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EP1619555A4 - Porous underlayer film and underlayer film forming composition used for forming the same - Google Patents

Porous underlayer film and underlayer film forming composition used for forming the same

Info

Publication number
EP1619555A4
EP1619555A4 EP04727980A EP04727980A EP1619555A4 EP 1619555 A4 EP1619555 A4 EP 1619555A4 EP 04727980 A EP04727980 A EP 04727980A EP 04727980 A EP04727980 A EP 04727980A EP 1619555 A4 EP1619555 A4 EP 1619555A4
Authority
EP
European Patent Office
Prior art keywords
underlayer film
forming
same
composition used
porous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP04727980A
Other languages
German (de)
French (fr)
Other versions
EP1619555A1 (en
Inventor
S Takei
Y Sakaida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Chemical Corp
Original Assignee
Nissan Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Chemical Corp filed Critical Nissan Chemical Corp
Publication of EP1619555A1 publication Critical patent/EP1619555A1/en
Publication of EP1619555A4 publication Critical patent/EP1619555A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP04727980A 2003-04-17 2004-04-16 Porous underlayer film and underlayer film forming composition used for forming the same Withdrawn EP1619555A4 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003112667 2003-04-17
PCT/JP2004/005446 WO2004092840A1 (en) 2003-04-17 2004-04-16 Porous underlayer film and underlayer film forming composition used for forming the same

Publications (2)

Publication Number Publication Date
EP1619555A1 EP1619555A1 (en) 2006-01-25
EP1619555A4 true EP1619555A4 (en) 2007-09-12

Family

ID=33296062

Family Applications (1)

Application Number Title Priority Date Filing Date
EP04727980A Withdrawn EP1619555A4 (en) 2003-04-17 2004-04-16 Porous underlayer film and underlayer film forming composition used for forming the same

Country Status (7)

Country Link
US (1) US7365023B2 (en)
EP (1) EP1619555A4 (en)
JP (1) JP4471123B2 (en)
KR (1) KR101148918B1 (en)
CN (1) CN1774673B (en)
TW (1) TWI352261B (en)
WO (1) WO2004092840A1 (en)

Families Citing this family (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1995035572A1 (en) 1994-06-20 1995-12-28 Neomagic Corporation Graphics controller integrated circuit without memory interface
EP1780600B1 (en) * 2004-07-02 2014-02-26 Nissan Chemical Industries, Ltd. Lower layer film forming composition for lithography including naphthalene ring having halogen atom
JP2006133315A (en) * 2004-11-02 2006-05-25 Matsushita Electric Ind Co Ltd Planarization material, anti-reflection coating formation material, and method of manufacturing semiconductor device using them
JP4736522B2 (en) * 2005-04-28 2011-07-27 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
JP4742665B2 (en) * 2005-04-28 2011-08-10 旭硝子株式会社 Method of manufacturing processed substrate processed by etching
KR100628248B1 (en) * 2005-09-13 2006-09-27 동부일렉트로닉스 주식회사 Manufacturing Method of Semiconductor Device
JP4788415B2 (en) * 2006-03-15 2011-10-05 ソニー株式会社 Manufacturing method of semiconductor device
US20070231736A1 (en) * 2006-03-28 2007-10-04 Chen Kuang-Jung J Bottom antireflective coating composition and method for use thereof
US7765046B2 (en) 2006-12-28 2010-07-27 Fujitsu Ten Limited In-vehicle electronic apparatus and in-vehicle electronic system
US7684200B2 (en) 2006-12-28 2010-03-23 Fujitsu Ten Limited Electronic apparatus and electronic system
US7904236B2 (en) 2006-12-28 2011-03-08 Fujitsu Ten Limited Electronic apparatus and electronic system
US7860643B2 (en) 2006-12-28 2010-12-28 Fujitsu Ten Limited In-vehicle detachably electronic apparatus and in-vehicle electronic system
US20080159557A1 (en) * 2006-12-27 2008-07-03 Fujitsu Ten Limited Electronic apparatus, electronic system and method of controlling sound output
JP4842785B2 (en) * 2006-12-04 2011-12-21 富士通テン株式会社 In-vehicle electronic system and in-vehicle electronic device
US8706396B2 (en) * 2006-12-28 2014-04-22 Fujitsu Ten Limited Electronic apparatus and electronic system
US7774104B2 (en) 2006-12-27 2010-08-10 Fujitsu Ten Limited Electronic apparatus and electronic system
US20080157999A1 (en) * 2006-12-28 2008-07-03 Fujitsu Ten Limited Electronic apparatus, electronic system and method of controlling audio output
US20080161950A1 (en) * 2006-12-28 2008-07-03 Fujitsu Ten Limited Electronic system, electronic apparatus and method of operating audio unit
DE102006059860A1 (en) * 2006-12-15 2008-06-19 Ewald Dörken Ag Process for producing porous films and film material produced therefrom
US7869196B2 (en) * 2006-12-28 2011-01-11 Fujitsu Ten Limited Electronic apparatus
US7960708B2 (en) * 2007-03-13 2011-06-14 University Of Houston Device and method for manufacturing a particulate filter with regularly spaced micropores
JP5185312B2 (en) 2010-03-19 2013-04-17 株式会社東芝 Pattern formation method
US9678427B2 (en) * 2013-12-27 2017-06-13 Nissan Chemical Industries, Ltd. Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chain
US9229326B2 (en) * 2014-03-14 2016-01-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method for integrated circuit patterning
CN107430123B (en) 2014-11-28 2020-04-14 通用电气健康护理生物科学股份公司 Methods for detecting analyte-ligand binding on sensor surfaces
CN114373878B (en) * 2020-10-14 2023-10-20 北京京东方技术开发有限公司 Manufacturing method of patterned quantum dot luminescent layer and manufacturing method of luminescent device
US20240319599A1 (en) * 2023-03-24 2024-09-26 Inpria Corporation Gas releasing underlayers for photopatternable organometallic resist

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010021726A1 (en) * 1997-09-02 2001-09-13 Brown James F. Porous surface compositions and methods of retaining biological samples on said surface

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2913715B2 (en) * 1989-12-28 1999-06-28 日本板硝子株式会社 Antireflection film and method of forming the same
KR950007478B1 (en) * 1992-06-17 1995-07-11 금성일렉트론주식회사 Anti reflective method in metal mask step
US5443938A (en) * 1992-09-25 1995-08-22 Brother Kogyo Kabushiki Kaisha Photosensitive printing member having ink-receptive capillary structures in the support and photosensitive layer
US5693691A (en) * 1995-08-21 1997-12-02 Brewer Science, Inc. Thermosetting anti-reflective coatings compositions
US5994430A (en) * 1997-04-30 1999-11-30 Clariant Finance Bvi) Limited Antireflective coating compositions for photoresist compositions and use thereof
TW473653B (en) * 1997-05-27 2002-01-21 Clariant Japan Kk Composition for anti-reflective film or photo absorption film and compound used therein
US5919599A (en) * 1997-09-30 1999-07-06 Brewer Science, Inc. Thermosetting anti-reflective coatings at deep ultraviolet
US6410209B1 (en) * 1998-09-15 2002-06-25 Shipley Company, L.L.C. Methods utilizing antireflective coating compositions with exposure under 200 nm
US6114085A (en) 1998-11-18 2000-09-05 Clariant Finance (Bvi) Limited Antireflective composition for a deep ultraviolet photoresist
US6316165B1 (en) 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
ATE305057T1 (en) * 1999-04-14 2005-10-15 Allied Signal Inc NANO-POROUS MATERIAL WITH LOW DILECTRIC CONSTANT OBTAINED BY POLYMER DEGRADATION
US6824879B2 (en) * 1999-06-10 2004-11-30 Honeywell International Inc. Spin-on-glass anti-reflective coatings for photolithography
ATE391303T1 (en) * 1999-09-28 2008-04-15 Fujifilm Corp ANTIREFLEX COATING, POLARIZATION PLATE PROVIDED THEREFROM, AND IMAGE DISPLAY DEVICE WITH THE ANTIREFLEX COATING OR WITH THE POLARIZATION PLATE
FR2803245B1 (en) * 1999-12-31 2002-12-20 Rollin Sa COMPRESSIBLE PLATE FOR FLEXOGRAPHIC PRINTING AND PROCESS FOR OBTAINING
US6686031B2 (en) * 2000-02-23 2004-02-03 Fuji Photo Film Co., Ltd. Hard coat film and display device having same
JP3784234B2 (en) 2000-03-24 2006-06-07 独立行政法人科学技術振興機構 Antireflection film comprising silica film and method for producing the same
US6461717B1 (en) 2000-04-24 2002-10-08 Shipley Company, L.L.C. Aperture fill
JP4654544B2 (en) 2000-07-12 2011-03-23 日産化学工業株式会社 Gap fill material forming composition for lithography
EP1172695A1 (en) 2000-07-14 2002-01-16 Shipley Company LLC Barrier layer
JP2002081328A (en) * 2000-09-06 2002-03-22 Mikuni Corp Throttle body for internal combustion engine
JP2002207296A (en) 2000-11-08 2002-07-26 Jsr Corp Composition for resist lower layer film, method for manufacturing the same and resist lower film and method for manufacturing the same
JP2002207295A (en) * 2000-11-08 2002-07-26 Jsr Corp Composition for resist lower layer film, resist lower layer film and method for manufacturing the same
JP3568158B2 (en) 2000-12-20 2004-09-22 東京応化工業株式会社 Protective film forming material
EP1478682A4 (en) * 2001-11-15 2005-06-15 Honeywell Int Inc Anti-reflective coatings for photolithography and methods of preparation thereof
JP3549108B2 (en) * 2002-02-14 2004-08-04 大日本印刷株式会社 Anti-reflective porous optical material
JP3813890B2 (en) * 2002-03-22 2006-08-23 富士写真フイルム株式会社 Intermediate layer material composition for three-layer resist process and pattern forming method using the same
KR20050040275A (en) * 2003-10-28 2005-05-03 삼성전자주식회사 Composition for forming dielectric film and method for forming dielectric film or pattern using the same
CN1926471B (en) * 2004-03-02 2010-09-08 旭化成电子材料株式会社 Photosensitive structure for flexographic printing and process for producing the same

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20010021726A1 (en) * 1997-09-02 2001-09-13 Brown James F. Porous surface compositions and methods of retaining biological samples on said surface

Also Published As

Publication number Publication date
US20060211256A1 (en) 2006-09-21
KR20060004673A (en) 2006-01-12
CN1774673A (en) 2006-05-17
US7365023B2 (en) 2008-04-29
JPWO2004092840A1 (en) 2006-07-06
TWI352261B (en) 2011-11-11
KR101148918B1 (en) 2012-05-22
EP1619555A1 (en) 2006-01-25
TW200500810A (en) 2005-01-01
CN1774673B (en) 2010-09-29
JP4471123B2 (en) 2010-06-02
WO2004092840A1 (en) 2004-10-28

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Legal Events

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PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

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17P Request for examination filed

Effective date: 20051107

AK Designated contracting states

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Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL HR LT LV MK

DAX Request for extension of the european patent (deleted)
RBV Designated contracting states (corrected)

Designated state(s): DE FR GB IT NL

A4 Supplementary search report drawn up and despatched

Effective date: 20070816

17Q First examination report despatched

Effective date: 20071227

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

RTI1 Title (correction)

Free format text: POROUS UNDERLAYER FILM FORMING COMPOSITION AND METHOD FOR FORMING PHOTORESIST PATTERN

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20111230