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DE69611476D1 - Aktivierte Kathode und deren Herstellungsverfahren - Google Patents

Aktivierte Kathode und deren Herstellungsverfahren

Info

Publication number
DE69611476D1
DE69611476D1 DE69611476T DE69611476T DE69611476D1 DE 69611476 D1 DE69611476 D1 DE 69611476D1 DE 69611476 T DE69611476 T DE 69611476T DE 69611476 T DE69611476 T DE 69611476T DE 69611476 D1 DE69611476 D1 DE 69611476D1
Authority
DE
Germany
Prior art keywords
manufacturing process
activated cathode
cathode
activated
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69611476T
Other languages
English (en)
Other versions
DE69611476T2 (de
Inventor
Takamichi Kishi
Osamu Arimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ThyssenKrupp Nucera Japan Ltd
Original Assignee
Chlorine Engineers Corp Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chlorine Engineers Corp Ltd filed Critical Chlorine Engineers Corp Ltd
Publication of DE69611476D1 publication Critical patent/DE69611476D1/de
Application granted granted Critical
Publication of DE69611476T2 publication Critical patent/DE69611476T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/34Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
    • C23C28/345Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates with at least one oxide layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/021Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material including at least one metal alloy layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/02Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material
    • C23C28/023Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings only including layers of metallic material only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/321Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer with at least one metal alloy layer
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/30Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
    • C23C28/32Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer
    • C23C28/322Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one pure metallic layer only coatings of metal elements only
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25BELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Chemically Coating (AREA)
  • Coating With Molten Metal (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
DE69611476T 1995-04-26 1996-04-26 Aktivierte Kathode und deren Herstellungsverfahren Expired - Fee Related DE69611476T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12591195A JP3612365B2 (ja) 1995-04-26 1995-04-26 活性陰極及びその製造法

Publications (2)

Publication Number Publication Date
DE69611476D1 true DE69611476D1 (de) 2001-02-15
DE69611476T2 DE69611476T2 (de) 2001-06-13

Family

ID=14921973

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69611476T Expired - Fee Related DE69611476T2 (de) 1995-04-26 1996-04-26 Aktivierte Kathode und deren Herstellungsverfahren

Country Status (4)

Country Link
US (1) US5954928A (de)
EP (1) EP0739999B1 (de)
JP (1) JP3612365B2 (de)
DE (1) DE69611476T2 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6224741B1 (en) * 1997-08-08 2001-05-01 Peremelec Electrode Ltd. Electrolyte process using a hydrogen storing metal member
JP4223619B2 (ja) * 1999-02-15 2009-02-12 ペルメレック電極株式会社 電解用陰極及びこの陰極を具備した電解槽
CA2415614A1 (en) 2000-06-02 2001-12-13 David L. Olmeijer Polymer membrane composition
EP1393400B1 (de) 2001-06-01 2008-07-09 Polyfuel, Inc. Austauschbare Brennstoffpatrone, Brennstoffzellenaggregat mit besagter Brennstoffpatrone für tragbare elektronische Geräte und entsprechendes Gerät
US7316855B2 (en) 2001-06-01 2008-01-08 Polyfuel, Inc. Fuel cell assembly for portable electronic device and interface, control, and regulator circuit for fuel cell powered electronic device
US8221610B2 (en) * 2003-10-10 2012-07-17 Ohio University Electrochemical method for providing hydrogen using ammonia and ethanol
US8216437B2 (en) * 2003-10-10 2012-07-10 Ohio University Electrochemical cell for oxidation of ammonia and ethanol
US8216956B2 (en) * 2003-10-10 2012-07-10 Ohio University Layered electrocatalyst for oxidation of ammonia and ethanol
CA2557955C (en) * 2004-03-18 2012-10-09 Moltech Invent S.A. Aluminium electrowinning cells with non-carbon anodes
AU2005224456B2 (en) * 2004-03-18 2011-02-10 Rio Tinto Alcan International Limited Non-carbon anodes
US20100252422A1 (en) * 2005-10-14 2010-10-07 Ohio University Carbon fiber-electrocatalysts for the oxidation of ammonia and ethanol in alkaline media and their application to hydrogen production, fuel cells, and purification processes
US20070207364A1 (en) * 2006-03-03 2007-09-06 Abd Elhamid Mahmoud H Fuel cells comprising moldable gaskets, and methods of making
US7709413B2 (en) * 2007-11-26 2010-05-04 Kabuhsiki Kaisha Toshiba Solid catalysts and fuel cell employing the solid catalysts
US8349165B2 (en) * 2008-11-25 2013-01-08 Tokuyama Corporation Process for producing an active cathode for electrolysis
JP5670600B2 (ja) * 2012-03-19 2015-02-18 旭化成ケミカルズ株式会社 電解セル及び電解槽
FR2998814B1 (fr) * 2012-11-30 2015-05-08 Eurecat Sa Procede de preparation de catalyseurs metalliques supportes
WO2018151228A1 (ja) * 2017-02-15 2018-08-23 旭化成株式会社 陰極、その製造方法、およびそれを用いた電解槽、水素製造方法
JP7038375B2 (ja) * 2018-03-28 2022-03-18 Eneos株式会社 電気化学デバイスおよび電気化学デバイスの制御方法
KR102365086B1 (ko) * 2018-12-03 2022-02-18 주식회사 엘지에너지솔루션 비파괴적 활물질의 활성 면적 측정 방법

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3974058A (en) * 1974-09-16 1976-08-10 Basf Wyandotte Corporation Ruthenium coated cathodes
US4377454A (en) * 1980-05-09 1983-03-22 Occidental Chemical Corporation Noble metal-coated cathode
US4487818A (en) * 1982-07-19 1984-12-11 Energy Conversion Devices, Inc. Fuel cell anode based on a disordered catalytic material
FR2538005B1 (fr) * 1982-12-17 1987-06-12 Solvay Cathode pour la production electrolytique d'hydrogene et son utilisation
US4871703A (en) * 1983-05-31 1989-10-03 The Dow Chemical Company Process for preparation of an electrocatalyst
US4970094A (en) * 1983-05-31 1990-11-13 The Dow Chemical Company Preparation and use of electrodes
GB8316778D0 (en) * 1983-06-21 1983-07-27 Ici Plc Cathode
JPS6112032A (ja) * 1984-06-27 1986-01-20 Sharp Corp 半導体装置の製造方法
JPH0232519B2 (ja) * 1985-02-22 1990-07-20 Kitagawa Iron Works Co Ryutaiyokaitentsugite
FR2579628A1 (fr) * 1985-03-29 1986-10-03 Atochem Cathode pour electrolyse et un procede de fabrication de ladite cathode
DE3612790A1 (de) * 1986-04-16 1987-10-22 Sigri Gmbh Kathode fuer waesserige elektrolysen
JPS6364518A (ja) * 1986-09-03 1988-03-23 株式会社東芝 保護継電器
JPH0335387A (ja) * 1989-06-30 1991-02-15 Toshiba Corp 現金管理システム
JP2776073B2 (ja) * 1991-07-25 1998-07-16 カシオ計算機株式会社 表示駆動装置および表示装置

Also Published As

Publication number Publication date
JP3612365B2 (ja) 2005-01-19
EP0739999A1 (de) 1996-10-30
EP0739999B1 (de) 2001-01-10
JPH08296079A (ja) 1996-11-12
US5954928A (en) 1999-09-21
DE69611476T2 (de) 2001-06-13

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee