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EP0400947A1 - Diamond growth - Google Patents

Diamond growth Download PDF

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Publication number
EP0400947A1
EP0400947A1 EP90305794A EP90305794A EP0400947A1 EP 0400947 A1 EP0400947 A1 EP 0400947A1 EP 90305794 A EP90305794 A EP 90305794A EP 90305794 A EP90305794 A EP 90305794A EP 0400947 A1 EP0400947 A1 EP 0400947A1
Authority
EP
European Patent Office
Prior art keywords
diamond
carbide layer
substrate
film
carbide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP90305794A
Other languages
German (de)
French (fr)
Other versions
EP0400947B1 (en
Inventor
Barbara Lynn Jones
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
De Beers Industrial Diamond Division Pty Ltd
Original Assignee
De Beers Industrial Diamond Division Pty Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by De Beers Industrial Diamond Division Pty Ltd filed Critical De Beers Industrial Diamond Division Pty Ltd
Publication of EP0400947A1 publication Critical patent/EP0400947A1/en
Application granted granted Critical
Publication of EP0400947B1 publication Critical patent/EP0400947B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S427/00—Coating processes
    • Y10S427/103—Diamond-like carbon coating, i.e. DLC
    • Y10S427/106—Utilizing plasma, e.g. corona, glow discharge, cold plasma

Definitions

  • This invention relates to diamond growth.
  • a gaseous compound can be produced from a liquid carbon compound such as an alcohol or acetone.
  • the gaseous carbon compounds may be decomposed by various methods including the use of heat and radio frequency (RE) energy, and also by means of microwave energy.
  • RE radio frequency
  • European Patent Publication No. 0348026 describes a method of growing crustalline diamond on a substrate which includes the steps of providing a surface of a suitable nitride, placing the substrate on the nitride surface, creating an atmosphere of a gaseous carbon compound around the substrate, bringing the temperature of the nitride surface and the substrate to at least 60°C, and subjecting the gaseous carbon compound to microwave energy suitable to cause the compound to decompose and produce carbon which deposits on the substrate and forms crystalline diamond thereon.
  • the nitride is typically silicon nitride and the frequency of the microwave is typically in the range 200 MHz to 90 GHz.
  • a method of producing a diamond or diamond-like film of a desired profile includes the steps of providing a solid substrate having a surface shaped to the desired profile, producing a thin carbide layer on the profiled surfaced growing a diamond or diamond-like film on the carbide layer, removing the substrate and optionally removing the carbide layer.
  • the drawing illustrates schematically the various steps of an embodiment of the method of the invention.
  • the solid substrate will be made of a material which can easily be formed into a desired shape and which is inert to microwave or like energy.
  • suitable materials are silicon nitride and, preferably, carbon, e.g. graphite.
  • the carbide layer will be thin and generally less than 20 microns in thickness. Preferably, the thickness of the layer will be less than 5 microns. The layer will thus follow closely the profile of the shaped surface.
  • the carbide layer will preferably be a carbide of a high melting metal such as titanium, hafnium, zirconium, molybdenum, tantalum or the like.
  • This layer is preferably formed by first depositing a layer of the metal, for example by evaporation, on the shaped surface and thereafter exposing the metal layer to an atmosphere containing carbon plasma to convert the metal to a carbide.
  • the diamond or diamond-like film which is grown on the carbide layer by chemical vapour deposition such as that described in European Patent Publication No. 0348026.
  • the solid substrate and/or carbide layer may be removed by machining, milling or etching, or a combination of such methods.
  • the invention produces a profiled diamond or diamond-like film which has a large surface area and which is thin.
  • the thickness of the diamond or diamond-like film will generally be less than 100 microns.
  • the film will, of course, have a major surface and this surface will generally have an area of at least 10mm2.
  • the film can be any one of a variety of shapes such as curved, convoluted, and the like.
  • the diamond or diamond-like film may be left bonded to the thin carbide layer. In this form it is essentially free standing.
  • the carbide layer may be removed producing a diamond or diamond-­like film which is completely free standing.
  • stage I a graphite substrate 10 having a curved, semi-circular upper surface 12.
  • stage II a layer 14 of tianium is evaporated on to the curved surface 12.
  • this layer 14 will have a thickness of less than 5 microns. Because of the thinness of this layer, it follows closely the profile of the surface 12.
  • the titanium layer is converted to titanium carbide in stage III. This is achieved by exposing the coated graphite substrate 10 to microwave energy in the presence of a mixture of methane and hydrogen, the methane constituting 15% to 80%, preferably 50%, by volume of the mixture. The methane decomposes to produce carbon plasma which reacts with the titanium to form titanium carbide.
  • a diamond lilm 16 is grown on the upper curved surface 18 of the titanium carbide layer 14 by any known method of producing a diamond film on a substrate by chemical vapour deposition.
  • stage V the graphite substrate is machined or etched away leaving a diamond film 16 on a thin titanium carbide backing 14.
  • This diamond film is essentially free-standing.
  • the titanium carbide backing 14 can be removed, for example by milling, plasma etching or chemical digestion to produce a diamond film which is completely free-standing.
  • the diamond film will typically have a thickness of less than 100 microns and its upper surface 20 will typically have an area of at least 10mm2.

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

A method of producing a diamond or diamond-like film (16) having a desired profile which involves providing a solid carbon substrate (10) having a surface (12) shaped to the desired profile, creating a thin carbide layer (14) on the profiled surface (12), growing a diamond or diamond-like film (16) on the carbide layer (14), removing the carbon substrate (10) and optionally also removing the carbide layer (14).

Description

    BACKGROUND OF THE INVENTION
  • This invention relates to diamond growth.
  • Various methods have been proposed and tried for growing diamond on diamond seed crystals by chemical vapour deposition (CVD) using gaseous carbon compounds such as hydrocarbons or carbon monoxide. A gaseous compound can be produced from a liquid carbon compound such as an alcohol or acetone. The gaseous carbon compounds may be decomposed by various methods including the use of heat and radio frequency (RE) energy, and also by means of microwave energy.
  • Examples of patents directed to methods of growing diamonds on substrates are United States Patents Nos. 4,434,188 and 4,734,339 and European Patent Publications Nos. 288065, 327110, 305903 and 286306.
  • European Patent Publication No. 0348026 describes a method of growing crustalline diamond on a substrate which includes the steps of providing a surface of a suitable nitride, placing the substrate on the nitride surface, creating an atmosphere of a gaseous carbon compound around the substrate, bringing the temperature of the nitride surface and the substrate to at least 60°C, and subjecting the gaseous carbon compound to microwave energy suitable to cause the compound to decompose and produce carbon which deposits on the substrate and forms crystalline diamond thereon. The nitride is typically silicon nitride and the frequency of the microwave is typically in the range 200 MHz to 90 GHz.
    • SUMMARY OF THE INVENTION
  • According to the present invention, a method of producing a diamond or diamond-like film of a desired profile includes the steps of providing a solid substrate having a surface shaped to the desired profile, producing a thin carbide layer on the profiled surfaced growing a diamond or diamond-like film on the carbide layer, removing the substrate and optionally removing the carbide layer.
    • DESCRIPTION OF THE DRAWINGS
  • The drawing illustrates schematically the various steps of an embodiment of the method of the invention.
    • DESCRIPTION OF EMBODIMENTS
  • The solid substrate will be made of a material which can easily be formed into a desired shape and which is inert to microwave or like energy. Examples of suitable materials are silicon nitride and, preferably, carbon, e.g. graphite.
  • The carbide layer will be thin and generally less than 20 microns in thickness. Preferably, the thickness of the layer will be less than 5 microns. The layer will thus follow closely the profile of the shaped surface.
  • The carbide layer will preferably be a carbide of a high melting metal such as titanium, hafnium, zirconium, molybdenum, tantalum or the like. This layer is preferably formed by first depositing a layer of the metal, for example by evaporation, on the shaped surface and thereafter exposing the metal layer to an atmosphere containing carbon plasma to convert the metal to a carbide.
  • The diamond or diamond-like film which is grown on the carbide layer by chemical vapour deposition such as that described in European Patent Publication No. 0348026. The layer which will generally be polycrystalline in nature.
  • The solid substrate and/or carbide layer may be removed by machining, milling or etching, or a combination of such methods.
  • The invention produces a profiled diamond or diamond-like film which has a large surface area and which is thin. The thickness of the diamond or diamond-like film will generally be less than 100 microns. The film will, of course, have a major surface and this surface will generally have an area of at least 10mm². The film can be any one of a variety of shapes such as curved, convoluted, and the like.
  • The diamond or diamond-like film may be left bonded to the thin carbide layer. In this form it is essentially free standing. Alternatively, the carbide layer may be removed producing a diamond or diamond-­like film which is completely free standing.
  • An embodiment of the invention will now be described with reference to the accompanying drawings. Refering to these drawings, there is shown in stage I a graphite substrate 10 having a curved, semi-circular upper surface 12. In stage II a layer 14 of tianium is evaporated on to the curved surface 12. Typically, this layer 14 will have a thickness of less than 5 microns. Because of the thinness of this layer, it follows closely the profile of the surface 12.
  • The titanium layer is converted to titanium carbide in stage III. This is achieved by exposing the coated graphite substrate 10 to microwave energy in the presence of a mixture of methane and hydrogen, the methane constituting 15% to 80%, preferably 50%, by volume of the mixture. The methane decomposes to produce carbon plasma which reacts with the titanium to form titanium carbide.
  • Then, in stage IV a diamond lilm 16 is grown on the upper curved surface 18 of the titanium carbide layer 14 by any known method of producing a diamond film on a substrate by chemical vapour deposition.
  • In stage V, the graphite substrate is machined or etched away leaving a diamond film 16 on a thin titanium carbide backing 14. This diamond film is essentially free-standing. The titanium carbide backing 14 can be removed, for example by milling, plasma etching or chemical digestion to produce a diamond film which is completely free-standing.
  • The diamond film will typically have a thickness of less than 100 microns and its upper surface 20 will typically have an area of at least 10mm².

Claims (9)

1. A method of producing a diamond or diamond-like film (16) having a desired profile includes the steps of providing a solid substrate (10) having a surface (12) shaped to the desired profile, producing a thin carbide layer (14) on the profiled surface (12), growing a diamond or diamond-like film (16) on the carbide layer (14) and removing the substrate.
2. A method according to claim 1 wherein the carbide layer (14) is also removed.
3. A method according to claim 1 or claim 2 wherein the substrate (10) is a solid carbon substrate.
4. A method according to claim 3 wherein the substrate (10) is a graphite substrate.
5. A method according to any one of the preceding claims wherein the carbide is a carbide of a high melting metal selected from titanium, hafnium, zirconium, molybdenum and tantalum.
6. A method according to any one of the preceding claims wherein the carbide layer (14) has a thickness of less than 20 microns.
7. A method according to any one of claims 1 to 4 wherein the carbide layer (14) has a thickness of less than 5 microns.
8. A method according to any one of the preceding claims wherein the solid substrate (10) and/or carbide layer (14) are removed by a method selected from machining, milling, etching and a combination thereof.
9. A method according to any one of the preceding claims wherein the diamond or diamond-like film (16) is grown on the carbide layer (14) by chemical vapour deposition.
EP90305794A 1989-05-31 1990-05-29 Diamond growth Expired - Lifetime EP0400947B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB898912498A GB8912498D0 (en) 1989-05-31 1989-05-31 Diamond growth
GB8912498 1989-05-31

Publications (2)

Publication Number Publication Date
EP0400947A1 true EP0400947A1 (en) 1990-12-05
EP0400947B1 EP0400947B1 (en) 1994-08-17

Family

ID=10657650

Family Applications (1)

Application Number Title Priority Date Filing Date
EP90305794A Expired - Lifetime EP0400947B1 (en) 1989-05-31 1990-05-29 Diamond growth

Country Status (6)

Country Link
US (1) US5114745A (en)
EP (1) EP0400947B1 (en)
JP (1) JPH0397697A (en)
DE (1) DE69011584T2 (en)
GB (1) GB8912498D0 (en)
ZA (1) ZA903950B (en)

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GB2253416A (en) * 1991-02-21 1992-09-09 De Beers Ind Diamond Radiation absorber comprising a CVD diamond film having special surface characteristics
EP0467043A3 (en) * 1990-06-13 1993-04-21 General Electric Company Free standing diamond sheet and method and apparatus for making same
EP0511874B1 (en) * 1991-05-01 1996-02-28 General Electric Company A method of producing diamond articles by chemical vapor deposition
EP0718642A1 (en) * 1994-12-20 1996-06-26 De Beers Industrial Diamond Division (Proprietary) Limited Diffractive optics
EP0727507A2 (en) * 1995-02-15 1996-08-21 Saint-Gobain/Norton Industrial Ceramics Corporation Apparatus and method for making free standing diamond
EP0486056B1 (en) * 1990-11-15 1996-10-09 Norton Company Method for producing a synthetic diamond structure
US5916456A (en) * 1995-06-29 1999-06-29 Diamanx Products Limited Diamond treatment for passivating stress surface defects
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ZA903950B (en) 1991-03-27
EP0400947B1 (en) 1994-08-17
DE69011584D1 (en) 1994-09-22
JPH0397697A (en) 1991-04-23
DE69011584T2 (en) 1994-12-08
US5114745A (en) 1992-05-19
GB8912498D0 (en) 1989-07-19

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