DE69423720D1 - Vorrichtung mit integriert-optischem Wellenleiterpaar - Google Patents
Vorrichtung mit integriert-optischem WellenleiterpaarInfo
- Publication number
- DE69423720D1 DE69423720D1 DE69423720T DE69423720T DE69423720D1 DE 69423720 D1 DE69423720 D1 DE 69423720D1 DE 69423720 T DE69423720 T DE 69423720T DE 69423720 T DE69423720 T DE 69423720T DE 69423720 D1 DE69423720 D1 DE 69423720D1
- Authority
- DE
- Germany
- Prior art keywords
- optical waveguide
- integrated optical
- waveguide pair
- pair
- integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/125—Bends, branchings or intersections
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/132—Integrated optical circuits characterised by the manufacturing method by deposition of thin films
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33050393A JP3345143B2 (ja) | 1993-12-27 | 1993-12-27 | 光導波路の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69423720D1 true DE69423720D1 (de) | 2000-05-04 |
DE69423720T2 DE69423720T2 (de) | 2000-11-23 |
Family
ID=18233360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69423720T Expired - Fee Related DE69423720T2 (de) | 1993-12-27 | 1994-12-21 | Vorrichtung mit integriert-optischem Wellenleiterpaar |
Country Status (5)
Country | Link |
---|---|
US (1) | US5604835A (de) |
EP (1) | EP0661561B1 (de) |
JP (1) | JP3345143B2 (de) |
KR (1) | KR950019788A (de) |
DE (1) | DE69423720T2 (de) |
Families Citing this family (63)
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US5987196A (en) * | 1997-11-06 | 1999-11-16 | Micron Technology, Inc. | Semiconductor structure having an optical signal path in a substrate and method for forming the same |
US6198168B1 (en) | 1998-01-20 | 2001-03-06 | Micron Technologies, Inc. | Integrated circuits using high aspect ratio vias through a semiconductor wafer and method for forming same |
US6150188A (en) | 1998-02-26 | 2000-11-21 | Micron Technology Inc. | Integrated circuits using optical fiber interconnects formed through a semiconductor wafer and methods for forming same |
US6090636A (en) * | 1998-02-26 | 2000-07-18 | Micron Technology, Inc. | Integrated circuits using optical waveguide interconnects formed through a semiconductor wafer and methods for forming same |
US6775453B1 (en) * | 1998-12-21 | 2004-08-10 | Lsi Logic Corporation | On-chip graded index of refraction optical waveguide and damascene method of fabricating the same |
US6282358B1 (en) * | 1998-12-21 | 2001-08-28 | Lsi Logic Corporation | On-chip single layer horizontal deflecting waveguide and damascene method of fabricating the same |
KR100333900B1 (ko) * | 1999-01-21 | 2002-04-24 | 윤종용 | 모드모양 변환기, 그 제작 방법 및 이를 구비한 집적광학 소자 |
US6403393B1 (en) | 1999-09-01 | 2002-06-11 | International Business Machines Corporation | Device having integrated optical and copper conductors and method of fabricating same |
US20050054084A1 (en) * | 1999-10-06 | 2005-03-10 | Infineon Technologies Ag | Substrate with at least one pore |
US6470130B1 (en) * | 2000-02-01 | 2002-10-22 | Agere Systems Guardian Corp. | Waveguide structures |
US6392257B1 (en) | 2000-02-10 | 2002-05-21 | Motorola Inc. | Semiconductor structure, semiconductor device, communicating device, integrated circuit, and process for fabricating the same |
JP2001337302A (ja) * | 2000-05-26 | 2001-12-07 | Nec Corp | 光導波路素子およびその製造方法ならびに光ポーリング方法 |
WO2001093336A1 (en) | 2000-05-31 | 2001-12-06 | Motorola, Inc. | Semiconductor device and method for manufacturing the same |
WO2002009187A2 (en) | 2000-07-24 | 2002-01-31 | Motorola, Inc. | Heterojunction tunneling diodes and process for fabricating same |
US6450699B1 (en) | 2000-12-19 | 2002-09-17 | Intel Corporation | Photonic and electronic components on a shared substrate |
US6869882B2 (en) * | 2000-12-19 | 2005-03-22 | Intel Corporation | Method of creating a photonic via using deposition |
US7000434B2 (en) * | 2000-12-19 | 2006-02-21 | Intel Corporation | Method of creating an angled waveguide using lithographic techniques |
US6650823B1 (en) | 2000-12-19 | 2003-11-18 | Intel Corporation | Method of creating a photonic via using fiber optic |
US6819836B2 (en) | 2000-12-19 | 2004-11-16 | Intel Corporation | Photonic and electronic components on a shared substrate with through substrate communication |
US20020096683A1 (en) | 2001-01-19 | 2002-07-25 | Motorola, Inc. | Structure and method for fabricating GaN devices utilizing the formation of a compliant substrate |
US20020118942A1 (en) * | 2001-02-26 | 2002-08-29 | Shin-Etsu Chemical Co., Ltd. | Method for producing an optical waveguide substrate and an optical waveguide substrate |
WO2002082551A1 (en) | 2001-04-02 | 2002-10-17 | Motorola, Inc. | A semiconductor structure exhibiting reduced leakage current |
EP2261953A3 (de) * | 2001-05-17 | 2011-05-25 | Optronx, Inc. | Lichtwellenleiter mit zusätzlichen Polysiliziumschichten |
US6709989B2 (en) | 2001-06-21 | 2004-03-23 | Motorola, Inc. | Method for fabricating a semiconductor structure including a metal oxide interface with silicon |
US6992321B2 (en) | 2001-07-13 | 2006-01-31 | Motorola, Inc. | Structure and method for fabricating semiconductor structures and devices utilizing piezoelectric materials |
US20030015770A1 (en) * | 2001-07-20 | 2003-01-23 | Motorola, Inc. | Optical waveguide trenches in composite integrated circuits |
US7019332B2 (en) | 2001-07-20 | 2006-03-28 | Freescale Semiconductor, Inc. | Fabrication of a wavelength locker within a semiconductor structure |
US6693298B2 (en) | 2001-07-20 | 2004-02-17 | Motorola, Inc. | Structure and method for fabricating epitaxial semiconductor on insulator (SOI) structures and devices utilizing the formation of a compliant substrate for materials used to form same |
US6855992B2 (en) | 2001-07-24 | 2005-02-15 | Motorola Inc. | Structure and method for fabricating configurable transistor devices utilizing the formation of a compliant substrate for materials used to form the same |
US20030022456A1 (en) * | 2001-07-25 | 2003-01-30 | Motorola, Inc. | Interferometer gating of an optical clock for an integrated circuit |
US20030034491A1 (en) | 2001-08-14 | 2003-02-20 | Motorola, Inc. | Structure and method for fabricating semiconductor structures and devices for detecting an object |
US20050211664A1 (en) * | 2001-09-19 | 2005-09-29 | Applied Materials, Inc. | Method of forming optical waveguides in a semiconductor substrate |
US20030071327A1 (en) | 2001-10-17 | 2003-04-17 | Motorola, Inc. | Method and apparatus utilizing monocrystalline insulator |
US6670210B2 (en) * | 2002-05-01 | 2003-12-30 | Intel Corporation | Optical waveguide with layered core and methods of manufacture thereof |
US6916717B2 (en) | 2002-05-03 | 2005-07-12 | Motorola, Inc. | Method for growing a monocrystalline oxide layer and for fabricating a semiconductor device on a monocrystalline substrate |
EP1776610A2 (de) * | 2002-07-22 | 2007-04-25 | Applied Materials, Inc. | Optisch fertige substrate mit optischem wellenleiter und mikroelkronischem schaltkreis |
US7072534B2 (en) | 2002-07-22 | 2006-07-04 | Applied Materials, Inc. | Optical ready substrates |
WO2004027471A1 (ja) | 2002-09-18 | 2004-04-01 | Fujitsu Limited | 光導波路デバイスおよび光導波路デバイスの製造方法 |
US7169619B2 (en) | 2002-11-19 | 2007-01-30 | Freescale Semiconductor, Inc. | Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process |
US6885065B2 (en) | 2002-11-20 | 2005-04-26 | Freescale Semiconductor, Inc. | Ferromagnetic semiconductor structure and method for forming the same |
US6806202B2 (en) | 2002-12-03 | 2004-10-19 | Motorola, Inc. | Method of removing silicon oxide from a surface of a substrate |
US6965128B2 (en) | 2003-02-03 | 2005-11-15 | Freescale Semiconductor, Inc. | Structure and method for fabricating semiconductor microresonator devices |
US7786983B2 (en) | 2003-04-08 | 2010-08-31 | Poa Sana Liquidating Trust | Apparatus and method for a data input device using a light lamina screen |
JP2007501448A (ja) | 2003-05-29 | 2007-01-25 | アプライド マテリアルズ インコーポレイテッド | 光学信号の直列経路 |
WO2004106986A2 (en) | 2003-05-29 | 2004-12-09 | Applied Materials Inc. | Maskless fabrication of waveguide mirrors |
US20050016446A1 (en) | 2003-07-23 | 2005-01-27 | Abbott John S. | CaF2 lenses with reduced birefringence |
US7509011B2 (en) * | 2004-01-15 | 2009-03-24 | Poa Sana Liquidating Trust | Hybrid waveguide |
US7676131B2 (en) * | 2004-06-04 | 2010-03-09 | Poa Sana Liquidating Trust | Waveguide with a three-dimensional lens |
US7471865B2 (en) * | 2004-06-04 | 2008-12-30 | Poa Sana Liquidating Trust | Apparatus and method for a molded waveguide for use with touch screen displays |
US7267930B2 (en) * | 2004-06-04 | 2007-09-11 | National Semiconductor Corporation | Techniques for manufacturing a waveguide with a three-dimensional lens |
JP2006053662A (ja) * | 2004-08-10 | 2006-02-23 | Matsushita Electric Ind Co Ltd | 多重プロセッサ |
JP4543956B2 (ja) * | 2005-02-18 | 2010-09-15 | ソニー株式会社 | 半導体装置およびそれを用いた電子機器 |
WO2007027615A1 (en) | 2005-09-01 | 2007-03-08 | Applied Materials, Inc. | Ridge technique for fabricating an optical detector and an optical waveguide |
US7551814B1 (en) | 2006-02-21 | 2009-06-23 | National Semiconductor Corporation | Optical detection of user interaction based on external light source |
WO2007105393A1 (ja) * | 2006-03-14 | 2007-09-20 | Konica Minolta Opto, Inc. | 記録ヘッド及び記録装置 |
US20080031584A1 (en) * | 2006-08-02 | 2008-02-07 | National Semiconductor Corporation | Apparatus and method for a singulation of polymer waveguides using photolithography |
US7369724B2 (en) | 2006-10-03 | 2008-05-06 | National Semiconductor Corporation | Apparatus and method for an improved lens structure for polymer wave guides which maximizes free space light coupling |
DE102008012858B4 (de) * | 2008-03-06 | 2016-08-04 | Infineon Technologies Austria Ag | Halbleiterbauelement mit einem das Halbleiterbauelement durchdringenden Isoliergraben und metallischen Bahnen zur galvanisch getrennten Signalübertragung und Verfahren zu dessen Herstellung |
US8791405B2 (en) * | 2009-12-03 | 2014-07-29 | Samsung Electronics Co., Ltd. | Optical waveguide and coupler apparatus and method of manufacturing the same |
US8513037B2 (en) * | 2010-12-03 | 2013-08-20 | Bae Systems Information And Electronic Systems Integration Inc. | Method of integrating slotted waveguide into CMOS process |
US11532574B2 (en) * | 2019-03-12 | 2022-12-20 | Intel Coropration | Through-substrate waveguide |
US11886001B2 (en) * | 2019-12-20 | 2024-01-30 | Snap Inc. | Optical waveguide fabrication process |
US20240176067A1 (en) * | 2022-11-28 | 2024-05-30 | Globalfoundries U.S. Inc. | Enlarged multilayer nitride waveguide for photonic integrated circuit |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2152464B1 (de) * | 1971-09-16 | 1974-05-31 | Thomson Csf | |
JPS57163207A (en) * | 1981-03-31 | 1982-10-07 | Matsushita Electric Ind Co Ltd | Substrate for optical circuit |
JPS57176006A (en) * | 1981-04-23 | 1982-10-29 | Nippon Sheet Glass Co Ltd | Manufacture of optical waveguide circuit |
JPS59220703A (ja) * | 1983-05-31 | 1984-12-12 | Fujitsu Ltd | 光導波路の製造方法 |
US5163118A (en) * | 1986-11-10 | 1992-11-10 | The United States Of America As Represented By The Secretary Of The Air Force | Lattice mismatched hetrostructure optical waveguide |
JPS63224252A (ja) * | 1987-02-06 | 1988-09-19 | シーメンス、アクチエンゲゼルシヤフト | 導波路−ホトダイオードアレー |
JPS6442132A (en) * | 1987-08-10 | 1989-02-14 | Hitachi Ltd | Formation of pattern |
JPH0329903A (ja) * | 1989-06-27 | 1991-02-07 | Seiko Epson Corp | 光導波路及びその製造方法 |
JPH03132705A (ja) * | 1989-10-19 | 1991-06-06 | Brother Ind Ltd | 光導波路アレイ及びその製造方法 |
JPH03144514A (ja) * | 1989-10-31 | 1991-06-19 | Brother Ind Ltd | 光導波路アレイおよびその製造方法 |
JPH0494536A (ja) * | 1990-08-10 | 1992-03-26 | Fujitsu Ltd | レジストパターンの形成方法 |
GB9021944D0 (en) * | 1990-10-09 | 1990-11-21 | British Telecomm | Self-aligned-v-groves and waveguides |
US5194079A (en) * | 1991-09-17 | 1993-03-16 | The Charles Stark Draper Laboratory, Inc. | Method of forming an optical channel waveguide by thermal diffusion |
US5319727A (en) * | 1992-12-28 | 1994-06-07 | Honeywell Inc. | Ion-beam deposited, gain enhanced ring resonators |
JP3029903U (ja) | 1996-04-08 | 1996-10-18 | 八重 藤川 | 頭髪巻付けタオル |
-
1993
- 1993-12-27 JP JP33050393A patent/JP3345143B2/ja not_active Expired - Fee Related
-
1994
- 1994-12-21 EP EP94309625A patent/EP0661561B1/de not_active Expired - Lifetime
- 1994-12-21 DE DE69423720T patent/DE69423720T2/de not_active Expired - Fee Related
- 1994-12-22 KR KR1019940035843A patent/KR950019788A/ko not_active Application Discontinuation
- 1994-12-22 US US08/361,681 patent/US5604835A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JPH07191224A (ja) | 1995-07-28 |
JP3345143B2 (ja) | 2002-11-18 |
DE69423720T2 (de) | 2000-11-23 |
EP0661561B1 (de) | 2000-03-29 |
EP0661561A3 (de) | 1995-09-20 |
KR950019788A (ko) | 1995-07-24 |
EP0661561A2 (de) | 1995-07-05 |
US5604835A (en) | 1997-02-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |