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DE69617350D1 - Radiofrequenzwellen-Ätzverfahren - Google Patents

Radiofrequenzwellen-Ätzverfahren

Info

Publication number
DE69617350D1
DE69617350D1 DE69617350T DE69617350T DE69617350D1 DE 69617350 D1 DE69617350 D1 DE 69617350D1 DE 69617350 T DE69617350 T DE 69617350T DE 69617350 T DE69617350 T DE 69617350T DE 69617350 D1 DE69617350 D1 DE 69617350D1
Authority
DE
Germany
Prior art keywords
etching
radio frequency
frequency waves
waves
radio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69617350T
Other languages
English (en)
Other versions
DE69617350T2 (de
Inventor
Donnie K Reinhard
Jes Asmussen
Rabindra N Chakraborty
Paul D Goldman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Saint Gobain Ceramics and Plastics Inc
Michigan State University MSU
Original Assignee
Michigan State University MSU
Saint Gobain Norton Industrial Ceramics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Michigan State University MSU, Saint Gobain Norton Industrial Ceramics Corp filed Critical Michigan State University MSU
Publication of DE69617350D1 publication Critical patent/DE69617350D1/de
Application granted granted Critical
Publication of DE69617350T2 publication Critical patent/DE69617350T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32266—Means for controlling power transmitted to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • H01J2237/3343—Problems associated with etching
    • H01J2237/3344—Problems associated with etching isotropy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/964—Roughened surface

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69617350T 1995-09-25 1996-08-02 Radiofrequenzwellen-Ätzverfahren Expired - Fee Related DE69617350T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/533,562 US6077787A (en) 1995-09-25 1995-09-25 Method for radiofrequency wave etching

Publications (2)

Publication Number Publication Date
DE69617350D1 true DE69617350D1 (de) 2002-01-10
DE69617350T2 DE69617350T2 (de) 2002-05-08

Family

ID=24126507

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69617350T Expired - Fee Related DE69617350T2 (de) 1995-09-25 1996-08-02 Radiofrequenzwellen-Ätzverfahren

Country Status (5)

Country Link
US (1) US6077787A (de)
EP (1) EP0764968B1 (de)
JP (1) JP3375832B2 (de)
CA (1) CA2182342C (de)
DE (1) DE69617350T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6013191A (en) * 1997-10-27 2000-01-11 Advanced Refractory Technologies, Inc. Method of polishing CVD diamond films by oxygen plasma
US6417013B1 (en) 1999-01-29 2002-07-09 Plasma-Therm, Inc. Morphed processing of semiconductor devices
DE10309711A1 (de) * 2001-09-14 2004-09-16 Robert Bosch Gmbh Verfahren zum Einätzen von Strukturen in einem Ätzkörper mit einem Plasma
US6955177B1 (en) * 2001-12-07 2005-10-18 Novellus Systems, Inc. Methods for post polysilicon etch photoresist and polymer removal with minimal gate oxide loss
US6852639B2 (en) * 2002-07-31 2005-02-08 Infineon Technologies Ag Etching processing method for a material layer
US20060231389A1 (en) * 2005-04-14 2006-10-19 Ravi Mullapudi Insulated pallet in cleaning chamber
JP5219116B2 (ja) * 2007-03-09 2013-06-26 独立行政法人産業技術総合研究所 ダイヤモンド表面の微細加工方法
JP2008305736A (ja) * 2007-06-11 2008-12-18 Tokyo Electron Ltd プラズマ処理装置、プラズマ処理装置の使用方法およびプラズマ処理装置のクリーニング方法
US8316797B2 (en) * 2008-06-16 2012-11-27 Board of Trustees of Michigan State University Fraunhofer USA Microwave plasma reactors
WO2011007745A1 (ja) * 2009-07-15 2011-01-20 東京エレクトロン株式会社 マイクロ波プラズマ処理装置およびマイクロ波プラズマ処理方法
EP2707521B1 (de) 2011-05-13 2018-08-08 Board Of Trustees Of Michigan State University Verbesserte mikrowellen-plasmareaktoren
JP6450919B2 (ja) * 2014-02-05 2019-01-16 アダマンド並木精密宝石株式会社 ダイヤモンド基板及びダイヤモンド基板の製造方法
TWI546858B (zh) * 2014-04-17 2016-08-21 紫焰科技股份有限公司 非接觸式物理蝕刻系統及方法
US10622217B2 (en) * 2016-02-04 2020-04-14 Samsung Electronics Co., Ltd. Method of plasma etching and method of fabricating semiconductor device using the same
US11469077B2 (en) * 2018-04-24 2022-10-11 FD3M, Inc. Microwave plasma chemical vapor deposition device and application thereof

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
US4691662A (en) * 1983-02-28 1987-09-08 Michigan State University Dual plasma microwave apparatus and method for treating a surface
US4727293A (en) * 1984-08-16 1988-02-23 Board Of Trustees Operating Michigan State University Plasma generating apparatus using magnets and method
US5081398A (en) * 1989-10-20 1992-01-14 Board Of Trustees Operating Michigan State University Resonant radio frequency wave coupler apparatus using higher modes
US5804033A (en) * 1990-09-26 1998-09-08 Hitachi, Ltd. Microwave plasma processing method and apparatus
JP2721054B2 (ja) * 1990-10-16 1998-03-04 インターナショナル・ビジネス・マシーンズ・コーポレイション 電子サイクロトロン共鳴装置と基板へのイオンの流れを生成する方法
JPH04240725A (ja) * 1991-01-24 1992-08-28 Sumitomo Electric Ind Ltd エッチング方法
US5311103A (en) * 1992-06-01 1994-05-10 Board Of Trustees Operating Michigan State University Apparatus for the coating of material on a substrate using a microwave or UHF plasma
US5324388A (en) * 1992-06-22 1994-06-28 Matsushita Electric Industrial Co., Ltd. Dry etching method and dry etching apparatus
US5306985A (en) * 1992-07-17 1994-04-26 Sematech, Inc. ECR apparatus with magnetic coil for plasma refractive index control
US5430355A (en) * 1993-07-30 1995-07-04 Texas Instruments Incorporated RF induction plasma source for plasma processing

Also Published As

Publication number Publication date
JPH09184082A (ja) 1997-07-15
EP0764968A3 (de) 1997-10-08
EP0764968A2 (de) 1997-03-26
CA2182342A1 (en) 1997-03-26
DE69617350T2 (de) 2002-05-08
JP3375832B2 (ja) 2003-02-10
US6077787A (en) 2000-06-20
EP0764968B1 (de) 2001-11-28
CA2182342C (en) 1999-10-05

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee