the recess (3.1), wherein the depth t1 is smaller than the depth t, and / or
in that the support part (3) has at least one channel (3.7) connecting the recess (3.1) and the end face (3.3) with an opening (3.7a), the opening (3.7a) of the channel (3.7) being related to a central axis M of the channel (3.7) is provided at a depth t2 of the recess (3.1). Polishing head (1) according to claim 2 with a polishing foil (4) or polishing foil (4) attached to the carrier part (3),
characterized,
in that the polishing foil (4) has at least one hole (4.1), the hole (4.1) forming an access to the recess (3.1) and the polishing foil (4) forming an inner side (4.2) facing or facing the carrier part (3) has on the optical surface (8.1) attachable outside (4.3), and that the polishing film (4) in addition to the hole (4.1) at least one further hole (4.4) with a radial distance a to the hole (4.1), which in the region of Edge (3.3) of the recess (3.1) and / or in the region of the groove (3.5) and / or in the region of an opening (3.7a) of the channel (3.7) is arranged, wherein the further hole (4.4) an outflow channel for polishing agent the recess (3.1), out of the groove (3.5) and / or out of the opening (3.7a) out. Polishing head (1) according to claim 2 or 3,
characterized,
that the central axis M of the channel (3.7) with the axis of rotation D forms an angle β between 25 ° and 60 °. Polishing head (1) according to claim 2, 3 or 4,
characterized,
wherein the angle β about the length of the channel (3.7) is that the channel (3.7) curved or parabolic varies. Polishing head (1) according to one of claims 1, 3 to 5, or polishing foil (4) according to claim 3,
characterized,
in that the polishing foil (4) has an inner side (4.2) facing or facing the carrier part (3) and an outer side (4.3) which can be applied to the optical surface (8.1), wherein the polishing foil (4) has at least one on the inside (4.2) provided groove (4.5) having a groove bottom (4.6) and on the outside (4.3) has at least one recess (4.7) which opens the groove base (4.6) partially to the outside (4.3) out and the Hole (4.1) has a distance d, wherein the groove (4.5) with the recess (4.7) forms an outflow channel for polishing agent from the recess (3.1) out. Polishing head (1) according to one of claims 1, 3 to 6, or polishing foil (4) according to claim 3 or 6,
characterized,
in that the polishing foil (4) has a first functional region F1 and corresponding means for a) a cover function in partial areas of the edge (3.3) the recess (3.1) by a projection (4.8); b) a forwarding function for polishing agent from the recess (3.1) radially outward through the groove (4.5) and / or in the axial direction through the further hole (4.4). Polishing head (1) according to one of claims 1, 3 to 7, or polishing foil (4) according to claim 3, 6 or 7,
characterized,
in that the polishing foil (4) has a second functional area F2 and corresponding means for the outlet function for polishing agent towards the outside (4.3) through the further hole (4.4, 4.7) and / or through the recess (4.7). Polishing head (1) or polishing foil (4) according to claim 7 or 8,
characterized,
in that the polishing foil (4) has a lower part (4b) with the inner side (4.2) and an upper part (4a) with the outer side (4.3), the first functional region F1 being associated with the lower part (4b) and the second functional region F2 is associated with the upper part (4a) Polishing head (1) according to one of claims 1 to 9,
characterized,
that the recess (3.1) has a volume that is large is at least 0.3 ml or 0.4 ml or 0.5 ml or 0.6 ml. Polishing head (1) according to one of claims 1 to 10,
characterized,
that the recess (3.1) funnel and / or cup-shaped, wherein the wall surface (3.2) of the recess (3.1) with respect to the sectional view has a straight or parabolic boundary line B. Polishing head (1) according to one of claims 1 to 11,
characterized,
that the recess (3.1) or at least the funnel and / or cup-shaped part of the recess (3.1) is segmented with respect to the circumferential direction U into a plurality of sub-segments (3.1a, 3.1b, 3.1c). Polishing head (1) according to one of claims 1 to 12,
characterized,
that the basic body (2) having a central polishing agent channel (2.3). Method for polishing optical spectacle surfaces (8.1) with a zonal polishing tool consisting of a polishing spindle (7) and a polishing head (1) arranged thereon, comprising a base body (2) for fastening to the polishing spindle (7) and one to the base body (7) 2) arranged elastic support member (3) having a recess (3.1) and a support member (3) fixed polishing foil (4) is formed,
characterized,
in that prior to merging the polishing head (1) and the surface to be polished (8.1), a supply of polishing agent is introduced into the recess (3.1) in the carrier part (3) and / or polishing agent is supplied via the polishing agent channel (2.3). Method according to claim 14,
characterized,
that this filling process is repeated at least once during the polishing process of one spectacle surface (8.1).

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