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EP0022016B1 - Slow-wave structure with varying pitch for a travelling-wave tube, and travelling-wave tube using such a slow-wave structure - Google Patents

Slow-wave structure with varying pitch for a travelling-wave tube, and travelling-wave tube using such a slow-wave structure Download PDF

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Publication number
EP0022016B1
EP0022016B1 EP80400940A EP80400940A EP0022016B1 EP 0022016 B1 EP0022016 B1 EP 0022016B1 EP 80400940 A EP80400940 A EP 80400940A EP 80400940 A EP80400940 A EP 80400940A EP 0022016 B1 EP0022016 B1 EP 0022016B1
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EP
European Patent Office
Prior art keywords
delay line
section
pitch
variation
structures
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
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EP80400940A
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German (de)
French (fr)
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EP0022016A1 (en
Inventor
Christian Deville
Philippe Lafuma
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Thales SA
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Thomson CSF SA
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/16Circuit elements, having distributed capacitance and inductance, structurally associated with the tube and interacting with the discharge
    • H01J23/24Slow-wave structures, e.g. delay systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/34Travelling-wave tubes; Tubes in which a travelling wave is simulated at spaced gaps
    • H01J25/36Tubes in which an electron stream interacts with a wave travelling along a delay line or equivalent sequence of impedance elements, and without magnet system producing an H-field crossing the E-field
    • H01J25/38Tubes in which an electron stream interacts with a wave travelling along a delay line or equivalent sequence of impedance elements, and without magnet system producing an H-field crossing the E-field the forward travelling wave being utilised

Definitions

  • the present invention relates to a delay line for traveling wave tube of cylindrical structure, more particularly a delay line of the type with ceiling (s) and rings.
  • a delay line of the above type consisting of a cylindrical metal guide for example and, in the straight sections of this guide, coaxial metal rings each fixed to the wall of the guide by at least one metal rod; it further comprises at least one ceiling constituted by a metallic wedge fixed to the inner wall of the guide and extending over the entire length of the latter any section of this ceiling by a plane perpendicular to the axis of the guide having the shape of a circular crown sector.
  • the delay lines of the above type, used in traveling wave tubes appear as formed by a succession of elementary sections or cells made up of the elements described above, all identical, repeating periodically along of the electron beam propagation axis.
  • traveling wave tubes using this type of constant pitch line have an HF power available at the tube outlet, limited to about a third of that applied by the power supplies.
  • the object of the present invention is to increase the interaction efficiency of traveling wave tubes using lines of the ceiling (s) and ring type by providing a new line structure.
  • the present invention can also be applied to delay lines of the above type comprising a metallic conductor in contact with the ceilings on one of the faces of the section and forming a short circuit between them, as described in the first addition to the patent. number 82.236.
  • This feature eliminates certain parasitic operating modes. In this case, the variation of the pitch can be achieved by modifying the distance between rings and short-circuits.
  • FIG. 1 represents, in perspective, an elementary cell 10 of a delay line of the invention.
  • Each of these cells consists, in accordance with the art of the cited patents, in a metal guide section with circular section 11, comprising two metal ceilings 1 extending symmetrically from the wall of the guide section up to a certain distance from the center from the right section of it.
  • a circular metal ring 3 In a plane parallel to that of the ceilings, is disposed a circular metal ring 3 supported by two diametrically opposite rods 4 fixed to the wall of the guide section.
  • the two ceilings 1 are interconnected by a loop 2 made of an electrically conductive material.
  • this loop, or short circuit consists of a linear conductor applied to the two ceilings and entirely located in their plane; the figure shows, without markers, the four holes used in the example for cooling the line by circulation of fluid; the different guide sections similar to that described are mounted and clamped against each other, to form the delay line of the invention, the rods 4 all parallel to each other, as well as the ceilings 1; the assembly is made vacuum tight by brazing.
  • step L is carried out, according to the invention, by modifying, inside each cell, or the dimensions of the constituent elements of the cell, thickness of the ring and support rod assembly, or the distance between ring and short circuit, in particular.
  • the delay rate imparted to the electromagnetic wave propagating along the line varies in opposite direction to the pitch.
  • the pitch of the structure decreases first (section II) compared to that in the first section, I, near the electron gun, then increases in section III , beyond its value in section I.
  • the thickness of the assembly formed by the ring 3 and its support rods 4, roughly uniform in the example of Figure 1, is designated by d in this figure; the distance between ring 3 and short circuit 2 by d 'in Figure 2.
  • the thickness of the support rods is very substantially greater than that of the ring itself.
  • the variation of the pitch of the line of the invention can be obtained in two ways: either by modifying the thickness of the assembly, 3-4, formed by the ring and its supports, or by modifying the distance from the ring 3 to the short circuit 2.
  • the first way of proceeding proves to be the most effective for varying the pitch; it also has the advantage of causing a slight disturbance in the coupling impedance between the electron beam and the delay line.
  • the improvement in efficiency obtained with the delay line of the invention is further increased precisely because of this coupling impedance.
  • the increase in pitch in the last part of the line is not incompatible with a reduction in the coupling impedance in this part, and a lesser dispersion of the electronic speeds, confirmed by calculation.
  • the focusing of the electron beam is thereby facilitated and the transmission coefficient of the beam improved: the losses of electrons along the line are less, which allows a better beam utilization factor and an average power. higher frequency available at the outlet of the stronger tube, all other things being equal.
  • a low coupling impedance generally corresponds to a poorly dispersive structure, that is to say a large passband.
  • the arrangements provided by the invention to increase the efficiency of the tube therefore go in the direction of a greater bandwidth, which, as is known, is one of the main characteristics of traveling wave tubes.
  • variable-pitch delay line of the invention has many advantages, which result from the above, without causing technological complications of implementation.
  • the invention is not limited to the examples described and shown but applies, in general, to any delay line with ceiling (s) and rings, in particular in the case of lines which would include a number of ceilings, different from that of the example shown, arranged in the intervals between the support rods of the rings. It applies, inter alia, also to the case of waveguides having a section other than the circular section shown and, in general, it includes all the variants accessible to those skilled in the art from that shown .
  • FIG. 2 to which reference has been made for the description of the delay line of the invention shows in section the whole of a tube constructed with this line, the latter, formed of three sections l, II and III, bears the reference 20.
  • the tube comprises a metal envelope 21 closed at its two ends by an electron collector 22 and by an insulating foot 23 in which is housed an electron gun whose cathode has been shown at 24 and its heating filament at 25, a focusing electrode 26, as well as an acceleration electrode 27.
  • the cathode emits, under the action of the power source 28, an electron beam 29 whose outline is shown in dotted lines.
  • the delay line is coupled to the input and output circuits of the tube, amplifier in the example, by the antennas 30 and 31.
  • the reference 32 designates the solder ring ensuring the vacuum-tight assembly of the cells 10 between them.
  • the cells For clarity, finally, we have limited, in each section, the cells to a small number, when in reality each of these sections can comprise of the order of several tens.
  • a tube equipped with a delay line according to the invention supplied on the frequency of 3 gigahertz for high frequency power of 300 kilowatts peak, for a total applied peak power of 600 kilowatts, in the form of pulses of 25 fJS with a form factor of 60 and a beam intensity of 17 amps.
  • the line included a hundred cells.
  • the invention is generally applicable to the production of high power levels with a large bandwidth and with a high efficiency in the microwave field, particularly in the centimeter range.

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  • Microwave Tubes (AREA)
  • Microwave Amplifiers (AREA)

Description

La présente invention concerne une ligne à retard pour tube à onde progressive de structure cylindrique, plus particulièrement une ligne à retard du type à plafond(s) et anneaux.The present invention relates to a delay line for traveling wave tube of cylindrical structure, more particularly a delay line of the type with ceiling (s) and rings.

On connaît notamment par le brevet français 1.162.425 une ligne à retard du type ci-dessus constituée d'un guide métallique cylindrique par exemple et, dans les sections droites de ce guide, d'anneaux métalliques coaxiaux fixés chacun à la paroi du guide par au moins une tige métallique ; elle comporte, en outre, au moins un plafond constitué par une cale métallique fixée à la paroi intérieure du guide et s'étendant sur toute la longueur de celui-ci toute section de ce plafond par un plan perpendiculaire à l'axe du guide ayant la forme d'un secteur de couronne circulaire.We know in particular from French patent 1,162,425 a delay line of the above type consisting of a cylindrical metal guide for example and, in the straight sections of this guide, coaxial metal rings each fixed to the wall of the guide by at least one metal rod; it further comprises at least one ceiling constituted by a metallic wedge fixed to the inner wall of the guide and extending over the entire length of the latter any section of this ceiling by a plane perpendicular to the axis of the guide having the shape of a circular crown sector.

D'autre part, les lignes à retard du type ci-dessus, utilisées dans les tubes à onde progressive apparaissent comme formées d'une succession de tronçons élémentaires ou cellules constituées des éléments décrits ci-dessus, tous identiques, se répétant périodiquement le long de l'axe de propagation du faisceau d'électrons. Toutefois, les tubes à onde progressive utilisant ce type de ligne à pas constant présentent une puissance HF disponible en sortie du tube, limitée au tiers environ de celle appliquée par les alimentations.On the other hand, the delay lines of the above type, used in traveling wave tubes appear as formed by a succession of elementary sections or cells made up of the elements described above, all identical, repeating periodically along of the electron beam propagation axis. However, traveling wave tubes using this type of constant pitch line have an HF power available at the tube outlet, limited to about a third of that applied by the power supplies.

En conséquence, la présente invention a pour but, d'accroître le rendement d'interaction des tubes à ondes progressives utilisant des lignes du type à plafond(s) et anneaux en fournissant une nouvelle structure de ligne.Accordingly, the object of the present invention is to increase the interaction efficiency of traveling wave tubes using lines of the ceiling (s) and ring type by providing a new line structure.

La présente invention a donc pour objet une ligne à retard pour tube à onde progressive constituée de cellules jointives composée chacune des éléments suivants :

  • - un tronçon de guide d'ondes métallique comportant des plafonds de même épaisseur que le tronçon, occupant, chacun, une partie de sa section, et s'étendant d'une fraction de son pourtour à une certaine distance de son centre ;
  • - un anneau métallique coaxial fixé à la paroi du tronçon de guide par des tiges-supports disposées dans les espaces libres entre les plafonds ; l'ensemble des cellules constituant un guide d'ondes de section uniforme, dans lequel les plafonds d'une part, et les tiges supports d'autre part, sont alignés, s'étendant autour du faisceau d'électrons le long de son trajet dans le tube, caractérisée en ce que la ligne se subdivise en trois groupes de cellules à l'intérieur de chacun desquels le pas est constant, les pas des second et troisième groupes de cellules étant respectivement plus petits et plus grands que celui du premier groupe de cellules lorsqu'on se déplace le long de la ligne en partant du canon à électrons et la variation du pas étant obtenue par dilatation ou contraction d'au moins une cote des cellules. Selon un mode de réalisation préférentiel la variation du pas est réalisée en modifiant à l'intérieur de chaque cellule les cotes des éléments constitutifs de la cellule, à savoir l'épaisseur de l'ensemble anneaux et tiges supports.
The present invention therefore relates to a delay line for a traveling wave tube consisting of contiguous cells each composed of the following elements:
  • - A metallic waveguide section having ceilings of the same thickness as the section, each occupying a part of its section, and extending a fraction of its periphery at a certain distance from its center;
  • - a coaxial metal ring fixed to the wall of the guide section by support rods arranged in the free spaces between the ceilings; the set of cells constituting a waveguide of uniform section, in which the ceilings on the one hand, and the support rods on the other hand, are aligned, extending around the electron beam along its path in the tube, characterized in that the line is subdivided into three groups of cells inside each of which the pitch is constant, the steps of the second and third groups of cells being respectively smaller and larger than that of the first group of cells when moving along the line starting from the electron gun and the variation of the pitch being obtained by dilation or contraction of at least one dimension of the cells. According to a preferred embodiment, the variation of the pitch is achieved by modifying the dimensions of the constituent elements of the cell inside each cell, namely the thickness of the assembly of rings and support rods.

La présente invention peut aussi s'appliquer aux lignes à retard du type ci-dessus comportant un conducteur métallique en contact avec les plafonds sur l'une des faces du tronçon et formant court-circuit entre eux, comme décrit dans la première addition au brevet précédent portant le numéro 82.236. Cette caractéristique permet l'élimination de certains modes parasites de fonctionnement. Dans ce cas, la variation du pas peut être réalisée en modifiant la distance entre anneaux et court-circuits.The present invention can also be applied to delay lines of the above type comprising a metallic conductor in contact with the ceilings on one of the faces of the section and forming a short circuit between them, as described in the first addition to the patent. number 82.236. This feature eliminates certain parasitic operating modes. In this case, the variation of the pitch can be achieved by modifying the distance between rings and short-circuits.

L'invention sera mieux comprise, en se reportant à la description qui suit et aux figures jointes qui représentent :

  • Figure 1 Une vue d'ensemble en perspective de la cellule constitutive de la ligne à retard de l'invention ;
  • Figure 2 Une vue schématique en coupe d'un tube à onde progressive incorporant une ligne à retard de l'invention.
The invention will be better understood by referring to the description which follows and to the attached figures which represent:
  • Figure 1 An overall perspective view of the cell constituting the delay line of the invention;
  • Figure 2 A schematic sectional view of a traveling wave tube incorporating a delay line of the invention.

La figure 1, représente, en perspective, une cellule élémentaire 10 d'une ligne à retard de l'invention. Chacune de ces cellules consiste, conformément à l'art des brevets cités, en un tronçon de guide métallique à section circulaire 11, comportant deux plafonds métalliques 1 s'étendant symétriquement de la paroi du tronçon de guide jusqu'à une certaine distance du centre de la section droite de celle-ci. Dans un plan parallèle à celui des plafonds, est disposé un anneau métallique circulaire 3 supporté par deux tiges 4 diamétralement opposées fixées à la paroi du tronçon de guide.FIG. 1 represents, in perspective, an elementary cell 10 of a delay line of the invention. Each of these cells consists, in accordance with the art of the cited patents, in a metal guide section with circular section 11, comprising two metal ceilings 1 extending symmetrically from the wall of the guide section up to a certain distance from the center from the right section of it. In a plane parallel to that of the ceilings, is disposed a circular metal ring 3 supported by two diametrically opposite rods 4 fixed to the wall of the guide section.

Les deux plafonds 1 sont reliés entre eux par une boucle 2 en un matériau conducteur de l'électricité. Dans l'exemple, cette boucle, ou court-circuit est constituée par un conducteur linéaire appliqué sur les deux plafonds et entièrement situé dans leur plan ; la figure montre, sans repères, les quatre trous servant dans l'exemple au refroidissement de la ligne par circulation de fluide ; les différents tronçons de guide semblables à celui décrit sont montés et serrés les uns contre les autres, pour former la ligne à retard de l'invention, les tiges 4 toutes parallèles entre elles, ainsi que les plafonds 1 ; l'ensemble est rendu étanche au vide, par brasage.The two ceilings 1 are interconnected by a loop 2 made of an electrically conductive material. In the example, this loop, or short circuit, consists of a linear conductor applied to the two ceilings and entirely located in their plane; the figure shows, without markers, the four holes used in the example for cooling the line by circulation of fluid; the different guide sections similar to that described are mounted and clamped against each other, to form the delay line of the invention, the rods 4 all parallel to each other, as well as the ceilings 1; the assembly is made vacuum tight by brazing.

Le résultat d'un exemple de cet assemblage est montré en coupe sur la figure 2, où l'on retrouve, avec les mêmes repères, des cellules présentant la même structure générale que celle de la figure précédente. La figure comporte le long de l'axe Oz de propagation du faisceau, de la gauche vers la droite, trois sections désignées par I, II, et III. dans lesquelles le pas, L de la ligne, constant dans chacune d'elles, a des valeurs différentes. Ce pas L à l'intérieur d'une section est égal à l'épaisseur de la cellule.The result of an example of this assembly is shown in section in Figure 2, where we find, with the same references, cells having the same general structure as that of the previous figure. The figure comprises along the axis Oz of propagation of the beam, from left to right, three sections designated by I, II, and III. in which the step, L of the line, constant in each of them, has different values. This step L inside a section is equal to the thickness of the cell.

La variation du pas L est réalisée, suivant l'invention, en modifiant, à rintérieur de chaque cellule, soit les cotes des éléments constitutifs de la cellule, épaisseur de l'ensemble anneau et tiges supports, soit la distance entre anneau et court-circuit, notamment.The variation of the step L is carried out, according to the invention, by modifying, inside each cell, or the dimensions of the constituent elements of the cell, thickness of the ring and support rod assembly, or the distance between ring and short circuit, in particular.

Il est ainsi possible de faire varier lentement et de façon éventuellement continue, suivant la loi désirée, le pas de la ligne à retard. Le taux de retard imprimé à l'onde électromagnétique se propagent le long de la ligne varie en sens inverse du pas.It is thus possible to vary slowly and possibly continuously, according to the desired law, the pitch of the delay line. The delay rate imparted to the electromagnetic wave propagating along the line varies in opposite direction to the pitch.

Dans l'exemple de la figure 2, on a représenté une ligne à trois tronçons principaux de pas différents, ce pas étant constant à l'intérieur de chacun des tronçons ; ces derniers sont reliés entre eux par d'autres portions de ligne, non représentées, où le pas varie de façon progressive de sa valeur dans le tronçon de droite. On a exagéré volontairement sur la figure les différences de cote pour faire apparaître la variation de pas d'une section à l'autre. On notera qu'en bande S la ligne à retard présente une longueur de quelques dizaines de centimètres, alors que l'épaisseur d'une cellule est de quelques millimètres seulement.In the example of Figure 2, there is shown a line with three main sections of different pitches, this pitch being constant inside each of the sections; the latter are interconnected by other line portions, not shown, where the pitch varies progressively from its value in the straight section. The differences in dimension have been deliberately exaggerated in the figure to show the variation in pitch from one section to another. It will be noted that in band S the delay line has a length of a few tens of centimeters, while the thickness of a cell is only a few millimeters.

Comme on le voit sur la figure 2 et conformément à la présente invention le pas de la structure diminue d'abord (section II) par rapport à celui dans la première section, I, près du canon à électrons, puis augmente dans la section III, au-delà de sa valeur dans la section I.As seen in Figure 2 and in accordance with the present invention the pitch of the structure decreases first (section II) compared to that in the first section, I, near the electron gun, then increases in section III , beyond its value in section I.

L'épaisseur de l'ensemble formé par l'anneau 3 et ses tiges supports 4, à peu près uniforme dans l'exemple de la figure 1, est désigné par d sur cette figure ; la distance entre anneau 3 et court-circuit 2 par d' sur la figure 2.The thickness of the assembly formed by the ring 3 and its support rods 4, roughly uniform in the example of Figure 1, is designated by d in this figure; the distance between ring 3 and short circuit 2 by d 'in Figure 2.

On notera que sur cette dernière figure, qui correspond à l'une des variantes possibles de l'invention, l'épaisseur des tiges supports est très sensiblement supérieure à celle de l'anneau lui- même.It will be noted that in this last figure, which corresponds to one of the possible variants of the invention, the thickness of the support rods is very substantially greater than that of the ring itself.

Les travaux expérimentaux de la demanderesse ont, en effet, démontré que pour obtenir l'augmentation de rendement recherchée, toutes choses égales par ailleurs, le pas de la ligne à retard en s'éloignant du canon à électrons, doit d'abord diminuer, puis augmenter dans la dernière partie de la ligne, contrairement à la conception de l'art antérieur selon laquelle le pas de la structure à retard devait diminuer dans la dernière partie de celle-ci, à l'opposé du canon à électrons. En outre, il apparaît que la dispersion des vitesses des électrons au sein du faisceau n'augmente pas de façon prohibitive dans la dernière section, malgré l'augmentation importante de rendement obtenue avec les lignes à retard de l'invention.The Applicant's experimental work has in fact demonstrated that, in order to obtain the desired increase in yield, all other things being equal, the pitch of the delay line moving away from the electron gun must first decrease, then increase in the last part of the line, contrary to the conception of the prior art according to which the pitch of the delay structure had to decrease in the last part of it, opposite to the electron gun. In addition, it appears that the dispersion of the velocities of the electrons within the beam does not increase prohibitively in the last section, despite the significant increase in efficiency obtained with the delay lines of the invention.

Ce rendement a atteint des valeurs de 50 % au cours des essais de la demanderesse, avec des variations extrêmes de pas de + 9 % par rapport au pas initial, c'est-à-dire le pas de la section I. Le rendement dont il s'agit est le rapport de la puissance haute fréquence recueillie à la sortie du tube à la puissance continue appliquée au tube. Dans le cadre de l'invention, ces variations peuvent aller de quelques centimètres du pas à plusieurs fois ce pas.This efficiency reached values of 50% during the tests of the applicant, with extreme variations of pitch of + 9% compared to the initial pitch, that is to say the pitch of section I. The efficiency of which this is the ratio of the high frequency power collected at the outlet of the tube to the continuous power applied to the tube. In the context of the invention, these variations can range from a few centimeters of the step to several times this step.

Comme on l'a dit, la variation du pas de la ligne de l'invention peut être obtenue de deux façons : soit en modifiant l'épaisseur de l'ensemble, 3-4, formé par l'anneau et ses supports, soit en modifiant la distance de l'anneau 3 au court-circuit 2. La première façon de procéder s'avère la plus efficace pour faire varier le pas ; elle a l'avantage en outre d'entraîner une faible perturbation de l'impédance de couplage entre le faisceau d'électrons et la ligne à retard.As has been said, the variation of the pitch of the line of the invention can be obtained in two ways: either by modifying the thickness of the assembly, 3-4, formed by the ring and its supports, or by modifying the distance from the ring 3 to the short circuit 2. The first way of proceeding proves to be the most effective for varying the pitch; it also has the advantage of causing a slight disturbance in the coupling impedance between the electron beam and the delay line.

L'amélioration du rendement obtenu avec la ligne à retard de l'invention se trouve encore accrue du fait précisément de cette impédance de couplage. Avec la disposition de l'invention, en effet, l'augmentation de pas dans la dernière partie de la ligne n'est pas incompatible avec une diminution de l'impédance de couplage dans cette partie, et une moindre dispersion des vitesses électroniques, confirmée par le calcul.The improvement in efficiency obtained with the delay line of the invention is further increased precisely because of this coupling impedance. With the arrangement of the invention, in fact, the increase in pitch in the last part of the line is not incompatible with a reduction in the coupling impedance in this part, and a lesser dispersion of the electronic speeds, confirmed by calculation.

La focalisation du faisceau d'électrons s'en trouve facilitée et le coefficient de transmission du faisceau amélioré : les pertes d'électrons le long de la ligne sont moins grandes, ce qui permet un facteur d'utilisation du faisceau meilleur et une puissance moyenne haute fréquence disponible à la sortie du tube plus forte, toutes choses étant égales par ailleurs.The focusing of the electron beam is thereby facilitated and the transmission coefficient of the beam improved: the losses of electrons along the line are less, which allows a better beam utilization factor and an average power. higher frequency available at the outlet of the stronger tube, all other things being equal.

En outre, en «grossissant» les cellules élémentaires pour augmenter leur pas, on diminue l'impédance thermique de la ligne à l'endroit de ces cellules, tout en augmentant ses possibilités de dissipation, ce qui est doublement avantageux.In addition, by “enlarging” the elementary cells to increase their pitch, the thermal impedance of the line at the location of these cells is reduced, while increasing its possibilities of dissipation, which is doubly advantageous.

On notera enfin qu'une faible impédance de couplage correspond en général à une structure peu dispersive, c'est-à-dire une large bande passante. Les dispositions prévues par l'invention pour augmenter le rendement du tube vont donc dans le sens d'une plus grande largeur de bande, ce qui, comme on sait, est l'une des caractéristiques principales des tubes à onde progressive.Finally, it should be noted that a low coupling impedance generally corresponds to a poorly dispersive structure, that is to say a large passband. The arrangements provided by the invention to increase the efficiency of the tube therefore go in the direction of a greater bandwidth, which, as is known, is one of the main characteristics of traveling wave tubes.

D'autres modifications à l'intérieur de la cellule permettent, en même temps que la variation du pas, d'abaisser l'impédance de couplage, notamment l'augmentation de :

  • - l'épaisseur des anneaux 3 - cote a - pouvant notamment aller du simple au double ;
  • - la largeur des tiges supports d'anneau 4 - cote b ;
  • - la largeur des plafonds 1 - cote c.
Other modifications inside the cell allow, at the same time as the variation of the pitch, to lower the coupling impedance, in particular the increase of:
  • - The thickness of the rings 3 - dimension a - which can in particular range from single to double;
  • - the width of the ring support rods 4 - dimension b;
  • - the width of the ceilings 1 - dimension c.

On peut ajouter des cannelures aux plafonds, c'est-à-dire prévoir pour ceux-ci des bords en gradins. Par ces moyens, il est possible aisément de réduire cette impédance au tiers ou au quart de sa valeur.You can add grooves to the ceilings, that is to say provide for them stepped edges. By these means, it is easily possible to reduce this impedance to a third or a quarter of its value.

La structure de la ligne à retard à pas variable de l'invention présente de nombreux avantages, qui résultent de ce qui précède, sans entraîner de complications technologiques de réalisation.The structure of the variable-pitch delay line of the invention has many advantages, which result from the above, without causing technological complications of implementation.

On a énuméré dans ce qui précède un certain nombre des dispositions prévues par l'invention pour faire varier les caractéristiques de la cellule constitutive de la ligne. Il va sans dire que l'on peut, dans le cadre de l'invention, combiner ces dispositions.A number of the provisions provided by the invention have been listed in the foregoing for varying the characteristics of the cell constituting the line. It goes without saying that it is possible, in the context of the invention, to combine these provisions.

L'invention n'est pas limitée aux exemples décrits et représentés mais s'applique, de façon générale, à toute ligne à retard à plafond(s) et anneaux, notamment au cas des lignes qui comprendraient un nombre de plafonds, différent de celui de l'exemple représenté, disposés dans les intervalles entre les tiges supports des anneaux. Elle s'applique, entre autres, aussi au cas de guides d'ondes ayant une section autre que la section circulaire représentée et, de façon générale, elle comprend toutes les variantes accessibles à l'homme de l'art à partir de celle représentée.The invention is not limited to the examples described and shown but applies, in general, to any delay line with ceiling (s) and rings, in particular in the case of lines which would include a number of ceilings, different from that of the example shown, arranged in the intervals between the support rods of the rings. It applies, inter alia, also to the case of waveguides having a section other than the circular section shown and, in general, it includes all the variants accessible to those skilled in the art from that shown .

La figure 2 à laquelle on s'est référé pour la description de la ligne à retard de l'invention montre en coupe l'ensemble d'un tube construit avec cette ligne , cette dernière, formée de trois sections l, Il et III, porte le repère 20. Le tube comporte une enveloppe métallique 21 fermée à ses deux extrémités par un collecteur d'électrons 22 et par un pied isolant 23 dans lequel est logé un canon à électrons dont on a représenté la cathode en 24 et son filament chauffant en 25, une électrode de focalisation 26, ainsi qu'une électrode d'accélération 27. La cathode émet, sous l'action de la source d'alimentation 28, un faisceau d'électrons 29 dont le contour est représenté en pointillé. La ligne à retard est couplée aux circuits d'entrée et de sortie du tube, amplificateur dans l'exemple, par les antennes 30 et 31. Sur la figure, le repère 32 désigne le jonc de brasure assurant l'assemblage étanche au vide des cellules 10 entre elles. Pour la clarté, enfin, on a limité, dans chaque section, les cellules à un petit nombre, alors qu'en réalité chacune de ces sections peut en comprendre de l'ordre de plusieurs dizaines.FIG. 2 to which reference has been made for the description of the delay line of the invention shows in section the whole of a tube constructed with this line, the latter, formed of three sections l, II and III, bears the reference 20. The tube comprises a metal envelope 21 closed at its two ends by an electron collector 22 and by an insulating foot 23 in which is housed an electron gun whose cathode has been shown at 24 and its heating filament at 25, a focusing electrode 26, as well as an acceleration electrode 27. The cathode emits, under the action of the power source 28, an electron beam 29 whose outline is shown in dotted lines. The delay line is coupled to the input and output circuits of the tube, amplifier in the example, by the antennas 30 and 31. In the figure, the reference 32 designates the solder ring ensuring the vacuum-tight assembly of the cells 10 between them. For clarity, finally, we have limited, in each section, the cells to a small number, when in reality each of these sections can comprise of the order of several tens.

Un tube équipé d'une ligne à retard selon l'invention a fourni sur la fréquence de 3 giga- hertz pour puissance haute fréquence de 300 kilowatts crête, pour une puissance crête totale appliquée de 600 kilowatts, sous la forme d'impulsions de 25 fJS avec un facteur de forme de 60 et une intensité de faisceau de 17 ampères. La ligne comportait une centaire de cellules.A tube equipped with a delay line according to the invention supplied on the frequency of 3 gigahertz for high frequency power of 300 kilowatts peak, for a total applied peak power of 600 kilowatts, in the form of pulses of 25 fJS with a form factor of 60 and a beam intensity of 17 amps. The line included a hundred cells.

L'invention s'applique de façon générale à la production de hauts niveaux de puissance à grande bande passante et avec un rendement élevé dans le domaine des micro-ondes, centimétriques notamment.The invention is generally applicable to the production of high power levels with a large bandwidth and with a high efficiency in the microwave field, particularly in the centimeter range.

Claims (7)

1. Delay line for a travelling wave tube formed of joined structures (10) each of which is composed of the following members :
- a section of a metallic waveguide (11) comprising roof members (1) of the same thickness as the section, each roof member occupying a portion of its cross-section and extending from a fraction of its periphery to a determined distance from its center ;
- a coaxial metallic ring (3) secured to the wall of the guide section by mounting rods (4) located within the free spaces between the roof members ; the structures together forming a waveguide of uniform section in which the roof members,. on the one hand, and the mounting rods, on the other hand, are aligned and extend about the electron beam along its path within the tube, characterized in that the line is subdivided into three sets of structures (I, II, III), the pitch within each set being constant and the pitch of the second and third sets of structures being smaller and larger than that of the first set of structures, respectively, when considered along the line starting from the electron gun, and the pitch variation being obtained by an increase or reduction of at least one dimension of the structures.
2. Delay line according to claim 1, characterized in that the variation of dimension consists in a variation of the thickness of the rings (3) and of their mounting rods (4), all having the same thickness d.
3. Delay line according to claim 1, characterized in that, in case the delay line comprises, in addition, a metallic conductor (2) contacting the roof members (1) on one of the faces of the section to form a short-circuit therebetween, the variation of dimension consisting in a variation of the distance between the rings (3) and the short- circuits (2).
4. Delay line according to any of claims 1 to 3, characterized in that the coupling impedance is simultaneously reduced.
5. Delay line according to claim 4, characterized in that the reduction of the coupling impedance is obtained by increasing the thickness (a) of the rings (3).
6. Delay line according to claim 4, characterized in that the reduction of the coupling impedance is obtained by increasing the width (b) of the ring mounting rods (4).
7. A travelling wave tube, and more especially an amplifying tube, comprising means for generating an electron beam and for propagating it to a collector which captures it, and a delay line which is positioned along the beam path and along which the electromagnetic waves interacting, in operation, with the beam propagate, characterized in that the delay line is a line according to claim 7.
EP80400940A 1979-07-03 1980-06-24 Slow-wave structure with varying pitch for a travelling-wave tube, and travelling-wave tube using such a slow-wave structure Expired EP0022016B1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR7917201 1979-07-03
FR7917201A FR2460539A1 (en) 1979-07-03 1979-07-03 VARIABLE NO DELAY LINE FOR PROGRESSIVE WAVE TUBE, AND PROGRESSIVE WAVE TUBE PROVIDED WITH SUCH A LINE

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EP0022016A1 EP0022016A1 (en) 1981-01-07
EP0022016B1 true EP0022016B1 (en) 1983-12-28

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US (1) US4371852A (en)
EP (1) EP0022016B1 (en)
JP (1) JPS5613641A (en)
DE (1) DE3065992D1 (en)
FR (1) FR2460539A1 (en)

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Publication number Priority date Publication date Assignee Title
FR2528626A2 (en) * 1978-12-29 1983-12-16 Thomson Csf High energy microwave frequency electromagnetic wave generator - has cyclotron frequency resonator coupled to variable-delay retarding section
FR2490872A1 (en) * 1980-09-19 1982-03-26 Thomson Csf COUPLED CAVITY DELAY LINE FOR PROGRESSIVE WAVE TUBE AND PROGRESSIVE WAVE TUBE HAVING SUCH A LINE
FR2520552A2 (en) * 1982-01-22 1983-07-29 Thomson Csf RADIO WAVE GENERATOR FOR HYPERFREQUENCY
CA1219672A (en) * 1983-05-09 1987-03-24 National Aeronautics And Space Administration Linearized traveling wave amplifier with hard limiter characteristics
US4558256A (en) * 1983-06-09 1985-12-10 Varian Associates, Inc. Velocity tapering of comb-quad traveling-wave tubes
JPH0590762U (en) * 1992-05-15 1993-12-10 日本開閉器工業株式会社 Membrane switch

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US4371852A (en) 1983-02-01
EP0022016A1 (en) 1981-01-07
FR2460539B1 (en) 1981-11-27
JPH0119224B2 (en) 1989-04-11
FR2460539A1 (en) 1981-01-23
DE3065992D1 (en) 1984-02-02
JPS5613641A (en) 1981-02-10

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