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DE69605053D1 - Kanonenlinse zur Partikelstrahlerzeugung - Google Patents

Kanonenlinse zur Partikelstrahlerzeugung

Info

Publication number
DE69605053D1
DE69605053D1 DE69605053T DE69605053T DE69605053D1 DE 69605053 D1 DE69605053 D1 DE 69605053D1 DE 69605053 T DE69605053 T DE 69605053T DE 69605053 T DE69605053 T DE 69605053T DE 69605053 D1 DE69605053 D1 DE 69605053D1
Authority
DE
Germany
Prior art keywords
cannon
lens
particle beam
beam generation
generation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69605053T
Other languages
English (en)
Other versions
DE69605053T2 (de
Inventor
Juergen Frosien
Stefan Lanio
Gerald Schoenecker
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of DE69605053D1 publication Critical patent/DE69605053D1/de
Application granted granted Critical
Publication of DE69605053T2 publication Critical patent/DE69605053T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69605053T 1996-12-24 1996-12-24 Kanonenlinse zur Partikelstrahlerzeugung Expired - Fee Related DE69605053T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96120867A EP0851460B1 (de) 1996-12-24 1996-12-24 Kanonenlinse zur Partikelstrahlerzeugung

Publications (2)

Publication Number Publication Date
DE69605053D1 true DE69605053D1 (de) 1999-12-09
DE69605053T2 DE69605053T2 (de) 2000-02-24

Family

ID=8223559

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69605053T Expired - Fee Related DE69605053T2 (de) 1996-12-24 1996-12-24 Kanonenlinse zur Partikelstrahlerzeugung

Country Status (4)

Country Link
US (1) US5895919A (de)
EP (1) EP0851460B1 (de)
JP (2) JP3558325B2 (de)
DE (1) DE69605053T2 (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7470967B2 (en) * 2004-03-12 2008-12-30 Semisouth Laboratories, Inc. Self-aligned silicon carbide semiconductor devices and methods of making the same
JP4317779B2 (ja) * 2004-03-26 2009-08-19 株式会社日立ハイテクノロジーズ 電界放出型電子銃およびそれを用いた電子ビーム応用装置
US7893406B1 (en) 2005-06-29 2011-02-22 Hermes-Microvision, Inc. Electron gun with magnetic immersion double condenser lenses
EP1760762B1 (de) * 2005-09-06 2012-02-01 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Vorrichtung und Verfahren zur Auswahl einer Emissionsfläche einer Emissionsstruktur
JP5281004B2 (ja) * 2006-06-30 2013-09-04 株式会社島津製作所 エミッタの設計方法、電子ビーム発生装置およびそれを用いたデバイス
US8895922B2 (en) 2011-03-18 2014-11-25 Ecole Polytechnique Federale De Lausanne (Epfl) Electron beam apparatus
JP6394418B2 (ja) 2014-03-24 2018-09-26 日亜化学工業株式会社 非水系二次電池用正極活物質及びその製造方法
US9799484B2 (en) 2014-12-09 2017-10-24 Hermes Microvision, Inc. Charged particle source
US11227740B2 (en) 2017-09-07 2022-01-18 Hitachi High-Tech Corporation Electron gun and electron beam application device
JP6779847B2 (ja) 2017-09-11 2020-11-04 株式会社ニューフレアテクノロジー 荷電粒子装置、荷電粒子描画装置および荷電粒子ビーム制御方法
JP6722958B1 (ja) * 2019-11-20 2020-07-15 株式会社Ｐｈｏｔｏ ｅｌｅｃｔｒｏｎ Ｓｏｕｌ 電子線適用装置および電子線適用装置における電子ビームの射出方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1594465A (en) * 1977-03-23 1981-07-30 Nat Res Dev Electron beam apparatus
US4199689A (en) * 1977-12-21 1980-04-22 Tokyo Shibaura Denki Kabushiki Kaisha Electron beam exposing method and electron beam apparatus
JPH0610963B2 (ja) * 1985-04-11 1994-02-09 日本電気株式会社 電子ビ−ム発生装置
US4825080A (en) * 1986-03-25 1989-04-25 Universite De Reims Champagne-Ardenne Electrical particle gun
JP2775071B2 (ja) * 1989-02-22 1998-07-09 日本電信電話株式会社 荷電粒子ビーム発生装置
US5196707A (en) * 1991-03-04 1993-03-23 Etec Systems, Inc. Low aberration field emission electron gun
KR970005769B1 (ko) * 1992-08-27 1997-04-19 가부시끼가이샤 도시바 자계 계침형 전자총
JP3264775B2 (ja) * 1994-06-29 2002-03-11 電気化学工業株式会社 熱電界放射電子銃

Also Published As

Publication number Publication date
EP0851460A1 (de) 1998-07-01
JP2004253395A (ja) 2004-09-09
US5895919A (en) 1999-04-20
DE69605053T2 (de) 2000-02-24
JP3558325B2 (ja) 2004-08-25
EP0851460B1 (de) 1999-11-03
JPH10188868A (ja) 1998-07-21

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee