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DK148485B - PROCEDURE FOR PREPARING PLASTIC SURFACES TO BE PROVIDED WITH AN ADJUSTABLE METAL COATING BY AIRLESS METAL COVERAGE - Google Patents

PROCEDURE FOR PREPARING PLASTIC SURFACES TO BE PROVIDED WITH AN ADJUSTABLE METAL COATING BY AIRLESS METAL COVERAGE Download PDF

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Publication number
DK148485B
DK148485B DK673573AA DK673573A DK148485B DK 148485 B DK148485 B DK 148485B DK 673573A A DK673573A A DK 673573AA DK 673573 A DK673573 A DK 673573A DK 148485 B DK148485 B DK 148485B
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Denmark
Prior art keywords
permanganate
solution
plastic surfaces
surface activation
minutes
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DK673573AA
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Danish (da)
Inventor
Joseph Polichette
Edward John Leech
John G Branigan
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Kollmorgen Tech Corp
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Priority to DK179081A priority Critical patent/DK179081A/en
Publication of DK148485B publication Critical patent/DK148485B/en

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/30Activating or accelerating or sensitising with palladium or other noble metal
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2026Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by radiant energy
    • C23C18/2033Heat
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/208Multistep pretreatment with use of metal first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073Multistep pretreatment
    • C23C18/2086Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18Pretreatment of the material to be coated
    • C23C18/20Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28Sensitising or activating
    • C23C18/285Sensitising or activating with tin based compound or composition
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Adhesives Or Adhesive Processes (AREA)

Description

i U8485in U8485

Opfindelsen angår en fremgangsmåde til forbehandling af plast-overflader, hvilken fremgangsmåde er af den i krav l's indledning angivne art.The invention relates to a method for pretreating plastic surfaces, which is of the kind set out in the preamble of claim 1.

Til indstilling af pH-værdien og forholdet mellem permanganat 5 og manganat anvendes en puffer, f.eks. en phosphor- eller bor-holdig forbindelse, et carbonat, et bicarbonat eller en pH-regulator i form af en organisk eller uorganisk base. Det er kendt at forsyne overfladen af basismateriale til fremstilling af trykte kredsløb med et overtrækslag, der er fremkom-10 met ved behandling -med alkalisk permanganatopløsning og udtørring, efter at overfladen har været underkastet en ætse-proces med henblik på opnåelse af den fornødne vedhæftnings-styrke, jf. DE-offentliggørelsesskrift nr. 2.239.908. Selv cm alkaliske pemnanganatætseopløsninger er almindeligt kendte - jf. f.eks. US-patent-1Ξ skrift nr. 3.141.797 - og anvendes til rensning eller forbehandling af t metaloverflader, har det i sammenhæng med fremgangsmåder af den indledningsvis nævnte art ikke været kendt, at sammensætningen af den alkaliske ætseopløsning er af afgørende betydning for ætsningsresultatet og den ved ætsningen tilsigtede fast-20 hæftningsstyrke af det metal, som i en efterfølgende proces anbringes på underlaget. Følgende er en kendt reaktionsligning for ligevægtsindstillingen i alkalisk opløsning: 3Mn04~~ + 2H20 = Mn02 + 2Mn04" + 4 OH-, K = 16 og det teoretiske molforhold mellem manganat og permanganat 25 som funktion af pH-værdien ér da følgende: pH Manganat/permanganat 14 2,5 13 1,2 12 0,5 30 11 0,25To adjust the pH and the ratio of permanganate 5 to manganate, a buffer is used, e.g. a phosphorus or boron-containing compound, a carbonate, a bicarbonate or a pH regulator in the form of an organic or inorganic base. It is known to provide the surface of printed circuit board fabric with a coating layer obtained by treatment with alkaline permanganate solution and desiccation after the surface has been subjected to an etching process to obtain the required adhesion. strength, cf. DE Publication No. 2,239,908. Even cm alkaline pemnanganate solutions are well known - cf. U.S. Patent No. 1,141,797 - and used for cleaning or pre-treating metal surfaces, it has not been known, in the context of processes of the kind mentioned above, that the composition of the alkaline etching solution is critical to the etching result and the adhesive strength of the metal intended for etching which is applied to the substrate in a subsequent process. The following is a known reaction equation for the equilibrium setting in alkaline solution: 3Mn04 ~~ + 2H20 = Mn02 + 2Mn04 "+ 4 OH-, K = 16 and the theoretical molar ratio of manganate to permanganate 25 as a function of the pH value then the following: pH Manganate / permanganate 14 2.5 13 1.2 12 0.5 30 11 0.25

Dette er udgangspunktet for opfindelsen, hvis formål er at anvise en fremgangsmåde af den indledningsvis nævnte art, der 2 148435 kan gøres niere stabil ved valg af et bestemt pH-værdiområ-de og et bestemt manganat/permanganat-forhold ved definerede temperaturbetingelser og behandlingstider, samtidigt som de ønskede egenskaber med hensyn til fasthæftningsstyrken 5 for det metal, der skal påføres i en efterfølgende proces, forbedres.This is the starting point of the invention, the object of which is to provide a process of the kind mentioned above that can be rendered more stable by selecting a particular pH range and a specific manganate / permanganate ratio at defined temperature conditions and treatment times. while improving the desired properties with respect to the adhesive strength 5 of the metal to be applied in a subsequent process.

Det angivne formål opnås ved en fremgangsmåde, der ifølge opfindelsen er ejendommelig ved de i krav l's kendetegnende del angivne træk.The stated object is achieved by a method which according to the invention is characterized by the features of claim 1.

10 Ved at anvende opløsninger, der opfylder de i krav l's kendetegnende del angivne betingelser, og gå frem på den deri angivne måde, opnås i forhold til den kendte teknik en forbedret aktivering af bindingscentrene.By using solutions which fulfill the conditions set out in the characterizing part of claim 1 and proceed in the manner indicated therein, improved activation of the binding centers is achieved in the prior art.

Hvad virkningen angår, er permanganatopløsningerne fuldstæn- 15 digt ækvivalente med de almindeligt kendte chromsyreopløsnin-ger, men er ikke behæftet med de alvorlige problemer, der vedrører tilintetgørelse og uskadeliggørelse af syren og anvendelse af meget kostbare materialer for badbeholderne, opvarmningsorganerne, blandeorganerne m.v.As to the effect, the permanganate solutions are completely equivalent to the commonly known chromic acid solutions, but are not beset with the serious problems of annihilation and harmlessness of the acid and the use of very costly materials for the bath vessels, heating means, mixers, etc.

20 Et yderligere fortrin består i opløsningens gode stabilitet i det pågældende pH-område, idet de hidtil almindeligt anvendte, stærkt sure bade er meget mindre stabile. F.eks. indtræder ved en opløsning af 2-10 g/1 kaliumpermanganat og 600 ml/1 koncentreret svovlsyre eller 500 ml 85%'s phosphor- 25 syre en pludselig og hurtig, fuldstændig spaltning. På den anden side er de stærkt alkaliske permanganatopløsninger ganske vist meget stabile, men de arbejder meget langsommere, og den opnåede fasthæftningsstyrke for det aflejrede metallag på underlaget er meget ringe.A further advantage lies in the good stability of the solution in the pH range concerned, since the hitherto commonly used, highly acidic baths are much less stable. Eg. At a solution of 2-10 g / l potassium permanganate and 600 ml / l of concentrated sulfuric acid or 500 ml of 85% phosphoric acid, a sudden and rapid, complete decomposition occurs. On the other hand, the highly alkaline permanganate solutions are very stable, but they work much more slowly and the obtained adhesive strength for the deposited metal layer on the substrate is very poor.

30 Ved fremgangsmåden ifølge opfindelsen er det muligt at anvende et vilkårligt metalsalt af permangansyre, forudsat at det er opløseligtog stabilt i vandig opløsning op til 2 g/1. Imidlertid anvendes fortrinsvis alkali- og jordalkalisalte, f.eks.In the process of the invention, it is possible to use any metal salt of permanganic acid, provided that it is soluble and stable in aqueous solution up to 2 g / l. However, alkali and alkaline earth salts are preferably used, e.g.

148485 3 natrium- og kaliumsalt.Sodium and potassium salt.

Permanganatopløsningernes koncetrationsområde kan varieres inden for vide grænser, og kan ligge mellem 1-2 g/1 og mætningspunktet. Det skal dog bemærkes, at de bedste resultater 5 opnås med kalium- og natriumpermanganatopløsninger i området 1-60 g/1.The concentration range of permanganate solutions can be varied within wide limits, and may be between 1-2 g / l and the saturation point. However, it should be noted that the best results 5 are obtained with potassium and sodium permanganate solutions in the range of 1-60 g / l.

Aktiveringshastigheden for de kim, der er indlejret i harpiksoverfladen, vokser med permanganatopløsningens koncentration op til en koncentration på 60 g/1. Over denne værdi kan der 10 ikke iagttages nogen yderligere stigning i aktiveringshastigheden. Med lavere koncentrationer end 10 g/1 opnås der en forholdsvis lav aktiveringshastighed, san det normalt ikke er hensigtsmæssigt at anvende i produktionen.The rate of activation of the germs embedded in the resin surface increases with the concentration of the permanganate solution up to a concentration of 60 g / l. Above this value, no further increase in the activation rate can be observed. At concentrations lower than 10 g / l, a relatively low activation rate is obtained, which is not normally appropriate for use in production.

pH-Værdien kan reguleres ved at tilsætte syrer eller baser, alt efter analyseresultatet. Analysen kan udføres på følgen-15 de måde: 1) af den opløsning, der skal undersøges, udtages en prøveportion og nedkøles til stuetemperatur, 2) pH-værdien måles med et dertil egnet måleinstrument, f.eks. et pH-meter, 20 3) indstillingsopløsningen (pH-regulatoren) tilsættes i en så stor mængde, at pH-værdien antager den ønskede værdi, 4) til hovedopløsningen sættes en tilsvarende mængde indstillingsopløsning .The pH can be adjusted by adding acids or bases, depending on the analysis result. The analysis can be carried out as follows: 1) of the solution to be examined, a sample portion is taken and cooled to room temperature; 2) the pH is measured with a suitable measuring instrument, e.g. a pH meter, 3) the adjusting solution (pH controller) is added in such a quantity that the pH value assumes the desired value, 4) a corresponding amount of adjusting solution is added to the main solution.

Dersom hovedopløsningens pH-værdi f.eks. er faldet til 11,5 25 på grund af absorption af CO2 fra luften, tilsættes KOH dråbevis til den udtagne prøveportion, indtil pH-værdien indstiller sig på 12,5. Derpå sættes den beregnede mængde KOH til hovedopløsningen.If the pH of the main solution, e.g. has dropped to 11.5 25 due to absorption of CO2 from the air, KOH is added dropwise to the sampled portion until the pH reaches 12.5. Then the calculated amount of KOH is added to the main solution.

Den anden vigtige parameter for den foreliggende opløsning, 30 nemlig forholdet mellem manganat og permanganat, måles også ved at udtage en prøveportion og titrere denne med KJ, idet 4 148485 der gås frem på samme måde som ved indstillingen af pH-værdien, ved at der til den udtagne prøveportion tilsættes så meget permanganat, at den ønskede koncentration opnås, hvorpå den beregnede mængde tilsættes hovedopløsningen.The other important parameter of the present solution, namely the ratio of manganate to permanganate, is also measured by taking a sample portion and titrating it with KJ, proceeding in the same manner as in adjusting the pH value by to the sampled portion is added so much permanganate that the desired concentration is obtained, and then the calculated amount is added to the main solution.

5 Puffersubstanser, såsom phosphater, borater, carbonater eller bicarbonater, tjener også under indstillingen af det korrekte manganat/permanganat-forhold også til opnåelse af den ønskede pH-værdi. Specielt foretrukne puffere er kalium-phosphat eller monobasisk kaliumphosphat eller dibasisk ka-10 liumphosphat, kaliumpyrophosphat eller kaliumpolyphosphat eller de tilsvarende natriumsalte. Som velegnede har ligeledes vist sig saltene af borsyre, såsom kaliumborat, kalium-diborat, metaborat, orthoborat og de tilsvarende natriumsalte.Buffer substances, such as phosphates, borates, carbonates or bicarbonates, also serve to achieve the desired pH during the setting of the correct manganate / permanganate ratio. Particularly preferred buffers are potassium phosphate or monobasic potassium phosphate or dibasic potassium phosphate, potassium pyrophosphate or potassium polyphosphate or the corresponding sodium salts. Also suitable have been found the salts of boric acid such as potassium borate, potassium diborate, metaborate, orthoborate and the corresponding sodium salts.

15 De til indstilling af den korrekte pH-værdi fornødne mængder afhænger selvsagt også af den ønskede pH-værdi. Dersom man arbejder med opløste salte, opnås en væsentlig forenkling, dersom der anvendes det samme antal gram af pufferen eller de til pH-værdiindstilling anvendte salte som af permanganatmæng-20 den. I så fald kan der anvendes fra 2 til 60 g/1 alkaliphos-phat, carbonat, mono- eller dibasisk phosphat eller peroxydi-phosphat eller et af de allerede nævnte borater.Of course, the quantities needed to set the correct pH value also depend on the desired pH value. When working with dissolved salts, a significant simplification is obtained if the same number of grams of the buffer or the salts used for pH adjustment as the permanganate amount is used. In this case, from 2 to 60 g / l of alkali phosphate, carbonate, mono- or dibasic phosphate or peroxydiphosphate or one of the borates already mentioned may be used.

Ved behov kan der til opløsningen sættes et almindeligt på markedet tilgængeligt befugtningsmiddel, såsom f.eks. fluor-25 carbonhydrid.If necessary, a common wetting agent, such as e.g. fluorocarbon.

Tid og temperatur for aktiveringstrinnet vil variere, og i almindelighed fremskyndes processen ved højere temperaturer. Behandlingstiden varierer fra 30 sekunder til 2 timer, temperaturen kan ligge mellem 20°C og 100°C, idet de bedste re-30 sultater i reglen opnås ved temperaturer mellem 40 og 70°C og behandlingstider mellem 2 og 20 minutter. De overflader, der skal behandles, kan bringes i berøring med opløsningen på forskellige måder, f.eks. ved neddypning, eller sprøjtning eller 5 U8485 lignende almindeligt kendte metoder.The time and temperature of the activation step will vary and generally the process is accelerated at higher temperatures. The treatment time varies from 30 seconds to 2 hours, the temperature can be between 20 ° C and 100 ° C, with the best results usually being obtained at temperatures between 40 and 70 ° C and treatment times between 2 and 20 minutes. The surfaces to be treated can be brought into contact with the solution in various ways, e.g. by immersion, or spraying or similar commonly known methods.

De genstande, der skal behandles, består enten i sin helhed af en kunstharpiks eller -harpiksblanding, eller de har kun et overtræk af sådant materiale.The articles to be treated either consist in their entirety of an artificial resin or resin mixture, or they have only a coating of such material.

5 Plastoverfladerne forbehandles fortrinsvis på en sådan måde, at de i det mindste for en tid er polariserede og befugtelige.The plastic surfaces are preferably pretreated in such a way that they are at least for a time polarized and wettable.

Dette kan udføres ved påsprøjtning af eller neddypning i en væske, såsom dimethylformamid, dimethylsulfoxid, N-methyl-2-pyrrolidon, ketoner eller halogenerede carbonhydrider eller 10 blandinger deraf.This can be accomplished by spraying or dipping in a liquid such as dimethylformamide, dimethyl sulfoxide, N-methyl-2-pyrrolidone, ketones or halogenated hydrocarbons or mixtures thereof.

Ved visse substrater, f.eks. en acrylonitril-butadien-styren-harpiks, er det tilrådeligt med en forbehandling bestående i dypning f.eks. i en stærk opløsning af svovlsyre, salpetersyre, phosphorsyre, toluensulfonsyre eller en stærk amin. Med 15 en sådan behandling kan der opnås fortrinlige bindinger uden blæredannelse. Sådanne fordele opnås overraskende ikke med dette substrat, når man i stedet anvender stærke opløsninger af saltsyre eller natriumhydroxid.For certain substrates, e.g. an acrylonitrile-butadiene-styrene resin, it is advisable to have a pretreatment consisting of dipping e.g. in a strong solution of sulfuric acid, nitric acid, phosphoric acid, toluene sulfonic acid or a strong amine. With such treatment, excellent bonds can be obtained without blistering. Surprisingly, such benefits are not obtained with this substrate when strong solutions of hydrochloric acid or sodium hydroxide are used instead.

Det vil være klart for fagfolk inden for strømløs metalaf-20 sætning, at hvis overfladen ikke i sig selv er aktiv for afsætning af metal ad strømløs ved, f.eks. hvis der ikke er nogen katalysator, såsom kobberoxid, til stede i harpikslegemet, vil det, efter forbehandling ifølge opfindelsen til fremme af aktivering af bindingspunkter, være nødvendigt at indføje et 25 trin til at gøre den aktiverede overflade katalytisk for optagelse af strømløst afsat metal inden kontakt med det strømløse metalafsætningsbad. Der eksisterer mange velkendte metoder til at gøre overfladen katalytisk. Blandt disse er der trinvise processer, såsom neddypning af legemet først i en 30 opløsning af stannoioner og derpå i en sur opløsning af ædelmetal-, såsom palladium- eller platinioner. På den anden side kan der også anvendes ét enkelt bad til sådanne formål, såsom de dispersioner af kolloidt palladium og tinioner, der er beskrevet i USA-patent nr. 3.011.920, eller fortrinsvis de 6 U8485 opløselige komplekser af ædelmetaller, stannoioner og anioner, der er beskrevet i USA-patent nr. 3.672.938.It will be clear to those skilled in the art of powerless metal deposition that if the surface is not itself active for the deposition of metal by powerless wood, e.g. if no catalyst such as copper oxide is present in the resin body, after pretreatment according to the invention to promote activation of bonding points, it will be necessary to insert a 25 step to render the activated surface catalytic for uptake of deposited metal before contact with the powerless metal deposition bath. Many well-known methods for making the surface catalytic exist. Among these, there are incremental processes such as immersing the body first in a solution of stannous ions and then in an acidic solution of precious metal such as palladium or platinum ions. On the other hand, a single bath may also be used for such purposes as the colloidal palladium and tin ions dispersions disclosed in U.S. Patent No. 3,011,920, or preferably the 6 U8485 soluble complexes of precious metals, stannous ions and anions. , disclosed in U.S. Patent No. 3,672,938.

Det således aktiverede(og om nødvendigt katalyserede) harpikslegeme metalliseres så ved strømløs afsætning, f.eks. afsættes 5 et nikkellag fra et konventionelt surt nikkel-hypophosphit-bad ved en moderat forhøjet temperatur, såsom 50-60°C, eller fra et alkalisk nikkel-bad ved omkring 20 til 35°C, som kendt i teknikken. I stedet for nikkel kan man påføre kobber ad strøm-løs vej fra et konventionelt kobberafsætningbad, som udover 10 et reducerende middel for cupriioner indeholder et kompleksdannende middel og andre konventionelle ingredienser. Et egnet kobberafsætningsbad består f.eks. af: CuSO^-5^0, 30 g/1; Rochellesalte, 150 g/1; befugtningsmiddel 1 ml; natriumcyanid, 30 mg/1; formaldehyd (37%'s), 15 ml/1; natriumhydroxid i en 15 mængde, der giver pH 13. Andre egnede strømløse metalafsætningsbade er beskrevet i USA-patenterne nr. 3.445.350, 3.437.507, 3.433.828 og 3.625.758, og guld-, sølv- og cobalt-samt andre strømløse afsætningsbade er kendt af fagmanden.The resin body thus activated (and, if necessary, catalyzed) is then metallized by powerless deposition, e.g. a nickel layer is deposited from a conventional acidic nickel hypophosphite bath at a moderately elevated temperature such as 50-60 ° C, or from an alkaline nickel bath at about 20 to 35 ° C, as known in the art. Instead of nickel, copper can be applied by current-free pathway from a conventional copper deposition bath, which, in addition to a copper reducing agent, contains a complexing agent and other conventional ingredients. A suitable copper deposition bath consists e.g. of: CuSO ^ -5 ^ 0.30 g / l; Rochelle salt, 150 g / l; wetting agent 1 ml; sodium cyanide, 30 mg / l; formaldehyde (37%), 15 ml / l; sodium hydroxide in a 15 to give pH 13. Other suitable streamless metal deposition baths are disclosed in U.S. Patents Nos. 3,445,350, 3,437,507, 3,433,828 and 3,625,758, and gold, silver and cobalt, and others. Powerless outlets are known to those skilled in the art.

Selv om det ikke er tvingende nødvendigt, er det en foretruk-20 ket praksis efter behandling med det her omhandlede middel at fremme aktiveringen af bindingspunkterne med et andet middel for at "neutralisere" permanganatet forud for katalyse og strømløs metalafsætning. Dette middel synes at fjerne overskydende permanganat fra harpiksoverfladen og forhindrer for-25 . tynding og andre eventuelle effekter som følge af resterende stærkt oxidationsmiddel på de følgende trin og bade i processen. Som neutralisationsmidler kan der anvendes stannoioner, såsom dem, der hidrører fra et surt stannochloridbad. Egnet er også bisulfitioner, hydroxylamin, sukker eller faktisk 30 enhver almindeligt kendt vandopløselig forbindelse, der kan oxideres af permanganat. Alt, hvad der er nødvendigt for at opnå den ønskede neutraliserende effekt, er at neddyppe det med permanganat behandlede substrat i en vandig opløsning af neutralisationsmidlet ved en koncentration på f.eks. 2 til 35 100 g/1 i kort tid og derpå skylle grundigt med vand, inden det næste trin udføres. Dette valgfrie trin illustreres i eksemplerne.Although not imperative, it is a preferred practice, after treatment with the present invention, to promote activation of the binding sites with another agent to "neutralize" the permanganate prior to catalysis and powerless metal deposition. This agent appears to remove excess permanganate from the resin surface and prevents pre-25. thinning and other possible effects due to residual strong oxidizing agent on the following steps and baths in the process. Stannous ions such as those derived from an acidic stannous chloride bath may be used as neutralizing agents. Also suitable are bisulfitions, hydroxylamine, sugar or indeed any commonly known water-soluble compound which can be oxidized by permanganate. All that is needed to achieve the desired neutralizing effect is to immerse the permanganate-treated substrate in an aqueous solution of the neutralizing agent at a concentration of e.g. 2 to 35 100 g / l for a short time and then rinse thoroughly with water before performing the next step. This optional step is illustrated in the examples.

7 148Λ857 148Λ85

Det har vist sig, at der opnås overlegne bindinger, hvis det metalliserende bad på kendt måde formuleres således, at afsætningen af metal ad strømløs vej sker langsomt. Ved en udførelsesform indledes afsætningen med et langsomt bade, hvorpå em-5 net flyttes til et hurtigt strømløst bad. Dette gør nedgangen i hastigheden ved dette nøgle-produktionstrin minimal.It has been found that superior bonds are obtained if the metallizing bath is formulated in a known manner such that the deposition of metal by a powerless path occurs slowly. In one embodiment, the deposit is started with a slow bath, whereupon the article is moved to a fast powerless bath. This minimizes the decline in speed at this key production stage.

Eksempel 1.Example 1.

Det følgende eksempel illustrerer anvendelse af et aktiveringsbad, hvori pH og permanganat/manganat-forholdet reguleres ved 10 hjælp af en stærk base.The following example illustrates the use of an activation bath in which the pH and permanganate / manganate ratio are controlled by a strong base.

Et epoxy-glas-laminat med en overfladebelægning af en harpiksrig epoxyphenolharpiks-nitrilgummi metalliseres ved følgende procedure: a) overfladen rensen og skylles med vand, 15 b) emnet nedsænkes i 2 minutter ved ca. 60°C under svag omrøring i en opløsning, der indeholder KMn04 40 g KOH (45%'s vandig opløsning) til pH 12,5 vand (op til) 1000 ml, 20 c) emnet skylles i stille (ikke rindende) vand,- d) man neutraliserer i 5 minutter ved 20-25°C i en opløsning, der indeholder hydroxylamin · HC1 50 g kone. HCl (37%'s vandig 25 opløsning) 20 ml vand (op til) 1000 ml, e) man nedsænker emnet i 2 minutter ved 20-25°C i vand, der indeholder 300 ml/1 37%'s saltsyre, f) skyller emnet med rindende vand ved 20-25°C, 30 g) nedsænker emnet i 10 minutter i en sensibiliseringsopløsning, der indeholder: 8 148485 palladiumchlorid 1 g stannochlorid 60 g kone. HC1 (37%'s vandig opløsning) 100 ml 5 vand (op til) 1000 ml, i form af et palladiumchlorid-stannochloridkompleks, USA-pa-tent nr. 3.672.938, h) man skyller med vand, i) man nedsænker emnet ved 55¾ i et- strømløst kobberafsætnings-10 bad, ifølge USA-patent nr. 3.672.986, eksempel 7, ca. 50 timer til strømløs afsætning af et overtræk af duktilt kobber med en tykkelse på ca. 0,25 mm, og j) man skyller med vand og lufttørrer.An epoxy glass laminate with a surface coating of a resin-rich epoxyphenol resin nitrile rubber is metallized by the following procedure: a) the surface is cleaned and rinsed with water; b) the blank is immersed for 2 minutes at ca. 60 g C with gentle stirring in a solution containing KMnO 4 40 g KOH (45% aqueous solution) to pH 12.5 water (up to) 1000 ml, 20 c) the substance is rinsed in still (non-running) water, - d) neutralize for 5 minutes at 20-25 ° C in a solution containing hydroxylamine · HCl 50 g wife. HCl (37% aqueous solution) 20 ml water (up to) 1000 ml, e) immerse the blank for 2 minutes at 20-25 ° C in water containing 300 ml / l 37% hydrochloric acid, ) rinse the blank with running water at 20-25 ° C, 30 g) immerse the blank for 10 minutes in a sensitization solution containing: 8 148485 palladium chloride 1 g stannous chloride 60 g wife. HCl (37% aqueous solution) 100 ml water (up to) 1000 ml, in the form of a palladium chloride-stannous chloride complex, U.S. Patent No. 3,672,938; (h) rinsing with water; the blank at 55¾ in a powerless copper deposition bath, according to U.S. Patent No. 3,672,986, Example 7, ca. 50 hours for powerless deposition of a ductile copper coating of approx. 0.25 mm, and j) rinse with water and air dryer.

Det metalliserede lag prøves for vedhæftning ved at måle afskræl-15 ningsstyrken ved standard-procedurer. Der opnås høje afskræl-ningsstyrker på mere end 1,8 kg/cm og op til 2,3 kg/cm med et gennemsnit på omkring 1,9 kg/cm for 6 prøver.The metallized layer is tested for adhesion by measuring the peel strength by standard procedures. High peel strengths of more than 1.8 kg / cm and up to 2.3 kg / cm are obtained with an average of about 1.9 kg / cm for 6 samples.

Eksempel 2.Example 2.

Proceduren i eksempel 1 gentages, idet man dog anvender en 20 støbt plade af "Cycolac" EP 3530, et isolerende substrat eller basismateriale bestående af en butadien-acrylonitril-styren-podnings-copolymer indeholdende små mængder stabilisatorer, blødgørere og pigmenter, og indskyder en forbehandlings-dypning i 80 vægt-%'s vandig svovlsyre ved 23°C i 3 til 10 minut-25 ter. Nedsænkningen i den aktiverende opløsning ved pH 12,5 varer i 10 minutter ved 23°C. Der opnås fortrinlige bindingsstyrker og metalliserede lag uden blærer.The procedure of Example 1 is repeated, however, using a cast plate of "Cycolac" EP 3530, an insulating substrate or base material consisting of a butadiene-acrylonitrile-styrene graft copolymer containing small amounts of stabilizers, plasticizers and pigments, pretreatment dipping in 80% by weight aqueous sulfuric acid at 23 ° C for 3 to 10 minutes. The immersion in the activating solution at pH 12.5 lasts for 10 minutes at 23 ° C. Excellent bond strengths and metallized layers without blisters are obtained.

De følgende eksempler illustrerer bade, hvori permanganat/manga-nat-forholdet og pH-værdien styres med puffer-forbindelser.The following examples illustrate baths in which the permanganate / manganate ratio and pH are controlled with buffer compounds.

30 Eksempel 3.Example 3.

En støbt plade af en butadien-acrylonitril-styren-podnings-polymer ("Cycolac" EP 3530) metalliseres ved følgende proce- 148485 9 dure : a) man renser overfladen i 5 minutter ved 70°C i vand, der indeholder 50 g/1 trinatriumphosphat, b) man skyller med vand, 5 c) man nedsænker emnet i 5 minutter ved ca. 20-25°C under svag omrøring i en opløsning, der indeholder methylketon 200 ml ikke-ionisk befugtningsmiddel (Triton X-100, Rohm & Haas Co.) 1 ml 10 vand (op til) 1000 ml d) man fremmer aktiveringen af bindingspunkterne ved i 10 minutter ved 70°C at nedsænke i en opløsning, der består af formulering nr. 3 (se den· efterfølgende tabel), 15 e) man skyller i stille (ikke rindende vand, f) man neutraliserer (eventuelt) i 5 minutter ved 20-25°C i en opløsning, der indeholder: stannochlorid-dihydrat 30 g saltsyre (37%'s) 330 ml 20 vand (op til) 1000 ml.A cast plate of a butadiene-acrylonitrile-styrene grafting polymer ("Cycolac" EP 3530) is metallized by the following procedures: a) the surface is cleaned for 5 minutes at 70 ° C in water containing 50 g / ml 1 trisodium phosphate, b) rinse with water, 5 c) immerse the blank for 5 minutes at approx. 20-25 ° C with gentle stirring in a solution containing methyl ketone 200 ml nonionic wetting agent (Triton X-100, Rohm & Haas Co.) 1 ml 10 water (up to) 1000 ml d) promoting activation of the binding points by immersing for 10 minutes at 70 ° C in a solution consisting of formulation # 3 (see the following table), 15 e) rinsing in still (non-running water, f) neutralizing (optionally) for 5 minutes minutes at 20-25 ° C in a solution containing: stannous chloride dihydrate 30 g of hydrochloric acid (37%) 330 ml of water (up to) 1000 ml.

Sensibilisering og metallisering udføres ved proceduren i eksempel 1, trin e) til j).Sensitization and metallization are performed by the procedure of Example 1, steps e) to j).

Den metalliserede plade prøves for vedhæftning ved måling af afskrælningsstyrken ved standard-procedurer. Der opnås en høj 25 afskrælningsværdi på fra 1,46 til 1,80 kg/cm (bredden af den afrevne metalstrimmel).The metallized plate is tested for adhesion by measuring the peel strength by standard procedures. A high peel value of from 1.46 to 1.80 kg / cm (the width of the strip of metal strip) is obtained.

Eksempel 4.Example 4

Proceduren i eksempel 3 gentages, idet man i stedet for badet i trin d) anvender en opløsning, der består af: 30 formulering nr. 4 (se tabellen nedenfor).The procedure of Example 3 is repeated, instead of using the bath in step d), a solution consisting of: Formulation # 4 (see table below).

Der opnås stærkt bundne metallag efter strømløs afsætning.Highly bonded metal layers are obtained after powerless deposition.

10 14848510 148485

Eksempel 5.Example 5

Proceduren i eksempel 3 gentages, idet man i stedet for badet i trin d) anvender en opløsning, der består af: formulering nr. 5 5 (se tabellen nedenfor).The procedure of Example 3 is repeated, instead of using the bath in step d), a solution consisting of: Formulation No. 5 (see table below).

Der opnås stærkt bundne metallag efter strømløs afsætning.Highly bonded metal layers are obtained after powerless deposition.

TabelTable

AktiverinqsbadeAktiverinqsbade

Formulering nr. 34 5 10 KMn04, g 40 40 40 kh2po4, g K2HP04, g 30 K3P04, g 40 K2C03, g 40 15 k3bo3, gFormulation No. 34 5 10 KMn04, g 40 40 40 kh2po4, g K2HPO4, g 30 K3PO4, g 40 K2CO3, g 40 15 k3bo3, g

Vand bp til) 1000 1000 1000 pH 11,6 12,5 11,0 * - Der er tilsat tilstrækkeligt KOH til at nå pH 12,5.Water bp to 1000 1000 1000 pH 11.6 12.5 11.0 * - Sufficient KOH has been added to reach pH 12.5.

En række aktiveringsopløsninger, der indeholder 40 g/1 kalium-20 permanganat og 30 g/1 K2HP04, fremstilles og indstilles på forskellige pH-værdier inden for området på fra 11 til 13,0.A variety of activation solutions containing 40 g / l potassium-20 permanganate and 30 g / l K 2 HPO 4 are prepared and adjusted to various pH values in the range of 11 to 13.0.

Der fremstilles aktiverede overflader ifølge den generelle procedure i eksempel 1, idet man dog bruger en aktiveringsbadtemperatur på 70°C og en neddypning i 15 minutter.Activated surfaces are prepared according to the general procedure of Example 1, however, using an activation bath temperature of 70 ° C and a dip for 15 minutes.

25 Neutraliseringsbadet indeholder 50 g/1 hydroxylamin-hydrochlorid og 20 ml/1 37%'s saltsyre.The neutralization bath contains 50 g / l hydroxylamine hydrochloride and 20 ml / l 37% hydrochloric acid.

Efter metallisering bestemmes afskrælningsstyrkerne; de opnåede data er vist grafisk i fig. 1. Den øvre kurve viser da-taerne fra aktivering af én type harpikslag; den nedre kurve 30 viser dataerne fra aktivering af en anden type harpikslag, 11 U8485 nemlig et epoxyphenolharpiks-nitrilgummi-adhæsiv.After metallization, the peel strengths are determined; the data obtained are shown graphically in FIG. 1. The upper curve shows the data from activation of one type of resin layer; the lower curve 30 shows the data from activation of another type of resin layer, namely an epoxyphenol resin nitrile rubber adhesive.

Disse data viser, at der sikres høje bindingsstyrker, og at der opnås et særligt foretrukket maksimum ved mellem 12 og 12.5 på pH-skalaen.These data show that high bond strengths are ensured and a particularly preferred maximum is achieved at between 12 and 12.5 on the pH scale.

5 På lignende måde blev effekten af temperaturen på afskrælnings-styrken bestemt ved, at man fremstillede et aktiveringsbad, der indeholdt 40 g/1 kaliumpermanganat, 30 g/1 K2HP04, og som var indstillet til en pH-værdi på 12,5 med kaliumhydroxid. Der anvendtes den generelle procedure i eksempel 1 med en aktive-10 ringstid på 15 minutter, og aktiveringsbadets temperatur blev varieret over området fra 60 til 80°C. De opnåede data er vist i grafisk form på fig. 2. Den øvre kurve viser data fra aktivering af én type harpikslag; den nedre kurve viser data fra aktivering af en anden type harpikslag. På lignende måde blev 15 effekten af permanganatkoncentrationen på afskrælningsstyrken bestemt ved, at man fremstillede et aktiveringsbad, der indeholdt 30 g/1 K^HPO^, og som var indstillet til en pH-værdi på 12.5 med kaliumhydroxid, og derpå varierede permanganatkoncentrationen inden for området på fra 20 til 50 g/1. Disse bade 20 blev anvendt ifølge proceduren i eksempel 1 med en aktiveringstid på 15 minutter, og aktiveringsbadets temperatur blev holdt ved 70°c. De opnåede data er vist i grafisk form på fig. 3. Den øvre kurve repræsenterer data fra aktivering af én type harpikslag; den nedre kurve repræsenterer data fra 25 aktivering af en anden type harpikslag, nemlig et epoxy-phenol-harpiks-nitrilgummi-adhæsiv.Similarly, the effect of the temperature on the peel strength was determined by preparing an activation bath containing 40 g / l potassium permanganate, 30 g / l K 2 HPO 4 and adjusted to a pH of 12.5 with potassium hydroxide. . The general procedure of Example 1 was used with a activation time of 15 minutes and the temperature of the activation bath varied over the range from 60 to 80 ° C. The data obtained are shown in graphical form in FIG. 2. The upper curve shows data from activation of one type of resin layer; the lower curve shows data from activation of another type of resin layer. Similarly, the effect of the permanganate concentration on the peel strength was determined by preparing an activation bath containing 30 g / l of K 2 HPO range from 20 to 50 g / l. These baths 20 were used according to the procedure of Example 1 with an activation time of 15 minutes and the temperature of the activation bath was maintained at 70 ° C. The data obtained are shown in graphical form in FIG. 3. The upper curve represents data from activation of one type of resin layer; the lower curve represents data from activation of another type of resin layer, namely, an epoxy-phenol-resin-nitrile rubber adhesive.

I stedet for kobberbadet kan der anvendes andre strømløse bade, der indeholder metaller fra gruppe IB og VIII, f.eks. de nikkelbade, der er beskrevet i Brenner, Metal Finishing, novem-30 ber 1954, side 68-76, eller de guldbade, der er beskrevet i USA-patent nr. 2.976.181. Ligeledes kan man anvende cobalt-, sølv- og andre bade, der er velkendte for fagmanden.Instead of the copper bath, other powerless baths containing Group IB and VIII metals, e.g. the nickel baths described in Brenner, Metal Finishing, November 30, 1954, pages 68-76, or the gold baths disclosed in U.S. Patent No. 2,976,181. Also cobalt, silver and other baths well known to those skilled in the art can be used.

I aktiveringsopløsningerne kan der i stedet for vand alene somIn the activation solutions, instead of water alone, as

Claims (4)

148485 t opløsningsmiddel anvendes en blanding af vand og andre ikke-oxiderbare opløsningsmidler, såsom eddikesyre. I stedet for kaliumpermanganat kan der anvendes natrium- og lithiumperman-ganat. I stedet for f.eks. kaliumcarbonat eller kaliumhydr-5 oxid kan der anvendes natrium- og lithiumhydroxider. I visse udførelsesformer kan der i stedet for methylethylketon (eksempel 3, trin c) anvendes dimethylformamid, methylchlorid, di-methylsulfoxid og N-methyl-2-pyrrolidon.148485 t of solvent is used a mixture of water and other non-oxidizable solvents such as acetic acid. Instead of potassium permanganate, sodium and lithium permanganate can be used. Instead of e.g. potassium carbonate or potassium hydroxide, sodium and lithium hydroxides can be used. In certain embodiments, dimethylformamide, methyl chloride, dimethyl sulfoxide, and N-methyl-2-pyrrolidone can be used in place of methyl ethyl ketone (Example 3, step c). 1. Fremgangsmåde til forbehandling af plastoverflader, hvorpå der ved strømløs metalafsætning skal påføres et vedhæftende metallag, ved hjælp af pufrede redoxsystemer på basis af permangansyre i vandig opløsning, kendetegnet ved, at overfladeaktiveringsopløsningerne, som indeholder permanganat- 15 og manganationer i et molforhold på op til 1,2, og som har en pH-værdi mellem 11 og 13, bringes i kontakt med plastoverfladerne i et temperaturområde mellem 20 og 100°C, fortrinsvis mellem 40 og 70°C i et tidsrum på fra 30 sekunder til 120 minutter, fortrinsvis fra 2 til 20 minutter, hvorpå plastoverfladerne skylles og 20 derpå, am så ønskes, behandles med en neutraliseringsopløsning.A process for pre-treating plastic surfaces to which an adhesive metal layer is to be applied by electroless metal deposition, by means of buffered redox systems based on permanganic acid in aqueous solution, characterized in that the surface activation solutions containing permanganate and manganese in a molar ratio of up to to 1.2 and having a pH between 11 and 13 are contacted with the plastic surfaces in a temperature range between 20 and 100 ° C, preferably between 40 and 70 ° C for a period of from 30 seconds to 120 minutes, preferably from 2 to 20 minutes, after which the plastic surfaces are rinsed and then, if desired, treated with a neutralization solution. 2. Fremgangsmåde ifølge krav 1, kendetegnet ved, at pH-værdien i overfladeaktiveringsopløsningen holdes på 12,5.Process according to claim 1, characterized in that the pH of the surface activation solution is kept at 12.5. 3. Fremgangsmåde ifølge krav 1 eller 2, kendetegnet ved, at forholdet mellem permanganat- og manganationer i 25 overfladeaktiveringsopløsningen samt dennes pH-værdi indstilles ved kontinuerlig eller halvkontinuerlig tilsætning af et pH-regulerende stof.Process according to claim 1 or 2, characterized in that the ratio of permanganate to manganese ions in the surface activation solution as well as its pH is adjusted by continuous or semi-continuous addition of a pH-regulating substance. 4. Fremgangsmåde ifølge krav 1, 2 eller 3, kendetegne t ved, at forholdet mellem permanganat- og manganationer i 30 overfladeaktiveringsopløsningen samt dennes pH-værdi indstilles på i og for sig kendt måde ved tilsætning af puffere, idet der som pufferstoffer fortrinsvis anvendes phosphater, carbonater, borater samt blandinger deraf.Process according to claim 1, 2 or 3, characterized in that the ratio of permanganate to manganese ions in the surface activation solution as well as its pH is adjusted in a manner known per se by the addition of buffers, preferably using phosphates as buffers. , carbonates, borates and mixtures thereof.
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IT (1) IT1000480B (en)
NL (1) NL178018C (en)
SE (1) SE419239B (en)

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Publication number Priority date Publication date Assignee Title
ZA756783B (en) * 1974-11-07 1976-10-27 Kollmorgen Corp Method for cleaning holes in resincontaining materials
JPS536376A (en) * 1976-07-06 1978-01-20 Minolta Camera Kk Pretreating of reinforced plastics for electr plating
JPS5418875A (en) * 1977-07-12 1979-02-13 Nippon Denki Kagaku Co Ltd Pretreatment for nonnelectrolytic copper plating on epoxyresin substrate
DE3806884C1 (en) * 1988-03-03 1989-09-21 Blasberg-Oberflaechentechnik Gmbh, 5650 Solingen, De Through-plated contact printed circuit and method for fabricating it
DK175025B1 (en) * 2002-09-26 2004-05-03 Inst Produktudvikling Process for pretreating a surface of a non-conductive material to be plated

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US3652351A (en) * 1970-05-13 1972-03-28 Carus Corp Processes for etching synthetic polymer resins with alkaline alkali metal manganate solutions

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ES421398A1 (en) 1976-04-16
AT328822B (en) 1976-04-12
AU6175973A (en) 1975-04-24
NL178018B (en) 1985-08-01
NL178018C (en) 1986-01-02
FR2210652A1 (en) 1974-07-12
GB1401600A (en) 1975-07-16
CH606471A5 (en) 1978-10-31
JPS4989771A (en) 1974-08-27
JPS5224549B2 (en) 1977-07-01
IT1000480B (en) 1976-03-30
DE2362381C3 (en) 1978-08-31
DE2362381B2 (en) 1977-05-05
DE2362381A1 (en) 1974-07-04
FR2210652B1 (en) 1976-06-25
ATA1029173A (en) 1975-06-15
NL7317078A (en) 1974-06-17
SE419239B (en) 1981-07-20
DE2365730B2 (en) 1977-04-21
DE2365730A1 (en) 1976-04-22

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