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DE69621989D1 - System zur Beschichtung einer Platte - Google Patents

System zur Beschichtung einer Platte

Info

Publication number
DE69621989D1
DE69621989D1 DE69621989T DE69621989T DE69621989D1 DE 69621989 D1 DE69621989 D1 DE 69621989D1 DE 69621989 T DE69621989 T DE 69621989T DE 69621989 T DE69621989 T DE 69621989T DE 69621989 D1 DE69621989 D1 DE 69621989D1
Authority
DE
Germany
Prior art keywords
coating
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69621989T
Other languages
English (en)
Other versions
DE69621989T2 (de
Inventor
Hironobu Nishimura
Yoshihiko Naito
Naozumi Mizutani
Masahiko Kotoyori
Yamaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Origin Electric Co Ltd
Original Assignee
Origin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Origin Electric Co Ltd filed Critical Origin Electric Co Ltd
Publication of DE69621989D1 publication Critical patent/DE69621989D1/de
Application granted granted Critical
Publication of DE69621989T2 publication Critical patent/DE69621989T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/02—Apparatus for spreading or distributing liquids or other fluent materials already applied to a surface ; Controlling means therefor; Control of the thickness of a coating by spreading or distributing liquids or other fluent materials already applied to the coated surface
    • B05C11/08—Spreading liquid or other fluent material by manipulating the work, e.g. tilting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/265—Apparatus for the mass production of optical record carriers, e.g. complete production stations, transport systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Coating Apparatus (AREA)
DE69621989T 1995-08-30 1996-08-22 System zur Beschichtung einer Platte Expired - Lifetime DE69621989T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24547795A JP3354761B2 (ja) 1995-08-30 1995-08-30 ディスク用被膜形成装置

Publications (2)

Publication Number Publication Date
DE69621989D1 true DE69621989D1 (de) 2002-08-01
DE69621989T2 DE69621989T2 (de) 2002-10-24

Family

ID=17134248

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69621989T Expired - Lifetime DE69621989T2 (de) 1995-08-30 1996-08-22 System zur Beschichtung einer Platte

Country Status (4)

Country Link
US (1) US5743965A (de)
EP (1) EP0761318B1 (de)
JP (1) JP3354761B2 (de)
DE (1) DE69621989T2 (de)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6399143B1 (en) * 1996-04-09 2002-06-04 Delsys Pharmaceutical Corporation Method for clamping and electrostatically coating a substrate
US5990450A (en) * 1996-11-08 1999-11-23 Odawara Automation, Inc. Rotary conveyor
JP3725344B2 (ja) 1998-05-11 2005-12-07 オリジン電気株式会社 光ディスクの貼り合わせ方法および装置
US6162299A (en) 1998-07-10 2000-12-19 Asm America, Inc. Multi-position load lock chamber
US6203619B1 (en) * 1998-10-26 2001-03-20 Symetrix Corporation Multiple station apparatus for liquid source fabrication of thin films
TW459225B (en) * 1999-02-01 2001-10-11 Origin Electric Bonding system and method
US6520895B2 (en) * 1999-09-07 2003-02-18 Nikon Corporation Polishing device and polishing pad component exchange device and method
EP1315156A4 (de) 2000-08-29 2004-08-04 Kitano Eng Co Ltd Verfahren und einrichtung zum abziehen von plattensubstraten von einer optischen einem paar von plattensubstraten, die aneinander kleben
DE10061628B4 (de) * 2000-12-11 2006-06-08 Leica Microsystems Wetzlar Gmbh Vorrichtung und Verfahren zum Ergreifen und Transportieren von Wafern
US7371041B2 (en) * 2001-08-30 2008-05-13 Seagate Technology Llc Assembly station with rotatable turret which forms and unloads a completed stack of articles
TW588202B (en) * 2002-12-27 2004-05-21 Chi Mei Optoelectronics Corp Curing method and apparatus
TW587825U (en) * 2003-03-11 2004-05-11 Automation Design & Manufactur Compact disk manufacturing machine
JP2005286102A (ja) * 2004-03-30 2005-10-13 Hitachi High-Technologies Corp 真空処理装置および真空処理方法
WO2005118159A1 (ja) * 2004-06-03 2005-12-15 Shibaura Mechatronics Corporation 樹脂層形成方法及び樹脂層形成装置、ディスク及びディスク製造方法
US7073554B1 (en) * 2005-05-20 2006-07-11 Guann Way Technologies Co., Ltd. Integration device for compact disk
DE102005026961B4 (de) * 2005-06-10 2007-08-30 Singulus Technologies Ag Vorrichtung zum Behandeln von Substraten
US7694643B1 (en) * 2005-07-15 2010-04-13 Dongguan Anwell Digital Machinery Co., Ltd. (CN) Sandwiched structure for optical discs
WO2009149211A2 (en) * 2008-06-03 2009-12-10 Vserv Technologies Corp System for simultaneous tabbing and stringing of solar cells
US9685186B2 (en) * 2009-02-27 2017-06-20 Applied Materials, Inc. HDD pattern implant system
WO2010105967A2 (en) * 2009-03-18 2010-09-23 Oc Oerlikon Balzers Ag Vacuum treatment apparatus
US8911554B2 (en) * 2010-01-05 2014-12-16 Applied Materials, Inc. System for batch processing of magnetic media
US9115425B2 (en) * 2010-10-18 2015-08-25 Electronics And Telecommunications Research Institute Thin film depositing apparatus
DE102014017149A1 (de) * 2014-11-17 2016-05-19 Kienle + Spiess Gmbh Verfahren zur Herstellung von Lamellenpaketen und Anlage zur Durchführung des Verfahrens
JP2022155711A (ja) * 2021-03-31 2022-10-14 芝浦メカトロニクス株式会社 成膜装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244318A (en) * 1979-12-31 1981-01-13 Sperry Corporation Thin particulate film spin coater
US4280689A (en) * 1980-06-27 1981-07-28 Nasa Head for high speed spinner having a vacuum chuck
US4587139A (en) * 1984-12-21 1986-05-06 International Business Machines Corporation Magnetic disk coating method and apparatus
US4722298A (en) * 1986-05-19 1988-02-02 Machine Technology, Inc. Modular processing apparatus for processing semiconductor wafers
DE3717610A1 (de) * 1986-06-26 1988-03-03 Gerling Gmbh Maschinenbau Automatische antloetvorrichtung fuer hartmetallzaehne
JPS6354725A (ja) * 1986-08-25 1988-03-09 Fuji Photo Film Co Ltd スピンコ−テイング方法及びその装置
DE3705592A1 (de) * 1987-02-21 1988-09-01 Convac Gmbh Geraete Zur Halble Vorrichtung zur duennen beschichtung (belackung) scheibenfoermiger substrate fuer elektronische anwendungszwecke, bspw. leiterplatten, compact disks etc.
US5238713A (en) * 1987-09-18 1993-08-24 Tokyo Ohka Kogyo Co., Ltd. Spin-on method and apparatus for applying coating material to a substrate, including an air flow developing and guiding step/means
US4981074A (en) * 1988-06-01 1991-01-01 Hitachi Techno Engineering Co., Ltd. Method and apparatus for screen printing
JPH0628223Y2 (ja) * 1989-06-14 1994-08-03 大日本スクリーン製造株式会社 回転塗布装置
US5310410A (en) * 1990-04-06 1994-05-10 Sputtered Films, Inc. Method for processing semi-conductor wafers in a multiple vacuum and non-vacuum chamber apparatus
US5234499A (en) * 1990-06-26 1993-08-10 Dainippon Screen Mgf. Co., Ltd. Spin coating apparatus
JPH0639697B2 (ja) * 1990-11-30 1994-05-25 株式会社芝浦製作所 基板のローディング装置
US5165340A (en) * 1991-03-06 1992-11-24 Karlyn William M Multicolor printing system for the silk-screen printing of compact discs
US5242496A (en) * 1992-02-07 1993-09-07 Mattel, Inc. Spinning platen paint set
JPH05269426A (ja) * 1992-03-26 1993-10-19 Dainippon Ink & Chem Inc 回転塗布装置
US5211753A (en) * 1992-06-15 1993-05-18 Swain Danny C Spin coating apparatus with an independently spinning enclosure
US5326398A (en) * 1992-07-22 1994-07-05 Statspin Technologies Compact slide spinner using a disposable slide holder
NL9201825A (nl) * 1992-10-21 1994-05-16 Od & Me Bv Inrichting voor het vervaardigen van een matrijs voor een schijfvormige registratiedrager.
JP2779570B2 (ja) * 1992-10-26 1998-07-23 オリジン電気株式会社 ディスク検査方法およびディスク製造装置
JP2808405B2 (ja) * 1993-01-26 1998-10-08 オリジン電気株式会社 ディスク用被膜形成装置および方法
DE4340522A1 (de) * 1993-11-29 1995-06-01 Leybold Ag Vorrichtung und Verfahren zum schrittweisen und automatischen Be- und Entladen einer Beschichtungsanlage
JP2925465B2 (ja) * 1994-11-01 1999-07-28 オリジン電気株式会社 ディスク用被膜形成装置

Also Published As

Publication number Publication date
US5743965A (en) 1998-04-28
DE69621989T2 (de) 2002-10-24
EP0761318A3 (de) 1998-04-15
EP0761318B1 (de) 2002-06-26
EP0761318A2 (de) 1997-03-12
JPH0957177A (ja) 1997-03-04
JP3354761B2 (ja) 2002-12-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition