[go: up one dir, main page]

DE69432991D1 - Dünnfilmtransistor und Anzeigevorrichtung unter Verwendung desselben - Google Patents

Dünnfilmtransistor und Anzeigevorrichtung unter Verwendung desselben

Info

Publication number
DE69432991D1
DE69432991D1 DE69432991T DE69432991T DE69432991D1 DE 69432991 D1 DE69432991 D1 DE 69432991D1 DE 69432991 T DE69432991 T DE 69432991T DE 69432991 T DE69432991 T DE 69432991T DE 69432991 D1 DE69432991 D1 DE 69432991D1
Authority
DE
Germany
Prior art keywords
display device
same
thin film
film transistor
transistor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69432991T
Other languages
English (en)
Other versions
DE69432991T2 (de
Inventor
Yasunori Miura
Makoto Shibusawa
Atsushi Sugahara
Masahiro Seiki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Application granted granted Critical
Publication of DE69432991D1 publication Critical patent/DE69432991D1/de
Publication of DE69432991T2 publication Critical patent/DE69432991T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6704—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device
    • H10D30/6723—Thin-film transistors [TFT] having supplementary regions or layers in the thin films or in the insulated bulk substrates for controlling properties of the device having light shields
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362—Active matrix addressed cells
    • G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441—Interconnections, e.g. scanning lines
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/6729—Thin-film transistors [TFT] characterised by the electrodes
    • H10D30/673—Thin-film transistors [TFT] characterised by the electrodes characterised by the shapes, relative sizes or dispositions of the gate electrodes
    • H10D30/6732—Bottom-gate only TFTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/60—Insulated-gate field-effect transistors [IGFET]
    • H10D30/67—Thin-film transistors [TFT]
    • H10D30/674—Thin-film transistors [TFT] characterised by the active materials
    • H10D30/6741—Group IV materials, e.g. germanium or silicon carbide
    • H10D30/6743—Silicon
    • H10D30/6746—Amorphous silicon

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Liquid Crystal (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
DE69432991T 1993-04-23 1994-04-21 Dünnfilmtransistor und Anzeigevorrichtung unter Verwendung desselben Expired - Lifetime DE69432991T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP9632893 1993-04-23
JP9632893 1993-04-23
JP8181594 1994-04-20
JP08181594A JP3512849B2 (ja) 1993-04-23 1994-04-20 薄膜トランジスタおよびそれを用いた表示装置

Publications (2)

Publication Number Publication Date
DE69432991D1 true DE69432991D1 (de) 2003-09-04
DE69432991T2 DE69432991T2 (de) 2004-04-15

Family

ID=26422815

Family Applications (2)

Application Number Title Priority Date Filing Date
DE69419472T Expired - Lifetime DE69419472T2 (de) 1993-04-23 1994-04-21 Dünnschichttransistor und diesen transistor gebrauchende anzeige.
DE69432991T Expired - Lifetime DE69432991T2 (de) 1993-04-23 1994-04-21 Dünnfilmtransistor und Anzeigevorrichtung unter Verwendung desselben

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE69419472T Expired - Lifetime DE69419472T2 (de) 1993-04-23 1994-04-21 Dünnschichttransistor und diesen transistor gebrauchende anzeige.

Country Status (7)

Country Link
US (2) US5563432A (de)
EP (2) EP0813251B1 (de)
JP (1) JP3512849B2 (de)
KR (1) KR0156766B1 (de)
DE (2) DE69419472T2 (de)
TW (1) TW313632B (de)
WO (1) WO1994025990A1 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3284816B2 (ja) * 1995-03-22 2002-05-20 ソニー株式会社 固体撮像装置
US6873362B1 (en) * 1995-03-22 2005-03-29 Sony Corporation Scanning switch transistor for solid-state imaging device
KR100223901B1 (ko) * 1996-10-11 1999-10-15 구자홍 액정 표시장치 및 제조방법
JPH10144928A (ja) * 1996-11-08 1998-05-29 Semiconductor Energy Lab Co Ltd 半導体装置及びその作製方法
JP2914496B2 (ja) * 1996-12-05 1999-06-28 日本電気株式会社 固体撮像素子
JP3425851B2 (ja) 1997-06-30 2003-07-14 日本電気株式会社 液晶表示装置用薄膜トランジスタ
GB9806609D0 (en) * 1998-03-28 1998-05-27 Philips Electronics Nv Electronic devices comprising thin-film transistors
KR100511172B1 (ko) * 1998-05-21 2005-11-30 엘지.필립스 엘시디 주식회사 박막트랜지스터의 구조
KR100325072B1 (ko) * 1998-10-28 2002-08-24 주식회사 현대 디스플레이 테크놀로지 고개구율및고투과율액정표시장치의제조방법
AU7091400A (en) * 1999-08-31 2001-03-26 E-Ink Corporation Transistor for an electronically driven display
JP4118484B2 (ja) 2000-03-06 2008-07-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2001257350A (ja) 2000-03-08 2001-09-21 Semiconductor Energy Lab Co Ltd 半導体装置およびその作製方法
JP4118485B2 (ja) 2000-03-13 2008-07-16 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4700160B2 (ja) 2000-03-13 2011-06-15 株式会社半導体エネルギー研究所 半導体装置
JP4683688B2 (ja) 2000-03-16 2011-05-18 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
JP4393662B2 (ja) 2000-03-17 2010-01-06 株式会社半導体エネルギー研究所 液晶表示装置の作製方法
US6900084B1 (en) 2000-05-09 2005-05-31 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device having a display device
US6624856B2 (en) * 2000-07-07 2003-09-23 Casio Computer Co., Ltd. Liquid crystal display device having thin film transistors for reducing leak current
JP3914753B2 (ja) * 2000-11-30 2007-05-16 Ｎｅｃ液晶テクノロジー株式会社 アクティブマトリクス型液晶表示装置およびスイッチング素子
JP2007094433A (ja) * 2000-11-30 2007-04-12 Nec Lcd Technologies Ltd アクティブマトリクス型液晶表示装置およびスイッチング素子
US7071037B2 (en) 2001-03-06 2006-07-04 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
KR100379684B1 (ko) * 2001-04-20 2003-04-10 엘지.필립스 엘시디 주식회사 박막 트랜지스터 액정표시소자 제조방법
KR100795344B1 (ko) 2001-05-29 2008-01-17 엘지.필립스 엘시디 주식회사 액정표시장치용 어레이 기판 및 그의 제조방법
KR100491821B1 (ko) * 2002-05-23 2005-05-27 엘지.필립스 엘시디 주식회사 액정표시장치용 어레이기판과 그 제조방법
KR100497569B1 (ko) * 2002-10-04 2005-06-28 엘지.필립스 엘시디 주식회사 횡전계방식 액정표시장치용 어레이기판
KR100980015B1 (ko) * 2003-08-19 2010-09-03 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법
JP4593094B2 (ja) * 2003-08-21 2010-12-08 日本電気株式会社 液晶表示装置及びその製造方法
TWI225182B (en) * 2003-10-27 2004-12-11 Au Optronics Corp Flat panel display device with a structure to prevent an electrode line from opening
JP5152448B2 (ja) * 2004-09-21 2013-02-27 カシオ計算機株式会社 画素駆動回路及び画像表示装置
JP4640026B2 (ja) * 2005-08-03 2011-03-02 セイコーエプソン株式会社 電気光学装置及び電子機器
KR20070019457A (ko) * 2005-08-12 2007-02-15 삼성전자주식회사 박막 트랜지스터 표시판 및 이를 포함하는 액정표시장치
US7612859B2 (en) 2005-10-31 2009-11-03 Hewlett-Packard Development Company, L.P. Ultra-violet radiation absorbing grid
US7876400B2 (en) * 2005-10-31 2011-01-25 Hewlett-Packard Development Company, L.P. Optical modulation system
US20070097291A1 (en) * 2005-10-31 2007-05-03 Hewlett-Packard Development Company, Lp Polymer dispersed liquid crystal
TWI293802B (en) * 2006-03-28 2008-02-21 Au Optronics Corp Liquid crystal display device
KR101381251B1 (ko) * 2007-06-14 2014-04-04 삼성디스플레이 주식회사 박막 트랜지스터 및 이를 갖는 표시패널
KR101831167B1 (ko) 2008-09-19 2018-02-26 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR101570347B1 (ko) * 2008-11-25 2015-11-20 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
WO2011104791A1 (ja) * 2010-02-25 2011-09-01 シャープ株式会社 薄膜トランジスタ基板及びその製造方法、表示装置
JP5342064B2 (ja) * 2010-02-26 2013-11-13 シャープ株式会社 液晶表示装置
US8988624B2 (en) * 2011-06-23 2015-03-24 Apple Inc. Display pixel having oxide thin-film transistor (TFT) with reduced loading
CN103926724B (zh) * 2013-06-24 2018-03-30 上海天马微电子有限公司 一种tft驱动的显示装置
CN110291644B (zh) * 2017-02-15 2022-11-01 夏普株式会社 有源矩阵基板

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56107287A (en) * 1980-01-31 1981-08-26 Tokyo Shibaura Electric Co Image display unit
JPS60189265A (ja) * 1984-03-08 1985-09-26 Matsushita Electric Ind Co Ltd 薄膜電界効果型半導体装置
JPH0758793B2 (ja) * 1984-12-19 1995-06-21 松下電器産業株式会社 薄膜トランジスタの製造方法
JPS62120076A (ja) * 1985-11-20 1987-06-01 Fujitsu Ltd 薄膜トランジスタ
JPS62226668A (ja) * 1986-03-27 1987-10-05 Sharp Corp 薄膜トランジスタ
JPS62171160A (ja) * 1986-01-22 1987-07-28 Sharp Corp 薄膜トランジスタ
JPS62226688A (ja) * 1986-03-27 1987-10-05 神東塗料株式会社 ブリツジ用導電性ペ−スト組成物
JP2667173B2 (ja) * 1987-08-31 1997-10-27 松下電器産業株式会社 半導体装置
JPH0748563B2 (ja) * 1988-08-01 1995-05-24 シャープ株式会社 薄膜トランジスタ装置
JPH0488641A (ja) * 1990-07-31 1992-03-23 Toshiba Corp 薄膜トランジスタの製造方法
JPH05275698A (ja) * 1992-03-27 1993-10-22 Sony Corp 薄膜トランジスタ
JP2635885B2 (ja) * 1992-06-09 1997-07-30 インターナショナル・ビジネス・マシーンズ・コーポレイション 薄膜トランジスタ及びアクティブマトリクス液晶表示装置
US5473168A (en) * 1993-04-30 1995-12-05 Sharp Kabushiki Kaisha Thin film transistor

Also Published As

Publication number Publication date
EP0647971A4 (de) 1995-05-03
EP0813251A2 (de) 1997-12-17
JP3512849B2 (ja) 2004-03-31
JPH0794753A (ja) 1995-04-07
US5811846A (en) 1998-09-22
WO1994025990A1 (fr) 1994-11-10
EP0647971A1 (de) 1995-04-12
EP0813251B1 (de) 2003-07-30
DE69419472T2 (de) 2000-02-03
EP0813251A3 (de) 1998-01-14
TW313632B (de) 1997-08-21
KR0156766B1 (ko) 1998-11-16
DE69432991T2 (de) 2004-04-15
EP0647971B1 (de) 1999-07-14
US5563432A (en) 1996-10-08
DE69419472D1 (de) 1999-08-19

Similar Documents

Publication Publication Date Title
DE69432991D1 (de) Dünnfilmtransistor und Anzeigevorrichtung unter Verwendung desselben
DE69618697D1 (de) Dünnfilmtransistor und Flüssigkristallanzeige, die diesen verwendet
DE69323113D1 (de) Flüssigkristallvorrichtung und elektronisches Gerät unter Verwendung derselben
NL194873B (nl) Dunnefilmtransistorenreeks en daarvan gebruikmakende vloeibare kristalweergeefinrichting.
DE69111888D1 (de) Flüssigkristallanzeigevorrichtung und Steuerverfahren dafür.
DE69418261D1 (de) Flüssigkristallvorrichtung
DE69431636D1 (de) Dünnschicht-Halbleiteranordnung, ihre Herstellung und Anzeigsystem
DE69413624D1 (de) Flüssigkristall-Anzeigevorrichtung
DE69420902D1 (de) Dünnschicht-Erzeugungsgerät
DE69423302D1 (de) Flüssigkristall-Anzeigevorrichtung
DE69432654D1 (de) Flüssigkristall-Anzeige und -vorrichtung
DE69407486D1 (de) Flüssigkristall-Anzeigevorrichtung
DE69225738D1 (de) Flüssigkristallanzeigeelement und Projektionsanordnung unter Verwendung desselben
DE69223002D1 (de) Flüssigkristall-Anzeigeelement und dieses verwendende Flüssigkristall-Anzeigevorrichtung
DE69425642D1 (de) Flüssigkristall-Anzeigevorrichtung
DE69325583D1 (de) Flüssigkristallvorrichtung
DE69529663D1 (de) Dünne anzeigevorrichtung
KR890012392A (ko) 박막트랜지스터 및 그것을 사용한 액정표시장치
DE69531284D1 (de) Flüssigkristall-anzeigevorrichtung und verzögerungsfolie
DE69109629D1 (de) Flussigkristallverbindung und Anzeigevorrichtung.
DE69633546D1 (de) Flüssigkristallanzeigevorrichtung und verzögerungsfilm
DE69410890D1 (de) Flüssigkristallvorrichtung
DE69610453D1 (de) Weichmagnetischer dünner Film und Dünnfilmmagnetelement unter Verwendung desselben
DE69533187D1 (de) Elektrooptische Anzeigevorrichtung
DE69406578D1 (de) Dünnschicht-Elektrolumineszenzvorrichtung

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8320 Willingness to grant licences declared (paragraph 23)
R082 Change of representative

Ref document number: 813251

Country of ref document: EP

Representative=s name: HENKEL, BREUER & PARTNER, 80333 MUENCHEN, DE

R082 Change of representative

Ref document number: 813251

Country of ref document: EP

Representative=s name: HENKEL, BREUER & PARTNER, DE