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DE69906195D1 - Fotoempfindliche Harzzusammensetzung und Farbfilter - Google Patents

Fotoempfindliche Harzzusammensetzung und Farbfilter

Info

Publication number
DE69906195D1
DE69906195D1 DE69906195T DE69906195T DE69906195D1 DE 69906195 D1 DE69906195 D1 DE 69906195D1 DE 69906195 T DE69906195 T DE 69906195T DE 69906195 T DE69906195 T DE 69906195T DE 69906195 D1 DE69906195 D1 DE 69906195D1
Authority
DE
Germany
Prior art keywords
resin composition
color filter
photosensitive resin
photosensitive
color
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69906195T
Other languages
English (en)
Other versions
DE69906195T2 (de
Inventor
Kenji Ueda
Satoshi Shioda
Hirotaka Nishijima
Tomoaki Mukaiyama
Syuichi Mitsuhashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Application granted granted Critical
Publication of DE69906195D1 publication Critical patent/DE69906195D1/de
Publication of DE69906195T2 publication Critical patent/DE69906195T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
    • C08G18/40—High-molecular-weight compounds
    • C08G18/62—Polymers of compounds having carbon-to-carbon double bonds
    • C08G18/6216—Polymers of alpha-beta ethylenically unsaturated carboxylic acids or of derivatives thereof
    • C08G18/625—Polymers of alpha-beta ethylenically unsaturated carboxylic acids; hydrolyzed polymers of esters of these acids
    • C08G18/6254—Polymers of alpha-beta ethylenically unsaturated carboxylic acids and of esters of these acids containing hydroxy groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/08—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated side groups
    • C08F290/12—Polymers provided for in subclasses C08C or C08F
    • C08F290/126—Polymers of unsaturated carboxylic acids or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/81—Unsaturated isocyanates or isothiocyanates
    • C08G18/8108—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group
    • C08G18/8116—Unsaturated isocyanates or isothiocyanates having only one isocyanate or isothiocyanate group esters of acrylic or alkylacrylic acid having only one isocyanate or isothiocyanate group
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/128—Radiation-activated cross-linking agent containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/14—Layer or component removable to expose adhesive
    • Y10T428/1471—Protective layer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DE69906195T 1998-07-31 1999-07-30 Fotoempfindliche Harzzusammensetzung und Farbfilter Expired - Fee Related DE69906195T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21686898 1998-07-31

Publications (2)

Publication Number Publication Date
DE69906195D1 true DE69906195D1 (de) 2003-04-30
DE69906195T2 DE69906195T2 (de) 2003-10-09

Family

ID=16695180

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69906195T Expired - Fee Related DE69906195T2 (de) 1998-07-31 1999-07-30 Fotoempfindliche Harzzusammensetzung und Farbfilter

Country Status (5)

Country Link
US (2) US6432614B1 (de)
EP (1) EP0977085B1 (de)
KR (1) KR100334426B1 (de)
DE (1) DE69906195T2 (de)
TW (1) TWI232354B (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60020762T2 (de) 1999-02-25 2006-05-04 Dai Nippon Printing Co., Ltd. Lichtempfindliche Harzzusammensetzung, Farbfilter und dafür geeignetes Copolymerharz
JP2001114827A (ja) * 1999-08-11 2001-04-24 Dainippon Printing Co Ltd 高安定性樹脂、硬化性樹脂組成物、それらの製造方法、カラーフィルター及び液晶パネル
JP2001106765A (ja) * 1999-10-08 2001-04-17 Dainippon Printing Co Ltd 高感度硬化性樹脂、硬化性樹脂組成物、それらの製造方法、カラーフィルター及び液晶パネル
KR20010107288A (ko) * 2000-05-26 2001-12-07 박이순 감광성 수지의 제조 방법
US6372074B1 (en) 2000-06-14 2002-04-16 Avery Dennison Corporation Method of forming a protective coating for color filters
US6680158B2 (en) * 2001-07-31 2004-01-20 Chi Mei Corporation Radiation-sensitive resin composition for spacer
JP3860806B2 (ja) 2002-12-19 2006-12-20 Ｊｓｒ株式会社 カラーフィルタ用着色層の形成方法
KR100677062B1 (ko) * 2003-11-24 2007-02-01 엘지.필립스 엘시디 주식회사 편광기능이 구비된 컬러필터 기판 및 그 제조 방법
JP4351519B2 (ja) * 2003-11-26 2009-10-28 東洋インキ製造株式会社 感光性組成物およびカラーフィルタ
JP4587865B2 (ja) * 2004-04-22 2010-11-24 昭和電工株式会社 感光性樹脂組成物及びその硬化物並びにそれらを使用するプリント配線基板の製造方法
TW200613903A (en) * 2004-05-26 2006-05-01 Showa Denko Kk Photosensitive resin composition, and cured product and use thereof
CN100340878C (zh) * 2004-06-15 2007-10-03 奇美实业股份有限公司 彩色滤光片用感光性树脂组成物
EP1866357B1 (de) * 2005-03-15 2012-02-22 Showa Denko K.K. (meth)acryloylgruppenhaltige aromatische isocyanatverbindung und herstellungsverfahren dafür
KR100968670B1 (ko) * 2005-03-15 2010-07-06 쇼와 덴코 가부시키가이샤 (메트)아크릴로일기 함유 방향족 이소시아네이트 화합물 및그의 제조 방법
KR101223627B1 (ko) 2006-02-03 2013-01-17 삼성에스디아이 주식회사 연료 개질장치 및 그 제조 방법
KR101306153B1 (ko) * 2006-08-25 2013-09-10 주식회사 동진쎄미켐 감광성 수지 조성물
TWI349117B (en) * 2007-01-03 2011-09-21 Au Optronics Corp Color filter and manufacturing method thereof
US20080194930A1 (en) * 2007-02-09 2008-08-14 Harris Melvyn L Infrared-visible needle
JP4190021B1 (ja) * 2008-01-11 2008-12-03 アサヒテック株式会社 導電性ボール配置用マスク及びその製造方法
JP2010044273A (ja) * 2008-08-14 2010-02-25 Fujifilm Corp カラーフィルタ及びその形成方法、並びに固体撮像素子
JP5021046B2 (ja) * 2009-02-26 2012-09-05 エルジー ケム． エルティーディ． 感光性樹脂組成物
KR101321417B1 (ko) * 2009-12-28 2013-10-30 제일모직주식회사 컬러필터 보호막용 수지 조성물, 이를 이용하여 제조된 컬러필터 보호막 및 이를 포함하는 이미지 센서
JP2011221463A (ja) * 2010-04-14 2011-11-04 Samsung Electronics Co Ltd 感光性樹脂組成物
JP5930832B2 (ja) 2012-04-27 2016-06-08 キヤノン株式会社 光硬化物の製造方法
CN103130955B (zh) * 2013-03-07 2015-06-17 京东方科技集团股份有限公司 一种光刻胶用光敏性寡聚物、其制备方法及负性光刻胶组合物
KR102450387B1 (ko) * 2015-05-13 2022-10-04 롬엔드하스전자재료코리아유한회사 네거티브형 감광성 수지 조성물 및 이를 이용한 절연막

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2121253A1 (de) * 1971-04-30 1972-11-09 Agfa-Gevaert Ag, 5090 Leverkusen Urethangruppenhaltige, durch Vinylpolymerisation vernetzbare Polymere
US3928299A (en) 1971-04-30 1975-12-23 Bayer Ag Polymers which contain urethane groups and which are cross-linkable by vinyl polymerisation
US4717643A (en) 1985-08-06 1988-01-05 Hercules Incorporated No thermal cure dry film solder mask
WO1995000573A1 (en) * 1993-06-23 1995-01-05 Union Carbide Chemicals & Plastics Reactive polymers having pendant flexible side chains prepared from ethylenically unsaturated isocyanates
US5925499A (en) * 1995-08-01 1999-07-20 Morton International, Inc. Epoxy-containing waterborne photoimageable composition
US5981111A (en) * 1996-09-09 1999-11-09 Fuji Photo Film Co., Ltd. Process for manufacturing color filter using silver halide light-sensitive material
JP3633179B2 (ja) * 1997-01-27 2005-03-30 Ｊｓｒ株式会社 ポジ型フォトレジスト組成物

Also Published As

Publication number Publication date
DE69906195T2 (de) 2003-10-09
US20020192596A1 (en) 2002-12-19
KR20000012118A (ko) 2000-02-25
US6432614B1 (en) 2002-08-13
US6558858B2 (en) 2003-05-06
KR100334426B1 (ko) 2002-05-03
TWI232354B (en) 2005-05-11
EP0977085B1 (de) 2003-03-26
EP0977085A1 (de) 2000-02-02

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee