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DE69724308D1 - Verfahren zur Leistungsverbesserung von Hochtemperatur-supraleitenden Dünnschichten - Google Patents

Verfahren zur Leistungsverbesserung von Hochtemperatur-supraleitenden Dünnschichten

Info

Publication number
DE69724308D1
DE69724308D1 DE69724308T DE69724308T DE69724308D1 DE 69724308 D1 DE69724308 D1 DE 69724308D1 DE 69724308 T DE69724308 T DE 69724308T DE 69724308 T DE69724308 T DE 69724308T DE 69724308 D1 DE69724308 D1 DE 69724308D1
Authority
DE
Germany
Prior art keywords
temperature superconducting
superconducting thin
thin films
improving
performance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69724308T
Other languages
English (en)
Other versions
DE69724308T2 (de
Inventor
Philip Shek Wah Pang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Application granted granted Critical
Publication of DE69724308D1 publication Critical patent/DE69724308D1/de
Publication of DE69724308T2 publication Critical patent/DE69724308T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H10N60/0688—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/725—Process of making or treating high tc, above 30 k, superconducting shaped material, article, or device
    • Y10S505/728—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S505/00—Superconductor technology: apparatus, material, process
    • Y10S505/775—High tc, above 30 k, superconducting material
    • Y10S505/776—Containing transition metal oxide with rare earth or alkaline earth
    • Y10S505/783—Thallium-, e.g. Tl2CaBaCu308

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
DE69724308T 1996-02-22 1997-02-10 Verfahren zur Leistungsverbesserung von Hochtemperatur-supraleitenden Dünnschichten Expired - Fee Related DE69724308T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US603838 1996-02-22
US08/603,838 US5688383A (en) 1996-02-22 1996-02-22 Method for improving the performance of high temperature superconducting thin film wafers

Publications (2)

Publication Number Publication Date
DE69724308D1 true DE69724308D1 (de) 2003-10-02
DE69724308T2 DE69724308T2 (de) 2004-06-24

Family

ID=24417126

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69724308T Expired - Fee Related DE69724308T2 (de) 1996-02-22 1997-02-10 Verfahren zur Leistungsverbesserung von Hochtemperatur-supraleitenden Dünnschichten

Country Status (6)

Country Link
US (1) US5688383A (de)
EP (1) EP0791968B1 (de)
JP (1) JPH1022536A (de)
CN (1) CN1169234C (de)
AT (1) ATE248437T1 (de)
DE (1) DE69724308T2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2625280B2 (ja) * 1991-05-30 1997-07-02 住友電気工業株式会社 酸化物超電導材料の製造方法
US8114245B2 (en) * 1999-11-26 2012-02-14 Tadahiro Ohmi Plasma etching device
EP1182685A1 (de) * 2000-08-09 2002-02-27 Toyo Technologies, Inc. Plasmapoliergerät mit streifendem Ionenbeschusswinkel
CN1512602A (zh) * 2002-12-30 2004-07-14 �廪��ѧ 制作高温超导器件的表面改性方法
CN1317777C (zh) * 2003-08-29 2007-05-23 南开大学 铊系高温超导薄膜材料及其制备方法
CN100338693C (zh) * 2004-08-25 2007-09-19 北京有色金属研究总院 单畴钇钡铜氧超导环的制备方法
US8735326B2 (en) * 2010-05-19 2014-05-27 Northrop Grumman Systems Corporation Methods of forming superconductor circuits

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01230275A (ja) * 1988-03-10 1989-09-13 Mitsubishi Metal Corp 超電導薄膜の形成法
US4966885A (en) * 1989-08-25 1990-10-30 At&T Bell Laboratories Method of producing a device comprising a metal oxide superconductor layer
JPH0494179A (ja) * 1990-08-10 1992-03-26 Nippon Telegr & Teleph Corp <Ntt> 酸化物超伝導薄膜デバイスの作製方法
EP0477063B1 (de) * 1990-09-06 1996-12-04 Sumitomo Electric Industries, Ltd. Supraleitendes Bauelement mit verringerter Dicke der supraleitenden Oxydschicht und dessen Herstellungsverfahren
US5091048A (en) * 1990-09-17 1992-02-25 National Semiconductor Corp. Ion milling to obtain planarization
JP2932650B2 (ja) * 1990-09-17 1999-08-09 松下電器産業株式会社 微細構造物の製造方法
US5260251A (en) * 1991-06-06 1993-11-09 E. I. Du Pont De Nemours And Company Process for making superconducting Tl-Pb-Sr-Ca-Cu oxide films
JPH05175562A (ja) * 1991-12-25 1993-07-13 Fujitsu Ltd ジョセフソン集積回路装置の製造方法
US5270294A (en) * 1991-12-27 1993-12-14 The United States Of America As Represented By The United States Department Of Energy Free-standing oxide superconducting articles

Also Published As

Publication number Publication date
US5688383A (en) 1997-11-18
EP0791968A1 (de) 1997-08-27
CN1169234C (zh) 2004-09-29
JPH1022536A (ja) 1998-01-23
EP0791968B1 (de) 2003-08-27
DE69724308T2 (de) 2004-06-24
ATE248437T1 (de) 2003-09-15
CN1171635A (zh) 1998-01-28

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee