DE756216C - Electrolytic process for roughening the surface of an electrode, especially for electrolytic capacitors - Google Patents
Electrolytic process for roughening the surface of an electrode, especially for electrolytic capacitorsInfo
- Publication number
- DE756216C DE756216C DES125400D DES0125400D DE756216C DE 756216 C DE756216 C DE 756216C DE S125400 D DES125400 D DE S125400D DE S0125400 D DES0125400 D DE S0125400D DE 756216 C DE756216 C DE 756216C
- Authority
- DE
- Germany
- Prior art keywords
- electrode
- roughening
- electrolytic
- hydrochloric acid
- mixtures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims description 21
- 238000007788 roughening Methods 0.000 title claims description 13
- 239000003990 capacitor Substances 0.000 title claims description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 17
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 10
- 239000002253 acid Substances 0.000 claims description 9
- 238000005530 etching Methods 0.000 claims description 8
- 239000003792 electrolyte Substances 0.000 claims description 7
- 150000007513 acids Chemical class 0.000 claims description 6
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 claims description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 4
- 239000000243 solution Substances 0.000 claims description 4
- 239000011833 salt mixture Substances 0.000 claims description 3
- 150000003839 salts Chemical class 0.000 claims description 3
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 150000002366 halogen compounds Chemical class 0.000 claims description 2
- 239000012266 salt solution Substances 0.000 claims description 2
- 239000011780 sodium chloride Substances 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 1
- 239000002826 coolant Substances 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 239000011591 potassium Substances 0.000 claims 1
- 229910052782 aluminium Inorganic materials 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 5
- 229910052801 chlorine Inorganic materials 0.000 description 5
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000001311 chemical methods and process Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- WPFRLQWLYOFXMF-UHFFFAOYSA-K aluminum titanium(4+) trichloride Chemical compound [Al+3].[Cl-].[Cl-].[Cl-].[Ti+4] WPFRLQWLYOFXMF-UHFFFAOYSA-K 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 150000001804 chlorine Chemical class 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- XCBKGJWOCHSAMS-UHFFFAOYSA-L copper;dichlorocopper Chemical compound [Cu].Cl[Cu]Cl XCBKGJWOCHSAMS-UHFFFAOYSA-L 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- WYXIGTJNYDDFFH-UHFFFAOYSA-Q triazanium;borate Chemical compound [NH4+].[NH4+].[NH4+].[O-]B([O-])[O-] WYXIGTJNYDDFFH-UHFFFAOYSA-Q 0.000 description 1
- 210000003462 vein Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/004—Details
- H01G9/04—Electrodes or formation of dielectric layers thereon
- H01G9/048—Electrodes or formation of dielectric layers thereon characterised by their structure
- H01G9/055—Etched foil electrodes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/04—Etching of light metals
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Description
Elektrolytisches Verfahren zum Aufrauhen-der Oberfläche einer Elektrode, insbesondere für elektrolytische-Kondensatoren Es ist dir Verfahren zur Aufrauhung der Oberfläche einer Elektrode, insbesondere, für elektrolytische Kondensatoren, bekanntgkworden, -bei welchem die VergrMerung der Elektrodenoberfläche durch eine elektrolytische Aufrauhung erzielt wird. Hierbei werden im allgemeinen sitarkeÄtzm- ittel, wie z. B. Sätiren, vorzugsr%ve#ise Salzsäure, benutzt. Bei diesem bekannten Verfahren besteht der Nachteil, daß eine jedesmalige Entfernung, ' der aufzurauhenden Elektroden aus dem Ätzbad im stromlosen Zu-stand der Anlage erforderlich ist, da:sonst auch im Ruhezustand ein Angriff seitens des Ätzmittels auf die Elektrodenoberfläche erfolgt. Ein solcher Angriff ist aber besonders beim Wanderbadverfahren unerw-iinscht.An electrolytic process for roughening the surface of an-electrode, particularly for electrolytic capacitors, it is thee methods for roughening the surface of an electrode, particularly for electrolytic capacitors, bekanntgkworden, -in which the VergrMerung the electrode surface is obtained by electrolytic roughening. In general, sitarkeÄtzm- means such. B. seeds, preferably ve # ise hydrochloric acid, are used. In this known method has the disadvantage that each repeated distance 'of the roughened electrode from the etch bath in the currentless stand to-the system is necessary because: otherwise also carried out an attack on the part of the etchant to the electrode surface at rest. Such an attack is particularly undesirable in the case of the hiking bath procedure.
I Die vorliegende Erfindung betrifft nun eine VerbesGerung dieses Verfahrens, und zwar werden gemäß der Erfindung Salz- und Säuregemische oder Salzgemische, angewendet, welche das Elektrodenmetall im stromlosen Z.jistand -.der. Ätzaplage .,gar nicht oder nur schw, #A, anc-Preifen. I The present invention now relates to an improvement of this method, namely salt and acid mixtures or salt mixtures are used according to the invention, which the electrode metal in the currentless Z.jistand -.der. Ätzaplage., Not at all or only black, #A, anc-Preifen.
Unter einem schwachen Angriff soll hierbei ein solcher --.verstanden werden, welcli##.,jr*# im Ruhezüsiand der Ätzanlage zu gar keiner oder nur zu einer ganz unwesentlichen Aufranhung führt.A weak attack is to be understood here as such become, welcli ##., jr * # in the rest period of the etching system to none or only to one leads to a very insignificant stringing up.
Im grundsätzlichen Gegensatz hierzu befindet sich z. B. ein bekanntest, rein, chemisches Verfahren züm Aufrauhen von Elektroden, #velches darin besteht, daß die gewünschte Aufrau.hung in einer wäßrigen Lösung von Kupferchlo-rid CuCI, innerhalb yon 30 Sekunden vollzogen wird. Hier: wird ein Älzmittel benutzt, welches die - Elektrodenoberfläche stark angreift. Das wirksame Ätzmittel wird hierbei ziemlich rasch aufgebraucht. Es bildet s-ich nämlich z. B. aus. Aluminium- und Kupferchlorid Kupfer und Aluminiumchlc>ri,d bz,w. es wird sich aus der durch Hydrolyse des Kupferchlorid entstandenen Salzsäure init-deni-Al-utniniufn'Alurninitirnchlorid und Wasserstoff entwickeln. Das auf diese Weise entstandene A-#ltimitüümthlorid- besitzt. aber praktisch keine chemis,c.hei_ Ätzwirkung. . In fundamental contrast to this is z. B. a well-known, pure, chemical process for roughening electrodes, #velches consists in that the desired roughening in an aqueous solution of copper chloride CuCl, is carried out within 30 seconds. Here: an alkali is used, which strongly attacks the - electrode surface. The effective etchant is used up fairly quickly. It forms s-ich z. B. off. Aluminum and copper chloride copper and aluminum chloride> ri, d or w. it will develop from the hydrochloric acid formed by hydrolysis of the copper chloride, init-deni-Al-utniniufn'Alurninitirnchlorid and hydrogen. The resulting A- # ltimitümthlorid- possesses. but practically no chemis, c.hei_ etching effect. .
Die bei deiii#"hiei#-.ge!ki#nnzeichiieten Ver-, fahren ange-#vend;&t#n': Salz- -und Säure-' gemische ge oder Salzgemische sollen auch nach vielen Sttinder# das Elektrodenmetall praktisch nicht angreifen. Die eigentliche Aufrauhung der Elektrodenoberfläche wird lediglich durch den elektrischen Strom bewirkt.The procedures used for deiii # "hiei # -. Ge! Ki # nn shall be- # vend; & t # n ': Salt and acid mixtures or salt mixtures should also be used after many practically do not attack the electrode metal. The actual roughening of the electrode surface is only caused by the electric current.
Bei den hier vorgeschlagenen. Ä:tzmiiteln entsteht nämlich z. B. an der als, Anode ge- schalteten * Aluminitimo:berfläche elementares Chlor. Dieses Chlor, das im..statu na-scendi vorliiiegt, übt äfigreifande. Wirkung auf das Aluminium aus und bewirkt damit eine.starke Aufrauhung. der Oberfläche.With the ones suggested here. Ä: tzmiiteln is created e.g. B. at the as, which is switched anode * Aluminitimo: berfläche elemental chlorine. This chlorine, which is present in the statu na-scendi, exercises aptitude. Effect on the aluminum and thus causes a strong roughening. the surface.
Als. Vo#teil'gegenüb-er den bekannten rein chemischen Verfahren ergibt sich hierb-ei insbesondere, daß eine Verarmung an Ätzmitteln praktiscli. nicht in Erscheinung -tritt, da. *das CÜfbr"'&ttsp#r#&ch#nid'd,er atige\vendo-ten elektrischen Strornstärke stets neu erzeugt wird, wobei die elektrische Stromstärke ein, direktes Maß der Ch.lormenge und damit der Ätzwirkung gibt. Eine Verarmung an chemischer Substanz tritt deshalb nicht ein, weil das Chlor sich mit dem Aluminium zu. Aluminiumch,lkiri(1 - -verbindet, 'aus welchem durch den 8lektri#ch-en -Strom wieder erneut Clilor in Frciiheit gesetzt werden kann. -Hierin liegt also der, grundliege,-ende Unterschied zu den bekannten, rein chemischen- Ätzverfahren.As. In particular, compared to the known purely chemical processes, the result is that a depletion of etching agents is practical. does not appear, there. * the CÜfbr "'& ttsp # r # & ch # nid'd, er atige \ vendo-th electrical current strength is always generated anew, whereby the electrical current strength is a direct measure of the chlorine quantity and thus the corrosive effect. A depletion of chemical Substance does not enter because the chlorine is mixed with the aluminum. Aluminum ch, lkiri (1 - -compounds, 'from which by the electrical current, Clilor can be set back into freshness , fundamental difference to the known, purely chemical etching processes.
Lediglich ein sehr kleiner Verlust von Chlorgas,-Welches niC'ht mit dein Aluminium reagiert, kann bei dem Verfah,ren auftreten. Eventuelle' Änderungen der Badzusammensetzung,- wie sie durch. die Bildung von Alumintitirrichlorid eintreten, wirken sich nicht ungünstig aus, weini dafür gesorgt wird, daß die Stromstärke evtl. durch Regulierung- der Badspannung immer konstant bleibt.Only a very small loss of chlorine gas, which does not take place Your aluminum reacts can occur in the process. Any 'changes the bath composition, - how they get through. the formation of aluminum titanium trichloride occur, do not have an unfavorable effect, as long as it is ensured that the current strength by regulating the bath voltage always remains constant.
Das gekennzeichnete Verfahren kann wie folgt ausgeführt werden: Die Elektroden werden in Salzlösungen oder in Gemischen solcher mit Säuren oder Alkalien, die Aluminium gar nicht oder nur wenig angreifen, so an Spannung gelegt, daß die 9,ufzurauliende Elektrode den Pluspol bildet. Vorteilhaft wird eine Mischung von Aluminiurnclilorid, Salzsäure und/oder chlorsaures Kalium be!-nutz.t. Als Ätzmittel tragende Substanz wirkt dabei das. Alurniniumchlorid. Die Salzsäure hat in der angegebenen Mischung lediglich den Zweck, die Lösung klar zu halten. Eine Ätzwirkuno 2, , kommt ihr nicht zu. Das Kaliumchl-orat unterstützt die Bildun<,r des. im statu nascendi wirkend-en Chlors. zn , -D#ie Strorndichte wird. so. eingestellt, daß dieselbe, ' je nach dem gewünschten Aufrauhungsgrad, vorzugsweise zwischen io bin 3 10 MilliamPele piro Quadratzentimeter liegt. Nach Bi#endigtifig der'Auirauhzeit wird der Strom abgeschaltet.The method described can be carried out as follows: The electrodes are connected to voltage in salt solutions or in mixtures of those with acids or alkalis which do not attack aluminum at all or only slightly, so that the electrode to be ufurauliulienden forms the positive pole. A mixture of aluminum chloride, hydrochloric acid and / or potassium chlorate is advantageously used. Aluminum chloride acts as the substance carrying the etchant. The only purpose of the hydrochloric acid in the specified mixture is to keep the solution clear. A Ätzwirkuno 2, you can not get to. The potassium chlorate supports the formation of the chlorine acting in the statu nascendi. zn , -D # ie flow density becomes. so. set that the same, 'depending on the desired degree of roughening, is preferably between 10 bin 3 10 milliamPele piro square centimeters. After the end of the wake-up period, the power is switched off.
Auf- die erhält man eine Oberflächerivbrgrößerung bis zu ZD 700 %, die sehr genau reproduzierbar ist. Weiterhin können vorteilhaft Lösungen' anderer Halogenverbindungen, z. B. Natriumchlorid oder Kaliumbromid mit oder ohne Zusatz von Säuren verwendet werden. Als sehr günstig haben sich hieTbei Konzentra.-tionen von o,5 und i Mol erwiesen. Jedoch können auch höhere Konzentrationen mit Erfolg angewandt werden.This gives a surface lens enlargement of up to ZD 700%, which is very precisely reproducible. Furthermore, beneficial solutions' others Halogen compounds, e.g. B. sodium chloride or potassium bromide with or without additives used by acids. Concentrations have proven to be very cheap of o, 5 and i moles. However, higher concentrations can also work with success can be applied.
.-Eine be-vorzugfe Lösung-besteht in der Zusa.mme,nsetzungvon2ooogWa.s#>ser, 4oogSalzsäure, 150 g Aluminiumchlo-rid und 45 g Kaliumchlorat. Bei diesem Elek-trolyt kann der -Anteil der Salzsäure auch fortgelassen werden, denn sie dient lediglich zur Klarhaltung der Lösun-Die Aufrau hung braucht- nicht be 1:stark, #c# -höhtenTemperaturen durchgeführt zu werden. Es glenügen auch. Temperaturgrade von 2o bis 70' C. Dort, wo das Arbeiten mit erhöhten Temperaturen schwierig ist, wird einpfohlen, diie Elektrollytbäder zu kühlen.-A preferred solution-consists in the combination of 2ooogwas #> ser, 40g hydrochloric acid, 150 g aluminum chloride and 45 g potassium chlorate. With this electrolyte, the hydrochloric acid content can also be omitted, because it only serves to keep the solution clear. The roughening does not need to be carried out at high, high temperatures. It is enough. Temperature degrees from 20 to 70 ° C. Where it is difficult to work with elevated temperatures, it is recommended to cool the electrolyte baths.
Ganz allgemein können alle dissoziierenden Sa:I.ze und, Säur -en verwendet werden, mit Ausnahme solcher, die eine Sperrschicht auf dem Elektrodenmetall entstehen lassen. Es ist dabei aucli gleichgültig, ob anorganische oder orga.i-Pische Stoffe Verwendung finden.In general, all dissociating acids and acids can be used with the exception of those that create a barrier layer on the electrode metal permit. It is also irrelevant whether inorganic or organic substances Find use.
Vorteilhaft 'ist es, nicht nur--ein Elektron lytba,d anzuwenden, sondern die Elektroden durch mehrere Elektrolythäder, die außeTdem verschiedenartige Elektrolyte entlialten# können, laufen zu lassen. Das Durchführeii, der E-fektroden durch die.Ätzl)äder erfolgt zweckmäßig nach der bekannten Art eines Wanderbades.It is advantageous not only to use an electron lytba, d, but the electrodes through several electrolyte wheels, which also contain various types of electrolytes Entlialten # can run. The lead-through of the electrodes through the caustic veins takes place appropriately in the well-known way of a hiking bath.
Die Bildung der Sperrscheicht auf den Elektroden für elektrolvtisclie Xondensatoren, geschielif anschließei;d an die Behandlung der Elektroden durch die -Ätzbäder in einem besonderen, z. B. eine wäßrige Lösung von Ammoniumborat darstellenden ' Elektrolyt. Hierbei kann man 7--,#,eclniäßig zwischen dem letzten Ätzbad und dem ersten Formierungsbad ein Waschbad zwischenischalten, in dem sich. z. B. destilliertes oder leicht angesäuertes Was,-er befindet.The formation of the barrier layer on the electrodes for electrolytic capacitors, depending on the treatment of the electrodes by the etching baths in a special, e.g. B. an aqueous solution of ammonium borate representing ' electrolyte. Here, a washing bath can be interposed between the last etching bath and the first forming bath, in which. z. B. distilled or slightly acidified what is located.
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES125400D DE756216C (en) | 1936-12-19 | 1936-12-19 | Electrolytic process for roughening the surface of an electrode, especially for electrolytic capacitors |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES125400D DE756216C (en) | 1936-12-19 | 1936-12-19 | Electrolytic process for roughening the surface of an electrode, especially for electrolytic capacitors |
| DES7049D DE932853C (en) | 1937-06-26 | 1937-06-26 | Process for roughening the surface of an electrode, especially for electrolytic capacitors |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE756216C true DE756216C (en) | 1952-10-13 |
Family
ID=25994770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DES125400D Expired DE756216C (en) | 1936-12-19 | 1936-12-19 | Electrolytic process for roughening the surface of an electrode, especially for electrolytic capacitors |
Country Status (1)
| Country | Link |
|---|---|
| DE (1) | DE756216C (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE973007C (en) * | 1951-03-21 | 1959-11-12 | Siemens Ag | Process for the production of roughened aluminum electrodes for electrolytic capacitors |
| DE1110313B (en) * | 1954-11-16 | 1961-07-06 | Mallory & Co Inc P R | Electrolytic capacitor with tantalum anode |
| FR2322015A1 (en) * | 1975-08-25 | 1977-03-25 | Hoechst Ag | METHOD OF MANUFACTURING SUPPORTS FOR PLANOGRAPHIC PRINTING PLATES IN ALUMINUM BY MAKING THE SURFACE RUGGED BY ELECTROCHEMICAL |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH170212A (en) * | 1932-03-10 | 1934-06-30 | Philips Nv | Electrolytic capacitor. |
| GB414374A (en) * | 1933-01-30 | 1934-07-30 | Telegraph Condenser Co Ltd | Improvements in or relating to electrolytic condensers |
| FR781144A (en) * | 1933-11-11 | 1935-05-09 | Magnavox Co | Improvements to electrolytic devices, such as capacitors and the like |
| CH183310A (en) * | 1933-11-16 | 1936-03-31 | Mij Tot Exploitatie Van Uitvin | Process for the manufacture of electrodes for electrolytic capacitors. |
-
1936
- 1936-12-19 DE DES125400D patent/DE756216C/en not_active Expired
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CH170212A (en) * | 1932-03-10 | 1934-06-30 | Philips Nv | Electrolytic capacitor. |
| GB414374A (en) * | 1933-01-30 | 1934-07-30 | Telegraph Condenser Co Ltd | Improvements in or relating to electrolytic condensers |
| FR781144A (en) * | 1933-11-11 | 1935-05-09 | Magnavox Co | Improvements to electrolytic devices, such as capacitors and the like |
| CH183310A (en) * | 1933-11-16 | 1936-03-31 | Mij Tot Exploitatie Van Uitvin | Process for the manufacture of electrodes for electrolytic capacitors. |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE973007C (en) * | 1951-03-21 | 1959-11-12 | Siemens Ag | Process for the production of roughened aluminum electrodes for electrolytic capacitors |
| DE1110313B (en) * | 1954-11-16 | 1961-07-06 | Mallory & Co Inc P R | Electrolytic capacitor with tantalum anode |
| FR2322015A1 (en) * | 1975-08-25 | 1977-03-25 | Hoechst Ag | METHOD OF MANUFACTURING SUPPORTS FOR PLANOGRAPHIC PRINTING PLATES IN ALUMINUM BY MAKING THE SURFACE RUGGED BY ELECTROCHEMICAL |
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