DE69331300D1 - Verfahren zur Abscheidung aus der Gasphase von einem Fluorid-Glasfilm auf einem Substrat - Google Patents
Verfahren zur Abscheidung aus der Gasphase von einem Fluorid-Glasfilm auf einem SubstratInfo
- Publication number
- DE69331300D1 DE69331300D1 DE69331300T DE69331300T DE69331300D1 DE 69331300 D1 DE69331300 D1 DE 69331300D1 DE 69331300 T DE69331300 T DE 69331300T DE 69331300 T DE69331300 T DE 69331300T DE 69331300 D1 DE69331300 D1 DE 69331300D1
- Authority
- DE
- Germany
- Prior art keywords
- substrate
- vapor deposition
- glass film
- fluoride glass
- fluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000005383 fluoride glass Substances 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
- 238000007740 vapor deposition Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/32—Non-oxide glass compositions, e.g. binary or ternary halides, sulfides or nitrides of germanium, selenium or tellurium
- C03C3/325—Fluoride glasses
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/80—Non-oxide glasses or glass-type compositions
- C03B2201/82—Fluoride glasses, e.g. ZBLAN glass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/15—Nonoxygen containing chalogenides
- Y10S65/16—Optical filament or fiber treatment with fluorine or incorporating fluorine in final product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Glass Compositions (AREA)
- Physical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Lasers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9211158A FR2695943B1 (fr) | 1992-09-18 | 1992-09-18 | Procédé de dépôt en phase vapeur d'un film en verre fluoré sur un substrat. |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69331300D1 true DE69331300D1 (de) | 2002-01-24 |
DE69331300T2 DE69331300T2 (de) | 2002-08-08 |
Family
ID=9433659
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69331300T Expired - Fee Related DE69331300T2 (de) | 1992-09-18 | 1993-09-15 | Verfahren zur Abscheidung aus der Gasphase von einem Fluorid-Glasfilm auf einem Substrat |
Country Status (6)
Country | Link |
---|---|
US (1) | US5454847A (de) |
EP (1) | EP0588718B1 (de) |
JP (1) | JPH06299324A (de) |
CA (1) | CA2106419C (de) |
DE (1) | DE69331300T2 (de) |
FR (1) | FR2695943B1 (de) |
Families Citing this family (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2742234B1 (fr) * | 1995-12-11 | 1998-02-27 | France Telecom | Procede pour la realisation de reseaux de bragg a partir d'un verre fluore de type pzg et guide optique obtenu par ledit procede |
US6207522B1 (en) * | 1998-11-23 | 2001-03-27 | Microcoating Technologies | Formation of thin film capacitors |
US6466365B1 (en) * | 2000-04-07 | 2002-10-15 | Corning Incorporated | Film coated optical lithography elements and method of making |
EP1393105A4 (de) * | 2001-04-12 | 2006-03-22 | Omniguide Inc | Faserwellenleiter mit hohem indexkontrast und anwendungen |
US20040137168A1 (en) * | 2002-11-22 | 2004-07-15 | Vladimir Fuflyigin | Dielectric waveguide and method of making the same |
US7226875B2 (en) * | 2004-11-30 | 2007-06-05 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for enhancing FSG film stability |
JP5328726B2 (ja) * | 2009-08-25 | 2013-10-30 | 三星ディスプレイ株式會社 | 薄膜蒸着装置及びこれを利用した有機発光ディスプレイ装置の製造方法 |
JP5677785B2 (ja) * | 2009-08-27 | 2015-02-25 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
JP5611718B2 (ja) * | 2009-08-27 | 2014-10-22 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | 薄膜蒸着装置及びこれを利用した有機発光表示装置の製造方法 |
US20110052795A1 (en) * | 2009-09-01 | 2011-03-03 | Samsung Mobile Display Co., Ltd. | Thin film deposition apparatus and method of manufacturing organic light-emitting display device by using the same |
US8876975B2 (en) | 2009-10-19 | 2014-11-04 | Samsung Display Co., Ltd. | Thin film deposition apparatus |
KR101146982B1 (ko) * | 2009-11-20 | 2012-05-22 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 및 유기 발광 디스플레이 장치 제조 방법 |
KR101084184B1 (ko) * | 2010-01-11 | 2011-11-17 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101174875B1 (ko) * | 2010-01-14 | 2012-08-17 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101193186B1 (ko) | 2010-02-01 | 2012-10-19 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101156441B1 (ko) | 2010-03-11 | 2012-06-18 | 삼성모바일디스플레이주식회사 | 박막 증착 장치 |
KR101202348B1 (ko) | 2010-04-06 | 2012-11-16 | 삼성디스플레이 주식회사 | 박막 증착 장치 및 이를 이용한 유기 발광 표시 장치의 제조 방법 |
US8894458B2 (en) | 2010-04-28 | 2014-11-25 | Samsung Display Co., Ltd. | Thin film deposition apparatus, method of manufacturing organic light-emitting display device by using the apparatus, and organic light-emitting display device manufactured by using the method |
KR101223723B1 (ko) | 2010-07-07 | 2013-01-18 | 삼성디스플레이 주식회사 | 박막 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101738531B1 (ko) | 2010-10-22 | 2017-05-23 | 삼성디스플레이 주식회사 | 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
KR101723506B1 (ko) | 2010-10-22 | 2017-04-19 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR20120045865A (ko) | 2010-11-01 | 2012-05-09 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR20120065789A (ko) | 2010-12-13 | 2012-06-21 | 삼성모바일디스플레이주식회사 | 유기층 증착 장치 |
KR101760897B1 (ko) | 2011-01-12 | 2017-07-25 | 삼성디스플레이 주식회사 | 증착원 및 이를 구비하는 유기막 증착 장치 |
KR101852517B1 (ko) | 2011-05-25 | 2018-04-27 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101840654B1 (ko) | 2011-05-25 | 2018-03-22 | 삼성디스플레이 주식회사 | 유기층 증착 장치 및 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 |
KR101857249B1 (ko) | 2011-05-27 | 2018-05-14 | 삼성디스플레이 주식회사 | 패터닝 슬릿 시트 어셈블리, 유기막 증착 장치, 유기 발광 표시장치제조 방법 및 유기 발광 표시 장치 |
KR101826068B1 (ko) | 2011-07-04 | 2018-02-07 | 삼성디스플레이 주식회사 | 유기층 증착 장치 |
KR20130010730A (ko) | 2011-07-19 | 2013-01-29 | 삼성디스플레이 주식회사 | 증착 소스 및 이를 구비한 증착 장치 |
KR20130015144A (ko) | 2011-08-02 | 2013-02-13 | 삼성디스플레이 주식회사 | 증착원어셈블리, 유기층증착장치 및 이를 이용한 유기발광표시장치의 제조 방법 |
KR101994838B1 (ko) | 2012-09-24 | 2019-10-01 | 삼성디스플레이 주식회사 | 유기층 증착 장치, 이를 이용한 유기 발광 디스플레이 장치의 제조 방법 및 이에 따라 제조된 유기 발광 디스플레이 장치 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63199860A (ja) * | 1987-02-16 | 1988-08-18 | Nec Corp | 薄膜el発光層の製造方法 |
GB2210613B (en) * | 1987-09-25 | 1991-08-14 | Gen Electric Co Plc | Manufacture of optical fibre preforms |
US5071460A (en) * | 1988-03-04 | 1991-12-10 | Nippon Telegraph And Telephone Corporation | Process for the preparation of fluoride glass and process for the preparation of optical fiber preform using the fluoride glass |
FR2643360B1 (fr) * | 1989-02-02 | 1992-11-20 | Centre Nat Rech Scient | Procede de depot en phase vapeur d'un verre fluore sur un substrat, et composition vitreuse deposee ainsi obtenue |
IT1245412B (it) * | 1991-02-22 | 1994-09-20 | Sip | Apparecchiatura per la preparazione di miscele di polveri di composti chimici con alto grado di mescolamento ed in composizioni percentuali prefissate |
-
1992
- 1992-09-18 FR FR9211158A patent/FR2695943B1/fr not_active Expired - Fee Related
-
1993
- 1993-09-15 EP EP93402247A patent/EP0588718B1/de not_active Expired - Lifetime
- 1993-09-15 DE DE69331300T patent/DE69331300T2/de not_active Expired - Fee Related
- 1993-09-17 JP JP5231520A patent/JPH06299324A/ja active Pending
- 1993-09-17 US US08/121,884 patent/US5454847A/en not_active Expired - Fee Related
- 1993-09-17 CA CA002106419A patent/CA2106419C/fr not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CA2106419C (fr) | 1999-07-06 |
DE69331300T2 (de) | 2002-08-08 |
EP0588718B1 (de) | 2001-12-12 |
FR2695943A1 (fr) | 1994-03-25 |
JPH06299324A (ja) | 1994-10-25 |
EP0588718A1 (de) | 1994-03-23 |
FR2695943B1 (fr) | 1994-10-14 |
US5454847A (en) | 1995-10-03 |
CA2106419A1 (fr) | 1994-03-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AVANEX CORP., FREMONT, CALIF., US |
|
8339 | Ceased/non-payment of the annual fee |