EP1045409A2 - Electrodes for electrolytic capacitors and production process thereof - Google Patents
Electrodes for electrolytic capacitors and production process thereof Download PDFInfo
- Publication number
- EP1045409A2 EP1045409A2 EP00107518A EP00107518A EP1045409A2 EP 1045409 A2 EP1045409 A2 EP 1045409A2 EP 00107518 A EP00107518 A EP 00107518A EP 00107518 A EP00107518 A EP 00107518A EP 1045409 A2 EP1045409 A2 EP 1045409A2
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- EP
- European Patent Office
- Prior art keywords
- substrate
- aluminium
- roll
- aluminium oxide
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/042—Electrodes or formation of dielectric layers thereon characterised by the material
- H01G9/045—Electrodes or formation of dielectric layers thereon characterised by the material based on aluminium
Definitions
- the present invention refers to electrodes for electrolytic capacitors and their production process.
- This object is solved by the present invention providing a process for the production of an electrode for electrolytic capacitors made of a conductive substrate onto which a porous layer of aluminium oxide is deposited on both sides in an at least two-phase process.
- This process consists of at least a vacuum deposition of unstoichiometric aluminium oxide in a reactive atmosphere and a following surface oxidation process by a treatment under reactive plasma.
- a further advantageous aspect of the invention is the creation of spongy structures showing a high specific area, which are stabilized by a process of plasma oxidation by means of a material addition technique.
- a pretreatment under reactive plasma in an oxidizing atmosphere is applied to the substrate prior to the vacuum deposition of aluminium oxide in order to clean and activate the substrate surface and to enable and enhance reliable attachment of aluminium oxide thereon.
- the deposition of unstoichiometric aluminium oxide is obtained by a reaction of evaporated aluminium at controlled rate and oxygen at controlled flow, the two sides of the substrate being guided at a predetermined angle with respect to each other and to the cloud of aluminium vapour.
- the guide device has an unwinding roll from which the substrate is unrolled, a rewinding roll on which the treated substrate is rolled and a plurality of guide rollers defining a mainly angled, spiral or wound spiral guide path for the substrate from the unwinding roll to the rewinding roll and a dome disposed above a source of aluminium vapour, the two inner sides of the dome exposed to the aluminium vapour belonging to the opposed surface sides of the substrate.
- both sides of the substrate are automatically exposed to the vapour of aluminium oxide in one process with one aluminium source only.
- the following treatment under reactive plasma can be performed according to the present invention in a chamber in an oxygen atmosphere at low pressure, the substrate being guided through said chamber in continuous operation.
- the substrate being guided through said chamber in continuous operation.
- only two rolls for unwinding and rewinding the substrate are needed, the substrate being tightened between the two rolls while passing through the chamber.
- the substrate is preferably submitted to the final anodic oxidation process.
- Such can be performed in a solution of ammonium adipate at a voltage between about 8 and 140 V.
- the invention is related to a "Roll-to-Roll"-system for the production of an electrode for electrolytic capacitors being disposed in a vacuum deposition chamber having inlet and outlet ports and a guide device with an unwinding roll, a rewinding roll and a plurality of guide rollers defining a mainly angled, spiral or wound guide path for the substrate from the unwinding roll to the rewinding roll and a dome disposed above a source of metallic, e.g. aluminium, vapour, the two inner sides of the dome exposed to the vapour belonging to the opposed surface sides of the substrate.
- a source of metallic e.g. aluminium, vapour
- the present invention is related as well to an electrode for electrolytic capacitors made of a conductive substrate with an unstoichiometric porous layer of aluminium oxide on both sides which is produced in a process described above.
- the electrode preferably has a layer of aluminium oxide with a dendritic structure.
- the electrode for electrolytic capacitors obtained by the process described below is made of a conductive substrate 7, e.g. an aluminium foil with purity between 99.5% and 99.99%.
- the substrate 7 is disposed on an unwinding roll 1 placed in a manufacturing "Roll-to-Roll"-system (Fig.1). During its unwinding, the substrate 7 is in a first phase pretreated under plasma 2 generated by a RF between 50 and 500 kHz in the presence of oxygen that is as well necessary for a further step of the reaction.
- This pretreatment is advantageous in order to increase the adhesion of the dendritic porous structure which is building-up during the following phase of reaction as well as to level the distribution on the substrate surfaces. Further, this pretreatment eliminates all possible pollution agents. Without such a pretreatment, the following dendritic growth occurs in a manner that it is not so uniform. The pretreatment is therefore important for obtaining the final product.
- the deposition of unstoichiometric aluminium oxide on both surface sides of the substrate takes place in a reactive atmosphere, obtained by the reaction between aluminium vapour coming from source 3 and oxygen blown into the reaction chamber 6 by two distributing inlet ports 4.
- the flow of oxygen shall be collimated with respect to the material of the beam of the vaporized aluminium.
- the distance between the substrate 7 and the inlet ports 4 of the reactive gas might be changed, thus obtaining a different dendritic morphology.
- the ratio between aluminium and oxygen is kept constant by checking the partial pressures of the oxygen and the cloud of aluminium vapour.
- the partial pressure of aluminium is kept constant by checking the oxygen inlet flow while keeping the partial vapour pressure constant by checking the deposition rate.
- the deposition method might be of thermal type, Joule effect or by electron gun.
- the two sides of the substrate are guided with a certain angle shot between the substrate itself and the cloud of aluminium vapour.
- the deposition rate of aluminium By changing the deposition rate of aluminium, the oxygen partial pressure and the incidence angle, spiral or wound between the substrate and the cloud of aluminium vapour, different stoichiometrics of deposited aluminium are obtained as well as different dendritic morphologies. For instance, by a chamber pressure, due to gas emission between 1 and 3 x 10 -2 Pa, a deposition rate between 3 and 5 g/minute of aluminium and an angle between the substrate 7 and the cloud of aluminium vapour of about 45° and 70°, the effective area increases by a factor of 200 to 500 with respect to the apparent geometric area.
- the substrate 7 is positioned on a guide device 8, so that it passes first the aluminium source 3 with one side and afterwards with the other side after a turn of substrate 7 around guide rollers 9. Finally, the substrate 7 is rolled on the rewinding roll 5. In this way, a simultaneous deposition of aluminium oxide occurs on both sides of the substrate 7.
- the rewinding roll 5 is then removed from the guide device 8 and submitted to an additional treatment described hereafter.
- the substrate 7 undergoes an additional process of surface oxidation by a treatment under active plasma.
- the substrate 7 is unrolled from roll 5, run through chamber 10 and rolled on a new roll 11.
- a plasma is created in an oxygen atmosphere at low pressure using a RF from 50 to 500 kHz and a power from 2 to 3 KVA. Scope of this last process is to increase the ratio of oxygen with regard to the aluminium on the surface. It has been experimentally ascertained that this enrichment of surface oxygen accounts for the stability of the dendritic structure over time, i.e. stability of the electric capacitance.
- the substrate 7 onto which this dendritic structure 12 was deposited by the above described process might now be used as anodic or cathodic electrode for electrolytic capacitors.
- the dendritic structure When used as an anodic electrode, it preferably undergoes an anodic oxidation process in a solution of ammonium adipate at 10% in weight of concentration.
- the anodic oxidation at a fixed voltage between about 8 and 140 V enables the creation of an aluminium oxide barrier, which forms the dielectric of the electrolytic capacitor.
- the value of the specific, electric capacitance per surface unit obtained after the anodic oxidation depends on the morphology of the dendritic layer obtained by the above mentioned processes. It was experimentally noticed that the capacitance value worsens over time without the oxidation process under plasma, losing about 30% of the initial value after a month since manufacturing.
- the present invention provides a process for a production of electrodes for electrolytic capacitors to be implemented in a vacuum deposition chamber by means of vapour deposition of aluminium in a reactive atmosphere onto a substrate of conductive material, such as an aluminium foil. Electrodes obtained by this process show dendritic structures of unstoichiometric aluminium oxide with a high specific capacitance on the surface, this process being then followed by an additional treatment in a reactive plasma athmosphere.
- the electrodes according to the present invention are accordingly of better quality and lower production costs compared to the known solutions.
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- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention refers to a process for the production of an electrode
for electrolytic capacitors made of a conductive substrate
(7) onto which a porous layer of aluminium oxide is deposited on
both sides in an at least two-phase process by vacuum deposition
of unstoichiometric aluminium oxide in a reactive atmosphere and
a following surface oxidation process by a treatment under reactive
plasma as well as a roll-to-roll system for such production
and an electrode made by such process.
Description
The present invention refers to electrodes for electrolytic
capacitors and their production process.
It concerns the technical field of materials for electronic
devices, especially for electrolytic capacitor applications,
which are widely used in electric circuitry applications. Up
to the present date, the techniques of manufacturing an
electrode for electrolytic capacitors are based on electro-chemical
processes where the increase of area is obtained by
material removal, e.g. by electrochemical etching. However,
due to removal of material, the thickness of the substrate in
present electrochemical technologies has to be about 100 µm
being comparatively thick with respect to miniaturized
applications. Further, the production process is expensive
since total power consumption for electrochemical processes
is high and chemical waste is remaining after the production
creating disposal problems.
Accordingly, it is the object of the invention to provide an
improved electrode with high capacitance, which enables the
use of thin substrate material, is cheaper, avoids chemical
waste during production, and a production process thereof.
This object is solved by the present invention providing a
process for the production of an electrode for electrolytic
capacitors made of a conductive substrate onto which a porous
layer of aluminium oxide is deposited on both sides in an at
least two-phase process. This process consists of at least a
vacuum deposition of unstoichiometric aluminium oxide in a
reactive atmosphere and a following surface oxidation process
by a treatment under reactive plasma.
With this advanced technology the use of a substrate with
thickness between 15 to 30 µm is possible, because the
substrate is not weakened by removal of material, but new
material is deposited thereon. The thinner substrate enables
to provide electrodes with a higher volume capacitance.
Further, since the vacuum process does not create any chemical
waste there are no disposal problems and this process is
environmentally advanced. In addition, the power consumption
for the production of the electrode in the vacuum deposition
process is less than the total power consumption needed for
the electrochemical technology, reaching equal or higher
volume capacitance. Thus, the production process according to
the present invention is economically convenient. A further
advantageous aspect of the invention is the creation of spongy
structures showing a high specific area, which are stabilized
by a process of plasma oxidation by means of a material
addition technique.
In an advantageous development of the present invention, a
pretreatment under reactive plasma in an oxidizing atmosphere
is applied to the substrate prior to the vacuum deposition of
aluminium oxide in order to clean and activate the substrate
surface and to enable and enhance reliable attachment of
aluminium oxide thereon.
Preferably, the deposition of unstoichiometric aluminium oxide
is obtained by a reaction of evaporated aluminium at controlled
rate and oxygen at controlled flow, the two sides of
the substrate being guided at a predetermined angle with
respect to each other and to the cloud of aluminium vapour.
In order to achieve easy handling of the substrate, it is
guided in the guide device during the vacuum deposition of
aluminium oxide and/or the pretreatment under reactive plasma.
The guide device has an unwinding roll from which the
substrate is unrolled, a rewinding roll on which the treated
substrate is rolled and a plurality of guide rollers defining
a mainly angled, spiral or wound spiral guide path for the
substrate from the unwinding roll to the rewinding roll and
a dome disposed above a source of aluminium vapour, the two
inner sides of the dome exposed to the aluminium vapour
belonging to the opposed surface sides of the substrate. In
this arrangement, both sides of the substrate are automatically
exposed to the vapour of aluminium oxide in one process
with one aluminium source only.
The following treatment under reactive plasma can be performed
according to the present invention in a chamber in an oxygen
atmosphere at low pressure, the substrate being guided through
said chamber in continuous operation. In this arrangement,
only two rolls for unwinding and rewinding the substrate are
needed, the substrate being tightened between the two rolls
while passing through the chamber.
If the substrate is to be used as anodic electrode the
substrate is preferably submitted to the final anodic
oxidation process. Such can be performed in a solution of
ammonium adipate at a voltage between about 8 and 140 V.
Further, the invention is related to a "Roll-to-Roll"-system
for the production of an electrode for electrolytic capacitors
being disposed in a vacuum deposition chamber having inlet and
outlet ports and a guide device with an unwinding roll, a
rewinding roll and a plurality of guide rollers defining a
mainly angled, spiral or wound guide path for the substrate
from the unwinding roll to the rewinding roll and a dome
disposed above a source of metallic, e.g. aluminium, vapour,
the two inner sides of the dome exposed to the vapour
belonging to the opposed surface sides of the substrate.
The present invention is related as well to an electrode for
electrolytic capacitors made of a conductive substrate with
an unstoichiometric porous layer of aluminium oxide on both
sides which is produced in a process described above. The
electrode preferably has a layer of aluminium oxide with a
dendritic structure.
Other features, advantages and possible uses of the present
invention will be discussed in more detail below with
reference to the accompanying drawings. It is to be understood
that the scope of the present invention is intended to
encompass all features described and illustrated independently
or in any appropriate combination.
In the drawings,
- Fig. 1
- shows a "Roll-to-Roll"-system for the production of an electrode for electrolytic capacitors according to the present invention;
- Fig. 2
- shows a system for the treatment of the substrate of the electrode under reactive plasma in a reactive atmosphere, and
- Fig. 3
- shows the structure of the substrate.
The electrode for electrolytic capacitors obtained by the
process described below is made of a conductive substrate 7,
e.g. an aluminium foil with purity between 99.5% and 99.99%.
The substrate 7 is disposed on an unwinding roll 1 placed in
a manufacturing "Roll-to-Roll"-system (Fig.1). During its
unwinding, the substrate 7 is in a first phase pretreated
under plasma 2 generated by a RF between 50 and 500 kHz in the
presence of oxygen that is as well necessary for a further
step of the reaction.
This pretreatment is advantageous in order to increase the
adhesion of the dendritic porous structure which is building-up
during the following phase of reaction as well as to level
the distribution on the substrate surfaces. Further, this pretreatment
eliminates all possible pollution agents. Without
such a pretreatment, the following dendritic growth occurs in
a manner that it is not so uniform. The pretreatment is
therefore important for obtaining the final product.
After said pretreatment, the deposition of unstoichiometric
aluminium oxide on both surface sides of the substrate takes
place in a reactive atmosphere, obtained by the reaction
between aluminium vapour coming from source 3 and oxygen blown
into the reaction chamber 6 by two distributing inlet ports
4. The flow of oxygen shall be collimated with respect to the
material of the beam of the vaporized aluminium. The distance
between the substrate 7 and the inlet ports 4 of the reactive
gas might be changed, thus obtaining a different dendritic
morphology.
The ratio between aluminium and oxygen is kept constant by
checking the partial pressures of the oxygen and the cloud of
aluminium vapour. The partial pressure of aluminium is kept
constant by checking the oxygen inlet flow while keeping the
partial vapour pressure constant by checking the deposition
rate. The deposition method might be of thermal type, Joule
effect or by electron gun.
The two sides of the substrate are guided with a certain angle
shot between the substrate itself and the cloud of aluminium
vapour. By changing the deposition rate of aluminium, the
oxygen partial pressure and the incidence angle, spiral or
wound between the substrate and the cloud of aluminium vapour,
different stoichiometrics of deposited aluminium are obtained
as well as different dendritic morphologies. For instance, by
a chamber pressure, due to gas emission between 1 and 3 x 10-2
Pa, a deposition rate between 3 and 5 g/minute of aluminium
and an angle between the substrate 7 and the cloud of
aluminium vapour of about 45° and 70°, the effective area
increases by a factor of 200 to 500 with respect to the
apparent geometric area.
The substrate 7 is positioned on a guide device 8, so that it
passes first the aluminium source 3 with one side and
afterwards with the other side after a turn of substrate 7
around guide rollers 9. Finally, the substrate 7 is rolled
on the rewinding roll 5. In this way, a simultaneous deposition
of aluminium oxide occurs on both sides of the substrate
7.
Up to now, the first process treatment was described. The
rewinding roll 5 is then removed from the guide device 8 and
submitted to an additional treatment described hereafter. The
substrate 7 undergoes an additional process of surface
oxidation by a treatment under active plasma. The substrate
7 is unrolled from roll 5, run through chamber 10 and rolled
on a new roll 11. Inside chamber 10, a plasma is created in
an oxygen atmosphere at low pressure using a RF from 50 to 500
kHz and a power from 2 to 3 KVA. Scope of this last process
is to increase the ratio of oxygen with regard to the
aluminium on the surface. It has been experimentally ascertained
that this enrichment of surface oxygen accounts for the
stability of the dendritic structure over time, i.e. stability
of the electric capacitance.
The substrate 7 onto which this dendritic structure 12 was
deposited by the above described process might now be used as
anodic or cathodic electrode for electrolytic capacitors.
When the dendritic structure is used as an anodic electrode,
it preferably undergoes an anodic oxidation process in a
solution of ammonium adipate at 10% in weight of concentration.
The anodic oxidation at a fixed voltage between about
8 and 140 V enables the creation of an aluminium oxide
barrier, which forms the dielectric of the electrolytic
capacitor.
The value of the specific, electric capacitance per surface
unit obtained after the anodic oxidation depends on the
morphology of the dendritic layer obtained by the above
mentioned processes. It was experimentally noticed that the
capacitance value worsens over time without the oxidation
process under plasma, losing about 30% of the initial value
after a month since manufacturing.
When the above mentioned structure is used as a cathodic
electrode it does not require neither a stabilization process
nor an anodic oxidation.
The present invention provides a process for a production of
electrodes for electrolytic capacitors to be implemented in
a vacuum deposition chamber by means of vapour deposition of
aluminium in a reactive atmosphere onto a substrate of
conductive material, such as an aluminium foil. Electrodes
obtained by this process show dendritic structures of
unstoichiometric aluminium oxide with a high specific
capacitance on the surface, this process being then followed
by an additional treatment in a reactive plasma athmosphere.
Thus, with the present invention concerning the technical
field of materials for electronics, especially for applications
in electrolytic capacitors, no chemical waste comes
up as all operations are of physical type. The electrodes
according to the present invention are accordingly of better
quality and lower production costs compared to the known
solutions.
- 1
- Unwinding roll
- 2
- Plasma
- 3
- Aluminium source
- 4
- Inlet port
- 5
- rewinding roll
- 6
- Vacuum deposition chamber
- 7
- Substrate
- 8
- Guide device
- 9
- Guide roller
- 10
- Chamber
- 11
- Roll
- 12
- Dendritic structure
- 13
- Dome
Claims (10)
- Process for the production of an electrode for electrolytic capacitors made of a conductive substrate (7) onto which a porous layer of aluminium oxide is deposited on both sides in an at least two-phase process by vacuum deposition of unstoichiometric aluminium oxide in a reactive atmosphere and a following surface oxidation process by a treatment under reactive plasma.
- Process according to claim 1, characterized in that a pretreatment under reactive plasma in an oxidizing atmosphere is applied to the substrate (7) prior to the vacuum deposition of aluminium oxide.
- Process according to claim 1 or 2, characterized in that the deposition of unstoichiomentric aluminium oxide is obtained by a reaction of evaporated aluminium at controlled rate and oxygen at controlled flow, the two sides of the substrate (7) being guided at a predetermined angle with respect to each other and to the cloud of aluminium vapour.
- Process according to one of the previous claims, characterized in that the substrate (7) is guided in a guide device (8) during the vacuum deposition of aluminium oxide and/or the pretreatment under reactive plasma said guide device (8) having an unwinding roll (1) from which the substrate (7) is unrolled, a rewinding roll (5) on which the treated substrate (7) is rolled and a plurality of guide rollers (9) defining a mainly angled, spiral or wound guide path for the substrate (7) from the unwinding roll (1) to the rewinding roll (5) and a dome (13) disposed above a source (3) of aluminium vapour, the two inner sides of the dome (13) exposed to the aluminium vapour belonging to opposed surface sides of the substrate (7).
- Process according to one of the previous claims, characterized in that a following treatment under reactive plasma is performed in a chamber (10) in an oxygen atmosphere at low pressure, the substrate (7) being guided through said chamber (10) in continuous operation.
- Process according to one of the previous claims, characterized in that the substrate (7) is submitted to a final anodic oxidation process, preferably in a solution of ammonium adipate at a voltage between about 8 and 140 V.
- Roll-to-Roll-System for the production of an electrode for electrolytic capacitors being disposed in a deposition vacuum chamber (6) having gas inlet and outlet ports and a guide device (8) with an unwinding roll (1) from which the substrate (7) is unrolled, a rewinding roll (5) on which the treated substrate (7) is rolled and a plurality of guide rollers (9) defining a mainly angled, spiral or wound guide path for the substrate (7) from the unwinding roll (1) to the rewinding roll (5) and a dome disposed above a source (3) of metallic, e.g. aluminium, vapour, the two inner sides of the dome (13) exposed to the aluminium vapour belonging to opposed surface sides of the substrate (7).
- Electrode for electrolytic capacitors made of a conductive substrate (7) with an unstoichiometric porous layer of aluminium oxide on both sides which is produced in a process according to one of the claims 1 to 6.
- Electrode according to claim 8, characterized in that the layer of aluminium oxide has a dendritic structure (12).
- Electrolytic capacitor made with at least one electrode according to claims 8 or 9.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/549,039 US6456483B1 (en) | 1999-04-14 | 2000-04-13 | Electrodes for electrolytic capacitors and production process thereof |
| US09/964,659 US6667247B2 (en) | 1999-04-14 | 2001-09-28 | Electrodes for electrolytic capacitors and production process thereof |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT1999RM000225 IT1307557B1 (en) | 1999-04-14 | 1999-04-14 | ELECTRODES FOR ELECTROLYTIC CAPACITORS AND THEIR MANUFACTURING PROCESS BY VACUUM VAPORATION. |
| ITRM990225 | 1999-04-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EP1045409A2 true EP1045409A2 (en) | 2000-10-18 |
| EP1045409A3 EP1045409A3 (en) | 2005-10-19 |
Family
ID=11406667
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EP00107518A Withdrawn EP1045409A3 (en) | 1999-04-14 | 2000-04-07 | Electrodes for electrolytic capacitors and production process thereof |
Country Status (2)
| Country | Link |
|---|---|
| EP (1) | EP1045409A3 (en) |
| IT (1) | IT1307557B1 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1426987A3 (en) * | 2002-12-05 | 2006-08-23 | Acktar Ltd. | Electrodes for electrolytic capacitors and method for producing them |
| EP1382048A4 (en) * | 2001-02-22 | 2008-05-28 | Acktar Ltd | ELECTROLYTIC CAPACITORS AND METHOD OF MANUFACTURING THE SAME |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0474406A (en) * | 1990-07-16 | 1992-03-09 | Matsushita Electric Ind Co Ltd | Manufacture of electrode foil for aluminum electrolytic capacitor |
| JPH0521289A (en) * | 1991-07-09 | 1993-01-29 | Toray Ind Inc | Manufacture of electrode foil for electrolytic capacitor |
| DE4127743C2 (en) * | 1991-08-22 | 1994-05-11 | Fraunhofer Ges Forschung | Surface-enlarged aluminum foil for electrolytic capacitors and vacuum coating processes for their production |
| JPH05129163A (en) * | 1991-11-05 | 1993-05-25 | Toyo Metaraijingu Kk | Electrode material for high capacity electrolytic capacitors |
| FR2688092B1 (en) * | 1992-02-14 | 1994-04-15 | Traitement Metaux Alliages Sa | SHEET FOR ELECTROLYTIC CAPACITOR ELECTRODE AND MANUFACTURING METHOD. |
| EP0905274B1 (en) * | 1996-04-03 | 2003-07-30 | "Okb "Titan",Zao | Method and device for applying porous coatings and cathode film of an electrolytic condenser |
-
1999
- 1999-04-14 IT IT1999RM000225 patent/IT1307557B1/en active
-
2000
- 2000-04-07 EP EP00107518A patent/EP1045409A3/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1382048A4 (en) * | 2001-02-22 | 2008-05-28 | Acktar Ltd | ELECTROLYTIC CAPACITORS AND METHOD OF MANUFACTURING THE SAME |
| EP1426987A3 (en) * | 2002-12-05 | 2006-08-23 | Acktar Ltd. | Electrodes for electrolytic capacitors and method for producing them |
| US7404887B2 (en) | 2002-12-05 | 2008-07-29 | Acktar, Ltd. | Electrodes for electrolytic capacitors and method for producing them |
Also Published As
| Publication number | Publication date |
|---|---|
| ITRM990225A1 (en) | 2000-10-14 |
| EP1045409A3 (en) | 2005-10-19 |
| IT1307557B1 (en) | 2001-11-14 |
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