DE69728036D1 - Vacuumkompatible linearbewegungsvorrichtung - Google Patents
Vacuumkompatible linearbewegungsvorrichtungInfo
- Publication number
- DE69728036D1 DE69728036D1 DE69728036T DE69728036T DE69728036D1 DE 69728036 D1 DE69728036 D1 DE 69728036D1 DE 69728036 T DE69728036 T DE 69728036T DE 69728036 T DE69728036 T DE 69728036T DE 69728036 D1 DE69728036 D1 DE 69728036D1
- Authority
- DE
- Germany
- Prior art keywords
- linear motion
- motion device
- vacuum compatible
- compatible linear
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C29/00—Bearings for parts moving only linearly
- F16C29/02—Sliding-contact bearings
- F16C29/025—Hydrostatic or aerostatic
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C32/00—Bearings not otherwise provided for
- F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
- F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C33/00—Parts of bearings; Special methods for making bearings or parts thereof
- F16C33/72—Sealings
- F16C33/74—Sealings of sliding-contact bearings
- F16C33/741—Sealings of sliding-contact bearings by means of a fluid
- F16C33/748—Sealings of sliding-contact bearings by means of a fluid flowing to or from the sealing gap, e.g. vacuum seals with differential exhaust
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70816—Bearings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
- F16C2300/00—Application independent of particular apparatuses
- F16C2300/40—Application independent of particular apparatuses related to environment, i.e. operating conditions
- F16C2300/62—Application independent of particular apparatuses related to environment, i.e. operating conditions low pressure, e.g. elements operating under vacuum conditions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/202—Movement
- H01J2237/20221—Translation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/317—Processing objects on a microscale
- H01J2237/3175—Lithography
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S277/00—Seal for a joint or juncture
- Y10S277/913—Seal for fluid pressure below atmospheric, e.g. vacuum
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T74/00—Machine element or mechanism
- Y10T74/20—Control lever and linkage systems
- Y10T74/20207—Multiple controlling elements for single controlled element
- Y10T74/20341—Power elements as controlling elements
- Y10T74/20354—Planar surface with orthogonal movement only
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Public Health (AREA)
- Epidemiology (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Electron Beam Exposure (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/766,271 US5784925A (en) | 1996-12-13 | 1996-12-13 | Vacuum compatible linear motion device |
PCT/US1997/022133 WO1998026444A1 (en) | 1996-12-13 | 1997-12-10 | Vacuum compatible linear motion device |
US766271 | 2001-01-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69728036D1 true DE69728036D1 (de) | 2004-04-15 |
DE69728036T2 DE69728036T2 (de) | 2005-01-20 |
Family
ID=25075937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69728036T Expired - Fee Related DE69728036T2 (de) | 1996-12-13 | 1997-12-10 | Vacuumkompatible linearbewegungsvorrichtung |
Country Status (7)
Country | Link |
---|---|
US (1) | US5784925A (de) |
EP (1) | EP0883892B1 (de) |
JP (1) | JP4257871B2 (de) |
KR (1) | KR100282797B1 (de) |
CA (1) | CA2244994A1 (de) |
DE (1) | DE69728036T2 (de) |
WO (1) | WO1998026444A1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69926753T2 (de) * | 1998-06-17 | 2006-01-19 | Nikon Corp. | Statischdrucklager,dieses verwendende einrichtung und optisches gerät versehen mit solch einer einrichtung |
DE19857028A1 (de) * | 1998-12-10 | 2000-07-06 | Rexroth Star Gmbh | Linearführungseinrichtung |
JP4354039B2 (ja) * | 1999-04-02 | 2009-10-28 | 東京エレクトロン株式会社 | 駆動装置 |
TW552480B (en) | 1999-04-19 | 2003-09-11 | Asml Netherlands Bv | Moveable support in a vacuum chamber and its application in lithographic projection apparatus |
NL1015738C2 (nl) | 1999-07-28 | 2002-10-15 | Kyocera Corp | Schuifapparaat en bijbehorend platformmechanisme voor gebruik in vacu³m. |
US6300630B1 (en) | 1999-12-09 | 2001-10-09 | Etec Systems, Inc. | Annular differential seal for electron beam apparatus using isolation valve and additional differential pumping |
JP2001210576A (ja) * | 2000-01-25 | 2001-08-03 | Nikon Corp | 荷重キャンセル機構、真空チャンバ結合体、露光装置及び半導体デバイスの製造方法 |
DE60144224D1 (de) * | 2000-02-01 | 2011-04-28 | Toto Ltd | Orrichtung zum gebrauchen in vakuum- umgebung, und einrichtung zur wiedergewinnung von gas für die hydrostatische gaslagervorrichtung |
US6443618B1 (en) * | 2000-07-24 | 2002-09-03 | Moore Epitaxial, Inc. | Particulate free air bearing and seal |
US6491435B1 (en) | 2000-07-24 | 2002-12-10 | Moore Epitaxial, Inc. | Linear robot |
US6666611B2 (en) * | 2000-08-18 | 2003-12-23 | Nikon Corporation | Three degree of freedom joint |
US6467960B1 (en) * | 2000-08-18 | 2002-10-22 | Nikon Corporation | Air bearing linear guide for use in a vacuum |
JP4534390B2 (ja) * | 2001-01-09 | 2010-09-01 | Toto株式会社 | 静圧気体軸受 |
JP2002252166A (ja) * | 2001-02-27 | 2002-09-06 | Canon Inc | ステージ装置、露光装置およびデバイス製造方法ならびに移動案内方法 |
US6614508B2 (en) * | 2001-08-16 | 2003-09-02 | Nikon Corporation | Reversed, double-helical bellows seal |
US6756706B2 (en) * | 2002-01-18 | 2004-06-29 | Nikon Corporation | Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines |
DE60332681D1 (de) * | 2002-01-22 | 2010-07-08 | Ebara Corp | Trägerplattevorrichtung |
JP2004319902A (ja) * | 2003-04-18 | 2004-11-11 | Advantest Corp | ステージ装置及び露光装置 |
DE102008019681B4 (de) * | 2008-04-11 | 2013-10-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Mittels aerostatischer Lagerelemente geführter Tisch für Vakuumanwendung |
US20100116139A1 (en) * | 2008-11-11 | 2010-05-13 | Chang-Cheng Ho | Chain protector for a linear motion processing machine |
JP6018592B2 (ja) | 2011-03-08 | 2016-11-02 | ポステク アカデミー−インダストリー ファウンデイションPostech Academy−Industry Foundation | ミラーの曲率調整装置及びこれを備えたミラー調整システム |
KR101156563B1 (ko) | 2011-03-08 | 2012-06-20 | 포항공과대학교 산학협력단 | 거울의 곡률 조정장치 및 이를 구비한 거울 조정시스템 |
TWI558929B (zh) * | 2014-09-02 | 2016-11-21 | 應用奈米科技股份有限公司 | 可擺動及位移之密封軸承組件 |
JP7141472B2 (ja) * | 2019-01-11 | 2022-09-22 | 三菱重工業株式会社 | シール装置及びこれを備えた駆動装置 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4058018A (en) * | 1976-04-15 | 1977-11-15 | Quadrastat Controls Corporation | Pressure compensated flexible bellows |
US4417770A (en) * | 1981-09-21 | 1983-11-29 | Control Data Corporation | High vacuum compatible air bearing stage |
US4462580A (en) * | 1981-10-02 | 1984-07-31 | At&T Bell Laboratories | Hydraulically driven X-Y stage |
US5218896A (en) * | 1986-11-06 | 1993-06-15 | Canon Kabushiki Kaisha | Driving mechanism with gas bearing |
US4961273A (en) * | 1987-03-30 | 1990-10-09 | Hull Corporation | Method and means for assuring freeze dryer chamber sterility |
JP2677913B2 (ja) * | 1991-05-13 | 1997-11-17 | 三菱電機株式会社 | 半導体製造装置のシール機構および半導体装置の製造方法 |
-
1996
- 1996-12-13 US US08/766,271 patent/US5784925A/en not_active Expired - Fee Related
-
1997
- 1997-12-10 WO PCT/US1997/022133 patent/WO1998026444A1/en active IP Right Grant
- 1997-12-10 KR KR1019980706077A patent/KR100282797B1/ko not_active IP Right Cessation
- 1997-12-10 EP EP97953082A patent/EP0883892B1/de not_active Expired - Lifetime
- 1997-12-10 DE DE69728036T patent/DE69728036T2/de not_active Expired - Fee Related
- 1997-12-10 CA CA002244994A patent/CA2244994A1/en not_active Abandoned
- 1997-12-10 JP JP52679998A patent/JP4257871B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2000506963A (ja) | 2000-06-06 |
JP4257871B2 (ja) | 2009-04-22 |
DE69728036T2 (de) | 2005-01-20 |
US5784925A (en) | 1998-07-28 |
EP0883892A1 (de) | 1998-12-16 |
EP0883892B1 (de) | 2004-03-10 |
KR19990082347A (ko) | 1999-11-25 |
CA2244994A1 (en) | 1998-06-18 |
KR100282797B1 (ko) | 2001-04-02 |
WO1998026444A1 (en) | 1998-06-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |