[go: up one dir, main page]

EP1579034A4 - Semiconductive corrosion and fouling control apparatus, system, and method - Google Patents

Semiconductive corrosion and fouling control apparatus, system, and method

Info

Publication number
EP1579034A4
EP1579034A4 EP03808972A EP03808972A EP1579034A4 EP 1579034 A4 EP1579034 A4 EP 1579034A4 EP 03808972 A EP03808972 A EP 03808972A EP 03808972 A EP03808972 A EP 03808972A EP 1579034 A4 EP1579034 A4 EP 1579034A4
Authority
EP
European Patent Office
Prior art keywords
semiconductive
corrosion
control apparatus
fouling control
fouling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03808972A
Other languages
German (de)
French (fr)
Other versions
EP1579034A1 (en
Inventor
Farshad Khorrami
David B Dowling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Semiconductor International Ltd
Original Assignee
Applied Semiconductor International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/291,770 external-priority patent/US6811681B2/en
Application filed by Applied Semiconductor International Ltd filed Critical Applied Semiconductor International Ltd
Publication of EP1579034A1 publication Critical patent/EP1579034A1/en
Publication of EP1579034A4 publication Critical patent/EP1579034A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F13/00—Inhibiting corrosion of metals by anodic or cathodic protection
    • C23F13/02—Inhibiting corrosion of metals by anodic or cathodic protection cathodic; Selection of conditions, parameters or procedures for cathodic protection, e.g. of electrical conditions
    • C23F13/04—Controlling or regulating desired parameters

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Prevention Of Electric Corrosion (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Testing Resistance To Weather, Investigating Materials By Mechanical Methods (AREA)
EP03808972A 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system, and method Withdrawn EP1579034A4 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US291770 1988-12-29
US27173402A 2002-10-17 2002-10-17
US271734 2002-10-17
US10/291,770 US6811681B2 (en) 2002-11-12 2002-11-12 Semiconductive corrosion and fouling control apparatus, system, and method
PCT/US2003/029133 WO2004035865A1 (en) 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system, and method

Publications (2)

Publication Number Publication Date
EP1579034A1 EP1579034A1 (en) 2005-09-28
EP1579034A4 true EP1579034A4 (en) 2008-07-02

Family

ID=32109814

Family Applications (1)

Application Number Title Priority Date Filing Date
EP03808972A Withdrawn EP1579034A4 (en) 2002-10-17 2003-10-17 Semiconductive corrosion and fouling control apparatus, system, and method

Country Status (6)

Country Link
EP (1) EP1579034A4 (en)
JP (1) JP5009502B2 (en)
AU (1) AU2003276888B2 (en)
CA (1) CA2502465C (en)
EA (1) EA007147B1 (en)
WO (1) WO2004035865A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7318889B2 (en) * 2005-06-02 2008-01-15 Applied Semiconductor International, Ltd. Apparatus, system and method for extending the life of sacrificial anodes on cathodic protection systems
WO2007120087A1 (en) * 2006-04-19 2007-10-25 Volvo Technology Corporation Method for predicting an impact of an aging behaviour of an electrical element and simulation model for simulating such behaviour
RU2486288C2 (en) * 2011-08-11 2013-06-27 Анатолий Александрович Анашкин Device for pulsed cathodic protection
JP5980437B2 (en) 2012-10-11 2016-08-31 エコスペック グローバル テクノロジー ピーティーイー エルティーディー． System and method for preventing corrosion of metal structures using time-varying electromagnetic waves
RU2618968C1 (en) * 2015-10-13 2017-05-11 Александр Петрович Молодцов Device for power and automatic control of output current system of cathodic protection system from corrosion of metal constructions
RU170510U1 (en) * 2016-07-28 2017-04-26 Федеральное государственное бюджетное образовательное учреждение высшего образования "Омский государственный университет путей сообщения" AUTOMATIC DRAINAGE INSTALLATION
RU2735162C1 (en) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Device for protection of object against action of space
RU2735223C1 (en) * 2020-03-25 2020-10-28 Федеральное государственное унитарное предприятие "Всероссийский научно-исследовательский институт автоматики им. Н.Л.Духова"(ФГУП "ВНИИА") Device for protection of object against action of space

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002006563A1 (en) * 2000-07-18 2002-01-24 Applied Semiconductor, Inc. Method and system of preventing fouling and corrosion of biomedical devices and structures
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
WO2002101117A1 (en) * 2001-06-08 2002-12-19 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6551491B2 (en) * 2000-06-02 2003-04-22 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002006563A1 (en) * 2000-07-18 2002-01-24 Applied Semiconductor, Inc. Method and system of preventing fouling and corrosion of biomedical devices and structures
US6402933B1 (en) * 2001-06-08 2002-06-11 Applied Semiconductor, Inc. Method and system of preventing corrosion of conductive structures
WO2002101117A1 (en) * 2001-06-08 2002-12-19 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion
US6562201B2 (en) * 2001-06-08 2003-05-13 Applied Semiconductor, Inc. Semiconductive polymeric system, devices incorporating the same, and its use in controlling corrosion

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
No further relevant documents disclosed *
See also references of WO2004035865A1 *

Also Published As

Publication number Publication date
CA2502465A1 (en) 2004-04-29
WO2004035865A1 (en) 2004-04-29
CA2502465C (en) 2011-09-27
WO2004035865A9 (en) 2004-06-17
JP2006503184A (en) 2006-01-26
JP5009502B2 (en) 2012-08-22
EP1579034A1 (en) 2005-09-28
EA007147B1 (en) 2006-08-25
AU2003276888B2 (en) 2008-04-17
AU2003276888A1 (en) 2004-05-04
EA200500665A1 (en) 2005-10-27

Similar Documents

Publication Publication Date Title
EP1604794A4 (en) Substrate-cutting system, substrate-producing apparatus, substrate-scribing method, and substrate-cutting method
AU2003283762A1 (en) Object positioning system, object positioning apparatus and object positioning method
AU2003220518A8 (en) Transcoding apparatus, system, and method
EP1665688A4 (en) Device control system, method, and apparatus
AU2003275045A8 (en) Knowledge system method and apparatus
EP1614087A4 (en) System, apparatus and method for mapping
EP1482480A4 (en) Learning apparatus, learning method, and robot apparatus
GB0506966D0 (en) Isometric system, method and apparatus
EP1486300A4 (en) Robot behavior control system, behavior control method, and robot device
AU2002344640A1 (en) Application creation system, creation apparatus, creation method, application providing system, providing apparatus, providing method, application operation system, operation apparatus, and operation method
AU2003299948A8 (en) System and method for rendering content on multiple devices
SG111296A1 (en) Apparatus, system, and method for video encoder rate control
IL162740A0 (en) Device, method and system for reduced transmissionimaging
EP1575184A4 (en) Communication system, communication apparatus and communication method
GB0224050D0 (en) Completion system, apparatus and method
HK1081429A1 (en) System, device and method for ventilation
AU2003303267A1 (en) Positioning system, apparatus and method
AU2003284091A8 (en) Connection verification apparatus, system, and method
EP1664474B8 (en) Drilling apparatus, method, and system
AU2003232940A1 (en) Method and apparatus for monitoring corrosion
AU2003265314A1 (en) Apparatus, system, and method for alarm systems
AU2003266045A1 (en) Method and apparatus for treating water
EP1579034A4 (en) Semiconductive corrosion and fouling control apparatus, system, and method
AU2003217487A1 (en) Image processing apparatus and its method, and image processing system and its control method
EP1540108A4 (en) Cladding apparatus, method and system

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20050504

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LI LU MC NL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL LT LV MK

DAX Request for extension of the european patent (deleted)
A4 Supplementary search report drawn up and despatched

Effective date: 20080530

17Q First examination report despatched

Effective date: 20130701

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN

18D Application deemed to be withdrawn

Effective date: 20140114