EP1771596A1 - CONDUCTIVE MATERIAL COMPRISING AN Me-DLC HARD MATERIAL COATING - Google Patents
CONDUCTIVE MATERIAL COMPRISING AN Me-DLC HARD MATERIAL COATINGInfo
- Publication number
- EP1771596A1 EP1771596A1 EP05747049A EP05747049A EP1771596A1 EP 1771596 A1 EP1771596 A1 EP 1771596A1 EP 05747049 A EP05747049 A EP 05747049A EP 05747049 A EP05747049 A EP 05747049A EP 1771596 A1 EP1771596 A1 EP 1771596A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- material according
- elements
- metal
- guide material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000463 material Substances 0.000 title claims abstract description 32
- 239000004020 conductor Substances 0.000 title claims abstract description 12
- 238000000576 coating method Methods 0.000 title description 17
- 239000011248 coating agent Substances 0.000 title description 13
- 239000010410 layer Substances 0.000 claims abstract description 107
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 27
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 25
- 229910052802 copper Inorganic materials 0.000 claims abstract description 22
- 239000010949 copper Substances 0.000 claims abstract description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 11
- 239000000956 alloy Substances 0.000 claims abstract description 11
- 239000012790 adhesive layer Substances 0.000 claims abstract description 6
- 239000011651 chromium Substances 0.000 claims description 27
- 229910052751 metal Inorganic materials 0.000 claims description 23
- 239000002184 metal Substances 0.000 claims description 23
- 229910052804 chromium Inorganic materials 0.000 claims description 12
- 239000012791 sliding layer Substances 0.000 claims description 12
- 239000010936 titanium Substances 0.000 claims description 8
- 230000007704 transition Effects 0.000 claims description 8
- 229910052750 molybdenum Inorganic materials 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 229910052715 tantalum Inorganic materials 0.000 claims description 6
- 229910052782 aluminium Inorganic materials 0.000 claims description 5
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 229910052758 niobium Inorganic materials 0.000 claims description 5
- 229910052755 nonmetal Inorganic materials 0.000 claims description 5
- 230000000737 periodic effect Effects 0.000 claims description 5
- 229910052720 vanadium Inorganic materials 0.000 claims description 5
- 229910052726 zirconium Inorganic materials 0.000 claims description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 229910052721 tungsten Inorganic materials 0.000 claims description 4
- 229910000906 Bronze Inorganic materials 0.000 claims description 3
- 239000010974 bronze Substances 0.000 claims description 3
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical compound [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 claims description 3
- 229910001369 Brass Inorganic materials 0.000 claims description 2
- 229910052796 boron Inorganic materials 0.000 claims description 2
- 239000010951 brass Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229910052741 iridium Inorganic materials 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 2
- MOFOBJHOKRNACT-UHFFFAOYSA-N nickel silver Chemical compound [Ni].[Ag] MOFOBJHOKRNACT-UHFFFAOYSA-N 0.000 claims description 2
- 239000010956 nickel silver Substances 0.000 claims description 2
- 229910052757 nitrogen Inorganic materials 0.000 claims description 2
- 229910052763 palladium Inorganic materials 0.000 claims description 2
- 229910052697 platinum Inorganic materials 0.000 claims description 2
- 239000011265 semifinished product Substances 0.000 claims description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 1
- 239000011733 molybdenum Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 13
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 6
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 230000008093 supporting effect Effects 0.000 description 3
- 229910010038 TiAl Inorganic materials 0.000 description 2
- 229910010037 TiAlN Inorganic materials 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 238000003780 insertion Methods 0.000 description 2
- 230000037431 insertion Effects 0.000 description 2
- 239000011229 interlayer Substances 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 150000001247 metal acetylides Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002843 nonmetals Chemical class 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- QIJNJJZPYXGIQM-UHFFFAOYSA-N 1lambda4,2lambda4-dimolybdacyclopropa-1,2,3-triene Chemical compound [Mo]=C=[Mo] QIJNJJZPYXGIQM-UHFFFAOYSA-N 0.000 description 1
- 238000012935 Averaging Methods 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910039444 MoC Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 229910003470 tongbaite Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 239000002347 wear-protection layer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/02—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0272—Deposition of sub-layers, e.g. to promote the adhesion of the main coating
- C23C16/029—Graded interfaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/30—Self-sustaining carbon mass or layer with impregnant or other layer
Definitions
- the invention relates to a conductive material made of a copper-containing alloy for use as a plug or Klemm ⁇ connection according to the preamble of claim 1. Further, a contact piece according to claim 18, and a semifinished product according to claim 19 or a band or profile according to claim 20 ,
- Copper-containing conductive materials are also known from the prior art, such as the good suitability of copper materials for the application of galvanic layers for Ober ⁇ surface refinement.
- PVD, CVD or PVD / CVD layers have hitherto been used little on the relatively soft copper materials, since, for example, in the case of a sliding stress with high load, as can occur when mounting plug-in or clamped connections, the layer In the base material is pressed or breaks and many used for the tool coating layer system too high a coefficient of friction (for example, the carbides WC, or Cr x Cy have a coefficient of friction of about 0.5 and greater), have too high roughness or poor electrical conductivity which makes them unsuitable for such an application.
- the carbides WC, or Cr x Cy have a coefficient of friction of about 0.5 and greater
- DE 1 802 932 discloses a high-frequency plasma method for coating electrical contacts with carbide wear protection layers. Similar to DE 3011694, wherein inter alia the application of a galvanic adhesive layer on various hardened or hardened metallic Werk ⁇ materials and an adjoining PVD coating in High-frequency plasma is described in which, inter alia, a carbide hard material layer is deposited. This achieves good electrical conductivity and increased wear protection, but the carbide coating results in a relatively high coefficient of friction.
- the invention is based on the object to provide a copper-containing control material, in which the disadvantages of the prior art are avoided and better electrical properties and a better service life and sliding behavior compared to conventionally coated materials are achieved.
- modified carbon-containing sliding or hard coatings having a carbon content of greater than or equal to 40 but less than or equal to 70 atomic percent, which are deposited on copper or copper alloys, it is possible the hardness of the surface and thus the To increase the wear and abrasion resistance of the materials without significantly changing their excellent electrical properties.
- the carbon content is understood as meaning the content of carbide-bound and free carbon which, together with the carbide former and additional optional elements added to 100%.
- a hard layer having defined tribological and electrical properties is deposited with a method as described in more detail below, which leads to an extension of the service life of the guide materials.
- the layers are slightly less hard than conventional hard carbides, for example, but significantly harder than the carrier material and thus protect it against abrasive wear. Surprisingly, these layers better protect the carrier material in plug-in and clamping applications than conventional hard-coating systems, wherein a support layer may additionally be provided for applications with high surface pressure. In the case of existing hard coatings, this could also be attributed to the relatively low coefficient of friction, which has advantageous effects, for example when used in a plug connection, since this simultaneously reduces the insertion forces and prevents scratching of a possibly uncoated counterpart.
- galvanically coated conductive materials examples include Cr, Ni or CrNi layers, which are applied before the support layer.
- plasma CVD, PVD or PVD / CVD hybrid processes are particularly suitable for the deposition of Me-DLC layers for the coating of, for example, hardenable copper materials.
- an additional support layer comprising at least one metal Me from the elements of subgroups IV, V, and VI of the Periodic Table of the Elements (ie Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W) or aluminum or Si included, could further impressions even at very high loads are avoided.
- Stauer ⁇ layers have proven to be particularly advantageous in addition to the metallic phase and a non-metal such as C, N, B, or 0 or the HartstoffVerbin ⁇ containing the metals with these non-metals.
- the backing layer systems TiN or Ti / TiN (ie, a metallic titanium layer with an adjoining Titannitridhart für), CrN or Cr / CrN, Cr x C ⁇ or Cr / Cr x C y, Cr x (CN) ⁇ or Cr / Cr x (CN) y , TiAl or TiAlN and TiAl / TiAlN mentioned.
- the support layer has a minimum layer thickness. This depends above all on the surface pressure occurring depending on the application. For example, with a low surface pressure even with layer thicknesses of 0.5 .mu.m, a sufficient supporting effect of the DLC layer could be achieved, while with a support layer of 0.3 .mu.m, the supporting effect was no longer sufficient. In general, however, a layer thickness of at least 1 to about 3 microns is recommended. For applications in which particularly high surface pressures occur, larger layer thicknesses, for example 6 ⁇ m, may also be advantageous.
- a metallic intermediate layer with or without a graded transition, or directly a transition layer, for example in the form of a gradient layer with increasing carbon content towards the sliding layer can be applied become .
- the DLC overlay itself is therefore advantageously carried out as follows: Directly on the support layer, a metallic intermediate layer comprising at least one metal Me from the elements of the IV, V, VI subgroup, Al or Si deposited.
- a metallic intermediate layer comprising at least one metal Me from the elements of the IV, V, VI subgroup, Al or Si deposited.
- an intermediate layer of the elements Cr or Ti is used, which have been found to be particularly suitable for this purpose.
- nitridic, carbidic, boridic or oxidic interlayers, or interlayers which are a mixture of one or more metals with one or more of the said non-metals, which, if required, can be used even on a metallic base layer with or without graded Transition can be constructed.
- this intermediate step can be omitted if the adhesion layer itself consists of a metal or a compound suitable as an adhesion-promoting layer.
- a transition layer in particular in the form of a gradient layer, preferably adjoins, in the course of which, perpendicular to the workpiece surface, the metal content decreases and the C content increases.
- the increase in the carbon can be effected by increasing possibly different carbide phases, by increasing the free carbon, or by a mixture of such phases with the metallic phase of the intermediate layer.
- the thickness of the gradient layer can be adjusted by setting suitable process ramps.
- the increase of the C-content or decrease of the metallic phase can take place continuously or stepwise, furthermore, at least in one part of the gradient layer, a sequence of metal-rich and C-type metals can also be obtained.
- a MeC layer which is applied for example by sputtering, and the proportion of free carbon by adding a carbon-containing reactive gas continuously or gradually increased.
- tungsten carbide-based layers for example, a ratio of about 50: 1 to about 2: 1 of the carbide bound to the free carbon has proved favorable. Similar dependencies could also be found for layers based on chromium carbide, tantalum carbide or molybdenum carbide.
- the material properties (for example modulus of elasticity, structure etc.) of the support layer and the DLC layer are substantially continuously adapted to each other and thus the risk of crack formation along an otherwise occurring metal or Si / DLC interface counteracted.
- the conclusion of the DLC sliding layer can be made by switching off the sputtering and / or bias supply upon reaching a defined flow of the carbon-containing process gas or upon reaching a certain pressure. Another possibility is to keep the coating parameters constant during the last process phase in order to keep the properties of the outer functional layer constant over a desired minimum layer thickness.
- the hardness of the entire carbon layer is set to a value greater than 0.8 GPa, preferably greater than or equal to 10 GPa, and even at layer thicknesses> 1 .mu.m, preferably> 2 .mu.m, an adhesive strength is better on a steel test specimen having a hardness of about 60 HRC or equal to HF 3, but preferably equal to HF 1 according to VDI 3824 sheet 4 is achieved.
- the growth rate is about 1-3 ⁇ m / h and depends, in addition to the process parameters, also on the loading and mounting. In particular, this affects whether the parts to be coated 1-, 2- or 3-turn, on magnetic brackets, or clamped or plugged attached. Also, the total mass and plasma transmittance of the supports is important, for example, with lightly constructed brackets, e.g. achieved by using storage plates, instead of plates made of solid material, higher growth rates and an overall better layer quality.
- the layer stress can be at 0.8 GPa and thus in the usual range of hard DLC layers. Furthermore, such layers, with a slightly lower hardness (9 to 15 GPa), a significantly lower coefficient of friction on the insertion forces occurring reduced.
- these properties can be achieved by adding, for example by co-sputtering, evaporation, alloying to the target materials or the like, small amounts of the elements -S
- Ag, Au, Cu, Fe, Ir, Mo, Ni, Pd, Pt, Os, Rh, Ru, W and / or their alloys are improved and / or stabilized against corrosion / oxidation. If it is desired to achieve particularly good conductive properties, it is advantageous to provide a residual metal content of at least 30 to at most 60%, preferably between 40 and 50%, in the final layer package.
- a metal-containing DLC sliding layer on a CuSn ⁇ bronze in the final, ie outer layer area was formed by means of chromium adhesion layer, but applied without additional support layer.
- a chromium adhesion layer was first applied as in process example 1 of DE 100 18 143.
- the WC targets are run for 6 minutes at constant Ar flow and 3.5 kW power, then the acetylene gas flow is increased to 200 sccm in 11 minutes and held constant for 60 minutes at the parameters described in Table 1. Subsequently, the coating process is stopped.
- Example 2 Differs from Example 1 in that the acetylene gas flow in the last stage of the process in 5 min. only increased to 80 sccm and held there for 60 minutes.
- Example 2 Differs from Example 1 in that the acetylene gas flow in the last process phase in 2 min. increased to 30 sccm and held there for 60 minutes constant.
- Example 5 Differs from Example 1 in that no acetylene added in the last stage of the process and the WC targets are operated after switching off the Cr targets, 60 min at constant Ar flow.
- Example 5 Differs from Example 1 in that no acetylene added in the last stage of the process and the WC targets are operated after switching off the Cr targets, 60 min at constant Ar flow.
- Example 5 a CrN support layer was first deposited and then applied to Example 3 a Me-DLC conductive layer on the support layer.
- the deposition of the CrN supporting layer was carried out in accordance with the parameters given in Table 5), in which case a low-voltage arc discharge ignited in the central axis between a hot cathode and an auxiliary anode was additionally operated to increase the plasma density.
- Example 6 a chromium adhesion layer was first applied as in Example 1. The subsequent WC-containing functional layer was doped with Ag.
- WC targets For activated Cr targets, four WC targets each with 1 kW power are activated and both target types are simultaneously run for 2 minutes, whereby the power of the WC targets is 1 kW within 2 minutes with the Ar flow remaining constant is increased to 3.5 kW.
- Two silver targets also incorporated in the coating system are ignited simultaneously with the WC targets and their power increased from 0 to 1 kW in the same period.
- the negative substrate voltage on the components is ramped up from 0 V applied at the end of the Cr adhesion layer to 300 V in 2 minutes.
- the Cr targets are switched off.
- the WC and Ag targets are operated together for 6 min at constant Ar flow, then the Acetylengaspound in 2 min. increased to 30 sccm and during the last coating phase the parameters according to Table 6 were kept constant for 60 minutes.
- Example 1 is a typical example of an a-C: H: Me or Me-DLC layer, with a strongly increasing C-content towards the surface.
- Example 4 represents a carbide layer, without appreciable amounts of free carbon. The indicated measured values were determined by averaging at 5 different measuring points in each case 10 s after application of a contact weight of 100 g. The tip of the Kunststoff ⁇ weight consists of gold with a diameter of 3 mm. The determination of the individual value was confirmed by a preceding and subsequent reference measurement of gold.
- the frictional force of the connectors was determined on a macro wear test bench for
- Test duration 3000 cycles 25 cycles
- the indication of the frictional force after a defined number of cycles shows the frictional wear of the sample.
- the tinned standard plug has a friction force of 1000 ⁇ iN after 25 cycles. Increasing the number of cycles to more than 30 leads to complete destruction.
- the values for DLC coated connectors are in the third column.
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Contacts (AREA)
- Manufacture Of Switches (AREA)
- Chemical Vapour Deposition (AREA)
- Non-Insulated Conductors (AREA)
- Conductive Materials (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
Description
Kupferhaltiger Leitwerkstoff mit Me-DLC HartstoffbeschichtungCopper-containing material with Me-DLC hard coating
Technisches GebietTechnical area
Die Erfindung betrifft einen Leitwerkstoff aus einer kupfer- haltigen Legierung für den Einsatz als Steck- oder Klemm¬ verbindung gemäss dem Oberbegriff des Anspruchs 1. Ferner ein Kontaktstück nach Anspruch 18, sowie ein Halbzeug nach Anspruch 19 bzw. ein Band oder Profil nach Anspruch 20.The invention relates to a conductive material made of a copper-containing alloy for use as a plug or Klemm¬ connection according to the preamble of claim 1. Further, a contact piece according to claim 18, and a semifinished product according to claim 19 or a band or profile according to claim 20 ,
Stand der TechnikState of the art
Kupferhaltige Leitwerkstoffe sind ebenso aus dem Stand der Technik bekannt, wie die.gute Eignung von Kupferwerkstoffen für das Aufbringen von galvanischen Schichten für die Ober¬ flächenveredelung. Hingegen wurden PVD-, CVD- bzw. PVD/CVD- Schichten bis heute auf den relativ weichen Kupferwerkstoffen wenig eingesetzt, da beispielsweise bei einer Gleitbean¬ spruchung mit hoher Belastung, wie sie auch beim Montieren von Steck- oder Klemmverbindungen vorkommen kann, die Schicht in den Grundwerkstoff gedrückt wird bzw. durchbricht und viele für die Werkzeugbeschichtung eingesetzte Schichtsystem einen zu hohen Reibkoeffizient (beispielsweise haben die Carbide WC, bzw. CrxCy einen Reibkoeffizient von ca. 0.5 und grösser), zu hohe Rauhigkeit oder eine schlechte elektrische Leitfähigkeit aufweisen, die sie für eine derartige Anwendung wenig geeignet macht.Copper-containing conductive materials are also known from the prior art, such as the good suitability of copper materials for the application of galvanic layers for Ober¬ surface refinement. On the other hand, PVD, CVD or PVD / CVD layers have hitherto been used little on the relatively soft copper materials, since, for example, in the case of a sliding stress with high load, as can occur when mounting plug-in or clamped connections, the layer In the base material is pressed or breaks and many used for the tool coating layer system too high a coefficient of friction (for example, the carbides WC, or Cr x Cy have a coefficient of friction of about 0.5 and greater), have too high roughness or poor electrical conductivity which makes them unsuitable for such an application.
DE 1 802 932 offenbart ein Hochfrequenz-Plasma-Verfahren zur Beschichtung von elektrischen Kontakten mit karbidischen Verschleissschutzschichten. Ähnlich DE 3011694, wobei unter anderem das Aufbringen einer galvanischen Haftschicht auf verschiedenen gehärteten oder ausgehärteten metallischen Werk¬ stoffen und eine daran anschliessende PVD-Beschichtung im Hochfrequenzplasma beschrieben wird, bei der unter anderem eine karbidische Hartstoffschicht abgeschieden wird. Dadurch wird eine gute elektrische Leitfähigkeit sowie ein erhöhter Verschleissschütz erreicht, wobei sich aber aus der Carbid- beschichtung ein relativ hoher Reibkoeffizient ergibt.DE 1 802 932 discloses a high-frequency plasma method for coating electrical contacts with carbide wear protection layers. Similar to DE 3011694, wherein inter alia the application of a galvanic adhesive layer on various hardened or hardened metallic Werk¬ materials and an adjoining PVD coating in High-frequency plasma is described in which, inter alia, a carbide hard material layer is deposited. This achieves good electrical conductivity and increased wear protection, but the carbide coating results in a relatively high coefficient of friction.
Aus DE 4421144 sind beschichtete Werkzeuge bekannt, bei denen zur Erhöhung der Standzeit zunächst eine HartstoffSchicht aus Metallcarbid und anschliessend eine freien Kohlenstoff enthaltende ReibminderungsSchicht auf Wolframcarbidbasis aufgebracht wird.From DE 4421144 coated tools are known in which a hard material layer of metal carbide and then a free carbon-containing ReibminderungsSchicht is applied to tungsten carbide base to increase the service life.
Darstellung der ErfindungPresentation of the invention
Der Erfindung liegt die Aufgabe zu Grunde, einen kupferhal- tigen Leitwerkstoff zur Verfügung zu stellen, bei welchem die Nachteile des Standes der Technik vermieden werden und bessere elektrische Eigenschaften sowie ein besseres Standzeit- und Gleitverhalten gegenüber herkömmlich beschichteten Werkstoffen erreicht werden.The invention is based on the object to provide a copper-containing control material, in which the disadvantages of the prior art are avoided and better electrical properties and a better service life and sliding behavior compared to conventionally coated materials are achieved.
Diese Aufgabe wird durch die erfindungsgemässen Merkmale im kennzeichnenden Teil des Anspruchs 1 gelöst.This object is achieved by the inventive features in the characterizing part of claim 1.
Durch die Anwendung erfindungsgemäss modifizierter kohlen¬ stoffhaltiger Gleit- bzw. Hartschichten mit einem Kohlenstoff¬ gehalt grösser oder gleich 40 aber kleiner oder gleich 70 Atomprozent, die auf Kupfer- oder Kupferlegierungen abge¬ schieden werden, ist es möglich die Härte der Oberfläche und damit die Verschleiß- und Abriebfestigkeit der Werkstoffe zu erhöhen, ohne dass sich deren ausgezeichnete elektrische Eigenschaften wesentlich ändern. Als Kohlenstoffgehalt wird dabei der Gehalt an karbidisch gebundenem und freiem Kohlen¬ stoff verstanden, der sich gemeinsam mit dem Karbidbildner und fakultativen weiteren Elementen auf 100% ergänzt. Dabei wird, mit einem wie unten näher beschriebenen Verfahren, eine Hart¬ schicht mit definierten tribologischen und elektrischen Eigen¬ schaften abgeschieden, die zu einer Verlängerung der Standzeit der Leitwerkstoffe führt. Die Schichten sind etwas weniger hart als herkömmliche beispielsweise karbidische Hart¬ schichten, aber deutlich härter als der Trägerwerkstoff und schützen diesen dadurch gegen abrasiven Verschleiß. Über¬ raschenderweise schützen diese Schichten den Trägerwerkstoff bei Steck- und Klemmanwendungen besser als herkömmliche Hart¬ schichtsysteme, wobei für Anwendungen mit hoher Flächen¬ pressung zusätzlich noch eine Stützschicht vorgesehen sein kann. Dies könnte bei vorliegenden Hartschichten auch auf den verhältnismässig niedrigen Reibwert zurückzuführen sein, der sich vorteilhaft beispielsweise bei Verwendung in einer Steck¬ verbindung auswirkt, da damit gleichzeitg die Steckkräfte verringert und ein Zerkratzen eines möglicherweise auch unbeschichteten Gegenstücks verhindert wird.By using according to the invention modified carbon-containing sliding or hard coatings having a carbon content of greater than or equal to 40 but less than or equal to 70 atomic percent, which are deposited on copper or copper alloys, it is possible the hardness of the surface and thus the To increase the wear and abrasion resistance of the materials without significantly changing their excellent electrical properties. The carbon content is understood as meaning the content of carbide-bound and free carbon which, together with the carbide former and additional optional elements added to 100%. In this case, a hard layer having defined tribological and electrical properties is deposited with a method as described in more detail below, which leads to an extension of the service life of the guide materials. The layers are slightly less hard than conventional hard carbides, for example, but significantly harder than the carrier material and thus protect it against abrasive wear. Surprisingly, these layers better protect the carrier material in plug-in and clamping applications than conventional hard-coating systems, wherein a support layer may additionally be provided for applications with high surface pressure. In the case of existing hard coatings, this could also be attributed to the relatively low coefficient of friction, which has advantageous effects, for example when used in a plug connection, since this simultaneously reduces the insertion forces and prevents scratching of a possibly uncoated counterpart.
Gerade diese Eigenschaften machen solche Schichten auch für Anwendungen im Fahrzeug- oder Flugzeugbau bzw. bei allen Anwendungen bei denen Dauerbelastungen durch Vibrationen, Schwingungen oder Ähnlichem unter Umständen auch in Verbindung mit Stossbelastungen auftreten, geeignet. Durch die höhere Stabilität gegenüber herkömmlichen Kupferleitwerkstoffen werden funktionsstörende oder gar funktionsverhindernde Erscheinungen von Oberflächenermüdung an solchen Verbindungs¬ stellen vermieden, die durch die relativ geringe Festigkeit des Kupfers bzw. der vorbekannten beschichteten Kupfer¬ werkstoffe auftreten kann. Weiters können dabei auch Triboxidationserscheinungen, die bei erhöhten Arbeitstempera- turen auftreten und häufig die Ursache für das Versagen von derartigen Steck- und Klemmverbindungen sind, wirkungsvoll verhindert werden. Auf folgenden erfindungsgemäss beschichteten kupferhaltigen Legierungen konnte bis jetzt beim Einsatz als Steck- und Klemmverbindungen eine markante Verbesserung der Belastbarkeit festgestellt werden: Kupfer, Bronze, Messing oder Neusilber. Jedoch sind ähnliche Verbesserungen auch bei Verwendung anderer Grundwerkstoffe wie beispielsweise CuBe und anderen Legierungen, bzw. beim Einsatz für andere Anwendungen zu erwarten.It is precisely these properties that make such layers suitable for applications in vehicle or aircraft construction or in all applications in which continuous loads due to vibrations, oscillations or the like may also occur in conjunction with shock loads. Due to the higher stability compared to conventional copper conductive materials, dysfunctional or even function-preventing phenomena of surface fatigue at joints which can occur due to the relatively low strength of the copper or of the previously coated copper materials are avoided. Furthermore, it is also possible to effectively prevent triboxidation phenomena which occur at elevated working temperatures and are frequently the cause of the failure of such plug and clamp connections. On the following copper-containing alloys coated according to the invention, a marked improvement in the load-bearing capacity could be ascertained up to now when used as push-in and clamp connections: copper, bronze, brass or nickel silver. However, similar improvements are expected when using other base materials such as CuBe and other alloys, or when used for other applications.
Des Weiteren kann es auch vorteilhaft sein, galvanisch vorbe¬ schichtete Leitwerkstoffe zu verwenden. Beispiele dafür sind Cr-, Ni- bzw. CrNi-Schichten, die vor der Stützschicht aufge¬ bracht werden.Furthermore, it may also be advantageous to use galvanically coated conductive materials. Examples of these are Cr, Ni or CrNi layers, which are applied before the support layer.
Aufgrund der niedrigen Abscheidungstemperaturen eignen sich Plasma CVD-, PVD- bzw. PVD/CVD-Hybridverfahren besonders zur Abscheidung von Me-DLC Schichten für die Beschichtung von beispielsweise aushärtbaren Kupferwerkstoffen.Due to the low deposition temperatures, plasma CVD, PVD or PVD / CVD hybrid processes are particularly suitable for the deposition of Me-DLC layers for the coating of, for example, hardenable copper materials.
Allerdings konnte mit herkömmlichen beispielsweise in DE 4421144 beschriebenen freien Kohlenstoff enthaltenden Schichten, bzw. in US4992153 bzw. DE10018143 beschriebenen Me- DLC-Schichten (DLC steht für „diamond like carbon" ) keine ausreichende Leitfähigkeit und ebenso wie bei bekannten Carbidschichten kein ausreichender Schutz gegen ein wie oben erwähntes Eindrücken in den Grundwerkstoff erzielt werden. Erstaunlicherweise konnte nur durch Einstellen des Kohlen¬ stoffgehalts auf grösser oder gleich 40, aber kleiner oder gleich 70 Atomprozent bereits eine wesentliche Verbesserung der Leitfähigkeit erzielt werden. Besonders gute Ergebnisse wurden mit einem Kohlenstoffgehalt grösser oder gleich 50, aber kleiner oder gleich 60 Atomprozent erzielt. Durch Aufbringen einer zusätzlichen Stützschicht, die zumindest ein Metall Me aus den Elementen der Nebengruppe IV, V, und VI des Periodensystems der Elemente (d.h. Ti, Zr, Hf; V, Nb, Ta; Cr, Mo, W) bzw. Aluminium oder Si umfasst, konnte weiters ein Eindrücken auch bei sehr hohen Lasten vermieden werden. Als besonders vorteilhaft haben sich dabei Stütz¬ schichten erwiesen, die neben der metallischen Phase auch noch ein Nichtmetall wie C, N, B, oder 0 bzw. die HartstoffVerbin¬ dungen der Metalle mit diesen Nichtmetallen enthalten. Lediglich beispielhaft seien hier die StützSchichtSysteme TiN bzw. Ti/TiN (d.h. eine metallische Titanschicht mit einer daran anschliessenden Titannitridhartschicht) , CrN bzw. Cr/CrN, CrxCγ bzw. Cr/CrxCy, Crx(CN)γ bzw. Cr/Crx(CN)y, TiAl bzw. TiAlN und TiAl/TiAlN erwähnt.However, with conventional free carbon-containing layers described, for example, in DE 4421144, or Me-DLC layers described in US Pat. No. 4,992,153 or DE10018143 (DLC stands for "diamond-like carbon"), sufficient conductivity could not be afforded and, as is the case with known carbide layers, insufficient protection against Surprisingly, only by adjusting the carbon content to greater than or equal to 40 but less than or equal to 70 atomic percent could a substantial improvement in conductivity be achieved equal to 50 but less than or equal to 60 atomic percent. By applying an additional support layer comprising at least one metal Me from the elements of subgroups IV, V, and VI of the Periodic Table of the Elements (ie Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W) or aluminum or Si included, could further impressions even at very high loads are avoided. Stütz¬ layers have proven to be particularly advantageous in addition to the metallic phase and a non-metal such as C, N, B, or 0 or the HartstoffVerbin¬ containing the metals with these non-metals. Merely by way of example here are the backing layer systems TiN or Ti / TiN (ie, a metallic titanium layer with an adjoining Titannitridhartschicht), CrN or Cr / CrN, Cr x C γ or Cr / Cr x C y, Cr x (CN) γ or Cr / Cr x (CN) y , TiAl or TiAlN and TiAl / TiAlN mentioned.
Allerdings ist dabei je nach Anwendungsfall zu beachten, dass die Stützschicht eine Mindestschichtdicke aufweist. Dies ist vor allem von der je nach Anwendungsfall auftretenden Flächen¬ pressung abhängig. Beispielsweise konnte bei einer geringen Flächenpressung bereits mit Schichtdicken von 0.5 μm eine ausreichende Stützwirkung der DLC-Schicht erreicht werden, während bei einer Stützschicht von 0.3 μm die Stützwirkung nicht mehr ausreichend gegeben war. Im Allgemeinen ist jedoch eine Schichtdicke von zumindest 1 bis ca. 3 μm empfehlenswert. Für Anwendungen bei denen besonders hohe Flächenpressungen auftreten, können auch grossere Schichtdicken beispielsweise 6 μm vorteilhaft sein.However, depending on the application, it should be noted that the support layer has a minimum layer thickness. This depends above all on the surface pressure occurring depending on the application. For example, with a low surface pressure even with layer thicknesses of 0.5 .mu.m, a sufficient supporting effect of the DLC layer could be achieved, while with a support layer of 0.3 .mu.m, the supporting effect was no longer sufficient. In general, however, a layer thickness of at least 1 to about 3 microns is recommended. For applications in which particularly high surface pressures occur, larger layer thicknesses, for example 6 μm, may also be advantageous.
Zusätzlich kann noch zwischen der Stützschicht und der Gleit¬ schicht eine metallische Zwischenschicht mit oder ohne gradiertem Übergang, oder direkt eine ÜbergangsSchicht, beispielsweise in Form einer Gradientenschicht mit gegen die Gleitschicht hin zunehmendem Kohlenstoffgehalt aufgebracht werden .In addition, between the support layer and the sliding layer, a metallic intermediate layer with or without a graded transition, or directly a transition layer, for example in the form of a gradient layer with increasing carbon content towards the sliding layer, can be applied become .
Die DLC-Gleitschicht selbst wird daher vorteilhafterweise wie folgt ausgeführt: Direkt auf der Stützschicht wird eine metallische Zwischenschicht, die zumindest ein Metall Me aus den Elementen der IV, V, VI Nebengruppe, Al oder Si umfasst, abgelegt. Bevorzugt wird eine Zwischenschicht aus den Elementen Cr oder Ti verwendet, die sich für diesen Zweck als besonders geeignet erwiesen haben. Es können aber auch nitridische, karbidische, boridische, oder oxydische Zwischen¬ schichten, bzw. Zwischenschichten, die eine Mischung aus einem oder mehreren Metallen mit einem oder mehreren der genannten Nichtmetalle verwendet werden, die bei Bedarf selbst auf einer metallischen Grundschicht mit oder ohne gradiertem Übergang aufgebaut sein können. Bei Aufbringen der Kohlenstoff - Gleitschicht direkt auf der Haftschicht kann dieser Zwischen¬ schritt unterbleiben, wenn die Haftschicht selbst aus einem Metall oder aus einer als Haftschicht geeigneten Verbindung besteht.The DLC overlay itself is therefore advantageously carried out as follows: Directly on the support layer, a metallic intermediate layer comprising at least one metal Me from the elements of the IV, V, VI subgroup, Al or Si deposited. Preferably, an intermediate layer of the elements Cr or Ti is used, which have been found to be particularly suitable for this purpose. However, it is also possible to use nitridic, carbidic, boridic or oxidic interlayers, or interlayers, which are a mixture of one or more metals with one or more of the said non-metals, which, if required, can be used even on a metallic base layer with or without graded Transition can be constructed. When the carbon-lubricant layer is applied directly to the adhesion layer, this intermediate step can be omitted if the adhesion layer itself consists of a metal or a compound suitable as an adhesion-promoting layer.
Daran, oder alternativ direkt, ohne Zwischenschicht, schliesst sich bevorzugt eine ÜbergangsSchicht insbesondere in Form einer Gradientenschicht an, in deren Verlauf senkrecht zur Werkstückoberfläche der Metallgehalt ab- und der C-Gehalt zunimmt. Der Zuwachs des Kohlenstoffs kann dabei durch Zunahme gegebenenfalls unterschiedlicher karbidischer Phasen, durch Zunahme des freien Kohlenstoffs, bzw. durch eine Mischung derartiger Phasen mit der metallischen Phase der Zwischen¬ schicht erfolgen. Die Dicke der Gradientenschicht kann dabei, wie dem Fachmann bekannt, durch Einstellung geeigneter Prozessrampen eingestellt werden. Die Zunahme des C-Gehalts bzw. Abnahme der metallischen Phase kann kontinuierlich oder stufenweise erfolgen, weiters kann zumindest in einem Teil der Gradientenschicht auch eine Abfolge metallreicher und C- reicher Einzelschichten zum weiteren Abbau von SchichtSpannun¬ gen vorgesehen werden. Beispielsweise kann dabei von einer MeC-Schicht, die beispielsweise durch Sputtern aufgebracht wird, ausgegangen und der Anteil des freien Kohlenstoffs durch Zugabe eines kohlenstoffhaltigen Reaktivgases kontinuierlich oder schrittweise erhöht werden. Dabei hat sich beispielsweise für Schichten auf Wolframkarbidbasis ein Verhältnis von ca. 50:1 bis ca. 2:1 des karbidisch gebundenen zum freien Kohlenstoff als günstig erwiesen. Auch für Schichten auf Chromkarbid-, Tantalkarbid- bzw. Molybdänkarbidbasis konnten ähnliche Abhängigkeiten festgestellt werden.On this, or alternatively directly, without an intermediate layer, a transition layer, in particular in the form of a gradient layer, preferably adjoins, in the course of which, perpendicular to the workpiece surface, the metal content decreases and the C content increases. The increase in the carbon can be effected by increasing possibly different carbide phases, by increasing the free carbon, or by a mixture of such phases with the metallic phase of the intermediate layer. As is known to the person skilled in the art, the thickness of the gradient layer can be adjusted by setting suitable process ramps. The increase of the C-content or decrease of the metallic phase can take place continuously or stepwise, furthermore, at least in one part of the gradient layer, a sequence of metal-rich and C-type metals can also be obtained. rich individual layers for further degradation of SchichtSpannun¬ conditions are provided. For example, it can be based on a MeC layer, which is applied for example by sputtering, and the proportion of free carbon by adding a carbon-containing reactive gas continuously or gradually increased. For tungsten carbide-based layers, for example, a ratio of about 50: 1 to about 2: 1 of the carbide bound to the free carbon has proved favorable. Similar dependencies could also be found for layers based on chromium carbide, tantalum carbide or molybdenum carbide.
Durch die erwähnten Ausbildungen der Gradientenschicht werden die Materialeigenschaften (beispielsweise E-Modul, Struktur etc.) der Stütz- und der DLC-Schicht im wesentlichen kontinuierlich aneinander angepasst und damit der Gefahr der Rissbildung entlang einer sonst auftretenden Metall bzw. Si / DLC-Grenzflache entgegengewirkt.As a result of the mentioned embodiments of the gradient layer, the material properties (for example modulus of elasticity, structure etc.) of the support layer and the DLC layer are substantially continuously adapted to each other and thus the risk of crack formation along an otherwise occurring metal or Si / DLC interface counteracted.
Der Abschluss der DLC-Gleitschicht kann durch Abschalten der Sputter und/oder Biasversorgung bei Erreichen eines definier¬ ten Fluss des kohlenstoffhaltigen Prozessgases oder bei Erreichen eines bestimmten Druckes erfolgen. Ein andere Möglichkeit ist es während der letzten Prozessphase die Beschichtungsparamter konstant zu halten um die Eigenschaften der äusseren FunktionsSchicht über eine gewünschte Mindest- schichtstärke konstant zu halten.The conclusion of the DLC sliding layer can be made by switching off the sputtering and / or bias supply upon reaching a defined flow of the carbon-containing process gas or upon reaching a certain pressure. Another possibility is to keep the coating parameters constant during the last process phase in order to keep the properties of the outer functional layer constant over a desired minimum layer thickness.
Die Härte der gesamten Kohlenstoff-Schicht wird dabei auf einen Wert grösser 0.8 GPa, bevorzugt grösser/gleich 10 GPa eingestellt, wobei auch bei Schichtdicken > 1 um, bevorzugt > 2 um auf einem Stahlprüfkörper mit einer Härte von ca. 60 HRC eine Haftfestigkeit besser oder gleich HF 3, bevorzugt aber gleich HF 1 nach VDI 3824 Blatt 4 erreicht wird. Messungen des Kontaktwiderstands erfindungsgemässer DLC-Schichten ergaben Werte zwischen δ = 0.1 mΩ und δ = 90 mΩ, wobei bevorzugt Werte zwischen 0.5 mΩ und 10 mΩ eingestellt werden, da einerseits δ-Werte kleiner 0.5 mΩ nur durch erhebliche Zusätze von Edelmetallen erzielbar sind, wodurch sich die Herstell¬ kosten deutlich erhöhen und andererseits für einige Anwen¬ dungen ein Kontaktwiderstand grösser 10 mΩ bereits zu gross ist.The hardness of the entire carbon layer is set to a value greater than 0.8 GPa, preferably greater than or equal to 10 GPa, and even at layer thicknesses> 1 .mu.m, preferably> 2 .mu.m, an adhesive strength is better on a steel test specimen having a hardness of about 60 HRC or equal to HF 3, but preferably equal to HF 1 according to VDI 3824 sheet 4 is achieved. Measurements of the contact resistance of inventive DLC layers revealed Values between δ = 0.1 mΩ and δ = 90 mΩ, whereby values between 0.5 mΩ and 10 mΩ are preferably set, since on the one hand δ values of less than 0.5 mΩ can only be achieved by substantial additions of noble metals, whereby the production costs increase significantly and on the other hand, for some applications, a contact resistance of more than 10 mΩ is already too high.
Gleichzeitig zeichnet sich die vorliegende Kohlenstoff-Schicht durch die für Me-Kohlenstoff typischen niedrigen Reib¬ koeffizienten, bevorzugt μ < 0.2 im Stift / Scheibetest bei einer Schichtrauhigkeit von Ra=0.01-0.04; R2 DIN < 0.8 bevorzugt < 0.5 aus .At the same time, the present carbon layer is characterized by the low friction coefficients typical for Me carbon, preferably μ <0.2 in the pencil / Scheib test, with a layer roughness of R a = 0.01-0.04; R 2 DIN <0.8 preferably <0.5.
Die Wachstumsgeschwindigkeit liegt bei etwa 1-3 μm/h und hängt, neben den Prozessparametern, auch von der Beladung und Halterung ab. Insbesonders wirkt sich hierbei aus ob die zu beschichtenden Teile 1-, 2- oder dreifach drehend, auf Magnethalterungen, oder geklemmt bzw. gesteckt befestigt werden. Auch die Gesamtmasse und Plasmadurchgängigkeit der Halterungen ist von Bedeutung, so werden beispielsweise mit leichtgebauten Halterungen, z.B. durch Verwendung von Speichentellern, statt Tellern aus Vollmaterial, höhere Wachstumsgeschwindigkeiten und eine gesamthaft bessere Schichtqualität erzielt. Die Schichtspannung kann bei 0.8 GPa und somit im üblichen Bereich von harten DLC-Schichten liegen. Weiters weisen solche Schichten, bei etwas geringerer Härte (9 bis 15 GPa) , einen deutlich geringeren Reibkoeffizienten auf der die auftretenden Steckkräfte verringert.The growth rate is about 1-3 μm / h and depends, in addition to the process parameters, also on the loading and mounting. In particular, this affects whether the parts to be coated 1-, 2- or 3-turn, on magnetic brackets, or clamped or plugged attached. Also, the total mass and plasma transmittance of the supports is important, for example, with lightly constructed brackets, e.g. achieved by using storage plates, instead of plates made of solid material, higher growth rates and an overall better layer quality. The layer stress can be at 0.8 GPa and thus in the usual range of hard DLC layers. Furthermore, such layers, with a slightly lower hardness (9 to 15 GPa), a significantly lower coefficient of friction on the insertion forces occurring reduced.
Weiters können diese Eigenschaften durch Zugabe, beispiels¬ weise durch Co-Sputtern, -Verdampfen, Zulegieren zu den Targetwerkstoffen oder Ähnlichem, kleiner Mengen der Elemente -S-Furthermore, these properties can be achieved by adding, for example by co-sputtering, evaporation, alloying to the target materials or the like, small amounts of the elements -S
Ag, Au, Cu, Fe, Ir, Mo, Ni, Pd, Pt, Os, Rh, Ru, W und/oder deren Legierungen verbessert und/oder gegen Korrosion/ Oxidation stabilisiert werden. Will man besonders gute Leit¬ eigenschaften erzielen, so ist es vorteilhaft im abschlies- senden Schichtpaket einen Restmetallgehalt von mindestens 30 bis maximal 60 %, bevorzugt zwischen 40 und 50 %, vorzusehen.Ag, Au, Cu, Fe, Ir, Mo, Ni, Pd, Pt, Os, Rh, Ru, W and / or their alloys are improved and / or stabilized against corrosion / oxidation. If it is desired to achieve particularly good conductive properties, it is advantageous to provide a residual metal content of at least 30 to at most 60%, preferably between 40 and 50%, in the final layer package.
Auf Grund der ausgezeichneten mechanischen Eigenschaften solcher metallhaltigen DLC-Schichten können diese auch dann vorteilhaft angewandt werden, wenn zusätzlich eine Lager¬ funktion des beschichteten Leitwerkstoffs erwünscht ist. Beispielsweise können solche Leitwerkstoffe vorteilhaft für Lager angewandt werden, die gleichzeitig der Übertragung elektrischer Signale dienen.Due to the excellent mechanical properties of such metal-containing DLC layers, these can also be used advantageously, if in addition a Lager¬ function of the coated Leitwerkstoffs is desired. For example, such control materials can be advantageously used for bearings which simultaneously serve to transmit electrical signals.
Beispiele und VersucheExamples and experiments
Im folgenden wird die Erfindung anhand verschiedener Ausführungsbeispiele beschrieben. Alle Me-DLC Schichten, bzw. Stützschichten wurden bei Temperaturen von weniger als 250 °C auf Kupferwerkstoffen, in einer, wie in DE 100 18 143 unter Figur 1 und dazugehöriger Beschreibung [0076] bis [0085] modifizierten, Balzers BAI 830 C Produktionsanläge, abgeschieden. Dazu wurde bei allen Beschichtungen eine Vorbehandlung mit einem, wie aus Prozessbeispiel 1 obiger Schrift bekannten Heiz- und Ätzprozess unter Verwendung eines Niedervoltbogens vorgenommen. Die entsprechend bezeichneten Stellen obiger Offenbarungsschrift werden zum integralen Bestandteil vorliegender Anmeldung erklärt.In the following the invention will be described with reference to various embodiments. All Me-DLC layers or support layers were at temperatures of less than 250 ° C on copper materials, in a, as in DE 100 18 143 under Figure 1 and related description [0076] to [0085] modified, Balzers BAI 830 C Produktionsanläge , isolated. For this purpose, in all coatings, a pretreatment was carried out using a heating and etching process known from process example 1 above using a low-voltage arc. The correspondingly designated passages of the above disclosure will become an integral part of the present application.
Vergleichendes Beispiel 1Comparative Example 1
Dabei wurde eine im abschliessenden d.h. äusseren Schicht¬ bereich metallhaltige DLC-Gleitschicht auf einer CuSnδ-Bronze mittels ChromhaftSchicht, aber ohne zusätzliche Stützschicht aufgebracht. Nach der oben erwähnten Vorbehandlung wurde zunächst eine Chromhaftschicht wie in Prozessbeispiel 1 von DE 100 18 143 aufgebracht.In this case, a metal-containing DLC sliding layer on a CuSnδ bronze in the final, ie outer layer area was formed by means of chromium adhesion layer, but applied without additional support layer. After the above-mentioned pretreatment, a chromium adhesion layer was first applied as in process example 1 of DE 100 18 143.
Anschliessend wurden bei aktivierten Cr-Targets sechs WC- Targets mit einer Leistung von jeweils 1 kW aktiviert und beide Targettypen für 2 min gleichzeitig laufengelassen. Dabei wird die Leistung der WC-Targets bei gleich bleibendem Ar- Fluss in 2 Minuten von 1 kW auf 3.5 kW erhöht. Gleichzeitig wird auf den Bauteilen die negative Substratspannung von der am Ende der Cr-Haftschicht angelegten Spannung von 0 V in 2 min rampenförmig auf 300 V erhöht. Die 300 V sind also dann erreicht, wenn die WC-Targets auf höchster Leistung laufen. Anschliessend werden die Cr-Targets abgeschaltet. Die WC- Targets werden 6 min bei konstantem Ar-Fluss und 3.5 kW Leistung laufengelassen, dann wird der Acetylengasfluss in 11 min auf 200 sccm erhöht und 60 Minuten bei den in Tabelle 1 beschriebenen Parametern konstant gehalten. Anschliessend wird der Beschichtungsprozess gestoppt. Subsequently, with activated Cr targets, six WC targets with a power of 1 kW each were activated and both target types were run simultaneously for 2 min. At the same time, the power of the WC targets is increased from 1 kW to 3.5 kW in 2 minutes while maintaining the Ar flow. At the same time, the negative substrate voltage on the components is ramped up from 0 V applied at the end of the Cr adhesion layer to 300 V in 2 minutes. The 300 V are reached when the WC targets are running at full power. Subsequently, the Cr targets are switched off. The WC targets are run for 6 minutes at constant Ar flow and 3.5 kW power, then the acetylene gas flow is increased to 200 sccm in 11 minutes and held constant for 60 minutes at the parameters described in Table 1. Subsequently, the coating process is stopped.
Tabelle 1) Beschichtungsparameter 1 - metallhaltige DLC- SchichtTable 1) Coating parameter 1 - metal-containing DLC layer
Fluss Argon 115 sccmRiver Argon 115 sccm
Fluss Acetylen 200 sccrαFlow of acetylene 200 sccrα
BiasSpannung -300 VBias voltage -300 V
Spulenspannung obere Spule 6 ACoil voltage upper coil 6 A
Spulenspannung untere Spule 0 ACoil voltage lower coil 0 A
Targe11eistung 6 x 3.5 kWTare output 6 x 3.5 kW
Beispiel 2Example 2
Unterscheidet sich von Beispiel 1 dadurch, dass der Acetylen- gasfluss in der letzten Prozessphase in 5 min. nur auf 80 sccm erhöht und dort 60 Minuten konstant gehalten wird.Differs from Example 1 in that the acetylene gas flow in the last stage of the process in 5 min. only increased to 80 sccm and held there for 60 minutes.
Beispiel 3Example 3
Unterscheidet sich von Beispiel 1 dadurch, dass der Acetylen- gasfluss in der letzten Prozessphase in 2 min. auf 30 sccm erhöht und dort 60 Minuten konstant gehalten wird.Differs from Example 1 in that the acetylene gas flow in the last process phase in 2 min. increased to 30 sccm and held there for 60 minutes constant.
Vergleichendes Beispiel 4Comparative Example 4
Unterscheidet sich von Beispiel 1 dadurch, dass in der letzten Prozessphase kein Acethylen zugesetzt und die WC-Targets, nach abschalten der Cr-Targets, 60 min bei konstantem Ar-Fluss betrieben werden. Beispiel 5Differs from Example 1 in that no acetylene added in the last stage of the process and the WC targets are operated after switching off the Cr targets, 60 min at constant Ar flow. Example 5
Für Beispiel 5 wurde zunächst eine CrN-Stützschicht abgeschieden und anschliessend anlog zu Beispiel 3 eine Me- DLC-Leitschicht auf der Stützschicht aufgebracht. Die Abscheidung der CrN-Stützschicht erfolgte gemäss den in Tabelle 5) angegebenen Parmetern, dabei wurde zur Erhöhung der Plasmadichte zusätzlich eine in der zentralen Achse zwischen einer Heisskathode und einer Hilfsanode gezündete Niedervolt- bogenentladung betrieben.For Example 5, a CrN support layer was first deposited and then applied to Example 3 a Me-DLC conductive layer on the support layer. The deposition of the CrN supporting layer was carried out in accordance with the parameters given in Table 5), in which case a low-voltage arc discharge ignited in the central axis between a hot cathode and an auxiliary anode was additionally operated to increase the plasma density.
Tabelle 5) Beschichtungsparameter CrN-StützschichtTable 5) Coating parameters CrN support layer
Beispiel 6Example 6
Für Beispiel 6 wurde zunächst eine Chromhaftschicht wie in Beispiel 1 aufgebracht. Die daran anschliessende WC-haltige Funktionsschicht wurde mit Ag dotiert.For Example 6, a chromium adhesion layer was first applied as in Example 1. The subsequent WC-containing functional layer was doped with Ag.
Dazu werden bei aktivierten Cr-Targets vier WC-Targets mit jeweils 1 kW Leistung aktiviert und beide Targettypen für 2 min gleichzeitig laufengelassen, wobei die Leistung der WC- Targets bei gleich bleibendem Ar-Fluss in 2 Minuten von 1 kW auf 3,5 kW erhöht wird. Zwei ebenfalls in der Beschichtungsan¬ läge eingebaute Silbertargets werden gleichzeitig mit den WC- Targets gezündet und deren Leistung im selben Zeitraum von 0 auf 1 kW erhöht. Gleichzeitig wird auf den Bauteilen die negative SubstratSpannung von der am Ende der Cr-Haftschicht angelegten Spannung von 0 V in 2 min rampenförmig auf 300 V erhöht. Anschliessend werden die Cr-Targets abgeschaltet. Die WC- und Ag-Targets werden gemeinsam 6 min bei konstantem Ar- Fluss betrieben, dann wird der Acetylengasfluss in 2 min. auf 30 sccm erhöht und während der letzten Beschichtungsphase die Parameter gemäss Tabelle 6 für 60 Minuten konstant gehalten.For activated Cr targets, four WC targets each with 1 kW power are activated and both target types are simultaneously run for 2 minutes, whereby the power of the WC targets is 1 kW within 2 minutes with the Ar flow remaining constant is increased to 3.5 kW. Two silver targets also incorporated in the coating system are ignited simultaneously with the WC targets and their power increased from 0 to 1 kW in the same period. At the same time, the negative substrate voltage on the components is ramped up from 0 V applied at the end of the Cr adhesion layer to 300 V in 2 minutes. Subsequently, the Cr targets are switched off. The WC and Ag targets are operated together for 6 min at constant Ar flow, then the Acetylengasfluss in 2 min. increased to 30 sccm and during the last coating phase the parameters according to Table 6 were kept constant for 60 minutes.
Tabelle 6) Beschichtungsparameter metallhaltige DeckschichtTable 6) Coating parameters metal-containing cover layer
Fluss Argon 115 sccmRiver Argon 115 sccm
Fluss Acetylen 30 sccmFlow of acetylene 30 sccm
BiasSpannung -300 VBias voltage -300 V
Spulenspannung obere Spule 6 ACoil voltage upper coil 6 A
Spulenspannung untere Spule 0 ACoil voltage lower coil 0 A
Targetleistung WC 4 x 3.5 kWTarget power WC 4 x 3.5 kW
Targetleistung Ag 2 x 1 kWTarget power Ag 2 x 1 kW
Beurteilung der SchichtenAssessment of the layers
Wie aus Tabelle 7 erkennbar weisen Schichten des Standes der Technik, wie in den vergleichenden Beispielen 1 und 4 beschrieben, einen verhältnismässig hohen Kontaktwiderstand auf. Beispiel 1 steht hierbei als typisches Beispiel einer a- C:H:Me- bzw. Me-DLC-Schicht, mit einem zur Oberfläche hin stark ansteigenden C-Anteil. Beispiel 4 steht für eine Karbid¬ schicht, ohne nennenswerte Anteile an freiem Kohlenstoff. Die angegebenen Messwerte wurden über Mittelwertbildung an 5 verschiedenen Messpunkten jeweils 10 s nach Auflegen eines Kontaktgewicht von 100 g ermittelt. Die Spitze des Kontakt¬ gewichtes besteht aus Gold mit einem Durchmesser von 3 mm. Die Bestimmung des Einzelwerts wurde durch eine vor- und nachher¬ gehende Referenzmessung an Gold bestätigt.As can be seen from Table 7, layers of the prior art, as described in Comparative Examples 1 and 4, have a relatively high contact resistance. Example 1 is a typical example of an a-C: H: Me or Me-DLC layer, with a strongly increasing C-content towards the surface. Example 4 represents a carbide layer, without appreciable amounts of free carbon. The indicated measured values were determined by averaging at 5 different measuring points in each case 10 s after application of a contact weight of 100 g. The tip of the Kontakt¬ weight consists of gold with a diameter of 3 mm. The determination of the individual value was confirmed by a preceding and subsequent reference measurement of gold.
Die Ermittlung der Reibkraft der Steckverbindungen erfolgte auf einem Makroverschleissprüfstand fürThe frictional force of the connectors was determined on a macro wear test bench for
DLC-Stecker StandardsteckerDLC plug standard plug
(verzinnt)(tinned)
Probengeometrie rider on flat rider on flatSample geometry rider on flat rider on flat
Durchmesser des riders 4 mm 4 mmDiameter of the rider 4 mm 4 mm
Kontaktfläche 0.3 mm2 0.3 mm2 Contact area 0.3 mm 2 0.3 mm 2
Prüfatmosphäre trocken trockenTest atmosphere dry dry
Frequenz 1 Zyklus in 2.5 s 1 Zyklus in 2.5 sFrequency 1 cycle in 2.5 s 1 cycle in 2.5 s
Prüfdauer 3000 Zyklen 25 ZyklenTest duration 3000 cycles 25 cycles
Normalkraft 20 N 5 NNormal force 20 N 5 N
Reibweg 3 mm 3 mmFriction travel 3 mm 3 mm
Die Angabe der Reibkraft nach einer definierten Zyklenzahl zeigt den Reibverschleiss der Probe. Der verzinnte Standard¬ stecker hat nach 25 Zyklen eine Reibkraft von 1000 πiN. Eine Erhöhung der Zyklenzahl auf mehr als 30 führt zu einer voll¬ ständigen Zerstörung. Die Werte für DLC beschichtete Stecker befinden sich in der dritten Spalte.The indication of the frictional force after a defined number of cycles shows the frictional wear of the sample. The tinned standard plug has a friction force of 1000 πiN after 25 cycles. Increasing the number of cycles to more than 30 leads to complete destruction. The values for DLC coated connectors are in the third column.
Überraschenderweise zeigte sich in den Versuchen, dass Schichten deren Anteil an freiem Kohlenstoff in einem Zwischenbereich liegt (Beispiele 2 bis 3), einen deutlich geringeren Kontaktwiderstand aufweisen. Dieser geringe Kontaktwiderstand blieb auch bei Aufbringen einer zusätzlichen CrN-Stützschicht wie in Beispiel 5 angegeben erhalten. Durch Co-Sputtern von Ag wie in Beispiel 6 beschrieben konnte der Kontaktwiderstand noch weiter abgesenkt werden.Surprisingly, it was found in the experiments that layers whose proportion of free carbon is in an intermediate range (Examples 2 to 3), have a significantly lower contact resistance. This low Contact resistance was also maintained when applying an additional CrN support layer as indicated in Example 5. By co-sputtering Ag as described in Example 6, the contact resistance could be further lowered.
Tabelle 7) Kontaktwiderstand und Reibkraft unterschiedlicher DLC-Schichten:Table 7) Contact resistance and frictional force of different DLC layers:
Claims
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PCT/CH2005/000333 WO2006005200A1 (en) | 2004-07-09 | 2005-06-15 | CONDUCTIVE MATERIAL COMPRISING AN Me-DLC HARD MATERIAL COATING |
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EP1980645A1 (en) * | 2007-04-13 | 2008-10-15 | Ralf Stein | Method for applying a multi-layer coating to workpieces and/or work materials |
DE102007047629A1 (en) * | 2007-04-13 | 2008-10-16 | Stein, Ralf | Method of applying a high-strength coating to workpieces and / or materials |
DE102008042747A1 (en) * | 2008-10-10 | 2010-04-15 | Federal-Mogul Burscheid Gmbh | Sliding element in an internal combustion engine, in particular piston ring |
US8449995B2 (en) | 2009-03-31 | 2013-05-28 | Seagate Technology Llc | Corrosion resistant coating for copper substrate |
DE102010004853B4 (en) | 2010-01-16 | 2017-11-16 | Schaeffler Technologies AG & Co. KG | Electrically insulated rolling bearing |
JP5049358B2 (en) * | 2010-01-25 | 2012-10-17 | 株式会社神戸製鋼所 | Method for producing a tungsten-containing diamond-like carbon film on a base material of a contact probe pin for a semiconductor inspection apparatus |
BR112013021804A2 (en) * | 2011-03-02 | 2017-03-28 | Oerlikon Trading Ag Trübbach | "Sliding component comprising coating intended to be at least partially in contact with lubricant, its tribological system and its use" |
CN102644042A (en) * | 2012-04-11 | 2012-08-22 | 燕山大学 | A kind of method improving electrical conductivity of copper-chromium alloy |
CA2918538A1 (en) * | 2013-07-19 | 2015-01-22 | Oerlikon Surface Solutions Ag, Trubbach | Coatings for forming tools |
CN103509964B (en) * | 2013-09-18 | 2015-10-14 | 温州银泰合金材料有限公司 | Rare earth alloy electrical contact terminal and production method thereof |
JP2016128599A (en) * | 2015-01-09 | 2016-07-14 | 株式会社神戸製鋼所 | Diamond-like carbon layer laminate and method for manufacturing the same |
WO2019099299A1 (en) * | 2017-11-15 | 2019-05-23 | Lintec Of America, Inc. | Nanofiber sheet holder |
CN108359954A (en) * | 2018-04-16 | 2018-08-03 | 中国科学院宁波材料技术与工程研究所 | Carbon-base film and preparation method thereof |
CN109930120B (en) * | 2018-12-20 | 2020-12-25 | 兰州空间技术物理研究所 | Intelligent composite lubricating film for surfaces of space movable parts and preparation method thereof |
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