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DK0437883T3 - Skanderingsindretning til optisk skandering af en overflade langs en linie - Google Patents

Skanderingsindretning til optisk skandering af en overflade langs en linie

Info

Publication number
DK0437883T3
DK0437883T3 DK90203396.8T DK90203396T DK0437883T3 DK 0437883 T3 DK0437883 T3 DK 0437883T3 DK 90203396 T DK90203396 T DK 90203396T DK 0437883 T3 DK0437883 T3 DK 0437883T3
Authority
DK
Denmark
Prior art keywords
optical
scanning device
line
scanning
surface along
Prior art date
Application number
DK90203396.8T
Other languages
Danish (da)
English (en)
Inventor
Willem Dirk Van Amstel
Joseph Louis Horijon
Original Assignee
Philips Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Nv filed Critical Philips Nv
Application granted granted Critical
Publication of DK0437883T3 publication Critical patent/DK0437883T3/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10Scanning systems
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G02B27/0031Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration for scanning purposes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/682Mask-wafer alignment
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/89Investigating the presence of flaws or contamination in moving material, e.g. running paper or textiles
    • G01N21/8901Optical details; Scanning details
    • G01N2021/8905Directional selective optics, e.g. slits, spatial filters
    • G01N2021/8907Cylindrical optics

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Optics & Photonics (AREA)
  • Biochemistry (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • General Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Textile Engineering (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Lenses (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Light Guides In General And Applications Therefor (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Noodles (AREA)
  • Epoxy Compounds (AREA)
  • Facsimile Scanning Arrangements (AREA)
DK90203396.8T 1990-01-16 1990-12-18 Skanderingsindretning til optisk skandering af en overflade langs en linie DK0437883T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL9000100 1990-01-16

Publications (1)

Publication Number Publication Date
DK0437883T3 true DK0437883T3 (da) 1994-10-03

Family

ID=19856420

Family Applications (1)

Application Number Title Priority Date Filing Date
DK90203396.8T DK0437883T3 (da) 1990-01-16 1990-12-18 Skanderingsindretning til optisk skandering af en overflade langs en linie

Country Status (11)

Country Link
US (1) US5170037A (fi)
EP (1) EP0437883B1 (fi)
JP (1) JP2995238B2 (fi)
KR (1) KR0170783B1 (fi)
AT (1) ATE108029T1 (fi)
CA (1) CA2034017C (fi)
DE (1) DE69010318T2 (fi)
DK (1) DK0437883T3 (fi)
ES (1) ES2058766T3 (fi)
FI (1) FI104297B1 (fi)
IL (1) IL96947A (fi)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5512760A (en) * 1993-05-06 1996-04-30 U.S. Philips Corporation Optical height detector with coaxial irradiation and image axes and plural detectors spaced along the image axis
DE19528519A1 (de) * 1995-08-03 1997-02-06 Tzn Forschung & Entwicklung Vorrichtung zur Detektion streifenförmiger Oberflächenfehler
DE19714221A1 (de) * 1997-04-07 1998-10-08 Zeiss Carl Fa Konfokales Mikroskop mit einem motorischen Scanningtisch
EP1436646A4 (en) * 2001-09-13 2006-09-13 Anzpac Systems Ltd METHOD AND DEVICE FOR ARTICLE TESTING
US8441694B2 (en) * 2003-09-30 2013-05-14 Hewlett-Packard Development Company, L.P. Method and an apparatus for adjusting a scanning target area of an image reproduction device
DE102005061834B4 (de) 2005-12-23 2007-11-08 Ioss Intelligente Optische Sensoren & Systeme Gmbh Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche
KR100816078B1 (ko) * 2006-06-19 2008-03-24 광운대학교 산학협력단 공간영상 투영장치 및 그 방법
WO2009061458A1 (en) * 2007-11-07 2009-05-14 Amfit, Inc. Impression foam digital scanner
CN111536949A (zh) * 2020-06-04 2020-08-14 马鞍山芯乔科技有限公司 多面镜旋转取像装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH539892A (de) * 1971-03-22 1973-07-31 Zellweger Uster Ag Abtastvorrichtung für optisch erkennbare Zeichen
US3995110A (en) * 1973-12-20 1976-11-30 Xerox Corporation Flying spot scanner with plural lens correction
DE2550814C3 (de) * 1975-11-12 1979-08-09 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Zeilentastvorrichtung für Materialbahnen zur Fehlstellenermittlung
DE2827705C3 (de) * 1978-06-23 1981-07-30 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Gerät zur Feststellung von Fehlern an Bahnmaterial
DE3431540A1 (de) * 1984-07-02 1986-03-06 Elektro Optik Gmbh & Co Kg Verfahren zur korrektur der sphaerischen aberration und des astigmatismus eines ausmittigen lichtbuendels in einer spiegeloptik
US4872757A (en) * 1988-04-20 1989-10-10 Ball Corporation Optical convex surface profiling and gauging apparatus and method therefor

Also Published As

Publication number Publication date
FI910150A0 (fi) 1991-01-11
KR0170783B1 (ko) 1999-05-01
IL96947A (en) 1993-07-08
ATE108029T1 (de) 1994-07-15
DE69010318T2 (de) 1995-01-26
DE69010318D1 (de) 1994-08-04
FI910150A (fi) 1991-07-17
IL96947A0 (en) 1992-03-29
EP0437883A1 (en) 1991-07-24
CA2034017A1 (en) 1991-07-17
ES2058766T3 (es) 1994-11-01
EP0437883B1 (en) 1994-06-29
FI104297B (fi) 1999-12-15
FI104297B1 (fi) 1999-12-15
CA2034017C (en) 2001-08-21
JP2995238B2 (ja) 1999-12-27
JPH04212120A (ja) 1992-08-03
US5170037A (en) 1992-12-08

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