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DE69432899D1 - Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität - Google Patents

Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität

Info

Publication number
DE69432899D1
DE69432899D1 DE69432899T DE69432899T DE69432899D1 DE 69432899 D1 DE69432899 D1 DE 69432899D1 DE 69432899 T DE69432899 T DE 69432899T DE 69432899 T DE69432899 T DE 69432899T DE 69432899 D1 DE69432899 D1 DE 69432899D1
Authority
DE
Germany
Prior art keywords
point sources
high luminosity
liquid ionic
ionic compositions
ion point
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69432899T
Other languages
English (en)
Inventor
Antoine Corbin
Pierre Sudraud
Rainer Sailer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orsay Physics SA
International Business Machines Corp
Original Assignee
Orsay Physics SA
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orsay Physics SA, International Business Machines Corp filed Critical Orsay Physics SA
Application granted granted Critical
Publication of DE69432899D1 publication Critical patent/DE69432899D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
DE69432899T 1994-10-07 1994-10-07 Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität Expired - Lifetime DE69432899D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP94480098A EP0706199B1 (de) 1994-10-07 1994-10-07 Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität

Publications (1)

Publication Number Publication Date
DE69432899D1 true DE69432899D1 (de) 2003-08-07

Family

ID=8218137

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69432899T Expired - Lifetime DE69432899D1 (de) 1994-10-07 1994-10-07 Flüssige ionische Zusammensetzungen verwendende Ionenpunktquellen hoher Luminosität

Country Status (3)

Country Link
US (1) US6337540B1 (de)
EP (1) EP0706199B1 (de)
DE (1) DE69432899D1 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2823005B1 (fr) 2001-03-28 2003-05-16 Centre Nat Rech Scient Dispositif de generation d'un faisceau d'ions et procede de reglage de ce faisceau
US6955930B2 (en) * 2002-05-30 2005-10-18 Credence Systems Corporation Method for determining thickness of a semiconductor substrate at the floor of a trench
EP1622184B1 (de) * 2004-07-28 2011-05-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Emitter für eine Ionenquelle und Verfahren zu deren Herstellung
US7985952B2 (en) * 2007-03-05 2011-07-26 Hitachi, Ltd. Charged particle spin polarimeter, microscope, and photoelectron spectroscope
FR2918790A1 (fr) * 2007-07-09 2009-01-16 Orsay Physics Sa Source micronique d'emission ionique
US7827779B1 (en) * 2007-09-10 2010-11-09 Alameda Applied Sciences Corp. Liquid metal ion thruster array
EP2311063A2 (de) * 2008-07-16 2011-04-20 Carl Zeiss NTS, LLC. Stromvergrösserung in quellen geladener teilchen und systemen
EP2272547B1 (de) * 2009-06-23 2017-01-11 Biotronik VI Patent AG Implantat und Verfahren zur Herstellung desselben
JP5792886B2 (ja) * 2012-03-09 2015-10-14 株式会社日立ハイテクノロジーズ 試料観察方法および試料前処理方法
CN106841706B (zh) * 2017-03-31 2023-06-27 中国工程物理研究院电子工程研究所 一种离子源测试夹具
US10546719B2 (en) 2017-06-02 2020-01-28 Fei Company Face-on, gas-assisted etching for plan-view lamellae preparation
FR3100464B1 (fr) * 2019-09-10 2023-05-05 Centre Nat Rech Scient Procede d’emission d’atomes, de molecules ou d’ions
FR3112420B1 (fr) 2020-07-10 2022-09-09 Univ Paris Saclay Procédé pour la production d’un faisceau d’espèces chargées en phase gazeuse et dispositif associé
US12237137B2 (en) * 2021-04-02 2025-02-25 California Institute Of Technology Method and apparatus for reducing the work function of polycrystalline metal hexaboride

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5878557U (ja) * 1981-11-24 1983-05-27 株式会社日立製作所 電界放出型イオン源
JPS58178944A (ja) * 1982-04-14 1983-10-20 Hitachi Ltd イオン源
JPS5954156A (ja) * 1982-09-21 1984-03-28 Agency Of Ind Science & Technol 電界放出型イオンビ−ム発生装置用電極構造
US5504340A (en) * 1993-03-10 1996-04-02 Hitachi, Ltd. Process method and apparatus using focused ion beam generating means

Also Published As

Publication number Publication date
EP0706199B1 (de) 2003-07-02
US6337540B1 (en) 2002-01-08
EP0706199A1 (de) 1996-04-10

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Legal Events

Date Code Title Description
8332 No legal effect for de