EP0676792A3 - Ion technology device. - Google Patents
Ion technology device. Download PDFInfo
- Publication number
- EP0676792A3 EP0676792A3 EP95104594A EP95104594A EP0676792A3 EP 0676792 A3 EP0676792 A3 EP 0676792A3 EP 95104594 A EP95104594 A EP 95104594A EP 95104594 A EP95104594 A EP 95104594A EP 0676792 A3 EP0676792 A3 EP 0676792A3
- Authority
- EP
- European Patent Office
- Prior art keywords
- technology device
- ion technology
- ion
- technology
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
- H01J49/067—Ion lenses, apertures, skimmers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
- H01J49/14—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers
- H01J49/147—Ion sources; Ion guns using particle bombardment, e.g. ionisation chambers with electrons, e.g. electron impact ionisation, electron attachment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/06—Sources
- H01J2237/08—Ion sources
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/10—Lenses
- H01J2237/12—Lenses electrostatic
- H01J2237/1207—Einzel lenses
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Tubes For Measurement (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AT700/94 | 1994-04-05 | ||
AT70094 | 1994-04-05 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0676792A2 EP0676792A2 (en) | 1995-10-11 |
EP0676792A3 true EP0676792A3 (en) | 1996-01-10 |
Family
ID=3497513
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95104594A Withdrawn EP0676792A3 (en) | 1994-04-05 | 1995-03-29 | Ion technology device. |
Country Status (1)
Country | Link |
---|---|
EP (1) | EP0676792A3 (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102016110495B4 (en) * | 2016-06-07 | 2018-03-29 | Vacom Vakuum Komponenten & Messtechnik Gmbh | Apparatus and method for generating, storing and releasing ions from a surrounding residual gas atmosphere |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230246A (en) * | 1983-06-14 | 1984-12-24 | Shimadzu Corp | Tetrode-type mass spectrograph |
EP0324247A2 (en) * | 1988-01-11 | 1989-07-19 | Eaton Corporation | Ion implantation surface charge control method and apparatus |
US4916311A (en) * | 1987-03-12 | 1990-04-10 | Mitsubishi Denki Kabushiki Kaisha | Ion beaming irradiating apparatus including ion neutralizer |
US5101105A (en) * | 1990-11-02 | 1992-03-31 | Univeristy Of Maryland, Baltimore County | Neutralization/chemical reionization tandem mass spectrometry method and apparatus therefor |
-
1995
- 1995-03-29 EP EP95104594A patent/EP0676792A3/en not_active Withdrawn
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59230246A (en) * | 1983-06-14 | 1984-12-24 | Shimadzu Corp | Tetrode-type mass spectrograph |
US4916311A (en) * | 1987-03-12 | 1990-04-10 | Mitsubishi Denki Kabushiki Kaisha | Ion beaming irradiating apparatus including ion neutralizer |
EP0324247A2 (en) * | 1988-01-11 | 1989-07-19 | Eaton Corporation | Ion implantation surface charge control method and apparatus |
US5101105A (en) * | 1990-11-02 | 1992-03-31 | Univeristy Of Maryland, Baltimore County | Neutralization/chemical reionization tandem mass spectrometry method and apparatus therefor |
Non-Patent Citations (1)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 009, no. 106 (E - 313) 10 May 1985 (1985-05-10) * |
Also Published As
Publication number | Publication date |
---|---|
EP0676792A2 (en) | 1995-10-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A2 Designated state(s): AT CH DE FR GB LI |
|
PUAL | Search report despatched |
Free format text: ORIGINAL CODE: 0009013 |
|
AK | Designated contracting states |
Kind code of ref document: A3 Designated state(s): AT CH DE FR GB LI |
|
17P | Request for examination filed |
Effective date: 19951204 |
|
17Q | First examination report despatched |
Effective date: 19961011 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 19981110 |